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    Calculation of transmission tunneling current across arbitrary potential barriers

    Yuji Andoand Tomohiro Itoh

    Citation: Journal of Applied Physics 61, 1497 (1987); doi: 10.1063/1.338082

    View online: http://dx.doi.org/10.1063/1.338082

    View Table of Contents: http://scitation.aip.org/content/aip/journal/jap/61/4?ver=pdfcov

    Published by theAIP Publishing

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  • 7/24/2019 Calculation of Transmission Tunneling Current Across Arbitrary

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    Calculation

    of

    transmission tunneling current

    across

    arbitrary potential

    barriers

    Yuji Ando and Tomohiro itoh

    Microelectronics Research Laboratories

    NEC

    Corporation 4-1-1.

    114iyazaki

    Miyamae-ku Kawasaki

    213,

    Japan

    (Received 11 September 1986; accepted for publication 5 November 1986)

    This pape r presents a simple method for accurately calculating quantum mechanical

    transmission probability and current across arbitrary potential barriers by using the multistep

    potential approximation. Th is method is applicable to various potential balTiers and wells,

    including continuous variations of potential energy and electron effective mass. Various

    potential barrier structures and a hot-electron transistor are analyzed to show the feasibility

    of

    this method.

    I

    INTRODUCTION

    Recently, from the viewpoint of high-speed and new

    functional device application,I-3 there has been an increas

    ing interest in resonant tunneling in quantum-wen

    and

    su

    periattice structures. The WKB (Wentzel-Kramers-BriI

    louin) approximation,

    the

    conventional method used to

    calculate the transmission coefficient across potential bar

    riers, fails to explain the resonance phenomena. Further-

    more, the WKB method is inaccurate in regions where the

    potential profile varies abruptly,4 Abruptly varying poten

    tial functions are, however, frequently encountered at the

    interface between two different materials in heterojunction

    structures.

    Another method for calculating the transmiss ion coeffi

    cient

    is

    to solve Schrodinger s equations

    through

    potential

    barriers. Chandra and Eastman

    5

    calculated the transmission

    coefficient for a triangular barr ier by solving SchrOdinger s

    equations via the numerical method.

    On the other

    hand,

    Gundlach

    6

    calculated

    the

    tunneling

    current

    for a trapezoidal

    barrier

    by

    connecting the Airy functions, exact solutions for

    Schrodinger s equations,

    at

    two interfaceso

    The

    same proce

    dure has been applied

    to

    triangular barriers

    by

    Christodou

    lides

    et al.

    7

    Lui and Fukuma

    8

    showed this calculation to be

    applicable to use with arbitrary piecewise linear potential

    barriers. These calculations are, however, unsuitable for de

    signing quantum-well and superlattice structures, because of

    the complicated treatment involved. Furthermore, varia

    tions

    of

    electron effective masses have never been taken into

    account in these analyses,

    This paper presents a simpler method for accurately cal

    culating the t ransmission coefficient

    and current

    across arbi

    trary potential barriers.

    In

    the present method, we approxi

    mate variations of potential energy and electron effective

    mass by multistep functions (multistep potential approxi

    mation).

    The

    transmission coefficient is calculated by con

    necting

    momentum

    eigenfunctions.

    9

    The details of the cal

    culation procedures are described in Sec. II. As mentioned

    above, various potential barriers, including continuous var

    iations of potential and effective mass,

    can

    be analyzed easily

    by using the present method. For example, rectangular and

    parabolic potential barriers, fabricated with

    GaAs/

    AIGaAs

    heterostructures, are analyzed in Sec.

    III.

    Section

    IV

    de-

    scribes

    the

    analysis for hot-electron transistors

    HETs)

    an application

    to quantum

    size effect devices.

    II. CALCULATION PROCEDURE

    A Transmission probability across arbitrary potentia

    barriers

    In the present calculation, instead of dealing with co

    tinuous variations

    of

    potential energy, we split the potenti

    barrier

    up into

    segments, in

    which

    potential energy

    can

    b

    regarded as a constant. In the limit as the divisions becom

    finer and finer, a continuous variation will be recovered.

    Let

    us assume

    the

    potential barrier

    to

    be a sequence of

    small segments.

    An

    example, in

    the

    case where N

    =

    10,

    shown in Fig. 1 where

    the

    potential

    barrier

    U x),

    the

    effe

    tive mass m* x) ,

    and the

    permittivity

    E X)

    are approxima

    ed by

    the

    multistep functions

    U x)

    = =

    U[(x

    j

    ._ +x j ) /2 ]

    ,

    m* x)

    =mj=m*[ x j

    .

    J

    +Xj)/2]

    ,

    x) =j

    [ X

    i

    -

    1

    + x

    j

    ) /2J,

    for x

    j

    . t

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    an electron with energy E moving normally on the barrier, is

    given by

    r (x)

    =

    Aj

    expUkjx)

    +

    OJ exp( - ikjx)

    , 2)

    where

    k

    j

    =

    J [2mtCE

    -10)] If i,

    (3)

    and

    is the

    reduced Planck s constant.

    From the

    continuity

    of lh (x) and

    1/

    mJ')

    d1h

    I dx)

    at

    each boundary,Il the

    detenniningA

    j

    and OJ in Eqs. 2)

    can

    be reduced

    to

    the multiplication of the following

    N

    + 1

    2X2) matrices:

    (4)

    4

    =

    [

    + SI

    )exp[ - i(k

    l

    + I -

    kl )xI]

    2 1

    -

    S[

    )exp[i(k/+

    1 +

    kJ )x/]

    l -S / )exp[

    i k

    l

    + I +k[)Xd]

    1

    +S/)exp[i k

    l

    +

    l

    - k / ) x

    1

    ]

    (5)

    and

    mt+l

    k[

    S/= .

    (6)

    m? k

    l

    +

    1

    By setting Ao

    =

    1 and B N + I

    =

    0 in Eq. 4) for j

    =

    N + 1,

    we can calculate the transmission amplitude AN+- 1 and the

    transmission probability D(E) as foHows:

    7)

    and

    m* k

    D(E) _ ~ I 2

    - ' k N + II

    ,

    m

    N

    +

    1

    0

    8)

    where

    (9)

    B

    Transmission

    current

    calculation

    The band diagram, used for calculating the transmission

    current-voltage

    I-V)

    characteristics for

    the

    potential bar

    rier, is shown in Fig. 2. The solid line denotes the potential

    function for

    the

    barrier, whereas

    the

    broken line denotes

    the

    approximated potential function. As shown in Fig. 2, the

    U x,V)

    qVa

    o

    Ef+qVa-qV

    t

    >

    x

    qVb

    t

    FIG. 2. Energy band diagram for the potential barrier un der biasing condi

    tions.

    1498

    J.

    Appl. Phys., Vol. 61,

    No.4,

    15 February 1987

    i

    total applied voltage

    V

    is expressed as

    V =

    Va

    + Vb + V

    d

    ,

    where Va Vb and Vd are the voltage drop values in the

    accumulation layer, the barrier, and the depletion layer, re

    spectively. These values

    and the

    space charge ns

    per

    unit

    area in the depletion layer, which is equal

    to the

    net charge in

    the accumulation layer, are determined using fonowing

    equations

    2;

    exp qValkn

    - q V a l k T - l =q2

    n

    ;/2okTN

    D

    , 10)

    Vb =

    lLb[qnJ X)]dX,

    Vd =

    qn;/2N t - N

    D

    ,

    11 )

    12)

    where N D

    is the

    donor concentration in

    the

    semiconductor

    at both contacts, Lb is the barrier thickness, q is the elec

    tronic charge,

    k

    is

    the

    Boltzmann s constant,

    and T

    is

    the

    temperature. The Boltzmann distribution and the depletion

    layer approximation are assumed for

    Egs. 10) and 12),

    respectively.

    The potential function U(x) in the barrier is determined

    by the

    superimposition of

    the

    zero-bias potential

    and

    poten

    tial drop

    (x)

    =

    [qn, l

    (x) ] dx. The transmission proba

    bility D(E

    x

    , V) through the barrier region is calculated as

    described above. The accumulation and depletion regions

    are assumed not to affect the transmission probability. As

    suming the dependence of transmission probability only on

    longitudinal electron energy Ex for oblique incidence, the

    current

    density is given by 13

    q m ~

    J(E

    x

    )dEx

    =

    --::::23 D(E ,

    Vb)

    21Tfi

    xL: [ /o(E) -IN+1CE)JdEdE

    x

    (13a)

    where

    10

    and f N + I

    are

    the distribution functions in

    the

    left

    contact

    and

    in

    the

    right contact, respectively. Assuming

    the

    Fermi-Dirac distribution, Eq. (13a) can be rewritten as

    fol

    lows:

    q m ~ k

    JCE ) =

    21T

    2

    fz3 D(Ex , Vb)

    Xln .

    1 + exp Ef +

    qV; -

    Ex ) lkT )

    1 + exp E

    r

    + qVa - qV - Ex

    ) lkT

    130)

    Here, the

    Fermi

    level in the accumulation region is treated as

    to be raised by qVa .

    Y. Ando and T Itoh 1498[This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to

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    III, EXAMPLES

    Various potential barriers fabricated with

    GaAsl

    Alx

    Gal x As structures were analyzed.

    The

    conduction-band

    offset t:.Ec

    was taken to

    be 60% of

    GaAs and Alx

    Gal x As

    r

    band-gap

    difference. 14 In

    the

    fol

    lowing, the electron concentration in

    GaAs

    was taken to be

    n

    =

    1 X 10

    18

    em

    -

    3,

    equal to N

    D

    and

    the

    Fermi energy was

    presumed

    to

    be

    0.05

    eVat

    77 K. The

    parameters used are

    listed be1ow

    I5

    :

    1::.E

    = {O.75X eV)

    c O.7Sx + O.69 x - 0.45)2 (eV)

    m*lmo =

    0.067

    + O.083x

    lEo =

    13.1 1 -

    x) +

    10.

    Ix

    ,

    for

    xO.45 ,

    14a)

    (14b)

    Cl4c)

    where

    ma and Eo

    are

    the

    free electron mass

    and

    the vacuum

    static dielectric constant, respectively.

    Ao Transmission

    probability across

    quantum barrier

    structures

    The

    transmission probability is calculated in semicon

    ductor-insulator-semiconductor SIS) structures with

    a

    rec

    tangular barrier

    and

    with a parabolic barrier as shown in

    Figs.

    3(a) and 3(b),

    respectively.

    Figure 4(a) shows

    the

    transmission probability

    D

    for

    x =

    0.05 eV across

    the

    rectangular barrier [in Fig. 3

    (a)]

    with respect

    to VI> In

    these calculations,

    the barrier

    is divid

    ed into

    N

    segments with

    N

    values ranging between 10 and 80.

    There

    is only a slight difference in solutions for

    N;;.40 and

    they converge

    to the

    solid curve

    [in

    Fig. 4(a)] for

    N;;.80.

    For

    this case,

    the Airy

    functions can give

    the

    exact solution,

    6

    which coincides with the solid curve.

    The

    oscillatory behav

    ior ofD

    Vb

    ) is presumed

    to

    be due

    to

    resonance through the

    virtual states above

    the

    barrier.

    16

    Electron wavelengths

    at

    the

    resonant states are about 80 A for

    Vb =

    1 V

    and

    50 A for

    a)

    Rectangular Barrier

    (b)

    Parabolic Barrier

    AlxGal-xAs

    x ~ O - O _ 5 - 0 )

    f ~ 7 e v

    ~ E

    GaAs

    ~ - - -

    350A

    --0. GaAs

    FIG. 3.

    Analyzed single-barrier structure

    band

    diagrams. (a) Rectangular

    barrier. (b) Parabolic barrier.

    1499

    J. Appl. Phys., VoL

    61

    ,

    No.4,

    15

    February 1987

    .,...

    '"

    10-2--- - 0 _ - - -

    _____

    _ I

    a)

    Rectangular

    Barrier L\j

    r

    Ex:=:O 050V

    /1

    j

    1

    I

    1

    p J

    J ~

    ~ _ J

    N=20

    N=40,80

    0.5 Hi

    1.5

    Voltage (v)

    -- -

    ~

    b)

    Parabolic

    Barrier

    Vb=O

    1 0

    I' i

    i\

    i \ /

    . \ \ I.

    N=9

    N=15

    .. \

    . \ I . '

    , v i.j I.

    \ 1

    0.0 L

    - l N _ = _ 1 _ 9 _ . 3 _ 9 ~ - - _ . _____

    L__J

    ao

    Q4

    Q8

    Energy eV)

    FIG. 4. Transmission probability plot la)

    vs

    voltage for the rectangul

    barrier shown in Fig.

    3(aJ.

    where

    Nvalues

    range from

    10

    to 80,

    and

    (h)

    electron energy calculated for the parabolic

    barrier

    sh )wn in Fig.

    3(b

    where N values range from 9 to 39.

    Vb

    =

    2 V whereas the width

    of

    each segment is about 9 A

    for

    N

    = 40. Thus, in the present method, the exact solutio

    can be obtained by choosing a segment

    width

    sufficient

    smaller

    than the

    electron wavelengths

    at

    the resonant state

    Fignre

    4

    b) shows transmission probability

    D

    acros

    the

    parabolic barrier

    [in

    Fig. 3

    (b)] at thermal

    equilibrium

    with respect to

    E

    for

    N

    values ranging between 9 and 3

    The

    flat

    structure

    for the transmission probability profiles

    a notable difference from the

    structure

    for a rectangular ba

    rier.

    B. V characteristics for

    double-barrier structures

    The

    transmission probability and

    the -V

    characteristi

    are calculated for double-barrier structures with a rectang

    lar

    well

    and

    with a parabolic well, as

    shown

    in Figs. 5

    (a) an

    5(b),

    respectively.

    Y.

    Ando and

    T.

    Itoh

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    a) Rectangular

    WeI

    AlAs

    AlAs

    GaAs

    I lo ev

    ~ - - - - - - - - Ec

    GaAs ' '30A

    iOOA

    S OA GaAs

    b) Parabolic Well

    AlxGa1-xAs

    x=1-0-1)

    r

    O.956eV

    ---- --

    Ec

    GaAs

    I 100A

    - GaAs

    FIG.

    5

    Analyzed double-barrier structure band diagrams.

    a)

    Rectangular

    well. b) Parabolic well.

    Figures

    6 a)

    and

    6 b)

    show D Ex) for a rectangular

    well [in Fig. 5 a)] with

    N

    = 32

    and

    for

    a

    parabolic well [ in

    Fig.

    5 b)]

    with N

    =

    41, respectively. The peaks of D E

    x

    ),

    En n

    =

    0,1,2, ... ), separa te at regular intervals for a parabol

    ic weIll? as shown in Fig.

    6 b),

    in contrast to that for a

    rectangular well shown in

    Fig. 6 a),

    These results agree wen

    with the concept that boundary state energies are expressed

    as En =

    n

    +

    112)00

    for the quantum

    wen

    expressed as

    U x) =

    1/2)m*w

    2

    x

    2

    ,4

    Calculated J- V characteristics for both structures

    at

    77

    K are shown in Figs.

    7 a) and 7 b).

    Figures

    7 a) and 7 b)

    correspond

    to

    the rectangular well

    and the

    parabolic wen,

    respectively. In these figures, the solid lines denote the

    suIts, including the effects of accumulating and depleting,

    whereas the broken lines denote the results without these

    effects. With the accumulation and depletion t aken into ac

    count,

    the current

    density increases and

    the

    voltage shifts.

    These results show

    that

    voltage drops at contact layers seri

    ously affect J-V characteristics,

    and

    hence, should be taken

    into

    account in analyzing and designing quantum size de

    vices.

    IV. APPLICATION-ANALYSIS OF HETs HOT

    ELECTRON TRANSISTORS)

    The HET, one

    of

    the quantum size effect devices utiliz

    ing electron tunneling through potentia] barriers, was ana

    lyzed

    to

    show

    the

    feasibility of this method.

    A. AnalysiS procedure for

    HETs

    Figure 8 is

    a

    band diagram

    of the HET

    proposed by

    Heiblum. 18 The

    J-

    V

    characteristics

    ofHETs

    can be analyzed

    applying the present calculation to the potential function

    U X,VBE,V

    CB

    shown in Fig. 8), where

    VEE

    is the voltage

    applied between emitter and base, and VeE is the voltage

    between the base and collector. The present calculation is the

    1500

    J.

    Appl. Phys., Vol. 61,

    No.4,

    15

    February 1987

    10

    0

    0.0

    0.0

    (a) Rectangular Well

    0.5

    1.0

    Energy (eV)

    (b)

    Parabolic Well

    0.5

    Energy (eV)

    1.0

    FIG. 6 Transmission probability vs electron energy plot

    a)

    calculated for

    the rectangular well structure shown in Fig. 5

    a)

    and b) calculated for the

    parabolic well struc ture shown ill Fig. 5 b )

    extension

    of that

    used for

    MOMOM

    Cmetal-oxide-metal

    oxide-metal) devices. 18

    The transmi.ssion probability DE Ex, VEE across the

    emitter barrier and Dc Ex,

    V

    CB ) across the collector barrier

    can be calculated, as described in Sec.

    II

    A. Current density

    JE between the emitter and

    base,

    was calculated as de

    scribed

    in

    Sec. II B That is,

    qm*

    1

    E E

    x

    ) = ~ D E E x ) [ iE E ) iB E)]dE ,

    21117 Ex

    15)

    Y. Ando and

    T.

    Itoh

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    6

    E

    D

    --

    4

    -;J

    o-E

    (/)

    c

    OJ

    0

    -

    2

    ::J

    ,)

    0

    0.0

    6

    E

    ()