Electrochemical Oxidation for Water Treatment and the Limitation of Hazardous Byproducts

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Electrochemical Oxidation for Water Treatment and the Limitation of Hazardous Byproducts. AWRA Meeting Philadelphia, PA March 21, 2013 Adrienne Donaghue Brian P. Chaplin Villanova University Department of Civil & Environmental Engineering . Introduction. - PowerPoint PPT Presentation

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AWRA MeetingPhiladelphia, PAMarch 21, 2013

Adrienne DonaghueBrian P. ChaplinVillanova University

Department of Civil & Environmental Engineering

Electrochemical Oxidation for Water Treatment and the

Limitation of Hazardous Byproducts

Introduction

Electrochemical oxidation has become promising for treatment of recalcitrant and biorefractory waste streams

Advantages:• Easy installation and operation

• Cost effective

• Environmentally friendly

2

Oxineo ®

Environmental Applications

Electrochemical Oxidation Pilot plant for landfill leachate in Cantabria, Spain.

3

Electrochemical Reactions

Power Supply+ _

Anode Cathode

e-

OHH 0.5eOH 22H2O OH + H+ + e-

OH

OH

OH

OH

OH

OH

OH

4

Electrochemical OxidationDestruction of pollutants occurs through 2 mechanisms:

1. Direct electron transfer (DET)2. Indirect oxidation via hydroxyl radicals (OH●)

* Electrochemical material plays important role in the effectiveness of oxidation!

5

Indirect electrochemical oxidation

Anode Adsorbed •OH

current

•OH

Free •OH

R

ROR or RO

CO₂ + H₂O

Oxygen Evolution

Direct electrochemical oxidation

e-

Zhu et. al, 2008.

Boron Doped Diamond Electrode

• Boron-doped diamond (BDD) film grown on p-silicon substrate using CVD (Advanced Diamond Technologies).

• Boron doping @ ppm levels provides electrical conductivity.• Inert surface and low adsorption properties• Remarkable corrosion satiability• Produces large amount of OH●

(weakly adsorbed)

• Emerging AOP technology.• Can oxidize perfluorinated

compounds

Note! These compounds can not be degraded by

other AOP technologies 6

Farrell et al. (2008)

Perfluorooctane Sulfunate (PFOS)

(C₈F₁₇SO₃⁻)

7

By-product/Perchlorate (ClO4-) Formation

• Is a multi-step process• Hazardous to human health• EPA set an advisory limit of 15 ppb for drinking

water sources• CA and MA drinking water limits of 2 and 6 ppb

Cl- OCl- ClO₂- ClO₃- ClO₄-

8

Rate-limiting step

9

By-product/ClO4- Formation Cont.

Azizi et. al, 2011

2 step process:

Cl- OCl- ClO₂- ClO₃- ClO₄-

Rate-limiting step

Reaction Zone

Anod

e

ClO₃⁻

OH●

e-

ClO3●

ClO4-

1.

2.

Research Objectives

• Understand how the reactivity of certain organics effect perchlorate formation at the anode surface

• Use “model” p-substituted phenols to determine the importance of each step in the two step process of perchlorate formation.

• Model organic behavior with in the diffuse and reaction zones to understand mechanisms of inhibition of ClO4

- at the anode surface

10

1)

2)

Experimental Setup

11

Batch ReactorRotating Disk Electrode (RDE)

Organic compounds

p-nitrophenol (p-NP)

p-methoxyphenol (p-MP)

p-benzoquinone (p-BQ)

Oxalic acid (OA)

Solutions were tested at: Kinetically Control: 1.0 mA/cm² Mass-transfer Control: 2.4 mA/cm²,

10.0 mA/cm²

12

Results: ClO₄⁻ Formation

OH• Rate Constant* Log Kow

(L mol⁻¹ s⁻¹)

p-nitrophenol (p-NP) 3.8x10⁹ 1.91

p-benzoquinone (p-BQ) 6.6x10⁹ 0.2

p-methoxyphenol (p-MP) 2.6x10¹⁰ 1.34

oxalic acid (OA) 1.4x10⁶ -0.81

p-NP p-BQ p-MP OA0

20

40

60

80

100

12099.6 96.1 93.3

5.3

93.6 92.1

53.5

0.0

29.27

85.04

12.96

0.00

1.0 mA cm⁻² 2.4 mA cm⁻² 10 mA cm⁻²

Inhi

bitio

n of

ClO

₄⁻ F

orm

ation

(%)

* Buxton et al. 1988

Initial Organic Concentration = 250 μM

13

Results: Organic Reactivity

C

x/L

Anode Diffuse Layer

COMSOL ®

Anod

e Su

rface

OH●

ClO₃●

RB

Diffusion ZoneReaction Zone

0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1-2.0E-03

5.2E-18

2.0E-03

4.0E-03

6.0E-03

8.0E-03

1.0E-02 High Current Density

p-NP p-BQp-pmeth

x/μm

Conc

entr

ation

(mol

/m³)

0 0.2 0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 20

0.05

0.1

0.15

0.2

0.25Low Current Density

p-NP p-BQ p-pmeth

x/μm

Conc

entr

ation

(mol

/m³)

2 μm 5 μm

Results: ClO₄⁻ Formation

14

p-NP p-BQ p-MP OA0

20

40

60

80

100

12099.6 96.1 93.3

5.3

93.6 92.1

53.5

0.0

29.3

85.0

13.0

0.0

Experimental1.0 mA cm⁻²2.4 mA cm⁻²10 mA cm⁻²

Inhi

bitio

n of

ClO

₄⁻ F

or-

mati

on (%

)

p-NP p-BQ p-MP OA0

20

40

60

80

100

120

95 97 99

1

85 8696

16 5 5 1

Model1.0 mA cm⁻²

2.4 mA cm⁻²

10 mA cm⁻²

Inhi

bitio

n of

ClO

₄⁻

Form

ation

(%)

Conclusions:

15

Limiting ClO₄- formation• Rate limiting step is a

two step process• Reactions occur right at

surface• Organic reactivity is

importantFor Low Current Densities:

Scavenging occurs on surface

For High Current Density:Location becomes important

Anod

e

ClO₃⁻

OH●

e-

ClO3●

ClO4-

Step 1

Step 2

Conclusion Cont.

• Operating under MT conditions is the most effective means to limit ClO4

- formation.• In addition, operating at these conditions is

cost effective.• EC is viable technology for refractory organic

pollutants but in order for it to be integrated into environmental applications, ClO4

- must be inhibited below advisory levels.

16

Acknowledgements

This research was funded by Advanced Diamond Technologies (ADT) in Romeoville, IL via NSF SBIR Phase II grant.

Special thanks to my advisor Dr. Brian P. Chaplin

17

Questions?

Results: LSV of p-substituted phenols

19

0.50 1.00 1.50 2.00 2.50 3.00 3.500.00

0.20

0.40

0.60

0.80

1.00

1.20p-methoxyphenol

Potential (V/ SHE)

Curr

ent D

ensit

y (m

A/cm

^2)

0.50 1.00 1.50 2.00 2.50 3.000.00

0.20

0.40

0.60

0.80

1.00

1.20

p-nitrophenol

Potential (V/SHE)

Curr

ent D

ensit

y (m

A/cm

²)

0.50 1.00 1.50 2.00 2.50 3.00 3.50-0.30

0.20

0.70

1.20

1.70 p-benzoquinone

Potential (V/SHE)

Curr

ent D

ensit

y (m

A/cm

²)

Blank

Blank

Blank

0.50 1.00 1.50 2.00 2.50 3.00 3.500.00

0.20

0.40

0.60

0.80

1.00

1.20

Oxalic Acid

Potential (V/SHE)

Curr

ent D

ensit

y (m

A/cm

²)

Blank

1 mM

5 mM

10 mM

0.75 mM

1.0 mM

0.25 mM

0.50 mM

20

Measured Rates vs. Mass Transfer

0 200 400 600 800 10000.0E+005.0E+021.0E+031.5E+032.0E+032.5E+033.0E+033.5E+034.0E+03

p-NP

Conc (µM)

Rate

(µm

ole/

m³/

min

)

0 200 400 600 800 10000.0E+00

5.0E+02

1.0E+03

1.5E+03

2.0E+03

2.5E+03

3.0E+03

3.5E+03

4.0E+03 p-BQ

Conc. (µM)

Rate

(µm

ole/

m³/

min

)0 200 400 600 800 1000

0.0E+005.0E+021.0E+031.5E+032.0E+032.5E+033.0E+033.5E+034.0E+03

p-MP

Conc (µM)

Rate

(µm

ole/

m³/

min

)

OH●

OH●

OH●

OH●

R

R

RClO3

ClO3●

ClO3●

ClO₄⁻

ClO₄⁻

Anod

e

Reaction Zone

Anod

e

ClO₃⁻

OH●

e-

ClO3●

ClO4-