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Lithography for Silicon-based and Flexible Electronics
Christopher K. OberMaterials Science & Engineering
Cornell [email protected]
2
Smaller is BetterMoore’s Law after 40 Years
http://www.chips.ibm.com/gallery/p-n2.htmlhttp://www.intel.com/research/silicon/mooreslaw.htm
• Microprocessors with thousands of transistors operating at a few MHz
• Feature sizes of ~ 0.5 µm
• Now few GHz
• Feature sizes of ~ 100 nm
3
International Technology Roadmap for Semiconductors
4
Sowing the Seeds of Nanotechnology
Richard Feynman, “There is plenty of room at the bottom” (1959)
But…….Gutenberg laid the foundation for microlithography when he invented the printing press (~1450)
5
Expose (193 nm or 157 nm) (seconds)
Resist
WaferCoat & Bake
Mask
Positive
Develop (seconds)
Negative
Typical exposure, bake and development times are in seconds!
Strip
(PEB) Post-Exposure Bake (seconds)
Etch (Plasma)
Lithography: the printing press made small
6
Making the Pattern
• Crosslinking• Chain scission• Polarity change
h ν
h ν
h ν
The March to Smaller Dimensions
193 nmImmersion
?
Photoresist
• Photosensitive material used for transferring pattern to substrate
• Has to– Adhere to substrate– Undergo radiation induced solubility change– Possess etch resistance– Be developable in aqueous base (or other solvent)– Disappear when not wanted
9
Limitations of Polymeric Photoresists
Resolution• High molecular weight• Molecular weight distribution
SwellingResidual stress
• Adhesion (collapse)• Distortion
Line width roughness (LWR)
Silicon
resist polymer
http://www.xraylith.wisc.edu
Topics
• High resolution DUV lithography• Without chemical amplification• 193 nm immersion• 157 nm lithography
• E-beam lithography• EUV Lithography• Thick film lithography• Future directions in lithography
• Imprint lithography• Ink jet printing
11
Resists without Chemical Amplification
• Established technology– Mostly used as electron-beam resists– Was original basis of DUV resists
• High resolution (no acid diffusion problems)• Sub 30 nm feature sizes possible• Problem: Low sensitivity! How to improve?
– Currently low sensitivities are traded for high resolution
12
Electron Beam Lithography
• Characterized by expensive systems and long write times– Typically used for mask making or MEMS devices
e-
13
PMMA
+
O
E-Beam
• Excellent resolution (<30 nm) + Contrast
• Low sensitivity (800µc/cm2 @ 100kV)
• How to improve sensitivity?
-copolymerize with MAA for 4x increase in sensitivity
E-beam Technology Group, Stanford Nanofabrication Facility
14
E-Beam Sensitivity of PMMA Analogues
Copolymer Sensitivity (15 kV, µC/Cm2)
PMMA 40
X = Me, Y = COOH 35
X = Me, Y = CN 12
X = Me, Y = Me 14
X = Cl, Y = COOMe 12
X = CN, Y = H 12
• Stability of Radical intermediates seems most important factor
• From ‘Introduction to Microlithography’ p. 202
15
Styrene Monomers
insensitive neg. tone resist
insensitive pos. tone resist
Highly sensitive Negative tone
Sensitivity
‘Introduction to Microlithography’, p 207
E-beam Resists
17
Improving the Sensitivity of Chain Scission Resists
• Electron withdrawing groups or copolymerization with appropriate Chromophore
PMMA-phenyl isopropyl ketone (PIPK)
(ZEP Photoresist) resolution of 20nm possible
•Note: Both examples result in more stable radical intermediates
C.Pittman et al J.Electrochem soc., 1981, 1759,
K. Sugita et al, Polymer J., 1993, 25, 1059
18
IBM Terpolymer Resist• High sensitivity (7 µC/Cm2 at 15 kV)• Positive-tone resist based on chain scission
Moreau, W, et al. J. Vac. Sci. Technol. 1979, 16(6) 1989
19
Poly (1-Butene Sulphone)
• Very sensitive, but poor dry etch resistance!
+
• Again, favorable decomposition route. Note release of neutral species.
R-SO2-R [RSO2R]+ RSO2+ + R R+ + SO2
20
Overcoming poor etch resistance…
• Use poly(2-methylpentene sulfone) as a sensitizer with Novolac resin:
• Bowdon M. J., et al, J. Electrochem. Soc. 1981, 128, 1304
• Variation: Ito, H., et al, J. Electrochem. Soc. 1988, 135(6), 1504
21
• Silicon-containing resistsOvercoming poor etch resistance…
Fox12™ (hydrogen silsesquioxane) PDMS-PVMS
• Crosslink upon e-beam exposure• Very low sensitivities, but high resolution (~20 nm)
22
Epoxy Resists• Negative tone rendered insoluble by radiation induced ring opening and
X-Linking, classic example: COP (Bell Labs)
Thompson, L.F. et al, Polym. Eng. Sci, 1974, (14) 7, 529
23
Epoxy Resists – Molecular glass
• Calix[4]arene derivative, negative-tone by epoxy ring opening
Ruderisch, A.; Sailer, H.; Schurig, V.; Kern, D. P., Microelectron. Eng. 2003, (67-68) 292.
• Other Derivatives:
24
Olefin-co-CO Copolymers
+Propylene-CO
Ethylene-CO
• Propylene-CO much more sensitive: Decomposition more favorable
S.G. Bond et al, Polymer, 1994, 35, 451
25
Photosensitive polyimidesiloxane
Jeng, S.; Xu, M.; Liu, P. L.; Kwok, H. S.; Lee, C. J. MRS Symposium Proceedings 1990, (167), 111.
• Crosslinks upon UV exposure, dose of 100mJ/cm2
26
Key Concepts
• To Improve Sensitivity:
(1) Build in bonds capable of cleavage (2) Ensure stability of intermediates(3) Release of neutral species, i.e. SO2
CNF NanoCourses
CORNELL NANOSCALE FACILTY • CORNELL NANOSCALE FACILITY • CORNELL NANOSCALE FACILITY • CORNELL NANOSCALE FACILITY
E-Beam Resists and Processing
Positive resists PMMA Toray EBR-9 PBS ZEP Photoresists as e-beam resists
Negative resists COP Shipley SAL NEB-31
Multilayer systems Low/high molecular weight PMMA PMMA/copolymer Trilayer systems
CNF NanoCourses
CORNELL NANOSCALE FACILTY • CORNELL NANOSCALE FACILITY • CORNELL NANOSCALE FACILITY • CORNELL NANOSCALE FACILITY
Poly(methyl methacrylate) (PMMA)
The most popular e-beam resist Extremely high-resolution Easy handling Excellent film characteristics Wide process latitude Usually dissolved in a solvent (e.g. anisole) Exposure causes scission of the polymer chains Solvent developer dissolves exposed (lighter molecular weight)
resist
CNF NanoCourses
CORNELL NANOSCALE FACILTY • CORNELL NANOSCALE FACILITY • CORNELL NANOSCALE FACILITY • CORNELL NANOSCALE FACILITY
PMMA Characteristics
Positive acting Several viscosities available, allowing a wide range of resist
thickness Not sensitive to white light Developer mixtures can be adjusted to control contrast and
profile Appropriate processing results in undercut profile for liftoff Poor dry etch resistance No shelf life or film life issues
CNF NanoCourses
CORNELL NANOSCALE FACILTY • CORNELL NANOSCALE FACILITY • CORNELL NANOSCALE FACILITY • CORNELL NANOSCALE FACILITY
Spin-Speed Characteristics for PMMA,
Thicker films
CNF NanoCourses
CORNELL NANOSCALE FACILTY • CORNELL NANOSCALE FACILITY • CORNELL NANOSCALE FACILITY • CORNELL NANOSCALE FACILITY
P(MMA-MAA) Copolymer Resist
Higher sensitivity than PMMA Can be exposed at a lower dose Faster Less contrast.
Most useful in Bi-level resists with PMMA, to produce undercut profiles useful in liftoff processing
Characteristics Positive acting Several viscosities available, allowing a wide range of resist thickness Not sensitive to white light Developer mixtures can be adjusted to control contrast and profile Poor dry etch resistance No shelf life or film life issues
32
UV Lithography
• Only optical lithography can provide the information output needed for high volume production
• Industry loves this and will keep pushing it as long as it can go
33
Azo resists
34
Azo Absorbance
35
Azo Patterning
UV Stepper Tool (248/193 nm)
• Canon FPA-5500iZ step-and-repeat i-line stepper for 300 mm is a mix-and-match companion for the company's 300 mm scanners, the FPA-5000ES3 (KrF) and the FPA-5000AS2 (ArF). The tool can be easily converted to or from 200 mm wafer size and can be used for patterning less-critical IC layers. The unit includes the same third-generation platform as the company's 300 mm scanners.
DNQ Resists
Introduction to Microlithography, 2nd Ed., L. Thompson, C.G. Willons, M. J. Bowden, eds., ACS Books, Washington, 1994.
Interactions of Photoactive Molecule with Matrix
10
100
1000
10,000
R0
Rp
hν
Dissolution Rate(≈/s)
+
+
DNQ / Novolak Photoresists
*Courtesy George Barclay (Shipley)
OH
Limited Light Sources
R = k1λ/NA
Changing Wavelengths
248 nm
248 nm365 nm
193 nm
157 nm
EUV (13 nm)
X-ray
Resists with Chemical Amplification
Resist Components• Polymer• Solvent• Photoacid Generator (PAG)• Additives (e.g. DI,plasticizer)
Positive Chemically Amplified Photoresist Chemistry
0.12µm
0.40µm
PAG
hv H+
*Courtesy George Barclay (Shipley)
Photoacid Generator (PAG) Classes
Non-Ionic PAGsHalogenated Compounds:
Sulfonate Esters/Sulfones:
Ionic PAGsOnium Salts:
*Courtesy George Barclay (Shipley)
Positive Photoresist Technology
Differential in Aqueous Base Solubility - Deprotection Chemistry
Dis
solu
tion
Rat
e
40 A/sec
30,000 A/sec
+ H+
*Courtesy George Barclay (Shipley)
130 °C
Development Trends in MicrolithographyArchitectures
*Courtesy George Barclay (Shipley)
45
Photoresists for ArF (193 nm) Lithography
• The current state-of-the-art in the microelectronics industry.
• Capable of producing features as small as 65 nm.
Nikon Precision, Inc.
46
Resist Transparency at 193 nm
• Aromatic groups are highly absorbing at 193 nm wavelength– Phenolic groups used for 248 nm lithography cannot
be used here• Methacrylate groups are transparent
– Low plasma etch resistance• Alicyclic groups are transparent
– Plasma etch resistance similar to aromatics
Kunz RR, Allen RD, Hinsberg WD, Wallraff GM.. Proc. SPIE 1993; 1925: 167-175. Takechi S, Kaimoto Y, Nozaki K, Abe N. J. Photopolym. Sci. Technol. 1992; 5: 439-445
47
First 193 nm Photoresist
• Excellent transparency• Excellent solubility• Poor etch resistance
Poly(t-butyl methacrylate - methacrylic acid)
Kunz RR, Allen RD, Hinsberg WD, Wallraff GM.. Proc. SPIE 1993; 1925: 167-175.
48
Alicyclic Structures Improve Etch Resistance
• Norbornene group adds etch resistance• Maleic anhydride group adds solubility• Carboxylic acid leads to film swelling during
development
Cycloolefin-maleic anhydride (COMA) resist
Allen RD, Wallraff GM, DiPietro RA, Kunz RR. J. Photopolym. Sci. Technol. 1994; 7: 507-516.Allen RD, et al. J. Photopolym. Sci. Technol. 1995; 8: 623-636.
49
Swelling?
• Prior to dissolution, exposed film swells as the aqueous developer enters– Large dissolution/swelling front
• Ultimate resolution is mechanically hampered due to swelling
• Swelling can be controlled by adjusting compositions
Varanasi PR, et al. Proc. SPIE 2005; 5753 , 131.
50
Hexafluoroisopropanol Groups
• Similar pKa to that of phenolic groups– Good dissolution
• Fluorinated groups have high transparency at 193 nm.• Less prone to cause swelling compared to carboxylic
acid.
Ito H, Seehof N, Sato R, Nakayama T, Ueda M. Synthesis and evaluation of alicyclic backbone polymers for 193 nm lithography. in ACS Symp Series 706, Micro- and nano-patterining polymers Ito H, Reichmanis E, Nalamasu O, Ueno T. ed. American Chemical Society, 1998; chap 16, 208-223.
51
Current examples
• Adamantyl groups further add etch resistance• Lactone groups increase solubility• Long aliphatic chains further reduce swelling
Varanasi PR, et al. Proc. SPIE 2005; 5753 , 131.
52
Silsesquioxanes
• Transparent at 193 nm• Silicon drastically increase etch resistance• Standard resist chemistries added for solubility
Ito, H, et al. Proc. SPIE 2005; 5753 , 109.
R=
53
Increasing NA: Immersion ArF Lithography
• Placing a fluid with a higher refractive index than air (n=1) increases depth of focus and ultimate resolution– Water: n=1.45 @ 193 nm
ASML. Brewer Science ARC Symposium, Albany, Oct 28, 2004
54
Immersion Lithography
• Issues:– Film swelling due to water– Water must be ultra-pure,
free of bubbles– Leaching of resist
components into water must be controlled
55
Immersion Lithography
• Solutions:– Transparent topcoat over resist to reduce
interaction between resist and water– Engineer resist platforms to increase
hydrophobicity– Use PAGs and additives that do not strongly
segregate to the surface.
Houlihan, F, et al. Proc. SPIE 2005; 5753 , 78.
248 to 193 to 157 Dilemma
248 nm Resists– Aromatic, phenolic structures– Acids as base soluble groups
193 nm Resists– No aromatics - cycloaliphatic structures for etch resistance
157 nm Resists– No aromatics, no acids– Fluoropolymers and activated alcohols for base solubility
57
Absorbance of Polymers at 157 nm
Kunz, R.R; Bloomstein, T. M; ,Hardy, D. E; Goodman, R. B; Downs, D.K; Curtin, J.E, Proc SPIE 3678:13 (1999)
“Fluoropolymers and Polysilsesquioxanes”
Challenges for NGL Resists for 157 nm Imaging
Requirements Targets Strategies
Transparency A < 2 µm–1 Hydrofluorocarbon>30% fluorination
Acidic group forbase solubility
Etch resistance
Imaging group
pKa ~ 10 Fluorocarbinols
Comparable toNovolac system
Alicyclicstructures
Cleavable by PAG* Alkoxy alkyl ethers
*PAG: Photochemical acid generator
59
Structural Elements for CA 157 nm Resist Design
Back Bone (Transparency)
Etch Resistance
Developer Selectivity
Protecting Group
Hydorofluorocarbon
Alicylic with Electron
attracting group
Fluoro Carbinol
Alkoxy ethers
Patterson, Kyle; Somervell, Mark; Willson, C. Grant. The challenges in materials design for 157nm photoresists, Solid State Technology (2000), 43(3), 41
Design
Sub Elements Example
60
157 nm Resist Based on CO/NBHFA Vinyl Addition Polymer
VUV Spectra of NBHFA Polymers
70/30 blend of vinyl addition
copolymer with CO Polymeric DI
VUV Spectra of CO Polymers
CO norbornene terpolymer
performance
Reduced OD
Higher contrast with Dissolution Inhibitor
First Commercial Resist [PNBHFA with 20 mol % t-BOC + CO DI – Clariant]
Absorption reduced by acetal Protecting and geminal CF3 group
Hung, R.J;Tran, H.V;Trinque, B.C; Chiba, T;Yamada, S; Sanders, D.P; Connor, E. F; Grubbs, R.H; Klopp, J; Fréchet, J.M.J; Thomas, B.H; Shafer, G.J; DesMarteau, D.D; Conley, W; Willson, C.G Proc SPIE, 4345, 385 (2001)
Trinque, B. C; Osborn, B. P; Chambers, C.R; Hsieh, Y-T; Corry, S; Chiba, T; Hung, R. J; Tran, H,V; Zimmerman, P; Miller, D; Conley, W; Willson C G Proc SPIE 4690, 58 (2002)
61
Tetrafluoroethylene (TFE) based 157 nm Resist
VUV absorbance of spectra of fluoropolymer with TFE in the background with those without TFE
Cross-section SEMs of the 100 nm lines of a resist containing TFE as a co monomer. Resist thickness was 157 nm, A = 2.3 µm-1and the OD = 0.36
Crawford, M. K; Feiring, A. E; Feldman, J; French, R.H; Periyasamy, M; Schadt, F.L III;, Smalley, R.J; Zumsteg, F.C; Kunz, R.R; Rao, V; Liao, L; Holl, S. M Proc SPIE 4345, 428,2001
Lower absorptionLower hydrophilicityLower dry etch resistantSpecial Condition for polymerization
62
All Acrylate and Acrylate/NBHFA Copolymers for 157 nm
Poly(methyl 2-trifluoromethylacrylate) [PMTFMA] an e-beam resistPMTFMA Absorption at 157 nm 3.1/µmReplacement of CH3 to CF3 Reduces the OD to three to four timesFacile copolymerization with NBHFACopolymer of acrylate/NBHFA reduces the absorption of polymer to OD of 2.6 -2.7/µmLiphophilic and insoluble in TMAH – Maximum NBHFA is 40 mol %Blending of NBHFA increases the hydrophilicity and reduces the OD to 2.0/µm
Matsuzawa, N; N; Mori ,S;Yano, E; Okazaki, S; Ishitani, A; Dixon, D. A Proc SPIE 3999, 375, 2000Ito, H;Truong, H.D; Okazaki, M; Miller, D.C; Fender, N; Breyta, G; Brock, P.J; Wallraff, G.M; Larson, C.E; Allen, R.D Proc
SPIE 4690,18, 2002
VUV-VASE Spectra
140 160 180 200 220 240 260 280 300
0.0
0.5
1.0
1.5
2.0
2.5
3.0A
bsor
banc
e, µ
m-1
Wavelength, nm
2.03 µm–1
@ 157 nm
– After exposure, the resist was soluble in 0.262 N TMAH Y. C. Bae*, K. Douki, T. Yu, J. Dai, D. Schmaljohann, H. Koerner, C. K. Ober*, W. Conley, “Tailoring Transparency of Imageable Fluoropolymers at 157 nm by Incorporation of Hexafluoroisopropyl Alcohol to Photoresist Backbones”, Chem Mater., (2002), 14(3), 1306-1313.
157 nm Resist Performance
0
0.2
0.4
0.6
0.8
1
1 10 100Dose(mJ/cm2)
Thi
ckne
ss
THPMA=40mol%
THPMA=30mol%
THPMA=20mol%
Version 4
– Clearing dose: ~16 mJ/cm2
– Better contrast with more THPMA– Higher dose with more THPMA: requires more PAG
PAB: 115 oC/ 90 sec; PEB: 90 oC / 90 secPAG: 1 wt% TPSNf; 0.26 N TMAH for 60 sec
A: 2.4 µm-1
A: 1.6 µm-1
<ISSUE> • Top rounding (too absorbing @ 157 nm)
<ISSUE>• obtained mostly homopolymer of methacrylate
• Only latent image @ 248nm• Low Tg• Poor dissolution contrast
<ISSUES>
157nm Resist Strategies
Vohra, V.; Douki, K.; Kwark, Y.; Liu, X.; CKO; Bae, Y. C.; Conley, W.; Miller, D.; Zimmerman, P. Highly transparent resist platforms for 157-nm microlithography: an update. Proceedings of SPIE-The International Society for Optical Engineering (2002), 4690 84-93.
66
157 nm Lithography
130 nm 1:5 L/S
80 nm L/S
R ~ 5 nmEUV
A=2.5µm-1
Y. C. Bae, C. K. Ober et al.“Tailoring Transparency of Imageable Fluoropolymers at 157 nm by Incorporation of Hexafluoroisopropyl Alcohol to Photoresist Backbones”, Chem Mater., (2002), 14(3), 1306-1313.
hν
PAG
A Matter of Scale
Carbon Nanotube
Photoresist (150 nm)
Intel 4004 Patterned atoms
HumanHair
Red blood cells
Dimensions (nm)
Virus
NGL Lithography
• Extreme UV (EUV)– 13 nm radiation
• Ion projection lithography (IPL)– Less likely than a couple years ago
• SCALPEL– Projection e-beam/high res. E-beam resists
• X-ray– Same issues as EUV/need synchrotron
• Step and Flash – Limited production/lower fidelity
69
0
500,000
1,000,000
1,500,000
2,000,000
2,500,000
3,000,000
3,500,000
4,000,000
Absorbance at 13.5 nm
• Resist absorption at 13.5 nm depends only on chemical composition and density of the material
Pho
toab
sorp
tion
cros
s-se
ctio
n (c
m2/
mol
)
EUV Lithography
• Challenges for this new technology include:
• Manufacturing of optics including multi-layer coatings with atomic precision
• Developing powerful sources• Manufacturing of defect-free reflection masks• Controlling contamination (molecular and particulate)• Cost of ownership
EUV Stepper
Eric J. Lerner, “Next-Generation Lithography”, The Industrial Physicist 18 June 1999
72
Requirements for EUV Resists
Year 2009
Resolution – Gate (nm) 15
Resolution – ½ pitch (nm) 45
LWR - 3σ (nm) 1.5
Sensitivity (mJ/cm2) 2-5
Absorbance (µm-1) Low
Depth of Focus (µm) > 0.2
Outgassing No outgassing
Collapse No collapse
Intel targets for insertion of EUV tools into manufacturing in 2009
Cao, Heidi, et al., Proceeding of SPIE 2003, 5039, 484.
73
Resists For EUV Lithography
• Challenges: resists need to have:
High Sensitivity (Weak sources) High resolution (for small feature sizes) Low LER Minimal outgassing (damages optics)
• Most conventional resists are patternable at EUV wavelengths, But…
None so far meet all of these requirements
74
Is Absorbance Important in EUVL?
Reducing absorbance increases resolution and wall angle.
18
20
22
24
26
28
30
32
1 2 3 4 5Absorbance ( µm-1)
CD
(nm
)80
81
82
83
84
85
86
87
88
89
90
Ang
le (°
)Smaller absorbance1 5 (µm-1)
Distance (µm)
Res
ist H
eigh
t (µ
m)
Beta tool (NA=0.25, sigma=0.5) Resist thk = 60 nm, Dose = 2.95 mJ/cm2
0.231 0.238 0.245 0.253 0.260 0.268
0.000
0.012
0.024
0.036
0.048
0.060
Cao, Heidi, et al., Proceeding of SPIE 2003, 5039, 484.
75
Novel systems…
• Mass persistent protecting group to minimize outgassing
• EUV lithography pattern profiles of positive resist poly(HOST-co-MBAMA): (a) 100 nm line and space (1:1) elbow pattern; (b)–(e) 100–50 nm line (pitch 180 nm) pattern.
• Gonsalves K, et al, Microelectronic engineering 2005 77, 27-35
76
Experimental Data for λEUV
βxλ
π=µ
β+δ=
θ−+θ
θ−−θ=
4 )( Absorbance
- 1 index Refractive
Rs
in
nn
2
22
22
cossincossin
0
1
2
3
4
5
6
0 2 4 6µexperimental
µ cal
cula
ted
Grazing Angle Incidence
PMMA
Ref
lect
ance
Angle (deg)%The measured absorbance values match well with the calculated ones.
Si wafer coated with polymer
detectorsource
θ θ
l
Difference (D) = (µcalc-µexp)/µcalc × 100 (%)* Density not determined.
77
Effect of Si and O Components
calculation experiment
78
Design Strategy
Transparency Polarity Acid sensitivity
Styrene-Based Positive Tone EUV Resists
79
5% TPS triflate115°C, 60s PAB115°C, 60s PEB60s development in 0.263N TMAH w/surfactant
P-A
50 nm L/S 32.5 nm L/S
EUV Exposure Results
Structures for Single Layer Silicon-containing EUV
Resists
Negative-tone
N-A
N-B
Positive-tone
P-B
P-A
P-A
Positive-tone EUV Resists -- Exposure Results
5% TPS triflate115°C, 60s PAB115°C, 60s PEB60s development in 0.263N TMAH w/surfactant
T= 0.652, 125nm
34 nm 56 nm
Dai, Junyan; Ober, Christopher K.; Kim, Sang-Ouk; Nealey, Paul F.; Golovkina, Victoria; Shin, Jangho; Wang, Lin; Cerrina, Franco. Synthesis and evaluation of novel organoelement resists for EUV lithography. Proceedings of SPIE (2003), 5039 1164-1172.
82
Silicon Etch Resistance
0
0.167
0.333
0.500
0.667
0.833
1.000
APEX P-A P-B
O2 etchingCF4 etchingCHF3/O2 etching
P-A P-B
Rel
ativ
e E
tch
Rat
e
83
248 nm and EUV Exposure
Pitch = 150 nm
A10 = 1.53 µm-1 A10 = 1.42 µm-110 : 27 : 63 30 : 20 : 50
Pitch = 100 nm
• High resolution and good transparency, but LER issues
84
Silicon in the Main Chain
Polysilanes
Polysiloxanes - polysilsesquioxanes
Polysilazanes - polysilsesquiazanes
Polycarbosilanes
Multiple bonds on Si center may minimize outgassing problem.
85
Modified Polysilanes
8 : 2A10 = 1.10 µm-1 A10 = 1.2 µm-1
Much better resist performance
86
Outgassing at 13.4 nm
87
Molecular Size
• Molecular glasses can possess substantially smaller size
• Many of same features as polymer• More uniform distribution of resist
additives
Poly(hydroxy styrene), DPn = 50
Molecular glass resist components
88
E-beam Molecular Glass Resists
• High dosage (12 ~ 14 mC/cm2 @ 50kV)
Positive-tone resists:
Negative-tone resists:
Kadota, T.; Yoshiiwa, M.; Kageyama, H.; Wakaya, F.; Gamo, K.; Shirota, Y. Proceedings of SPIE 2002, 4345, 891-899
89
Calixarene Based Molecular Glass Resists
• Micron size patterns obtained with DUV exposures
Positive-tone resists:
OH
ORO
R
O R
OR
OR O
R
OR
OR
HO
HO
HO
OH
OH
OH
OH
RO
ROH3C
RO OR
CH3
OR
ORCH3
ORRO
H3C
OCOCH3
CH3
OCOCH3OCOCH3
OCOCH3
CH3
OCOCH3
CH3CH3
H3COCO
CH3CH3
Calix[8]-arene, R=Ac, TsC4-R, R=H, t-BOC
Hexaacetate p-methylCalix[6]-areneCalix[4]-resorcinarene
HO
HOH3C
HO OH
CH3
OH
OHCH3
OHHO
H3C
Negative-tone resists:
• 7 nm pattern obtained by Ebeam• Low sensitivity (mC/cm2)
Haba, O.,M. Ueda et al. Chem. Mater.1999, 11, 427-432
Nakayama, T.; Ueda M. J. Mater. Chem.1999. 9(3), 697-702
Kwon, Y., M. Ueda et al. J. Mater. Chem. 2002. 12, 53-57
Fujita, J. et al. Appl. Phys. Lett. 1996, 68(9), 1297-1299
90
pg
CoreAcid Acid
Ac
id A
cid
PG PG
PG
PG
%High glass transition temperature
%High etch resistance
%Solubility switch%High glass transition
temperature%High etch resistance
%Acidity%H-bonding with resist
components%Solubility, adhesion
Protecting group
Design of Molecular Glass Resists
91
Molecular Glass Design
High Tg• Rigid molecular structure
• Strong attractive forces• H-bonding
Amorphous• Low tendency toward
crystallization
• Asymmetric structure Etch resistance
High C/H ratio
EUV Less oxygen
78% tBoc, Tg: 67 °C
66% tBoc, Tg: 58 °C
74% tBoc, Tg: 25 °C
75% tBoc, Tg: 52 °C
No Tg observed before decomposition
92
Positive-tone Molecular Glass Resist - 248 nm Images
4.2 mJ/cm2 (250nm L/S)28.6 mJ/cm2 (250nm L/S)
65 mJ/cm2 (350nm L/S) 30 mJ/cm2 (350nm L/S)
93
Negative-tone Molecular Glass Resist
TMMGU Crosslinker
Glasses
Photoacid Generator
94
Negative-tone Molecular Glass Resist - Chemistry
Insoluble cross-linked oligomerSoluble monomer
unexposed exposed
expose
95
Negative-tone Molecular Glass Resist - 248 nm Images
3.6mJ/cm2 3.6mJ/cm2
55.7 mJ/cm2 19.3 mJ/cm2
96
E-beam Molecular Glass Resist
15 wt% TMMGU5 wt% TPS NonaflatePAB: 115ºC, 60sPEB: 115ºC, 60sDevelopment: 0.026N TMAH, 10s
60µC/cm2 @100kV
Dose range 60 – 240 µC/cm2 @100kV60 nm pattern image at 180µC/cm2 @100kV
97
Line Width Roughness - Preliminary Results
3sigma = 6.14 nm 4.35 nm/pixel
3sigma = 5.12 nm4.08 nm/pixel
100nm dense lines
100nm isolated line
Calculation program courtesy Professor Francesco Cerrina research group at University of Wisconsin-Madison
98
0
0.5
1.0
1.5
2.0
2.5
3.0
PHS
MG4 tBOC
MG4 THP
SPIRO N
eg
MG4 Neg
MG10 N
eg
Yu, T.; Ching, P.; Ober, C. K. Proceedings of SPIE 2001, 4345, 945-948
Nitride Etch Resistance
99
Positive-tone Molecular Glass Resist – EUV Images
10.0mJ/cm2 Bright Field
5 wt% TPS Nonaflate0.14 wt% TOAPAB: 115ºC, 60sPEB: 115ºC, 60sDevelopment: 0.026N TMAH, 30s
Images obtained at Lawrence Berkeley National Laboratories by EUV microexposure tool
40 nm is < 1/1000th the size of a human hair
100
Summary• The ability to make nm-scale patterned
structures continues to advance• Shorter wavelength optical lithography now
rivals the best e-beam imaging• Alternative methods are on the horizon (e.g.
step-and-flash, self-assembly)• Eventually these methods will be routine and
impact all areas of science and technology
Patterned Surfaces
101
Dry Film Photoresists
• polyester support sheet for the photosensitive material
• layer of photoactive monomer mixed with polymeric binder and other materials
• polyolefin cover sheet withich prevents photoresist from sticking or “blocking” when it is wound on a roll
• exposures can take several minutes
Dry Film Initiator Structure
102
N
N
N
N
Cl Cl
N
N
Cl
light
2
Ia
Ia +H3CH2C N
R
R
N
N
Cl
+ H3CHC N
R
R
II IIa
Dry Film Dye Formation
103
Ia + CH NR
R
NR
R
N
R
R
III
C NR
R
NR
R
NR
R
- electronC N
R
R
NR
R
NR
R
Pattern Formation
104
IIa + CH2C
CH2
H2C
H2CO O
O
CH3
OO
O
Polymer Network
IIa + IV +
IV
*HC
H2C
HC
HC *
OO
OH OH
V
nPolymerized matrix
Circuitization
105
106
System Supplier
Cleaning/Wet Process Kraemer KoatingWet Stripper/Developer Hollmuller Siegmund
Large High Vacuum Coater* CHAIn-line Defect Inspection* ECDPrecision Lithography* AzoresPrecision Wet Coat & Bake Frontier IndustrialOLED Evaporation Source* KJL
Small High Vacuum Coater* TBDManual Inspection Table TBD
Defined Systems
*USDC supported
107
Scrub/Rinse
Poly Tank
SSTank
RewindUnwind
Air KnifePoly Tank
• Kraemer Koating, 2001
• 6” to 14” width
• Designed for cleaning and/or wet processing
• Recirculation w/cascading possible
• 0.2 to 10 FPM
• 0.5 PLI to 1.6 PLI
Cleaning/Wet Processing: Capability
108
• Hollmuller Siegmund (MacDermid) 1993
• Up to 15” width
• Designed for Develop & Strip
• Heated tanks (three process and two rinse)
• Stripper: Stainless Steel (DuPont Riston II S-1100X)
• Developer: Polypropylene (DuPont Riston II D-2000)
• Air Knife
• Currently rebuilding web handling
Wet Stripper/Developer: Capability
109
AzoresCorp, 2006
• Based on proven FPD stepper
• 8” width, can handle up to 24” with new chucks
• g-line (436 nm)
• 4 µm L/S
• 230 to 760 mm/min
• 400 ppm distortion compensation
• Requires hole-punch pattern for pre- alignment:
Precision Lithography: Capability
Web handlers in test
110
Other Printing Methods
A
C
E
B
Transducer Ink reservoir
SubstrateNozzle
F
Silicone pad
SubstrateCliche InkD
Inkjet Methods
111
Thermal Inkjet Printing Piezoelectric Inkjet Printing
112
Ink Jet Printing
500 nm
Ink dropletSurface
energypattern
AB
C
113
Drop Spreading
100 µmsource
drain
gate
channel
A
B
C
114
Wetting Control
50 µm
PEDOT/surfactant
PEDOT
PEDOT
Surfactant molecules
A
B
C
115
Ink Jet Circuits
B
C
B
A
116
Printed Designs
117
Soft Lithography
• Umbrella term for ‘unconventional lithography’• Includes molding, embossing and printing.• Recent reviews:
Gates, B.D. et al, Chem. Rev. 2005, 105, 1171
Gates, B.D. et al, Annu. Rev. Mater. Res. 2004, 34, 339
Resnick, D. J. et al, Materials Today, 2005, 8, 34
• Included in ITRS roadmap (2010)
Comparison of Imprint Lithographies
Christie R. K. Marrian and Donald M. Tennant, “Nanofabrication”, J. Vac. Sci. Technol. A 21(5) S207 2003
Step and Flash Process
T. Bailey, B. J. Choi, M. Colburn, M. Meissl, S. Shaya, J. G. Ekerdt, S. V. Sreenivasan, and C. G. Willson, “Step and flash imprint lithography: Template surface treatment and defect analysis”, J. Vac. Sci. Technol. B 3572 18 2000
Sub-100 nm Features
121
Soft Stamp (i.e. PDMS)
Microcontact Printing (µCP)
• Uses a soft stamp to apply ‘ink’ to a substrate
Soft Stamp (i.e. PDMS)
Substrate, typically a metal Transfer ‘Ink’
Wet with ‘Ink’ i.e. thiol.
Press Stamp
Etch • Ink binds by Chemisorption of Physisorbtion
• Forms self assembled monolayer (SAM) at point of contact with substrate
122
Fabrication of Stamps for Soft Lithography
Hard Substrate
Photoresist
Expose + Develop
Etch
Elastomeric pre-polymer
Elastomeric polymer
Cure/HeatPeel off
• Hard substrates include quartz, SiO2, Cr. • Soft stamps made from PDMS, PFPE
Use as Hard Mold or…. Use to make soft stamp
123
Pros and Cons of µCP
• Can generate large patterns of SAM’s (>cm2) across curved surfaces.
(Delamarche, E. et al. Langmuir 2003, 19, 8749)
• Good for fictionalization of surfaces for different applications, i.e. biomaterials
(Brock, A. et al, Langmuir 2003, 19, 1611)
• Resolution depends on binding of ink to substrate. Can’t be considered a universal method.
124
Nanoimprint lithography (NIL)
• Uses rigid mold (i.e. silicon)
Ridged Mold
Polymer Film
Substrate
Ridged Mold
Substrate
Heat > Tg and Imprint
Ridged Mold Ridged Mold
Substrate
Cool < Tg
Release Mold
Etch, etc.
• High Temp., High Pressure• High viscosity medium• Can be difficult to fill all voids in the mold and obtain uniform patterns
125
Applications of NIL
• Extension of process used to make DVD’s, holograms etc.
SEM images of structures patterned by nanoimprint: (a) 10-nm diameter metal dots with a periodicity of 40 nm, and (b) Fresnel zone plates with a 125-nm minimum line width. (c) SEM
image of features patterned by SAMIM. Gates, B.D. et al, Annu. Rev. Mater. Res. 2004, 34, 339.
126
• Density of patterning layer…
Easiest… Easy… Very Difficult!
“Base layer”
Solution? Use a low viscosity patterning layer
(Slide Courtesy of G. Willson)
Problems with NIL
127
Step-and-flash Imprint Lithography (SFIL)
Dispense
template etch barrier
transfer layer
Expose
Separate
release treatment
Imprint
Breakthrough Etch
Transfer Etch
Residual layer
• Etch barrier: UV Curable monomer (low viscosity)
• Avoids density problems with NIL
(Slide Courtesy of G. Willson)
UV Cure
Halogen RI Etch
O2 RI Etch
128
Composition of the Etch Barrier
O2 Etch Resistance
X-Linker (Lowers Viscosity)
UV Free-Radical Initiator
129
• Resolution theoretically limited by template
• Pattern fidelity not so good for small feature sizes-still some interaction between template and etch barrier
(Slide Courtesy of G. Willson)
30 nm 20 nm 20 nm
Resolution of SFIL
130
Step-and-Flash Imprint Lithography (SFIL)
• Low cost, potential for step-and-repeat process
• Formation of multilayer structures possible
SEM images showing cross sections of multi-tiered structures on a template fabricated with alternating layers of ITO and PECVD oxide.
Johnson et al., Microelectron. Eng. 67-68 (2003), 67, 221
131
Soft Lithography: Summary
• Low cost compared to Photolithography
• Potential for Step-and-repeat processes
• SFIL looks most promising technique
• Pattern fidelity issues must be overcome!
Materials Chemistry Solution?