21
Calibration and performance validation of optical elements in a photoelastic modulator- based polarimetric camera Anna-Britt Mahler, Russell Chipman, and Stephen C. McClain College of Optical Sciences, University of Arizona David J. Diner, Ab Davis, Nasrat Raouf, Sven Geier, and Bruce Hancock Jet Propulsion Laboratory, California Institute of Technology

Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

Embed Size (px)

Citation preview

Page 1: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

Calibration and performance validation of

optical elements in a photoelastic modulator-

based polarimetric camera

Anna-Britt Mahler, Russell Chipman, and Stephen C. McClain

College of Optical Sciences, University of Arizona

David J. Diner, Ab Davis, Nasrat Raouf, Sven Geier, and Bruce Hancock

Jet Propulsion Laboratory, California Institute of Technology

Page 2: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

2

Science objectivesDeveloping the Multi-angle SpectroPolarimetric Imager (MSPI)

Under NASA's Instrument Incubator Program (IIP)

Multiple technologies in a single instrument

Advance our capability to monitor and characterize aerosols from space

Cloud-aerosol interactions are a major source of uncertainty in climate

change prediction

Global particulate pollution is a major public health concern

Page 3: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

3

Science objectives

Desired retrievals

Aerosol absorption measured using UV

Particle size and shape constrained using multi-angle intensity data

over wavelengths from VIS through NIR

Real refractive index and particle size variance using accurate

polarimetry

Aerosol plume injection and transport heights provided using stereo

images from multi-angled cameras

Page 4: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

4

Multi-angle SpectroPolarimetric Imager (MSPI)

MSPI will use an

approach similar to

MISR (shown here)

9 Aerosol

SpectroPolarimetric

cameras (ASPC)

8 spectral bands from 355 nm to 935 nm

±31º cross-track FOV

Relative Transmittance

0.0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

0.9

1.0

300 400 500 600 700 800 900 1000

Wavelength (nm)

Rela

tive t

ran

sm

itta

nce

±31º

Page 5: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

5

MSPI instrument architecture

Dual photoelastic

modulator (PEM) and wave

plate assembly modulate

the polarization state

Dual-PEM approach

circumvents inaccuracies

introduced by detector gain

changes or uncertainties

Bandpass filters

with analyzers in

different

orientations

Page 6: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

6

We report on the status of our prototype camera

development

The theoretical and experimental work

on the required and measured

performance of:

Spectro-polarimetric filters

Quarter wave plates

Tandem PEMs

Measurement of mirror polarization

Camera polarization calibrationWavelength (nm)

Dia

ttenuation

Wavelength (nm)

Dia

ttenuation

Page 7: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

7

Spectropolarimetric filters are assembled and located

just above the CMOS focal plane

Long, thin filter strips

must be fabricated to

meet specifications on

uniformity, spectral

bandwidth, and

transmission

Adjacent line arrays

must be geometrically

close to minimize

parallax and avoid errors

in geometric calibration

Page 8: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

8

Bandpass filters are meeting transmittance

requirementsRelative Transmittance

0.0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

0.9

1.0

300 400 500 600 700 800 900 1000

Wavelength (nm)

Rela

tive t

ran

sm

itta

nce

Filter fabrication in progress for

both the brassboard (660 nm band

only) camera and the full multiband

camera

Measurements show

high transmission

Out-of-band suppression meets

specifications

Spectral band center

wavelengths and widths

660 nm Bandpass Filter Transmittance

0

10

20

30

40

50

60

70

80

90

100

630 640 650 660 670 680 690

Wavelength (nm)

Tra

ns

mit

tan

ce

Page 9: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

9

Patterned polarizer transmission and contrast are

expected to meet SNR specifications

Polarizers are patterned on a

separate substrate prior to

integration with the filters rather

than slicing them

Polarizer to filter bonding causes

a loss of transmittance and

polarization contrast ratio, but

SNR changes only by 5 to 15%

Tra

nsm

issio

n

Contrast ratio

Before bonding

polarizer to

filter

After bonding

polarizer to

filter

865 nm470 nm 660 nm

SNR Contour Plot

Page 10: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

10

Achromatic quarter wave retarders

0º ± 0.13º0º ± 0.1ºRetardance uncertainty

90º ± 5º for 660-nm camera,

Achromatized design in process

90º ± 5ºBand-integrated retardance

0º ± 0.125º0º ± 0.1ºAlignment uncertainty

0º ± 0.125º0º ± 0.5ºAlignment offset between fast axes

Demonstrated CapabilityRequirementParameter

Zero-order quartz quarter wave

plate alignment setup

Page 11: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

11

Tandem PEM signal sampling requirements have

been established based on noise sensitivity analyses

The dual PEM assembly is at technology readiness level (TRL) 5

Dual PEM signal timing and phasing requirements have been established

to minimize DoLP errors and have been incorporated into the detailed

signal sampling design

Electronics to implement all of these requirements have been fabricated

and logic design and testing of the FPGAs is in process

Diner, D.J., A. Davis, B. Hancock, G. Gutt, R.A. Chipman and B. Cairns, “Dual-photoelastic-modulator-based polarimetric

imaging concept for aerosol remote sensing,” Applied Optics 46, issue 35, pp. 8428-8445 (December 3, 2007).

Page 12: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

12

Mirror coating requirements

High reflectivity broadband

Controlled retardance

Mirror coating retardances should be close to 1/2 a wave of retardancein the polarization bands

Prevents the coupling of circular into linear polarization

Low diattenuation

Diattenuation <1% broadband is required so that cameras can operateas high-accuracy intensity imagers in non-polarization bands

ps

ps

RR

RRD

+=

Page 13: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

13

System model predicts overall diattenuation < 1%

Wavelength (nm)

Diattenuation

400. 450. 500. 550. 600. 650. 700.

0.002

0.003

0.004

0.005

0.006

0.007

0.008

0.009

Wavelength (nm)

Diattenuation

400. 450. 500. 550. 600. 650. 700.

0.002

0.003

0.004

0.005

0.006

0.007

0.008

0.009

Full field pupil-averaged diattenuation

Diattenuation Pupil Map

0.09 Diattenuation

-1 0 1

X-AXIS

-1

0

1

Y-AXIS

Diattenuation Pupil Map

0.09 Diattenuation

-1 0 1

X-AXIS

-1

0

1

Y-AXIS

Line length indicates

diattenuation magnitude.

Line orientation

indicates direction of

dominant polarization

More difficult to

control at lower

wavelengths

Page 14: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

14

Measured diattenuation of the mirror witness

samples agrees with model predictions

Page 15: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

15

Full system measurements imply < 1.5% system

diattenuation from 450 - 700 nm

Assembled camera polarization is slightly higher than expected from the

model and the witness sample measurements

The difference between the measurements is under study

Wavelength (nm)

Dia

ttenuation

Wavelength (nm)

Dia

ttenuation

Page 16: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

16

The PSG (partial polarization state generator) is a

precision tool for calibration of the ASPC camera

Careful control of scattered light has allowed the

PSG to be calibrated to generate DoLPs ranging

from 0.07% to 40% with an uncertainty of 0.05%

in the 660 nm waveband

DoLP as a function of pupil

location for a given plate tilt angle

Page 17: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

17

Critical component performance and requirements are

established

Progress on MSPI critical technologies continues

We are entering the system integration phase

Data acquisition campaign will begin in the fall

An airplane flight test is scheduled to occur next year

Page 18: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

18

Acknowledgements

This research is being carried out at the

Jet Propulsion Laboratory, California Institute of

Technology, under contract with NASA and at the

University of Arizona College of Optical Sciences

under subcontract with JPL

Page 19: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

19

Optical design

3-mirror off-axis telescope

Reflective design accommodates

our various wavelengths

Effective focal length of 29 mm

Spherical

primary

mirror

Ellipsoidal

secondary

mirror

Ellipsoidal

tertiary

mirror

Telecentric

In image

space

Dual PEMs

and waveplates

Field of view is

±31º cross-track

±1º along-track

Page 20: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

20

Mechanical design

Dual-PEM assembly in front of

the camera opto-mechanical

assembly.

Camera with PEM assembly

installed and cover removed.

L x W x H = 215 mm x 233 mm x 160 mm.

Page 21: Calibration and performance validation of optical … elements in a photoelastic modulator-based polarimetric camera ... phase Data acquisition ... to the modulation pattern was baselined

21

Tandem PEMs signal sampling requirements have been

established based on noise sensitivity analyses

The dual PEM assembly is at technology readiness level (TRL) 5

PEM timing requirements minimize DOLP errors

Photon shot noise is calculated to be the limiting source of error

Synchronization of image frames to the modulation pattern was

baselined.

Dual PEM signal timing and phasing requirements have been

incorporated into the detailed signal sampling design

A minimum of 16 subframes will sample the modulation pattern during

an image frame

These subframes will be synchronized to the mean frequency of the two

PEMs

PEM signals are mimicked in the electronics by means of phase-locked

loops (PLLs) tied to the PEM controller signals

The PLL have been tested with the PEMs

Electronics to implement all of these requirements have been fabricated

and logic design and testing of the FPGAs is in process