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1 BROOKHAVEN SCIENCE ASSOCIATES National Synchrotron Light Source II Damping Wiggler Beamline: XAS Preliminary Design Summary Paul Northrup January 16th, 2008

1 BROOKHAVEN SCIENCE ASSOCIATES National Synchrotron Light Source II Damping Wiggler Beamline: XAS Preliminary Design Summary Paul Northrup January 16th,

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1 BROOKHAVEN SCIENCE ASSOCIATES

National Synchrotron Light Source II

Damping Wiggler Beamline: XAS Preliminary Design Summary

Paul NorthrupJanuary 16th, 2008

2 BROOKHAVEN SCIENCE ASSOCIATES

Overall Mission• To provide a versatile and highly productive facility for

hard X-ray Absorption Spectroscopy for a wide range of scientific disciplines: • Catalysis and energy science• Environmental science and low-temperature geochemistry• Life science and biology• Nanomaterials and condensed matter research• Earth and high pressure science

• To pursue and apply cutting-edge XAS capabilities and techniques appropriate to the advanced quality of the NSLS-II source

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Preliminary Design• Careful consideration of:

• Community input • User and scientific needs and new opportunities• Technical feasibility• Overall mission of NSLS-II

• Through: • Workshops -- local and national• Beamlines’ staff and representatives of scientific communities• NSLS UEC• White papers

• Technical, EFAC, and DOE reviews

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Beamline Requirements, Specifications

• Source requirements: • Broad spectrum, high flux, non-coherent source• Source stability (running in top-off mode):

– position within 10% of source size, – vertical angle within 1 rad (for monochromatic energy stability)

• Specifications: • Energy range: ~5.5-50 keV, provisions to use up to 90 keV• Tunable spot size from 0.2 x 0.2 mm to 5 x 55 mm• Microbeam (1 x 1 micron) available• Standard (10-4) and high (10-5) energy resolution modes available• Controlled sample environment (air-sensitive or hazardous samples)• Beamline stability scan-to-scan: position on sample within 5 microns,

energy calibration within 0.05 eV

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Beamline Design -- Overview

Top view:

Side view:

First Optic Enclosure (FOE) containing beamline optics and white-beam components

Bulk XAS (with three sample positions)

Shield wall

2 Experimental Hutches in line

Microbeam XAS Beam

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Insertion Device

• Damping Wiggler, length 3.5 meters, in high-beta straight section

• Future upgrade: two canted 3.5m wigglers independently serving microbeam and bulk endstations

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Damping Wiggler Characteristics

Flux: Brightness:

Highest hard X-ray flux at Highest brightness of broad- NSLS-II spectrum sources

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Damping Wiggler Heat Load (3.5m)

• Wiggler output 32 kW, 4 kW reaches beamline at max acceptance of 0.15 mrad (v) x 1.0 mrad (h) defined by optics

• Challenging to maintain broad energy range, stability• “Divide and conquer” approach (absorbs:)

• front end mask 25 kW• white-beam apertures 3-7 kW (pass up to 4 kW)• filters and attenuators 1-2.5 kW• white-beam mirror 0-2.5 kW• monochromator first crystal 100-700 W• monochromator second crystal (scatter)

• Preliminary thermal analyses show that this can be done• Heat load on sample may be significant (>20 mW)

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White Beam Components

• Retractable attenuators, sequentially added for higher energy experiments (water-cooled, carbon)

• White-beam mirror • 1.5 meter, Si (or GlidCop) substrate, water-cooled• Two “stripes” (bare Si and Pt-coated) available• Three positions: 2.0 or 3.15 mrad, or removed from beam

– Thus 5 configurations to cover required energy range• Vertical collimation and harmonic rejection

Beam

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White Beam Components

• High Heatload Monochromator: • LN2 cooled first and second crystals• Side-by-side sets: Si(111) and Si(311) [or Si(333) instead]

Beam

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Beamline Optics

• High energy resolution (10-5 or better) monochromator• In series with high-heatload monochromator • Passes beam when not in use• No LN2 cooling required, high precision mechanism• Several crystal types being considered (less restrictions on

material)• Synchronization with primary monochromator is required

Beam

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Beam Conditioning Optics

Focusing mirror (~2:1) • Two toroidal “stripes” match Mirror 1• Reflects in opposite sense to Mirror 1• Initial ray tracing calculations:

spot size 0.2 x 0.2 mm at sample

Beam

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Endstation 2: Bulk XAS

• Acceptance up to 0.15 x 1.0 mrad

• Spot size ~0.2x0.2 mm up to 5x55 mm

• Continuous-scan or step-scan modes of data collection• Time-resolved (minutes)

studies• 3 sample positions

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Endstation 2: Bulk XAS

Sample position 1: Classic benchtop XAS

• Transmission, fluorescence and grazing-incidence

geometries• In-situ measurements:

electrochemical cells, gas and solution flow-through cells

• Heater, cryostat and LN2 cooling• Standard and high-resolution

(energy selective) detectors• Detector for powder XRD pattern

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Endstation 2: Bulk XAS

2: Controlled environment XAS• Multi-use enclosure:

• Glove box: controlled atmosphere• Containment/fume hood for

hazardous samples• Multi-element detector • Low-concentration samples • Hazardous, nano, or radioactive

materials

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Endstation 2: Bulk XAS

3: Space for move-in apparatus• Large-volume high-pressure

or catalytic cells• High-field magnet• Available control and

data channels, utilities, etc.• ~2 x 3 m

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Endstation 1: Microbeam XAS

• Conventional K-B mirror optics• Focused spot ~1 micron• Microbeam and single-crystal XAS• Diamond anvil cell high-P XAS• Multi-use enclosure• Multi-element detector • XRD detector shared with Endstation 2

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1.E+10

1.E+11

1.E+12

1.E+13

1.E+14

1.E+15

0 10000 20000 30000 40000 50000

Estimated flux (delivered to sample at monochromator bandpass) 5.5 keV

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Estimated Flux: High Energy Resolution

1.E+10

1.E+11

1.E+12

1.E+13

1.E+14

0 10000 20000 30000 40000

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Summary: Initial Project Scope• Two endstations included, one control station• Single source and one set of optics serving both

endstations• Endstation 2 hutch can be accessed for set-up while

Endstation 1 is in use; but not vice versa• Accommodations (space, component design) made for

future canting of source• Heatload R&D

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Potential Upgrade/Build-out Path

• Add second canted wiggler source and beamline optics to provide independent beam for each endstation

• Addition of mirror in front end to divert low-energy portion of overlapped fans into a third station for high-flux bulk 2-6 keV applications

• Complementary bulk/micro XAS beamline at adjacent dipole for 1-5 keV applications

• Net potential: core cluster of XAS endstations covering 1-90 keV energy range, bulk and microbeam capability

12 3

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Lower Energy (2-6 keV) Side Station

1.E+10

1.E+11

1.E+12

1.E+13

1.E+14

1.E+15

0 10000 20000 30000