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In 1959, Richard P. Feynman initiated the Nano-age in his lecture “There’s plenty of room at the bottom”. Feynman also had a clear vision about computers and asked: ”Why can’t we make them very small, make them of little wires, little elements - and by little, I mean little. For instance, the wires should be 10 or 100 atoms in diameter, and the circuits should be a few thousand angstroms across.” At the same time, Jean Hoerni from Fairchild Semiconductors tried to get his “planar process” to production. Hoerni’s planar process using silicon substrates, so-called “wafers”, revolutionized semiconductor manufacturing and was widely adapted by the industry. The great success of the planar wafer process is also much related with tremendous improvements in optical lithography over all the years. From the early age dominated by mask aligners to highly sophisticated steppers and scanners, lithography was the key enabling technology, allowing now – 50 years after Feynman’s vision – nanostructuring down to the atomic scale on 300mm planar wafers. The evolutionary development of optical lithography is reviewed along with a brief discussion of options for the future.
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OPTICAL LITHOGRAPHY
KEY ENABLING TECHNOLOGY FOR OUR MODERN WORLD
Dr. Reinhard Voelkel CEO SUSS MicroOptics SA
Switzerland
Invited Talk at DGaO Annual Meeting 2012, Eindhoven, The Netherlands
SUSS MicroOptics is part of the SUSS MicroTec group, formerly known as Karl Suss, supplying lithography tools (mask aligners) since 1963.
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 2
My talk is about îOptical Lithography - Key Enabling Technology for our Modern Worldî What is our Modern World?
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 3
OUR MODERN WORLD
Source: www.apple.com
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 4
ONLY SOME 10 YEARS AGO
5
Source: www.wikipedia.org
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
6
http://www.itrs.net/Links/2011Winter/5_MEMS.pdf
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
LITHOGRAPHY IS KEY ENABLING TECHNOLOGY
7
Christopher J. Progler: (CTO Photronics), at SPIE Advanced Litho, San Jose, Feb 2012
Source: www.apple.com
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
128GB MEMORY STICKS
8
22 nm (half-pitch) lithography
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
Lithography (Greek: λίθος = lithos, 'stone' + γράφειν = graphein, 'to write')
is a method for printing using a stone (limestone) or a metal plate with a smooth surface.
Invented in 1796 by Bavarian author Johann Alois Senefelder (1771 – 1834) as a cheap method of publishing theatrical works.
Lithography can be used to print text or artwork onto paper or other suitable material.
WIKIPEDIA
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 9
JOHANN ALOIS SENEFELDER (1771 – 1834): LITHOGRAPHY
10
Cheap method to publish his theatrical works?
Paints ink as a resist on flat plates Solnhofen limestone
Limestone is porous (hydrophilic) and absorbs ink => hydrophobic
Gum Arabic solution absorbed at hydrophilic areas, hydrophobic
design repels
Rolling on an ink made of soap, wax, oil and lampblack, this greasy
substance coated the design but did not spread over the moist blank
area.
Senefelder’s invention changed printing industry: Newspapers!
Johann Alois Senefelder
(1771 – 1834)
Source: www.wikipedia.org
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
JOSEPH NICÉPHORE NIÉPCE (1765 – 1833): HELIOGRAPHY
11
Photosensitive asphalt (bitumen of Judea) as photoresist
Oiled paper with black ink as photomask
Sun-exposure (several hours) hardens the resist
Unexposed soft resist areas dissolved by solvents and removed
Joseph Nicéphore Niépce
(1765 – 1833)
Original engraving by Isaac
Briot (1633)
Niépce’s heliography
(1826)
Port
rait o
f th
e C
ard
inal G
eorg
es D
’Am
bois
e, arc
hbis
hop o
f R
ouen
Source: www.wikipedia.org
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
Still some more inventions needed to build my Smart Phone...
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 12
John Bardeen, William Shockley and Walter Brattain
Nobel Prize in Physics 1956
INVENTION OF THE TRANSISTOR (1947)
13
Bardeen, Shockley and Brattain
at Bell Labs (1948)
1st transistor invented at Bell Labs by
Bardeen, Shockley and Brattain in 1947 Source: www.computerhistory.org
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
Bell Labs
Jules Andrus and Walter L. Bond
Carl Frosch and Lincoln Derrick’s silicon diffusion process
DOFL: U.S. Army’s Diamond Ordnance Fuse Laboratories
Jay W. Lathrop and James Nall: First microscope-based “stepper”
Jay W. Lathrop and James Nall invented the name “Photolithography”
PIONEERS OF PHOTOLITHOGRAPHY IN SEMI RESEARCH
14
Jules Andrus Photoengraving
for PNPN (1957)
Lathrop/Nall: Transistor integrally mount with a printed circuit
plate by thin-film metal strips manufactured by
photolithography and vacuum deposition (1957).
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
Photoresist!
1935: Louis Minsk at Eastman Kodak developed first negative
photoresist for printed circuit board (PCB) applications
Photoresist adherence was one of the major problems in the
1950s research on transistors
KPR (Kodak PhotoResist) did not stick well on germanium
(HCL-etching) and silicon dioxide (BHF-etching)
Research teams and industry used black or Carnauba wax
In 1960 Kodak released the new KTFR (Kodak Thin Film Resist)
invented by Martin Hepher and Hans Wagner
PHOTORESIST PROBLEMS
16
Pioneers of photoresist development at Eastman Kodak: (from left) Louis
Minsk, Martin Hepher, Hans Wagner and Armost Reiser
Source: www.computerhistory.org
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
Integrated Circuits (IC)
Jack S. Kilby from Texas Instruments had the “Monolithic Idea”
to integrate resistors, capacitors and transistors in a single chip.
Kilby filed his patent for an “Integrated Circuit” on Feb 6, 1959.
At the same time Robert Noyce from Fairchild invented the
“Planar Integrated Circuit” and filed his patent on Jul 30, 1959.
After a short patent-war they cross-licensed their patents.
INVENTION OF THE INTEGRATED CIRCUIT (1958)
18
Jack S. Kilby
(1923 – 2005)
Integrated circuit (IC) built at Texas
Instruments by Jack S. Kilby in 1958
Robert N. Noyce
(1927 - 1990)
Noyce’s integrated circuit (IC) chip as
manufactured by Fairchild in 1961 Source: www.computerhistory.org
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
Planar Process
Jean Hoerni invented in 1957 the revolutionary “Planar Process”,
still the base of all semiconductor manufacturing today.
Thin SiO2 film was photo structured and etched
Fairchild starts production of planar transistors in 1959
THE PLANAR PROCESS (1957)
20
Jean Hoerni
(1924 - 1997)
Source: www.computerhistory.org
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
1957 the eight founders left Shockley and founded
Fairchild in Palo Alto
Fundamental inventions like the “Planar Process”
and the “Planar Integrated Circuit” allowed
industrial manufacturing of transistors and ICs
Fairchild licensed their process to other companies
Silicon Valley
Semiconductor equipment manufacturers
Requirement for lithography tools!!!
THE INCREDIBLE FAIRCHILD START-UP
21
The eight founders of Fairchild in 1960: (from left) Gordon
Moore, Sheldon Roberts, Eugene Kleiner, Robert Noyce,
Victor Grinich, Julius Blank, Jean Hoerni, and Jay Last
Noyce’s integrated circuit (IC) chip as
manufactured by Fairchild in 1961
Jean Hoerni’s planar process as
patented in 1957
Source: www.computerhistory.org
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
1960 – 1980 The Golden Age of Mask Aligner
Mask Aligners Lithography is „Shadow Printing“ Mask illumination using UV light
Resolution is related to the Proximity Gap
23
Wafer
Mask
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
LITHOGRAPHY IN 1976
25
Semiconductor Feature
Sizes (Half-Pitch)
micron
1957 120
1963 30
1971 10
1974 6
1976 3
1982 1.5
1985 1.3
1989 1
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
Shrinkage in Lithography
In 1959, when computers filled rooms Feynman had the vision to miniaturize
computers and chips towards their physical limits.
”Why can’t we make them (computers) very small, make them of little
wires, little elements - and by little, I mean little. For instance, the
wires should be 10 or 100 atoms in diameter, and the circuits should
be a few thousand angstroms across.”
THERE IS PLENTY OF ROOM AT THE BOTTOM
27
Source: www.wikipedia.org
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
JACK S. KILBY’S NOBEL PRIZE LECTURE (2000)
28
Smaller features, lower costs, larger market,
(from Jack S. Kilby’s nobel lecture in 2000)
Jack S. Kilby
(1923 – 2005)
22nm
Source: www.wikipedia.org
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
MOORE’S LAW
29
Source: www.wikipedia.org
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
SHRINKAGE REDUCES ENERGY PER CHIP OPERATION
31 SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
THE FUTURE OF SHRINKAGE?
32 SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
Intel’s 22nm Tri-Gate transistor is a fundamental
change:
37% faster and 50% power reduction
Change from “Sandy Bridge” to “Ivy Bridge” in 2012
INTEL’S 3D TRANSISTORS
33
source: www.intel.com
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
Optical lithography made the most important contributions to allow the profitable continuation of Mooreís Law.
However, providing leading-edge lithography tools was always a very challenging and selective business.
Those equipment suppliers who were not able to provide next generation lithography (NGL) were often kicked out of business.
Only the winners who provided the leading-edge lithography tools, achieved good margins and could afford to continue their cost-intensive development of the next generation tool.
But even for winners it was often very difficult to make the right choices regarding the future technology.
MOORE’S LAW AND ITS CONSEQUENCES FOR SUPPLIERS
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 34
LITHOGRAPHY IN 1980
Semiconductor Feature
Sizes (Half-Pitch)
micron
1957 120
1963 30
1971 10
1974 6
1976 3
1982 1.5
1985 1.3
1989 1
HISTORIC LITHO TOOL PRICE [US$]
37
Mask Aligner
Front-End Litho Tool
EUVL
ASML 1950i
Every 4 years the price doubles
[1970 – 2010]
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
Scanner and Stepper
SCANNER AND STEPPER
Source: Perkin-Elmer, ASML, Zeiss, Herbert Gross: Handbook of Optical Systems
X-Ray Lithography
1992: SUSS MASK ALIGNER XRS-200 (X-RAY)
Source: www.suss.com
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 41
Customized Illumination
CUSTOMIZED ILLUMINATION IN DUV LITHOGRAPHY
43
Source: www.zeiss.com
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
ASML/ZEISS ILLUMINATION SYSTEM FOR DUV LITHOGRAPHY
Source: EPFL/IMT, Carl Zeiss SMT GmbH
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 44
FLEXRAY ILLUMINATION SYSTEM
Diffractive Optical Elements
MEMS Mirror Arrays
(FlexRay™)
Source: EPFL/IMT, ASML, Carl Zeiss SMT GmbH
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 46
SUSS MicroOptics SA is "Preferred Supplier" for Carl Zeiss SMT GmbH
157nm Lithography? Next: Immersion Lithography
Mar 2002: Burn Lin (TSMC) suggested to consider
immersion lithography @SPIE in Santa Clara.
Oct 2003: ASML and IMEC demonstrate feasibility
Jan 2004: Industry shifts from 157nm to immersion
End 2004: Multiple 0.85NA immersion scanners
shipped to (TSMC, IMEC)
2011: ASML NXT:1950i Step and Scan
In-line catadioptric lens design (1.35NA, TWINSCAN)
Resolution 40nm (C-quad), 38nm (dipole), 2.5 nm overlay
FlexRay (customized illumination)
FlexWave (programmable wavefronts)
Reticle Control (heating compensation)
IMMERSION LITHOGRAPHY
Sourc
e: IM
EC
, ww
w.d
nse.c
om
, AS
ML, F
abte
ch
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 48
SUSS MicroOptics SA is "Preferred Supplier" for Carl Zeiss SMT GmbH
SUCCESS STORY
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 49
SUSS MicroOptics SA is "Preferred Supplier" for Carl Zeiss SMT GmbH
THE FUTURE OF LITHOGRAPHY?
50 SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
EUV Lithography
EUV LITHOGRAPHY
52
Source!!
Source: ASML, XTREME
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
Tricks & Tweaks? Workarounds?
Moore’s Law: Double function every 2 years!
Reduce cost per function
Making chips more powerful for same cost, or
Making chips of a given capability cheaper
Litho Tools: Prices doubles every 4.4 years!
RULE: Cost per function must decrease about 30%
per year - a factor of 2 every two years - to stay on
track!
THE LAWS OF SEMICONDUCTOR INDUSTRY
54
Source: Chris Mack, www.lithoguru.com
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
Tricks & Tweaks: Double-Patterning Self-Aligned ...
DOUBLE PATTERNING, MULTIPLE PATTERNING, SELF ALIGNED
Self-aligned spacer
Source: Wikipedia, SPIE
Litho-Etch-Litho-Etch
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 56
The End of Shrinkage?
CRUSING SPEED OF COMMERCIAL AIRCRAFT
59
Source: Chris Mack, www.lithoguru.com
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
16-CORE CPU?
60
Source: www.amd.com
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
Less-Litho-Intensive-Approach?
Yes & More Tricks: 3D Integration 3D IC, 3D Memory
3D INTEGRATION, STACKING
63
2D Integration 3D Integration
Source: www.yole.fr
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
MORE 3D INTEGRATION
Source: www.yole.fr
Where is the Mask Aligner?
LITHOGRAPHY FOR LED MANUFACTURING
66
Market Share LED Exposure ToolsSUSS
Mask Aligner
ASML Stepper
Beta Squareused Perkin Elmer
DNK Aligner
Nikon Used Stepper
Ultratech Stepper
Ushio full-field
EVGMask Aligner
ELS Aligner
China 102 23 3 128
80% 18% 2%
Europe 6 1 1 8
75% 13% 13%
Japan 22 22
100%
Korea 14 9 25 1 2 51
27% 18% 49% 2% 4%
Malaysia 4 1 5
80% 20%
Singapore 20 20
100%
Taiwan 23 75 23 14 9 144
16% 52% 16% 10% 6%
USA 11 11
100%
Worldwide 182 20 2 107 48 14 1 6 9 389
Source: www.yole.fr
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
MASK ALIGNER 2012
ICs &
Components End Products End User Equipment
Supplier
Research
Institutes
Source: www.suss.com
New Mask Aligner?
Mask Aligner technology changed tremendously over
the last 50 years
Mask Aligners 1963 - 2012
The optics did not for 30 years!
1969: MJB3 1985: MA150 2010: MA200 Compact
Source: www.suss.com
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 69
NEW: MO EXPOSURE OPTICS®
SELF CALIBRATING MASK ALIGNER ILLUMINATION
Microlens Optical Integrators
Lamp readjustment required
Uniformity change over lamp lifetime
Daily uniformity test required
Variation of illumination light over mask
(angular spectrum)
NO
NO
NO
NO
Source: www.suss.com
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 70
Illumination technology from Stepper in Mask Aligner
Microlens Integrators for light homogenization
Self-calibrating light source, telecentric illumination
Illumination filter plates allow customized illumination
Source-Mask Optimization (SMO) in Mask Aligner
MO EXPOSURE OPTICS®
Advanced Mask Aligner Lithography (AMALITH) Source: www.suss.com
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 71
- Self-calibrating light source
- Source-Mask Optimization (SMO) - Customized Illumination
- Optical Proximity Correction (OPC)
- Full 3D Litho Simulation in LAB software (GenISys)
ADVANCED MASK ALIGNER LITHOGRAPHY
(AMALITH)
Source: www.suss.com, www.genisys-gmbh.com
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 72
ENJOY THE MODERN WORLD!
Source: www.apple.com
SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven 73
SUSS.
Our Solutions
Set Standards
SUSS MicroOptics SA Rouges-Terres 61
CH-2068 Hauterive
Switzerland
Tel +41-32-564444
Fax +41-32-5664499
info@suss.ch, www.suss.ch
74 SUSS MicroOptics SA, R. Voelkel, Optical Lithography, DGaO 2012, Eindhoven
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