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S1 Supporting Information Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b- PMOST Julia Cushen, 1* Lei Wan, 1 Gregory Blachut, 2 Michael J. Maher, 3 Thomas R. Albrecht, 1 Christopher J. Ellison, 2 C. Grant Willson, 2, 3 Ricardo Ruiz 1 1 HGST, a Western Digital Company 3403 Yerba Buena Rd. San Jose, CA 95135 2 The University of Texas at Austin, McKetta Department of Chemical Engineering 200 E Dean Keeton St. Stop C0400 Austin, TX 78712 3 The University of Texas at Austin, Department of Chemistry 105 E. 24th St. Stop A5300, Austin, TX 78712 *[email protected]

Double-Patterned Sidewall Directed Self-Assembly … Supporting Information Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST Julia Cushen,

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Page 1: Double-Patterned Sidewall Directed Self-Assembly … Supporting Information Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST Julia Cushen,

S1

Supporting Information

Double-Patterned Sidewall Directed Self-Assembly

and Pattern Transfer of Sub-10 nm PTMSS-b-

PMOST

Julia Cushen, 1* Lei Wan,

1 Gregory Blachut,

2 Michael J. Maher,

3 Thomas R. Albrecht,

1

Christopher J. Ellison, 2 C. Grant Willson,

2, 3 Ricardo Ruiz

1

1HGST, a Western Digital Company 3403 Yerba Buena Rd. San Jose, CA 95135

2The University of Texas at Austin, McKetta Department of Chemical Engineering 200 E Dean

Keeton St. Stop C0400 Austin, TX 78712

3The University of Texas at Austin, Department of Chemistry 105 E. 24th St. Stop A5300,

Austin, TX 78712

*[email protected]

Page 2: Double-Patterned Sidewall Directed Self-Assembly … Supporting Information Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST Julia Cushen,

S2

The characterization data for the materials studied in this work is summarized in Table S1. The

composition of the top coat used to orient PTMSS-b-PMOST19.9 is reported in a previous study and the

composition of the top coat used to orient PTMSS-b-PMOST17.4 is: 48 mol% maleic anhydride, 35 mol%

3,5-di-tert-butylstyrene, and 17 mol% styrene.

Polymer L0 a Mn,A

b ĐA

c Mn,BCP

b ĐBCP

c

PTMSS-b-PMOST19.9 19.6 14.4 1.01 28.6 1.08

PTMSS-b-PMOST17.4 17.0 9.2 1.03 17.9 1.02

aLamellae periodicity (L0) in nm, determined by primary SAXS peak.

bMn in kDa, determined by GPC.

cDispersity Index Ð, determined by GPC.

Table S1. Properties of the polymers described in this work

The water contact angles of the PS mat guiding line, the oxidized side walls of the guiding line, and

backfill brush are reported in Table S2.

Table S2. Water contact angles of the relevant surface materials in this paper

Page 3: Double-Patterned Sidewall Directed Self-Assembly … Supporting Information Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST Julia Cushen,

S3

Figure S1. AFM trace of the chemical contrast pattern with the backfill brush and corresponding height

profile of the guiding line and trench.

Figure S2. Low magnification SEM image of PTMSS-b-PMOST19 terracing with incommensurate film

thickness on sidewall-guiding pattern.

Page 4: Double-Patterned Sidewall Directed Self-Assembly … Supporting Information Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST Julia Cushen,

S4

Figure S3. SEM image of PTMSS-b-PMOST when aligned on a guiding pattern with a pitch of 80 nm

and a line width of 40 nm. Guiding lines were patterned perpendicular to the orientation of most of the

BCP domains.

The EELS maps of the individual elements (carbon, oxygen, and silicon) in Figure 3 of the main text are

shown in Figures S3 and S4.

Page 5: Double-Patterned Sidewall Directed Self-Assembly … Supporting Information Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST Julia Cushen,

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Figure S4. EELS mapping of individual elements in the BCP film stack that corresponds to Figure 3 in

the main text.

Figure S5. EELS mapping of individual elements in partially etched BCP film stack that corresponds to

Figure 3 in the main text.