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Electron emittance reduction using variable bends, USPAS, January 2008 1 Effective emittance reduction using variable field dipoles in electron storage rings Yannis PAPAPHILIPPOU CERN United States Particle Accelerator School, University of California - Santa-Cruz, Santa Rosa, CA 14 th – 18 th January 2008

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Page 1: Effective emittance reduction using variable field dipoles ... › teaching › effectiveemmitance.pdfy 2 0 0 8 2 Lattice upgrade options Vertical emittance due to coupling Horizontal

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Effective emittance reductionusing variable field dipoles in

electron storage rings Yannis PAPAPHILIPPOU

CERNUnited States Particle Accelerator School,

University of California - Santa-Cruz, Santa Rosa, CA14th – 18th January 2008

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Lattice upgrade options

Vertical emittance due to coupling

Horizontal emittance depends on the energy, the bending angle and thedamping partition number

Increase number of dipoles, e.g.from Double Bend to Triple Bendstructure. Difficult due to spaceconstraints

Vary field along bending magnetto increase radiation damping,i.e. Double Variable Bendstructure

Decrease the energy is not anattractive option for the ESRF (ID’sare optimized for 6GeV)

Increase the damping partitionnumber is mostly used for matchingand not for emittance minimisation.

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For isomagnetic lattices, the minimum effectiveemittance depends on the integral

Increase bending radius (i.e. decrease dipolefield) where is high and vice-versa

Longitudinally varying dipole fields(Wrulich 1992, Guo andRaubenheimer 2002, Nagaoka2004)

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The notion of effective emittance

Reaching the minimumtheoretical emittance

Horizontal dispersion inthe straight section

Enlargement of the beam sizethrough the electron energyspread at the ID

The brilliance is inversely proportional to

the effective emittanceAfter replacing the expressions for position and angles and consider that the alphafunction and dispersion derivative are zero on the ID

Page 5: Effective emittance reduction using variable field dipoles ... › teaching › effectiveemmitance.pdfy 2 0 0 8 2 Lattice upgrade options Vertical emittance due to coupling Horizontal

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Effective emittance reminder

Equilibrium energy spreadEquilibrium betatron emittance

“Phase space invariant”

Damping partition numbers

Radiationintegrals

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Optics functions for a generalized bend

Consider the transport matrix of a generalized dipole magnet withvarying bending radius, in thin lens approximation and ignoring edgefocusing

At its entrance (from the ID side)the initial optics functions are

and their evolution along themagnet is given by

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Effective emittance with respect to initial optics functions

with

The transverse emittance is

By setting , we get an expression of the effective emittance atthe ID, depending on the initial optics functions

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Optics functions’ conditions for minimum effective emittance

Finally, one has to solve the following equation for the dispersionderivative

After some lengthy manipulations and exploiting certain symmetries ofthe equations, we obtain the following relations

The conditions for minimum effective emittance are

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Keeping the real solution of the 3rd order polynomial equation, and replacing inthe previous conditions, we obtain the optics functions for minimum effectiveemittance

Optics functions and minimum effective emittance forarbitrary dipole fields

with By replacing, we get an analytic expression for the minimum effective

emittance for any dipole field profile

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For an ESRF Double Bend lattice (64 dipoles, 6GeV), the minimum effectiveemittance is 1.69nm

Setting the minimum betatron emittance is obtained for the optics functionconditions

Imposing achromatic conditionsthe minimum betatron (=effective) emittance is obtained for the optics function conditions

Special cases

which is a factor of 1.55 higher than theminimum betatron emittance

In the case of constant field we obtainthe relation of Tanaka and Ando (1996)

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Variable bend with three steps Simple field configuration (see

ESRF dipole with soft edges) Maximum of 1.7 T to avoid

saturation Minimum effective emittance of

0.77nm obtained The emittance can be further

minimized by adding moresteps or raising the maximumbending field

The optics function, at theentrance, for this configuration

0

10

20

30

40

50

60

70

7,00 7,50 8,00 8,50 9,00 9,50 10,00

S [m]

Be

nd

ing

ra

diu

s [

m]

11.8m (1.7T)

26.5m (0.75T)

65.6m (0.31T)

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Equilibrium energy spread in a DVB

For a uniform field dipole

0

10

20

30

40

50

60

70

7,00 7,50 8,00 8,50 9,00 9,50 10,00

S [m]

Be

nd

ing

ra

diu

s [

m]

11.8m (1.7T)

26.5m (0.75T)

65.6m (0.31T)

For the Variable 3-step bend

andThe energy spread is

Taking the uniform field approximationthis implies that for having the sameenergy dispersionand the max. field should drop accordingly

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9.0E-04

1.0E-03

1.1E-03

1.2E-03

1.3E-03

1.4E-03

1.5E-03

2.0 2.5 3.0 3.5 4.0 4.5

Length [m]

__p

/p

0.7

0.9

1.1

1.3

1.5

1.7

1.9

2.0 2.5 3.0 3.5 4.0 4.5

Length [m]B

ma

x [T

]

_x=0.80nm

_x=0.85nm

_x=0.90nm

_x=0.95nm

_x=1.0nm

Constraining the dipole field

We choose 1.3e-3 as the target energy spread (13%reduction in the flux for harmonic 3 at 1nm)

A fixed energy spread and a dipole length of 2.4m willimpose the maximum field (1.4T) and the minimumemittance

Page 14: Effective emittance reduction using variable field dipoles ... › teaching › effectiveemmitance.pdfy 2 0 0 8 2 Lattice upgrade options Vertical emittance due to coupling Horizontal

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0

0.5

1

1.5

0 1 2 3

Length [m]

Be

nd

ing

fie

ld [

T]

Choosing the variable dipole Minimum emittance

achieved of 0.85nm Maximum field of 1.4T Initial opticsfunctions are

compared tofor the extremeDVB (0.77nm)

and for theactual SR Note thatbeta at the dipole exit is 19m

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Phase advance for minimum effective emittance cell

General rule: Provided that dispersion is not zero, there is a uniquephase advance for a straight section with mirror symmetry in the center

Given the initial (final) optics functions the phaseadvance for such a line is

Applying the result to an arbitrary double bend cell, we obtain

a function depending only on the initial optics functions and the dipole !!!

The horizontal phase advance for reaching the absolute minimumeffective emittance at the ESRF storage ring is 293

o (205

o actually)

The horizontal phase advance for reaching the effective emittanceminimum for the three step double variable bend lattice is 355

o

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By detuning the initial beta anddispersion we obtain curves ofequal effective emittance ratio

Possibility to have a 4-parametric plot for all opticsfunctions

Note that by detuning theoptics functions, the phaseadvance also changes (lowerfor higher F values)

Emittance ratio for detuned optics functions

F=1

(Emma and Raubenheimer 2001, Streun 2001,Korostelev and Zimmermann 2003)

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Constraints for general double bend cells

Consider a general double bend with the idealeffective emittance (drifts are parameters)

In the straight section between the ID and thedipole entrance, there are three constraints,thus at least three quadrupoles are needed

In the “achromat”, there are two constraints,thus at least two quadrupoles are needed (oneand a half for a symmetric cell)

Note that there is no control in the verticalplane

The vertical phase advance is also fixed!!!! Expressions for the quadrupole gradients can be

obtained, parameterized with the drift lengths,the initial optics functions and the beta on theIDs

All the optics functions are thus uniquelydetermined for both planes and can beminimized (the gradients as well) by varying thedrifts

The chromaticities are also uniquely defined

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Constraints for a Double Variable Bend structure @ theESRF

Constraints for the dipoleEnergy of 6GeV, 64 dipoles, i.e. total bending radius of π/32Dipole length of 2.3mMaximum dipole field of 1.4T (imposed by momentum spread of 1.3e-3)

Constraints for the driftsCell length of 26.4mID drift of 3m vertical beta of 2.5m at the IDDrift next to dipoles ρ 0.5m (space for the absorber)Drifts between quadrupoles ρ 0.5m (space for sextupoles, correctors, BPM, etc.)

Constraints for the quadrupolesMaximum gradient of 45T/m (reducing the bore diameter by a factor of 2)

Constraints for the sextupolesMaximum integrated sextupole strength of 35m-2

Constraints for the optics functionsHorizontal betas at the IDs of 35 and 1mMaximum betas (chromaticity) as low as possible

(Master thesis of T. Perron 2002)

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0.00

5.00

10.00

15.00

20.00

25.00

30.00

35.00

40.00

45.00

0.000 5.000 10.000 15.000 20.000 25.000 30.000

-0.040

-0.020

0.000

0.020

0.040

0.060

0.080

0.100

0.120

0.140BetaX BetaZ Dispersion

• Effective Emittance of 0.96nm (0.95nm in the high betaand 0.97nm in the low beta)• Max. quad strength of 45T/m (15 T/m for the SR• Max. betas of 35 and 40m (46 and 35m for the SR)• Maximum dispersion of 0.13m (0.34m for the SR)• Chromaticities of (-169, -160) (-132, -50 for the SR)• Phase adv. of (357o,166o) (205o,81o for the SR)

0.00

5.00

10.00

15.00

20.00

25.00

30.00

35.00

40.00

45.00

50.00

0.000 5.000 10.000 15.000 20.000 25.000 30.000

-0.050

0.000

0.050

0.100

0.150

0.200

0.250

0.300

0.350

0.400BetaX BetaZ Dispersion

Extreme DVB with low energy spread

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High phase advance implications

Big phase advance

Strong quadrupolesHigh Chromaticity

Small dispersion

Strong sextupolesSmallSmall dynamicdynamic apertureaperture

Limited injection apertureLimited injection apertureLimited lifetimeLimited lifetime

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Some comments…

• The maximum quad length is of0.9m• The distance between thedipoles and quads is 0.5m (min.distance allowed between dipolesand quads)• The distance between the quadsin the middle of the “achromat” isbigger than 3m• In that area, the hor. beta issmall (only efficient for verticalchromaticity correction)• This space can be occupied byanother dipole or ID element(convergence between TBA andDVB solution)• Preliminary non-linearoptimisation showed poor DA

βy βx

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Relaxed DVB with low energy spread

0.00

5.00

10.00

15.00

20.00

25.00

30.00

0.000 5.000 10.000 15.000 20.000 25.000 30.000

-0.050

0.000

0.050

0.100

0.150

0.200

0.250BetaX BetaZ Dispersion

• Effective Emittance of 1.55nm (1.5nm in the high beta and1.61nm in the low beta) (compared to 0.96)• Max. quad strength of 46T/m (compared to 45 T/m)• Max. betas of 35 and 40m (compared to 35 and 40 m)• Maximum dispersion of 0.19m (compared to 0.13m)• Chromaticities of (-110, -89) (compared to -169, -160)

• Phase adv. of (275o,129o) (compared to 357o,166o)• The maximum quad length is of 0.8m• The distance between the dipoles and quads is 0.5m•The distance between the quads in the middle of the“achromat” is 3.8m, with the same low hor.beta• Preliminary runs show a horizontal DA of around 30mm(target value is 20mm imposed by injection aperture)

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Scaling of the chromaticity with emittance

Emittance scales almost linearly with chromaticity. Question to be answered: lowest emittance that can be achieved which leading

to a reasonable DA. Preliminary scaling suggests that this emittance may be found around 1.3nm Top-up could allow a small of momentum DA (lifetime), at least 10mm are

mandatory for ensuring efficient injection.

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Upgrade stages

• Long interruption time for installation of all components

• Long commissioning to reach ultimate performance (2-3 years)

Ultimate latticedrawbacks

• Changing half of each cell (achromat)

• Increase the phase advance to reach 2nm

• Increase the current to 300mA (feed-back)

• 3-fold increase of brilliance

• All dipoles replaced by variable bends

• Small gain in emittance

• All straight section magnets are replaced

• Sub-nanometer emittance

• An RF upgrade to reach more than 500mA

• Brilliance increased by a factor of 10

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Design challenges

Adequate dynamic aperture for high phase advance cellsVariable bending magnets field qualityBuilding high gradient quadrupoles with incorporated

sextupole componentsDesign of new absorbers to sustain high beam power due to

current upgradeHigh-gradient magnets need low gaps and small vacuum

chambers, i.e. impedance increase (NEG coating)Design of septum with smaller sheet thicknessOptimising injection process (booster, transfer lines) to allow

continuous top-up operation