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I JSRD - I nternational Jour nal for Scientifi c Re se arch & Deve lopment| Vol. 1, I ss ue 8, 2013 | ISS N (onli ne): 2321-0 613 All rights reserved by www.ijsrd.com 1600 1×2 Digital Optoelectronic Switch using MZI structure and studying the Effect of Bi-Polar Voltage on Electrode Chetan B. Bambhroliya 1 Rahul J. Thumar 2 Prof. Sarman K. Hadia 3 2 Assistant Professor 3 Associate Professor 1, 2, 3 Department of Communication Engineering 1, 3  Charusat University, At & Po: Changa-388421, Dist-Anand, India 2 Dr. Subhash Technical Campus, At: Junagadh-362001, Gujarat, India  Abstract   The electro optic switch has wide application in optical network due to capability of route the light path from one port to the desired port. In this paper, we propose a 1×2 digital optoelectronics switch based on mach-zehnder interferometer structure on a single titanium diffuse lithium niobate substrate. The design is simulate on BPM-cad simulator for switch analysis and study the effect of bipolar voltage 0v to ± 5.75v applied at 1st and center electrode region for switching. A short study of wavelength dependent switch for first optical window 8.5 µm and third optical window 1.55 µm has been simulated without use of voltage with changing titanium stripe thickness to 0.07µm.  Key words: Bipolar voltage, MZI, electro-optic effect I. INTRODUCTION In a modern communication network, switches are most important part of a network and in optical communication a switching in all light, means in optical domain is more important than switching in electrical domain i.e. conversion from optical to electrical and electrical to optical. With such a conversion the data transfer capability and speed of switching reliability is less. The speed of optical switches is necessarily has to match with currently new generation photonic devices in which light is not only carry information but also control the switching path is much important. The electro-optic effect is a change in optical  properties of a material in response to electrical field that various slowly with compared to frequency of light. Speed of this effect is less than 1 ns. A 2×2 optoelectronic switch  based on mzi structure and study the effect of electrode voltage has done in 2008 with switching voltage 0V to 6.75V at center electrode [1]. An electro-optic 3×3 switch  based on integrated mach zehnder interferometer has introduced with switching voltage -8.0V to 8.0V [2]. A 4×4  banyan optical switch using optoelectronics mzi switches with low cross talk has introduced in 2009[3]. A 1×4 digital optical switch using Y structure has introduced in 2008 with switching voltage to 10V [4]. Various optoelectronics materials with various structures such as MZI, Y, MMI has  been use to desi gn Optical switch s uch as LiNOb3, LiTaO3, InGaAs-AlGaInAs, photonic crystals etc. InP/InGaAsP Optical integrated MMI switches (shintaro et al., 2008) InGaAsP-InP MZI optical space switch (Agrawal et. al 1995) are some examples. A LiNbO3 can be doped w ith various dopants. Few among them dopants are titanium, iron, copper, magnesium oxide.[2] This paper propose a design of 1×2 digital optical switch based on mzi structure using titanium ion diffused in host lithium niobate substrate with low bipolar driving voltage ± 4.75V to ±5.75V for switching from one port to second port for a wavelength 1300µ in TM polarization. Ti- doped in the lithium niobate crystal increases refraction index which allows both TM and TE modes to propagate along the waveguides [7] after study the effect of bipolar voltage on electrode, we simulate our design for 8.55µm and 1.55µm wavelength with changing thickness of titanium stripe at 0.07 µm. II. DESIGNING OF 1×2 DIGITAL OPTO-ELECTRONIC MZI SWITCH The design switch allows switching directly in all optical domains avoiding conversion of E/O/E. This paper is oriented towards design of 1×2 integrated optical switch  based on mach zehnder interferometer. The switch is created on z-cut of lithium niobate and surrounded by air cladding. The direction of z-cut is along the horizontal of the screen. The switch is oriented along the y-optical axis of lithium niobate and is perpendicular to the screen. Width of the waveguide is 8.0 µm and is along to the x axis of the screen. The crystal lithium niobate has a crystal cut along z-axis and  propagation direction along y-axis. Air with refractive index 1.0 is use as a dielectric material. The whole device is constructed on 33 mm long and 100 microns wide. Waveguide is formed by diffusion of titanium ion on a host lithium niobate substrate at high temperature range from few hundred to several hundred Celsius. The thickness of titanium stripe before diffusion is 0.05. For higher wavelength say 1550µ operation, we can vary thickness up to 0.07 because Ti-doped in lithium niobate crystal increase refractive index which allows both TE and TM mode to  propagate light along the waveguide which satis fied desired condition for optical signal parameter. The lateral diffusion length Dh constant and diffusion length in depth Dv is 4.0 and 3.5 micrometer respectively. The 3D wafer properties include air as a cladding material with thickness of 2 micrometer and lithium niobate substrate with thickness of 10 micrometer. The device has been created using opti bpm cad. An electrode region with three electrode set is defined on the wafer structure for controlling the light propagation to different port of the switch with buffer la yer. Thickness of  buffer layer is 0.2µm. vertical and horizontal permittivities of buffer layer are 4.0 respectively. The thickness of electrode is 3.0 µm. electrode are defined with three region with different parameter. First region has electrode with 10 micrometers width and 0V. Second electrode has 10 micrometer width and 0V. The gap between electrode 1 and 2 is keep 5 micrometer and gape between 2 and 3rd electrode is 5 micrometer. For Switching of light to port 1 to desired port we change the electrode voltage of 1st and center electrode from 0V, to +4.75V at first electrode and - 4.75V at center electrode. The input plane is selected with

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I JSRD - I nternational Journal for Scientifi c Research & Development| Vol. 1, I ssue 8, 2013 | ISSN (onli ne): 2321-0613

All rights reserved by www.ijsrd.com  1600 

1×2 Digital Optoelectronic Switch using MZI structure and studying the

Effect of Bi-Polar Voltage on Electrode

Chetan B. Bambhroliya1

Rahul J. Thumar2

Prof. Sarman K. Hadia3

2Assistant Professor 3Associate Professor1, 2, 3Department of Communication Engineering

1, 3

 Charusat University, At & Po: Changa-388421, Dist-Anand, India2Dr. Subhash Technical Campus, At: Junagadh-362001, Gujarat, India

 Abstract  — The electro optic switch has wide application in

optical network due to capability of route the light path from

one port to the desired port. In this paper, we propose a 1×2

digital optoelectronics switch based on mach-zehnder

interferometer structure on a single titanium diffuse lithiumniobate substrate. The design is simulate on BPM-cad

simulator for switch analysis and study the effect of bipolar

voltage 0v to ± 5.75v applied at 1st and center electrode

region for switching. A short study of wavelength dependent

switch for first optical window 8.5 µm and third optical

window 1.55 µm has been simulated without use of voltagewith changing titanium stripe thickness to 0.07µm.

 Key words: Bipolar voltage, MZI, electro-optic effect

I.  INTRODUCTION

In a modern communication network, switches are most

important part of a network and in optical communication a

switching in all light, means in optical domain is more

important than switching in electrical domain i.e.conversion from optical to electrical and electrical to optical.

With such a conversion the data transfer capability and

speed of switching reliability is less. The speed of optical

switches is necessarily has to match with currently newgeneration photonic devices in which light is not only carry

information but also control the switching path is muchimportant. The electro-optic effect is a change in optical

 properties of a material in response to electrical field that

various slowly with compared to frequency of light. Speed

of this effect is less than 1 ns. A 2×2 optoelectronic switch

 based on mzi structure and study the effect of electrode

voltage has done in 2008 with switching voltage 0V to

6.75V at center electrode [1]. An electro-optic 3×3 switch

 based on integrated mach zehnder interferometer has

introduced with switching voltage -8.0V to 8.0V [2]. A 4×4

 banyan optical switch using optoelectronics mzi switches

with low cross talk has introduced in 2009[3]. A 1×4 digitaloptical switch using Y structure has introduced in 2008 with

switching voltage to 10V [4]. Various optoelectronics

materials with various structures such as MZI, Y, MMI has

 been use to design Optical switch such as LiNOb3, LiTaO3,

InGaAs-AlGaInAs, photonic crystals etc. InP/InGaAsP

Optical integrated MMI switches (shintaro et al., 2008)InGaAsP-InP MZI optical space switch (Agrawal et. al

1995) are some examples. A LiNbO3 can be doped with

various dopants. Few among them dopants are titanium,

iron, copper, magnesium oxide.[2] This paper propose a

design of 1×2 digital optical switch based on mzi structure

using titanium ion diffused in host lithium niobate substrate

with low bipolar driving voltage ± 4.75V to ±5.75V forswitching from one port to second port for a wavelength

1300µ in TM polarization. Ti- doped in the lithium niobate

crystal increases refraction index which allows both TM and

TE modes to propagate along the waveguides [7] after study

the effect of bipolar voltage on electrode, we simulate our

design for 8.55µm and 1.55µm wavelength with changing

thickness of titanium stripe at 0.07 µm.

II.  DESIGNING OF 1×2 DIGITAL OPTO-ELECTRONIC 

MZI SWITCH

The design switch allows switching directly in all opticaldomains avoiding conversion of E/O/E. This paper is

oriented towards design of 1×2 integrated optical switch

 based on mach zehnder interferometer. The switch is createdon z-cut of lithium niobate and surrounded by air cladding.

The direction of z-cut is along the horizontal of the screen.

The switch is oriented along the y-optical axis of lithium

niobate and is perpendicular to the screen. Width of the

waveguide is 8.0 µm and is along to the x axis of the screen.

The crystal lithium niobate has a crystal cut along z-axis and propagation direction along y-axis. Air with refractive index

1.0 is use as a dielectric material. The whole device is

constructed on 33 mm long and 100 microns wide.

Waveguide is formed by diffusion of titanium ion on a hostlithium niobate substrate at high temperature range from few

hundred to several hundred Celsius. The thickness oftitanium stripe before diffusion is 0.05. For higher

wavelength say 1550µ operation, we can vary thickness up

to 0.07 because Ti-doped in lithium niobate crystal increase

refractive index which allows both TE and TM mode to

 propagate light along the waveguide which satisfied desired

condition for optical signal parameter. The lateral diffusion

length Dh constant and diffusion length in depth Dv is 4.0

and 3.5 micrometer respectively. The 3D wafer properties

include air as a cladding material with thickness of 2

micrometer and lithium niobate substrate with thickness of

10 micrometer. The device has been created using opti bpmcad. An electrode region with three electrode set is defined

on the wafer structure for controlling the light propagation

to different port of the switch with buffer layer. Thickness of

 buffer layer is 0.2µm. vertical and horizontal permittivities

of buffer layer are 4.0 respectively. The thickness of

electrode is 3.0 µm. electrode are defined with three regionwith different parameter. First region has electrode with 10

micrometers width and 0V. Second electrode has 10

micrometer width and 0V. The gap between electrode 1 and

2 is keep 5 micrometer and gape between 2 and 3rd

electrode is 5 micrometer. For Switching of light to port 1 to

desired port we change the electrode voltage of 1st and

center electrode from 0V, to +4.75V at first electrode and -4.75V at center electrode. The input plane is selected with

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mode as the starting field and 0.0 offset on z-axis. For

simulation we set the global data with refractive index

modal and wavelength 1.3 micrometer. The 2D property hasset with TM polarization and 500 mesh points. We calculate

2D isotropic simulation.

III.  SIMULATION AND RESULTS

The complete design was stimulated in 2D using beam propagation method in opti bpm cad software. For

simulation we set the global data with refractive index

model and wavelength 1.3 micrometer. The 2D property has

set with TM polarization, beam propagation method solver

as a paraxial, engine with finite difference, scheme

 parameter 0.5, propagation step 1.5 and boundary condition

TBC.

A switching operation was achieved by properly

changing the range of various parameters and set it as shown

in table 1.

Output Electrode-1

Center

electrode Electrode-2

Buffer

layer

PortW

µm

V

(V)

W

µm

V

(V)

W

µm

V

(V)

W

µm

1 10 0 26 0 10 0 0.2

2 10 +4.75 10 -4.75 10 0 0.2

Inter gap between 1st and

center electrode:- 5 (µm)

Inter gap between center and

2nd electrode:- 5(µm)

Electrode thickness :- 3(µm)

Table. 1: Specification of Electrode region and Switching

Voltage 

A propose 1×2 switch Design layout is design in opti bpm

waveguide layout designer which is shown in figure 1. A

switching voltage play an important role for gets desired

output port. A desired light propagation for port 1 is

achieved by biasing voltage at 0V for all electrode regions.And for port 2 is achieved by biasing voltage +4.75V at

electrode 1 and -4.7V at center electrode region. As shown

in Fig. 2 and 3.

Fig. 1: A 1×2 optical switch using mzi structure.

Fig. 2: Light propagation for port 1 with biasing voltage 0V

at all electrode region

Fig. 3: Light propagation for port 2 with ± 4.75V at 1st and

center electrode.

Fig. 4: Refractive index propagation at xz slice

Figure 4. Shows the refractive index slice for xz slice after

simulation.

Plot of normalize Power versus change in bipolar biasing

voltage at electrode region 1 and center electrode is shown

in Figure 5 and 6 for port 1 and 2.

Fig. 5: Normalize power versus voltage for port 1

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Fig. 6: Normalize power versus voltage for port 2

As the biasing voltage from 0V to increase we can see that power decrease for port 1 and after ±3V biasing voltage

light propagate form port 1 to port 2 and switching done. Asthe biasing voltage increase form ±5V power decrease and

also coupling efficiency too. So for reliable switching we

chose biasing voltage between ± 4.75V to ± 5.75V. The

simulation results show good performance for this structure.The insertion loss (I.L.) [2] is the important parameter for

the optical switching. The our propose design has I.L. -

0.016db for port 1 and -0.020db for port 2 which is less and

acceptable.

IV.  SIMULATION FOR  WAVELENGTH DEPENDENT 

SWITCH

As the years goes the demand of internet is growth with

exponential growth in bandwidth as increasing number ofusers in multimedia applications and scientific computing,

academic institutes, military. As a result of wavelength

division multiplexing technology, the number of

wavelengths per fiber has been increased to hundred or more

with each wavelength operating at rates of 10gbps or higher[6]. It is expected that the traffic carried on fibers at each

node in WDM mesh network will soon approach several

terabits per second. Switching such a huge amount of traffic

electronically becomes a very challenging, due to both the

high cost of optical-electronics-optical conversion [6]. In the

 propose design wavelength 8.0  –   7.0 µm for port 1 and

wavelength 1500 -1550 µm used switch port 2. A proposes

switch design layout is shown in figure (7)

Fig. 7: Layout for wavelength dependent switch 

In design layout we can see that electrode region for

wavelength dependent switch has been not show because

here we get switching based on wavelength. For get proper

switching we change the thickness of titanium stripe at 0.07

µm. we simulate our design in opti bpm cad.

After simulation we have observe the light propagation for

wavelength 0.8µm to a fix output port 1. And light

 propagation for wavelength 15 µm to a fix output port 2 as

shown below Fig. (8) & (9).

Fig. 8: Simulation for 8.5 µm wavelength at fix port 1

Fig. 9: Simulation for 1.5 µm wavelength at fix port 2

Above Fig 8 shows that light propagation for wavelength

0.85µm at fix port 1. And Fig. 9 shows the light propagation

for wavelength 1.5µm at fix port 2

The graph plotted with relative filed strength and the

effective refractive index of the waveguide with the width of

the wafer size used in the switch architecture shown in

 below Fig. 10 & 11.

Fig. 10: Relative field strength versus Effective refractiveindex for wavelength 0.85 µm.

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Fig. 11: Relative field strength versus Effective refractive

index for wavelength 1.5 µm

V.  CONCLUSION

The 1×2 Digital optoelectronics switch using mach zehnder

structure has been designed and simulated for light

switching to desired port by ± 4.75V biasing voltage at

1300µm wavelength with TM polarization. Coupling

efficiency of the 1×2 digital optical switch can be controlled by changing the electrode voltage. When no biasing voltage

applied to electrode the coupling efficiency is almost equal

to 100% and when biasing voltage applied the coupling

occurs and by electro-optic effect we switch the light

 propagation to desired port. The future proposes work is to

design a switch for high wavelength and independent

 polarization i.e. both TM and TE polarization with less

losses. In a wavelength dependent switch we observe the

switching with 0.85 µm for fix output port 1. And for 1.5

µm wavelength at fix output port 2. So we can use this

switch as a wavelength de-multiplexer.

ACKNOWLEDGMENT

I acknowledge the Prof. R.B. Patel, Head of Electronics and

communication department, UVPCE, and Mamta Kamra

who helped throughout entire duration work for continuous

encouragement, invaluable help, timely suggestion and

inspired guidance offered. Lastly authors express his sincere

thanks to all the friends who help directly and indirectly to

us.

REFERENCES

[1]  Ghanshayam shingh, R.P. Yadav, Vijay Jaynyani, and

Aranab. “Design  of 2 × 2 Optoelectronics

switch based on mzi and studies the effect of electrodeswitching voltage”,  World Academy of science,

 Engineering and Technology 39 2008, 401-407.

[2]  Mohammad Syuhaimi , Ab.Rahman , Khaled Mohamed

Shaktur, Rahman Mohammad, “An electro optic 3×3

switch based on integrated Mach-Zehnder

Interferometer ”,  Proc.8th

  WSEAS international

conference on applied electromagnetic, wireless and

optical communication, ISBN 978-960-474-167-

0,ISSN:1790-2769,11-14.

[3]  Vandana Sachdeva, Rajeev Ratan, J.S. Mahanwal,

“Design of 4×4 banyan optical switch usingoptoelectronic mzi switches with low crosstalk,”  Indian

 journal of science and technology,vol.2 No. 10(oct2009) ISSN:0974-6846,48-51.

[4]  Shurti Karla, Ghanshayam Singh, Vijay Janyani, R.P.

Yadav. “1×4 Ti:LiNbO3 digital optical switch: design

and performance analysis for THz operations”, International conference on optics and photonics

Chandigarh, India ICOP-2009, 30oct-1Nov2009

[5]  S. Gupta, P. Jain, S. Bothara, V. Janyani, R.P.Yadav,

G.singh,“”, High performance Digital optical

switch Photonics lettersofpoland , vol.3(1),2011,38-40 

[6] 

Ghanshayam Singh, Tirtha Pratim Bhattacharjee,R.P.Yadav, V.janyani “Design of non-blocking and

rearrangeble modified banyan network with electro-

optic mzi switching elements”.  World academy of

science, engineering and technology 43, 2008.

[7]  Ghanshayam Singh, R. P. Yadav, V. janyani

“performance and analysis of Ti-LiNbO3 1×2 digital

 photonic switch with Sio2 layer ”,international

conference on Mechanical and Electrical Technology

 ,ICMET-2010,122-124