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Materials and Corrosion 56, 205–212 (2005) Corrosion Books 205 Corrosion Books The Local Chemical Analysis of Materi- als, J. W. Martin, 215 pages, Pergamon Ma- terials Series, R. W. Cahn (ed.), Vol. 9. El- sevier Amsterdam 2003. Prize: 120 EUR. ISBN: 0-08-043936-5. Local chemical analysis down to the na- nometer or even atomistic range is a chal- lenging issue and therefore the respective techniques are still under development, justifying a review of the state of the art from time to time. This was done here, and the systematic approach is to distin- guish the available methods according to excitation sources i.e. X-rays, laser be- ams, ion beams or electron beams. The ul- timate technique however is to remove sin- gle atoms from a specimen and analyse them by mass spectroscopy. Therefore the book starts by describing this technique i.e. Atom Probe Field Ion Mi- croscopy (AP-FIM). Nowadays it is possi- ble to perform a 3D-reconstruction of atoms within a volume of approximately 1 1 25 nm 3 . Typical fields of applicati- on are noon-sized precipitates, grain boun- dary segregation and multilayer thin films. Chapter 2 is dedicated to X-ray Photo- electron Spectroscopy (XPS), also known as Electron Spectroscopy for Chemical Analysis (ESCA). Since the method is very sensitive to surface layers, contamina- tion is a crucial point, and most meaningful results can be obtained by creating fresh fracture surfaces in the ultrahigh vacuum inside the instrument. Principles, instru- mentation, restrictions to the technique, ar- tefacts and how to get rid of them, are de- scribed comprehensively. Some examples of application are given such as metal oxi- dation or surface layers on glass, semicon- ductors and polymers. The application of light sources for the excitation of vibrational modes of crystals or molecules lead to methods like IR and Raman Spectroscopy or Laser Microprobe Mass Spectroscopy (LAMMA), as des- cribed in chapter 3. A great advantage of these techniques is that they are not res- tricted to vacuum environment and therefo- re a wide field of applications evolves, all dealing with issues of molecule adsorption at surfaces. Some of the techniques also provide the possibility of microanalysis with a spatial resolution of 1 lm (Raman Microscopy) or even 0.5 lm (LAMMA). Chapter 4 deals with the large variety of techniques using the interaction of ion beams with matter. The most widely used method of this kind is Secondary Ion Mass Spectroscopy (SIMS). Its great ad- vantages are that all elements and isotopes might be detected even at very low concen- trations (ppm) and that depth profiling with a resolution of 10 nm can be performed rea- dily. On the other hand ultrahigh vacuum and a flat surface is required and therefore the main field of application is dopant cont- rol in the semiconductor industry. Other techniques utilizing various ion-atom or ion-electron interactions and their special applications are discussed as well. Finally in chapter 5 electron microscopy and the utilization of secondary signals pro- duced by electron-material interactions are described. Scanning Electron Microscopy (SEM) and Electron Probe Micro Analysis (EPMA) are very convenient for most stan- dard problems of microstructural charac- terization, but the lateral resolution of the latter is restricted to approximately 1 lm. Better resolution of the order of 1 nm can be achieved with the analytical Transmissi- on Electron Microscope (TEM) or Scan- ning Transmission Electron Microscope (STEM). Two impressive examples of ap- plication i.e. GP-zones in an aluminium al- loy and grain boundary segregation are pre- sented. Furthermore Auger Electron Spec- troscopy (AES), another method to study grain boundary segregation, is described. Finally the potentials of Electron Energy Loss Spectroscopy (EELS) and High Reso- lution EELS (HREELS) are discussed, techniques which represent options for a TEM instrument or a surface analytical de- vice, respectively. The last chapter provides useful informa- tion related to the choice of the appropriate technique for the solution of problems. In conclusion, the book can indeed be re- commended to materials scientists and en- gineers as an aid for solving numerous pro- blems for which local chemical information or surface analysis is needed. It provides a good overview, a profound understanding of the techniques and a clear assessment of advantages and disadvantages. – CB03404 – W. Oesterle Reinigen und Entfetten in der Metallin- dustrie. Thomas W. Jelinek und 5 Auto- ren, 200 Seiten 67 Abbildungen und 42 Ta- bellen. 1. Auflage 1999, Eugen G. Leuze Verlag, Bad Saulgau, 2001. 59,00 EUR. ISBN-Nr. 3-87480-155-1. Dieses Buch ist fu ¨ r Praktiker der Oberfla ¨- chentechnik sowie fu ¨r Lehrlinge und Stu- denten geschrieben worden. Es gibt dem Leser die Mo ¨glichkeit, die Grundlagen und die technische Durchfu ¨hrung der in der Oberfla ¨chentechnik eingesetzten Reini- gungs- und Entfettungsverfahren zu verste- hen. Es ist ein umfangreiches Werk, das so- wohl das Reinigen mit Lo ¨sungsmitteln als auch die wa ¨ssrigen Heißentfettungen be- handelt. Die Themen umfassen u.a. Metho- den zur Beurteilung des Reinheitsgrades der Oberfla ¨chen, Verfahren zum Reinigen und Entfetten, Reinigen mit Lo ¨sungsmit- teln, wa ¨ssrige Reinigung und Entfettung, Reinigungsanlagen und Plasmareinigung. Es werden die im Sinne einer stoffver- lustminimierten Prozesstechnik relevanten Stoffkreislaufschließungen unter Einsatz von Regenerationsverfahren fu ¨r wa ¨ssrige Entfettungen beschrieben sowie Hinweise zur Optimierung der Spu ¨ltechnik gege- ben. Die Regenerationsverfahren werden kurz erla ¨utert, wobei die Anlagenbeschrei- bungen zum U ¨ bertragen in die betriebliche Praxis hilfreich sind. Die Berechnungen der Spu ¨lwasservolumenstro ¨ me fu ¨ r die Spu ¨lkas- kade wird jedoch nur mit einer vereinfach- ten Formel durchgefu ¨hrt. Fu ¨r Spu ¨loptimie- rungen ist daher weiterfu ¨hrende Literatur notwendig. Besonders nu ¨tzlich fu ¨r Praktiker sowie Anlagenlieferanten sind die zahlreichen Anwendungsbeispiele fu ¨r verschiedene Werkstoffe, in denen die Arbeitsga ¨nge, die Art der angewendeten Reiniger, Tempe- ratur, Spu ¨ltechnik, eventueller Einsatz von Regenerationsverfahren und Einsatz von Ultraschall beschrieben sind. Nach fast jedem Kapitel ist ein Literatur- verzeichnis angegeben, das dem Leser die Mo ¨glichkeit fu ¨r ein vertiefendes Studium gibt. Hilfreich ist auch das Glossar zum ra- schen Nachschlagen wichtiger Begriffe. Insgesamt eignet sich das Buch auch heute noch sehr gut als Lehrbuch und Nach- schlagewerk zum Thema Reinigungs- und Entfettungsverfahren fu ¨r die angespro- chene Leserschaft. – CB02804 – C. Ba ¨ßler Powder Coatings – Chemistry and Tech- nology. P. Gillis de Lange. 384 Seiten, zahl- reiche Abbildungen und Tabellen, Vincentz KG Hannover 2004. EUR 119. ISBN 3- 87870-784-3. Das in der Reihe Coatings Compendia erschienene Buch ist die zweite, vollsta ¨n-

Corrosion Books: Reinigen und Entfetten in der Metallindustrie. By: Thomas W. Jelinek

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Page 1: Corrosion Books: Reinigen und Entfetten in der Metallindustrie. By: Thomas W. Jelinek

Materials and Corrosion 56, 205–212 (2005) Corrosion Books 205

CorrosionBooks

The Local Chemical Analysis of Materi-als, J. W. Martin, 215 pages, Pergamon Ma-terials Series, R. W. Cahn (ed.), Vol. 9. El-sevier Amsterdam 2003. Prize: 120 EUR.ISBN: 0-08-043936-5.Local chemical analysis down to the na-

nometer or even atomistic range is a chal-lenging issue and therefore the respectivetechniques are still under development,justifying a review of the state of the artfrom time to time. This was done here,and the systematic approach is to distin-guish the available methods according toexcitation sources i.e. X-rays, laser be-ams, ion beams or electron beams. The ul-timate technique however is to remove sin-gle atoms from a specimen and analysethem by mass spectroscopy.Therefore the book starts by describing

this technique i.e. Atom Probe Field IonMi-croscopy (AP-FIM). Nowadays it is possi-ble to perform a 3D-reconstruction of atomswithin a volume of approximately1 � 1 � 25 nm3. Typical fields of applicati-on are noon-sized precipitates, grain boun-dary segregation and multilayer thin films.Chapter 2 is dedicated to X-ray Photo-

electron Spectroscopy (XPS), also knownas Electron Spectroscopy for ChemicalAnalysis (ESCA). Since the method isvery sensitive to surface layers, contamina-tion is a crucial point, and most meaningfulresults can be obtained by creating freshfracture surfaces in the ultrahigh vacuuminside the instrument. Principles, instru-mentation, restrictions to the technique, ar-tefacts and how to get rid of them, are de-scribed comprehensively. Some examplesof application are given such as metal oxi-dation or surface layers on glass, semicon-ductors and polymers.The application of light sources for the

excitation of vibrational modes of crystalsor molecules lead to methods like IR andRaman Spectroscopy or Laser MicroprobeMass Spectroscopy (LAMMA), as des-cribed in chapter 3. A great advantage ofthese techniques is that they are not res-

tricted to vacuum environment and therefo-re a wide field of applications evolves, alldealing with issues of molecule adsorptionat surfaces. Some of the techniques alsoprovide the possibility of microanalysiswith a spatial resolution of 1 lm (RamanMicroscopy) or even 0.5 lm (LAMMA).Chapter 4 deals with the large variety of

techniques using the interaction of ionbeams with matter. The most widely usedmethod of this kind is Secondary IonMass Spectroscopy (SIMS). Its great ad-vantages are that all elements and isotopesmight be detected even at very low concen-trations (ppm) and that depth profiling witha resolution of 10 nm can be performed rea-dily. On the other hand ultrahigh vacuumand a flat surface is required and thereforethe main field of application is dopant cont-rol in the semiconductor industry. Othertechniques utilizing various ion-atom orion-electron interactions and their specialapplications are discussed as well.Finally in chapter 5 electron microscopy

and the utilization of secondary signals pro-duced by electron-material interactions aredescribed. Scanning Electron Microscopy(SEM) and Electron Probe Micro Analysis(EPMA) are very convenient for most stan-dard problems of microstructural charac-terization, but the lateral resolution of thelatter is restricted to approximately 1 lm.Better resolution of the order of 1 nm canbe achieved with the analytical Transmissi-on Electron Microscope (TEM) or Scan-ning Transmission Electron Microscope(STEM). Two impressive examples of ap-plication i.e. GP-zones in an aluminium al-loy and grain boundary segregation are pre-sented. Furthermore Auger Electron Spec-troscopy (AES), another method to studygrain boundary segregation, is described.Finally the potentials of Electron EnergyLoss Spectroscopy (EELS) and High Reso-lution EELS (HREELS) are discussed,techniques which represent options for aTEM instrument or a surface analytical de-vice, respectively.The last chapter provides useful informa-

tion related to the choice of the appropriatetechnique for the solution of problems.In conclusion, the book can indeed be re-

commended to materials scientists and en-gineers as an aid for solving numerous pro-blems for which local chemical informationor surface analysis is needed. It provides agood overview, a profound understandingof the techniques and a clear assessmentof advantages and disadvantages.– CB03404 – W. Oesterle

Reinigen und Entfetten in der Metallin-dustrie. Thomas W. Jelinek und 5 Auto-ren, 200 Seiten 67 Abbildungen und 42 Ta-bellen. 1. Auflage 1999, Eugen G. LeuzeVerlag, Bad Saulgau, 2001. 59,00 EUR.ISBN-Nr. 3-87480-155-1.Dieses Buch ist fur Praktiker der Oberfla-

chentechnik sowie fur Lehrlinge und Stu-denten geschrieben worden. Es gibt demLeser die Moglichkeit, die Grundlagen

und die technische Durchfuhrung der inder Oberflachentechnik eingesetzten Reini-gungs- und Entfettungsverfahren zu verste-hen.Es ist ein umfangreiches Werk, das so-

wohl das Reinigen mit Losungsmitteln alsauch die wassrigen Heißentfettungen be-handelt. Die Themen umfassen u.a. Metho-den zur Beurteilung des Reinheitsgradesder Oberflachen, Verfahren zum Reinigenund Entfetten, Reinigen mit Losungsmit-teln, wassrige Reinigung und Entfettung,Reinigungsanlagen und Plasmareinigung.Es werden die im Sinne einer stoffver-

lustminimierten Prozesstechnik relevantenStoffkreislaufschließungen unter Einsatzvon Regenerationsverfahren fur wassrigeEntfettungen beschrieben sowie Hinweisezur Optimierung der Spultechnik gege-ben. Die Regenerationsverfahren werdenkurz erlautert, wobei die Anlagenbeschrei-bungen zum Ubertragen in die betrieblichePraxis hilfreich sind. Die Berechnungen derSpulwasservolumenstrome fur die Spulkas-kade wird jedoch nur mit einer vereinfach-ten Formel durchgefuhrt. Fur Spuloptimie-rungen ist daher weiterfuhrende Literaturnotwendig.Besonders nutzlich fur Praktiker sowie

Anlagenlieferanten sind die zahlreichenAnwendungsbeispiele fur verschiedeneWerkstoffe, in denen die Arbeitsgange,die Art der angewendeten Reiniger, Tempe-ratur, Spultechnik, eventueller Einsatz vonRegenerationsverfahren und Einsatz vonUltraschall beschrieben sind.Nach fast jedem Kapitel ist ein Literatur-

verzeichnis angegeben, das dem Leser dieMoglichkeit fur ein vertiefendes Studiumgibt. Hilfreich ist auch das Glossar zum ra-schen Nachschlagen wichtiger Begriffe.Insgesamt eignet sich das Buch auch

heute noch sehr gut als Lehrbuch und Nach-schlagewerk zum Thema Reinigungs- undEntfettungsverfahren fur die angespro-chene Leserschaft. – CB02804 – C. Baßler

Powder Coatings – Chemistry and Tech-nology. P. Gillis de Lange. 384 Seiten, zahl-reiche Abbildungen und Tabellen, VincentzKG Hannover 2004. EUR 119. ISBN 3-87870-784-3.Das in der Reihe Coatings Compendia

erschienene Buch ist die zweite, vollstan-