EQP Series High Sensitivity Mass and Energy Analysers for Monitoring,

Control and Characterisation of Ions, Neutrals and Radicals in Plasma

Plasma Sampling InterfaceXX Plasma is sampled via a laser drilled orifice available from 30 – 300 µm.

XX The orifice is specifically designed for plasma sampling, using pre-thinned material for the laser drilled component.

XX The ion extraction optics are software controlled and optimised for minimum plasma perturbation.

XX The optics are fully tuneable for optimum detection of +ve and –ve ions as well as electrons and radicals.

Integral Ionisation SourceXX The integral ioniser is fully software controllable offering precise control

of electron energy (0-150 eV) and thermionic emission (0.2-2000 µA).

XX Two oxide coated iridium filaments, with a radially symmetrical cage offering Electron Impact, Appearance Potential and Soft Ionisation modes for powerful characterisation of the neutral and radical species from the plasma.

XX A key feature of the EQP ionisation source is the confinement of the electrons in the source cage, allowing precise control for appearance potential measurements for the analysis of radical species and energetic neutrals.

XX Optionally, Electron Attachment Ionisation allows for the analysis of electronegative species from the plasma. This feature provides valuable information of radical species from electronegative plasmas.

Energy AnalyserXX The EQP analyser offers constant transmission at all energies with

minimum perturbation of the ion flight path.

XX The 45° electrostatic parallel plate energy analyser is used to provide minimum perturbation of the ion flight path within the analyser for optimum energy resolution.

XX Constant transmission for ion energy distribution functions throughout the ion energy range +/- 100 eV or +/- 1000 eV.

XX Software controlled Energy scan increments are from 0.05 eV, with a <0.25 eV FWHM energy resolution.

XX The EQP system can be floated to 10 keV with an external power supply and isolation components. EXAMPLE DATA SHOWING TYPICAL ENERGY SPECTRUM

EQP PLASMA SAMPLING INTERFACE

EQP IONISATION SOURCE

EQP 45° ENERGY SECTOR ANALYSER

Internal Ioniser

Ion Energy eV

Sem

C/S

The Hiden EQP Series - Mass and Energy Analysers for Plasma Diagnostics and Characterisation

Mass AnalyserXX A Hiden high performance triple filter mass spectrometer

is included with the EQP system.

XX Mass range options of 20, 50, 200, 300, 510, 1000, 2500 and 5000 amu are offered.

XX 6, 9 and 20 mm quadrupole diameters are offered for specialist plasma sampling applications.

XX The triple mass filter system comprises a main filter featuring RF and DC filtering, coupled with RF only pre and post filters. This technology minimises the effects from fringe fields at the primary mass filter entrance and exit, enhancing mass resolution and transmission. Triple filter technology allows high mass species such as clusters and metallic compounds used in plasma deposition to be analysed.

XX Abundance sensitivity is to 0.1 ppm and minimum detection of plasma species is 20 ppb.

XX Mass filter rods are precision machined from molybdenum with radially supported precision ceramics.

DetectorXX A digital ion counting detector is included as standard with

7-decade continuous dynamic range. Counting is via a 32-bit counter for 1 c/s resolution.

XX A Faraday Cup option extends the range up to 5 x 1010 c/s for high density plasma applications.

XX The EQP MASsoft Professional software provides data acquisition as raw counts, counts per second or integrated counts. Averaging or accumulating counts over repeated mass and energy scans significantly increases the signal to noise ratio in the analysis of minor components.

XX A TTL output of raw counts is available via an external connector on the EQP electronics system.

XX Signal gating with 100 ns time resolution for energy & mass distributions.

XX Optional integrated Multi-Channel Scalar (MCS) device offers 50 ns time resolution for transient event analysis such as HiPIMS, plasma ignition/modulation/extinction experiments and ion flight time measurements.

SE

M: c

/s C+ at ~20PPB

100PPB

100

90

80

70

60

50

40

30

20

10

07 8 9 10 11 12 13 14 15 16 17

mass : amu

SE

M: c

/s

1.6e+08

1.4e+08

1.2e+08

1e+08

8e+07

6e+07

4e+07

2e+07

035 36 37 38 36 40 41 42 43 44 45

mass : amu

EQP ABUNDANCE SENSITIVITY - Typical Ar+ and ArH+ mass resolved spectrum

Turbo molecular pump port

45˚ Sector field energy analyser

Triple filter quadrupole mass analyser

Ion counting detector

Ion flight tube to provide plasma sampling insertion from 240 mm up to 750 mm

The Hiden EQP Series - Mass and Energy Analysers for Plasma Diagnostics and Characterisation

EQP-6 3F MASS ANALYSER

EQP SENSITIVITY - 20 ppb detection of C+ ions from CF4 plasma

SE

M: c

/s C+ at ~20PPB

100PPB

100

90

80

70

60

50

40

30

20

10

07 8 9 10 11 12 13 14 15 16 17

mass : amu

SE

M: c

/s

1.6e+08

1.4e+08

1.2e+08

1e+08

8e+07

6e+07

4e+07

2e+07

035 36 37 38 36 40 41 42 43 44 45

mass : amu

SE

M: c

/s

90000

70000

80000

60000

50000

40000

30000

20000

10000

08.5 8.7 8.9 9.1 9.3 9.5 9.7 9.9 10.1 10.3 10.5

energy eV

FWHM 0.24ev

EQP ENERGY RESOLUTION

Hiden EQP Plasma diagnostics Systems

The Hiden EQP System is an advanced plasma diagnostic tool with combined high transmission ion energy analyser and quadrupole mass spectrometer, acquiring both mass spectra at specified ion energies and ion energy distributions of selected plasma ions. The advanced EQP ioniser provides for neutral and radical detection, the electron attachment ionisation feature further enhancing the detection capability for radicals in electronegative plasma chemistries.

XX High Sensitivity Sub ppm detection of plasma ions, neutrals and radicals.

XX Ion Energy Analysis Ion Energy distributions of plasma ions are acquired in seconds, 100 eV and 1000 eV energy range versions are available.

XX HiPIMS, Afterglow, Pulsed and Laser Ablation A standard TTL signal gating input is included for time resolved studies. The programmable signal gating option provides for automatic data acquisition for defined time slices through the plasma pulse. Gating resolution is 100 ns.

XX Optional innovative Multi-Channel Scalar (MCS) device integrated into controller firmware and MASsoft Professional software.

XX 6000-bin multichannel scalar resolution offering 50 ns time resolution with data intuitive to obtain and can be manipulated in external programmes such as Excel and Origin.

XX Positive and Negative Ion Measurement Pre-set software modes enable automatic switching between positive ion, negative ion and neutral analysis modes.

XX Neutral and Radical Detection The EQP integral electron impact ioniser provides for analysis of neutral and radical species.

XX Electron Attachment Ionisation This technique of soft ionisation offered as an option for the analysis of electronegative species in plasma, further enhances the analysis of neutrals and radicals.

XX Appearance Potential Spectra The EQP ioniser features precision control of all ion source parameters, including the facility to accurately scan electron energy for appearance potential spectra of selected species. The appearance potential spectra provide direct information to confirm the fragmentation and excitation state of plasma neutral species.

ION ENERGY DISTRIBUTIONS of selected +ve and -ve ions

MASS SPECTRA at selected ion energies for +ve ions, -ve ions and neutrals.

electron-energy: V

10000

9000

8000

7000

6000

5000

4000

3000

2000

1000

10 10.5 11 11.5 12 12.51 3 13.51 4 14.51 50

SE

M:

c/s

400 W plasmametastable O2

excited state a1Δg

no plasmaground state O2

-

X3 Σ-g

APPEARANCE POTENTIAL SPECTRA for identification of radical species from parent stable molecules.

EQP OPERATING MODES

ELECTRON ATTACHMENT IONISATION scans to identify radical species produced in the plasma from electronegative gases.

00

500000

1e+06

1.5e+06

2.5e+06

3e+06

3.5e+06

2e+06

10 20 30 40 50 60 70 80 90 100

SE

M:

c/s

Ar+ IED Inductively Coupled Plasma Source 3x10-2 mbar 100W

electron-energy: V

mass : amu

0 1 2 3 4 5 6 7 8 9 10 11 120

500

3500

2500

3000

2000

1500

1000

SE

M:

c/s

CF3- Ions By Attachment by in CF4

Appearance Potential of O2+ from CO2

Plasma On

Plasma Off

electron-energy: V

100000

1e+06

10000

1000

100

10

010 20 30 40 50

SE

M:

c/s

Replace‘MassSpectra’withthisone:

ReplaceElectronAttachmentionisationwiththisone:

0

1000

2000

3000

4000

5000

6000

0 1 2 3 4 5 6 7 8 9 10 11 12 13

SEM

: c/s

Plasma Off

Plasma On

Ti+

N+

Ti2+

Ar+

XX Parallel-plate Argon plasma driven by a 20 kHz AC supply.

XX MCS device used to collect mass resolved ion energy distributions for Ar+ plasma at 200 ns intervals.

XX Data shows ignition and decay of features in the ion energy spectra that are not possible to obtain with time averaged data.

Example EQP Data

Ion Energy Distributions in dual frequency RF PlasmasIon energy distributions (IEDs) for both positive and negative ions have been measured, using a mass/energy spectrometer system, for two plasma reactors which can be operated using a combination of two RF power sources. One reactor uses capacitively-coupled inputs and the other includes an inductively-coupled input. Typical data for 2.26, 13.56 and 27.1 MHz inputs are presented for a range of phase relationships. The IEDs clearly show significant differences between the data for different species of ions. The differences result, in part, from the ion-molecule collisions occurring particularly in the plasma/surface sheath regions.

IEDs for argon plasma at 2.5x10-2 mbar with 13.56 and 27.12 MHz for phase differences 0° to 180°.

IEDs for N+ ions in nitrogen plasma at 6x10-2 mbar for mixed 2.26 and 13.56 MHz signals for selected phase differences.

IEDs for O- ions from a nitrous oxide plasma at selected phase differences.

0

2000

4000

6000

8000

10000

12000

Ar+ ion energies. 6x10-2 mbar 20 kHz plasma.

0 eV

20 eV

Time Resolved Ar+ Ion Energy Distributions in RF Plasma

Example EQP Data

Mass and energy spectra of (a) HIPIMS of Cr and (b) conventional dc sputtering of Cr in Ar and N2 atmosphere as used to deposit the CrN/NbN nanolayer coating.

Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 26(2).

MAGNETRON SPUTTERING – POSITIVE AND NEGATIVE ION MASS SPECTRA

HIPIMS AND CONVENTIONAL SPUTTERING COMPARED – MASS AND ENERGY SPECTRA

EQP Operating Modes

plas

ma

diag

nost

ics

gas

anal

ysis

vacu

uman

alys

is

surfa

cesc

ienc

e

Hiden EQP Systems High Sensitivity Mass and Energy Analysers forMonitoring, Control and Characterisation of Ions,Neutrals and Radicals in Plasma.

• Ion Energy Distributions of selected +veand -ve ions.

• Mass Spectra at selected ion energies for+ve ions, -ve ions and neutrals.

• Appearance potential spectra for identification ofradical species from parent stable molecules.

10000900080007000600050004000300020001000

10 10.5 11 11.5 12 12.5 13 13.5 14 14.5 150

5 lpm CO2, Plasma Reactor: 1 Torr Appearance Potential: mass 32

electron-energy: V

SE

M: c

/s

400 W plasmametastable O2

excited state a1∆g

no plasmaground state O2-

X3 Σ-g

• Electron attachment ionisation scans to identifyradical species produced in the plasma from electronegative gases.

CF4- Ions By Attachment in CF4

The Hiden EQP System is an advanced plasmadiagnostic tool with combined high transmission ionenergy analyser and quadrupole mass spectrometer,acquiring both mass spectra at specified ion energiesand ion energy distributions of selected plasma ions.The advanced EQP ioniser provides for neutral andradical detection, the electron attachment ionisationfeature further enhancing the detection capability forradicals in electronegative plasma chemistries.

• High SensitivitySub PPM detection of plasma ions, neutrals andradicals.

• Ion Energy AnalysisIon Energy distributions of plasma ions areacquired in seconds, 100 eV and 1000 eV energyrange versions are available.

• Afterglow, Pulsed Plasma, and Laser AblationA standard TTL signal gating input is included fortime resolved studies. The programmable signal gating option providesfor automatic data acquisition for defined timeslices through the plasma pulse. Gating resolutionis 100 nanoseconds.

• Positive and Negative Ion MeasurementPre-set software modes enable automatic switchingbetween positive ion, negative ion and neutralanalysis modes.

• Neutral and Radical DetectionThe EQP integral electron impact ioniser providesfor analysis of neutral and radical species.

• Electron Attachment IonisationThis technique of soft ionisation offered as anoption for the analysis of electronegative species inplasma, further enhances the analysis of neutralsand radicals.

• Appearance Potential SpectraThe EQP ioniser features precision control of all ionsource parameters, including the facility toaccurately scan electron energy for appearancepotential spectra of selected species. Theappearance potential spectra provide directinformation to confirm the fragmentation andexcitation state of plasma neutral species.

Hiden EQP Plasma Diagnostic Systems

Manufactured in England by:

HIDEN ANALYTICAL LTD

420 EUROPA BOULEVARD

WARRINGTON, WA5 7UN, ENGLAND

Tel: +44 (0)1925 445225 Fax: +44 (0)1925 416518

Email: info@hiden.co.uk

Web Site: www.HidenAnalytical.com

It is Hiden Analytical’s policy to continually improve product performance and therefore specifications are subject to change.

TECHNICAL DATA SHEET 172

Certificate No. 6738

EXAMPLE EQP DATA

Cou

ntra

te, c

s-1

Flux

, (x1

06

coun

ts-1

)

Ar+

Cr1+

N2+

N+

Cr2+

E = 0.5 eV

Energy, (eV)

Cr(1+)

Ar(1+)

N2(1+)

0 5 10

3

1

2

10

10

1k

10k

100k

1M

10M

0

0 10 20 30 40 50 60

mass : amu

Cou

ntra

te, c

s-1

Flux

, (x1

06

coun

ts-1

)

Ar+ Cr1+

N2+

N+

Cr2+

E = 0.5 eV

Energy, (eV)

Cr(1+)

Ar(1+)

N2(1+)

0 5 10

2

1

10

10

1k

10k

100k

1M

10M

0

0 10 20 30 40 50 60

mass : amu

HIPIMS and conventional sputtering compared – mass and energy spectra

Mass and energy spectra of (a) HIPIMS of Cr and (b) conventional dc sputtering of Cr in Ar and N2

atmosphere as used to deposit the CrN/NbN nanolayer coating.Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 26(2).

(a) (b)

Plasma etching of Hf-based high k thin films

QMS-measured plasma ionic species are shown in(a) and (b). Higher mass ionic species measured byQMS are shown in (c) and (d). The data in the leftcolumn are taken at 3 mTorr and 500W (high densityplasma condition) while those in the right columnare taken at 5 mTorr and 300W (low density plasmacondition).

Data ref:Ryan M. Martin, Jane P. Chang University of California, Los Angeles, USA.J.Vac. Sci. Technol. A 27(2)

100

2000

0120 140 160

mass : amu

SE

M: c

/s

180 200 22090

4000

6000

8000

10000

12000

14000

16000

110 130 150 170 190 210 150

1000

0170 190 210

mass : amu

SE

M: c

/s

140

2000

3000

4000

5000

6000

7000

8000

160 180 200 220

Magnetron sputtering – Positive and negative ion mass spectra

3 mTorr, 500Watt 5 mTorr, 300Watt

Ar+ IEDInductively CoupledPlasma Source25mT 100W

SE

M: c

/s

energy: VCycle number 0000001

00

500000

1e+06

1.5e+06

2e+06

2.5e+06

3e+06

3.5e+06

10 20 30 40 50 60 70 80 90 100

SE

M: c

/s

00

10000

20000

30000

40000

50000

60000

70000

80000

90000

100000

20 40 60 80 100 120 140

EQP Operating Modes

plas

ma

diag

nost

ics

gas

anal

ysis

vacu

uman

alys

is

surfa

cesc

ienc

e

Hiden EQP Systems High Sensitivity Mass and Energy Analysers forMonitoring, Control and Characterisation of Ions,Neutrals and Radicals in Plasma.

• Ion Energy Distributions of selected +veand -ve ions.

• Mass Spectra at selected ion energies for+ve ions, -ve ions and neutrals.

• Appearance potential spectra for identification ofradical species from parent stable molecules.

10000900080007000600050004000300020001000

10 10.5 11 11.5 12 12.5 13 13.5 14 14.5 150

5 lpm CO2, Plasma Reactor: 1 Torr Appearance Potential: mass 32

electron-energy: V

SE

M: c

/s

400 W plasmametastable O2

excited state a1∆g

no plasmaground state O2-

X3 Σ-g

• Electron attachment ionisation scans to identifyradical species produced in the plasma from electronegative gases.

CF4- Ions By Attachment in CF4

The Hiden EQP System is an advanced plasmadiagnostic tool with combined high transmission ionenergy analyser and quadrupole mass spectrometer,acquiring both mass spectra at specified ion energiesand ion energy distributions of selected plasma ions.The advanced EQP ioniser provides for neutral andradical detection, the electron attachment ionisationfeature further enhancing the detection capability forradicals in electronegative plasma chemistries.

• High SensitivitySub PPM detection of plasma ions, neutrals andradicals.

• Ion Energy AnalysisIon Energy distributions of plasma ions areacquired in seconds, 100 eV and 1000 eV energyrange versions are available.

• Afterglow, Pulsed Plasma, and Laser AblationA standard TTL signal gating input is included fortime resolved studies. The programmable signal gating option providesfor automatic data acquisition for defined timeslices through the plasma pulse. Gating resolutionis 100 nanoseconds.

• Positive and Negative Ion MeasurementPre-set software modes enable automatic switchingbetween positive ion, negative ion and neutralanalysis modes.

• Neutral and Radical DetectionThe EQP integral electron impact ioniser providesfor analysis of neutral and radical species.

• Electron Attachment IonisationThis technique of soft ionisation offered as anoption for the analysis of electronegative species inplasma, further enhances the analysis of neutralsand radicals.

• Appearance Potential SpectraThe EQP ioniser features precision control of all ionsource parameters, including the facility toaccurately scan electron energy for appearancepotential spectra of selected species. Theappearance potential spectra provide directinformation to confirm the fragmentation andexcitation state of plasma neutral species.

Hiden EQP Plasma Diagnostic Systems

Manufactured in England by:

HIDEN ANALYTICAL LTD

420 EUROPA BOULEVARD

WARRINGTON, WA5 7UN, ENGLAND

Tel: +44 (0)1925 445225 Fax: +44 (0)1925 416518

Email: info@hiden.co.uk

Web Site: www.HidenAnalytical.com

It is Hiden Analytical’s policy to continually improve product performance and therefore specifications are subject to change.

TECHNICAL DATA SHEET 172

Certificate No. 6738

EXAMPLE EQP DATA

Cou

ntra

te, c

s-1

Flux

, (x1

06

coun

ts-1

)

Ar+

Cr1+

N2+

N+

Cr2+

E = 0.5 eV

Energy, (eV)

Cr(1+)

Ar(1+)

N2(1+)

0 5 10

3

1

2

10

10

1k

10k

100k

1M

10M

0

0 10 20 30 40 50 60

mass : amu

Cou

ntra

te, c

s-1

Flux

, (x1

06

coun

ts-1

)

Ar+ Cr1+

N2+

N+

Cr2+

E = 0.5 eV

Energy, (eV)

Cr(1+)

Ar(1+)

N2(1+)

0 5 10

2

1

10

10

1k

10k

100k

1M

10M

0

0 10 20 30 40 50 60

mass : amu

HIPIMS and conventional sputtering compared – mass and energy spectra

Mass and energy spectra of (a) HIPIMS of Cr and (b) conventional dc sputtering of Cr in Ar and N2

atmosphere as used to deposit the CrN/NbN nanolayer coating.Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 26(2).

(a) (b)

Plasma etching of Hf-based high k thin films

QMS-measured plasma ionic species are shown in(a) and (b). Higher mass ionic species measured byQMS are shown in (c) and (d). The data in the leftcolumn are taken at 3 mTorr and 500W (high densityplasma condition) while those in the right columnare taken at 5 mTorr and 300W (low density plasmacondition).

Data ref:Ryan M. Martin, Jane P. Chang University of California, Los Angeles, USA.J.Vac. Sci. Technol. A 27(2)

100

2000

0120 140 160

mass : amu

SE

M: c

/s

180 200 22090

4000

6000

8000

10000

12000

14000

16000

110 130 150 170 190 210 150

1000

0170 190 210

mass : amu

SE

M: c

/s

140

2000

3000

4000

5000

6000

7000

8000

160 180 200 220

Magnetron sputtering – Positive and negative ion mass spectra

3 mTorr, 500Watt 5 mTorr, 300Watt

Ar+ IEDInductively CoupledPlasma Source25mT 100W

SE

M: c

/s

energy: VCycle number 0000001

00

500000

1e+06

1.5e+06

2e+06

2.5e+06

3e+06

3.5e+06

10 20 30 40 50 60 70 80 90 100

SE

M: c

/s

00

10000

20000

30000

40000

50000

60000

70000

80000

90000

100000

20 40 60 80 100 120 140

EQP Operating Modes

plas

ma

diag

nost

ics

gas

anal

ysis

vacu

uman

alys

is

surfa

cesc

ienc

e

Hiden EQP Systems High Sensitivity Mass and Energy Analysers forMonitoring, Control and Characterisation of Ions,Neutrals and Radicals in Plasma.

• Ion Energy Distributions of selected +veand -ve ions.

• Mass Spectra at selected ion energies for+ve ions, -ve ions and neutrals.

• Appearance potential spectra for identification ofradical species from parent stable molecules.

10000900080007000600050004000300020001000

10 10.5 11 11.5 12 12.5 13 13.5 14 14.5 150

5 lpm CO2, Plasma Reactor: 1 Torr Appearance Potential: mass 32

electron-energy: V

SE

M: c

/s

400 W plasmametastable O2

excited state a1∆g

no plasmaground state O2-

X3 Σ-g

• Electron attachment ionisation scans to identifyradical species produced in the plasma from electronegative gases.

CF4- Ions By Attachment in CF4

The Hiden EQP System is an advanced plasmadiagnostic tool with combined high transmission ionenergy analyser and quadrupole mass spectrometer,acquiring both mass spectra at specified ion energiesand ion energy distributions of selected plasma ions.The advanced EQP ioniser provides for neutral andradical detection, the electron attachment ionisationfeature further enhancing the detection capability forradicals in electronegative plasma chemistries.

• High SensitivitySub PPM detection of plasma ions, neutrals andradicals.

• Ion Energy AnalysisIon Energy distributions of plasma ions areacquired in seconds, 100 eV and 1000 eV energyrange versions are available.

• Afterglow, Pulsed Plasma, and Laser AblationA standard TTL signal gating input is included fortime resolved studies. The programmable signal gating option providesfor automatic data acquisition for defined timeslices through the plasma pulse. Gating resolutionis 100 nanoseconds.

• Positive and Negative Ion MeasurementPre-set software modes enable automatic switchingbetween positive ion, negative ion and neutralanalysis modes.

• Neutral and Radical DetectionThe EQP integral electron impact ioniser providesfor analysis of neutral and radical species.

• Electron Attachment IonisationThis technique of soft ionisation offered as anoption for the analysis of electronegative species inplasma, further enhances the analysis of neutralsand radicals.

• Appearance Potential SpectraThe EQP ioniser features precision control of all ionsource parameters, including the facility toaccurately scan electron energy for appearancepotential spectra of selected species. Theappearance potential spectra provide directinformation to confirm the fragmentation andexcitation state of plasma neutral species.

Hiden EQP Plasma Diagnostic Systems

Manufactured in England by:

HIDEN ANALYTICAL LTD

420 EUROPA BOULEVARD

WARRINGTON, WA5 7UN, ENGLAND

Tel: +44 (0)1925 445225 Fax: +44 (0)1925 416518

Email: info@hiden.co.uk

Web Site: www.HidenAnalytical.com

It is Hiden Analytical’s policy to continually improve product performance and therefore specifications are subject to change.

TECHNICAL DATA SHEET 172

Certificate No. 6738

EXAMPLE EQP DATA

Cou

ntra

te, c

s-1

Flux

, (x1

06

coun

ts-1

)

Ar+

Cr1+

N2+

N+

Cr2+

E = 0.5 eV

Energy, (eV)

Cr(1+)

Ar(1+)

N2(1+)

0 5 10

3

1

2

10

10

1k

10k

100k

1M

10M

0

0 10 20 30 40 50 60

mass : amu

Cou

ntra

te, c

s-1

Flux

, (x1

06

coun

ts-1

)

Ar+ Cr1+

N2+

N+

Cr2+

E = 0.5 eV

Energy, (eV)

Cr(1+)

Ar(1+)

N2(1+)

0 5 10

2

1

10

10

1k

10k

100k

1M

10M

0

0 10 20 30 40 50 60

mass : amu

HIPIMS and conventional sputtering compared – mass and energy spectra

Mass and energy spectra of (a) HIPIMS of Cr and (b) conventional dc sputtering of Cr in Ar and N2

atmosphere as used to deposit the CrN/NbN nanolayer coating.Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 26(2).

(a) (b)

Plasma etching of Hf-based high k thin films

QMS-measured plasma ionic species are shown in(a) and (b). Higher mass ionic species measured byQMS are shown in (c) and (d). The data in the leftcolumn are taken at 3 mTorr and 500W (high densityplasma condition) while those in the right columnare taken at 5 mTorr and 300W (low density plasmacondition).

Data ref:Ryan M. Martin, Jane P. Chang University of California, Los Angeles, USA.J.Vac. Sci. Technol. A 27(2)

100

2000

0120 140 160

mass : amu

SE

M: c

/s

180 200 22090

4000

6000

8000

10000

12000

14000

16000

110 130 150 170 190 210 150

1000

0170 190 210

mass : amu

SE

M: c

/s

140

2000

3000

4000

5000

6000

7000

8000

160 180 200 220

Magnetron sputtering – Positive and negative ion mass spectra

3 mTorr, 500Watt 5 mTorr, 300Watt

Ar+ IEDInductively CoupledPlasma Source25mT 100W

SE

M: c

/s

energy: VCycle number 0000001

00

500000

1e+06

1.5e+06

2e+06

2.5e+06

3e+06

3.5e+06

10 20 30 40 50 60 70 80 90 100

SE

M: c

/s

00

10000

20000

30000

40000

50000

60000

70000

80000

90000

100000

20 40 60 80 100 120 140

EQP Operating Modes

plas

ma

diag

nost

ics

gas

anal

ysis

vacu

uman

alys

is

surfa

cesc

ienc

e

Hiden EQP Systems High Sensitivity Mass and Energy Analysers forMonitoring, Control and Characterisation of Ions,Neutrals and Radicals in Plasma.

• Ion Energy Distributions of selected +veand -ve ions.

• Mass Spectra at selected ion energies for+ve ions, -ve ions and neutrals.

• Appearance potential spectra for identification ofradical species from parent stable molecules.

10000900080007000600050004000300020001000

10 10.5 11 11.5 12 12.5 13 13.5 14 14.5 150

5 lpm CO2, Plasma Reactor: 1 Torr Appearance Potential: mass 32

electron-energy: V

SE

M: c

/s

400 W plasmametastable O2

excited state a1∆g

no plasmaground state O2-

X3 Σ-g

• Electron attachment ionisation scans to identifyradical species produced in the plasma from electronegative gases.

CF4- Ions By Attachment in CF4

The Hiden EQP System is an advanced plasmadiagnostic tool with combined high transmission ionenergy analyser and quadrupole mass spectrometer,acquiring both mass spectra at specified ion energiesand ion energy distributions of selected plasma ions.The advanced EQP ioniser provides for neutral andradical detection, the electron attachment ionisationfeature further enhancing the detection capability forradicals in electronegative plasma chemistries.

• High SensitivitySub PPM detection of plasma ions, neutrals andradicals.

• Ion Energy AnalysisIon Energy distributions of plasma ions areacquired in seconds, 100 eV and 1000 eV energyrange versions are available.

• Afterglow, Pulsed Plasma, and Laser AblationA standard TTL signal gating input is included fortime resolved studies. The programmable signal gating option providesfor automatic data acquisition for defined timeslices through the plasma pulse. Gating resolutionis 100 nanoseconds.

• Positive and Negative Ion MeasurementPre-set software modes enable automatic switchingbetween positive ion, negative ion and neutralanalysis modes.

• Neutral and Radical DetectionThe EQP integral electron impact ioniser providesfor analysis of neutral and radical species.

• Electron Attachment IonisationThis technique of soft ionisation offered as anoption for the analysis of electronegative species inplasma, further enhances the analysis of neutralsand radicals.

• Appearance Potential SpectraThe EQP ioniser features precision control of all ionsource parameters, including the facility toaccurately scan electron energy for appearancepotential spectra of selected species. Theappearance potential spectra provide directinformation to confirm the fragmentation andexcitation state of plasma neutral species.

Hiden EQP Plasma Diagnostic Systems

Manufactured in England by:

HIDEN ANALYTICAL LTD

420 EUROPA BOULEVARD

WARRINGTON, WA5 7UN, ENGLAND

Tel: +44 (0)1925 445225 Fax: +44 (0)1925 416518

Email: info@hiden.co.uk

Web Site: www.HidenAnalytical.com

It is Hiden Analytical’s policy to continually improve product performance and therefore specifications are subject to change.

TECHNICAL DATA SHEET 172

Certificate No. 6738

EXAMPLE EQP DATA

Cou

ntra

te, c

s-1

Flux

, (x1

06

coun

ts-1

)

Ar+

Cr1+

N2+

N+

Cr2+

E = 0.5 eV

Energy, (eV)

Cr(1+)

Ar(1+)

N2(1+)

0 5 10

3

1

2

10

10

1k

10k

100k

1M

10M

0

0 10 20 30 40 50 60

mass : amu

Cou

ntra

te, c

s-1

Flux

, (x1

06

coun

ts-1

)

Ar+ Cr1+

N2+

N+

Cr2+

E = 0.5 eV

Energy, (eV)

Cr(1+)

Ar(1+)

N2(1+)

0 5 10

2

1

10

10

1k

10k

100k

1M

10M

0

0 10 20 30 40 50 60

mass : amu

HIPIMS and conventional sputtering compared – mass and energy spectra

Mass and energy spectra of (a) HIPIMS of Cr and (b) conventional dc sputtering of Cr in Ar and N2

atmosphere as used to deposit the CrN/NbN nanolayer coating.Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 26(2).

(a) (b)

Plasma etching of Hf-based high k thin films

QMS-measured plasma ionic species are shown in(a) and (b). Higher mass ionic species measured byQMS are shown in (c) and (d). The data in the leftcolumn are taken at 3 mTorr and 500W (high densityplasma condition) while those in the right columnare taken at 5 mTorr and 300W (low density plasmacondition).

Data ref:Ryan M. Martin, Jane P. Chang University of California, Los Angeles, USA.J.Vac. Sci. Technol. A 27(2)

100

2000

0120 140 160

mass : amu

SE

M: c

/s

180 200 22090

4000

6000

8000

10000

12000

14000

16000

110 130 150 170 190 210 150

1000

0170 190 210

mass : amuS

EM

: c/s

140

2000

3000

4000

5000

6000

7000

8000

160 180 200 220

Magnetron sputtering – Positive and negative ion mass spectra

3 mTorr, 500Watt 5 mTorr, 300Watt

Ar+ IEDInductively CoupledPlasma Source25mT 100W

SE

M: c

/s

energy: VCycle number 0000001

00

500000

1e+06

1.5e+06

2e+06

2.5e+06

3e+06

3.5e+06

10 20 30 40 50 60 70 80 90 100

SE

M: c

/s

00

10000

20000

30000

40000

50000

60000

70000

80000

90000

100000

20 40 60 80 100 120 140

POSITIVE IONS Molybdenum Cathode. Sulphur Hexafluoride Gas. Mass spectrum 90 to 220 amu, showing Molybdenum Fluoride Ions.

NEGATIVE IONS Molybdenum Cathode. Sulphur Hexafluoride Gas. Mass spectrum 140 to 220 amu, showing SF6

-, MoF5- and MoF6

- Ions.

EQP System Configurations

Plasma Applications

System OptionsThe EQP system can be configured with a wide range of customised options to suit many plasma conditions. These include:

Option Part No.1000 eV energy range 620100

Dual Faraday/ Electron Multiplier Detector 443020

Extended Flight Tube 321 or 400 mm 620200

Extended Flight Tube to 750 mm 620400

Magnetic Shielding to 800 Gauss 610201

Magnetic Shielding to 500 Gauss 610211

Electron Attachment Ionisation 610320

DC Driven Electrode 44 mm diameter 618010

RF/DC Driven Electrode 150 mm diameter 618020

Water Cooled RF/DC Electrode 84 mm diameter 618030

4.5” UHV Gate Valve 202350

Z-drive 4” Stroke – Manual 202500

Z-drive 12” Stroke – Motorised 202900

Front End Shutter 610440

RIV60 Re-Entrant Isolation Valve 610450

PC Computer with MASsoft Professional Software Pre-Installed 800624

Windows NIST MS Database 800500

0-10 volt 8 Channel Analogue Output Card 304908

Penning Gauge and Controller incl. Vacuum Interlock for System Protection 303805

Programmable Signal Gating with Foreground and Background Delay Timers 110600

Multi-Channel Scalar (MCS) Mode for 50 ns Time Resolution 800404

HPR-60 Molecular Beam Sampling Option for Atmospheric Plasma Sampling 303065

EQP systems are offered with a range of standard plasma sampling options to provide non-invasive sampling of a broad range of plasma applications including:

XX HiPIMS

XX ECR – Electron Cyclotron Discharge

XX Magnetron Discharge

XX Helicon Source

XX DC Glow Discharge Plasma

XX Pulsed Plasma & Laser Ablation

XX Parallel Plate – RF Plasma

XX ICP – Inductively Coupled Plasma

EQP Mass Spectrometer RangeEQP-6 6 mm quadrupole rod diameter - Mass range options 300 and 510 amu

EQP-9 9 mm quadrupole rod diameter - Mass range options 50, 300, 510, 1000, 2500 and 5000 amu

EQP-20 20 mm quadrupole rod diameter - Zone H Mass range 20 amu - Zone 1 Mass range 200 amu

Plasma Pressure OptionsXX Up to 0.5 mbar – Differential pumping with a 60 l/s

turbomolecular pump

XX Up to 2 mbar – Differential pumping with a 240 l/s turbomolecular pump

XX > 2 mbar - EQP system is upgradeable to the multi stage HPR-60 molecular beam sampling system

EQP SYSTEM in plasma PLASMA NEEDLE - atmospheric plasma - analysis with EQP/HPR-60 molecular beam sampling system.

Hiden Analytical Ltd.420 Europa BoulevardWarrington WA5 7UN England

T +44 [0] 1925 445 225 F +44 [0] 1925 416 518 E info@hiden.co.uk W www.HidenAnalytical.com

Hiden’s quadrupole mass spectrometer systems address a broad application range in:

GAS ANALYSIS

dynamic measurement of reaction gas streamscatalysis and thermal analysismolecular beam studiesdissolved species probesfermentation, environmental and ecological studies

SURFACE ANALYSIS

UHV TPDSIMSend point detection in ion beam etchelemental imaging – 3D mapping

PLASMA DIAGNOSTICS

plasma source characterisationetch and deposition process reaction kinetic studiesanalysis of neutral and radical species

VACUUM ANALYSIS

partial pressure measurement and control of process gasesreactive sputter process controlvacuum diagnosticsvacuum coating process monitoring

TDS 172/2

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