1
....... Granted in the Metal Finishing Field Compiled by Anselm Kuhn; E-mail, [email protected] METAL FINISHING PATENTS PUBLISHED IN DECEMBER 2003 PROCESS FOR |N-SITU ELECTROFORMING A STRUCTURAL LAYER OF METALLIC MATERIAL TO AN OUTSIDE WALL OF A METAL TUnE US 2003234181 Brooks, I.; Palumbo, G. METHOD OF DEPOSITING EPITAXIAL LAYERS ON A SUBSTRATE US. 6,670,308 (UT Battelle LLC) Goyal, A. ATOMIC LAYER DEPOSITION METHOD USING A NOVEL GROUP IV METAL PRECURSOR US 6669990 (Samsung Electronics Co. Ltd.) Cho, YJ.; Kim, D.S. METHOD FOR PRODUCING BY EVAPORATION A FUNCTIONALLY GRADED COATING WITH AN OUTER CERAMIC LAYER ON A METAL SUUSTRATE US 6669989 (Internat. CT For Electron Beam) Nerodenko, L.M. HARDWARE ASSEMBLY FOB CVI/CVD PROCESSES US 6669988 (Goodrich Corp..) Bazshushtari, A.; Daws, D. PROCESS FOR ETCHING BISMUTH-CONTAINING OXIDE FILMS US 6669857 (Infineon Technologies AG) Hintermaier, F. METHOD FOR HIGH DEPOSITION RATE SOLDER ELECTROPLATING ON A MICROELECTRONIC WOBKPIECE US 6669834 (Semitool Inc..) Ritzdorf, T.L.; Conrady, S. Method, chemistry, and apparatus for selectively elec- trodepositing tin-lead solder bumps and other struc- tures at a high deposition rate onto a microelectronic device from a workpiece, such as a semiconductor wafer. Apparatus comprises a reactor chamber con- taining an electroplating solution having free ions of tin and lead for plating onto the workpiece. A chemi- cal delivery system is used to deliver the electroplat- ing solution to the reactor chamber at a high flow rate. A workpiece support is used that includes a contact assembly for providing electroplating power to a sur- face at a side of the workpiece that is to be plated. The workpiece is electrically contacted at a large plurality of discrete contact points, isolated from exposure to the electroplating solution. An anode, preferably a consumable anode, is spaced from the workplece sup- port within the reaction chamber and is in contact with the electroplating solution. A methane sulfonic acid electrolyte may be used. SELF-HEALING NON-CHROMATE CONVERSION COATINGS FOR ALUMINUM AND ITS ALLOYS US 6669786 (Concurrel~t Technologies Corp.~ Sampath, K. Chromate-replacement coatings for aluminum and its alloys includes forming a boehmite coating. Layer with A1 (III) ions on an aluminum surface, and applying an ionic conversion coating solution to the coating layer. The ionic conversion coating solu- tion comprises hexavalent and trivalent ions. The trivalent ions are selected from the group consisting of Ce, Ga, Mn, Sc, Ti, Te and V. The hexavalent ions are selected from the group consisting of Mn, Mo, Se and W. The resulting coatings claim to provide cor- rosion resistance and self-healing effect in any defects present in the coatings. PRETREATMENT FOR ALUMINUM AND ALUMINUM ALLOYS US 6669764 (US Navy) Matzdorf, C.A.; Nickerson, Jr W. Pretreated aluminum and aluminum alloys and the process and composition for pretreating them to pro- vide a coating with color recognition for identifica- tion purposes and to improved the corrosion-resist- ance, electrical conductivity, and adhesion properties which comprises pretreating aluminum and its alloys with an effective amount of an acidic aqueous solution having a pH ranging from about 2.5 to 5.5 comprising water soluble trivalent chromi- um compounds, alkali metal hexafluorozirconates, divalent zinc compounds, alkali metal fluoro-com- April 2004 67

Atomic layer deposition method using a novel group iv metal precursor

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Granted in the Metal Finishing Field Compiled by Anselm Kuhn; E-mail, [email protected]

METAL FINISHING PATENTS PUBLISHED IN DECEMBER 2 0 0 3

PROCESS FOR |N-SITU ELECTROFORMING A STRUCTURAL LAYER OF METALLIC MATERIAL TO AN OUTSIDE WALL OF A METAL TUnE US 2003234181 Brooks, I.; Palumbo, G.

METHOD OF DEPOSITING EPITAXIAL LAYERS ON A SUBSTRATE US. 6,670,308 (UT Battelle LLC) Goyal, A.

ATOMIC LAYER DEPOSITION METHOD USING A NOVEL GROUP I V METAL PRECURSOR US 6669990 (Samsung Electronics Co. Ltd.) Cho, YJ.; Kim, D.S.

METHOD FOR PRODUCING BY EVAPORATION A FUNCTIONALLY GRADED COATING WITH AN OUTER CERAMIC LAYER ON A METAL SUUSTRATE US 6669989 (Internat. CT For Electron Beam) Nerodenko, L.M.

HARDWARE ASSEMBLY FOB C V I / C V D PROCESSES US 6669988 (Goodrich Corp..) Bazshushtari, A.; Daws, D.

PROCESS FOR ETCHING BISMUTH-CONTAINING OXIDE FILMS US 6669857 (Infineon Technologies AG) Hintermaier, F.

METHOD FOR HIGH DEPOSITION RATE SOLDER ELECTROPLATING ON A MICROELECTRONIC WOBKPIECE US 6669834 (Semitool Inc..) Ritzdorf, T.L.; Conrady, S. Method, chemistry, and apparatus for selectively elec- trodepositing tin-lead solder bumps and other struc- tures at a high deposition rate onto a microelectronic device from a workpiece, such as a semiconductor wafer. Apparatus comprises a reactor chamber con- taining an electroplating solution having free ions of tin and lead for plating onto the workpiece. A chemi- cal delivery system is used to deliver the electroplat-

ing solution to the reactor chamber at a high flow rate. A workpiece support is used that includes a contact assembly for providing electroplating power to a sur- face at a side of the workpiece that is to be plated. The workpiece is electrically contacted at a large plurality of discrete contact points, isolated from exposure to the electroplating solution. An anode, preferably a consumable anode, is spaced from the workplece sup- port within the reaction chamber and is in contact with the electroplating solution. A methane sulfonic acid electrolyte may be used.

SELF-HEALING NON-CHROMATE CONVERSION COATINGS FOR ALUMINUM AND ITS ALLOYS US 6669786 (Concurrel~t Technologies Corp.~ Sampath, K. Chromate-replacement coatings for aluminum and its alloys includes forming a boehmite coating. Layer with A1 (III) ions on an a luminum surface, and applying an ionic conversion coating solution to the coating layer. The ionic conversion coating solu- tion comprises hexavalent and tr ivalent ions. The trivalent ions are selected from the group consisting of Ce, Ga, Mn, Sc, Ti, Te and V. The hexavalent ions are selected from the group consisting of Mn, Mo, Se and W. The resulting coatings claim to provide cor- rosion resis tance and self-healing effect in any defects present in the coatings.

PRETREATMENT FOR ALUMINUM AND ALUMINUM ALLOYS US 6669764 (US Navy) Matzdorf, C.A.; Nickerson, Jr W. Pretreated aluminum and aluminum alloys and the process and composition for pretreating them to pro- vide a coating with color recognition for identifica- tion purposes and to improved the corrosion-resist- ance, electrical conductivity, and adhesion properties which comprises pretreat ing aluminum and its alloys with an effective amount of an acidic aqueous solution having a pH ranging from about 2.5 to 5.5 comprising water soluble trivalent chromi- um compounds, alkali metal hexafluorozirconates, divalent zinc compounds, alkali metal fluoro-com-

April 2004 67