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imec academy Kapeldreef 75 BE-3001 Leuven +32 16 28 12 50 www.imecacademy.be [email protected] 10TH PHOTONIC INTEGRATED CIRCUIT TRAINING WHY PARTICIPATE The use of CMOS fabrication technology has led to the spectacular miniaturization of photonic circuits and resulted large scale integration of photonic components at chip level – called Photonic Integrated Circuits (PICs). PICs have ushered in numerous chip based applications in the domains of communications, sensing and detection - key markets for the Internet of Things (IoT). Slated to exceed US$ 1.5 billion by 2022, the PIC market is steadily growing. One key reason for this trend is that the concepts of fabless manufacturing and multi-project-wafer (MPW) services are now widely available for PICs, for various base materials. Furthermore, low-cost access to generic fabrication processes for rapid prototyping and low volume production has shifted the emphasis to design innovation. PIC foundries offer Process Design Kits (PDKs) to support simulations, designing and layouting. As a result, Photonics Design Automation (PDA) is gaining prominence in facilitating design flows. This training course aims to give a jump-start on PIC technology from a fabless manufacturing perspective by providing Technology overview - through one day of seminar sessions conducted by experts from the PIC industry and academia, and Design overview - through two days of hands-on training on Synopsys PDA tools. 10 - 12 October 2018 The structure and content of this training encompasses various aspects of PIC technology – physics of basic building blocks, systems and sub-systems, applications, simulations, designing, mask layout, fabrication and packaging platforms and their access routes. It is intended that the training will help the trainees to gain a background on PIC technology, and its academic and industrial eco-system. After the hands-on sessions, the trainees should be able to understand the PIC design flow and be able to perform basic simulations, designing and generations of mask layouts. More details about the training on next page. WHO SHOULD ATTEND This training is suitable for academic and industrial participants alike. A background in photonics is useful but not necessary. Participants can either attend only the first part of the training (seminars) for one day, or they can attend the complete training for three days (seminars + hands-on). WHY IMEC ACADEMY Imec academy acts as the learning lever for both imec own employees and the local and international industry and academia. We strive to educate, develop and inspire individuals and groups to empower them to stay successful in their research and development: learning for excellence. Our unique high-tech environment and our international top talent enable us to combine advanced world-class expertise with hands-on applications IC SOC PCB DESIGN

10TH PHOTONIC INTEGRATED CIRCUIT TRAINING Integrated Circuit Training... · • OptSim Circuit • RSoft Component Design Suite • OptoDesigner This covers the complete PIC design

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imec academyKapeldreef 75 BE-3001 Leuven+32 16 28 12 50

www.imecacademy.be [email protected]

10TH PHOTONIC INTEGRATED CIRCUIT TRAINING

WHY PARTICIPATEThe use of CMOS fabrication technology has led to the spectacular miniaturization of photonic circuits and resulted large scale integration of photonic components at chip level – called Photonic Integrated Circuits (PICs). PICs have ushered in numerous chip based applications in the domains of communications, sensing and detection - key markets for the Internet of Things (IoT). Slated to exceed US$ 1.5 billion by 2022, the PIC market is steadily growing.

One key reason for this trend is that the concepts of fabless manufacturing and multi-project-wafer (MPW) services are now widely available for PICs, for various base materials. Furthermore, low-cost access to generic fabrication processes for rapid prototyping and low volume production has shifted the emphasis to design innovation. PIC foundries offer Process Design Kits (PDKs) to support simulations, designing and layouting. As a result, Photonics Design Automation (PDA) is gaining prominence in facilitating design flows.

This training course aims to give a jump-start on PIC technology from a fabless manufacturing perspective by providing• Technology overview - through one day of seminar sessions conducted by experts from the PIC industry and academia, and• Design overview - through two days of hands-on training on Synopsys PDA tools.

10 - 12 October 2018

The structure and content of this training encompasses various aspects of PIC technology – physics of basic building blocks, systems and sub-systems, applications, simulations, designing, mask layout, fabrication and packaging platforms and their access routes. It is intended that the training will help the trainees to gain a background on PIC technology, and its academic and industrial eco-system. After the hands-on sessions, the trainees should be able to understand the PIC design flow and be able to perform basic simulations, designing and generations of mask layouts.

More details about the training on next page.

WHO SHOULD ATTENDThis training is suitable for academic and industrial participants alike. A background in photonics is useful but not necessary. Participants can either attend only the first part of the training (seminars) for one day, or they can attend the complete training for three days (seminars + hands-on).

WHY IMEC ACADEMYImec academy acts as the learning lever for both imec own employees and the local and international industry and academia. We strive to educate, develop and inspire individuals and groups to empower them to stay successful in their research and development: learning for excellence. Our unique high-tech environment and our international top talent enable us to combine advanced world-class expertise with hands-on applications

IC SOC PCB DESIGN

in the domains in which imec excels.

LECTURING TEAM This training is conducted by lecturers and trainers from the key players of the ecosystem. For this edition of the training, hands-on training will be provided by Synopsys. Following is the list of organizations whose speakers are expected to teach the seminar sessions:

imec (Belgium), Ghent University / ePIXfab (Belgium), STFC (UK), Tyndall National Institute (Ireland), Lumerical (Canada), CEA-LETI (France), VLC Photonics (Spain), and Synopsys (Netherlands).

WHY PARTICIPATE (CONTINUED)The training is structured in two parts:• The first part, running for a full day, is seminar-based and focuses on the basics of PICs and the value chain of their fabless and MPW fabrication and packaging within different material platforms. This part is ideal for those who are seeking an essential introduction of PIC technology and routes to access it.• The second part, running over two days, focuses on design flow through intensive hands-on training on some of the leading PDA tools and learn the use of PDKs. This part, as a supplement to the first part, is intended for those who are interested in learning the practical implementation of PDA.

Participants, depending on their requirements, can either at-tend only the first part of the training for one day, or they can attend the complete training for three days.

The first part of the training, seminar sessions, starts with a tuto-rial on PIC components and their basic physics by UGent / ePIX-fab. After this, the role of Europractice and photonics MPWs are explained by imec and STFC. This will be followed by sessions from foundries - PIC packaging solutions by Tyndall National Institute, Silicon Photonics, by imec and CEA-LETI, and Silicon Nitride Photonics, by imec. Last three sessions will focus on the designing where PIC design flow will be overviewed by Synop-sys, PIC simulations by Lumerical, and PIC design challenges by VLC Photonics.

The second part of the training, the hands-on sessions, covers practical implementation of PIC component and circuit design, physical simulations, layouting, and a discussion of PDKs. Hands-on training will be provided by Synopsys on the following tools:• OptSim Circuit• RSoft Component Design Suite• OptoDesigner

This covers the complete PIC design flow, from integrated photonics simulations, circuit simulations, process visualization to mask layout.

Furthermore, there is a tour of imec’s 300mm cleanroom at the end of the training. This training also provides participants with an excellent opportunity for networking with technology providers

WED 10.10.18 PIC TECHNOLOGY OVERVIEW ( SEMINARS)

09.00 - 9.10 WELCOME NOTE ADIL MASOOD (IMEC)

09.10 - 10.40 PIC TUTORIAL ROEL BAETS (GHENT UNIVERSITY / EPIXFAB)

10.40 - 10.50 COFFEE BREAK

10.50 - 11.20 EUROPRACTICE & PHOTONICS MPW

NICHOLAS WYN OWEN (STFC) & ADIL MASOOD (IMEC)

11.20 - 12.00 IMEC SILICON PHOTONICS PLATFORM

SEBASTIEN LARDENOIS (IMEC)

12.00 - 13.00 LUNCH

13.00 - 13.40 PIC PACKAGING SOLUTIONS

PADRAIC MORRISSEY (TYNDALL NATIONAL INSTITUTE)

13.40 - 14.20 CEA-LETI SILICON PHOTONICS PLATFORM

ANDRE MYKO (CEA-LETI)

14.20 - 15.00 IMEC SILICON NITRIDE PHOTONICS PLATFORM TBD (IMEC)

15.00 - 15.10 COFFEE BREAK

15.10 - 15.50 PIC DESIGN OVERVIEW

TBD (SYNOPSYS)

15.50 - 16.30 PIC SIMULATION

GREG BAETHGE (LUMERICAL)

16.30 - 17.10 CHALLENGES IN PIC DESIGN

TBD (VLC PHOTONICS)

THU 11.10.18 PIC DESIGN OVERVIEW (HANDS-ON)

09.00 - 09.40 INTRODUCTION TO SYNOPSYS PIC DESIGN FLOW

TBD (SYNOPSYS)

09.40 - 10.40 OPTSIM CIRCUIT BASICS

TBD (SYNOPSIS)

10.40 - 10.50 COFFEE BREAK

10.50 - 12.00 RING RESONATOR PIC, THERMAL TUNING TBD (SYNOPSYS)

12.00 - 13.00 LUNCH

13.00 - 13.40 MODULATORS: RING, TW-MZM, SE-MZM

TBD (SYNOPSYS)

13.40 - 14.20 DESIGN FOR MANUFACTURING: MONTE CARLO TBD (SYNOPSYS)

14.20 - 15.00 INTRODUCTION TO RSOFT COMPONENT DESIGN

TBD (SYNOPSYS)

15.00 - 15.10 COFFEE BREAK

15.10 - 15.50 CREATING AND SIMULATING STRUCTURES WITH RSOFT TBD (SYNPOSYS)

15.50 - 17.00 AUGMENTING PDK WITH CUSTOM PDK COMPONENTS TBD (SYNPOSYS)

FRI 12.10.18 PIC DESIGN OVERVIEW (HANDS-ON)

09.00 - 09.40 INTRODUCTION TO MASK LAYOUT AND PDK

TBD (SYNOPSYS)

09.40 - 10.40 OBJECT ORIENTED DESIGN AND CONNECTIVITY IN OPTODESIGNER

TBD (SYNOPSIS)

10.40 - 10.50 COFFEE BREAK

10.50 - 11.20 BUILDING BLOCK GENERATION TBD (SYNOPSYS)

11.20 - 12.00 AUTOROUTING TBD (SYNOPSYS)

12.00 - 13.00 LUNCH

13.00 - 14.30 COMPLETE PIC DESIGN FLOW

TBD (SYNOPSYS)

14.30 - 15.00 PIC LAYOUT VERIFICATION ADIL MASOOD (IMEC)

15.00 - 15.10 COFFEE BREAK

15.10 - 15.40 IMEC CLEANROOM TOUR ADIL MASOOD (IMEC)

PRACTICAL INFORMATION

PROGRAM SUMMARYPIC Technology Overview (seminar sessions):• 10th of October (Wednesday), 2018. from 09.00 to 17.00

PIC Design Overview (hands-on training sessions):• 11th of October (Thursday), 2018. from 09.00 to 17.00• 12th of October (Friday), 2018. from 09.00 to 16.00

LOCATIONThe training will take place at imec headquarter located in Heverlee (Leuven), Belgium. The participants must report at the imec tower reception, located at:Remisebosweg 1,3001 Heverlee, BelgiumFor more details on how to reach imec tower, click here: www.imec-int.com/en/connect-with-us/imec-belgium .

PC REQUIREMENTParticipants are required to bring their own PC, with administrative rights, for the training. Instructions to install software will be sent to them after registration.

Minimum requirements:• Operating systems: Microsoft Windows 7 or newer (64 bit OS)• Full administrative rights (for installation of software)• 3 GB free hard disk space• 2 GB RAM memory• WiFi card• 1 free USB port

CATERINGRegistration for the training also involves sandwich lunches as well as coffee and refreshments.

CONTACTFor more information, please feel free to visit us on www.imecacademy.be , or contact us on [email protected] .

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