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國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
Evaluation Criteria for Reduced Graphene OxideEvaluation Criteria for Reduced Graphene OxideRef: Ref: Dachao Luo, Guoxin Zhang, Junfeng Liu, and Xiaoming Sun, Dachao Luo, Guoxin Zhang, Junfeng Liu, and Xiaoming Sun, J. Phys. Chem. C, 2011.J. Phys. Chem. C, 2011.
Advisor: Chii-Rong Yang Advisor: Chii-Rong Yang Student: Zi-Ying Chen (Student: Zi-Ying Chen ( 陳姿穎陳姿穎 ))
Department of Mechatronic EngineeringDepartment of Mechatronic EngineeringNational Taiwan Normal UniversityNational Taiwan Normal University
Date: 10/20/2014Date: 10/20/2014
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
OutlineOutline
Abstract
Introduction
Experimental
Result and discussion
Conclusions
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
AbstractAbstract
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
AbstractAbstract
The oxidation in this chemical method induces a variety of defects and oxygen-containing functional groups such as hydroxyl and epoxide, resulting in degradation of the electronic properties of graphene. Meanwhile, the reduction process can lead to the occurrence of aggregate, ion doping, and so on.
The samples were systematic compared by four aspects: dispersibility, reduction degree, defect repair degree, and electrical conductivity. On the basis of the comparison, a simple evaluation criterion was proposed for qualitatively judging the quality of RGO.
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
AbstractAbstract
Here we present a simple classification as followed:
Reducing agents
hydroquinone, dimethylhydrazine, hydrazine, sodium borohydride, sulfur-containing compounds, aluminum powder, vitamin C, hexamethylenetetramine, ethylenediamine (EDA), polyelectrolyte, reducing sugar, protein, sodium citrate, carbon monoxide, Fe, and norepinephrine.
Performing under various conditions
acid/alkali, thermal treatment, and others like microwave, photocatalytic, sonochemical, laser, plasmas, bacterial respiration, lysozyme, tea solution.
Electrochemical -
Two-step reduction -
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
IntroductionIntroduction
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
IntroductionIntroduction
In this study, RGOs were prepared by six typical reduction
methods: N2H4·H2O, NaOH, NaBH4, solvothermal, high-
temperature, and two-step.
On the basis of the comparison, a simple evaluation criterion was
proposed for qualitatively judging the quality of RGO.
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
ExperimentExperiment
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
GO Synthesis and Purification (1/4)GO Synthesis and Purification (1/4)
Nature graphite (5 g) was grounded with NaCl (100 g) for 30 min.
NaCl was washed away using water with vacuum filtration.
The remaining graphite was heated at 60 °C in oven for 24 h to
remove any water.
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
GO Synthesis and Purification (2/4)GO Synthesis and Purification (2/4)
at RTstirred for 24 h
The dried solid +
H2SO4 (115 mL) Chiller
+ 15 g of KMnO4
kept below 20 °C for 1.5 h.
+ NaNO3 (0.5 g)
for 20 min
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
GO Synthesis and Purification (3/4)GO Synthesis and Purification (3/4)
Increase to 35 ~ 40 °C and keep for 1 h. Increase to 70 °C and keep for 30 min.Add water (15 mL), increase to 100 °C and keep for
20 min.Add water (15 mL) and keep for 30 min.Add water (200 mL). Add ice water (500 mL), this step can dilute and cool
down the system to 50 °C. ∼After 15 min, 50 mL of 30% H2O2 was added to the
flask under vigorous stirring. This suspension was stirred at room temperature for
1 h.
Put into the oil bath
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
GO Synthesis and Purification (4/4)GO Synthesis and Purification (4/4)
The suspension was centrifuged at low speed for 3 times (4500 rpm,
15 min) and washed with 5% HCl solution for 2 rounds and then
centrifuged at high speed for 3 times (12000 rpm, 60 min) with
distilled water (first step we add 0.1 g of NH4Cl).
Finally, the GO was kept in a vacuum desiccator with self-
indicating silica gel for 1 week.
self-indicating silica gel
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
Reduction (1/3)Reduction (1/3)
Hydrazine hydrate
GO dispersion (25.0 mL, 0.05 wt %)+ water (25 mL)+ hydrazine solution (11.0 μL, 80 wt %)+ ammonia solution (175.0 μL, 28 wt %)
After being vigorously shaken or stirred for a few minutes, the vial was put in a water bath (95 °C) for 1 h.
NaOH reduction
GO dispersion (0.5 mg/mL, 75 mL)+ NaOH solution (1 mL, 8 M)
The vessel was kept at 70 °C and mild sonicated for a few minutes.
NaBH4 reduction
graphite oxide (75 mg)+ water (75 g)+ sodium borohydride (600 mg in 15 g of water) + 5 wt % sodium carbonate solution. (pH being adjusted to 9–10)
The mixture was then kept at 80 °C for 1 h under constant stirring.
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
Reduction (2/3)Reduction (2/3)
SolvothermalGO aqueous solution (35 mL of 0.5 mg/mL) was transferred to a Teflon-lined autoclave and heated at 180 °C for 6 h.
High-temperature
Put the GO powder in porcelain boat and then place it into the edge of long quartz tube.
The sample was flushed with argon for 10 min. The porcelain boat was quickly inserted into the
middle of long quartz tube furnace preheated to 900 °C and held in the furnace for 30 s.
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
Reduction (3/3)Reduction (3/3)
Two-step
100 mg of dry GO sample was dispersed in deionized water to give a 1.0 mg/mL colloidal solution.
The pH value of this solution was adjusted to 9–10 by 5 wt % sodium carbonate solution. (NaBH4 reduction)
Sodium borohydride (800 mg) was directly added into 100 mL of GO dispersion under magnetic stirring, and the mixture was kept at 80 °C for 1 h.
Reduced product was separated by filtration and washed with large amount of water several times to remove most residual ions.
This partially reduced GO was kept in a vacuum desiccator with phosphorus pentoxide for 2 days and redispersed in concentrated sulfuric acid and heated to 120 °C with stirring for 12 h.
After cooling down, the dispersion was diluted with deionized water. Further annealed at 900 °C under gas flow of Ar for 15 min. (High-
temperature)
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
Result and discussionsResult and discussions
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
CriterionCriterion
The samples were systematically compared by four aspects:
a. Dispersibility
b. Reduction degree
c. Defect repair degree
d. Electrical conductivity
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
AFM imagesAFM images
Tapping-mode AFM images (2 × 2 μm2, scale bar: 400 nm).
GO N2H4
NaOH
Solvothermal
NaBH4
High-temperature
Two-step NaBH4
two-step
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
DispersibilityDispersibility
1 week after
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
UV–vis absorption spectroscopyUV–vis absorption spectroscopyUV–vis absorption spectroscopy gives us an average reflection of
reduction degree of RGO by different reduction methods. To further reveal the details, XPS was employed to analyze the GO and RGO.
UV–vis absorption spectraN
2H4
GO
NaO
H
Sol
voth
erm
al
NaB
H4
Hig
h-t
emp
erat
ure
Tw
o-st
ep
→
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
XPS spectraXPS spectraGO N2H4
NaOH
Solvothermal
NaBH4
High-temperature
Two-step
XPS spectra and Values of C/O atomic ratios obtained by the XPS analysis for GO (sample 1) and different methods reduced RGO (from sample 2 to 7: N2H4, NaOH, NaBH4, solvothermal, high-temperature, two-step).
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
GO N2H4 NaOH NaBH4 SolvothermalHigh
temperatureTwo-step
C–O 0.31 0.39 0.28 0.45 0.17 0.36 0.30
C═O 0.23 0.08 0.13 0.16 0.26 0.01 0.05
N2H
4
GO
NaO
H
Sol
voth
erm
al
NaB
H4
Hig
h-t
emp
erat
ure
Tw
o-st
ep
On the basis of the above results, we can rationally design the reaction process for transforming the functional groups of GO to improve the reduction degree, for example, by adjusting the environment (e.g., pH) to convert some functional groups into carboxyl or hydroxyl groups and then using a reducing agent to further restore the structure.
↑ ↑ ↑
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
Raman spectraRaman spectra
Here we borrow the D/G ratio of single-layer graphene prepared by mechanical exfoliation of graphite (about 1.0, HOPG is about zero) as a reference to solve this problem.
N2H
4
GO
NaO
H
Sol
voth
erm
al
NaB
H4
Hig
h-t
emp
erat
ure
Tw
o-st
ep
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
Electrical Conductivity Electrical Conductivity
GO N2H4 NaOH NaBH4 SolvothermalHigh
temperatureTwo-step
electrical conductivity
[S/m]insulator 156.2 3.6 0.006 4.8 232.1 267.8
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
ConclusionConclusion
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
ConclusionConclusion (1/2)(1/2)
GO N2H4 NaOH NaBH4 SolvothermalHigh
temperatureTwo-step
Dispersibility Good Bad Good Good OK Bad Bad
Reduction degreeUV–vis
absorption
- OK Bad Bad Bad Good Good
Reduction degreeXPS
- Bad Bad Bad Bad Good OK
Defect repair degreeRaman
- OK Good OK OK Bad Good
Electrical conductivity
insulator 156.2 3.6 0.006 4.8 232.1 267.8
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
ConclusionConclusion (2/2)(2/2)Under this evaluation criterion, the two-step method appears the
best one for better RGO synthesis in the six reduction methods
compared. RGO reduced by the two-step method has better reduction degree,
defect repair degree and electrical conductivity, but the relatively
weak dispersibility and tedious preparation process still need to
improve. In practice, the reduction degree and the defect repair degree are
the two key factors for effective reduction of GO.
國立臺灣師範大學微奈米光機電系統實驗室
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Z. Y. Chen, NTNU ME
Thank you for your attention!Thank you for your attention!
敬請批評與指教敬請批評與指教