An Introduction to High-Resolution X-Ray Diffractometry Dr. Manfred Schuster Siemens AG, Corporate Research and Development, Dept. ZFE BT MR 32, Otto-Hahn-Ring 6, D-81739 Munich, Germany Dr. Nikolaus Herres Fraunhofer-Institut für Angewandte Festkörperphysik, Tullastr. 72, D-79108 Freiburg, Germany In: Proceedings “Herbstschule Röntgenoptik“ (ed. H.-R. Höche), pp. 69-119. Günthersberge/Harz (Germany), 27-30 Sept. 1993.

Introduction to High-Resolution X-Ray Diffraction

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Einführung in die Röntgendiffraktometrie von dünnen epitaktischen Halbleiter-Schichten. Aus: Proceedings “Herbstschule Röntgenoptik“ (ed. H.-R. Höche), pp. 69-119. Günthersberge/Harz (Germany), 27-30 Sept. 1993. This contribution is intended to give an introduction to High-Resolution X-Ray Diffraction (HRXRD). Furthermore, it shall be demonstrated how HRXRD can be applied fo the investigation of epitaxial structures and which information can be obtained from these measurements. We shall concentrate on III-V- and IV-IV-compound semiconductors. The methods and the results to be presented may easily be applied to other material systems.

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$Page 1: Introduction to High-Resolution X-Ray Diffraction$

An Introduction to High-Resolution X-Ray Diffractometry

Dr. Manfred Schuster

Siemens AG, Corporate Research and Development, Dept. ZFE BT MR 32,

Otto-Hahn-Ring 6, D-81739 Munich, Germany

Dr. Nikolaus Herres

Fraunhofer-Institut für Angewandte Festkörperphysik,

Tullastr. 72, D-79108 Freiburg, Germany

In: Proceedings “Herbstschule Röntgenoptik“ (ed. H.-R. Höche), pp. 69-119.

Günthersberge/Harz (Germany), 27-30 Sept. 1993.

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