(19) United States US 20100320428A1

(12) Patent Application Publication (10) Pub. No.: US 2010/0320428A1 Luly et al. (43) Pub. Date: Dec. 23, 2010

(54) GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS

(75) Inventors: Matthew H. Luly, Hamburg, NY (US); Robert G. Richard, Hamburg, NY (US)

Correspondence Address: HONEYWELLADLA PPER Patent Services 101 Columbia Road, P.O.Box 224.5 Morristown, NJ 07962 (US)

(73) Assignee: HONEYWELL INTERNATIONAL INC., Morristown, NJ (US)

(21) Appl. No.: 12/871,169

(22) Filed: Aug. 30, 2010

Related U.S. Application Data

(63) Continuation of application No. 1 1/637,657, filed on Dec. 12, 2006, now Pat. No. 7,807,074.

Publication Classification

(51) Int. Cl. HOIB 3/16 (2006.01) COB 70 (2006.01) COB 3.3/08 (2006.01) CD7C 2L/8 (2006.01)

(52) U.S. Cl. .......... 252/571; 423/481; 423/341; 570/135 (57) ABSTRACT

A dielectric gaseous compound which exhibits the following properties: a boiling point in the range between about -20°C. to about -273° C.; non-ozone depleting; a GWP less than about 22,200; chemical stability, as measured by a negative standard enthalpy of formation (dHf-0); a toxicity level such that when the dielectric gas leaks, the effective diluted con centration does not exceed its PEL; and a dielectric strength greater than air.

US 2010/0320428 A1

GASEOUS DELECTRICS WITH LOW GLOBAL WARMING POTENTIALS

1. FIELD

0001. The present disclosure relates generally to a class of gaseous dielectric compounds having low global warming potentials (GWP). In particular, such gaseous dielectric com pounds exhibits the following properties: a boiling point in the range between about -20° C. to about -273° C.; low, preferably non-ozone depleting; a GWP less than about 22,200; chemical stability, as measured by a negative stan dard enthalpy of formation (dHf-0); a toxicity level such that when the dielectric gas leaks, the effective diluted concentra tion does not exceed its PEL, e.g., a PEL greater than about 0.3 ppm by Volume (i.e., an Occupational Exposure Limit (OEL or TLV) of greater than about 0.3 ppm); and a dielectric strength greater than air. These gaseous dielectric compounds are particularly useful as insulating-gases for use with elec trical equipment, such as gas-insulated circuit breakers and current-interruption equipment, gas-insulated transmission lines, gas-insulated transformers, or gas-insulated Substa tions.

2. BACKGROUND

0002 Sulfur hexafluoride (SF) has been used as a gas eous dielectric (insulator) in high Voltage equipment since the 1950s. It is now known that SF is a potent greenhouse warm ing gas with one of the highest global Warming potentials (GWP) known. Because of its high GWP, it is being phased out of all frivolous applications. However, there is currently no known Substitute for SF in high Voltage equipment. The electrical industry has taken steps to reduce the leak rates of equipment, monitor usage, increase recycling, and reduce emissions to the atmosphere. However, it would still be advantageous to find a substitute for SF in electrical dielec tric applications. 0003. The basic physical and chemical properties of SF,

its behavior in various types of gas discharges, and its uses by the electric power industry have been broadly investigated. 0004. In its normal state, SF is chemically inert, non toxic, non-flammable, non-explosive, and thermally stable (it does not decompose in the gas phase attemperatures less than 500° C.). SF exhibits many properties that make it suitable for equipment utilized in the transmission and distribution of electric power. It is a strong electronegative (electron attach ing) gas both at room temperature and at temperatures well above ambient, which principally accounts for its high dielec tric strength and good arc-interruption properties. The break down Voltage of SF is nearly three times higher than air at atmospheric pressure. Furthermore, it has good heat transfer properties and it readily reforms itself when dissociated under high gas-pressure conditions in an electrical discharge or an arc (i.e., it has a fast recovery and it is self-healing). Most of its stable decomposition byproducts do not significantly degrade its dielectric strength and are removable by filtering. It produces no polymerization, carbon, or other conductive deposits during arcing, and its is chemically compatible with most Solid insulating and conducting materials used in elec trical equipment attemperatures up to about 200° C. 0005 Besides it good insulating and heat transfer proper

ties, SF has a relatively high pressure when contained at room temperature. The pressure required to liquefy SF at 21° C. is about 2100 kPa; its boiling point is reasonably low,

Dec. 23, 2010

–63.8°C., which allows pressures of 400 kPa to 600 kPa (4 to 6 atmospheres) to be employed in SF-insulated equipment. It is easily liquefied under pressure at room temperature allow ing for compact storage in gas cylinders. It presents no han dling problems, is readily available, and reasonably inexpen sive.

0006 SF replaced air as a dielectric in gas insulated equipment based on characteristics such as insulation ability, boiling point, compressibility, chemical stability and non toxicity. They have found that pure SF, or SF-nitrogen mixtures are the best gases to date. 0007. However, SF has some undesirable properties: it can form highly toxic and corrosive compounds when Sub jected to electrical discharges (e.g., SF SOF); non-polar contaminants (e.g., air, CF) are not easily removed from it: its breakdown Voltage is sensitive to water vapor, conducting particles, and conductor Surface roughness; and it exhibits non-ideal gas behavior at the lowest temperatures that can be encountered in the environment, i.e., in cold climatic condi tions (about -50° C.), SF becomes partially liquefied at nor mal operating pressures (400 kPa to 500 kPa). SF is also an efficient infrared (IR) absorber and due to its chemical inert ness, is not rapidly removed from the earth's atmosphere. Both of these latter properties make SF a potent greenhouse gas, although due to its chemical inertness (and the absence of chlorine and bromine atoms in the SF molecule) it is benign with regard to stratospheric ozone depletion. 0008 That is, greenhouse gases are atmospheric gases which absorb a portion of the infrared radiation emitted by the earth and return it to earth by emitting it back. Potent green house gases have strong infrared absorption in the wavelength range from approximately 7 um to 13 Jum. They occur both naturally in the environment (e.g., H2O, CO., CH, NO)and as man-made gases that may be released (e.g., SF, perfluori nated compound (PFC); combustion products such as CO, nitrogen, and Sulfur oxides). The effective trapping of long wavelength infrared radiation from the earth by the naturally occurring greenhouse gases, and its reradiation back to earth, results in an increase of the average temperature of the earth's Surface. Mans impact on climate change is an environmental issue that has prompted the implementation of the Kyoto Protocol regulating the emissions of man made greenhouse gases in a number of countries. 0009 SF is an efficient absorber of infrared radiation, particularly at wavelengths near 10.5 Lum. Additionally, unlike most other naturally occurring greenhouse gases (e.g., CO, CH). SF is only slowly decomposed; therefore its contribution to global warming is expected to be cumulative and long lasting. The strong infrared absorption of SF and its long lifetime in the environment are the reasons for its extremely high global warming potential which for a 100 year time horizon is estimated to be approximately 22.200 times greater (per unit mass) than that of CO, the predomi nant contributor to the greenhouse effect. The concern about the presence of SF in the environment derives exclusively from this very high value of its potency as a greenhouse gas. 0010. Accordingly, many in the electrical equipment industry have spent Substantial time and effort seeking Suit able replacement gases to reduce the use of SF in high Volt age electrical equipment. To date, the possible replacement gases have been identified as (i) mixtures of SF and nitrogen for which a large amount of research results are available; (ii) gases and mixtures (e.g., pure nitrogen, low concentrations of SF in N, and SF. He mixtures) for which a smaller yet

US 2010/0320428 A1

significant amount of data is available; and (iii) potential gases for which little experimental data is available. 0011. Some replacements which have been proposed have higher GWPs than SF. For example, CFSFs falls into this category. Because of fugitive emissions in the manufacture, transportation, filling and use of Such chemicals, they should be avoided. 0012 However, the present inventors have determined that given the environmental difficulty of SF, it is necessary to relax certain of the requirements traditionally held as impor tant and accept as an alternative gas, compromise candidates with a lower GWP. For example, gases which are non-toxic are often inert with long atmospheric lifetimes which can yield high GWP. By accepting a somewhat more reactive gas than SF, the GWP can be greatly reduced. It may also be necessary to accept slightly more toxic materials in order to find the best alternative in these applications. Such an increase intoxicity can be offset by reducing equipment leak rates or installing monitoring equipment. In some cases, the gases discovered by the present inventors as Suitable alterna tives to SF are show to be efficient at low levels and can be mixed with nitrogen and/or another non-toxic gas to give dielectrics with greatly reduced toxicity and acceptably low GWPS. 0013 The unique gaseous compounds discovered by the present inventors for use as substitutes for SF can be used in Some existing electrical equipment, although they would preferably be used in specific electrical equipment optimized for them. The gaseous compounds of the present disclosure are preferably used in pure form, but can also be used as part of an azeotrope, or a mixture with an appropriate second gas, such as nitrogen, CO or NO.

SUMMARY

0014. A dielectric gaseous compound which exhibits the following properties: a boiling point in the range between about -20°C. to about -273°C.; low, preferably non-ozone depleting; a GWP less than about 22,200; chemical stability, as measured by a negative standard enthalpy of formation (dHf-0); a toxicity level such that when the dielectric gas leaks, the effective diluted concentration does not exceed its PEL (i.e., an Occupational Exposure Limit (OEL or TLV) of at least about 0.3 ppm); and a dielectric strength greater than a1.

0015 The dielectric gaseous compound is at least one compound selected from the group consisting of 0016 Arsenic pentafluoride 0017 Arsine 0018. Diboron tetrafluoride 0019. Diborane 0020 Perchloric acid, 2-chloro-1,1,2,2-tetrafluoroethyl ester (9CI)

0021 Perchloric acid, 1.2.2-trichloro-1,2-difluoroethyl ester

0022 Trifluoroacetylchloride 0023 trifluoromethylisocyanide (CF, NC) 0024 trifluoromethyl isocyanide 0.025 trifluoro-nitroso-ethene?/Trifluor-nitroso-aethen 0026. Tetrafluoroethene 0027 3,3,4,4-tetrafluoro-3,4-dihydro-1,2diazete 0028 (Difluoramino)difluoracetonitril 0029 Tetrafluorooxirane 0030 Trifluoroacetyl fluoride 0031) Perfluorimethylfluorformiat

Dec. 23, 2010

0032 trifluoro-acetyl hypofluorite 0033 perfluoro-2-aza-1-propene 0034 Perfluor-2-aza-1-propen (germ.) 0035. N-Fluor-tetrafluor-1-aethanimin (germ.) 0036 3.3-difluoro-2-trifluoromethyl-oxaziridine 0037 bis-trifluoromethyl-diazene?/hexafluoro-icis aZomethane

0038 Fluoroxypentafluoroethane 0039 bis-trifluoromethyl peroxide 0040 1,1-Bis(fluoroxy)tetrafluoroaethan 0041. Hexafluorodimethyl sulfide 0042 3-fluoro-3HH-diazirine-3-carbonitrile 0043. Ethyne 0044) 1.2.2-trifluoro-aziridine 0045 Ketene 0046 (difluoro) vinylboran 0047 (Difluor) vinylboran (germ.) 0048 trifluoro-vinyl-silane 0049. Ethinylsilan 0050 ethyl-difluor-borane 0051 Ethyl-difluor-boran (germ.) 0.052 methyl-methylen-amine 0053. Dimethyl ether 0054 vinyl-silane 0055 Dimethylsilane 0056 Chloroethyne 0057 fluoroethyne/fluoro-acetylene 0058. Ethanedinitrile 0059 tetrafluoropropyne?/1,3,3,3-tetrafluoropropyne 0060 hexafluoro-oxetane 0061 Trifluoro(trifluoromethyl)oxirane 0062 1,1,1,3,3,3-Hexafluoropropanone 0063 pentafluoro-propionyl fluoride?/perfluoropropionyl fluoride

0064 Trifluoromethyl trifluorovinyl ether 0065. 1-Propyne 0.066 Cyclopropane 0067 Propane 0068 Trimethylborane 0069 cyanoketene 0070 butatriene 0071 Cyano-bispentafluorethyl-phosphin 0072 Trimethyl-1,1,2,2-tetrafluorethylsilan (0073 methyl diborane (0074 Methyldiboran (germ.) (0075 carbonyl bromide fluoride 0076 chloro-difluoro-nitroso-methane/Chlor-difluor-ni troso-methan

(0077 chloroperoxytrifluoromethane (0078 carbonylchlorid-fluorid (0079 Carbonychloridifluorid (germ.) 0080 3.3-difluoro-3HH-diazirine 0081 difluoro diazomethane I0082 Difluordiazomethan (germ.) I0083 Carbonyl fluoride 0084. Difluordioxiran I0085 difluoro-(3-fluoro-3 iH -diazirin-3-yl)-amine I0086 trifluoromethylazide I0087 Trifluormethylazid (germ.) 0088 tetrafluoro-diaziridine I0089. Fluorperoxytrifluormethan (0090 Bis(fluoroxy)difluorimethan (0091 Trifluormethyl-phosphonylfluorid 0092 Cyanogen fluoride

US 2010/0320428 A1

0093 0094) 0095 0.096 0097 0098 0099

Trifluorimethylphosphane (germ.) Diazomethane formaldehyde/Formalin (methyl)difluoroborane (Methyl)difluorboran (germ.) Chloromethane methylphosphonous acid difluoride/difluoro-me

thyl-phosphine 01.00 0101 01.02 (0103) 0104 01.05 01.06 01.07 0108 0109 0110 0111 0112 0113 0114 0115 0116 0117 0118 0119) 0120 0121 0122) (0123 0124 0125 0126 O127 0128 0129 0130 0131) (0132 0133) 0134) 0135) 0136 0137 0138 0139 0140 0141 0142 0143 0144) (0145 014.6 0147 0148 aethan

0149 0150 0151 0152 0153 0154)

trifluoro-methoxy-silane Methylhypofluorid Methane Methylsilane #Si-bromo-it-Sili Si'-methanediyl-bis-silane #Si-iodo-iSii Si'-methanediyl-bis-silane Difluormethylnitrit trifluoromethanol Formyl fluoride Cyanic acid Chlorine Chlorine fluoride Chlorine trioxide fluoride carbon oxide selenide/Kohlenoxidselenid Fluorine Difluorosilane Fluorine oxide fluorine peroxide Sulfuryl fluoride sulphur difluoride Phosphorus trifluoride oxide Phosphorus trifluoride sulfide tetrafluorophosphorane Tetrafluorohydrazine Sulfur tetrafluoride hexafluoro disiloxane Hexafluordisiloxan (germ.) Nitryl fluoride Hydrogen Hydrogen selenide Phosphorus trihydride Germanium hydride Silane Tin tetrahydride Oxygen OZone Antimony monophosphide Disilicon monophosphide Radon Argon Trifluoroborane Hydrogen bromide Bromopentafluoroethane Chlorotrifluoroethene Trifluoroacetonitrile trifluoromethyl isocyanate trifluoromethyl thiocarbonyl fluoride Trifluormethylthiocarbonylfluorid (germ.) pentafluoro-nitroso-ethane//Pentafluor-nitroso

(trifluoromethyl-carbonyl)-difluoro-amine Hexafluoroethane Bis-trifluorimethyl-nitroxid bis-trifluoromethyl ether bis(trifluoromethyl)tellurium bis(trifluoromethyl) ditelluride

Dec. 23, 2010

015.5 N,N-Difluor-pentafluoraethylamin (germ.) 0156 N-Fluor-bis(trifluorimethyl)-amin (germ.) (O157 N-Fluor-N-trifluormethoxy-perfluorimethylamin

(germ.) 0158 fluoroformylcyanide 0159 1-chloro-1-fluoro-ethene/71-Chlor-1-fluor-aethen// 1-chloro-1-fluoroethylene

(0160 1,1-Difluoroethene 0.161 it trans-1,2-difluoro-ethene/#trans-vinylene dif luoride/(E)-1,2-difluoroethylene/(E)-1,2-difluoro ethene/#trans-vinylene fluoride

0162 1,2-difluoro-ethene/icis-Vinylene difluoride/1.2- Difluor-aethen//vinylene fluoride

0163 it cis-1,2-difluoro-ethene/icis-Vinylene difluo ride/(Z)-1,2-difluoroethylene/ (Z)-1,2-difluoro-ethene/ icis-Vinylene fluoride

(0164. 1,1,1,2-Tetrafluoroethane (0165. 1,1,2,2-Tetrafluoroethane (0166 Fluoroethene (0167. 1,1,1-Trifluoroethane (0168 Ether, methyl trifluoromethyl (0169. Ethene (0170 1,1-Difluoroethane (0171 Fluoroethane 0172 Ethane (0173 fluoro-dimethyl-borane 0.174 Disiloxane, 1,1,3,3-tetrafluoro-1,3-dimethyl-Trif luoroethene

(0175 trifluoroacetaldehyde?/Trifluor-acetaldehyd (0176 Pentafluoroethane (0177. Difluoromethyl trifluoromethyl ether (0178 Tris(trifluoromethyl)bismuth 0179 tetrafluoropropadiene/tetrafluoro-allene/ 1,1,3,3- tetrafluoro-1,2-propadiene

0180 tetrafluorocyclopropene 0181 Perfluoropropionyliodid 0182 pentafluoro-propionitrile?/pentafluoropropiononi trile

0183 hexafluoro-cyclopropane?/Hexafluor-cyclopro pan//freon-iCl216

0.184 Hexafluoropropylene 0185 hexafluoro-1,3dioxolane 0186 Octafluoropropane 0187 Perfluorimethylethylether 0188 1,1-difluoro-propadiene/allenylidene difluoride/ 1,1-difluoro-allene

(0189 2,3,3,3-tetrafluoro-propene/HFO-1234yf 0.190 trans HFO-1234ze (0191 3,3,3-Trifluoropropene 0.192 cyclopropene 0193 Allene 0194 1,1-difluoro-propene/propenylidene difluoride/1. 1-Difluor-propen

(0195 methylketene (0196) 2-fluoropropene (0197) 1-Propene 0198 DL-2-aminopropanoic acid (0199 3,3,3-trifluoro-propyne/3,3,3-Trifluor-propin/trif

luoromethyl-ethyne/3,3,3-trifluoro-1-propyne 0200 1,1,3,3,3-pentafluoro-propene/ 1,1,3,3,3-Pen tafluor-propen

0201 1,2,3,3,3-pentafluoro-propene 0202 1,1,14.4.4-hexafluoro-2-butyne 0203 11,4,4-tetrafluoro-butane-2,3-dione

US 2010/0320428 A1

0204 0205 0206 0207 0208 0209 0210 0211 0212 0213 0214 0215

Trifluormethylhypochlorit Chlor-difluor-methyl-hypofluorit N-Chlor-N-fluor-trifluorimethylamin (germ.) Chlordifluordifluoraminomethan thiocarbonyl difluoride Thiocarbonyldifluorid (germ.) selenocarbonyl difluoride Trifluoroiodomethane N-Fluor-difluorimethanimin (germ.) trifluoro-nitroso-methane/Trifluor-nitroso-methan difluoro-carbamoyl fluoride trifluoro-nitro-methane?/Trifluor-nitro-methan//

fluoropicrin 0216 0217 0218 0219) rigsaeure-trifluormethylester//trifluoromethyl rite

0220 0221) 0222 0223 0224 0225 0226 0227 0228 0229 0230 0231 0232 0233

Tetrafluoromethane Tetrafluorformamidin (germ.) tetrafluorourea hypofluorous acid trifluoromethyl ester/Hypofluo

hypofluo

trifluoromethanesulfonyl fluoride N,N-Difluor-trifluorimethylamin (germ.) Trifluormethyloxydifluoramin (Difluoraminoxy)difluorimethylhypofluorit sulfurcyanide pentafluoride Schwefelcyanid-pentafluorid (germ.) difluoro-trifluoromethyl-phosphine Hexafluormethandiamin perfluoro methylsilane Perfluorimethylsilan (germ.) Trifluormethyl-tetrafluorphosphoran (germ.) Difluoromethane Fluoroiodomethane fluoromethane//methyl fluoride/Fluor-methan//

freon-41 0234 0235 0236 0237) 0238 0239) 0240 0241 0242 0243 0244 0245 0246 0247 0248 0249 0250 0251 0252) 0253 0254 0255 0256 0257 0258 0259 0260 0261 0262 0263

trifluoromethyl-silane"CF3SiH3 methyltrifluorosilane difluoro-methyl-silane fluoro-methyl-silane methylgermane Difluorformimin Trifluoromethane trifluoromethane thiol Trifluormethanthiol (germ.) N.N.,1,1-Tetrafluorimethylamin difluoro dichlorosilane Difluordichlorsilan (germ.) difluoro chlorosilane Difluorchlorsilan (germ.) Phosphorus chloride difluoride Chlorotrifluorosilane Hydrogen chloride Chlorosilane Carbon monoxide Carbon dioxide Carbonyl sulfide Difluoramine trans-Difluorodiazine cis-Difluorodiazine Thionyl fluoride Trifluorosilane Nitrogen trifluoride Trifluoramine oxide thiazyl trifluoride Phosphorus trifluoride

Dec. 23, 2010

0264 0265 0266 0267 0268 0269 0270 0271 0272 0273 0274 0275 0276 (0277 0278 0279 0280

Germanium(IV) fluoride Tetrafluorosilane Phosphorus pentafluoride Selenium hexafluoride Tellurium hexafluoride fluorosilane Nitrosyl fluoride Fluorine nitrate Hydrogen sulfide Ammonia Helium Hydrogen iodide Krypton Nitrogen dinitrogen oxide Neon Nitrogen oxide; and

(0281 Xenon 0282 More preferably, the dielectric compounds can be selected from the group consisting of: (0283 Argon 0284 Trifluoroborane (0285) Hydrogen bromide 0286 Bromopentafluoroethane 0287 Chlorotrifluoroethene 0288 Trifluoroacetonitrile 0289 trifluoromethyl isocyanate 0290 trifluoromethylthiocarbonyl fluoride 0291 Trifluorimethylthiocarbonylfluorid (germ.) 0292 pentafluoro-nitroso-ethane/Pentafluor-nitroso aethan

0293 0294 0295) 0296 0297 0298 0299

(trifluoromethyl-carbonyl)-difluoro-amine Hexafluoroethane Bis-trifluorimethyl-nitroxid bis-trifluoromethyl ether bis(trifluoromethyl)tellurium bis(trifluoromethyl) ditelluride N,N-Difluor-pentafluoraethylamin (germ.)

0300 N-Fluor-bis(trifluorimethyl)-amin (germ.) 0301 N-Fluor-N-trifluormethoxy-perfluorimethylamin (germ.)

(0302) fluoroformylcyanide 0303 1-chloro-1-fluoro-ethene/71-Chlor-1-fluor-aethen// 1-chloro-1-fluoroethylene

0304 1,1-Difluoroethene 0305 it trans-1,2-difluoro-ethenekrans-vinylene difluo ride/7(E)-1,2-difluoroethylene/(E)-1,2-difluoro ethenekrans-vinylene fluoride

0306 1,2-difluoro-ethene/icis-Vinylene difluoride/1.2- Difluor-aethen//vinylene

0307 fluoride 0308 icis-1,2-difluoro-ethene/icis-Vinylene difluo ride/(Z)-1,2-difluoroethylene/ (Z)-1,2-difluoro-ethene/ icis-Vinylene fluoride

0309 1,1,1,2-Tetrafluoroethane 0310 1,1,2,2-Tetrafluoroethane 0311 Fluoroethene 0312 1,1,1-Trifluoroethane 0313 Ether, methyl trifluoromethyl 0314 Ethene 0315 1,1-Difluoroethane 0316 Fluoroethane 0317 Ethane 0318 fluoro-dimethyl-borane

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0319 Disiloxane, 1,1,3,3-tetrafluoro-1,3-dimethyl-Trif luoroethene

0320 0321 0322 0323 0324

trifluoroacetaldehyde?/Trifluor-acetaldehyd Pentafluoroethane Difluoromethyl trifluoromethyl ether Tris(trifluoromethyl)bismuth tetrafluoropropadiene/tetrafluoro-allene?/1,1,3-

tetrafluoro-1,2-propadiene 0325 0326 0327

trile 0328

tetrafluorocyclopropene Perfluoropropionyliodid pentafluoro-propionitrile?/pentafluoropropiononi

hexafluoro-cyclopropane?/Hexafluor-cyclopro pan//freon-iCl216

0329 0330 0331 0332 0333

Hexafluoropropylene hexafluoro-1,3dioxolane Octafluoropropane Perfluormethylethylether 1,1-difluoro-propadiene/allenylidene difluoride/

1,1-difluoro-allene 0334 0335) 0336 0337 0338 0339

2,3,3,3-tetrafluoro-propene/HFO-1234yf trans. HFO-1234ze 3,3,3-Trifluoropropene cyclopropene Allene 1,1-difluoro-propene/propenylidene difluoride/1.

1-Difluor-propen 0340 0341 0342 0343 0344

methylketene 2-fluoropropene 1-Propene DL-2-aminopropanoic acid 3,3,3-trifluoro-propyne/3.3.3-Trifluor-propin/trif

luoromethyl-ethyne/3,3,3-trifluoro-1-propyne (0345 1,1,3,3,3-pentafluoro-propene/1,1,3,3,3-Pen

tafluor-propen 0346) 0347 0348 0349 0350 0351 O352 0353 0354) 0355 0356 0357 0358 0359 0360

1.2.3,3,3-pentafluoro-propene 1.1.1.4.4.4-hexafluoro-2-butyne 1,1,4,4-tetrafluoro-butane-2,3-dione Trifluormethylhypochlorit Chlor-difluor-methyl-hypofluorit N-Chlor-N-fluor-trifluorimethylamin (germ.) Chlordifluordifluoraminomethan thiocarbonyl difluoride Thiocarbonyldifluorid (germ.) selenocarbonyl difluoride Trifluoroiodomethane N-Fluor-difluorimethanimin (germ.) trifluoro-nitroso-methane/Trifluor-nitroso-methan difluoro-carbamoyl fluoride trifluoro-nitro-methane?/Trifluor-nitro-methan//

fluoropicrin 0361 0362 0363 0364

Tetrafluoromethane Tetrafluorformamidin (germ.) tetrafluorourea hypofluorous acid trifluoromethyl ester/Hypofluo

rigsaeuretrifluorimethylester//trifluoromethyl hypofluorite 0365 0366 0367 0368 0369 0370 0371 0372

trifluoromethanesulfonyl fluoride N,N-Difluor-trifluomethylamin (germ.) Trifluormethyloxydifluoramin (Difluoraminoxy)difluorimethylhypofluorit sulfurcyanide pentafluoride Schwefelcyanid-pentafluorid (germ.) difluoro-trifluoromethyl-phosphine Hexafluormethandiamin

Dec. 23, 2010

0373 0374 0375 0376

perfluoro methylsilane Perfluorimethylsilan (germ.) Trifluormethyl-tetrafluorphosphoran (germ.) Difluoromethane

0377 Fluoroiodomethane 0378 fluoromethane/methyl freon-41

0379 trifluoromethyl-silane"CF3 SiH3 (0380 methyltrifluorosilane 0381 difluoro-methyl-silane 0382 fluoro-methyl-silane 0383 methylgermane 0384 Difluorformimin 0385 Trifluoromethane 0386 trifluoromethane thiol (0387 Trifluormethanthiol (germ.) (0388 N.N,1,1-Tetrafluormethylamin 0389 difluoro dichlorosilane 0390 Difluordichlorsilan (germ.) 0391 difluoro chlorosilane 0392. Difluorchlorsilan (germ.) 0393 Phosphorus chloride difluoride 0394 Chlorotrifluorosilane 0395 Hydrogen chloride 0396 Chlorosilane 0397 Carbon monoxide 0398 Carbon dioxide 0399 Carbonyl sulfide 0400. Difluoramine 0401 trans-Difluorodiazine 0402 cis-Difluorodiazine (0403. Thionyl fluoride 04.04 Trifluorosilane 04.05 Nitrogen trifluoride 0406 Trifluoramine oxide (0407 thiazyl trifluoride (0408 Phosphorus trifluoride 04.09 Germanium(IV) fluoride 0410 Tetrafluorosilane 0411 Phosphorus pentafluoride 0412 Selenium hexafluoride 0413 Tellurium hexafluoride 0414 fluorosilane 0415 Nitrosyl fluoride 0416 Fluorine nitrate 0417. Hydrogen sulfide 0418 Ammonia 0419 Helium 0420 Hydrogen iodide 0421 Krypton 0422 Nitrogen 0423 Nitrous oxide 0424 Neon 0425 Nitrogen oxide; and 0426 Xenon 0427. The dielectric gaseous compound is optionally form as an azeotrope, which imparts many advantages in handling the mixture. Preferred mixtures for dielectric gaseous com pound contain one additional gas selected from the group consisting of nitrogen, CO and N.O. 0428 The present disclosure also includes an insulation gas for use in electrical equipment, wherein said insulation gas is a dielectric gaseous compound which exhibits the fol lowing properties: a boiling point in the range between about

fluoride/Fluor-methan//

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-20°C. to about -273°C.; low, preferably non-ozone deplet ing; a GWP less than about 22,200; chemical stability, as measured by a negative standard enthalpy of formation (dHf-0); a toxicity level such that when the dielectric gas leaks, the effective diluted concentration does not exceed its PEL (i.e., Occupational Exposure Limit (OEL or TLV) of at least about 0.3 ppm); and a dielectric strength greater than air. 0429 Preferably, the electrical equipment is at least one selected from the group consisting of gas-insulated circuit breakers and current-interruption equipment, gas-insulated transmission lines, gas-insulated transformers, and gas-insu lated Substations.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

0430. The compounds of the present disclosure are useful in gaseous phase for electrical insulation and for arc quench ing and current interruption equipment used in the transmis sion and distribution of electrical energy. Generally, there are four major types of electrical equipment which the gases of the present disclosure can be used for insulation and/or inter ruption purposes: (1) gas-insulated circuit breakers and cur rent-interruption equipment, (2) gas-insulated transmission lines, (3) gas-insulated transformers, and (4) gas-insulated Substations. Such gas-insulated equipment is a major compo nent of power transmission and distribution systems all over the world. It offers significant savings in land use, is aestheti cally acceptable, has relatively low radio and audible noise emissions, and enables substations to be installed in popu lated areas close to the loads. 0431 Depending on the particular function of the gas insulated equipment, the gas properties which are the most significant vary. 0432 For circuit breakers the excellent thermal conduc

tivity and high dielectric strength of Such gases, along with the fast thermal and dielectric recovery (short time constant for increase in resistivity), are the main reasons for its high interruption capability. These properties enable the gas to make a rapid transition between the conducting (arc plasma) and the dielectric state of the arc, and to withstand the rise of the recovery Voltage. 0433 For gas-insulated transformers the cooling ability, compatibility with sold materials, and partial discharge char acteristics, added to the dielectric characteristics, make them a desirable medium for use in this type of electrical equip ment. The compounds have distinct advantages over oil insu lation, including none of the fire safety problems or environ mental problems related to oil, high reliability, flexible layout, little maintenance, long service life, lower noise, bet ter handling, and lighter equipment. 0434 For gas-insulated transmission lines the dielectric strength of the gaseous medium under industrial conditions is of paramount importance, especially the behavior of the gas eous dielectric under metallic particle contamination, Switch ing and lightning impulses, and fast transient electrical stresses. These gases also have a high efficiency for transfer of heat from the conductor to the enclosure and are stable for long periods of time (e.g., 40 years). These gas-insulated transmission lines offer distinct advantages: cost effective ness, high-carrying capacity, low losses, availability at all Voltage ratings, no fire risk, reliability, and a compact alter native to overhead high Voltage transmission lines in con gested areas that avoids public concerns with overhead trans mission lines.

Dec. 23, 2010

0435 For gas-insulated substations, the entire substation (circuit breakers, disconnects, grounding Switches, busbar, transformers, etc., are interconnected) is insulated with the gaseous dielectric medium of the present disclosure, and, thus, all of the above-mentioned properties of the dielectric gas are significant. 0436 The properties of a dielectric gas that are necessary for its use in high Voltage equipment are many and vary depending on the particular application of the gas and the equipment. 0437 Intrinsic properties are those properties of a gas which are inherent in the physical atomic or molecular struc ture of the gas. These properties are independent of the appli cation or the environment in which a gas is placed. One of the desirable properties of a gaseous dielectric is high dielectric strength (higher, for instance than air). The gas properties that are principally responsible for high dielectric strength are those that reduce the number of electrons which are present in an electrically-stressed dielectric gas. To effect such a reduc tion in the electron number densities, as gas should: (i) be electronegative (remove electrons by attachment over as wide an energy range as possible); it should preferably exhibit increased electron attachment with increasing electron energy and gas temperature since electrons have a broad range of energies and the gas temperature in many applica tions is higher than ambient; (ii) have good electron slowing down properties (slow electrons down so that they can be captured efficiently at lower energies and be prevented from generating more electrons by electron impactionization); and (iii) have low ionization cross section and high ionization onset (prevent ionization by electron impact). Besides the above properties, there are a number of other basic properties which are necessary for the complete characterization of the dielectric gas behavior and its performance in practice, e.g., secondary processes such as electron emission from Surfaces by ion and photon impact; photoprocesses; absorption of photoionizing radiation (this is a controlling factor in dis charge development in non-uniform fields); dissociation under electron impact decomposition; ion-molecule reac tions; reactions with trace impurities; and reactions with Sur faces.

0438. The dielectric gas must also have the following chemical properties: high vapor pressure; high specific heat, high thermal conductivity for gas cooling; thermal stability over long periods of time for temperatures greater than 400° K; chemical stability and inertness with regard to conducting and insulating materials; non-flammable; toxicity acceptable for industrial exposure; and non-explosive. When used in mixtures, it must have appropriate thermodynamic properties for mixture uniformity, composition, and separation. 0439 Extrinsic properties are those which describe how a gas may interact with its Surroundings, or in response to external influences, such as electrical breakdown and dis charges. To be used in electrical applications, a dielectric gas should: (undergo no extensive decomposition; lead to no polymerization; form no carbon or other deposits; and be non-corrosive and non-reactive to metals, insulators, spacers, and seals. In addition it should have: no byproduct with tox icity unacceptable for industrial applications; removable byproducts; and a high recombination rate for reforming itself, especially for arc interruption. Finally, the gas must be environmentally friendly, e.g., it must not contribute to global warming, must not deplete stratospheric oZone, and must not persist in the environment for long periods of time.

US 2010/0320428 A1

0440 Specific properties of the gas under discharge and breakdown conditions include: a high breakdown Voltage under uniform and non-uniform electric fields; insensitivity to Surface roughness or defects and freely moving conducting particles; good insulation properties under practical condi tions; good insulator flashover characteristics; good heat transfer characteristics; good recovery (rate of Voltage recov ery) and self-healing; no adverse reactions with moisture and common impurities; and no adverse effects on equipment, especially on spacers and electrode surfaces. 0441 Specific properties of gaseous insulators for specific electrical equipment is set forth below: Circuit breakers—The most significant required gas proper ties for arc interruption are: (i) high dielectric strength com parable to that of SF; (ii) high thermal conductivity; (iii) fast gas recovery; and (iv) self-healing/dielectric integrity. Gas-insulated transmission lines—The required properties include: (i) high dielectric strength; (ii) high vapor pressure at operating and ambient temperature; (iii) chemical inertness; (iv) high thermal conductivity; (V) no thermal aging; (vi) no deposits; (vii) easily removable, non-harmful byproducts; and (viii) no unacceptable level of hazards (fire, explosion, toxicity, corrosion). Gas-insulated transformers—The properties of the gas required for this application include: (i) high dielectric strength at reasonable pressures (e.g., 500 kPa); (ii) low boil ing point; (iii) acceptably low toxicity; (iv) chemical inert ness; (V) good thermal stability; (vi) non-flammable; (vii) high cooling capability; (viii) good compatibility with Solid materials; (ix) good partial discharge characteristics; (X) use able over a range of temperatures; and (xi) safe, easy to handle, inexpensive and securely available.

Dec. 23, 2010 7

0442. The present inventors have discovered a unique series of dielectric gases for use in electric equipment appli cations, which exhibit many of the aforementioned proper ties, which avoiding the greenhouse problems associated with SF. Such dielectric compounds exhibit at least one of the following properties:

0443 A boiling point in the range between about -20° C. to about -273° C.

0444 Low, preferably, Non-ozone depleting 0445. A GWP less than about 22,200 0446 Chemical stability, as measured by a negative standard enthalpy of formation (dHf-0)

0447. A toxicity level such that when the working gas leaks from equipment at the manufacturer's specified maximum leak rate, the effective diluted concentration does not its PEL, i.e., does not exceed the PEL of that specific compound. In general with minimal ventilation PELs greater than about 0.3 ppm by volume are accept able (i.e., an Occupational Exposure Limit (OEL or TLV) of at least about 0.3 ppm). OSHA sets enforceable permissible exposure limits (PELs) to protect workers against the health effects of exposure to hazardous Sub stances. OSHA PELs are based on an 8-hour time weighted average (TWA) exposure. Approximately 500 PELs have been established. Existing PELs are con tained in 29 CFR 1910.1000, the air contaminants stan dard. Most PELS are listed in 29 CFR 1910.1000, Table Z-1, and 29 CFR 1910.1000, Table Z-2.

0448. A dielectric strength greater than air. 0449 These unique dielectric gases are at least one gas selected from the group consisting of those set forth in Table 1 below:

TABLE 1

MY Name CAS MW BP(° C.)

Arsenic pentafluoride 7784-36-3 169.91 -52.8 Arsine 7784-42-1 77.95 -62.2 Diboron tetrafluoride 13965-73-6 97.61 -34.2 Diborane 19287-45-7 27.67 -92.3 Perchloric acid, 2-chloro- 38126-28-2 234.92 -95.0 1,1,2,2-tetrafluoroethyl ester (9CI) Perchloric acid, 1,2,2- 38126-29-3 267.83 -350 trichloro-1,2-difluoroethyl eSe:

Trifluoroacetyl chloride 354-32-5 32.47 -27.O trifluoromethylisocyanide 1948O-O1-4 95.02 -84.0 (CF3 NC) trifluoromethyl isocyanide 1948O-O1-4 95.02 -350 trifluoro-nitroso- 2713-04-4 11.02 -23.7 ethene Trifluor-nitroso aethen Tetrafluoroethene 116-14-3 OO.O2 -75.6 3,3,4,4-tetrafluoro-3,4- 694-60-0 28.03 -36.O dihydro-1,2diazete (Difluoramino)difluoracetonitril 5131-88-4 28.03 -32.0 Tetrafluorooxirane 694-17-7 16.01 -63.5 Trifluoroacetyl fluoride 354-34-7 16.01 -59.O Perfluorimethylfluorformiat 3299-24-9 32.01 -33.O trifluoro-acetyl hypofluorite 359-46-6 32.01 -2SO

perfluoro-2-azal-1-propene 33.02 -34.0 Perfluor-2-azal-1-propen (germ.)

N-Fluor-tetrafluor-1- 758-35-0 33.02 -32.0 aethanimin (germ.) 3,3-difluoro-2- 6O247-20-3 49.02 -34.8 trifluoromethyl-oxaziridine

US 2010/0320428 A1

Dielectric Compound

CBrFO CCIF2NO

Structure

NCCN FCCCF3

CF3- O O. Cl COCIF

CF3- N N N

TABLE 1-continued

Name

bis-trifluoromethyl diazene, hexafluoro-icist azomethane Fluoroxypentafluoroethane bis-trifluoromethyl peroxide 1

Bis(fluoroxy)tetrafluoroaethan Hexafluorodimethylsulfide 3-fluoro-3HH-diazirine-3- carbonitrile Ethyne 2,2-trifluoro-aziridine

Ketene (difluoro)vinylboran (Difluor)vinylboran (germ.) trifluoro-vinyl-silane Ethinylsilan ethyl-difluor-borane Ethyl-difluor-boran (germ.) methyl-methylen-amine Dimethyl ether vinyl-silane Dimethylsilane Chloroethyne fluoroethyne?/fluoro acetylene Ethanedinitrile etrafluoropropyne? (1,3,3,3- etrafluoropropyne hexafluoro-oxetane Trifluoro(trifluoromethyl)oxirane ,1,1,3,3,3- Hexafluoropropanone pentafluoro-propionyl fluoride?/perfluoropropionyl fluoride Trifluoromethyl trifluorovinyl ether -Propyne

Cyclopropane Propane Trimethylborane cyanoketene butatriene Cyano-bispentafluorethyl phosphin Trimethyl-1,1,2,2- etrafluorethylsilan methyl diborane Methyldiboran (germ.) carbonyl bromide fluoride chloro-difluoro-nitroso methane, Chlor-difluor nitroso-methan chloroperoxytrifluoromethane carbonylchlorid-fluorid Carbonychloridifluorid (germ.) 3,3-difluoro-3#H-diazirine difluoro diazomethane Difluordiazomethan (germ.) Carbonyl fluoride Difluordioxiran difluoro-(3-fluoro-3#H- diazirin-3-yl)-amine trifluoromethylazide Trifluormethylazid (germ.) tetrafluoro-diaziridine Fluorperoxytrifluormethan Bis(fluoroxy)difluormethan Trifluormethyl phosphonylfluorid

CAS

372-63-4

3848-94-O 927-84-4 16329-92-3

371-78-8 4849-85-8

74-86-2 1514-44-9 463-51-4 358-95-2

421-24-9 1066-27-9 430-41-1

1761-67-7 115-1O-6 7291-09-0 1111-74-6 593-63-5 2713-09-9

460-19-5 2O174-11-2

425-82-1 428-59-1 684-16-2

422-61-7

1187-93-5

74-99-7 75-19-4 74-98-6 593-90-8 4452-08-8 2873-SO-9 35449-90-2

4168-08-5

23777-55-1

753-56-0 421-13-6

327SS-26-3 353-49-1

693-85-6 814-73-3

3S3-SO-4 96.740-99-7 4823-43-2

3802-95-7

17224-09-8 34511-13-2 16282-67-0 19162-94-8

MW

166.03

154.01 170.01 170.01

170.08 85.04

26.04 97.04 42.04 7585

112.13 56.14 77.87

43.07 46.07 58.15 60.17 6048 44.O3

S2O3 112.03

16602 16602 16602

16602

16602

40.06 42.08 44.10 55.92 67.05 52.08

295.02

174.21

41.70

126.91 115.47

136.46 82.46

78.02 78.02

66.O1 82.O1

111.03

110.03

116.02 120.00 120.00 153.98

-20.0

-50.O -40.0 -350

-22.2 -30.O

-84.7 -24.0 -49.8 -38.8

-2SO -22.4 -2SO

-350 -24.8 -22.8 -20.2 -30.2

-105.0

-21.2 -50.O

-38.O -27.4 -27.3

-27.O

-26.0

-23.2 -32.8 -42.0 -20.2 -34.0 -78.O -78.O

-72.O

-350

-20.6 -350

-22.0 -46.0

-91.3 -91.3

-84.6 -85.O -36.0

-285

-350 -69.4 -64.0 -20.1

Dec. 23, 2010

US 2010/0320428 A1

Dielectric Compound

C CH2O C

C 7

Structure

F2CH O NO F3COH HFCO HOCN C2 CIF

F2 SF2H2 OF2 FOOF SO2F2 SF2 POF3

PSF3

C

C

TABLE 1-continued

Name

Cyanogen fluoride Trifluormethylphosphane (germ.) Diazomethane formaldehyde?/Formalin (methyl)difluoroborane (Methyl)difluorboran (germ.) Chloromethane

CAS

1495-SO-7 420-52-0

334-88-3 SO-OO-O 373-64-8

74-87-3 methylphosphonous acid difluoride? difluoro

methyl-phosphine trifluoro-methoxy-silane Methylhypofluorid Methane Methylsilane #Sil-bromo-#SilitSi!'- methanediyl-bis-silane #Si!-iodo-#SilitSi!'- methanediyl-bis-silane Difluorimethylnitrit trifluoromethanol Formyl fluoride Cyanic acid Chlorine Chlorine fluoride Chlorine trioxide fluoride carbon oxide selenide? Kohlenoxidselenid Fluorine Difluorosilane Fluorine oxide fluorine peroxide Sulfuryl fluoride sulphur difluoride Phosphorus trifluoride oxide Phosphorus trifluoride sulfide etrafluorophosphorane Tetrafluorohydrazine Sulfur tetrafluoride hexafluoro disiloxane Hexafluordisiloxan (germ.) Nitryl fluoride Hydrogen Hydrogen selenide Phosphorus trihydride Germanium hydride Silane Tin tetrahydride Oxygen Ozone Antimony monophosphide Disilicon monophosphide Radon Argon Trifluoroborane Hydrogen bromide Bromopentafluoroethane Chlorotrifluoroethene Trifluoroacetonitrile trifluoromethyl isocyanate

pentafluoro-nitroso ethane, Pentafluor-nitroso aethan (trifluoromethyl-carbonyl)- difluoro-amine Hexafluoroethane Bis-trifluormethyl-nitroxid bis-trifluoromethyl ether bis(trifluoromethyl)tellurium

25711-11-9 36336-08-0 74-82-8 992-94-9 56962-86-8

56962-87-9

1493-06-7 1493-11-4 1493-02-3 420-05-3 7782-50-5 7790-89-8 7616-94-6 603-84-5

7782-41-4 3824-36-7

3814-25-0 3478-20-1

3659-66-0 OO36-47-2

7783-60-0 451 S-39-0

OO22-SO-1 333-74-0

7783-07-5 78O3-51-2 7782-65-2 78O3-62-5 24O6-52-2 7782-44-7 10O28-15-6 l8

l8

10043-92-2 7440-37-1 7637-07-2 10O3S-1O-6 354-55-2 79-38-9 353-85-5 460-49-1

trifluoromethylthiocarbonyl fluoride Trifluormethylthiocarbonylfluorid (germ.)

354-72-3

32822-49-4

76-1 6-4 2154-71-4 1479–49-8 SS642-42-7

MW

45.02 102.00

42.04 30.03 63.84

116.11 SO.O3 16.04 46.14 1SS.14

2O2.14

97.02 86.O1 48.02 43.03 70.91 S4.45

102.45 106.97

38.00 68.10 S400 7O.OO

102.06 70.06

103.97

120.03

107.98 104.01 108.OS 186.16

6S.OO 2.02

80.98 34.00 76.62 32.12

122.72 32.00 48.00 152.72 87.14

222.00 39.95 67.81 80.91

198.92 116.47 95.02

111.02 132.08

149.02

149.02

138.01 168.02 154.01 265.61

-46.2 -26.5

-23.2 -21.0 -62.3

-24.2 -28.0

-78.O -33.O

-161.5 -56.9 -64.0

-49.0

-20.0 -20.0 -26.5 -64.2 -34.0

-101.0 -46.7 -21.7

-1882 -77.8

-144.7 -57.O -SS3 -350 -39.7

-52.3

-37.O -74.2 -40.5 -23.0

-72.3 -2529

-87.8 -88.2

-112.2

-183.0 -111.3 -52.3 -52.3

-1859 -101.2 -66.7

-28.4 - 68.8 -36.0

-45.7

-78.2 -20.0 -59.O -98.0

Dec. 23, 2010

US 2010/0320428 A1

Dielectric Compound

CF

CFSN

FSNO FSNO2 FSNS

CFSP

Structure

CH2CFCH3 CH2CHCH3

11

TABLE 1-continued

Name CAS

Allene 463-49-O 1,1-difluoro- 430-63-7 propenef propenylidene difluoride? 1,1-Difluor propen methylketene 6004-44-0 2-fluoropropene 1184-60-7 -Propene 115-07-1 DL-2-aminopropanoic acid 302-72-7 3,3,3-trifluoro- 661-54-1 propyne? (3,3,3-Trifluor propini?trifluoromethyl ethyne? (3,3,3-trifluoro-1- propyne 1,1,3,3,3-pentafluoro- 690-27-7 propenef, 1,1,3,3,3- Pentafluor-propen ,2,3,3,3-pentafluoro- 22S2-83-7

propene 1,144.4-hexafluoro-2- 692-SO-2

butyne 144-tetrafluoro-butane

2,3-dione

Trifluormethylhypochlorit 22082-78-6 Chlor-difluor-methyl- 2O614-17-9 hypofluorit N-Chlor-N-fluor- 1388O-72-3 trifluorimethylamin (germ.) Chlordifluordifluoraminomethan 13880-71-2 thiocarbonyl difluoride 420-32-6 Thiocarbonyldifluorid (germ.) selenocarbonyl difluoride 54393-39-4 Trifluoroiodomethane 2314-97-8 N-Fluor-difluorimethanimin 338-66-9 (germ.) trifluoro-nitroso- 334-99-6 methane, Trifluor-nitroso (8.

difluoro-carbamoyl fluoride 2368-32-3 trifluoro-nitro- 335-02-4 methane, Trifluor-nitro methan fluoropicrin Tetrafluoromethane 75-73-0 Tetrafluorformamidin 14362-70-0 (germ.) tetrafluorourea 10256-92-5

hypofluorous acid trifluoromethyl ester? Hypofluorigsaeure

trifluormethylesteri?trifluoromethyl hypofluorite

trifluoromethanesulfonyl 335-05-7 fluoride N,N-Difluor- 335-01-3 trifluorimethylamin (germ.) Trifluormethyloxydifluoramin 4217-93-O (Difluoraminoxy)difluorimethylhypofluorit 36781-60-9 Sulfurcyanide pentafluoride 1512-13-6 Schwefelcyanid pentafluorid (germ.) difluoro-trifluoromethyl- 1112-04-5 phosphine Hexafluorimethandiamin 4394-93-8 perfluoro methylsilane 335-06-8 Perfluorimethylsilan (germ.) Trifluormethyl- 1184-81-2 tetrafluorphosphoran (germ.) Difluoromethane 75-10-5 Fluoroiodomethane 373-53-5

MW

40.06 78.06

56.06 60.07 42.08 89.09 94.04

32.03

32.03

62.03

58.05

14.10 20.46 20.46

37.46

37.46 82.O7

28.97 95.91 83.O1

99.01

99.01 1S.O1

88.00 16.02

32.02 O4.00

52.07

21.01

37.01 53.01 53.08

37.98

54.01 54.09

75.97

-34.5 -29.O

-23.0 -24.0 -47.7 -50.2 -48.0

-21.0

-20.0

-24.6

-81.0

-33.O -47.0 -2SO

-32.8

-28.0 -46.0

-28.0 -21.8

-101.0

-86.0

-52.O -33.6

-128.1 -30.O

-20.0 -95.0

-21.7

-7S.O

-59.8 -29.O -2SO

-43.0

-37.O -42.0

-350

-51.7 -53.8

Dec. 23, 2010

US 2010/0320428 A1

Dielectric Compound

C

C

H3S CO CO2

HI

N2 N2O Ne NO

0450

Structure

SCF3 HCI SH3C CO CO2 OCS NHF2

12

TABLE 1-continued

Name

fluoromethanet methyl fluoride, Fluor methan freon-41 trifluoromethyl-silane" CF3SH3 methyltrifluorosilane difluoro-methyl-silane fluoro-methyl-silane methylgermane Difluorformimin Trifluoromethane trifluoromethane thiol Trifluormethanthiol (germ.) N,N,1,1- Tetrafluormethylamin difluoro dichlorosilane Difluordichlorsilan (germ.) difluoro chlorosilane Difluorchlorsilan (germ.) Phosphorus chloride difluoride Chlorotrifluorosilane Hydrogen chloride Chlorosilane Carbon monoxide Carbon dioxide Carbonyl sulfide Difluoramine trans-Difluorodiazine cis-Difluorodiazine Thionyl fluoride Trifluorosilane Nitrogen trifluoride Trifluoramine oxide thiazyl trifluoride Phosphorus trifluoride Germanium(IV) fluoride Tetrafluorosilane Phosphorus pentafluoride Selenium hexafluoride Tellurium hexafluoride fluorosilane Nitrosyl fluoride Fluorine nitrate Hydrogen sulfide Ammonia Helium Hydrogen iodide Krypton Nitrogen dinitrogen oxide Neon Nitrogen oxide Xenon

The preferred dielectric compounds are selected from the group consisting of those set forth in Table 2 below:

Dielectric Compound Structure

TABLE 2

Name

Argon Trifluoroborane Hydrogen bromide Bromopentafluoroethane Chlorotrifluoroethene Trifluoroacetonitrile

CAS

593-53-3

1O112-11-5

373-74-0 420-34-8 753-44-6

493-15-8

24708-53-0

8356-71-3

4335-40-1

4049-36-6 7647-01-0 346S-78-6

630-08-0 24-38-9

463-58-1 O4OS-27-3 3776-62-0 3812-43-6

7783-42-8 3465-71-9

7783-54-2 3847-6S-9 5930-75-3

7783-55-3 7783-58-6 7783-61-1 7647-19-0 7783-79-1 7783-80-4 13537-33-2 7789-25-5 7789-26-6 7783-06-4 7664-41-7 7440-59-7 10O34-85-2 7439-90-9 7727-37-9 10O24-97-2 7440-01-9 10102-43-9 7440-63-3

CAS

7440-37-1 7637-07-2 10O3S-1O-6 354-55-2 79-38-9 353-85-5

MW

34.03

100.12

100.12 82.12 64.13 90.65 6S.O2 70.01

102.08

103.02

136.99

102.56

104.42

120.53 36.46 66.56 28.01 44.01 60.07 53.01 66.O1 66.O1 86.06 86.09 71.OO 87.OO

103.07 87.97

148.58 104.08 12597 192.95 241.59 SO.11 49.00 81.00 34.08 17.03 4.OO

127.91 83.80 28.01 44.01 20.18 30.01

131.29

MW

39.95 67.81 80.91

198.92 116.47 95.02

-78.3

-383

-30.O -35.6 -44.0 -23.0 -22.0 -82.1 -36.7

-43.0

-31.8

-50.O

-47.3

-702 -85.O -303 -1915 -78.4 -50.3 -23.2

-111.5 -105.8 -43.8 -95.2

-129.1 -87.5 -27.1

-101.5 -36.5 -86.0 -84.5 -46.5 -38.8 -98.0 -59.9 -46.2 -59.5 -33.3

-268.9 -35.6 -1534 -1958 -88.5

-246.1 -151.8 -108.1

-1859 -101.2 -66.7 -21.0 -28.4 - 68.8

Dec. 23, 2010

US 2010/0320428 A1

Dielectric Compound

FSNO

HFSO

FSIO FSN

Structure

C

CF2-CH2 CHF CHF

FHC-CHF

CHF CHF

13

TABLE 2-continued

Name CAS

trifluoromethyl isocyanate 460-49-1 trifluoromethylthiocarbonyl fluoride

Trifluormethylthiocarbonylfluorid (germ.) pentafluoro-nitroso- 354-72-3 ethane, Pentafluor-nitroso aethan (trifluoromethyl-carbonyl)- 32822-49-4 difluoro-amine Hexafluoroethane 76-1 6-4 Bis-trifluorimethyl-nitroxid 2154-71-4 bis-trifluoromethyl ether 1479–49-8 bis(trifluoromethyl)tellurium SS642-42-7 bis(trifluoromethyl) 1718-20-3 ditelluride N,N-Difluor- 3S4-8O-3 pentafluoraethylamin (germ.) N-Fluor-bis(trifluorimethyl)- 359-62-6 amin (germ.) N-Fluor-N-trifluormethoxy- 4217-92-9 perfluorimethylamin (germ.) fluoroformyl cyanide 683-55-6 1-chloro-1-fluoro-ethene, 1- 2317-91-1 Chlor-1-fluor-aethen 1 chloro-1-fluoroethylene 1,1-Difluoroethene 75-38-7 #trans-1,2-difluoro- 1630-78-0 ethenefiti trans-vinylene difluoride? (E)-1,2- difluoroethylene/(E)-1,2- difluoro-ethenefiti trans vinylene fluoride 1,2-difluoro-ethenefiticist- 1691-13-O vinylene difluoride?/1,2- Difluor-aethen vinylene fluoride #cis-1,2-difluoro- 1630-77-9 ethenefiticist-vinylene

difluoroethylene, f(Z)-1,2- difluoro-ethenefiticist vinylene fluoride ,1,1,2-Tetrafluoroethane 811-97-2 1.22-Tetrafluoroethane 359-35-3

Fluoroethene 75-02-5 1,1-Trifluoroethane 420-46-2

Ether, methyl 421-14-7 trifluoromethyl Ethene 74-85-1 ,1-Difluoroethane 75-37-6 Fluoroethane 3S3-36-6 Ethane 74-84-O fluoro-dimethyl-borane 353-46-8 Disiloxane, 1,1,3,3- 63O89-45-2 etrafluoro-1,3-dimethyl Trifluoroethene 359-11-5 trifluoroacetaldehyde?/Trifluor- 75-90-1 acetaldehyd Pentafluoroethane 354-33-6 Difluoromethyl 3822-68-2 trifluoromethyl ether Tris(trifluoromethyl)bismuth S863-80-9 etrafluoropropadienefitetrafluoro- 461-68-7 allene? (1,1,3,3- etrafluoro-1,2-propadiene etrafluorocyclopropene 19721-29-O Perfluoropropionyliodid 137741-03-8 pentafluoro- 422-04-8 propionitrile pentafluoropropiononitrile hexafluoro- 931-91-9 cyclopropane? Hexafluor cyclopropan freon-#C216

MW

11.02 32.08

49.02

71.02

87.02

7303 80.49

64.03 64.03

64.03

64.03

102.03 102.03 46.04 84.04

100.04

28.05 66.OS 4806 30.07 59.88

178.23

82O2 98.02

120.02 136.02

416.00 112.03

112.03 273.93 145.03

-36.0 -21.0

-45.7

-21.1

-78.2 -20.0 -59.O -98.0 -53.O

-38.O

-37.O

-2SO

-21.0 -2S.S

-85.7 -53.1

-28.0

-26.0

-26.1 -23.0 -72.2 -47.3 -24.0

-103.7 -24.0 -37.7 -88.6 -44.0 -39.O

-51.O -21.0

-48.1 -35.3

-20.0 -27.O -350

-33.O

Dec. 23, 2010

US 2010/0320428 A1

Dielectric Compound

CFSN

Structure

CH2CFCH3 CH2CHCH3

14

TABLE 2-continued

Name CAS

Hexafluoropropylene 116-15-4 hexafluoro-1,3dioxolane 21297-65-4 Octafluoropropane 76-19-7 Perfluormethylethylether 665-16-7 1,1-difluoro- 430-64-8 propadiene fallenylidene difluoride? 1,1-difluoro allene 2,3,3,3-tetrafluoro- 754-12-1 propene/HFO-1234yf EranSHFO-1234ze 3,3,3-Trifluoropropene 677-21-4 cyclopropene 2781-85-3 Allene 463-49-O

1-difluoro- 430-63-7 propenef propenylidene difluoride? 1,1-Difluor Oel

methylketene 6004-44-0 2-fluoropropene 1184-60-7 -Propene 115-07-1 DL-2-aminopropanoic acid 302-72-7 3,3,3-trifluoro- 661-54-1 propyne? (3,3,3-Trifluor propini?trifluoromethyl ethyne? (3,3,3-trifluoro-1- propyne 1,1,3,3,3-pentafluoro- 690-27-7 propenef 1,1,3,3,3- Pentafluor-propen ,2,3,3,3-pentafluoro- 22S2-83-7

propene 1,144.4-hexafluoro-2- 692-SO-2

butyne 144-tetrafluoro-butane

2,3-dione

Trifluormethylhypochlorit 22082-78-6 Chlor-difluor-methyl- 2O614-17-9 hypofluorit N-Chlor-N-fluor- 1388O-72-3 trifluorimethylamin (germ.) Chlordifluordifluoraminomethan 13880-71-2 thiocarbonyl difluoride 420-32-6 Thiocarbonyldifluorid (germ.) selenocarbonyl difluoride 54393-39-4 Trifluoroiodomethane 2314-97-8 N-Fluor-difluorimethanimin 338-66-9 (germ.) trifluoro-nitroso- 334-99-6 methane, Trifluor-nitroso methan difluoro-carbamoyl fluoride 2368-32-3 trifluoro-nitro- 335-02-4 methane, Trifluor-nitro methan fluoropicrin Tetrafluoromethane 75-73-0 Tetrafluorformamidin 14362-70-0 (germ.) tetrafluorourea 10256-92-5

hypofluorous acid trifluoromethyl ester? Hypofluorigsaeure

trifluormethylesteri?trifluoromethyl hypofluorite

trifluoromethanesulfonyl 335-05-7 fluoride N,N-Difluor- 335-01-3 trifluorimethylamin (germ.)

MW

1SO.O2 182O2 18802 2O4.02 76.05

114.04

114.04 96.OS 40.06 40.06 78.06

56.06 60.07 42.08 89.09 94.04

32.03

32.03

62.03

58.05

14.10 20.46 20.46

37.46

37.46

28.97 95.91 83.O1

99.01

99.01 115.01

88.00 116.02

132.O2 104.00

152.07

121.01

-29.6 -22.1 -36.7 -20.0 -21.0

-28.3

-19.0 -2SO -36.0 -34.5 -29.O

-23.0 -24.0 -47.7 -50.2 -48.0

-21.0

-20.0

-24.6

-81.0

-33.O -47.0 -2SO

-32.8

-28.0 -46.0

-28.0 -21.8

-101.0

-86.0

-52.O -33.6

-128.1 -30.O

-20.0 -95.0

-21.7

Dec. 23, 2010

US 2010/0320428 A1

Dielectric Compound

CFSNO CFSNO2 CFSNS

CFSP

C

C

C

N2 N2O Ne NO Xe

Structure

SCF3 HCI SH3C CO CO2 OCS NHF2 FNNF FNNF F2SO SHF3 NF3 NOF3 NSF3 PF3 GeF4 SF4 PF5 SeF6 TeF6 SH3F

H2S NH3 He HI

N2 NON Ne NO Xe

15

TABLE 2-continued

Name

Trifluormethyloxydifluoramin (Difluoraminoxy)difluorimethylhypofluorit Sulfurcyanide pentafluoride Schwefelcyanid pentafluorid (germ.) difluoro-trifluoromethyl phosphine Hexafluorimethandiamin perfluoro methylsilane Perfluormethylsilan (germ.) Trifluormethyl etrafluorphosphoran (germ.) Difluoromethane Fluoroiodomethane fluoromethanet methyl fluoride, Fluor methan freon-41 trifluoromethyl-silane" CF3SH3 methyltrifluorosilane ifluoro-methyl-silane fluoro-methyl-silane methylgermane Difluorformimin rifluoromethane

trifluoromethane thiol Trifluormethanthiol (germ.) N,N,1,1- Tetrafluormethylamin ifluoro dichlorosilane

Difluordichlorsilan (germ.) ifluoro chlorosilane

Difluorchlorsilan (germ.) Phosphorus chloride ifluoride

Chlorotrifluorosilane Hydrogen chloride Chlorosilane Carbon monoxide Carbon dioxide Carbonyl sulfide Difluoramine trans-Difluorodiazine cis-Difluorodiazine Thionyl fluoride Trifluorosilane Nitrogen trifluoride Trifluoramine oxide hiaZyl trifluoride Phosphorus trifluoride Germanium(IV) fluoride Tetrafluorosilane Phosphorus pentafluoride Selenium hexafluoride Tellurium hexafluoride fluorosilane Nitrosyl fluoride Fluorine nitrate Hydrogen sulfide Ammonia

Hydrogen iodide Krypton Nitrogen Nitrous oxide Neon Nitrogen oxide Xenon

CAS

4217-93-O 36781-60-9 1512-13-6

1112-04-5

4394-93-8 335-06-8

1184-81-2

75-10-5 373-53-5 593-53-3

1O112-11-5

373-74-0 420-34-8 753-44-6

493-15-8

24708-53-0

8356-71-3

4335-40-1

4049-36-6 7647-01-0 346S-78-6

630-08-0 24-38-9

463-58-1 O4OS-27-3 3776-62-0 3812-43-6

7783-42-8 3465-71-9

7783-54-2 3847-6S-9 5930-75-3

7783-55-3 7783-58-6 7783-61-1 7647-19-0 7783-79-1 7783-80-4 13537-33-2 7789-25-5 7789-26-6 7783-06-4 7664-41-7 7440-59-7 10O34-85-2 7439-90-9 7727-37-9 10O24-97-2 7440-01-9 10102-43-9 7440-63-3

MW

37.01 53.01 53.08

37.98

54.01 54.09

75.97

S2O2 59.93 34.03

OO.12

OO.12 82.12 64.13 90.65 6S.O2 70.01

102.08

103.02

136.99

102.56

104.42

120.53 36.46 66.56 28.01 44.01 60.07 53.01 66.O1 66.O1 86.06 86.09 71.OO 87.OO

103.07 87.97

148.58 104.08 12597 192.95 241.59 SO.11 49.00 81.00 34.08 17.03 4.OO

127.91 83.80 28.01 44.01 20.18 30.01

131.29

-59.8 -29.O -2SO

-43.0

-37.O -42.0

-350

-51.7 -53.8 -78.3

-383

-30.O -35.6 -44.0 -23.0 -22.0 -82.1 -36.7

-43.0

-31.8

-50.O

-47.3

-702 -85.O -303 -1915 -78.4 -50.3 -23.2

-111.5 -105.8 -43.8 -95.2

-129.1 -87.5 -27.1

-101.5 -36.5 -86.0 -84.5 -46.5 -38.8 -98.0 -59.9 -46.2 -59.5 -33.3

-268.9 -35.6 -1534 -1958 -88.5

-246.1 -151.8 -108.1

Dec. 23, 2010

US 2010/0320428 A1

0451. The aforementioned dielectric compounds may be used in pure form, but can also be used as part of an azeotrope, or a mixture with an appropriate second gas, i.e., nitrogen, CO or NO. 0452 Particularly preferred non-electrical properties for dielectric gases according to the present disclosure, include:

0453 0454 Chemically stable—decomposition temperature must be higher than hot spot temperature in equipment, e.g., T 200° C., and gas should not decompose in partial discharge spark (approximately 1000 K)

0455 Low environmental impact, i.e., little to no destruction of ozone layer ODP=0; and low global warming impact GWP less than SF

0456. Acceptably low toxicity of gas and discharge byproducts

0457 Electrical equipment property requirements for dielectric gases according to the present disclosure, include:

0458 Insulation specific criteria include a critical field of E, and no conducting decomposition products should be generated by discharge

0459 Switching specific criteria include high critical field of E, arcing stability, i.e., a gas must recombine to original molecular structure after being decomposed in switching arc (Gibbs free energy of reaction is <0)

0460 Specific thermal interruption performance, i.e., must be able to interrupt current flow at accurrent Zero

0461 Arc erosion product from equipment and gas must not form conduction deposits

Non-liquefying, e.g., T. less than -20°C.

0462 Low velocity of sound

Example 1

0463 Measurements of the dielectric strength of potential alternatives were determined using ASTM D2477 or obtained from literature. These measurements were performed at 1 atmosphere pressure across a 0.1 inch gap and at ambient temperature. 0464. In the intended applications, the gas will not be at 1 atmosphere pressure but at a higher pressure. In this example 5 atmospheres pressure is used as a maximum pressure. If the gas liquefies at a lower pressure than that pressure was used. These gases have higher dielectric strengths and break down Voltages than air. Using 5 atmospheres (73.5 psia) pressure as the upper pressure (rating of the equipment).

Breakdown voltage Dielectric strength Pressure at maximum pressure

Gas kVO.1 inch gap (psia) (kVO.1 inch gap)

Air 4.75 73.5 23.75 R143a 5.8 73.5 29 R152a. 5.9 73.5 29.5 R12S 6.4 73.5 32 R134a 6.6 73.5 33 R22 7.2 73.5 39.9 R124 10.4 55.5 39.3 SF6 14.O 73.5 70 C318 16.O 45.3 49.3 R115 16.O 73.6 8O R114 17.0 31.1 36

Dec. 23, 2010

Example 2 0465. The dielectric strength of additional gases is mea Sure at 1 atmosphere and at the maximum system pressure. Their breakdown voltages are found to be greater then air, which allows Smaller gaps and therefore Smaller equipment then would be need if air was used. Here the measurements were performed on CTFE (Chlorotrifluoroethylene), HCl (hydrogen chloride) and SiF4 (silicon tetrafluoride). 0466 Having described the invention in detail by refer ence to the preferred embodiments and specific examples thereof, it will be apparent that modifications and variations are possible without departing from the spirit and scope of the disclosure and claims. What is claimed is: 1. A method of using a gaseous dielectric compound to

insulate electrical equipment comprising the steps of: providing electrical equipment configured to have an insu

lation gas; and placing an insulation gas in the electrical equipment, the

insulation gas comprising a gaseous compound; wherein the gaseous compound is selected to have each of

the following properties: a boiling point in the range between about -20° C. to

about -273° C.; a GWP less than about 22,200; chemical stability, as measured by a negative standard

enthalpy of formation (dHf-0); a toxicity level Such that when the dielectric gas leaks,

the effective diluted concentration does not exceed its PEL in the working environment; and

a dielectric strength greater than air. 2. The method of claim 1, wherein the gaseous compound

is selected from the group consisting of Arsenic pentaflouride; Arsine; Diboron tetrafluoride; Diborane; Perchloric acid, 2-chloro-1,1,2,2-tetrafluoroethyl ester

(9CI): Perchloric acid, 1.2.2-trichloro-1,2-difluoroethyl ester; Trifluoroacetyl chloride: trifluoromethylisocyanide (CF3-NC); trifluoromethyl isocyanide; trifluoro-nitroso-ethene; Tetrafluoroethene; 3,3,4,4-tetrafluoro-3,4-dihydro-1,2diazete; (Difluoramino)difluoracetonitril; Tetrafluorooxirane; Trifluoroacetyl fluoride; Perfluorimethylfluorformiat; trifluoro-aceryl hypofluorite: perfluoro-2-aza-1-propene; Perfluor-2-aza-1-propen (germ.); N-Fluor-tetrafluor-1-aethanimin (germ.); 3.3-difluoro-2-trifluoromethyl-oxaziridine: bis-trifluoromethyl-diazene: Fluoroxypentafluoroethane: bis-trifluoromethyl peroxide: 1,1-Bis(fluoroxy)tetrafluoroaethan; Hexafluorodimethyl sulfide: 3-fluoro-3HH-diazirine-3-carbonitrile; Ethyne; 1.2.2-trifluoro-aziridine; Ketene;

US 2010/0320428 A1

(difluoro)vinylboran; (Difluor) vinylboran (germ.); trifluoro-vinyl-silane; Ethinylsilan; ethyl-difluor-borane; Ethyl-difluor-boran (germ.); methyl-methylen-amine; Dimethyl ether; vinyl-silane; Dimethylsilane; Chloroethyne; fluoroethyne; Ethanedinitrile; 1,3,3,3-tetrafluoropropyne; hexafluoro-oxetane; Trifluoro(trifluoromethyl)oxirane: 1,1,1,3,3,3-Hexafluoropropanone; pentafluoro-propionyl fluoride; Trifluoromethyl trifluorovinyl ether; 1-Propyne; Cyclopropane; Propane; Trimethylborane; Cyanoketene; Butatriene; Cyano-bispentafluorethyl-phosphin; Trimethyl-1,1,2,2-tetrafluorethylsilan; methyl diborane; Methyldiboran (germ.); carbonyl bromide fluoride: chloro-difluoro-nitroso-methane; chloroperoxytrifluoromethane; carbonylchlorid-fluorid; Carbonychloridifluorid (germ.); 3,3-difluoro-3HH-diazirine; difluoro diazomethane; Difluordiazomethan (germ.); Carbonyl fluoride; Difluordioxiran; difluoro-(3-fluoro-3#H!-diazirin-3-yl)-amine; trifluoromethylazide: Trifluormethylazid (germ.); tetrafluoro-diaziridine; Fluorperoxytrifluorimethan; Bis(fluoroxy)difluorimethan; Trifluormethyl-phosphonylfluorid; Cyanogen fluoride; Trifluorimethylphosphane (germ.); Diazomethane; formaldehyde; (methyl)difluoroborane; (Methyl)difluorboran (germ.); Chloromethane; methylphosphonous acid difluoride; trifluoro-methoxy-silane; Methylhypofluorid; Methane; Methylsilane #Sil-bromo-i-SiliSi!'-methanediyl-bis-silane; #Si!-iodo-it-Sili Si'-methanediyl-bis-silane; Difluormethylnitrit; Trifluoromethanol: Formyl fluoride: Cyanic acid;

17 Dec. 23, 2010

Chlorine; Chlorine fluoride; Chlorine trioxide fluoride; carbon oxide selenide; Fluorine; Difluorosilane; Fluorine oxide: fluorine peroxide: Sulfuryl fluoride: sulphur difluoride; Phosphorus trifluoride oxide: Phosphorus trifluoride sulfide: Tetrafluorophosphorane; Tetrafluorohydrazine; Sulfur tetrafluoride; hexafluoro disiloxane: Hexafluordisiloxan (germ.); Nitryl fluoride: Hydrogen; Hydrogen selenide; Phosphorus trihydride: Germanium hydride; Silane; Tin tetrahydride; Oxygen; Ozone; Antimony monophosphide; Disilicon monophosphide; Radon; Argon; Trifluoroborane; Hydrogen bromide: Bromopentafluoroethane; Chlorotrifluoroethene; Trifluoroacetonitrile; trifluoromethyl isocyanate; trifluoromethyl thiocarbonyl fluoride; Trifluormethylthiocarbonylfluorid (germ.); pentafluoro-nitroso-ethane; (trifluoromethyl-carbonyl)-difluoro-amine; Hexafluoroethane; Bis-trifluorimethyl-nitroxid; bis-trifluoromethyl ether; bis(trifluoromethyl)tellurium; bis(trifluoromethyl) ditelluride: N,N-Difluor-pentafluoraethylamin (germ.); N-Fluor-bis(trifluormethyl)-amin (germ.); N-Fluor-N-trifluorimethoxy-perfluormethylamin (germ.); fluoroformyl cyanide; 1-chloro-1-fluoro-ethene; itrans-1,2-difluoro-ethene; 1,2-difluoro-ethene; #cis-1,2-difluoro-ethene; 1,1,1,2-Tetrafluoroethane; 1,1,2,2-Tetrafluoroethane; Fluoroethene; 1,1,1-Trifluoroethane; Ether, methyl trifluoromethyl: Ethene; 1,1-Difluoroethane; Fluoroethane; Ethane; fluoro-dimethyl-borane;

US 2010/0320428 A1

Disiloxane 1,1,3,3-tetrafluoro-1,3-dimethyl-trifluoroet hene;

trifluoroacetaldehyde; Pentafluoroethane; Difluoromethyl trifluoromethyl ether; Tris(trifluoromethyl)bismuth; tetrafluoropropadiene; tetrafluorocyclopropene; Perfluoropropionyliodid; pentafluoro-propionitrile; hexafluoro-cyclopropane; Hexafluoropropylene: hexafluoro-1,3dioxolane; Octafluoropropane; Perfluormethylethylether: 1,1-difluoro-propadiene; 2,3,3,3-tetrafluoro-propene: trans HFO-1234ze; 3,3,3-Trifluoropropene: Cyclopropene; Allene; 1,1-difluoro-propene; Methylketene: 2-fluoropropene; 1-Propene: DL-2-aminopropanoic acid; 3,3,3-trifluoro-1-propyne; 1,1,3,3,3-pentafluoro-propene; 1,2,3,3,3-pentafluoro-propene; 1.1.1.4.4.4-hexafluoro-2-butyne; 1,1,4,4-tetrafluoro-butane-2,3-dione; Trifluormethylhypochlorit; Chlor-difluor-methyl-hypoflourit; N-Chlor-N-fluor-trifluorimethylamin (germ.); Chlordifluordifluoraminomethan; thiocarbonyl difluoride; Thiocarbonyldifluorid (germ.); selenocarbonyl difluoride; Trifluoroiodomethane; N-Fluor-difluorimethanimin (germ.); trifluoro-nitroso-methane; difluoro-carbamoyl fluoride: trifluoro-nitro-methane; Tetrafluoromethane; Tetrafluorformamidin (germ.); Tetrafluorourea; hypofluorous acid trifluoromethyl ester; trifluoromethanesulfonyl fluoride; N,N-Difluor-trifluorimethylamin (germ.); Trifluormethyloxydifluoramin; (Difluoraminoxy)difluorimethylhypofluorit; sulfurcyanide pentafluoride; Schwefelcyanid-pentafluorid (germ. difluoro-trifluoromethyl-phosphine; Hexafluorimethandiamin; perfluoro methylsilane; Perfluorimethylsilan (germ.); Trifluormethyl-tetrafluorphosphoran (germ.); Difluoromethane; Fluoroiodomethane; Fluoromethane; trifluoromethyl-silane; methyltrifluorosilane; difluoro-methyl-silane;

18 Dec. 23, 2010

fluoro-methyl-silane; methylgermane; Difluorformimin; Trifluoromethane; trifluoromethane thiol: Trifluormethanthiol (germ.); N.N.,1,1-Tetrafluorimethylamin; difluoro dichlorosilane; Difluordichlorsilan (germ.); difluoro chlorosilane; Difluorchlorsilan (germ.); Phosphorus chloride difluoride: Chlorotrifluorosilane; Hydrogen chloride; Chlorosilane; Carbon monoxide: Carbon dioxide; Carbonyl sulfide: Difluoramine; trans-Difluorodiazine; cis-Difluorodiazine; Thionyl fluoride; Trifluorosilane; Nitrogen trifluoride; Trifluoramine oxide; thiazyl trifluoride; Phosphorus trifluoride; Germanium(IV) fluoride; Tetrafluorosilane; Phosphorus pentafluoride: Selenium hexafluoride; Tellurium hexafluoride; Fluorosilane; Nitrosyl fluoride: Fluorine nitrate; Hydrogen sulfide: Ammonia; Helium; Hydrogen iodide: Krypton; Nitrogen; dinitrogen oxide; Neon: Nitrogen oxide; and Xenon. 3. The method of claim 2, wherein the gaseous compound

is selected from the group consisting of Argon; Trifluoroborane; Hydrogen bromide: Bromopentafluoroethane; Chlorotrifluoroethene; Trifluoroacetonitrile; trifluoromethyl isocyanate; trifluoromethyl thiocarbonyl fluoride; Trifluormethylthiocarbonylfluorid (germ.); pentafluoro-nitroso-ethane; (trifluoromethyl-carbonyl)-difluoro-amine; Hexafluoroethane; Bis-trifluorimethyl-nitroxid; bis-trifluoromethyl ether; bis(trifluoromethyl)tellurium; bis(trifluoromethyl) ditelluride: N,N-Difluor-pentafluoraethylamin (germ.);

US 2010/0320428 A1

N-Fluor-bis(trifluorimethyl)-amin (germ.); N-Fluor-N-trifluorimethoxy-perfluormethylamin (germ.); fluoroformyl cyanide; 1-chloro-1-fluoro-ethene; iltrans-1,2-difluoro-ethene; 1,2-difluoro-ethene; #cis-1,2-difluoro-ethene; 1,1,1,2-Tetrafluoroethane; 1,1,2,2-Tetrafluoroethane; Fluoroethene; 1,1,1-Trifluoroethane; Ether, methyl trifluoromethyl; Ethene; 1,1-Difluoroethane; Fluoroethane; Ethane; fluoro-dimethyl-borane; Disiloxane 1,1,3,3-tetrafluoro-1,3-dimethyl-trifluoroet

hene; trifluoroacetaldehyde; Pentafluoroethane; Difluoromethyl trifluoromethyl ether; Tris(trifluoromethyl)bismuth; tetrafluoropropadiene; tetrafluorocyclopropene; Perfluoropropionyliodid; pentafluoro-propionitrile; hexafluoro-cyclopropane; Hexafluoropropylene: hexafluoro-1,3dioxolane; Octafluoropropane; Perfluormethylethylether: 1,1-difluoro-propadiene; 2,3,3,3-tetrafluoro-propene: trans HFO-1234ze; 3,3,3-Trifluoropropene: Cyclopropene; Allene; 1,1-difluoro-propene; Methylketene: 2-fluoropropene; 1-Propene: DL-2-aminopropanoic acid; 3,3,3-trifluoro-1-propyne; 1,1,3,3,3-pentafluoro-propene; 1,2,3,3,3-pentafluoro-propene; 1.1.1.4.4.4-hexafluoro-2-butyne; 1,1,4,4-tetrafluoro-butane-2,3-dione; Trifluormethylhypochlorit; Chlor-difluor-methyl-hypofluorit; N-Chlor-N-fluor-trifluorimethylamin (germ.); Chlordifluordifluoraminomethan; thiocarbonyl difluoride; Thiocarbonyldifluorid (germ.); selenocarbonyl difluoride; Trifluoroiodomethane; N-Fluor-difluorimethanimin (germ.); trifluoro-nitroso-methane; difluoro-carbamoyl fluoride: trifluoro-nitro-methane; Tetrafluoromethane; Tetrafluorformamidin (germ.); Tetrafluorourea; hypofluorous acid trifluoromethyl ester;

19 Dec. 23, 2010

trifluoromethanesulfonyl fluoride; N,N-Difluor-trifluorimethylamin (germ.); Trifluormethyloxydifluoramin; (Difluoraminoxy)difluorimethylhypofluorit; sulfurcyanide pentafluoride; Schwefelcyanid-pentafluorid (germ.); difluoro-trifluoromethyl-phosphine; Hexafluormethandiamin; perfluoro methylsilane; Perfluorimethylsilan (germ.); Trifluormethyl-tetrafluorphosphoran (germ.); Difluoromethane; Fluoroiodomethane; fluoromethane; methyltrifluorosilane; difluoro-methyl-silane; fluoro-methyl-silane; methylgermane; Difluorformimin; Trifluoromethane; trifluoromethane thiol: Trifluormethanthiol (germ.); N.N.,1,1-Tetrafluorimethylamin; difluoro dichlorosilane; Difluordichlorsilan (germ.); difluoro chlorosilane; Difluorchlorsilan (germ.); Phosphorus chloride difluoride; Chlorotrifluorosilane; Hydrogen chloride; Chlorosilane; Carbon monoxide: Carbon dioxide; Carbonyl sulfide: Difluoramine; trans-Difluorodiazine; cis-Difluorodiazine; Thionyl fluoride; Trifluorosilane; Nitrogen trifluoride; Trifluoramine oxide; thiazyl trifluoride; Phosphorus trifluoride; Germanium(IV) fluoride; Tetrafluorosilane; Phosphorus pentafluoride: Selenium hexafluoride; Tellurium hexafluoride; Fluorosilane; Nitrosyl fluoride: Fluorine nitrate; Hydrogen sulfide: Ammonia; Helium; Hydrogen iodide: Krypton; Nitrogen; Nitrous oxide: Neon: Nitrogen oxide; and Xenon.

US 2010/0320428 A1

4. The method of claim 1, wherein the gaseous compound is part of an azeotrope with a second gas.

5. The method of claim 1, wherein the insulation-gas fur ther comprises at least one gas selected from the group con sisting of nitrogen, CO and N.O.

6. The method of claim 1, wherein the electrical equipment is selected from the group consisting of current-interruption equipment, gas-insulated transmission lines, gas-insulated transformers, and gas-insulated Substations.

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7. The method of claim 1, wherein the electrical equipment has SF as an existing insulation gas and the step of placing comprises replacing the SF with the insulation gas.

8. The method of claim 1, wherein the gaseous compound is low oZone depleting.

9. The method of claim 1, wherein the gaseous compound is non-oZone depleting.

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