166
1 ABSTRACT Effects of Electronic Correlation and Host Isotopes on Infrared Spectra of Impurities in Semiconductors by Jiro Kato Solid-state device fabrication processes demand precise control of dopants in semiconductors, as the electronic and vibrational properties of semiconductors are subject to the species, concentration, and position of impurities, i.e., fundamental understanding of physics and chemistry of the impurities has been crucial for the advancement of today’s novel electric devices. Among a wide variety of optical measurements, infrared spectroscopy has contributed greatly to the better understanding of electronic (e.g., the hydrogenic model of shallow impurities, etc.) and vibrational (e.g., local vibrational modes of light impurities, etc.) properties of impurities in semiconductors. In parallel to the advancement of the characterization techniques, semiconductor crystal growth and doping technologies have advanced so much that impurity control at the level of <10 13 cm -3 and isotopic composition control of host semiconductors at the level of <10 18 cm -3 become possible. The present thesis describes the details of impurity physics revealed by infrared spectroscopy of advanced semiconductor materials in which the impurity concentration and/or host semiconductor isotopic composition are controlled precisely. After a brief introduction of infrared spectroscopy of impurities in

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1

ABSTRACT

Effects of Electronic Correlation and Host Isotopes

on Infrared Spectra of Impurities in Semiconductors

by

Jiro Kato

Solid-state device fabrication processes demand precise control of dopants in

semiconductors, as the electronic and vibrational properties of semiconductors are

subject to the species, concentration, and position of impurities, i.e., fundamental

understanding of physics and chemistry of the impurities has been crucial for the

advancement of today’s novel electric devices. Among a wide variety of optical

measurements, infrared spectroscopy has contributed greatly to the better

understanding of electronic (e.g., the hydrogenic model of shallow impurities, etc.)

and vibrational (e.g., local vibrational modes of light impurities, etc.) properties of

impurities in semiconductors. In parallel to the advancement of the

characterization techniques, semiconductor crystal growth and doping technologies

have advanced so much that impurity control at the level of <1013 cm-3 and isotopic

composition control of host semiconductors at the level of <1018 cm-3 become

possible. The present thesis describes the details of impurity physics revealed by

infrared spectroscopy of advanced semiconductor materials in which the impurity

concentration and/or host semiconductor isotopic composition are controlled

precisely.

After a brief introduction of infrared spectroscopy of impurities in

2

semiconductors (Chapter 1) and its experimental details (Chapter 2), I describe the

main results of the present thesis in Chapter 3 and 4.

Chapter 3 discusses the broadening of ground-state to bound excited-state

transitions of shallow donors in strongly compensated n-type Ge:(As,Ga) in the

presence of electric fields and their gradients, arising from randomly distributed

ionized impurities. Quantitative comparison of the experimentally obtained

linewidths with Monte Carlo simulation results makes possible a unique

determination of the ionized impurity distribution in the samples. We present clear

evidences for the random-to-correlated transition of the ionized impurity distribution

as a function of the ionized impurity concentration and of temperature.

Chapter 4 discusses a high-resolution infrared absorption study of the localized

vibrational modes (LVMs) of oxygen in isotopically enriched 28Si and 29Si single

crystals. Isotope shifts of LVM frequencies from those in natural Si are clearly

observed not only due to the change of the average mass in the nearest neighbor

silicon atoms but also to that of the second and beyond nearest neighbors. The

amount of these shifts agree quantitatively with calculations based on the harmonic

approximation. However, the linewidths of certain LVMs in the enriched samples

are much narrower than those in natural Si, despite the fact that the harmonic

approximation predicts very little dependence of the width on the host Si isotopic

composition. Such observation suggests that both anharmonicity and

inhomogeneous broadening due to isotopic disorder are playing important roles for

the determination of the oxygen LVM linewidths.

Chapter 5 provides the summary and future prospective based on the results

obtained in the present thesis. Non-destructive and precise determination of the

impurity concentration in semiconductors will become increasingly important in the

3

future for the development of advanced semiconductor structures. The present

work has shown that electronic correlation, mass disorder, and multi-phonon

emission contribute all together to the broadening of absorption linewidths, from

which the carrier concentration in semiconductors is determined non-distractively.

The subtle but important line broadening mechanisms discussed in this work may

have to be incorporated in the future for the precise determination of the impurity

concentrations.

4

Table of Contents

Chapter 1: Introduction

1.1 Infrared spectroscopy of shallow impurities in semiconductors – historical

background and its relation to the work presented in Chapter 3

1.2 Infrared spectroscopy of localized vibrational modes of impurities in

semiconductors – historical background and its relation to the work

presented in Chapter 4

References of Ch. 1

Chapter 2: Infrared spectroscopy of semiconductors

2.1 Michelson Interferometer

2.2 Phase

2.3 Resolution

2.4 Spectral range

2.5 Detector response and scan speed

2.6 Combination of elements in BOMEM DA-8 FT spectrometer

2.7 Calculation of the absorption coefficient

2.8 IR absorption measurement procedures

References of Ch. 2

Chapter 3: Observation of the random-to-correlated transition of the

ionized impurity distribution in compensated semiconductors

3.1 Introduction

7

7

14

18

20

20

30

32

38

39

43

47

50

53

54

54

5

3.2 Experimental Procedures

3.2.1 Samples

3.2.2 Hall effect determination of the As and Ga concentrations of

each sample: procedures and results

3.3 Results and discussions

References of Ch. 3

Chapter 4: The host isotope effect on the local vibrational modes of

oxygen in isotopically enriched crystalline 28Si, 29Si and 30Si

4.1 Introduction

4.2 Experimental procedures

4.3 Results and discussion

4.3.1 Effect of 1st nearest-neighboring host silicon atoms

4.3.2 Effect of the 2nd and beyond nearest-neighboring host atoms

4.3.3 Effect of host silicon isotopes in the oxygen LVM linewidths

References of Ch. 4

Chapter 5: Summary and future prospects

Appendices

Appendix A: Theoretical models for linewidth calculation in Chapter 3

A.1 Importance of using an anisotropic wavefunction

A.2 Calculation based on Kohn-Luttinger’s wavefunction

A.3 Calculation based on Faulkner’s wavefunction

A.4 Summary of the theoretical models

66

66

69

73

82

84

84

89

95

95

103

106

109

111

114

114

114

117

122

127

6

A.5 Monte Carlo methods for the linewidth calculations

Appendix B: Calculation for energy of the 1s orbital in Ge according to

Kohn-Luttinger method

Appendix C: Calculation for energy of the 2p(m=1) orbital in Ge according to

Kohn-Luttinger method

Appendix D: Calculation for energies of orbitals in Ge according to Faulkner’s

method

Appendix E: Calculation for linewidths of 1s-2p lines in the case of random and

correlated distribution

Appendix F: Calculation of one-dimensional harmonic linear chain model

Appendix G: Calculation of vibration energies of oxygen in silicon crystal with a

liner chain model of 20 atoms.

Appendix H: Calculation of vibration energy of oxygen doped silicon crystal

with a three-dimensional nine-atom molecule model.

Acknowledgement

129

136

137

138

144

152

157

159

166

7

Chapter 1: Introduction

1.1 Infrared spectroscopy of shallow impurities in semiconductors – historical

background and its relation to the work presented in Chapter 3

The present semiconductor technology began during the World War II when

intense efforts were made to develop microwave detectors. The group IV elemental

semiconductors such as silicon and germanium were identified as the most

promising materials. It was soon established that imperfections – their nature and

concentration – played a decisive role in the magnitude and the type of conductivity.

At sufficiently low temperatures, the Hall coefficient of silicon with group V

impurities like phosphorus in high enough concentrations is negative whereas it is

positive when the impurities belong to the group III of the periodic table of elements.

In the former, electron dominates the conductivity (n-type) while holes constitute the

majority current carriers in the latter (p type). The development of a crystal growth

and the introduction of known impurities in controlled amounts have proved to be

the crucial factors in the remarkable range of semiconductor devices that had been

invented. It became possible to produce, for example, germanium crystals free of

dislocations with impurity concentrations in range of 108-1020 cm-3. With such an

astonishing level of control, a wide range of basic solid-state experiments has

become possible.

Much effort has gone into establishing the nature of imperfections in

semiconductors. Intrinsic defects (vacancies, interstitials, line defects, etc.),

isolated impurities at substitutional and interstitial positions, and impurity complexes

are some of examples of imperfections which have received a great deal of

8

attentions.1 In case of group V impurity phosphorus in silicon, a variety of

evidences 2 have been adduced to prove that it enters the host in a site normally

occupied by a silicon atom, i.e. substitutionally. Four of the five of its outermost

electrons in the 2s23p3 states form covalent bonds with its four nearest neighbors.

The fifth electron not incorporated in this bonding scheme is donated to the

conduction band. However, it remains bound to the P+ ion by the Coulomb

attraction. It is clearly of interest to find out how tightly the ‘donor’ electron is

bound and to establish its energy level scheme. The potential energy of the donor

electron must take into account the adjustment of the charge density of the host in

the field of the positively charged donor. The evaluation of this potential is a

many-body problem. However, for distances r large compared to the lattice

spacing a, this adjustment can be viewed as a polarization of the host described by

its static dielectric constant, κ. In this limit the potential is

( ) rerU κ2−= . (1-1-1)

Closer to the impurity U(r) is more attractive, the dielectric screening being less

effective, approaching –e2/r as r becomes comparable to the size of the P+ ion. It

should be recognized, however, that the donor wavefunction must be orthogonal to

the core states of the P+ ion. It can be shown that this constraint results in an

approximate cancellation of the kinetic and potential energies close to the impurity

center which in turn justifies the potential in Eq. (1-1-1). In a crystal electrons

behave under an external field as particles with an effective mass m* different from

the free-electron mass, m, and often much smaller. Under these assumptions, the

donor electron will have hydrogen-like bound states as shown in Fig. 1-1-1 given by

9

2224 2* nemEn κh−= (1-1-2)

where n=1,2,3,…. . For example, in GaAs, m*=0.06650m and κ=12.58 yield an

ionization energy, EIonized=-E1=5.72 meV and the corresponding Bohr radius

22 ** ema κh= =100Å.3 Since a*>>a, the use of an effective kinetic energy

(p2/2m*) is justified, therefore providing validity for equation (1-1-2). This simple

model4 needs to be modified for semiconductors in two important respects. (i) To

the extent equation (1-1-1) fails to describe the true potential, the binding energies of

different impurities in Si or Ge, for example, are not the same. (ii) The effective

mass m* for many semiconductors is a tensor rather than a scalar, reflecting the

nature of the conduction band. In an analogous fashion one can develop a model

for substitutional group III impurities in Si or Ge which bind the hole created in the

valence band resulting from the formation of the covalent bonds with its nearest

neighbors.

Fig. 1-1-1 Excitation schemes of an electron bound to arsenic impurity in group IV

semiconductors. The figures on the left shows a highly simplified picture of orbitals

in the real space, in the middle and on the right show the band diagrams.

Ionization

Conduction Band

As Donor States

Valence Band

Conduction Band

Excitation

Excitation

10

These impurities which have accepted an electron from the valence band to complete

the bonding scheme with its four nearest neighbors are called ‘acceptors’. The

details of the bound states of the acceptor reflect the characteristics of the valence

band maximum of the host. (For a convenient summary of the symmetries and mass

parameters of the band maximum of the semiconductors, we refer the readers to

appendix C of Ref. 5). The concepts of donor and acceptor impurities are easily

extended to compound semiconductors which are tetrahedrally bonded, e.g. GaAs or

CdTe. In the III-V semiconductors, a group VI impurity like Te in a substitutional

site on the lattice of the group V atoms and the group II impurity like Zn replacing a

group III atom act as a donor and acceptor, respectively. A group VI impurity in a

III-V semiconductor is a donor or an acceptor, depending on whether it substitutes a

group III or a group V host atom.6

The hydrogenic model of donors and acceptors in semiconductors, especially

equation (1-1-2), immediately suggests optical excitation of Lyman, Balmer, …,

series of the hydrogen atom. Such spectra for semiconductors are expected in the

near to far infrared in view of small m* and large κ, which characterize typical

semiconductors. Samples would have to be held at cryogenic temperatures in order

to have neutral (not ionized) donors or acceptors, which are characterized by small

ionization energies. In the early days of semiconductor physics it was felt7 that the

excited states of different impurity centers would overlap in view of their large radii,

** 2anan = . Their binding energies would correspondingly decrease, and they

would merge with the conduction band. It was concluded that only the ground state

would have a finite binding energy. Pioneering experiments by Burstein and

co-workers8 on the Lyman spectra of donors and acceptors in silicon, showed that at

11

sufficient dilution discrete ground and excited states do exist. Since these early

observations, impurity states have been experimentally investigated using (i)

absorption and photoconductivity spectroscopy in the near and far infrared regions,

(ii) Raman spectroscopy, and (iii) photo-luminescence. Such spectra have been

reported for a large number of impurity species in several semiconductors and have

been studied under the influence of elastic strain or magnetic field. In this entire

development there has been a strong interaction of some of the most sensitive

infrared detectors based on the photoconductivity produced by the photoionization of

impurity centers.9 Figure 1-1-2 shows one example of infrared photoconductivity

spectra of silicon doped with phosphorus reported in Ref. 10. The absorption lines

correspond to transitions from the ground state to the excited states in good

agreement with the hydrogenic model.

Fig. 1-1-2 Excited spectrum of arsenic donors in silicon reported in Ref. 10.

Liquid helium is used as a coolant. Instrumental resolution is 0.06 cm-1. Room

temperature resistivity of the sample was ~6 Ωcm corresponding to the free

electron concentration n~7×1014cm-3.

12

Figure 1-1-3 shows discrete energy states calculated by Eq. 1-1-2 and experimental

results obtained by infrared spectroscopy of silicon doped with shallow impurities.

Nondegenerate excited states, such as 2p0, 2p±, and so on, and chemical shift of the

1s states are explained by the difference of the effective mass and the valley-orbit

interaction of the donor states, respectively.

Infrared absorption spectroscopy of shallow impurities is performed in this thesis

using a Fourier Transform Infrared Spectrometer (FT-IR) described in Chapter 2.

In Chapter 3, I will describe far-infrared probing of the distribution of donors and

acceptors in semiconductors.

Theory

Fig. 1-1-3 Energy states of Ⅴ impurities in silicon crystal. Theoretical values

are obtained by Eq. 1-1-2 and experimental values are obtained by infrared

spectroscopy similar to the one shown in Fig. 1-1-1. Difference between

theoretically obtained values and experimentally obtained values are due to

valley-orbit interaction. (Ref. 11)

13

Broadening of the excited levels of shallow arsenic donors is measured and

compared with the prediction of competing theoretical models assuming different

distributions of ionized impurities. The electric field and its gradient due to ionized

donors and acceptors are treated as perturbations. The anisotropic wavefunctions

based on Kohn-Luttinger’s model 12 and Faulkner’s model 13 will be employed

successfully to explain the line broadening of the experimentally observed

absorption peaks. Based on the results, we show a clear evidence for the first time

that the distribution of ionized impurities in semiconductors can change between

correlated and random distributions. This finding is important both scientifically

and technologically. Understanding of ionized impurity distribution is of great

importance because it represents a complicated many-body problems where

Coulombic forces (electron-electron interactions) play important roles. Once

understood, engineers can perform a simple FTIR to characterize the donor and

acceptor concentrations in pure semiconductors.

14

1.2 Infrared spectroscopy of localized vibrational modes of impurities in

semiconductors – historical background and its relation to the work presented

in Chapter 4

As explained in the previous section, the addition of impurities to a semiconductor,

whether by design or accident, introduces energy levels into the band gap. In

addition to altering the electronic properties of semiconductors, impurities also affect

the vibrational properties. Atoms in a crystalline solid collectively oscillate about

their equilibrium positions, resulting in quantized vibrational modes known as

phonons. Einstein14 first treated the problem of phonons by assuming that the

atoms in a solid vibrate independently of one another. Debye15 improved the

Einstein model by treating a solid as an elastic continuum. In this thesis, the term

phonon is used to denote excitations that are extended in real space, involving the

motion of many atoms. Since phonons have a band of phonon frequencies, they are

also extended in frequency space.

As in the case of electrons in a perfect lattice, phonons in a perfect lattice have a

well-defined frequency ω and wave vector q. The ω vs q dispersion relation

can be experimentally determined via neutron scattering.16 When an impurity is

introduced, the translational symmetry is broken and one or more new vibrational

modes may appear. If a mass defect replaces a heavier host atom, for example, its

vibrational frequency will appear above the phonon frequency range. Unlike a

phonon, the vibrational mode of the defect is localized in real space and frequency

space, and is referred to as a local vibrational mode (LVM). Hydrogen, for

example, typically has LVM frequencies 5-10 times the maximum phonon frequency

and has narrow infrared (IR) absorption peaks.

15

The LVMs of impurities are affected by the symmetry of the surrounding

environment. The isotopic composition of the impurity-host system leads to

well-defined splitting and shifts of the vibrational frequencies. In Ge, GaAs, and

CdTe, the host-isotope disorder leads to complex LVM spectra that have been

modeled successfully. The host-isotope splitting provides a unique signature for

determining the site on which an impurity resides. The translational symmetry of a

perfect lattice is broken when a defect is introduced. As a simple example,

consider a harmonic linear chain, where one lattice mass is replaced by a smaller

mass. This model is used for long time within a small correction for many LVM

centers. The details of calculational model are mentioned in Chapter 4.

Fig. 1-2-1 Infrared absorption spectroscopy of interstitial oxygen in germanium

reported in Ref. 17.

16

Figure 1-2-1 shows infrared spectroscopy due to LVMs of interstitial oxygen in a

germanium crystal reported in Ref. 17. In Fig. 1-2-1, the frequencies of LVM

absorption lines depend on masses of oxygen and its two nearest neighboring

germanium atoms. For example, absorption lines labeled as 73.5Ge in Fig. 1-2-1

mean that interstitial oxygen atom is sandwiched by 73Ge and 74Ge atoms.

Symmetry of the potential energy at vibrating oxygen atoms makes a small splitting

of each absorption line. The difference of the intensity of an absorption line

corresponds to the composition of isotopes of a germanium crystal.

Oxygen is an omnipresent impurity in Czochralski-grown silicon, with serious

implications for the fabrication of integrated circuits. High concentrations (1018

cm-3) of oxygen are incorporated in Czochralski-grown crystals,18 as a result of the

dissolution of the SiO2 crucible at the growth temperature. Because an oxygen

atom is lighter than a silicon atom, it has local vibrational modes (LVM) in silicon

crystals. A review of the microscopic structure of oxygen in silicon is given by

Pajot.19 In as-grown silicon crystals, oxygen exists primarily as an interstitial

defect, denoted Oi. In this form, the oxygen binds with two silicon atoms and

resides between two silicon atoms aligned along the <111> direction. Under

uniaxial stress, Corbett, McDonald, and Watkins20 showed that stress along [111] or

[110] directions produced splitting of LVM peaks, whereas stress along the [100]

direction produced no splitting. These observations are consistent with complexes

aligned along the 〈111〉 axes. Ab initio calculations21 have shown that the Si-O

bond lengths to be 1.59 Å and the Si-O-Si bond angle to be 172°.

The most well studied oxygen LVM absorption peak is known as the 9 μm

line appearing at 1100 cm-1 at room temperature.22 The integrated intensity of this

particular absorption peak has become an industry standard for the determination of

17

oxygen concentration in silicon. At liquid-helium temperatures, the peak position

shifts to 1136 cm-1,23 and agrees well with the prediction Ab initio calculation 1104

cm-1. The isotope effect of oxygen has also been investigated as shown in Fig.

1-2-2. 17Oi and 18Oi have stretch-mode frequencies at 1107 and 1084 cm-1,

respectively,24,25 and they are in good agreement with a simple-harmonic-oscillator

model in which the vibrational frequency is inversely proportional to the square root

of the oxygen mass.

Chapter 4 of the present thesis investigates the effect of silicon isotopes on the

LVM of oxygen in silicon. We show that the isotope effect of silicon is far more

complex than that of vibrating oxygen and cannot be explained in the framework of

harmonic approximation. The surprisingly large isotope effect of silicon changes

the linewidths of oxygen LVM significantly and its effect may become important in

the future for the precise determination of oxygen concentration in silicon based on

infrared spectroscopy.

Fig. 1-2-2 Infrared absorption spectroscopy of interstitial oxygen (16O, 17O, and

18O) in natural silicon crystal shown in Fig. 19.

18

References

1 C. P. Flynn, in Point Defects and Diffusion (Claredon, Oxford, 1972).

2 G. L. Pearson and J. Bardeen, Phys. Rev. 75, 865 (1949).

3 G. E. Stillman, D. M. Larsen, C. M. Wolfe, and R. C. Brandt, Solid State

Commum. 9, 2245 (1971).

4 N. F. Mott and R. F. Gurney, in Electric Processes in Ionic Crystals (Claredon,

Oxford, 1940).

5 D. Long, in Energy Bands in Semiconductors (Interscience, New York, 1968).

6 J. M. Whelan, in Properties of Some Covalent Semiconductors in Semiconductors,

(Reinhold, New York, 1960).

7 H. C. Torrey and C. A. Whitmer, in Crystal Rectifiers (McGraw-Hill, New York,

1948).

8 E. Burstein, G. Picus, B. Henvis, and R. Wallis, J. Phys. Chem. 57, 849 (1953).

9 E. H. Putley, Phys. Stat. Solidi. 6, 571 (1964).

10 C. Jaganaath, A. K. Ramdas, Phys. Rev. B 23 4426 (1981).

11 P. Y. Yu and M. Cardona, in Fundamentals of Semiconductors Physics and

Materials Properties Second Edition (Springer, Berlin Heidelberg, 1996) p.162.

12 W. Kohn and J. M. Luttinger, Phys. Rev. 98, 915 (1955).

13 R. A. Faulkner, Phys. Rev. 184, 713 (1969).

14 A. Einstein, Ann. Phys. (Leipzig) 22, 180 (1907); 22, 800 (1907).

15 P. Debye, Ann. Phys. (Leipzig) 39, 789 (1912).

16 B. N. Brockhouse and P. K. Iyergar, Phys. Rev. 111, 747 (1958).4c C. Kittel, in

Phonons, edited by R. W. H. Stevenson (Plenum, New York, 1966), Chap. 1.

17 A. J. Mayur, M. Dean Scicca, M. K. Udo, A. K. Ramdas, K. Itoh, J. Wolk, and E.

19

E. Haller, Phys. Rev. B 49, 16293 (1994).

18 C. Kittel, in Introduction to Solid State Physics First Edition (Wiley, New York,

1986), p. 83.

19 B. Pajot, Chapter V in Semiconductors and Semimetals 42 (Academic, New

York, 1994), p.191.

20 J. W. Corbett, R. S. McDonald, and G. D. Watkins, J. Phys. Chem.Solids 25, 873

(1964).

21 J. C. Mikkelson, Jr., Mater. Res. Soc. Symp. Proc. 59, 19 (1986).

22 R. Jones, A Umerski, and S. Oberg, Phys Rev. B 45, 11321 (1992).

23 R. J. Collins and H. Y. Fan, Phys Rev. 93, 674 (1954).

24 H. J. Hrostowski and R. H. Kaiser, Phys. Rev. 107, 966 (1957).

25 W. Kaiser, P. H. Keck, and C. F. Lange, Phys. Rev. 101, 1264 (1956).

20

Chapter 2: Infrared spectroscopy of semiconductors

Absorption spectra that will be presented in this thesis are recorded with a BOMEM

DA-8 Fourier Transform spectrometer. Basic elements of spectroscopy with the

BOMEM DA-8 are described in this chapter.

2.1 Michelson interferometer

The design of most interferometers used for infrared spectroscopy today is based

on that of two-beam interferometer originally designed by Michelson in 1891. The

Michelson interferometer is a device that can divide a beam of radiation into two

paths and then recombine the two beams after a path difference has been introduced.

A condition is thereby created under which interference between the beams can

occur. The intensity variations of the beam emerging from the interferometer can

be measured as a function of path difference by a detector. The simplest form of

the Michelson interferometer is shown Fig. 2-1-1.

Movable

Fixed mirror

Detector

Beamsplitter

Source

Mirror position

Fig. 2-1-1 Schematic representation of a Michelson interferometer.

Movable mirror

Fixed mirror

Detector

Beamsplitter

Source

Mirror position

21

It consists of two mutually perpendicular plane mirrors, one of which can move

along an axis that is perpendicular to its plane. The movable mirror is either moved

at a constant velocity or is held at equally spaced points for fixed short time periods

and rapidly stepped between these points. Between the fixed mirror and the

movable mirror is a beamsplitter, where a beam of radiation from an external source

can be partially reflected to the fixed mirror and partially transmitted to the movable

mirror. After the beams return to the beamsplitter, they interfere and are again

partially reflected and partially transmitted. Because of the effect of interference,

the intensity of each beam reaching to the detector and returning to the source

depends on the difference in path of the beams in the two arms of the interferometer.

The variation in the intensity of the beams passing to the detector and returning to

the source as a function of the path difference ultimately yields the spectral

information in a Fourier transform spectrometer. The source that returns to the

source is rarely of interest for spectrometry, and usually only the output beam

traveling in the direction perpendicular to that of the input beam is measured.

Nevertheless, it is important to remember that both of the output beams contain

equivalent information. The main reason for measuring only one of the output

beams is the difficulty of separating the output beam returning to the source from the

input beam. In some measurements, separate input beams can be passed into each

arm of the interferometer and the resultant signal measured using one or two

detectors.

The intensity of source power at the detector as a function of the position of the

movable mirror, which is named as interferogram, is transformed to the spectroscopy

as a function of the wave number with Fourier transformation as follows,

22

( ) ( ) ( )dxxxCI ⋅= ∫∞

∞−ω

πω cos1 , (2-1-1)

where C(x) is the intensity of the interferogram when the movable mirror position is

at x. It is impossible to move the movable mirror from infinity to minus infinity,

that is, we can’t use Eq. (2-1-1) directly in actual measurements. If we integrate the

interferogram from –L (the limiting position of the movable mirror) to +L, and there

are fringes in a spectrum near the peaks, then the line shape function will have the

form of (sinx)/x since the spectrum is obtained from the Fourier transition of the step

function. In order to avoid making fringes in the spectrum, we must adjust the

interferogram gradually to zero with Apodization functions as the position of the

movable mirror is going to –L or L. The advantage of using Apodization functions

is the reduction of the fringes near the peaks in the spectrum.

Fig. 2-1-2 Relation between the interferogram and spectroscopy as a

function of a wavenumber. The interferogram is obtained from the intensities

as a function of the position of the movable mirror summed for each wave

number. The spectroscopy is obtained after the interferogram is transformed

with Fourier transformation, Eq. (2-1-1).

Position of the movable mirror

Fourier

Wavenumber

Intensity

Transform

23

On the other hand, a disadvantage of using Apodization functions is deforming the

spectrum shape because of the reduction of the information of the interferogram.

Table 2-1-1 shows the relation between the Apodization functions prepared in

BOMEM DA-8 (Fig. 2-1-3) and peak shapes. These Apodization functions are

visualized in Fig. 2-1-4. The theoretical width of a monochromatic line at half its

peak height compared with the apodized resolution requested in percentage is listed

as FWHM, and the theoretical amplitude of the largest side-lobe compared with the

amplitude of the main peak in percentage is listed as SLAM in Table 2-1-1.

Name Functional Form FWHM

(%)

SLAM

(%)

BOXCAR 1 60 2

BARTLETT (1-D) 89 4.5

HAMMING 0.53856+0.46144(cosπD) 91 0.71

MINIMUM 3 TERM

BLACKMAN-HARRIS

0.42323+0.49755(cosπ

D)+0.07922(cos2πD)

116 0.04

WEAK 0.548-0.0833(1-D2)+0.5353(1-D2)2 72 5.8

MEDIUM 0.261-0.154838(1-D2)+0.894838(1-D2)2 84 1.4

STRONG 0.09-0.5875(1-D2)2+0.3225(1-D2)4 97 0.3

Note: D = (optical path difference)/(maximum optical path difference)

Table 2-1-1 Apodizing functions in BOMEM DA-8

24

0

0.2

0.4

0.6

0.8

1

-1 -0.5 0 0.5 1

Boxcar

Bratlet

HammingBlackman-HarrisWeak

Medium

Strong

可動鏡の位置/可動鏡の最大移動距離D (optical path difference / maximum optical path

Fig. 2-1-4 Shapes of apodizing functions available in the

BOMEM DA-8 spectrometer

Fig. 2-1-3 BOMEM DA-8 spectrometer employed this study. All devices (light

source, beamsplitter, detectors) are assembled in one unit.

25

Therefore, it is important for us to consider the effect of the broadening due to

Apodization functions. Apodization functions listed in Table 2-1-1 can be divided

into two classes:

1: those appropriate for very sharp peaks (width less than 0.1 cm-1) and

2: those appropriate for the width of the order ~1 cm-1.

In case the linewidth is very small (width less than 0.1 cm-1), we can see the

effect of Apodization function on linewidths clearly. Figure 2-1-5 shows

absorption spectra of water molecules (moisture in the air) vibration apodized by the

functions listed in Table 2-1-1.

1610 1620 1630 1640 1650

BoxcarBartlettHammingBlackmanWeakMediumStrong

Abs

orba

nce

[a.u

.]

Wavenumber [cm-1]Fig. 2-1-5 Absorption spectra due to H2O vibrations measured at room

temperature apodized by a variety of functions. These sharp features represent

lines of different vibration modes.

26

We focus of the linewidth measured at 1616.8 cm-1 in Fig. 2-1-5 in order to compare

the effect of Apodization functions. In Fig. 2-1-6, dotted points and solid lines

represent experimentally obtained data and Lorentzian fitting to them, respectively.

We obtained the linewidths (full width at half maximum) of each line by fits using

the Lorentzian function. The lines apodized by different functions have different

linewidths. This difference approximately agrees with the list in Table 2-1-1.

Therefore, the selection of Apodization function is important when we discuss the

linewidth of very narrow absorption lines.

BoxcarBartlettHammingBlackmanWeakMediumStrong

Abs

orba

nce

[a.u

.]

Wavenumber [cm-1]1616.0 1616.5 1617.0 1617.5

Fig. 2-1-6 Absorption lines of moisture vibrations measured at

1616.8cm-1 for different Apodization functions. The absorption lines

apodized by different functions have different widths.

27

Apodization function Linewidth of moisture at 1616.8 cm-1

BOXCAR 0.084

BARTLETT 0.133

HAMMING 0.190

MINIMUM 3 TERM BRACKMAN-HARRIS 0.140

WEAK 0.099

MEDIUM 0.109

STRONG 0.120

Next, we considered the effect of Apodization functions on absorption

linewidths when the lines are not so narrow (the width of more than 0.1 cm-1).

Figure 2-1-7 shows far infrared spectra of acceptor excitation bound to boron

impurities in silicon at 4 K. We find several peaks in this figure and they are

assigned to the transitions from the ground state to the discrete excited states of

boron acceptors. As an example, the widths of the peaks at 278 cm-1 are compared

in Fig. 2-1-8. Dotted points mean experimental results and the solid lines are

Lorentzian fitting to them. We find that the peak apodized by Bartlett function is

significanly broadened. However, other peaks are not so broadened. It is because

interferogram at the positions near the center is largely reduced by the Bartlett

function, while those by other Apodization functions are not reduced so much (see

Fig.2-1-4). The linewidths obtained by Lorentzian fitting are listed in Table 2-1-3.

Table 2-1-2 Linewidths (Full width at half maximum) of H2O molecule vibration

measured at 1616.8 cm-1 for each Apodization function.

28

240 260 280 300 320

BoxcarBartletHammingBlackmanWeakMediumStrong

Abs

orba

nce

[a.u

.]

Wavenumber [cm-1]

Si:B ([B]=2.63x1015) at T=4K

Fig. 2-1-7 Infrared spectra of Si:B measured at 4 K apodized by the seven

functions listed in Table 2-1-1.

275 276 277 278 279 280 281 282

BoxcarBartletHammingBlackmanWeakMediumStrong

Abs

orba

nce

[a.c

.]

Wavenuber [cm-1]

Si:B ([B]=2.63x1015) at T=4K

Fig. 2-1-6 Infrared spectra of Si:B measured at 4 K apodized by the seven

functions listed in Table 2-1-1. Dotted points are experimental results and

solid lines are Lorentzian fittings.

29

Apodization function Linewidth of boron line at 278 cm-1

BOXCAR 0.97

BARTLETT 1.23

HAMMING 1.00

MINIMUM 3 TERM BRACKMAN-HARRIS 0.99

WEAK 1.01

MEDIUM 1.00

STRONG 1.0

Table 2-1-3 shows clearly that the choice of Apodization functions (except for

Bartlett) does not lead to significant change in the linewidths when the width is

larger than 1 cm-1. Because widths of all the peaks we study in this work are of the

order of 1 cm-1, the effect of apodization is negligibly small.

Table 2-1-3 Linewidths (Full width at half maximum) of boron peaks at 278 cm-1

for each Apodization function.

30

2.2 Phase

In an ideal interferometer, the optical paths of the two perpendicular routs are

perfectly aligned and all waves interfere constructively at so called the zero path

difference (ZPD), where the lengths of the two routs are equal. In such an

interferometer, the cosine Fourier Transform always yields the correct spectrum.

In practice, however, both dispersion and sample shifts occur with respect to the

ZPD position. These effects are usually corrected for by a so-called phase

correction procedure performed for every measured interferogram. The phase is

calculated from the expression:

( ) ( ) ( )σσσ ri MMarctan−=Θ , (2-2-1)

where Mi( σ) and Mr( σ) are the imaginary and real components, respectively, of the

Fourier Transform of the interferogram at a particular wavenumber. Since

interferometric spectrometers may be employed for the spectral measurement of a

wide variety of transmission, the character of the interferograms produced by the

samples or source under investigation may be equally varied. As a consequence,

the phase information obtained by the complex transformation may not always be

fully representative of the phase response of the interferometer, i.e., phase errors may

become apparent in the recovered spectrum.

Due to the excellent alignment stability of BOMEM DA-8 spectrometer

achieved by the use of dynamic alignment, the dispersion and sample shift (phase

characteristic) of the interferometer are time invariant. In this situation, a

pre-calibration of the phase character of each interferometer can be carried out by

31

executing the functional step ‘Phase’ using the most suitable source and detector for

this task. The phase calibration curve is stored in the associated data system for

future use in interferogram symmetry.

The symmetrization of any measured interferogram is performed by convoluting

the incoming data with an impulse of the phase calibration curve. The convolution

is carried out in a digital form in real time, and in this step, the interferogram is also

numerically filtered. This procedure is completely independent of the character of

any measured interferogram and produces symmetric interferograms ready for

cosine transformation as in the ideal interferometer case.

The re-centering function permits an asymmetric interferogram to be

phase-corrected after having been stored on disk, i.e. after the measurement.

32

2.3 Resolution

In an interferometric spectrometer, the resolution is a function of the distance

traveled by the moving mirror, the apodizing function selected, and the criterion used

to judge this parameter. For an optimally aligned instrument observing a

monochromatic source those radiation is perfectly parallel to the optical axis of the

interferometer, it may be shown that for an unapodized interferogram the line shape

function will have the form (sin x)/x, and that for an infinitely large signal-to-noise

ratio, the full width of the resulting spectral line at half of its line height, FWHM,

will be:

LFWHM

22067.1

= (2-3-1)

where L is the maximum optical path difference.

This theoretical value is the best that can be achieved but in practice, this value

may be degraded by several factors. An unapodized interferogram produces large

spurious side lobes associated with individual spectral features; the usual practice is

to apodize the interferogram in order to reduce the contribution due to these features.

Each of Apodizing functions reduces the side lobes in a slightly different manner and

it is up to us to choose whichever is preferable in a given application. There is,

however, one major effect of reducing the intensity of the side lobes: there is a

corresponding increase in the width of the spectral features. For the most severe

Apodization offered, the FWHM value is increased to approximately 2.0/2L. This

worst case is taken for the apodized resolution (RE) specified; i. e.

33

LRE 1

= . (2-3-2)

For most of the Apodizing functions available, the apodized resolution value is a

conservative estimate of the resolution that should be achieved when operating the

spectrometer. One may sometimes want to calculate more points in the spectrum

than existed in the original interferogram. This has the effect of producing a

smoother spectrum, but does not change the resolution in any way. The

interpolation is usually performed in passing from the interferogram to the spectral

domain by the procedures of zero-filling or over-sampling, a transmission spectrum

of n points is calculated from a discrete finite interferogram having m real data

points, by a matrix product. In zero-filling a series of m zero elements are filled to

satisfy the condition n=m-2k where k is an integer. In over-sampling the Fourier

transformation is performed using a rectangular n×m matrix, yielding an n-point

spectrum from an m-point interferogram having no zero elements. The two

procedures yield identical results and the choice between them depends on how the

FT is carried out.

In order to obtain a satisfactory detector signal, it is sometimes desirable to

employ a lager optical aperture at the focal point of the collimation mirror. This

has two effects: to increase the intensity of the interferometer beam, and to increase

its divergence. The divergence of the collimated beam is related to the precision of

the optical path difference obtained; a less precise optical pass difference results in a

smearing of interferogram modulation, which places a limit on attainable spectral

resolution. It is therefore necessary, for high-resolution measurements, to restrict

the effective field of view (aperture size) of the instrument. The maximum aperture

34

diameter is related to the apodized resolution RE and the maximum phase frequency

SX by:

21

2_

××=

SXREFLdiaAperture (2-3-3)

where FL is the focal length of the input collimating mirror. Also, when

performing emission experiments particularly, selecting an inappropriate aperture

size may results in frequency shift problems. For experiments where the aperture

opening is not fully covered with radiation, it is required to reduce the size of the

aperture until the aperture size approximately fits the throughput of our experiment.

This is particularly important for experiments where no physical aperture is used; in

this case, set the software aperture size as if an aperture was used.

The rapid scanning mode of operation is used almost exclusively in present day

commercial interferometric spectrometers. In this model the frequency of an

infrared signal as represented in the interferogram is a simple function of the infrared

wavenumber and the travel speed of the moving mirror. The digital representation

of such an interferogram signal must be obtained at a sample rate that is at least

twice the maximum frequency generated in order that all information must be

retained. Note that this maximum frequency might not be due to the signal of

interest but might be caused by a spurious signal or by noise. By strongly

suppressing all frequencies outside the range of interest, the number of interferogram

samples may be kept to a minimum with the attendant shortening of transformation

times and easing of memory requirements.

Strong suppression of frequencies outside a range of interest by means of

35

electrical filtering becomes increasingly difficult as the ratio of the mean frequency

to the bandwidth of interest increases. This difficulty arises in designing sharp

cut-on and cut-off electrical filters having low distortion, and which can be

programmed over a wide range of frequencies. Furthermore, since electrical

frequencies relate directly to spectral frequencies via the velocity of the

interferometer mirror, a high degree of velocity stability is required. This later

approach suggests the need for frequent sampling of the signal. In order to

facilitate frequent sampling of an interferogram with minimal electrical filtering,

while at the same time minimizing the volume of stored data, BOMEM uses a Vector

Processor, that it developed, programmed to numerically filter incoming data in real

time. Only the result after numerical filtering is stored in memory, either as a single

scan or coadded to previous scans for subsequent Fourier transformation also

performed by the Vector Processor. The Vector Processor is sufficiently rapid to

filter data at a rate of up to 400,000 samples per second with flexible data

compression factors ranging from 1 to 127.

The filter process consists of convolving the incoming interferogram data with a

finite impulse response function that is the Fourier Transform of the desired spectral

filter response. Using the properties of convolution, this is equivalent to

multiplying the Fourier transform of the interferogram, i.e. the spectrum, with the

desired spectral filter response. The filter response is near unity over the spectral

band of interest and drops off to provide very high rejection just outside the band.

The frequencies of the numerical filter response are proportional to the sample

frequency. When the samples are synchronized with specific mirror positions, as is

the case for laser-fringe sampling, the numerical filter response becomes locked to

spectral frequencies and is independent of mirror velocities or electrical frequencies.

36

Since the numerical filter response is a well-defined function in the spectral

frequency domain, it can be used to suppress out-of-band spectral features.

As an example of this technique, an InSb detector may be used to detect

radiation in a band from 1820 cm-1 to 4000 cm-1 as defined by a long pass filter and

the detector cut-off. Interferograms for this spectral region are normally sampled

by a He-Ne laser at 15798 samples per cm of optical path difference, resulting in

4×106 samples for the full-mirror displacement of a model DA-8. If, however, it is

of interest to study only a part of this bandwidth, for example the υ1 and 2υ2 bands of

carbonyl fluoride that are located between 1890 or above 1985 cm-1, the number of

samples in the interferogram may be greatly reduced. This reduction factor is

calculated as follows: Consider a signal that has a bandwidth that falls within a

lower and upper frequency limit, σ(min) andσ(max), such that:

( ) ( )δσσ 1min −= n (2-3-4)

( ) δσσ n=max (2-3-5)

where ( ) ( )minmax σσδσ −= .

Then a sampling frequency of δσ2 may be used to unambiguously represent all

information in the signal, and under this scheme, the signal will occur in the n-th

alias. In the example of the υ1 and 2υ2 bands of carbonyl fluoride (COF2) as

mentioned above, if a sample rate of 336.13 samples per cm of optical path

difference is selected, then n=12, σ (min)=1849 cm-1, andσ(max)=2017 cm-1. It can

be seen therefore that the two bands of carbonyl fluoride occur in the twelfth alias

when sampled at 1/47 of the laser fringe frequency and no information is lost by

applying numerical filtering with the above criteria. The maximum number of

37

samples to be stored is now reduced by a factor of 47, i.e. 84,000 instead of the

4×106 samples obtained for full resolution with a DA-8 system. As a rule, after

numerical filtering, a new sample frequency can be chosen that is an integer fraction

of the laser fringe frequency and which is equal to or greater than twice the

bandwidth. The roll-off from unity to 10-6 gain is proportional to the bandwidth

and may vary from 3% to 10% depending on a number of operating parameters.

The software accompanying the DA-8 system is designed so that for any given lower

and upper frequency, a filter function is automatically generated along with a best

data compression factor and operating alias suggested by the Phase function. By

incorporating the inverse of the phase distortion of the interferometer into the

response function, interferograms stored after numerical filtering, therefore, need

only cosine Fourier transformation in order to yield the correct spectrum.

38

2.4 Spectral range

The net spectral range of the spectrometer is determined by the combination of

resources employed. The source, optical filter, beamsplitter, and detector each has

a limited spectral range. The sources radiate over spectral bands determined by the

materials and conditions employed (glowing solid, incandescent gas, pressure,

temperature, and so on). The spectral ranges of the beamspliters and windows are a

function of substrate and coating materials. The radiation detectors exploit a

variety of physical processes for sensitivity to spectral bands from far infrared to

ultraviolet. The spectral range is also determined by the data sampling. The

maximum wavenumber value is used to define the number of samples per laser

fringe obtained from the analog interferogram signal by the analog-to-digital

converter (ADC). Since the He-Ne laser is used for sampling the interferogram

signal and the detector exit emits a monochromatic beam of radiation at 15798 cm-1,

the maximum wavenumber that may be accommodated without aliasing is:

n×××2

15798,22

15798,12

15798L (2-4-1)

for 1, 2, …, n samples of the interferometer signal per laser fringe. In the PCDA

software that accompanies the DA-8, there is a choice of 1, 2, 4, or 8 samples per

laser fringe, permitting spectral bandwidths of from 0 cm-1 to 7899 cm-1 (1.266µm),

15798 cm-1 (0.633µm), 31596 cm-1 (0.316µm), and 63192 cm-1 (0.158µm),

respectively, without aliasing.

39

2.5 Detector response and scan speed

The following three detector properties directly affect the quality of

measurements made by the spectrometer:

1. spectral response;

2. response time;

3. frequency response.

The response time is the delay between an impulse of radiation and the peak

electrical output from the detector/preamplifier combination. The time delay can

differ by up to 5 orders of magnitude for different classes of detector, as summarized

in Table 2-5-1. The delay introduced minimizes the effect of speed variations on

the interferogram signal, and also, when using the technique of stored phase

characterization, permits application of one set of phase coefficients over a range of

scanning speeds. The response time is usually related to the 3 dB cutoff frequency

of the detector/preamplifier pair. The selection of the speed in a particular

experiment is based on several factors, however. The most important relates to the

frequency response of the detector. Each detector is supplied with a response curve

that shows the relative detector response as a function of the chopping frequency of

the signal on the detector element. A suitably matched preamplifier should not

alter this response curve significantly. For a rapid scanning interferometer the

output signal fringe frequency (FR, measured in Hz) is a function of the

wavenumber of interest (NU in cm-1) and the mechanical speed of the moving mirror

(SP in cm/s) as follows:

SPNUFR ⋅⋅= 2 (2-5-1)

40

Thus, for a specified spectral bandwidth, a speed may be chosen that is optimal with

respect to the response curve of the detector/preamplifier combination. For

example, the frequency response curve of a typical MCT (Hg-Cd-Te) detector shows

that this detector should be operated so that the infrared fringe frequencies lie within

400 Hz to 1 MHz. If the user decides to operate the system so that the spectral

bandwidth from 450 cm-1 to 5000 cm-1 is covered, then a speed of 0.5 cm/s would

produce a modulated output signal containing frequencies between 450 Hz (450

cm-1) and 5 kHz (5000 cm-1). Thus, as long as the preamplifier is matched to give

a uniform response at these frequencies, the interferometer should be operated with a

rapid moving mirror velocity for this particular detector/bandwidth combination.

Table 2-5-1 presents the 16 mirror scanning speeds available and also lists the

sampling frequency (i.e. conversion frequency of the ADC) for operation at the 4

samples per laser fringe values possible. Notes:

(a) The laser fringe frequency is the effective frequency of the He-Ne

laser fringes on the laser detectors.

(b) The sampling frequency is the rate at which the infrared signal is

sampled and is the laser fringe frequency multiplied by the number of

samples taken every laser fringe.

(c) Speeds lower than 0.05 may cause problems with stability, especially

as the number of samples per laser fringe is increased.

It should be noted that there are two other major limiting factors with respect to

the speed of the moving mirror: these relate to the conversion speed of the

analog-to-digital converter (ADC) and the speed of operation of the Vector Processor

system. As may be seen from Table 2-5-1, the conversion speed of the 16-bit ADC

41

limits the scanning speed to 1.5 cm/s, or less, at 1 sample-laser fringe if the full

resolution of the ADC is required, and with the other indicated values at faster

sampling rates.

Speed

(cm/s)

mechanical

Laser fringe

frequency

(kHz)

Time delay

1 2 4 8

0.01 0.316 0.316 0.632 1.26 2.53

0.02 0.632 0.632 1.26 2.53 5.06

0.03 0.948 0.948 1.90 3.79 7.58

0.05 1.58 1.58 3.16 6.32 12.6

0.07 2.21 2.21 4.42 8.84 17.7

0.10 3.16 3.16 6.32 12.6 25.3

0.15 4.74 4.74 9.48 19.0 37.9

0.2 6.32 6.32 12.6 25.3 50.6

0.3 9.48 9.48 19.0 37.9 75.8

0.5 15.8 15.8 31.6 63.2 1226.0

0.7 22.1 22.1 44.2 88.4 177.

1.0 31.6 31.6 63.2 126.0 253.

1.5 47.4 47.4 94.8 190. 379.

2.0 63.2 63.2 126.0 253. 506.

3.0 94.8 94.8 190. 379. 758.

4.6 145. 145. 290. 580. 1160.

Table 2-5-1 Scanning speed parameters and corresponding time delays

42

The major limitation in speed with respect to the Vector Processor is the rate at

which the coadding may be performed in the memory. This is a function of the data

reduction factor and the laser fringe frequency. The coadding rate is limited to 200

kHz and will be the speed limiting factor if using a fast ADC of 200kHz or above.

Instabilities in the dynamic alignment system may also be found to occur when the

moving mirror is driven at very low speeds.

43

2.6 Combination of elements in BOMEM DA-8 FT spectrometer

There are total of three sources, seven beamsplitters, and six detectors, as

summarized in Table 2-6-1, for the system we employed in the present thesis. The

combination of these elements depends on the spectrum region needed for our

investigation.

Source Beamsplitter Detector

Mercury 5~200 FIR 125u 3~25 Bolometer(1) 3~100

Globar 200~10000 FIR 50u 10~50 Bolometer(2) 10~700

Quartz 2000~25000 FIR 25u 15~100 DTGS/FIR 10~700

FIR 6u 75~450 MCT/KRs5 400~5000

FIR WIDE 125~850 InSb/AMc 3200~14000

KBr 450~4000 Si 8500~50000

Visible 4000~25000

(in unit of cm-1)

For example, a combination of the Globar source, KBr beamsplitter, and MCT/KRs5

detector span a spectrum range from 450 to 4000 cm-1, since the highest

wavenumber of minimum valid one among the three devices (Globar is 200 cm-1,

KBr is 450 cm-1, and MCT/KRs5 is 400 cm-1) is 450 cm-1 and the lowest

Table 2-6-1 Elements of BOMEM DA-8

44

wavenumber of maximum valid one among the three devices (Globar is 10000 cm-1,

KBr is 4000 cm-1, and MCT/KRs5 is 5000 cm-1) is 4000 cm-1. Figure 2-6-1 shows

two raw spectra for the combination of Globar, KBr, and MCT/KRs5 with and

without a cryostat we used. The vertical axis represents the intensity of

transmission, and horizontal axis represents frequency. Absorption measured at

1200 and 2800 cm-1 is due to the beamsplitter. Absorption lines measured from

1500 to 2000 cm-1 and from 3500 to 4000 cm-1 are due to vibrations of H2O

molecules existing in the sample room. We used cryostat with four ZnSe windows

which reduces the light transmission intensity further. Spectra shown in Chapter 4

were recorded in this setting (Globar, KBr, MCT/KRs5, and the cryostat with four

ZnSe windows).

1000 2000 3000 4000 5000

Without OPTISTATWith OPTISTAT

Inte

nsity

[a.u

.]

Wavenumber [cm-1]

Fig. 2-6-1 Raw spectra with and without a cryostat. Source is Globar,

beamsplitter is KBr, and detector is MCT. We used these spectra as

background of our measurement.

45

Figure 2-6-2 shows Infrared spectroscopy when a sample space was evacuated.

One spectrum was obtained when a cryostat was mounted in a sample space and

evacuated, and another was when He gas was filled in a sample space. Absorption

due to beamsplitter was measured at 200 cm-1. The cryostat has four windows of

polypropylene thin films (the thickness is 34 µm). Same spectra have been

obtained with vacuum and with exchange He gas. Therefore, we used Mercury as

light source, FIR-WIDE (Myler thin film) as a beamsplitter, and Bolometer (2) as a

detector, and the sample space was evacuated in order to observe absorption

spectrum shown in Chapter 3.

115 230 345 460 575 690

Without OPTISTAT, VacuumeWith OPTISTAT, VacuumeWith OPTISTAT in He Gas

Inte

nsity

[a.u

.]

Wavenumber [cm-1]

Figure 2-6-2 Raw spectra we obtained when we used Mercury as light source,

FIR-WIDE as a beamsplitter, and Bolometer (2) as a detector for three cases.

Sample space was evacuated (black), sample space was evacuated and a cryostat

was mounted (red), and sample space was filled with He exchange gas and a cryostat

was mounted (brown).

46

The beamsplitters for a far infrared source have fringes due to an interference of

beamsplitter itself as shown in Fig. 2-6-3. We used FIR-WIDE beamsplitter since

the interference is very small and the transmission intensity is strong. This

beamsplitter is made of thin Myler film with multi Ge thin film coating at the

surface.

FIR-WIDE

FIR-6μ

FIR-25μ

FIR-125μ

Fig. 2-6-3 Transmittance of several FIR beamsplitters with Mercury source

and the Bolometer (2) detector.

47

2.7 Calculation of the absorption coefficient

Absorption coefficient α is obtained by the measurements of transmittance

spectroscopies with and without inserting a sample. The spectrum of incident light

to the sample (Iin) is obtained by the measurement without a sample, while the

spectrum through a sample (Iout) is obtained with inserting a sample as shown in Fig.

2-7-1. The formula of absorption coefficient is given generally by the following;1

=

IoutIin

Lln1

α , (2-7-1)

where L is the thickness of a measured sample. However, multi-reflection within a

sample due to the high refractive index of a sample must be considered for the case

of semiconductor samples.

Fig. 2-7-1 An illustration of incident and transmitted lights

Sample

Thickness L

48

Equation 2-7-1 is used when we obtain absorption coefficient of low refractive index

materials, for example, gas and organic compounds. However, when we obtain

absorption coefficient of high refractive index materials, we must consider losses of

reflection at a surface of a sample and multiple reflections inside a sample. The

absorption coefficient for high refractive index materials is obtained by2

( ) ( )

−−+−=

221224

2

1412ln1

RTRRTR

Lα , (2-7-2)

where

( ) ( )( )LR

LRIIT

IN

out

αα

2exp1exp1

2

2

−−−−

== (2-7-3)

and

( )( )2

2

11

nnR

+−

= . (2-7-4)

For example, the reflection ratio of germanium is obtained by using a refractive

index n of 3.98 in this thesis.

The Lorentzian function Γ is used to fit absorption peaks arising from

bound-electronic transition and the local vibrational modes of impurities. The

function is given by :

( ) ( )220 2

2βωω

βχΓ

+−= , (2-7-5)

49

where χ is the intensity of the peak, ω is the frequency, and β is the full width at half

maximum (FWHM) of the peak. The linewidth in this thesis is obtained by fitting

with a Lorentzian function defined by Eq. (2-7-5).

50

2.8 IR absorption measurement procedures

All of the infrared absorption spectra appearing in this thesis have been

recorded with BOMEM DA-8 Fourier transform spectrometer as described in detail

in the previous sections. I will describe the practical aspect of the measurements in

this last section of Chapter 2.

Samples were wedged in order to avoid the constructive interference of

reflected waves inside samples. If the sample has parallel surfaces, the

wavelengths corresponding to the fraction of integer multiples constructively

interfere as illustrated in Fig. 2-8-1. Therefore, we make unparallel samples

which have less than 1°wedging by lapping with SiC slurry as depictured in Fig.

2-8-2.

Sample

Wavenumber

Fig. 2-8-1 Illustration of interference due to uniform sample thickness (left

picture) and absorption spectrum with interference (right picture). The small

fringes in the spectrum are due to interference.

51

Removing of the alias patterns in the interferogram is an additional effective

way to erasing interfering fringes in the spectra. This procedure normally known as

zapping is shown in Figure 2-8-3. Fig. 2-8-3 (b) shows interferogram of the

Fourier transformed infrared spectrum in Fig. 2-8-3 (a). A position of the

maximum intensity of interferogram is at the zero-path difference (the distance from

the beamsplitter to the fixed mirror is equal to that from the beamsplitter to the

movable mirror) in Fig. 2-8-3 (b). The ghost (alias) peak due to the constructive

interference of samples is seen in right part of Fig. 2-8-3 (b). Figure 2-8-3 (d) is

obtained by zapping the ghost peak in Fig. 2-8-3 (b). Figure 2-8-3 (c) demonstrates

the infrared spectrum obtain by Fourier transformation of the zapped interferogram

shown in Figure 2-8-3 (d), which show no interfering fringes. The linewidth of the

spectrum does not change before and after zapping. Therefore, we employ in this

study a combination of the sample wedging and interference zapping in order to

reduce fringes in the spectra.

Fig. 2-8-2 Illustration of a lapping equipment that allows for precise

wedging of samples.

Sample

SiC slurry

Glass plate

52

During the measurements, the signal-to-noise ratio was improved by coadding

100 to 720 spectra. A composite silicon bolometer operating at T = 4.2 K was used

as a detector. The samples were cooled in the OXFORD OPTISTAT cryostat and the

sample temperature was monitored with a calibrated thermometer installed at the

sample mount. A black-polyethylene film (34 µm thick) was used in front of samples

to eliminate above band-gap radiation.

Fig. 2-8-3 (a) A spectrum obtained by Fourier transformation of the

interferogram shown in (b). A zapped interferogram shown in (d) leads to a

fringe-less spectrum shown in (d). This series of spectra obtained by Ge:As of no

wedging. A clear As absorption line is seen at about 100 cm-1.

(a) (b)

(c) (d)

53

References

1 P. Y. Yu and M. Cardona, in Fundamentals of Semiconductors Physics and

Materials Properties Second Edition (Springer, Berlin Heidelberg, 1996) p.236.

2 P. R. Griffiths and J. A. de Hanseth, in Fourier Transform Infrared Spectrometry

(John Wiley, New York, 1986) p.308.

54

Chapter Ⅲ: Observation of the Random-to-Correlated Transition

of the Ionized Impurity Distribution in Compensated

Semiconductors

3.1 Introduction

Many-body Coulombic interactions between randomly distributed positive and

negative charges play important roles in a wide variety of physical systems. Such

interactions become important especially when the charges are mobile and

redistribute themselves in order to minimize the total Coulombic energy of the

system. Itoh, et. al. have shown recently that compensated semiconductors, e.g.,

germanium doped simultaneously by hydrogenic donors and acceptors, serve as

ideal systems for the investigation of many-body Coulombic interactions between

mobile ions.1 Let us define a problem of our interest as the following. Consider a

n-type semiconductor with the concentration of hydrogenic donors (ND) being twice

of that of hydrogenic acceptors (NA); ND= 2NA. As Fig.3-1-1 shows, at sufficiently

low temperatures one half of ND is positively charged (21 ND=ND

+) because their

bound-electrons are taken away by acceptors. These become negatively charged after

accepting electrons (NA=NA-). The remaining half of ND binds electrons so that

their charge state is neutral (21 ND=ND

o). This system is interesting because the

ionized donors (D+) can modify their distribution with respect to the fixed position of

ionized acceptors (A-) via the transfer of electrons between neutral (D0) and ionized

55

(D+) donors. Therefore, the distribution of the ionized donors can be either random

or correlated depending on the ionized impurity concentration and on the

temperature. Probing the many-body Coulombic interactions in such systems can

be performed simply by measuring the electric-field broadening of neutral donor

absorption lines by far-infrared spectroscopy. As it will be demonstrated later, the

quantitative comparison of the donor 1s-2p± hydrogenic absorption linewidths

between experiment and Mote Carlo simulation leads to an unambiguous

determination of the ionized impurity distribution as a function of the ionized

impurity concentrations (NI=ND++NA

-=2 NA) and of the temperature (T).

Conduction band

Valence band

N-type Germanium

Fig.3-1-1 Arsenic and gallium doped n-type germanium at low temperatures.

All the gallium acceptors are ionized negatively, while some of arsenic donors are

ionized positively. The distribution of the ionized arsenic donors is what is

probed in this thesis.

56

It has been expected theoretically that the ionized impurity distribution is

correlated when the available thermal energy is sufficiently smaller than the

correlation energy.2 Electrons distribute themselves among donors in such a way as

to reduce the total Coulombic energy. An energy gap is known as “Coulomb gap”

appears at the Fermi level in the density of the states of the donor band.3 The

correlation energy is of the same order of magnitude as the Coulomb energy between

Increase of Impurity Concentration Increase of temperature

Random Distribution Correlated Distribution

Fig.3-1-2 Random distribution and correlated distribution of ionized impurities

in strongly compensated n-type Ge:(As,Ga). As the ionized impurity

concentration is increased, ionized impurities tend to distribute themselves in

order to minimize the Coulombic energy in the system. When temperature is

increased and the thermal energy becomes larger than Coulombic energy, the

ionized impurities tend to distribute themselves randomly. Therefore, we expect a

transition in the distribution from correlated to random as the temperature is

increased.

57

impurities, e2ND1/3/κ, where κ is the dielectric constant. With NI=2KND where

K=NA/ND is the compensation ratio defined for n-type semiconductors, the correlated

distribution is expected for the condition: 2,3

3

22

eTkKNIκB≫ . (3-1-1)

For example, in the case of T=4 K, compensation ratio K=0.6, and dielectric

constant κ=16.0, the condition for the correlated distribution of ionized impurities is

( ) ].[1074.61060.1

41085.81641038.16.02 313

3

219

1223−

−−

×=

×

××××××× cmNI

π≫ (3-1-2)

The correlated distribution of the ionized impurities has been confirmed for the

condition given by Eq. (3-1-1) in case of p-type Ge by Itoh, et. al. previously. 1

When the thermal energy becomes larger than the correlation energy, i.e., the

left hand side of Eq. (3-1-1) is much smaller than the right hand side, electrons are

randomly distributed among donors, so that the ionized impurity distribution is

completely random. The random distribution is preferred for lower NI since the

larger distance between ions leads to weaker correlation. Larsen’s classic theory

for the calculation of the linewidth assuming the random distribution is valid for the

range; 4,5

3*5107.0 −−×≤ aNI , (3-1-3)

where a* is the effective Bohr radius of donor impurities. In case of a*=69[Å], a

value for a typical of shallow donors in Ge, the condition of completely random

58

distribution of ionized impurities is

].3[131013.237109.65107.0 −×=

−××−×≤ cmIN (3-1-4)

On the other hand, the transition temperature from random distribution to correlated

distribution is calculated according to Eq. (3-1-1) in case of IN =3×1014cm‐3 as

][98.62

2

KK

Nk

eT I

B

=

⋅=

κ. (3-1-5)

It is therefore of great interest to observe the correlated-to-random transition of the

ionized impurity distribution as a function of the ionized impurity concentration and

temperature, and if such transitions are observed, it is again of great interest to obtain

the critical ionized impurity concentration and temperature for the transitions and

compare with the predictions of equations (3-1-3) and (3-1-5). The experimental

determination of the transition temperature allows us to estimate the value of the

correlation energy. Similarly, the correlation energy (or equivalently the width of

the Coulomb gap) becomes larger with increasing ionized impurity concentration NI.

While many experiments to confirm the existence of the Coulomb gaphave been

performed, there has been very few direct evidence for the random distribution of

ionized impurities at low temperatures. The present chapter describes the

observation of the random-to-correlated distribution transition of ionized impurities

for the first time as a function of NI and T.

The Coulomb gap occurs due to the strong compensation between donors and

59

acceptors in the system. Figure 3-1-3 schematically shows the density of states

near the donor level in cases of the compensation ratios 0, 0.1, 0.5 at the zero

temperature. As the compensation ratio is increased, the donor level splits. The

energy difference between two levels is called Coulomb gap Δ (see Eq. 3-1-6) that

corresponds to the total Coulomb energy in the system. At zero temperature, the

lower donor level is completely filled, i.e., the distribution of ionized impurities is

completely correlated. In a case of the finite temperature, some of the donor bound

electrons are excited across the gap and occupy the upper branch of the donor states.

This is an origin of the random distribution of ionized impurities in the system (Fig.

3-1-4). While this simple picture is not rigorous because smearing of the gap itself

occurs as the temperature is raised, it nevertheless provides a simple view of

defining the problem and approximate estimates of at what ionized impurity

concentration and temperature we expect the transition. The energy of the

Coulomb gap ∆ for three dimensions is approximately; 3

23210

3 κge=∆ (3-1-6)

where, κ is the dielectric constant of germanium. The density of the state near

the Fermi level 0g is estimated as

20 erKNg DDκ= , (3-1-7)

where, the average distance between donors is Dr = (3/4πND)1/3. The Coulomb

gap according to Eq. (3-1-6) and (3-1-7) is shown in Fig. 3-1-5. As one can see,

the Coulomb gap dramatically increases in the region of NI≈1013-1014 cm-3, that

60

corresponds to the ionized impurity concentrations of our set of samples as

mentioned later in Chapter 3.2.

In order to obtain random-to-correlated distribution of ionized impurities, we

performed two kinds of experiments. At first, we performed the far infrared

absorption measurement as a function of the ionized impurity concentration at a

fixed temperature as shown in (1) of Fig. 3-1-6. Secondly, we determined the

impurity concentration as a function of temperature as shown in (2) of Fig. 3-1-6.

Electrons

Density of States

Energy Δ

K=0 K=0.1 K=0.5

Donor Level

Conduction Band

Fig.3-1-3 Density of states of the donor levels in cases of compensation ratio K = 0, 0.1,

and 0.5. As the compensation ratio is increased, the donor state splits due to the Coulomb

energy in the system. The lower part of the split donor levels is filled with bound electrons at

zero temperature. The energy difference between separated donor levels, Δ, is called a

“Coulomb Gap”.

61

Partially Random

Completely Random

kBT

Fig.3-1-4 Thermally induced excitation of bound electrons across the Coulomb

Gap. Electrons occupy the upper level due to temperature induced

randomization of the distribution of ionized impurities.

0

2

4

6

8

10

12

0 8 1014 1.6 1015 2.4 1015 3.2 1015

Coul

omb

Gap

[K]

Ionized Impurity Concentration [cm-3]

Fig.3-1-5 Width of the Coulomb gap according to Eq. (3-1-6) and (3-1-7).

62

Ionized Impurity Concentration

Correlated

Distribution

Random Distribution

(1)

(2)

In the past, there had been several attempts to observe distribution of ionized

impurities. A recent publication1 reported the broadening of the 1s-2p-like Ga

acceptor absorption peak in heavily compensated Ge samples having ionized

impurity concentration NI=9.0×1013 - 6.8×1015 cm-3. For the concentration range

they investigated, they found a better agreement with the theory based on the

correlated distribution of ionized impurities than the theory assuming a random

distribution as shown in Fig. 3-1-7. As a result of this observation, we have raised

the following questions.

1. Can we obtain same experimental results for the case of n-type samples?

(Theories dealing with the distribution of ionized impurities had been derived

for n-type samples and not for p-type that have been investigated in Ref. 1.)

2. Can we find the random distribution in low enough impurity concentration as

predicted by Eq. 3-1-1? (Only the correlated distribution was observed in Ref.

Fig. 3-1-6. An approximate phase diagram of the ionized impurity distribution.

This figure is constructed assuming the compensation ratio less than 0.9. In the

case of the compensation ratio more than 0.9, a random distribution is dominant

even when temperature is close to zero.

63

1.)

3. What is the origin of the large residual linewidth of 39 μeV in Ref. 1 in the limit

of NI =0 ?

4. Is it possible to find the random-to-correlated transition as a function of

temperature?

To answer these questions, we have prepared n-type samples that have lower

ionized impurity concentration. In order to observe random-to-correlated transition

clearly, we have prepared a large number of samples that have different ionized

impurity concentrations between 2.56×1013 and 2.26×1014 cm-3.

Fig. 3-1-7 A recent publication1 reporting the broadening of the 1s-2p-like Ga

acceptor absorption peak in heavily compensated Ge samples with ionized

impurity concentration NI=9.0×1013 - 6.8×1015 cm-3.

64

As a result we report in this thesis observation of correlated distribution for the high

impurity concentration in n-type samples. We report existence of the random

distribution for the low impurity concentrations (NI<7×1013 cm-3). We report that

the residual linewidth is due to thermal randomization of the distribution of ionized

impurities. We report on the observation of the temperature induced

random-to-correlated transition.

Before moving on to experiments, we would like to note that there is another

kind of random-to-correlated transition for large compensation ratio (K>0.7)

predicted based on my calculation described in Appendices A-E.

0

50

100

150

200

250

300

350

0 20 40 60 80 100Compensation Ratio [%]

FWH

M

Correlated distribution

Random distribution

Fig. 3-1-8. Linewidths from 1s state to 2p± state calculated when the number of

donors is 50 as a function of the compensated ratio. When the compensated ratio is

more than 90%, linewidths in case of correlated distribution are more broadened

than that of random distribution. This means the random distribution is more stable

than the correlated distribution. The detailed explanation of this calculation is

given in Appendices A and E.

65

Figure 3-1-8 shows the relation between theoretical linewidths and compensation

ratio as a result of my calculation. When the compensation ratio is less than 0.7,

the linewidths are not so strongly affected by compensation ratio, while the

linewidths in case of correlated distribution are dramatically increased as a function

of compensation ratio when compensation ratio is more than 0.8. When the

compensated ratio is more than 0.9, linewidths in case of correlated distribution is

more broadened than that of random distribution. The Coulombic energy of the

system in case of random distribution is lower than that of correlated distribution,

that is, we expect another kind of random-to-correlated distribution. Although this

type of transition is not reported in this thesis since our samples have K<0.7, it is of

great interest to observe such transition in the future.

66

3.2 Experimental Procedures

3.2.1 Samples

Samples are cut from a Cz(Czochralski)-grown, n-type Ge:(As,Ga)

single-crystal ingot as shown in Fig. 3-2-1-1. The concentrations of As and Ga

vary as a function of the position along ingot’s growth direction due to impurity

segregation during the growth as follows,

( )N x k N x k( ) = ⋅ − −0

11 , (3-2-1-1)

where, k is the segregation coefficient, N0 is the average impurity concentration, and

x is the solidification ratio. The segregation coefficients for impurities in Ge are

experimentally obtained in Table 3-2-1-1.

Fig. 3-2-1-1 The ingot we used were made by Czochralski method. The ingot

has different arsenic and gallium concentrations as a function of the position along

the growth direction as described in Fig. 3-2-1-2. The samples were cut from

different positions in order to obtain different impurity concentrations.

Seed Crystal

Germanium Ingot

Liquid Germanium

67

Table 3-2-1-1 The segregation coefficients of impurities in germanium

Impurity Segregation Coefficient

B 17

Al 0.073

Ga 0.087

In 0.001

P 0.08

As 0.02

Sb 0.003

C 0.000015

Zn 0.0004

Fig. 3-2-1-2 Germanium ingot (left illustration) and impurity concentrations

of arsenic and gallium, and the compensation ratio as a function of

solidification ratio (X) calculated according to Eq. (3-2-1-1) with the

parameters in Table 3-2-1-1.

0

1 0

0.2

0.4

0.6

0.8

1

0 0.2 0.4 0.6 0.8 1

Impu

rity

Conc

entra

tion

X

Compensation Ratio

[As] [Ga]

Position (X)

68

Figure 3-2-1-2 shows the relation between impurity concentration and

solidification ratio in the case of Ge:(As;Ga) according to Eq. (3-2-1-1) and the

segregation coefficients for As and Ga in Ge shown in Table 3-2-1-1. The impurity

concentrations at x = 0 is same as the ingot we used in this study. We obtain

samples whose impurity concentrations are systematically controlled as a function of

the position of the germanium ingot. In order to determine impurity concentrations

of our samples precisely, we have performed variable-temperature Hall effect

measurements for every sample.

69

3.2.2 Hall effect determination of the As and Ga concentrations of each

sample: procedures and results

The variable Hall effect measurement allows for precise determination of the

majority and minority impurity concentrations. In order to realize an appropriate

Hall measurement, it is required to prepare electric contacts that stay Ohmic down to

liquid helium temperatures. To obtain good electric contacts for the variable

temperature Hall measurement, we use indium (including 2% antimony) as a contact

material. By heating the sample with In(Sb) above Ge-In eutectic temperature, we

melt the contact region locally and dope heavily with Sb which is the n-type

impurities appropriate for our n-type Ge:As,Ga. The followings are the details of

the contact fabrication.

1. Polish samples with SiC slurry (# 600) to obtain flat surfaces.

2. Polish samples with smaller SiC slurry (# 1200) to reduce roughness of the

surfaces.

3. Polish etch with nitric-hydrofluoric acid (NHO3:HF=3:1) for about one minute

at room temperature.

4. Remove nitric-hydrofluoric acid by adding water to it.

5. Samples are rinsed in Hydrofluoric acid (1%) for about 15 minutes in order to

remove the surface oxides.

After etching samples, we cut indium wire (Ф=1mm), which was etched with

hydrochloric acid, with a paper cutter which was cleaned with trichloroethylene.

Indium plates (thickness is less than 0.5mm) were put on to the four corners of the

samples and pressed on. To minimize the in-plane impurity concentration

inhomogeneity within each sample, distances between electric contacts are chosen to

70

be less than 4 mm. Samples are annealed at 250˚C for five minutes in Ar gas in the

furnace illustrated in Fig. 3-2-2-1. Argon gas was used for purging inside of the

annealing furnace for over 30 minutes and its flow continues until the end of the

annealing process. As a result of this process, antimony in indium is diffused to the

samples, and the surface between the sample and indium were heavily doped as

shown in Fig. 3-2-2-1. This region is usually referred as n+ region since antimony

is a donor in germanium.

Hall effect we have been performed with a HL5500PC made by Bio-Rad Inc. The

effective magnetic field for the measurement is 0.320 T, and temperature is variable

down to about 5 K. We measure the Hall effects from room temperature to about

10 K. The bias we use for the measurement was 20µV from room temperature to

50 K, and 4µV for lower than 50 K in order to avoid resistive heating of samples.

Figure 3-2-2-2 shows the free carrier concentration n vs. 1/T for nine selected

samples measured in the van der Paw configuration. The data have been fitted

Heater

Sample

Glass cover

Figure 3-2-2-1 Illustration of the annealing furnace we used (left) and samples

after annealing (right). Temperature sensor is put under the samples.

In:Sb In:Sb n+ n+

Ge:(As;Ga)

71

very well using standard semiconductor statistics (solid curves in Fig. 3-2-2-2) with

the relation:

( )( ) ( )TkEN

nNNNnn

BDCAD

A −=−−

+ exp1β

(3-2-2-1)

where β=2 is the degeneracy factor for donors, NC is the effective density of states in

the conduction band, and ED is the ionization energy of the donors. After we obtain

ND and NA for each sample, we determine the ionized impurity concentration NI as a

function of temperature:

( ) AI NTnN 2+= . (3-2-2-2)

Fig. 3-2-2-2 Experimentally determined free carrier concentration vs.

inverse absolute temperature. The curves are the best fits to the experimental

data using Eq. (3-2-2-1) and (3-2-2-2).

5

6

7

8

9

10

11

12

13

14

15

0 0.02 0.04 0.06 0.08 0.1 0.12 0.14 0.16

Free

Car

rier

Con

cent

ratio

n [c

m-3

]

1/Temperature [K -1]

10

10

10

10

10

10

10

10

10

10

10

72

NI≈2NA in the low-temperature carrier freeze-out region since n(T)<<2NA. The

error in the values of ND and NA determined by this method is expected to be less

than 10%. Typical values of the compensation ratio (K=NA/ND) are ~0.6 for all of

the samples and their exact values along with ND and NA are listed in Table 3-2-2-1.6

Table 3-2-2-1 Impurity concentration of our set of samples determined by

variable temperature Hall effect.6 (In unit of 1013 cm-3)

Donor Acceptor Ionized Impurity Neutral Impurity CompensationConcentration Concentration Concentration Concentration Ratio

1.52 1.28 2.56 0.24 0.842.83 1.50 3.00 1.33 0.533.03 1.75 3.50 1.28 0.584.09 2.06 4.12 2.03 0.502.93 2.16 4.32 0.77 0.744.00 2.50 5.00 1.50 0.634.01 2.84 5.68 1.17 0.716.90 2.94 5.88 3.96 0.435.92 3.22 6.44 2.70 0.546.00 3.50 7.00 2.50 0.586.34 3.90 7.80 2.44 0.628.18 4.43 8.85 3.75 0.5413.55 7.99 15.98 5.56 0.599.00 5.40 10.80 3.60 0.6013.80 9.96 19.92 3.84 0.7213.85 6.00 12.00 7.85 0.4310.70 7.50 15.00 3.20 0.7018.80 11.00 22.60 7.80 0.5920.00 12.85 25.70 7.15 0.6420.25 14.46 28.91 5.80 0.71

73

3.3 Results and discussion

Figure 3-3-1 (a) shows a raw spectrum of Ge:(As;Ga) measured at 4 K. The

absorption peak is assigned as the transition from the ground state to the 2p± excited

state. The background of Fig. 3-3-1 (a) is due to multi-phonon absorption since

single phonon absorption cannot be observed by absorption measurements. The

absorption spectrum in Fig. 3-3-1 (b) has been obtained after subtraction of the

background.

One notices small fringes on the both sides of the absorption peak at 100 cm-1, which

is due to the effect of Apodization function. We used a BOXCAR function for

apodizing. The spectrum apodized with a BOXCAR function is not broadened, but

92 96 100 104 108 112 116 120

Fig.4-2-3 試料1の透過光スペクトル

波数 [cm-1 ]Wavenumber [cm-1] 0

1

2

3

4

5

6

7

98 99 100 101 102 103

Fig.4-2-4 試料1 As 1s→2p±光吸収スペクトルと

そのローレンツ・フィッティング

波数 [cm -1]Wavenumber [cm-1]

Fig. 3-3-1 (a) Raw spectrum of Ge:(As;Ga) measured at 4 K. The absorption at

100 cm-1 is assigned to 1s-2p± line. (b) Absorption spectrum of Ge:(As;Ga)

measured at 4 K. The absorption at 100 cm-1 is assigned to 1s-2p± line. Solid line

is the best fit with Lorentzian.

74

fringe appears at the both sides as described in Chapter 2. Therefore, imperfect

agreement of the fit to the both sides of the absorption peak at 100 cm-1 is of no

concern. The agreement of the fitting to the main part of the absorption peak is

excellent. Therefore, we obtain linewidths (FWHM) of samples with very high

precision.

99.8 100.0 100.2 100.4 100.6 100.8 101.0

3p±

2p±

2p0

75 80 85 90 95 100 105 110-202468

101214

Abs

orpt

ion

Coe

ffic

ient

[cm

-1]

Wavenumber [cm-1]

Abs

orpt

ion

Coe

ffici

ent [

a. u

.]

Wavenumber [cm-1]

Fig. 3-3-2 An inset shows As donor absorption peaks recorded at T=4 K with a

sample having NI= 3.50×1013cm-3. The three absorption peaks correspond to the

1s-2p0 (76 cm-1), 1s-2p± (100 cm-1), and 1s-3p± (106 cm-1) transitions. The main

frame shows the enlargement of the 1s-2p± (100 cm-1) absorption peak determined

experimentally (), calculated assuming random () and correlated (∆) distributions

of ionized impurities using the Monte Carlo method. Solid curves are the best fits to

the experimental and calculated points assuming Lorentzian distributions.

75

The inset of Fig. 3-3-2 shows the absorption spectrum of a sample having

ND=3.03×1013cm-3, NA=1.75×1013cm-3, i.e., NI≈2NA=3.50×1013 cm-3. It has been

recorded at T = 4 K with a resolution of 0.026 cm-1 in the wavenumber range

between 70 and 110 cm-1. Three distinct peaks correspond to excitations of bound

electrons of As in Ge from ground state to 2p0, 2p±, and 3p± excited states,

respectively. The main frame of Fig. 3-3-2 shows from bottom to top the

enlargement of the 1s to 2p± transition peaks; the experimental result (open circles),

Monte Carlo simulation assuming random distribution of ionized impurities (open

squares), and Monte Carlo simulation assuming correlated distribution of impurities

(open triangles). The Monte Carlo simulations are based on the theoretical

calculation reported in Eq. (25) of Ref. 5, which is used for isotropic conduction

bands of GaAs. We re-calculated it for anisotropic conduction band for Ge using

Faulkner’s method which is based on Kohn-Luttinger’s method.7,8 Details of the

calculation of an anisotropic conduction band and Monte Carlo simulation we used

are described in Appendix A and E. The solid curves are Lorentzian fits to each set

of data.

Fig. 3-3-3 shows FWHM vs. NI at T = 4 K. The experimental data (filled

circles) are compared with the theoretical linewidths assuming random (dashed line)

and correlated (solid line) distributions of ionized impurities. The intrinsic

linewidth due to phonon lifetime broadening9 for Ge has been found experimentally

to be 0.066 cm-1 10, i.e., it is negligibly small compared to the linewidths shown in

Fig. 3-3-4. Also ND<1× 1015 cm-3 for all of the samples employed, i.e., the

broadening due to overlap of donor wavefunctions (concentration broadening) is

negligible with respect to the amount of electric field broadening.11 Therefore, it is

appropriate to compare the experimentally found FWHM directly to the calculation

76

based on the effect of the electric field broadening only. The comparison between

the experimental results and theoretical estimations leads us to very interesting

conclusions. Excellent agreement between experimentally determined FWHM and

the random theory for NI < 7.5 × 1013 cm-3 is clear evidence for the random

distribution of ionized impurities in this low NI region. When NI is larger than

7.5×1013 cm-3, the experimental data lie between the estimates of random theory and

correlated theory. This implies that the ionized impurity distribution is somewhere

between “completely random” and “completely correlated”. The Monte Carlo

simulation for the correlated distribution shown in Fig. 3-3-3 has been performed for

T=0 K. However, the measurement was performed at the finite temperature (T=4

K) at which a certain degree of randomization of ionized impurities occurs due to the

finite thermal energy.

Fig. 3-3-3 Experimentally determined FWHM (filled circles) vs. NI at T = 4 K.

The dashed line is the prediction based on a random distribution of ions while the

solid line is the prediction based on a correlated distribution of ionized impurities at

zero temperature.

0 1x1014 2x1014 3x10140.0

0.2

0.4

0.6

0.8

1.0

1.2

Correlated Distribution

Random Distribution

FWH

M [c

m-1]

Ionized Impurity Concentration [cm-3]

77

It is also possible that the partial randomization of the ionized impurities was

induced partly by the far-infrared radiation used for the measurement. In order to

minimize such effects, we have limited ourselves to employ as small intensity of the

far-infrared radiation as possible. The fact that the FWHM increases with the

temperature (Fig. 3-3-4) suggests that the effect of temperature is more significant

than the effect of the infrared radiation. In this case we expect the linewidth to be

between the prediction of “completely random” and “completely correlated”

assumptions.

Figure 3-3-5 shows the comparison of the linewidths between T=4 and 10 K.

As expected, the linewidths at 4 K and 10 K for the “completely random” region

(NI<7.5×1013 cm-3) are the same while that of 10 K is broader than 4 K due to the

larger degree of thermal randomization of the ionized impurity distribution.

Fig. 3-3-5 Experimentally determined FWHM vs. NI at T = 4 K () and T = 10 K

().

0.0 5.0x10131.0x10141.5x10142.0x10142.5x10143.0x10140.0

0.2

0.4

0.6

0.8

1.0

1.2

FWH

M [c

m-1]

Ionized Impurity Concentration [cm-3]

10K

4K

78

The critical ionized impurity concentration (NIC), where the change of slope occurs

in Fig. 3-3-5, shifts from 7.5×1013 cm-3 at T=4 K to approximately 1.0×1014 cm-3 at

T=10 K. Lee et al. have shown for Si:B that the Coulomb gap smears out with

increasing temperature due to increasing population of above-gap states.12 Our

observation of the increasing NIC and FWHM above NIC with T is consistent with

what has been shown for Si:B. Figure 3-3-6 shows the temperature dependence of

the FWHM () for a sample having NI=7.8×1013 cm-3, which is just above the

critical concentration NIC=7.5×1013 cm-3 for T=4 K.13-15 We are interested in

whether we observe random to correlated transition with increasing temperatures

from T=2 K. Figure 3-3-6 shows clearly that the FWHM increases in two steps; the

first gradual increase occurs between T=5 and 11 K and the second rapid increase

takes place above T=14 K. The second increase at T>14 K is due to thermal

ionization of donors as it matches with the increment of NI (solid curve) calculated

using Eqs. (3-2-2-1) and (3-2-2-2). The first gradual increase is due to the

transition of the ionized impurity distribution from correlated to random, and the two

plateaus in FWHM at T=2-5 K and T=11-13 K represent characteristic FWHM for

the two distributions. In order to support our claim that we have observed the

transition, we shall estimate the critical temperature (Tc) for the transition using the

theory of Efros and Shklovskii3 and compare the result directly with our

experimental observation. Using Eqn. (3-1-6) and (3-1-7), the Coulomb gap

∆=0.31 meV has been obtained for the sample having NI=7.8×1013 cm-3 in Fig.

3-3-6. To first order, we expect Tc to be of the same order as ∆, i.e., Tc≈3.6 K is

what we estimate based on theory. The experimentally found gradual increase

starts around 4 K, in very good agreement with the theoretically estimated Tc≈3.6 K.

The inset in Fig. 3-3-6 shows the temperature dependence of the FWHM for samples

79

well below NIC and well above NIC. The width of the bottom curve (NI=4.3×1013

cm-3) remains unchanged because its width is determined solely by the random

distribution all the way up to 12K. Above 12K, the ionization of donors takes place

and the peak disappears very quickly, i.e., it was not possible to determine the widths

in this high temperature region. The FWHM of the bottom curve (NI=4.3×1013

cm-3) for the temperature range 2-12K agrees very well with the theoretical

prediction of the random theory (the dashed line in Fig. 3-3-3).

4 6 8 10 12 14 16 18

0.50.60.70.80.91.01.11.2

Ionized Impurity C

oncentration [x10 13cm-3]

10.5

10.0

9.5

9.0

-

-

-

-

8.5-

FWH

M [c

m-1]

Temperature [K]

4 6 8 10 12 14 16 18

0.4

0.6

0.8

1.0

1.2

1.4

NI=4.32×1013[cm-3]

NI=7.80×1013[cm-3]

NI=2.26 ×10

14[cm-3]

FWH

M [c

m-1]

Temperature [K]

Fig. 3-3-6 The main frame shows FWHM vs. temperature for a sample having NI

= 7.80×1013 cm-3. The solid curve is the ionized impurity concentration calculated

with Eq. (3-1-6) and (3-1-7). The inset compare FWHM vs. temperature of three

samples having NI = 4.32×1013 (), 7.80×1013 (), and 2.26×1014 cm-3 ().

80

The FWHM of the top curve in the inset (NI=2.26×1014 cm-3) for the temperature

range shown is determined dominantly by the correlated distribution because the

donor concentration is high enough for the neighboring ionized impurities to interact

with one another. The FWHM increases with the increasing temperature because

the partial randomization of the correlated distribution proceeds as was shown in Fig.

3-3-7.

Observation of the random-correlated transition of ionized impurity

distributions as a function of temperature has been claimed before by Baranovskii et

al. for GaAs.16,17 However, the calculational result from Eq. (3-2-2-1) and

(3-2-2-2) shows they did not observed the transition of the ionized impurities.

Fig. 3-3-7 Temperature dependence of the free carrier concentration calculated

from Eq. (3-2-2-1) and (3-2-2-2). The increase of the ionized impurities is due to

that of the free carriers, i.e., the rapid increase of the linewidths in the range of high

temperature (about < 10 K) in Fig. 3-3-6 is due not to the transition of the

distribution of ionized impurities.

0 5 10 15 20

NI=2.26×1014 [cm-3]の試料

NI=7.80×1013 [cm-3]の試料

NI=4.32×1013 [cm-3]の試料

Car

rier C

once

ntra

tion

[a. u

.]

Tempereture [K]

81

Figure 3-3-7 shows the temperature dependence of the free carrier concentration

corresponding to that of ionized impurities. Additionally, our analysis of their data

shows that they observe increase of FWHM due to ionization of donors and not the

transition. As one can see in the inset of Fig. 3-3-6, it takes extreme fine-tuning of

ND and NA in order to observe a clear signature of the transition with two distinct

plateaus below the temperatures where ionization takes place. The precise control

of both donors and acceptors at the level of 1013 cm-3 has been the key for the

successful observation of random-to-correlated transition of the ionized impurity

distribution in semiconductors.

82

References

1 K. M. Itoh, J. Muto, W. Walukiewicz, J. W. Beeman, E. E. Haller, Hyunjung Kim,

A. J. Mayur, M. Dean Sciacca, A. K. Ramdas, R. Buczko, J. W. Farmer, and V. I.

Ozhogin, Phys. Rev. B 53, 7797 (1996).

2 S. M. Kogan and N. Van Lien, Fiz. Tekh. Poluprovodn. 15, 44 (1981) [Sov. Phys.

Semicond. 15, 26 (1981)].

3 B.I.Shklovskii and A.L.Efros, in Electronic Properties of Doped Semiconductors,

(Springer-Verlag, Berlin Heidelberg New York Tokyo, 1984), Vol. 45, p.237.

4 D. M. Larsen, Phys. Rev. B 8, 535 (1973).

5 D. M. Larsen, Phys. Rev. B 13, 1681 (1976).

6 J. Kato, K. M. Itoh, and E. E. Haller, Physica B, 301-302, 1 (2001).

7 W. Kohn and J. M. Luttinger, Phys. Rev. 98, 915 (1955).

8 R. A. Faulkner, Phys. Rev. 184, 713 (1969).

9 K. Nishikawa and R. Barrie, Can. J. Phys. 41, 1135 (l963); R. Barrie and K.

Nishikawa, Can. J. Phys. 41, 1823 (1963).

10 H. Navarro, E. E. Haller, and F. Keilmann, Phys. Rev. B 37, 10822 (1988).

11 W. Baltensperger, Philos. Mag. 44, 1355 (1953).

12 Mark Lee, J. G. Massey, V. L. Nguyen, and B. I. Shklovskii, Phys. Rev. B 60,

1582 (1999).

13 Jiro Kato, Kohei M. Itoh, and Eugene E. Haller, Physica B, 308-310 521 (2001).

14 Jiro Kato, Kohei M. Itoh, and Eugene E. Haller, Phy. Rev. B 65 241201-1

(2002).

15 J. Kato and K. M. Itoh, Journal of the Physical Society of Japan Supplement, in

press.

83

16 S. D. Baranovskii, B. L. Gel’mont, V. G. Golubev, V. I. Ivanovskii, and A. V.

Osutin, Pis’ma Zh. Eksp. Teor. Fiz. 46, 405 (1987) [JETP Lett. 46, 510 (1987)].

17 S. D. Baranovskii, B. L. Gel’mont, V. G. Golubev, V. I. Ivanovskii, and A. V.

Osutin, Fiz. Tekh. Poluprovodn. 23, 1434 (1989) [Sov. Phys. Semicond. 23, 891

(1989)].

84

Chapter 4: The host isotope effect on the local vibrational modes

of oxygen in isotopically enriched crystalline 28Si, 29Si and 30Si

4.1 Introduction

A wide variety of novel isotope effects have been discovered recently1-5,

thanks to the availability of high quality bulk Si crystals with controlled isotopic

compositions.6, 7 In contrast to well-behaved isotope effects on phonons in Si

crystals with relatively mixed isotopic compositions,2 unpredictable isotope effects

have been discovered more recently in nearly 100% mono-isotopic Si crystals.3-5

With respect to the results obtained with natural silicon (hereafter natSi) that

composed of the isotopic composition 28Si (92.23%), 29Si (4.67%), and 30Si (3.10%),

a dramatic increase of the thermal conductivity3, a significant narrowing of the

impurity bound exciton luminescence peaks4, and absence of the acceptor ground

state splitting5 have been found unexpectedly when the enrichment of 28Si exceeded

99.98%. Similarly, a surprisingly large isotope effect on hydrogenic impurity levels

has been reported for isotopically enriched diamond.8 The present paper reports on

another intriguing effect of isotopes observed on the localized vibrational mode

(LVM) of impurity oxygen in Si.

Because of its technological importance, behaviors of oxygen in silicon have

been studied extensively.9 As a result, rich physics associated with the localized

motion of light impurities embedded in a relatively heavy host matrix has been

revealed using oxygen in Si as one of ideal examples. An oxygen atom in silicon

tends to exist as an interstitial defect between two silicon atoms at off-center

positions in the 〈111〉 direction as shown in Fig. 3-1-1.9-14 Ab initio calculations

85

have shown the bond lengths of Si-O to be 1.59Å with the Si-O-Si bond angle

172°.15 An interstitial oxygen atom has two equivalent nearest neighbor Si atoms,

six equivalent second nearest neighbor Si atoms, eighteen equivalent third neighbor

Si atoms, and so on. In the framework of the harmonic approximation, frequencies

of oxygen in silicon are determined by the local structures and masses (i.e., isotopes)

of vibrating oxygen and neighboring Si atoms.16 In many cases the isotope shifts of

the spring constants k and K of Si-O and Si-Si bonds, respectively, are small enough

to be ignored.

2nd nearest-neighbor Si

2nd nearest-neighbor Si

1st nearest-neighbor Si

1st nearest-neighbor Si

Interstitial Oxygen

K K

K

K K K

k

k

Fig. 4-1-1. The illustration of an interstitial oxygen atom in Si crystals. Oxygen

atom locates off-centered position between two neighboring silicon atoms. There

are three stable isotopes of oxygen (16O, 17O, 18O) and three silicon isotopes (28Si,

29Si, 30Si).

86

Therefore, isotope substitution of the oxygen centers with 16O, 17O, and 18O,

which changes exclusively the mass of vibrating species, has been useful in the past

for experimental understanding of the LVM of oxygen in Si. Moreover, the

discovery of the LVM linewidth of 17O being a factor of 1.5 larger than those of 16O

and 18O has suggested strongly that the interaction between Si phonons and oxygen

LVMs determines the linewidth of the oxygen LVMs in Si.14,20,21 In order to

understand the interaction between the bulk Si isotopes and vibrating oxygen atoms,

two factors must be considered separately;

i) energy dependence of the phonon density of states which is determined mainly by

the average mass of the constituting Si isotopes and

ii) disorder in Si masses (disorder in Si isotope distribution) which arises from the

co-presence of 28Si, 29Si, and 30Si isotopes.

While the larger linewidth of 17O is most likely due to the former effect, the effect of

isotopic disorder is predicted to be negligibly small within the framework of the

harmonic approximation as we will show later. As a result, the LVM linewidth is

believed to be determined solely by the relation between the LVM frequency (that

depends on the masses of the oxygen and neighboring Si) and the density of the

phonon states of Si. However, recent pump and probe measurements of oxygen

LVM in Si revealed the LVM lifetime of 229 ps which translates to the width of

0.023 cm-1,17 i.e., the linewidth measured in the absorption measurement may be

inhomogeneously broadened.

A calculation focusing on the mass of the vibrating oxygen and its two nearest

neighbors describe the energies of the LVMs to the first order. Theory of LVM of

87

oxygen in silicon proposed by Yamada-Kaneta et al. has been in good agreement

with the experimental results for a variety of modes.10-14 His quantum mechanical

calculation has separated the oxygen vibration perpendicular to the [111] plane from

the ones parallel to the [111] plane. Directions of vibrations of the A1g and A2u

modes are parallel to〈111〉 axis, while those of 2D LEAE (two-dimensional

low-energy anharmonic excitation,13 also known as low-frequency mode14 or 29 cm-1

mode10-12) are perpendicular to 〈111〉axis, as shown in Fig. 4-1-2. Energy

diagrams of the three major LVM modes and IR allowed transitions are shown in Fig.

4-1-3. Here N and M represent the contributions of the vibration due to A2u and

A1g modes, respectively, l is the angular moment along to 〈111〉 direction, and k is

the integers to distinguish each energy state.

2D LEAE A1g A2u

Fig. 4-1-2 The vibrational modes of the interstitial oxygen (red spheres) embedded in a

silicon crystal (gray spheres). There are A2u, A1g and Eu modes for the case of 2Cv

symmetry. The Eu modes are known as 2D LEAE (two-dimentional low-energy

anharmonic excitation) in the case of the LVMs of oxygen in silicon, since the interstitial

oxygen atoms are located at off center position between silicon atoms.

88

The calculation performed by Yamada-Kaneta et al. has explained not only the LVM

lines between zero-point energies of each mode but also those between non

zero-point energies. It has been developed based on the masses of vibrational

oxygen and its two nearest neighbor host atoms.

The present paper reports on the surprisingly large effect of Si isotopic mass

disorder on the oxygen LVM linewidths, which cannot be explained at all by the

harmonic approximation. Similar to the case of the recent experiments on oxygen

LVMs in isotopically controlled Ge,18, 19 the present work has investigated LVMs of

oxygen in Si samples with controlled isotopic composition.

Fig. 4-1-3 Theoretically obtained discrete energy states of the LVMs of oxygen in

silicon.14, 20-22 N and M indicate the contributions of A2u and A1g modes, respectively, l

is the angular moment along <111> directions, and k is the integers to distinguish each

energy state. (Illustration taken from Ref.14. )

89

4.2 Experimental procedures

Three samples investigated are SI-28 [28Si (99.86%), 29Si (0.13%), 30Si (0.2%)

with [O]= 4.75×1017 cm-3], SI-29 [28Si (2.17%), 29Si (97.10%), 30Si (0.73%) with

[O]= 1.01×1018 cm-3], and SI-Nat [28Si (92.2%), 29Si (4.7%), 30Si (3.1%) with [O]=

1.01×1018 cm-3] as listed in Table. 4-2-1.

All samples (SI-Nat, SI-28, SI-29, Si-30) are cut from CZ-grown natural silicon

and isotopically enriched, 28Si, 29Si and 30Si ingots, respectively. The isotopic

components of the crystals have been determined by a secondly ion mass

spectroscopy (SIMS) as shown in Table 4-2-1. Figure 4-2-1 and 4-2-2 are the

results of SIMS that show the distribution of the atoms as a function of the mass

number, i.e., the isotopic compositions. In order to find the fraction of each isotope,

we integrated the counts of the peak centered at each mass number. For example,

in case of mass number 28, we integrated the counts from 27.3 to 28.3. The errors

of isotopic compositions are less than 0.01 % since the total counts of SIMS profile

are the order of 106.

27.5 28.0 28.5 29.0 29.5 30.0104

105

106

Cou

nts

of D

ata

MassFig.4-2-1 The isotopic mass distribution of SI-29 sample measured by SIMS. By

integrating the each peak we find the isotopic composition 28Si: 2.17 %, 29Si:

97.10 %, and 30Si: 0.73 %.

90

Isotopic composition of SI-28 as published in Ref. 7 was also obtained by the SIMS

measurement. The oxygen concentration of natural silicon has been determined by

the LVM absorbance of 1100 cm-1 line at 77 K and 300 K. We used the American

Standard for Testing and Materials F121-79 for deciding the oxygen concentration in

natural silicon. In order to determine the oxygen concentration, we use the ratio of

the intensities of the main peak at 1100 cm-1 and the baseline at the shoulders of the

main peak. In case SI-29 sample, the transmittance (T) of the base line is 0.42 and

transmittance at the peak is 0.26. With the refractive index of silicon crystal

n=4.298 and the sample thickness d=0.07 cm, the reflection value R=10.9 is obtained

by the relation,

( )21−= nR . (4-2-1)

27.5 28.0 28.5 29.0 29.5 30.0 30.5

105

106

107

Cou

nts o

f Dat

a

Mass

Fig.4-2-2 The isotopic mass distribution of SI-30 crystal measured by SIMS. The

isotopic composition of the sample is 28Si:0.67%, 29Si: 0.59%, and 30Si: 98.74%.

91

The absorption coefficient, α, at the base line 77.9 cm-1 and at peak 84.9 cm-1 are

obtained by the following relation,

( ) ( )

+−+−−−=

TRTRRR

d 2

2242

2411

ln1α . (4-2-2)

The effective absorption coefficient of 6.83 is obtained by the subtraction from

absorption coefficient at the peak to that at the baseline. Finally the concentration

of oxygen is found as 6.48x1017 cm-3 by multiplying the effective absorption

coefficient by 9.5x1016 which is the procedure of the American Standard for Testing

and Materials F121-79. The electrically active impurity concentrations have been

determined by the far infrared transmittance spectroscopy and the Hall measurement

and the results are listed in Table 4-2-1. Oxygen was introduced to SI-29 and SI-30

samples during CZ growth from the quartz crucibles. We introduce oxygen to

SI-28 sample by melting it in a dilute atmosphere (0.1%) of oxygen in flowing Ar

gas. Figure 3-2-3 and 3-2-4 show far infrared transmittance spectroscopy of SI-29

and SI-30 measured at 4 K, respectively. In Fig. 4-2-3, two strong absorption lines

due to phosphorus in silicon are observed. The broad absorption from 500 cm-1 is

due to transitions from the ground state to the continuous conduction band states.

Phosphorus is the major electrically active impurity in this sample. In Fig. 4-2-4, a

series of the strong absorption lines in SI-30 due to boron impurities is obtained at

245.0, 278.5, 309.3, 319.5, 320.0, 322.0, 668.5, and 692.7 cm-1. The absorption

line at 603 cm-1 is due to the LVMs of carbon. The comparison between SI-Nat

(with low carbon impurity) and SI-30 indicates the existence of the carbon in SI-30.

A series of the electric lines due to boron and isotope shifted two phonon absorption

92

lines in SI-30 are shown in Fig. 4-2-5. Again a signature of the high concentration

of carbon is found near the TO+TA phonon line. The dip at 510 cm-1 is probably

due to the electric transition of impurities, since the peak has a temperature

dependence characteristic of the electronic transitions. The carbon concentration in

SI-30 is estimated to be 5.07×1017 cm-1 by these observations. This value was

obtained by the method described in Ref. 9. The infrared absorption spectra were

recorded with a BOMEM DA-8 Fourier transform spectrometer with a Globar light

source, a KBr beam splitter, and MCT detector. The resolution was 0.03 cm-1 and

the signal-to-noise ratio was improved by coadding 200 spectra. The samples were

cooled in an OXFORD OPTISTAT cryostat with a ZnSe window and the sample

temperature was monitored with a calibrated thermometer installed at the sample

mount.

Fig. 4-2-3 Far infrared spectroscopy of SI-29 measured at 4 K. Strong absorptions

at 278 and 319 cm-1 correspond to the electronic absorptions of phosphorus.

100 200 300 400 500 600

4

5

6

7

8

Phosphorus lines

Abs

orpt

ion

Coe

ffic

ient

[cm-1

]

Wave Number [cm-1]

93

Fig. 4-2-4 Temperature dependence of far infrared absorption spectroscopy of

SI-30. A series of the strong absorptions indicate the electronic transitions due to

boron. The absorption line at 603 cm-1 is due to the LVMs of carbon.

200 300 400 500 600 70015.0

15.5

16.0

16.5

17.0

17.5

18.0

18.5LVM of 12C in 30Si

Boron lines

Abs

orba

nce

[cm

-1]

Wavenumber [cm-1]

004K 010K 020K 040K 060K 080K 100K 120K 150K 200K 250K

200 300 400 500 600 700

15.0

17.5

T = 4 [K]

Two phonon (TO+TA)

LVM of C

Boron lines

NatSi(low [C])

30Si(high [C])

Abs

orba

nce

[cm

-1]

Wavenumber [cm -1]

Figure 4-2-5 Comparison between SI-Nat and SI-30 measured at 4 K. Strong

absorptions arise due to boron and two-phonon absorption in both samples.

Features due to carbon are observed only in SI-30.

94

Table 4-2-1. Isotopic composition and impurity concentrations of the isotopically

enriched 28Si, 29Si, 30Si, and natural silicon crystals (labeled SI-28, SI-29, SI-30, and

SI-Nat, respectively) used in this work. The Isotopic compositions have been

determined by the SIMS measurement. The oxygen concentration has been

determined by the absorption line measured at the 1100 cm-1 at 77 K and 300 K.

Impurity concentrations have been determined by the Hall measurements.

Isotopic Composition [%] Impurity Concnetration [cm-3] Sample

28Si 29Si 30Si

SI-Nat 92.23 4.67 3.10 [P]=1.19×1015 [O]=7.39×1017

SI-28 99.86 0.13 >0.2 [B]=5.03×1014 [O]=4.75×1017

SI-29 2.17 97.10 0.73 [B]= 2.64×1015 [O]=6.48×1017

SI-30 0.67 0.49 98.7 [B]= 5.48×1016 [O]=8.79×1017

[C]=5.07×1017

95

4.3 Results and discussion

Experimental data and discussions will be presented in the following three

sub-sections as follows.

(i) Sec. 4.3.1. The effect of the nearest Si atoms on oxygen LVM. A harmonic

linear chain model is used successfully for the discussion.

(ii) Sec. 4.3.2. The effect of the 2nd and beyond nearest-neighboring Si atoms.

The harmonic model is used for the discussion with a partial success.

(iii) Sec. 4.3.3. The effect of host Si atoms on LVM linewidths of oxygen in

SI-Nat, SI-28, and SI-29. The breakdown of the harmonic model will be

discussed.

4.3.1. Effect of 1st nearest-neighboring host silicon atoms

Figure 4-3-1-1 shows the A2u-related absorption spectrum of the SI-29 sample

obtained at 4 K. The inset shows an energy diagram of the A2u-related excitations

based on the notation |N,l,k〉 that has been employed in Ref. 13, 20-22. Here N, l,

and k are the principal quantum number of the A2u mode, the angular momentum of

the oxygen around the 〈 111 〉 axis, and the additional quantum number

distinguishing the states of the same N and l, respectively. Values of the energy

separation shown in the inset are calculated for the 29Si-16O-29Si configuration based

on a harmonic model of a linear chain composed of one linear 29Si-16O-29Si molecule

surrounded by 196 Si atoms of the average mass 28.966 which is in accordance with

the isotopic composition of SI-29. The periodic boundary condition is imposed to

eliminate the dangling bonds. The bonding constant connecting two Si atoms is

96

kSi-Si=Mω2/4= 113.3 N/m, where M is the mass of Si atoms and ω = 524.6 cm-1 is the

TO phonon energy at the Γ point determined by Raman spectroscopy of isotopically

pure Si.4 The bonding constant between Si and oxygen, kSi-O= 479.18 N/m, is

determined from the frequency of the A2u mode of 28Si-16O-28Si calculated by

Yamada-Kaneta et. al. (1151.5 cm-1).20-22 Details of this calculation is explained at

the end of this chapter in the case of five atom model, and the calculational code is

shown in Appendix V. We assume the same spring constants kSi-Si and kSi-O for the

all combinations of Si and O isotopes. A strong line at 1132.5 cm-1 observed

experimentally in the mainframe of Fig. 4-3-1-1 is the A2u excitation from the |0,0,0〉

to |1,0,0〉 states of the 29Si-16O-29Si configuration, which agrees very well with the

estimation of the harmonic model shown in the inset. Figure 4-3-2 also shows

several other LVM lines. The line at 1081.0 cm-1 is due to |0,0,0〉-|1,0,0〉 of

29Si-18O-29Si, 1201.4 cm-1 is |0,0,0〉 -|1,1,0〉 of 29Si-16O-29Si, 1207.7 cm-1 is

10,0,± - 11,1,± of 29Si-16O-29Si, 1100.6 cm-1 is most likely carbon-oxygen

complexes previously reported at 1103.9 cm-1 in natSi 23, and 1047.2 cm-1 may be

related to the oxygen-impurity complexes discussed by Chappell et al..24 In addition,

a LVM line due to the A2u+A1g combined mode of 29Si-16O-29Si is observed at

1734.4cm-1 in Fig. 4-3-1-3. The direct comparison of the peak positions between

experiment and calculations are in excellent agreement as shown in Table 4-3-1.

Figure 4-3-1-2 shows the temperature dependence of the 1132.5 cm-1 excitation.

As the temperature is raised, the low-frequency states such as 2D LEAE are excited.

Therefore, the absorption intensities of the peaks at 1118.3 cm-1 ( 20,0,± - 21,0,±

of 29Si-16O-29Si ), 1124.5 cm-1 ( 10,0,± - 11,0,± of 29Si-16O-29Si ), and 1126.40

cm-1 ( 10,0,± - 11,0,± of 28Si-16O-29Si ) grow with increasing temperatures.

Weak absorption lines at 1130.8 cm-1 and 1134.4 cm-1 are |0,0,0〉 -|1,0,0〉of

97

29Si-16O-30Si and 28Si-16O-29Si, respectively, for which the residual 28Si (2.17 %) and

30Si (0.73 %) isotopes in the SI-29 sample are responsible. A large isotope shift of

13.2 cm-1 in Fig. 4-3-1-3 (1734.4 cm-1 in SI-Nat, 1721.2 cm-1 in SI-29) is due to

delocalization of the A1g mode vibration. A discussion of the delocalization of A1g

will be given with Fig. 4-3-2-2, Ref. 13, and 14. Fig. 4-3-1-4 shows the absorption

spectra of SI-30 measured at T = 4 K. A strong absorption line due to |0,0,0〉

-|1,1,0〉 of 30Si-16O-30Si is observed at 1129.1 cm-1. Additionally, carbon-oxygen

complex mode and oxygen related complex modes are obtained at 1095 and 1121

cm-1.

Fig. 4-3-1-1. The absorption spectrum of the SI-29 sample measured at T = 4 K.

Obtained peaks are due to LVMs of oxygen in silicon crystal and to oxygen-carbon

complex. See text for details.

0.02

0.04

0.06

0.08

0.1

0.12

1040 1080 1120 1160 1200Abs

orpt

ion

Coe

ffic

ient

[cm

-1]

Wavenumber [cm-1]

1047.21081.0 1100.6 1132.5

1201.4

1207.7|0,0,0〉

|0,0,±1〉 |0,0,±2〉

|1,0,0〉

|1,0,±1〉

|1,0,±2〉

|1,1,0〉

|1,1,±1〉

98

The absorption spectra of SI-30 from T = 4 up to 60 K are shown in Fig. 4-3-1-5.

As the temperature is raised, new LVM lines appear at 1114.7and 1121.1 cm-1.

These lines appear due to the transitions from the thermally excited 2D LEAE states.

Figure 4-3-1-6 shows absorption line due to |0,0,0〉-|1,1,0〉 of 28Si-16O-28Si. No

signature of carbon and other impurities is observed.

Fig. 4-3-1-2. Temperature dependence of the A2u related LVM peaks in SI-29 for

the range T =4 - 60 K. As the temperature is raised, new LVM lines appear at

1118.25, 1124.50, and 1126.40 cm-1. This is a clear evidence of the LVM of oxygen

in silicon and they are named generally as “hot mode lines”. These lines appear

due to the transitions from the thermally excited 2D LEAE states. Around the LVM

line 1132.5 cm-1, small absorption lines at 1134.4 cm-1 and 1130.82 cm-1 are

observed. They represent the transitions from the ground state to the A2u excited

states in case of the 28Si-16O-29Si and 29Si-16O-30Si formations, respectively.

99

The absorption lines observed in the previous reports and present studies are

summerized in Table 4-3-1-2.9-14 LVM frequencies described in the Italics in Table

4-3-1-2 are reported for the first time in this work.

1700 1710 1720 1730 1740 1750 17600.000

0.002

0.004

0.006

0.008

0.010

0.012

A

bsor

ptio

n C

oeff

icie

nt [c

m-1]

Wavenumber [cm-1]

Fig. 4-3-1-3. An absorption peak due to the transition from the ground state to A1g

+ A2u combined excited state in SI-29. A large isotope shift of 13.2 cm-1 (from

1734.4 cm-1 in SI-Nat and 1721.2 cm-1 in SI-30) is due to delocalization of A1g mode

vibration.

100

Fig. 4-3-1-4 The absorption spectra of the isotopically enriched 30Si crystal measured at

T = 4 K. A strong absorption line due to the A2u excited state of the 29Si-16O-29Si is

observed. Additionally, carbon-oxygen complex mode and oxygen related complex mode

are observed at 1095 and 1121 cm-1. The lines due to the 29Si-16O-30Si and 28Si-16O-30Si

were obtained at 1130.8 and 1132.5 cm-1, respectively.

LVM Calculated frequency

[cm-1]

Experimental data

[cm-1]

28Si-16O-28Si 1136.5 1136.5

28Si-16O-29Si 1134.1 1134.4

28Si-16O-30Si 1131.9 1132.0

29Si-16O-29Si 1131.7 1132.5

29Si-16O-30Si 1129.4 1130.8

29Si-16O-30Si 1127.0 1129.1

28Si-18O-28Si 1087.1 1084.4

29Si-18O-29Si 1079.8 1081.0

1100 1150 12000.10

0.15

0.20

0.25

0.30

C-O complex

A2u

30Si-16O-30Si

A2u

+ 2D LEAE30Si-16O-30Si

Abs

orpt

ion

Coe

ffic

ient

[cm-1]

Wave Number [cm-1]Wavenumber

Table 4-3-1-1 Comparison of the excitation frequencies of the |0,0,0 〉 - |1,1,0 〉

transition between experiments and calculation.

101

1110 1115 1120 1125 1130 11350.0

0.5

1.0

1.5

2.0

2.5

3.0 4 K 10 K 20 K 40 K 60 K 77 K

Abs

orpt

ion

Coef

ficie

nt [c

m-1]

Wavenumber [cm-1]Fig. 4-3-1-5 The absorption spectra of SI-30 from T = 4 K up to T = 60 K. As

temperature is raised, new LVM lines appear at 1114.7and 1121.1 cm-1. This is a

clear evidence of the LVM of oxygen in silicon and they are named generally as “hot

mode lines”. These lines appear due to the transitions from the thermally excited

2D LEAE states.

0

1

2

3

4

5

6

1080 1120 1160 1200

28Si at T = 4 K

Abs

orpt

ion

Coe

ffic

ient

[cm

-1]

Wavenumber[cm-1]

Fig. 4-3-1-6 The absorption spectra of SI-28 measured at 4 K. The line shown at

the center of this figure is due to LVM of oxygen.

102

Table 4-3-1-2 Energies of various oxygen LVM in wavenumbers. Values in italic

fonts are the ones observed experimentally for the first time in the present study.

28Si

28Si

28Si

29Si

29Si

30Si

28Si

28Si

28Si

29Si

29Si

30Si

16O

16O

16O

16O

16O

16O

18O

18O

18O

18O

18O

18O

28Si

29Si

30Si

29Si

30Si

30Si

28Si

29Si

30Si

29Si

30Si

30Si

¦0,0,0,0>→¦0,0,0,±1> 29.25 27.2

¦0,0,0,±1>→¦0,0,0,±2> 37.7 35.3

¦0,0,0,±1>→¦0,0,1,0> 48.6

¦0,0,0,±2>→¦0,0,0,±3> 43.3

¦0,0,1,0>→¦0,1,0,±1> 517 517

¦0,0,0,±1>→¦0,1,1,0> 668

¦0,0,0,±2>→¦0,1,0,±3> 664

¦0,0,0,±1>→¦0,1,0,±2> 657.4

¦0,0,0,0>→¦0,1,0,±1> 648.2

¦0,0,0,±1>→¦0,1,0,0> 588.4

¦0,0,0,±2>→¦0,1,0,±1> 580.2

¦0,0,1,0>→¦0,1,0,±1> 570

¦0,0,0,0>→¦1,0,0,0> 1136.4 1134.4 1132.6 1132.5 1130.8 1129.1 1084.4 1081

¦0,0,0,±1>→¦1,0,0,±1> 1128.2 1126.4 1124.5 1121.1 1076.7

¦0,0,0,±2>→¦1,0,0,±2> 1121.9 1118.3 1114.7 1071

¦0,0,0,0>→¦1,0,1,0> 1205.7 1201.4 1197.1

¦0,0,0,±1>→¦1,0,1,±1> 1216.4 1207.7

¦0,0,0,0>→¦1,1,0,±1> 1748.6 1734.4 1721.2 1150.8

¦0,0,0,±1>→¦1,1,0,±1> 1740.9

¦0,0,0,±2>→¦1,1,0,±2> 1734.1

¦0,0,0,0>→¦1,1,1,0> 1819.5

¦0,0,0,±1>→¦1,1,1,±1> 1831.3

¦A2u,A1g,k,l >

103

4.3.2. Effect of the 2nd nearest and beyond nearest-neighboring host atoms

We shall now evaluate the effect of the second and beyond nearest Si neighbors

by focusing on a particular configuration 28Si-16O-29Si and compare the frequencies

of the A2u mode between the SI-29 and SI-Nat samples. Figure 4-3-2-1 shows the

absorption peaks of the |0,0,0〉-|1,0,0〉 excitations of the 28Si-16O-29Si in SI-29 and

SI-Nat, which shows the peak frequency shift of 0.07 cm-1. This small but obvious

shift is caused by the isotope effect of the second and beyond nearest neighboring Si

atoms, since those in SI-29 are mostly 29Si while those in SI-Nat are mostly 28Si

isotopes. Calculations based on the linear chain model described in chapter 4.3.1

predict the shift of approximately 0.03 cm-1 (see Fig.4-3-2-3). Although there is a

factor between the experiment and calculation, we believe this agreement within the

same order of magnitude shows unambiguously the effect of second and beyond

nearest Si neighbors. Figure 4-3-2-2 shows the amplitude of the displacement of

each atom in our linear-chain calculation. For the case of A2u, the second nearest

neighbor Si is displaced clearly, i.e., isotope substitution of the second neighbors

should shift the LVM frequency. Although much larger effect of the second and

beyond nearest neighbors is expected for A1g as seen in Fig. 4-3-2-2, we could not

observe A1g related absorption lines experimentally due to the insufficient thickness

(<1mm) of our sample. Our discussion here suggests that the origin of large

isotope shifts of the A1g mode and the A1g + A2u combined mode discussed in Ref.

14 and 22 may be due to the second and beyond nearest neighbors. In order to

observe the effect of the second and beyond nearest neighbors on impurity LVMs,

one has to select carefully the mass of the localized impurity and host

semiconductors. For example, a hydrogen atom is so much lighter than the host Si

104

atom that its vibration is strongly localized, and the second-nearest Si atoms are not

displaced at all. On the other hand, when the masses of the impurity and host

atoms are too close, the localization of the impurity vibration does not occur. For

the case of oxygen in Ge, the mass difference is too big to observe the effect of the

second and beyond nearest neighbors. To our knowledge, LVM of B in GaP is the

only other example that shows the effect of the second and beyond nearest

neighbors.25

Fig. 4-3-2-1 The absorption spectra of SI-29 () and SI-Nat () measured at T = 4

K. Both peaks are assigned from |0,0,0〉to |1,0,0〉of the 28Si-16O-29Si configurations,

but there is an important difference between the two. In the case of SI-29, second

nearest host atoms are almost all 29Si, while the second nearest host atoms are almost

all 28Si in the case SI-Nat. The difference of the LVM energies between these two

samples is about 0.07 cm-1.

1134.0 1134.5 1135.0

1134.471134.40

Abs

orba

nce

[a.u

.]

Wave Number [cm-1] Wavenumber [cm-1]

105

Fig. 4-3-2-2 The calculated displacement patterns of the A2u and A1g modes by a

linear chain model. The horizontal axis means the position of oxygen and silicon

atoms. The vertical axis means the intensities of the vibrations of the atoms.

Oxygen atom is positioned at the center of this linear chain. In this particular

calculation, the Si atom on the left of oxygen is 28Si. Other silicon atoms are 29Si.

Fig. 4-3-2-3 The calculational results of the energy shifts of 28Si-16O-29Si

configuration due to the second and beyond nearest silicon atoms as a function of

the number of atoms in a calculational cell. The calculational cell is

composed 99 atoms which is confirmed large enough to calculate the energy

shift. The big energy shift in the case of A1g mode is consistent with the weaker

localization of A1g mode than that of A2u mode.

20 40 60 80 1000.0

0.5

1.0

1.5

2.0

2.5

A2u: 0.03 cm-1

A1g: 2.5 cm-1

Ene

rgy

Shif

t [cm-1

]

The Number of Atoms

A2u mode

A1g mode

Inte

nsity

[a. u

.]

Position

106

4.3.3. Effect of host silicon isotopes in the oxygen LVM linewidths

Up to chapter 4.3.2, we have successfully applied the harmonic approximation

to explain the Si isotope shifts of the oxygen LVM frequencies. However, we shall

now demonstrate the complete breakdown of the harmonic model when it comes to

the linewidths of the oxygen LVM. Figure 4-3-3-1 shows the absorption lines of

the |0,0,0〉-|1,1,0〉 excitation recorded with SI-Nat, SI-28, and SI-29 samples. The

full widths at half maximum (FWHM) are 0.58 cm-1, 0.40 cm-1, and 0.23 cm-1 for

SI-Nat, SI-28, and SI-29, respectively. Firstly, we concentrate on the comparison of

the results between SI-Nat and SI-28. Since the average masses of the Si isotopes

are very similar, we expect the phonon density of the states of these two samples to

be the same. Therefore, the significant narrowing of the width in SI-28 with

respect to that of SI-Nat must not be due to the change in the phonon density of the

states. The remaining possibility is the degree of the Si mass disorder, which is

larger in SI-Nat than in SI-28. In attempt to reproduce theoretically the difference

in the linewidths, we have calculated the full matrix elements of oxygen LVM for the

three-dimensional structures shown in Fig. 4-1-1 with appropriate harmonic bond

strengths k and K using the method employed in Ref. 20 (details of this calculation is

mentioned in this chapter from page 121 to 125 and Appendix VI). However, we

find the change of only 0.02 cm-1, which is much smaller than the difference 0.18

cm-1 found in the experiment. Therefore, we conclude that the anharmonicity is

playing an extremely important role together with the differences in the degree of the

mass disorder. On the other hand, further narrowing of the peak in SI-29 must be

due to combined effects of changes in the phonon density of the states and isotope

disorder. In the case of the A2u mode (1136.4 cm-1 in SI-Nat), the LVM decays by

107

at least three phonons since the maximum of the Si phonon frequency is 524.5 cm-1.

One possibility is the change in three-phonon density of states at the LVM

frequencies between the peak positions 1132.5 cm-1 in SI-29, and 1136.4 cm-1 in

SI-28 and SI-Nat. FWHM=0.23 cm-1 in SI-29 is 0.35 cm-1 smaller than

FWHM=0.58 cm-1 in SI-Nat, in part because of the smaller phonon density of the

states at 1132.5 cm-1 than that at 1136.4 cm-1 leading to slower decay of oxygen

vibrations, and in part because of less Si mass disorder in the 97.10% isotopically

enriched SI-29 sample leading to less inhomogeneous broadening of the peak.

0.40 cm-1

0.58 cm-1

SI-29

SI-28

SI-Nat

0.23 cm-1

1132 1134 1136 1138

T=4K

Wavenumber [cm-1]

Abs

orba

nce

[a.u

.]

Fig. 4-3-3-1. A comparison of the width of the LVM lines of |0,0,0〉- |1,1,0〉transitions

in SI-29, SI-28, and SI-Nat.

108

It suggests that further enrichment of 29Si isotopes towards 100% will sharpen the

line beyond 0.23 cm-1 because of the surprisingly large contribution of the isotopic

mass disorder to the width of the oxygen A2u mode in Si.

109

References

1 E. E. Haller, J.Appl. Phys, 77, 2857 (1995).

2 F. Widulle, T. Ruf, M Konuma, I. Silier, M. Cardona, W. Kriegseis and V. I.

Ozhogin, Solid State Commun. 118, 1 (2001).

3 T. Ruf, R. W. Henn, M. Asen-Palmer, E. Gmelin, M. Cardona, H. -J. Pohl, G. G.

Devyatych and P. G. Sennikov, Solid State Commun. 115, 243 (2000).

4 D. Karaiskaj, M. L. W. Thewalt, T. Ruf, M. Cardona, H. –J. Pohl, G. G.

Deviatych, P. G. Sennikov, and H. Riemann, Phys. Rev. Lett. 86, 6010 (2001).

5 D. Karaiskaj, M. L. W. Thewalt, T. Ruf, M. Cardona, and M. Konuma, Phys. Rev.

Lett. 89, 016401 (2002).

6 Ken–ichiro Takyu, Kohei M. Itoh, Kunihiko Oka, Naoaki Saito and Valerii I.

Ozhogin, Jpn. J. Appl. Phys. 38, 1493 (1999).

7 A. D. Bulanov, G. G. Devyatych, A. V. Gusev, P. G. Sennikov, H. –J. Pohl, H.

Riemann, H. Schilling, and P. Becker, Cryst. Res. Technol. 35, 1023 (2000).

8 Hyunjung Kim, R. Vogelgesang, A. K. Ramdas, and S. Rodriguez, M. Grimsditch,

and T. R. Anthony, Phys. Rev. B 57, 15315 (1998).

9 R. C. Newman, J. Phys. Condens. Matter 12, 335 (2000).

10 D. R. Bosomworth, W. Hayes, A. R. Spray, and G. D. Watkins, Proc. Roy. Soc.

Lond. A. 317, 133 (1969).

11 H. J. Hrostowski and R. H. Kaiser, Phys. Rev. 107, 966 (1957).

12 H. J. Hrostowski and B. J. Alder, J. Chem. Phys. 33, 980 (1960).

13 Hiroshi Yamada-Kaneta, Physica B 302-303, 172 (2001).

14 B.Pajot, E. Artacho, C. A. Ammerlaan, and J-M. Spaeth, J. Phys. Condens.

Matter 7, 7077 (1995).

110

15 R. Jones, A. Umerski, and S.Öberb, Phys. Rev. B 45, 11321 (1992).

16 M. D. McCluskey, J.Appl. Phys, 87, 3593 (2000).

17 B. Sun, A. Fraser, and G. Lüpke, private communication.

18 A. J. Mayur, M. Dean Sciacca, M. K. Udo, A. K. Ramdas, K. Itoh, J. Wolk, and

E. E. Haller, Phys. Rev. B 49, 16293 (1994).

19 E. Artacho, F. Yndurain, B. Pajot, R. Ramirez, C. P. Herrero, L. I. Khirunenko,

K. M. Itoh, E. E. Haller, Phys. Rev. B 56, 3820 (1997).

20 Hiroshi Yamada-Kaneta, Chioko Kaneta, and Tsutomu Ogawa, Phys. Rev. B 42,

9650 (1990).

21 Hiroshi Yamada-Kaneta, Chioko Kaneta, and Tsutomu Ogawa, Phys. Rev. B 47,

9338 (1993).

22 H. Yamada-Kaneta, Phys. Rev. B 58, 7002 (1998).

23 G. Davies and R. C. Newman, in Handbook on Semiconductors Completely

Revised Edition (Elsevier Science Publishers B. V., Amsterdam, 1992), vol. 3,

Chapter 21, (1994).

24 S. P. Chappell, M. Claybourn, R. C. Newman, K. G. Barraclough, Semicon. Sci.

Technol. vol. 3, no. 10, 1047 (1988).

25 D. A. Robbie, M. J. L. Sangster, E. G. Grosche, R. C. Newman, T. Pletl, P.

Pavone, and D. Strauch, Phys. Rev. B 53, 9863 (1996).

26 Jiro Kato, Kohei M. Itoh, Hiroshi Yamada-Kaneta, and Hans-Joachim Pohl,

Proceedings of the 26th International Conference on the Physics of

Semiconductors, Edinburgh, July 29-August 2, 2002, Institute of Physics

Publishing, in press.

111

Chapter 5: Summary and future prospects

In this thesis we have discussed the effect of electronic correlation and isotopic

mass disorder on impurity infrared absorption spectra, especially on the linewidths.

In chapter 3, we have discussed the broadening of ground-state to bound

excited-state transitions of shallow donors in strongly compensated n-type

Ge:(As,Ga) in the presence of electric fields and their gradients, arising from

randomly distributed ionized impurities. Quantitative comparison of the

experimentally obtained linewidths with Monte Carlo simulation results made

possible a unique determination of the ionized impurity distribution in the samples.

A clear evidences for the random-to-correlated transition of the ionized impurity

distribution as a function of the ionized impurity concentration and of temperature

was presented.

In chapter 4, we have discussed a high-resolution infrared absorption study of

the localized vibrational modes (LVMs) of oxygen in isotopically enriched 28Si and

29Si single crystals. Isotope shifts of LVM frequencies from those in natural Si

were clearly observed not only due to the change of the average mass in the nearest

neighbor silicon atoms but also to that of the second and beyond nearest neighbors.

The amount of these shifts agrees quantitatively with calculations based on the

harmonic approximation. However, the linewidths of certain LVMs in the enriched

samples were much narrower than those in natural Si, despite the fact that the

harmonic approximation predicts very little dependence of the width on the host Si

isotopic composition. Such observation suggested that both anharmonicity and

inhomogeneous broadening due to isotopic disorder are playing important roles for

the determination of the oxygen LVM linewidths.

112

In this thesis, a strong focus was placed on the linewidth of the absorption

peaks. Understanding of the linewidths provides the bases for determination of

impurity concentrations and crystalline quality because the linewidth is very

sensitive not only to the impurity concentration but also to the quality of crystals.

Electric field, defects, stress, and other extrinsic properties affect the linewidth

significantly. Once high crystalline quality is confirmed, it is possible to use the

absorption spectroscopy to determine the concentrations of the electrically active

majority and minority impurity concentrations, and those of electrically inactive

localized impurities. In order to precisely determine these concentrations, it is

necessary to understand the physics of line broadening. In this regard, the results of

this thesis may be proven important for the characterization of semiconductors, i.e.,

technology, in the future.

Future prospectives includes further understanding of the linewidth. For

the work presented in chapter 3, open questions include the development of the

quantitative theoretical models describing the ionized impurity concentration and

temperature induced transition between correlated and random transition. Such

understanding is also of technological importance because determination of the

impurity concentration based on the linewidth depends on the temperature of the

measurement. For example, if the measurement is performed at T=4 K, one needs

to know what linewidths we expect for both random and partially correlated

distributions of impurities. In this thesis we have probed the linewidth only for the

compensation K<0.7. It is of interest in the future to probe the region K>0.7.

What happens when two kinds of donors and one kind of acceptor are contained was

not discussed in this thesis. Two kinds of donors have different energy states and,

with appropriate choices of compensation, a situation can be realized in which the

113

shallower donors are partially ionized while deeper donors are not ionized at all. In

this case we expect to observe correlated distribution only for the shallower donors.

The linewidth of the deeper donors should correspond to that of random distribution.

This kind of observation will further confirm the findings in chapter 3.

Physics of oxygen localized vibrational modes has been proven very rich in

chapter 4. It represents the chemical bonding between oxygen and silicon which

can not be described by the simple harmonic approximation. Unexpectedly large

isotope effects of host Si isotopes have been found. There is no doubt for the

importance of the investigation with silicon whose isotopic composition is

systematically modified. For example a crystal with 1:1 mixture of 28Si and 30Si

has a maximum Si disorder and its effect on the linewidth is of significant interest.

Also measurement and discussion of low frequency modes such as 2D LEAE as a

function of Si isotopic composition will provide better understanding of physics of

oxygen LVM in Si. The effect of multi-phonon emission is also important to

understand the LVM linewidth. We must calculate the multi-phonon density of

states to consider the effect quantitatively in the future.

114

Appendixes

Appendix A: Theoretical models for linewidth calculation in Chapter 3

A.1. Importance of using an anisotropic wavefunction

Larsen1 has calculated the width of the absorption peak of donors in GaAs by

using Eq. (25) in Ref. 1, i.e.,

⋅−+±

∂∂

−⋅⋅⋅=∆ 23 3*22*3* 156186 εaNTTz

ERyaNE IBAz

I . (A-1-1)

Eq. (A-1-1) represents the perturbation energy of the electron bound to the 2p±

orbital of shallow donors assuming a completely isotropic conduction band. A

distribution in perturbation energies for an ensemble of donor electrons leads to a

broadening of the peak. The circumstance of our experiment is very similar to that

in Ref. 1 in chapter 3 except for the point that our material (Ge:As) has the strong

anisotropy in the conduction bands. As a first-order approximation, Eq. (A-1-1)

can be employed to simulate our experimental results. However, applicability of

Eq. (A-1-1) for quantitative analysis remains questionable due to the strong

anisotropy (the longitudinal effective mass is approximately 20 times larger than the

transverse effective mass) of Ge conduction bands. Therefore, a donor electron

wavefunction for Ge should be composed based on a sum of eight wavefunctions

whose longitudinal axes (hereafter z axes) correspond to the directions of [ ]111 ,

[ ]111 , [ ]111 , [ ]111 , [ ]111 , [ ]111 , [ ]111 , and [ ]111 . The wavefunction of

115

our interest, ( )±p2ψ , is composed of the strong anisotropic wavefunctions and their

Bloch wavefunctions ( )±pi 2ϕ as follows,

( ) ( )∑ ±± ⋅=4

22i

ii pcp ϕψ , (A-1-2)

where ∑ =4

2 1i

ic . ( )±p2ψ is expressed as E+T1+T2 using the standard notations

of group theory in Td symmetry. Thus it is important for us to take into account the

anisotropy since there is no isotropic notation such as A1 in the ( )±p2ψ orbital.

In order to estimate the perturbation energy E∆ for the case of the Ge

anisotropic ( )±p2ψ wavefunction, we use:

( )

⋅+±−

∂∂

⋅⋅⋅=∆ ±±

±±± 1,1,222

22

1,1,222

1,1,222

1,1,2** cos

31

433

21 ψθψψψ ϕi

BAz

I eLrTTrzz

ERyaNE

(A-1-3)

where IN is ionized impurity concentration, *a is effective Bohr radius, and *Ry

is effective Rydberg constant. z

Ez

∂∂ and 22

BA TT + are given by

( )∑ −−=∂∂ 22

50

3 jjj

jz RZRe

zE

ε and (A-1-4)

( ) ( )2

50

2

225

0

22 2

⋅+

−=+ ∑∑ jj

j

jjj

j

jBA YX

Re

YXRe

TTεε

, (A-1-5)

respectively. The wavefunction for the 2p± orbital ( 1,1,2 ±ψ ) is given by:

116

*25*

111,21,1,2 sin

8

1 ar

i erea

YR−

±±± ⋅⋅=⋅= θ

πψ ϕ , (A-1-6)

where 1,2R and 11±Y are the radial wavefunction and the spherical harmonic

wavefunction, respectively. The direction of z-axis corresponds to the longitudinal

axis of a wavefunction. We ignored quadratic Stark effect in Eq. (A-1-3) since this

contribution is believed to be negligibly small for our set of samples.

In our calculation z

Ez

∂∂ and 22

BA TT + are quantitatively obtained by

numerical calculation based on the Monte Carlo method. Then the perturbation

energy E∆ is obtained directly from Eq. (A-1-3) since values for *a , *Ry , and

IN are known.

We shall describe in the following two sections how we obtain the anisotropic

wavefunctions based on Eq. (A-1-6) using well-established methods developed by

Kohn-Luttinger2 and by Faulkner3 We shall compare the three values of E∆

obtained by;

i) isotropic wavefunction [Eq. (A-1-1)],

ii) anisotropic wavefunction of Kohn-Luttinger, and

iii) anisotropic wavefunction of Faulkner

directly at the end of this chapter.

117

A.2. Calculation based on Kohn-Luttinger’s wavefunction2

The trial function ( )rTrialψ according to the Kohn-Luttinger method is obtained by

calculating the following equation,

( ) 022

2

2

2

2

2

2

2

2

2

1

2

=

−−

∂∂

+∂∂

−∂∂

− rEr

eyxmzm Trialψ

κhh , (A-2-1)

where m1 is an effective mass along the direction of the z-axis (longitudinal

direction)、m2 is along the direction of the x and y-axes (transverse directions). The

direction of z-axis corresponds to [ ]111 , [ ]111 , [ ]111 , [ ]111 , [ ]111 , [ ]111 ,

[ ]111 , and [ ]111 for the case of Ge.

Table A-2-1: Trial functions of Kohn-Luttinger method2

State Trial function

1s C exp[-(ρ2/a2+z2/b2)1/2]

2p, m=0 C z exp[-(ρ2/a2+z2/b2)1/2]

2s, m=0 (C1 + C2ρ2 + C3 z2) exp[-(ρ2/a2+z2/b2)1/2]

3s, m=0 (C1 + C2ρ2 + C3 z2) z exp[-(ρ2/a2+z2/b2)1/2]

2p, m=1 C x exp[-(ρ2/a2+z2/b2)1/2]

ρ=(x2+y2+z2)1/2

Equation. (A-2-1) is expressed more simply in the unit of energy 22420 2 κhemE = :

118

( ) 022

2

2

2

2

2

=

−−

∂∂

+∂∂

+∂∂

− rEryxz Trialψγ , (A-2-2)

where 22

2 emaB κh= is the effective Bohr radius and 12 mm=γ is a ratio of

effective masses. A trial function for the 1s orbital is expressed by

( ) 2

2

2

2

2_1_1 b

za

orbitalsTrial eba

r+−

πψ , (A-2-3)

and the energy of 1s orbital orbitalsE _1 is given by

( ) ( )rHrE orbitalsTrialorbitalsTrialorbitals _1__1_*

_1 ψψ=

dxdydzebaryxz

eba

bz

abz

a∫∫∫+−+−

∂∂

+∂∂

+∂∂

=

2

2

2

2

2

2

2

2

22

2

2

2

2

2*

2

121 ρρ

πγ

π.

(A-2-4)

orbitalsE _1 is numerically obtained by the lowering the energy through parameters a

and b in Eq. (A-2-4). Before we perform the calculation for Ge, we have checked

the reliability of our calculation using Si ( 2079.0=γ ) as an example. For the 1s

orbital of Si, we have obtained the minimum energy orbitalsE _1 =-1.56524 with

a=0.74426 and b=0.430841. With the relative dielectric constant of Si 12=κ , we

obtain -0.029eV for E1s orbital, which is in complete agreement with the original

calculation of Kohn and Luttinger in Ref. 2. In the same manner, the minimum

energies have been calculated as a function of γ (see Fig. A-2-1). The program

code of calculation for Ge ( 05134.0=γ ) is written in Appendix B.

119

We calculate the energy shift for the case of 2p(m=1) orbital as the same way for the

case of 1s orbital. The wavefunction is

( ) 2

2

2

2

4_)1(2_bz

aorbitalmpTrial e

baxr

+−

= =ρ

πψ . (A-2-5)

The minimum energy 36622.0_)1(2 −== orbitalmpE for Ge ( 0534.0=γ ) has been

obtained with a=1.53483、b=0.619206. The minimum energy orbitalmpE _)1(2 = as a

function of γ is shown in Fig. A-2-2.

-2.5

-2

-1.5

-1

-0.5

0.2 0.4 0.6 0.8 1

Ener

gy [/

E 0]

γ1/3

Fig. A-2-1 The energy of 1s orbital (m=0) vs. γ 1/3 according to the Kohn-Luttinger

method.

120

Therefore, 1,1,222

1,1,2 3 ±± − ψψ rz and ( ) 1,1,222

22

1,1,2 cos31

±±

± ⋅ ψθψ ϕieLr for Ge

( 05134.0=γ ) have been obtained as follows:

1,1,222

1,1,2 3 ±± − ψψ rz

[ ] dxdydzeba

xrzeba

x bz

abz

a∫∫∫+−+−

=

2

2

2

2

2

2

2

2

4

22

*

43

ρρ

ππ

9839.12−= (A-2-6)

( ) 1,1,22

222

1,1,21,1,222

22

1,1,2 cos31

±±

±±±

± ⋅+=⋅ ψψψθψ ϕϕ ii eyxeLr

-0.45

-0.4

-0.35

-0.3

-0.25

-0.2

0 0.2 0.4 0.6 0.8 1

Ener

gy [E

0]

γ1/3

Fig. A-2-2 The energy of the 2p (m=±1) orbital vs. γ 1/3 according to the

Kohn-Luttinger method

121

[ ] dxdydzeba

xyxeba

x bz

abz

a∫∫∫+−+−

+

=

2

2

2

2

2

2

2

2

4

22

*

4

ρρ

ππ

1341.14= (A-2-7)

The program code of the calculation is written in Appendix C.

Finally, we shall incorporate an appropriate effective mass m* and the ionized

impurity concentration NI to obtain realistic values for the energy shift of the 2p±

state for Ge as the following:

( )

⋅+±−

∂∂

⋅⋅⋅=∆ ±±

±±± 1,1,222

22

1,1,222

1,1,222

1,1,2** cos

31

433

21 ψθψψψ ϕi

BAz

I eLrTTrzz

ERyaNE

( )

×+±−×

∂∂

⋅⋅⋅=2*222*** 1341.14

439839.12

21 aTTa

zERyaN BA

zI

∂∂

−⋅⋅⋅= 22*3* 6006.104920.6 BAz

I TTz

ERyaN . (A-2-8)

122

A.3. Calculation based on Faulkner’s wavefunction3

An anisotropic trial function mln ,,ψ is expressed as follows according to Faulkner’s

method

( ) ( ) ( )φθαγβφθϕ

γβψ ,,,, ,

41

,,

41

,,l

mlnmlnmln YrRr ⋅

=

= , (A-3-1)

where α and β are parameters. The normalized radial wavefunctions are:

( ) ( )( )[ ]

( )nrLen

rln

lnn

rR lln

nrl

ln αααα α 22!

!12, 121

21

32

23

,+

−−−×

+−−

= . (A-3-2)

2

22

++= zyxr

γβ

(A-3-3)

where ( )zL kp is the Laguerre polynomial:

( ) ( ) ( )[ ]( ) ( )

sskp z

sskspkpzL

!!!!1

2

+−+

−=∑ (A-3-4)

and ( )φθ ,lmY is a function of the Spherical harmonics. The Hamiltonian matrix is

expressed as:

nlmHmln ′′′

dxdydzzyxrzyx

zyx mlnmln

∂∂

+∂∂

+∂∂

= ′′′′′′∫∫∫ γ

βψγγβψ

γβ ,,2,, ,,2

2

2

2

2

2*

,,

123

( ) ( )( )

++−

∂∂

−−

∂∂

+∂∂

+∂∂

−= ′′′∫∫∫ 2222

2

2

2

2

2

2

2*

,,21,,

zyxzzyxzyxmln

βγβψ

γβ

( )dxdydzzyxmln ,,,,ψ× .

(A-3-5)

For the case of ll =′ , the energy is expressed as:

( ) ( ) ( ) ( ) ( )( )( )

+−

−++−−+′−=′′′

32126121

3111,;,,2,,,,

21

llmlllnlnJllImlnHmln β

( ) ( ) ( ) mmnn lnlnJln

l′′

′+−× δααδ ,;,2 )1(

2

2

, . (A-3-6)

For the case of 2−=′ ll is given by:

( ) ( ) ( ) mmlnlnJllImlnHmln ′−′−−=′′′ δ,;2,,22,,,, 1

( ) ( )( )( )[ ]

( )( )( ) ( ) ( )( )lnlnJ

nl

nl

llmlml

lmm ,;2,2

21

32121

121 2

2

2

2

2212222

−′

′−

−+−−−

−−+ ′ ααδβ

( ) ( )[ ] ( )( ) ( ) ( )( ) ( ),;2,,;2,12,;2,2 01 lnlnDlnlnJlllnlnJll −′+−′−+−′−+− αα .(A-3-7)

For the case of 1,0;2 ≠±=′ jjll is given by:

( ) ( ) ( ) mmlnlnJllImlnHmln ′′′′−=′′′ δ,;,,2,,,, 1 , (A-3-8)

where

124

( ) ( ) ( )( )

Ω−−

ΩΩ=′ ∫

dYYllIl

ml

m

θβγ 2

*

cos11, (A-3-9)

( )( ) ( )( ) ( )( )drrlRrlRlnlnJ lnln ,,,;, ,0 ,0 αα∫

′′ ′=′′ (A-3-10)

( )( ) ( )( ) ( )( )drrlRrlrRlnlnJ lnln ,,,;, ,0 ,1 αα∫

′′ ′=′′ (A-3-11)

( )( ) ( )( ) ( )( )drrlRrlRrlnlnJ lnln ,,,;, ,0 ,22 αα∫

′′ ′=′′ (A-3-12)

( )( ) ( )( ) ( )( )drrlRr

rrlRlnlnJ lnln ,,,;, ,0 ,3 αα∫

′′ ∂∂′=′′ . (A-3-13)

We shall obtain wavefunctions in terms of eigenfunctions composed of energies

Eq. (A-3-6), (A-3-7), and (A-3-8). It can be achieved by minimization of the sum

of the eigenvalues. The following matrix is used to obtain the wavefunctions of

7,6,5,4,3,2,1,1 =±== nml :

±±±±±±±±

±±±±±±±±±±

1,1,71,1,71,1,61,1,71,1,21,1,71,1,71,1,6

1,1,21,1,31,1,21,1,31,1,71,1,21,1,31,1,21,1,21,1,2

HHHH

HHHHH

L

OMM

ML

L

.

Results of our calculation are shown in Table 3-2-3-1. Also, Fig. 3-2-3-2 shows

the γ dependency of 1,1,222

1,1,2 3 ±± − ψψ rz and ( ) 1,1,222

22

1,1,2 cos31

±±

± ⋅ ψθψ ϕieLr

in Eq. (A-1-3), for the case of the 2p± orbital.

From the results of Fig. A-3-2, we obtain for the case of Ge ( 05134.0=γ ),

125

γ 2p± 3p± 4p± 5p± 6p± 7p± α(1) α(3) β

0.001 -0.421482 -0.18733 -0.10537 -0.06744 -0.04683 -0.03441 1.44575 0.5002 0.0552

0.01 -0.399424 -0.17752 -0.09986 -0.06391 -0.04438 -0.03261 1.38524 0.5920 0.1564

0.05134 -0.365698 -0.16253 -0.09142 -0.05851 -0.04063 -0.02985 1.3014 0.7720 0.3134

0.1 -0.34654 -0.15402 -0.08663 -0.05545 -0.0385 -0.02829 1.25229 0.8123 0.4073

0.2079 -0.320453 -0.14242 -0.08011 -0.05127 -0.03561 -0.02616 1.18433 0.8499 0.5499

0.5 -0.28328 -0.1259 -0.07082 -0.04532 -0.03148 -0.02312 1.08709 0.9112 0.7710

0.8 -0.260895 -0.11595 -0.06522 -0.04174 -0.02899 -0.0213 1.03074 0.9910 0.9295

1.0 -0.249929 -0.11108 -0.06248 -0.03999 -0.02777 -0.0204 0.996037 1.0021 1.009

A unit of energy is 22420 2/ κε hem= .

-0.5

-0.4

-0.3

-0.2

-0.1

0

0 0.2 0.4 0.6 0.8 1

2p±

3p±

4p±

5p±

6p±

7p±

Ener

gy [/

E 0]

γ1/3

Table A-3-1: The energies of the impurity levels obtained from the Faulkner’s method.

Fig. A-3-1: The energy of the impurity levels obtained by Faulkner’s method.

126

*1,1,2

221,1,2 9638.123 arz −=− ±± ψψ , (A-3-14)

( ) *1,1,2

222

21,1,2 1181.14cos

31 aeLr i =⋅ ±

±± ψθψ ϕ . (A-3-15)

The program code of this calculation is written in Appendix D.

As a result, the energy shift of the 2p± orbital due to the electric field is given by:

( )

⋅+±−

∂∂

⋅⋅⋅=∆ ±±

±±± 1,1,222

22

1,1,222

1,1,222

1,1,2** cos

31

433

21 ψθψψψ ϕi

BAz

I eLrTTrzz

ERyaNE

( )

×+±−×

∂∂

⋅⋅⋅=2*222*** 1181.14

430638.12

21 aTTa

zERyaN BA

zI

∂∂

−⋅⋅⋅= 22*3* 5886.100319.6 BAz

I TTz

ERyaN (A-3-16)

-20

-10

0

10

20

30

0 0.2 0.4 0.6 0.8 1 1.2

(1)(2)

Ener

gy[/E

0]]

γ1/3

Fig. A-3-2 1,1,222

1,1,2 3 ±± − ψψ rz and ( ) 1,1,222

22

1,1,2 cos31

±±

± ⋅ ψθψ ϕieLr obtained from

the Faulkner’s method. (The effective Bohr radius 1* =a in this calculation.)

127

A.4. Summary of the theoretical models

We have derived the mathematical models for the energy shift of the 2p± orbital

due to the electric field without (Appendix A.1) and with (Appendix A.2 and A.3) an

anisotropy in the wavefunction. The results are summarized as follows:

For the case of an isotropic wavefunction, the energy shift without contribution of

the quadratic Stark effect is given by the first and second terms of Eq. (A-1-1):

∂∂

−⋅⋅⋅=∆ 22*3* 186 BAz

I TTz

ERyaNE . (A-4-1)

For the case of an anisotropic wavefunction, Kohn and Luttinger’s method has lead

to Eq. (A-2-8):

∂∂

−⋅⋅⋅=∆ 22*3* 6006.104920.6 BAz

I TTz

ERyaNE . (A-4-2)

For the case of an anisotropic wavefunction, Faulkner’s method has lead to Eq.

(A-3-16)

∂∂

−⋅⋅⋅=∆ 22*3* 5886.100319.6 BAz

I TTz

ERyaNE . (A-4-3)

Fig. A-4-1 compares directly the difference between Eq. (A-4-1), (A-4-2), and

(A-4-3) as a function of ionized impurity concentration. The calculational results

of Eq. (A-4-2) and (A-4-3) agree very well while that of Eq. (A-4-1) is different, as

128

we have expected.

0

0.2

0.4

0.6

0.8

1

1.2

0 1E+14 2E+14 3E+14

Ionized Impurity Concentration [cm-3]

FWH

M [c

m-1

]

AnisotropicWavefunction Eq. (D-2)

IsotropicWavefunction Eq. (D-1)

AnisotropicWavefunction Eq. (D-3)

Fig. A-4-1 Peak width of 1s-2p± line as a function of ionized impurity concentration

in case of random distribution .

129

A.5. Monte Carlo methods for the linewidth calculations

This section shows how we have calculated the linewidth of the arsenic (As)

absorption from the ground to 2p± excited states assuming either random or

correlated distributions of the ionized impurities. The energy of the 2p± excited

state of the light-absorbing As shifts due to the electric field arising from either

randomly or correlatingly distributed ionized centers. For the case of n-type Ge at

low temperatures, some of the donors lose their bound electrons to accepters and

become positively ionized. Also, acceptors that have received electrons from

donors become negatively charged. Therefore, we take into account the

distribution of light-absorbing neutral donors, positively charged donors, and

negatively charged acceptors in our Monte Carlo calculation. The effect of the

electric field on the 2p± excited state of the neutral donor is to be found for the

calculation of the linewidth.

In order to find ∆E at one neutral impurity center, 50 donors and 30 acceptors

are randomly distributed in the (x,y,z) space of a single unit cell for the Monte Carlo

calculation. We used linear congruential method to obtain random numbers in our

calculation. 30 donors and acceptors are ionized while 20 donors remain

electrically neutral. The positions of i-th ionized donors and accepters are given by

the coordinates ,, ______ idonorionizedidonorionizedidonorionized zyx and ,, ___ iaccepteriaccepteriaccepter zyx ,

respectively. The compensation ratio 0.6 (= 30 acceptors / 50 donors in a unit cell)

reflects our experiment very well. We have varied the number of donors in the cell

from 10 to 800 and repeated the same full-width-at-half-maximum (FWHM)

calculation as shown in Fig. A-5-1. It shows that FWHM saturates for the number

of donors larger than 20. Therefore, our choice of number of donors in the cell, 30,

130

is confirmed to be large enough for the simulation of our experimental results.

The cell in our calculation is a sphere with a radius L = 6.6×10-5 cm, set by the

condition:

3023

4 3 ×=⋅ INLπ . (A-5-1)

We distributed 2×30 ions (30 negatively ionized acceptors and 30 positively ionized

donors) in a unit cell. A neutral donor located closest in position to the center of

the spherical cell is the one whose energy shift of excited state is to be calculated.

Its location is indicated by the coordinate

,, ______ centerdonorneutralcenterdonorneutralcenterdonorneutral zyx . This neutral donor is considered to

be an absorption center. We define the new coordinate (X, Y, Z), whose origin is

set at the center of the absorption center, with the direction of the Z-axis being in the

direction parallel to that of symmetry axis of the 2p± orbital. The transformation

of the (x,y,z) coordinate to the (X,Y,Z) coordinate is performed by the following

relation.

0

20

40

60

80

100

120

140

1 10 100 1000 10000

The number of donors in a cell

FWH

M [c

m-1

]

Fig. A-5-1 FWHM vs. the number of the donors in a unit cell. We found the

unit cell containing 50 donors is enough large for our calculation.

131

−−−

=

centerdonorneutral

centerdonorneutral

centerdonorneutral

zzyyxx

ZYX

__

__

__

. (A-5-2)

The energy shift due to the electric field is obtained only taking into account the

effect of the gradient of the electric field at the absorption center as mentioned in

chapter A-1. The energy shift is numerically calculated according to Faulkner’s

relation [Eq. (A-5-3)]

∂∂

−⋅⋅⋅=∆ 22*3* 5886.100319.6 BAz

I TTz

ERyaNE , (A-5-3)

where

, (A-5-4)

2__

2__

2____ idonorionizedidonorionizedidonorionizedidonorionized ZYXR ++= , (A-5-5)

2__

2__

2____ iacceptorionizediacceptorionizediacceptorionizediacceptorionized ZYXR ++= , (A-5-6)

( )∑ −⋅

=i

iii

iA YX

ReT 22

50ε

−−

−=30

5__

2__

2__

5__

2__

2__

0 i iacceptorionized

iaccepterionizediaccepterionized

idonorionized

idonorionizedidonorionized

RYX

RYXe

ε, (A-5-7)

( )∑ ⋅⋅

=i

iii

iB YX

ReT 5

0

( )∑ −⋅

−=∂∂

iii

i

iz RZR

ez

E 225

0

−−−

−−

=30

5__

2__

2__

2__

5__

2__

2__

2__

0 2

2

i

iacceptorionized

iaccepterionizediaccepterionizediaccepterionized

idonorionized

idonorionizedidonorionizedidonorionized

RYXZ

RYXZ

132

−⋅

−=30

5__

____5

__

____

0

2i iacceptorionized

iaccepterionizediaccepterionized

idonorionized

idonorionizedidonorionized

RYX

RYXe

ε,(A-5-8)

where ε0 is the static dielectric constant and ei is the charge of the i-th ion,

Ri(Xi,Yi,Zi) is the distances between ionized impurities and the absorption center.

By the above-mentioned calculation, one energy shift at one absorption center is

obtained in case of the random distribution.

When we calculate the linewidth for the case of the correlated distribution of

ionized impurities, the psuedoground state of the total Coulombic energy in the unit

cell is obtained by changing the distribution of ionized and neutral impurities. A

pair of one neutral donor and one ionized donor is selected randomly and the change

in the total Coulombic energy of the whole cell is calculated as a result of the

electron exchange within the selected pair.

−+= ∑ ∑∑∑∑∑

−+=+=

na

i

na

i

na

j accepterionizedaccepterionized

na

ij accepterionized

na

i

na

ij donorionized rrreEnergyCoulombicTotal

__1 _1 _0

2 1114

__πε

,

(A-5-9)

where

( ) ( ) ( )2____2

____2

_____ jdonorionizedidonorionizedjdonorionizedidonorionizedjdonorionizedidonorionizeddonorionized zzyyxxr −+−+−= ,

(A-5-10)

accepterionizedr _

( ) ( ) ( )2____2

____2

____ jaccepterionizediaccepterionizedjaccepterionizediaccepterionizedjaccepterionizediaccepterionized zzyyxx −+−+−=

. (A-5-11)

accepterionizeddonorionizedr __ −

( ) ( ) ( )2____2

____2

____ jaccepterionizedidonorionizedjaccepterionizedidonorionizedjaccepterionizedidonorionized zzyyxx −+−+−=

. (A-5-12)

133

We accept a new distribution of the ionized and neutral impurities if the energy

is reduced as a result of the electron exchange within the pair, and reject the new

distribution if the energy is increased. This trial is repeated for 3000 times in order

to obtain the psuedground state of the correlated distribution of impurities. Fig.

A-5-2 shows the change in the total Coulombic energy as a function of the number

of trials. It shows that the psuedground state is obtained for a trial of more than 100

times, i.e., our calculation using 3000 trials is more than sufficient. The program

code for these linewidth calculations in case of random distribution and correlated

distribution is written in Appendix E.

The linewidth for the both cases of the random and correlated distribution have

been obtained by repeating above-mentioned routines for 30,000 times, i.e., Monte

Carlo results shown in Fig. A-5-2 of the manuscript is composed of 30,000 Monte

Carlo data, though we do not show all of them in the plot. Figure A-5-3 shows

distributions of ionized donors, neutral donors, and acceptors in a calculational cell

in case of random distribution and correlated distribution (after we obtained

psuedground state of the total Coulombic energy) when 800 donors and 400

acceptors are randomly distributed in a cell.

134

Fig. A-5-2 The total Coulombic energy of the system vs. the number of the trials

Nd=800,N

a=400

Ionized donor Neutral donor Acceptor

Y Axis

Z A

xis

Nd=800,N

a=400

Ionized donor Neutral donor Acceptor

Y Axis

Z A

xis

Random Distribution Correlated Distribution

Fig. A-5-3 Distributions in case of random and correlated distribution calculated

in a unit cell when 800 donors and 400 acceptors are randomly distributed.

-9.6 106

-9.4 106

-9.2 106

-9 106

-8.8 106

-8.6 106

-8.4 106

1 10 100 1000 104Tota

l Cou

lom

bic

Ener

gy [i

n un

it of

e/

nI2/

3 ]

The Number of The Trials

0

135

References

1 D. M. Larsen, Phys. Rev. B 13, 1681 (1976).

2 Kohn and J. M. Luttinger, Phys. Rev. 98, 915 (1955).

3 R. A. Faulkner, Phys. Rev. 184, 713 (1969).

136

Appendix B: Calculation for energy of 1s orbital in Ge according to

Kohn-Luttinger method

Clear@a, b, γDγ = 0.05134;amin= 0.5;bmin= 0.5;Mimimumvalue= 100000;

sorbital:=1è

π ×a2 × b×

−$ q2a2 + z2

b2

ForAi= 1, i< 200, i++,a= amin+ amin∗HRandom@D − 0.5Lê0.5∗ 0.5í è i;b= bmin+ bmin∗HRandom@D − 0.5Lê0.5∗ 0.5í è i;totalenergy=

NA·

−∞

∞·0

∞ik −2$ q2

a2 + z2b2 ik−b4 q2ik2a2 $ q2

a2 +z2b2 +

è q2 + z2 ik−1+$ q2a2 +

z2b2

yy−

a4z2 è q2 + z2 $ q2a2 +

z2b2 γ +

a2 b2 ik2z2ikè q2 + z2 − a2 $ q2a2 +

z2b2

y + q2è q2 + z2 γyyy ì

ika4 b3 πè q2 + z2 Ib2 q2 + a2z2M$ q2

a2 +z2b2

y×2 π ×q q zE;

If@Mimimumvalue> totalenergy, amin= a, amin= aminDIf@Mimimumvalue> totalenergy, bmin= b, bmin= bminDIf@Mimimumvalue> totalenergy, Mimimumvalue= totalenergy,

Mimimumvalue= MimimumvalueDPrint@i, " ", Mimimumvalue, " ", totalenergy, " ", amin, " ",

bmin, " ", a, " ", bDE

(A programming code for Mathmatica)

137

Appendix C: Calculation for energy of 2p(m=1) orbital in Ge according to

Kohn-Luttinger method

Clear@a, b, γDγ = 0.051340; H∗ γ=m1êm2∗Lamin= 1.5; H∗ initial value of variable coefficient ∗Lbmin= 0.5; H∗ initial value of variable coefficient ∗LMimimumvalue= 1000000;

porbital:=xè

π ×a4 × b1×

−$ x2+y2a2 + z2

b2

H∗ a wavefunction of p−orbital ∗LH∗ finding the minimum eigenvalues of wavefunctions ∗LForAi= 1, i< 200, i++,a= amin+ amin∗HRandom@D − 0.5Lê0.5∗ 0.5í è i;b= bmin+ bmin∗HRandom@D − 0.5Lê0.5∗ 0.5í è i;totalenergy=

NA‡−∞

∞‡−∞

∞‡−∞

∞ikporbital×ik−γ × D@D@porbital, zD, zD− D@D@porbital, xD, xD−

D@D@porbital, yD, yD −2è x2 + y2 +z2

× porbitalyy x y zE;

If@Mimimumvalue> totalenergy, amin= a, amin= aminDIf@Mimimumvalue> totalenergy, bmin= b, bmin= bminDIf@Mimimumvalue> totalenergy, Mimimumvalue= totalenergy,

Mimimumvalue= MimimumvalueDPrint@i, " ", Mimimumvalue, " ", totalenergy, " ", amin," ", bmin, " ", a, " ", bDE

a= amin;b= bmin;NA‡

−∞

∞‡−∞

∞‡−∞

∞Iporbital×I2 z2 −x2 − y2M× porbitalM x y zENA‡

−∞

∞‡−∞

∞‡−∞

∞Iporbital×Ix2 +y2M× porbitalM x y zE

(A programming code for Mathmatica)

138

Appendix D: Calculation for energies of orbitals in Ge according to Faulkner’s

method

Clear@n, l, m, α1, α2, α3, β, γ, p, k, rDγ = 0.05134; H∗ γ=m1êm2∗Lα1min= 1.38524; H∗ initial value of variable coefficient ∗Lα3min= 1.38524; H∗ initial value of variable coefficient ∗Lα5min= 1.38524; H∗ initial value of variable coefficient ∗Lβmin= 0.156499; H∗ initial value of variable coefficient ∗LMimimumvalue= 10000000000;

rnl1@n_D :=2 α132

n2 ×ik Hn− 1− 1L!HHn+ 1L!L3

y0.5×J 2 α1×r

n N×− α1×rn ×lpk1@n− 2, 3, nDH∗ tadial wavefunction for l=1 ∗L

rnl3@n_D :=2 α332

n2 ×ik Hn− 3− 1L!HHn+ 3L!L3

y0.5×J 2 α3×r

n N3×

− α3×rn ×lpk3@n− 4, 7, nDH∗ tadial wavefunction for l=3 ∗Lrnl5@n_D :=

2 α532n2 ×

ik Hn− 5− 1L!HHn+ 5L!L3y0.5

×J 2 α5×rn N5

×− α5×rn ×lpk5@n− 6, 11, nDH∗ tadial wavefunction for l=5 ∗L

lpk1@p_, k_, n_D :=„s=0

p H−1Ls ×HHp+ kL!L2Hp−sL!×Hk+ sL!×s!

×J 2 α1×rn Ns

H∗ Legendre function for l=1 ∗Llpk3@p_, k_, n_D :=„

s=0

p H−1Ls ×HHp+ kL!L2Hp−sL!×Hk+ sL!×s!

×J 2 α3×rn Ns

H∗ Legendre function for l=3 ∗Llpk5@p_, k_, n_D :=„

s=0

p H−1Ls ×HHp+ kL!L2Hp−sL!×Hk+ sL!×s!

×J 2 α5×rn Ns

H∗ Legendre function for l=5 ∗Lylm@l_, m_D := H−1L m+Abs@mD

2 ×$ 2×l+ 14 π

×H1− Abs@mDL!H1+ Abs@mDL!

×

LegendreP@l, Abs@mD, Cos@θDD H∗ spherical harmonics ∗Lil1l2@l1_, l2_, m_D := ·

0

2 π·0

π ylm@l1, mD×ylm@l2, mD$1− I1− γβM×HCos@θDL2

×Sin@θD θ φ

(A programming code for Mathmatica)

139

H∗ R.A.Faulkner' s equation H2.14L ∗Lj011@n1_, n2_D := ‡0

∞rnl1@n1D×rnl1@n2D rH∗ R.A.Faulkner' s equation H2.15L for l=1 and l'=1 ∗Lj013@n1_, n2_D := ‡0

∞rnl1@n1D×rnl3@n2D rH∗ R.A.Faulkner' s equation H2.15L for l=1 and l'=3 ∗Lj015@n1_, n2_D := ‡0

∞rnl1@n1D×rnl5@n2D rH∗ R.A.Faulkner' s equation H2.15L for l=1 and l'=5 ∗Lj031@n1_, n2_D := ‡0

∞rnl3@n1D×rnl1@n2D rH∗ R.A.Faulkner' s equation H2.15L for l=3 and l'=1 ∗Lj033@n1_, n2_D := ‡0

∞rnl3@n1D×rnl3@n2D rH∗ R.A.Faulkner' s equation H2.15L for l=3 and l'=3 ∗Lj035@n1_, n2_D := ‡0

∞rnl3@n1D×rnl5@n2D rH∗ R.A.Faulkner' s equation H2.15L for l=3 and l'=5 ∗Lj051@n1_, n2_D := ‡0

∞rnl5@n1D×rnl1@n2D rH∗ R.A.Faulkner' s equation H2.15L for l=5 and l'=1 ∗Lj053@n1_, n2_D := ‡0

∞rnl5@n1D×rnl3@n2D rH∗ R.A.Faulkner' s equation H2.15L for l=5 and l'=3 ∗Lj055@n1_, n2_D := ‡0

∞rnl5@n1D×rnl5@n2D rH∗ R.A.Faulkner' s equation H2.15L for l=5 and l'=5 ∗Lj111@n1_, n2_D := ‡0

∞r×rnl1@n1D ×rnl1@n2D rH∗ R.A.Faulkner' s equation H2.16L for l=1 and l'=1 ∗Lj113@n1_, n2_D := ‡0

∞r×rnl1@n1D ×rnl3@n2D rH∗ R.A.Faulkner' s equation H2.16L for l=1 and l'=3 ∗Lj115@n1_, n2_D := ‡0

∞r×rnl1@n1D ×rnl5@n2D rH∗ R.A.Faulkner' s equation H2.16L for l=1 and l'=5 ∗Lj131@n1_, n2_D := ‡0

∞r×rnl3@n1D ×rnl1@n2D rH∗ R.A.Faulkner' s equation H2.16L for l=3 and l'=1 ∗Lj133@n1_, n2_D := ‡0

∞r×rnl3@n1D ×rnl3@n2D rH∗ R.A.Faulkner' s equation H2.16L for l=3 and l'=3 ∗Lj135@n1_, n2_D := ‡0

∞r×rnl3@n1D ×rnl5@n2D rH∗ R.A.Faulkner' s equation H2.16L for l=3 and l'=5 ∗Lj151@n1_, n2_D :=‡0

∞r×rnl5@n1D× rnl1@n2D rH∗ R.A.Faulkner' s equation H2.16L for l=5 and l'=1 ∗L

140

j153@n1_, n2_D := ‡0∞r×rnl5@n1D ×rnl3@n2D rH∗ R.A.Faulkner' s equation H2.16L for l=5 and l'=3 ∗L

j155@n1_, n2_D := ‡0∞r×rnl5@n1D ×rnl5@n2D rH∗ R.A.Faulkner' s equation H2.16L for l=5 and l'=5 ∗L

j211@n1_, n2_D := ‡0∞r2 ×rnl1@n1D×rnl1@n2D rH∗ R.A.Faulkner' s equation H2.17L for l=1 and l'=1 ∗L

j213@n1_, n2_D := ‡0∞r2 ×rnl1@n1D×rnl3@n2D rH∗ R.A.Faulkner' s equation H2.17L for l=1 and l'=3 ∗L

j215@n1_, n2_D := ‡0∞r2 ×rnl1@n1D×rnl5@n2D rH∗ R.A.Faulkner' s equation H2.17L for l=1 and l'=5 ∗L

j231@n1_, n2_D := ‡0∞r2 ×rnl3@n1D×rnl1@n2D rH∗ R.A.Faulkner' s equation H2.17L for l=3 and l'=1 ∗L

j233@n1_, n2_D := ‡0∞r2 ×rnl3@n1D×rnl3@n2D rH∗ R.A.Faulkner' s equation H2.17L for l=3 and l'=3 ∗L

j235@n1_, n2_D := ‡0∞r2 ×rnl3@n1D×rnl5@n2D rH∗ R.A.Faulkner' s equation H2.17L for l=3 and l'=5 ∗L

j251@n1_, n2_D := ‡0∞r2 ×rnl5@n1D×rnl1@n2D rH∗ R.A.Faulkner' s equation H2.17L for l=5 and l'=1 ∗L

j253@n1_, n2_D := ‡0∞r2 ×rnl5@n1D×rnl3@n2D rH∗ R.A.Faulkner' s equation H2.17L for l=5 and l'=3 ∗L

j255@n1_, n2_D := ‡0∞r2 ×rnl5@n1D×rnl5@n2D rH∗ R.A.Faulkner' s equation H2.17L for l=5 and l'=5 ∗L

d11@n1_, n2_D := ‡0∞r×rnl1@n1D × D@rnl1@n2D, rD rH∗ R.A.Faulkner' s equation H2.18L for l=1 and l'=1 ∗L

d13@n1_, n2_D := ‡0∞r×rnl1@n1D × D@rnl3@n2D, rD rH∗ R.A.Faulkner' s equation H2.18L for l=1 and l'=3 ∗L

d15@n1_, n2_D := ‡0∞r×rnl1@n1D × D@rnl5@n2D, rD rH∗ R.A.Faulkner' s equation H2.18L for l=1 and l'=5 ∗L

d31@n1_, n2_D := ‡0∞r×rnl3@n1D × D@rnl1@n2D, rD rH∗ R.A.Faulkner' s equation H2.18L for l=3 and l'=1 ∗L

d33@n1_, n2_D := ‡0∞r×rnl3@n1D × D@rnl3@n2D, rD rH∗ R.A.Faulkner' s equation H2.18L for l=3 and l'=3 ∗L

d35@n1_, n2_D :=‡0∞r×rnl3@n1D× D@rnl5@n2D, rD rH∗ R.A.Faulkner' s equation H2.18L for l=3 and l'=5 ∗L

141

d51@n1_, n2_D := ‡0∞r×rnl5@n1D × D@rnl1@n2D, rD rH∗ R.A.Faulkner' s equation H2.18L for l=5 and l'=1 ∗L

d53@n1_, n2_D := ‡0∞r×rnl5@n1D × D@rnl3@n2D, rD rH∗ R.A.Faulkner' s equation H2.18L for l=5 and l'=3 ∗L

d55@n1_, n2_D := ‡0∞r×rnl5@n1D × D@rnl5@n2D, rD rH∗ R.A.Faulkner' s equation H2.18L for l=5 and l'=5 ∗L

hl1l1@n_, m_D :=

ReA−2×il1l2@1, 1, mD×j111@n, nD +ik1− H1− βL×13 ×

ik1+2×1× H1+ 1L − 6× m2H2×1− 1L×H2×1+ 3L yy ×

ik−Hα1L2

n2 + 2×α1×j111@n, nDyEhl1l1n@n1_, n2_, m_D :=

ReA−2×il1l2@1, 1, mD×j111@n1, n2D +ik1− H1− βL×13 ×

ik1+2×1× H1+ 1L − 6× m2H2×1− 1L×H2×1+ 3L yy ×H2×α1×j111@n1, n2DLE

hl3l3@n_, m_D :=

ReA−2×il1l2@3, 3, mD×j133@n, nD +ik1− H1− βL×13 ×

ik1+2×3× H3+ 1L − 6× m2H2×3− 1L×H2×3+ 3L yy ×

ik−Hα3L2

n2 + 2×α3×j133@n, nDyEhl3l3n@n1_, n2_, m_D :=

ReA−2×il1l2@3, 3, mD×j133@n1, n2D +ik1− H1− βL×13 ×

ik1+2×3× H3+ 1L − 6× m2H2×3− 1L×H2×3+ 3L yy ×H2×α3×j133@n1, n2DLE

hl5l5@n_, m_D :=

ReA−2×il1l2@5, 5, mD×j155@n, nD +ik1− H1− βL×13 ×

ik1+2×5× H5+ 1L − 6× m2H2×5− 1L×H2×5+ 3L yy ×

ik−Hα5L2

n2 + 2×α5×j155@n, nDyEhl5l5n@n1_, n2_, m_D :=

ReA−2×il1l2@5, 5, mD×j155@n1, n2D +ik1− H1− βL×13 ×

ik1+2×5× H5+ 1L − 6× m2H2×5− 1L×H2×5+ 3L yy ×H2×α5×j155@n1, n2DLEH∗ R.A.Faulkner' s equationH2.19L for Hl,l'L=H1,1L,H3,3L,and H5,5L ∗L

hl1l3@n1_, n2_, m_D :=

ReA−2 il1l2@1, 3, mD×j113@n1, n2D +H1− βL×1

2×3− 1 ×$ H32 − m2L×HH3− 1L2 − m2LH2×3+ 1L×H2×3− 3L ×ik 12 ×

ik α32n22 +

α12n12

y×j213@n1, n2D− Hα3+ α1L×j113@n1, n2D +

3×H2×3− 1L×j013@n1, n2D + H2×3− 1L×d13@n1, n2DyEhl3l1@n1_, n2_, m_D :=

ReA−2 il1l2@1, 3, mD×j113@n1, n2D + H1− βL×1

2×3− 1 ×$ H32 − m2L×HH3− 1L2 − m2LH2×3+ 1L×H2×3− 3L ×

142

ik 12 ×

ik α12n22 +

α32n12

y×j231@n1, n2D− Hα3+ α1L×j131@n1, n2D + 3×H2×3− 1L×j031@n1, n2D +H2×3−1L ×d31@n1, n2DyEhl3l5@n1_, n2_, m_D :=

ReA−2 il1l2@3, 5, mD×j135@n1, n2D +H1− βL×1

2×5− 1 ×$ H52 − m2L×HH5− 1L2 − m2LH2×5+ 1L×H2×5− 3L ×ik 12 ×

ik α52n22 +

α32n12

y×j235@n1, n2D− Hα5+ α3L×j135@n1, n2D +

5×H2×5− 1L×j035@n1, n2D + H2×5− 1L×d35@n1, n2DyEhl5l3@n1_, n2_, m_D :=

ReA−2 il1l2@5, 3, mD×j153@n1, n2D +H1− βL×1

2×5− 1 ×$ H52 − m2L×HH5− 1L2 − m2LH2×5+ 1L×H2×5− 3L ×ik 12 ×

ik α52n22 +

α32n12

y×j253@n1, n2D− Hα5+ α3L×j153@n1, n2D +

5×H2×5− 1L×j053@n1, n2D + H2×5− 1L×d53@n1, n2DyEH∗ R.A.Faulkner' s equationH2.19L for Hl,l'L=H1,3L,H3,1L,H3,5L,and H5,3L ∗Lhl1l5@n1_, n2_, m_D := Re@−2×il1l2@1, 5, mD×j115@n1, n2DDhl151@n1_, n2_, m_D := Re@−2×il1l2@5, 1, mD×j151@n1, n2DDH∗ R.A.Faulkner' s equationH2.19L for Hl,l'L=H1,5L and H5,1L ∗Ltensol:=88hl1l1@2, 1D, hl1l1n@2, 3, 1D, hl1l1n@2, 4, 1D, hl1l1n@2, 5, 1D, hl1l1n@2, 6, 1D,

hl1l1n@2, 7, 1D<,8hl1l1n@3, 2, 1D, hl1l1@3, 1D, hl1l1n@3, 4, 1D, hl1l1n@3, 5, 1D, hl1l1n@3, 6, 1D,hl1l1n@3, 7, 1D<,8hl1l1n@4, 2, 1D, hl1l1n@4, 3, 1D, hl1l1@4, 1D, hl1l1n@4, 5, 1D, hl1l1n@4, 6, 1D,hl1l1n@4, 7, 1D<,8hl1l1n@5, 2, 1D, hl1l1n@5, 3, 1D, hl1l1n@5, 4, 1D, hl1l1@5, 1D, hl1l1n@5, 6, 1D,hl1l1n@5, 7, 1D<,8hl1l1n@6, 2, 1D, hl1l1n@6, 3, 1D, hl1l1n@6, 4, 1D, hl1l1n@6, 5, 1D,hl1l1@6, 1D, hl1l1n@6, 7, 1D<,8hl1l1n@7, 2, 1D, hl1l1n@7, 3, 1D, hl1l1n@7, 4, 1D, hl1l1n@7, 5, 1D,hl1l1n@7, 6, 1D, hl1l1@7, 1D<<

H∗ finding the minimum eigenvalues of wavefunctions ∗LForAi= 1, i< 200, i++,α1= α1min+ α1min∗HRandom@D − 0.5Lê0.5∗ 0.3í è i;α3= α3min+ α3min∗HRandom@D − 0.5Lê0.5∗ 0.3í è i;

143

α5= α5min+ α5min∗HRandom@D − 0.5Lê0.5∗ 0.3í è i;β = βmin+ βmin∗HRandom@D − 0.5Lê0.5∗ 0.3í è i;

energy= Eigenvalues@tensolD;totalenergy= energy@@1DD+ energy@@2DD + energy@@3DD +energy@@4DD +

energy@@5DD+ energy@@6DD;If@Mimimumvalue> totalenergy, α1min= α1, α1min= α1minDIf@Mimimumvalue> totalenergy, α3min= α3, α3min= α3minDIf@Mimimumvalue> totalenergy, α5min= α5, α5min= α5minDIf@Mimimumvalue> totalenergy, βmin= β, βmin= βminDIf@Mimimumvalue> totalenergy, Mimimumvalue= totalenergy,

Mimimumvalue= MimimumvalueDPrint@i, " ", Mimimumvalue, " ", totalenergy, " ", α1min, " ", α3min," ", α5min, " ", βminDE

Print@energy@@1DD, " ", energy@@2DD, " ", energy@@3DD, " ", energy@@4DD," ", energy@@5DD, " ", energy@@6DDD

α = α1min;β = βmin;

porbital:= $ β

γ4

èα5

8 è

π×è x2 +y2 ×

α $ x2+y2+ βγ

z22

NA‡−∞

∞‡−∞

∞‡−∞

∞Iporbital×I2 z2 −x2 − y2M× porbitalM x y zENA‡

−∞

∞‡−∞

∞‡−∞

∞Iporbital×Ix2 +y2M× porbitalM x y zE

144

Appendix E: Calculation for linewidths of 1s-2p lines in the case of random and

correlated distribution

#include <stdio.h>

#include <stdlib.h>

#include <time.h>

#include <math.h>

main(void)

int change, p, q, number_of_data, number_of_trial,

i, j, m, number_of_accepter, number_of_donor,

randoma, randomb, a[20], b[30];

double ta, tb, field_gradient, random, ionized_impurity_concentration,

distance_ionized_donor, distance_ionized_accepter, ezero, electon, azero,

cmnx, cmny, cmnz, kyori, energyaa,

unit_length, minimum_energy, coulomb_energy, ans_plus, ans_minus,

ionized_donor_x[30], ionized_donor_y[30], ionized_donor_z[30],

ionized_accepter_x[30], ionized_accepter_y[30], ionized_accepter_z[30],

donor_x[50], donor_y[50], donor_z[50],

accepter_x[30], accepter_y[30], accepter_z[30];

ezero = 1.0;

azero = 87.6e-8;

(A programming code for C language)

145

electon = 4.8e-10;

number_of_accepter = 30;

number_of_donor = 50;

ionized_impurity_concentration = 5.0e13;

unit_length = pow(3.0/2.0/3.141592654*number_of_accepter/ionized_impurity_concentration,1.0/3.0);

srand(time(NULL));

printf("number_of_donor = %d number_of_accepter = %d ionized_impurity_concentration = %g azero = %g ¥n",

number_of_donor, number_of_accepter, ionized_impurity_concentration, azero);

/* a routine for obtain 30000 data */

for (number_of_data=0; number_of_data<30000; number_of_data++)

minimum_energy = 1.0e100;

/* making a distribution of donors and acceptors randomly */

i = 0;

while ( i<number_of_donor )

random = rand();

donor_x[i] = random / 32768.0 * 2.0 * unit_length - unit_length;

random = rand();

donor_y[i] = random / 32768.0 * 2.0 * unit_length - unit_length;

random = rand();

donor_z[i] = random / 32768.0 * 2.0 * unit_length - unit_length;

if ( pow(donor_x[i],2.0)+pow(donor_y[i],2.0)+pow(donor_z[i],2.0) <

pow(unit_length,2.0) )

i = i+1 ;

146

i = 0;

while ( i<number_of_accepter )

random = rand();

accepter_x[i] = random / 32768.0 * 2.0 * unit_length - unit_length;

random = rand();

accepter_y[i] = random / 32768.0 * 2.0 * unit_length - unit_length;

random = rand();

accepter_z[i] = random / 32768.0 * 2.0 * unit_length - unit_length;

if ( pow(accepter_x[i],2.0)+pow(accepter_y[i],2.0)+pow(accepter_z[i],2.0) <

pow(unit_length,2.0) )

i = i+1 ;

/* Coulombic energy between acceptors */

energyaa = 0;

for( i=0; i<number_of_accepter; i++)

for( j=0; j<number_of_accepter; j++)

if ( i > j)

energyaa = energyaa +

1.0/pow(pow(accepter_x[i]-accepter_x[j],2.0)+pow(accepter_y[i]-accepter_y[j],2.0)+pow(accepter_z[i]-accepter_z[j],2.0),0.5);

/* decidion of a distribution of ionizd donors */

i=0;

147

while ( i < number_of_donor - number_of_accepter )

randoma = rand() % number_of_donor;

a[i] = randoma;

q=0;

for ( p=0; p<i; p++)

if ( a[i] == a[p]) q = q+1;

if ( q == 0 ) i = i+1;

m = 0;

while ( m < number_of_accepter)

for (i=0; i< number_of_donor ; i++)

p=0;

for (j=0; j<number_of_donor - number_of_accepter; j++)

if ( i == a[j] ) p = p+1;

if (p==0)

b[m] = i;

m++;

/* a routine for making a correlated distribution */

for (number_of_trial=0; number_of_trial<3000; number_of_trial++)

148

randoma = rand() % (number_of_donor - number_of_accepter);

change = a[randoma];

randomb = rand() % number_of_accepter;

a[randoma] = b[randomb];

b[randomb] = change;

if(number_of_trial==0)

coulomb_energy = energyaa;

for( i = 0; i < number_of_accepter; i++)

for( j = 0; j < number_of_accepter; j++)

if ( i < j)

coulomb_energy =

coulomb_energy +

1.0/pow(pow(donor_x[b[i]]-donor_x[b[j]],2.0)+pow(donor_y[b[i]]-donor_y[b[j]],2.0)+pow(donor_z[b[i]]-donor_z[b[j]],2.0),0.

5);

for( i = 0; i < number_of_accepter; i++)

for( j = 0; j < number_of_accepter; j++)

coulomb_energy = coulomb_energy -

1.0/pow(pow(donor_x[b[i]]-accepter_x[j],2.0)+pow(donor_y[b[i]]-accepter_y[j],2.0)+pow(donor_z[b[i]]-accepter_z[j],2.0),0.5

);

149

if(number_of_trial > 0)

coulomb_energy = minimum_energy;

for(j=0 ; j<number_of_accepter ; j++)

if(j!=randomb)

coulomb_energy = coulomb_energy +

1.0/pow(pow(donor_x[b[randomb]]-donor_x[b[j]],2.0)+pow(donor_y[b[randomb]]-donor_y[b[j]],2.0)+pow(donor_z[b[random

b]]-donor_z[b[j]],2.0),0.5) -

1.0/pow(pow(donor_x[a[randoma]]-donor_x[b[j]],2.0)+pow(donor_y[a[randoma]]-donor_y[b[j]],2.0)+pow(donor_z[a[random

a]]-donor_z[b[j]],2.0),0.5);

coulomb_energy = coulomb_energy -

1.0/pow(pow(donor_x[b[randomb]]-accepter_x[j],2.0)+pow(donor_y[b[randomb]]-accepter_y[j],2.0)+pow(donor_z[b[random

b]]-accepter_z[j],2.0),0.5) +

1.0/pow(pow(donor_x[a[randoma]]-accepter_x[j],2.0)+pow(donor_y[a[randoma]]-accepter_y[j],2.0)+pow(donor_z[a[randoma

]]-accepter_z[j],2.0),0.5);

if ( minimum_energy > coulomb_energy )

minimum_energy = coulomb_energy;

else

change = a[randoma];

a[randoma] = b[randomb];

b[randomb] = change;

150

/* close a routine for making a correlated distribution */

/* decision of the neutral impurity which locates center of the unit cell */

kyori = 2*unit_length;

for (i=0; i < number_of_donor - number_of_accepter; i++)

if ( kyori >

pow(pow(donor_x[a[i]],2)+pow(donor_y[a[i]],2)+pow(donor_z[a[i]],2),0.5) )

kyori =

pow(pow(donor_x[a[i]],2)+pow(donor_y[a[i]],2)+pow(donor_z[a[i]],2),0.5);

cmnx = donor_x[a[i]];

cmny = donor_y[a[i]];

cmnz = donor_z[a[i]];

/* calculation of the energy shift */

field_gradient = 0.0;

ta = 0.0;

tb = 0.0;

for (i=0; i < number_of_accepter; i++)

ionized_donor_x[i] = (donor_x[b[i]]-cmnx);

ionized_donor_y[i] = (donor_y[b[i]]-cmny);

ionized_donor_z[i] = (donor_z[b[i]]-cmnz);

ionized_accepter_x[i] = (accepter_x[i]-cmnx);

151

ionized_accepter_y[i] = (accepter_y[i]-cmny);

ionized_accepter_z[i] = (accepter_z[i]-cmnz);

distance_ionized_donor =

pow(ionized_donor_x[i]*ionized_donor_x[i]+ionized_donor_y[i]*ionized_donor_y[i]+ionized_donor_z[i]*ionized_donor_z[i],

0.5);

distance_ionized_accepter =

pow(ionized_accepter_x[i]*ionized_accepter_x[i]+ionized_accepter_y[i]*ionized_accepter_y[i]+ionized_accepter_z[i]*ionized

_accepter_z[i],0.5);

field_gradient = field_gradient +

(1.0/pow(distance_ionized_donor,5.0)*(3.0*pow(ionized_donor_z[i],2.0)-pow(distance_ionized_donor,2.0))-1.0/pow(distance_

ionized_accepter,5.0)*(3.0*pow(ionized_accepter_z[i],2.0)-pow(distance_ionized_accepter,2.0)))/ionized_impurity_concentrat

ion;

ta = ta +

(-1.0/pow(distance_ionized_donor,5.0)*(pow(ionized_donor_x[i],2.0)-pow(ionized_donor_y[i],2.0))+1/pow(distance_ionized_

accepter,5.0)*(pow(ionized_accepter_x[i],2.0)-pow(ionized_accepter_y[i],2.0)))/ionized_impurity_concentration;

tb = tb +

(-2.0/pow(distance_ionized_donor,5.0)*ionized_donor_x[i]*ionized_donor_y[i]+2.0/pow(distance_ionized_accepter,5.0)*ioniz

ed_accepter_x[i]*ionized_accepter_y[i])/ionized_impurity_concentration;

ans_plus = -6.0319*field_gradient+10.6006*pow(pow(ta,2.0)+pow(tb,2.0),0.5);

ans_minus = -6.0319*field_gradient-10.6006*pow(pow(ta,2.0)+pow(tb,2.0),0.5);

printf("%d, %g, %g¥n", number_of_data, ans_plus, ans_minus);

/* close a routine for obtain 30000 data */

return 0 ;

152

Appendix F: Calculation of one-dimensional harmonic linear chain model

Here, we explain one-dimensional linear chain calculation within harmonic

oscillation, for instance, in case of five atoms (Fig. F-1). From K1 to K5 are force

constants between each atom, and from M1 to M5 are masses of each atom in Fig.

F-1. From u1 to u5 are distances from most stable positions of each atom. Then,

we obtained Eq. (F-1).

( ) ( )( ) ( )( ) ( )( ) ( )( ) ( )

+−++−=+−++−=+−++−=+−++−=+−++−=

15245155

54534444

43423333

32312222

21251111

uuKuuKuMuuKuuKuMuuKuuKuMuuKuuKuMuuKuuKuM

&&

&&

&&

&&

&&

, (F-1)

where, ( )ikxtiCu ii −⋅= ωexp since the vibration is supposed to be hamonic. At

the momentum k is zero, in case we obtained by our absorption measurements, we

use ( )tiCu ii ⋅= ωexp in Eq. (F-1). Then, we obtained Eq. (F-2).

( )( )( )( )

( )

−−++=−+−−+=−+−−+=−+−−+=−++−−=−

515451152

5

554543442

4

443432332

3

332321222

2

512212112

1

uKKuKuKuMuKuKKuKuMuKuKKuKuMuKuKKuKuMuKuKuKKuM

ωωωωω

(F-2)

Using matrix, Eq. (F-2) is expressed as Eq. (F-3).

M1 M2 M3 M5M4

K1 K2 K3 K1 K4 K5

Fig. F-1. A illustration of the linear chain model we used in case of five atoms in a cell.

153

+−−−+−

−+−−+−

−−+

=

5

4

3

2

1

1551

5544

4433

3322

1221

55

44

33

22

11

2

0000

0000

00

uuuuu

KKKKKKKK

KKKKKKKK

KKKK

uMuMuMuMuM

ω (F-3)

For easy calculation, Eq. (F-4) is better expression rather than Eq. (F-3).

+⋅

−⋅

−⋅

−+⋅

−⋅

−+⋅

−⋅

−+⋅

−⋅

−⋅

−+

=

55

44

33

22

11

5

15

45

5

15

1

54

5

4

54

34

4

43

4

3

43

23

3

32

3

2

32

12

2

51

1

21

2

1

21

55

44

33

22

11

2

00

00

00

00

00

uMuMuMuMuM

MKK

MMK

MMK

MMK

MKK

MMK

MMK

MKK

MMK

MMK

MKK

MMK

MMK

MMK

MKK

uMuMuMuMuM

ω

(F-4)

For example, we calculate when mass number of silicon atoms is 28 and that of

oxygen is 16. The masses used are

][1064.4 2628 kgM Si

−×= (=M1, M2, M4, M5)

][1066.2 2616 kgM O

−×= (=M3).

Force constants between Si-Si and Si-O is

]/[18.479 mNK OSi =− and

]/[33.113 mNK SiSi =− ,

154

which are obtained by the Raman measurement and absorption measurements of

isotopically controlled Si as mentioned fore part of this chapter. Calculational

frequencies (ω ) are obtained in unit of [s-1]. To obtain these frequencies in unit of

[cm-1], we multiplied 5.3129×10-12, and then, we obtained these eigenvalues,

ω =1151.51, 615.87, 409.70, 343.539, 147.16 [cm-1]

The eigenfunctions (that mean square of mass times distance from stable position of

atom) for each eigenvalue are as follows,

1 2 3 4 5

1 2 3 4 5 1 2 3 4 5

1 2 3 4 5

1 2 3 4 5

ω =1151.51cm-1 ω =615.87 cm-1

ω =409.70 cm-1 ω =343.538 cm-1

ω =147.16 cm-1

Position

Position Position

Position

Position

Fig. F-2 The dispersion patterns for each eigenvalue in case of 5 atoms (one

oxygen and four silicon atoms) in a unit cell.

155

As you can see, the vibration is strongly localized when eigenvalue is ω =1151.51

[cm-1]. The next step, we did same kind of calculation with 201 atoms (one oxygen

located at the center of the unit cell and 200 silicon atoms around oxygen atom) and

obtained eigenvalues in Fig. F-3. Two higher frequencies obtained in Fig. F-3

indicate the vibration due to A1g and A2u modes from the dispersion patterns in Fig.

F-4 (ω =617cm-1) and F-4 (ω =1151cm-1). Fig. F-3 means density of states of

atomic vibrations in unit cell. The reason why there is continual density of state

under 500 cm-1 is that we used mono force constant between silicon atoms in order

to reduce parameters in our calculation models. We confirmed this effect on LVM

frequencies by comparison with the model with two force constants between silicon

atoms.

0

5

10

15

20

25

60 200 340 480 620 760 900 1040 1180

Cou

nt o

f dat

a

Wavenumber [cm-1]

Fig. F-3 The distribution of eigenvalues obtained by the harmonic linear chain

model with 201 atoms in unit cell. Two higher frequencies at about 617 and 1151

cm-1 indicate LVMs of oxygen in silicon crystal, since we find strong localization

at oxygen atom in two cases as shown in Fig. F-4 and F-5.

156

Fig. F-5. The dispersion pattern in case of ω =617cm-1. The vibrations are

strongly localized at impurity oxygen atoms (located at the center of the unit cell).

This dispersion pattern means LVM of A2u mode.

Fig. F-4 The dispersion pattern in case of ω =1151cm-1. Oxygen atom

(located at the center of the unit cell ) does not strongly vibrates, but vibrations

are localized around impurity oxygen atoms. This dispersion pattern means LVM

of A1g mode (see Fig. 4-1-2).

Position

Position

157

Appendix G: Calculation for vibration energies of oxygen in silicon crystal with

a liner chain model of 20 atoms.

K=113.33064;

k=479.18;

M1=4.64951*10^-26; M2=4.64951*10^-26; M3=4.64951*10^-26; M4=4.64951*10^-26; M5=4.64951*10^-26;

M6=4.64951*10^-26; M7=4.64951*10^-26; M8=4.64951*10^-26;

M9=4.64951*10^-26; M10=2.65686*10^-26; M11=4.64951*10^-26; M12=4.64951*10^-26;

M13=4.64951*10^-26; M14=4.64951*10^-26; M15=4.64951*10^-26; M16=4.64951*10^-26;

M17=4.64951*10^-26; M18=4.64951*10^-26; M19=4.64951*10^-26; M20=4.64951*10^-26;

tensol:=Eigensystem[

2K/Sqrt[M1]/Sqrt[M1], -K/Sqrt[M1]/Sqrt[M2], 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 2K/Sqrt[M20]/Sqrt[M20],

-K/Sqrt[M2]/Sqrt[M1], 2K/Sqrt[M2]/Sqrt[M2], -K/Sqrt[M2]/Sqrt[M3], 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0,

0, -K/Sqrt[M3]/Sqrt[M2], 2K/Sqrt[M3]/Sqrt[M3], -K/Sqrt[M3]/Sqrt[M4], 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0,

0, 0, -K/Sqrt[M4]/Sqrt[M3], 2K/Sqrt[M4]/Sqrt[M4], -K/Sqrt[M4]/Sqrt[M5], 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0,

0, 0, 0, -K/Sqrt[M5]/Sqrt[M4], 2K/Sqrt[M5]/Sqrt[M5], -K/Sqrt[M5]/Sqrt[M6], 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0,

0, 0, 0, 0, -K/Sqrt[M6]/Sqrt[M5], 2K/Sqrt[M6]/Sqrt[M6], -K/Sqrt[M6]/Sqrt[M7], 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0,

0, 0, 0, 0, 0, -K/Sqrt[M7]/Sqrt[M6], 2K/Sqrt[M7]/Sqrt[M7], -K/Sqrt[M7]/Sqrt[M8], 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0,

0, 0, 0, 0, 0, 0, -K/Sqrt[M8]/Sqrt[M7], 2K/Sqrt[M8]/Sqrt[M8], -K/Sqrt[M8]/Sqrt[M9], 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0,

0, 0, 0, 0, 0, 0, 0, -K/Sqrt[M9]/Sqrt[M8], (K+k)/Sqrt[M9]/Sqrt[M9],-k/Sqrt[M9]/Sqrt[M10], 0, 0, 0, 0, 0, 0, 0, 0, 0, 0,

0, 0, 0, 0, 0, 0, 0, 0, -k/Sqrt[M10]/Sqrt[M9], 2k/Sqrt[M10]/Sqrt[M10], -k/Sqrt[M10]/Sqrt[M11], 0, 0, 0, 0, 0, 0, 0, 0, 0,

0, 0, 0, 0, 0, 0, 0, 0, 0, -k/Sqrt[M11]/Sqrt[M10], (k+K)/Sqrt[M11]/Sqrt[M11], -K/Sqrt[M11]/Sqrt[M12], 0, 0, 0, 0, 0, 0, 0, 0,

0, 0, 0, 0, 0, 0, 0, 0, 0, 0, -K/Sqrt[M12]/Sqrt[M11], 2K/Sqrt[M12]/Sqrt[M12], -K/Sqrt[M12]/Sqrt[M13], 0, 0, 0, 0, 0, 0, 0,

0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, -K/Sqrt[M13]/Sqrt[M12], 2K/Sqrt[M13]/Sqrt[M13], -K/Sqrt[M13]/Sqrt[M14], 0, 0, 0, 0, 0, 0,

0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, -K/Sqrt[M14]/Sqrt[M13], 2K/Sqrt[M14]/Sqrt[M14], -K/Sqrt[M14]/Sqrt[M15], 0, 0, 0, 0, 0,

(A programming code for Mathmatica)

158

0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, -K/Sqrt[M15]/Sqrt[M14], 2K/Sqrt[M15]/Sqrt[M15], -K/Sqrt[M15]/Sqrt[M16], 0, 0, 0, 0,

0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, -K/Sqrt[M16]/Sqrt[M15], 2K/Sqrt[M16]/Sqrt[M16], -K/Sqrt[M16]/Sqrt[M17], 0, 0, 0,

0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, -K/Sqrt[M17]/Sqrt[M16], 2K/Sqrt[M17]/Sqrt[M17], -K/Sqrt[M17]/Sqrt[M18], 0, 0,

0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, -K/Sqrt[M18]/Sqrt[M17], 2K/Sqrt[M18]/Sqrt[M18], -K/Sqrt[M18]/Sqrt[M19], 0,

0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, -K/Sqrt[M19]/Sqrt[M18], 2K/Sqrt[M19]/Sqrt[M19], -K/Sqrt[M19]/Sqrt[M20],

2K/Sqrt[M1]/Sqrt[M1], 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, -K/Sqrt[M20]/Sqrt[M19], 2K/Sqrt[M20]/Sqrt[M20]]

wavenumber=Sqrt[tensol[[1,1]]]*5.3129*10^-12,Sqrt[tensol[[1,2]]]*5.3129*10^-12,Sqrt[tensol[[1,3]]]*5.3129*10^-12,Sqrt[t

ensol[[1,4]]]*5.3129*10^-12,Sqrt[tensol[[1,5]]]*5.3129*10^-12,Sqrt[tensol[[1,6]]]*5.3129*10^-12,Sqrt[tensol[[1,7]]]*5.3129*

10^-12,Sqrt[tensol[[1,8]]]*5.3129*10^-12,Sqrt[tensol[[1,9]]]*5.3129*10^-12,Sqrt[tensol[[1,10]]]*5.3129*10^-12,Sqrt[tensol[[

1,11]]]*5.3129*10^-12,Sqrt[tensol[[1,12]]]*5.3129*10^-12,Sqrt[tensol[[1,13]]]*5.3129*10^-12,Sqrt[tensol[[1,14]]]*5.3129*1

0^-12,Sqrt[tensol[[1,15]]]*5.3129*10^-12,Sqrt[tensol[[1,16]]]*5.3129*10^-12,Sqrt[tensol[[1,17]]]*5.3129*10^-12,Sqrt[tensol[

[1,18]]]*5.3129*10^-12,Sqrt[tensol[[1,19]]]*5.3129*10^-12,Sqrt[tensol[[1,20]]]*5.3129*10^-12

159

Appendix H: Calculation for vibration energy of oxygen doped silicon crystal

with a three-dimensional nine-atom molecule model

We explain a three-dimensional calculation of LVM assuming a molecule

shown in Fig. H-1. We label these atoms from 1 to 9 in order to explain our

calculation easily. The atoms numbered 1 to 6 are 2nd nearest-neighboring Si atoms

in Fig. H-1. The atoms named as 7 and 8 are 1st nearest-neighboring Si atoms, and

the atom named as 9 is an interstitial O atom. The force constant between Si atoms

is labeled K, and between Si and O atoms is k. In order to simplify the calculation,

the interstitial O atom and its first nearest Si atoms vibrate only along 〈111〉

direction. Under this assumption, we can obtain the three-dimensional vibrations

of each atom by two-dimensional calculations.

Fig. H-1. Interstitial Oxygen (red one) and Silicon atoms (gray ones). Second

nearest Si atoms are labeled as 1 to 6. First nearest Si atoms are 7 and 8.

Interstitial O atom is 9.

1 2 3

4 5

6

7

8

9

160

At first, we calculate the vibrations of the 2nd nearest-neighboring Si atoms (the

atoms labeled from 1 to 6). The following explanation is for the atom labeled 1.

The others are calculated by the same way. The distance between 1st

nearest-neighboring Si atom and 2nd nearest-neighboring Si atom, l1, is obtained by

following relation:

( ) ( )210

271

21 rrzzhl ++−+= , (H-1)

where, h, z1, z7, r0, and r1 are expressed in Fig. H-2. The higher order values in Eq.

(H-1) are neglected and we obtain the increase of the distance as

−++=− 1sin2cos21

0

71

0

1001 θθ

lzz

lrlll . (H-2)

After using first order approximation of the Taylor expansion to Eq. (H-2), the

distance is

( ) θθ sincos 71101 zzrll −+=− . (H-3)

θ

l0

h

z7

z1 r1

r0

2nd nearest-neighboring Si atom labeled “1”

1st nearest-neighboring Si atom labeled “7”

Fig. H-2. Symbols used in our calculation.

161

Now we obtain two motion equations that are perpendicular and parallel to 〈111〉

direction of Si crystal as follows:

( ) ( ) θθθ

θθθ

cossinsin

cossincos

12

7111

217111

rzzKzm

rzzKrm

+−−=

+−−=

&&

&&. (H-4)

We assume a harmonic vibration of each atom,

( )( )( )tiZz

tiZztiRr

ωωω

expexpexp

77

11

11

===

(H-5)

Then, Eq. (H-5) is expressed as

( ) ( ) θθθω

θθθω

cossinsin

cossincos

12

7112

1

21711

21

RZZKZm

RZZKRm

+−=

+−= (H-6)

The atoms labeled 7, 8 and 9 are also expressed as

(H-7)

Namely, the calculation we should solve is obtained as following from Eq. (H-6) and

(H-7),

( ) ( ) ( )( ) ( ) ( )( )9879

29

6542

83218982

8

3212

73217972

7

2

sincossin3

sincossin3

ZZZkZm

RRRKZZZZCZZkZm

RRRKZZZZCZZkZm

−−−=

++−−++−+=

++−−++−−−=

ω

θθθω

θθθω

162

where,

θ

θ

θθ

23

22

1

sin

cossincos

KC

KC

KC

=

=

=

.

The eigenvalue of this tensor mean the squared of the vibration energies. The

vibrational modes are realized by the eigenfunctions of this tensor. In this tensor,

masses of Si and O atoms are determined for each case we want and θ=0.34 [rad].

The force constants between Si atoms (K) and Si and O atoms (k) were determined

by the comparison between the calculational results and experimentally obtained

data for 28Si-16O-28Si and 29Si-16O-29Si cases and the values of them are 113.33 and

472.79 [N/m], respectively. The program code written with Mathmatica and the

precise calculational results are the following:

=

+−−−−−−

−+

−−−−−−

9

8

7

6

6

5

5

4

4

3

3

2

2

1

1

2

9

8

7

6

6

5

5

4

4

3

3

2

2

1

1

999

88

3

8

3

8

1

8

3

8

1

8

3

8

1

77

2

7

3

7

1

7

3

7

1

7

3

7

1

6

3

6

3

6

1

6

1

6

1

6

2

1

3

5

3

5

1

5

1

5

1

5

2

4

3

4

3

4

1

4

1

4

1

4

2

3

3

3

3

3

1

3

1

3

1

3

2

2

3

2

3

2

1

2

1

2

1

2

2

1

3

1

3

1

1

1

1

1

1

1

2

2000000000000

30000000

0300000

000000000000

000000000000

000000000000

000000000000

000000000000

000000000000

000000000000

000000000000

000000000000

000000000000

000000000000

000000000000

Z

Z

Z

Z

R

Z

R

Z

R

Z

R

Z

R

Z

R

Z

Z

Z

Z

R

Z

R

Z

R

Z

R

Z

R

Z

R

mk

mk

mk

mk

mkC

mC

mC

mC

mC

mC

mC

mk

mkC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

mC

ω

163

OldK= 113.33;Oldkk= 679.18;θ = 0.3374;M= 1.6605402×10−27;Ans1= 1000;Ans2= 1000;Sub1= 1000000000;Sub2= 30000;

ForAi= 1, i< 1000, i++,S= 1;K= OldK+ HRandom@D − 0.5L∗OldKêSqrt@iD;k= Oldkk+ HRandom@D − 0.5L∗OldkkêSqrt@iD;c1=

1è 2KCos@θD Sin@θD;

c2=1è 2

KCos@θD Cos@θD;

c3=1è 2

KSin@θD Sin@θD;

m1= 28 M;m2= 28 M;m3= 28 M;m4= 28 M;m5= 28 M;m6= 28 M;m7= 28 M;m8= 28 M;m9= 16 M;wavenumber1= 1151.5;tensol1= Eigensystem@88c2ê m1, c1ê m1, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, −c1ê m1, 0, 0<,8c1ê m1, c3ê m1, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, −c3ê m1, 0, 0<,80, 0, c2ê m2, c1ê m2, 0, 0, 0, 0, 0, 0, 0, 0, −c1ê m2, 0, 0<,80, 0, c1ê m2, c3ê m2, 0, 0, 0, 0, 0, 0, 0, 0, −c3ê m2, 0, 0<,80, 0, 0, 0, c2ê m3, c1ê m3, 0, 0, 0, 0, 0, 0, −c1ê m3, 0, 0<,80, 0, 0, 0, c1ê m3, c3ê m3, 0, 0, 0, 0, 0, 0, −c3ê m3, 0, 0<,80, 0, 0, 0, 0, 0, c2ê m4, c1ê m4, 0, 0, 0, 0, 0, −c1ê m4, 0<,80, 0, 0, 0, 0, 0, c1ê m4, c3ê m4, 0, 0, 0, 0, 0, −c3ê m4, 0<,80, 0, 0, 0, 0, 0, 0, 0, c2ê m5, c1ê m5, 0, 0, 0, −c1ê m5, 0<,80, 0, 0, 0, 0, 0, 0, 0, c1ê m5, c3ê m5, 0, 0, 0, −c3ê m5, 0<,80, 0, 0, 0, 0, 0, 0, 0, 0, 0, c2ê m6, c1ê m6, 0, −c1ê m6, 0<,80, 0, 0, 0, 0, 0, 0, 0, 0, 0, c1ê m6, c3ê m6, 0, −c3ê m6, 0<,8−c1ê m7, −c3ê m7, −c1ê m7, −c3ê m7, −c1ê m7, −c3ê m7, 0,

0, 0, 0, 0, 0, 3c3ê m7+kê m7, 0, −kê m7<,80, 0, 0, 0, 0, 0, −c1ê m8, −c3ê m8, −c1ê m8, −c3ê m8,−c1ê m8, −c3ê m8, 0, 3c3ê m8+ kê m8, kê m8<,

164

80, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, −kê m9, kê m9, 2kê m9<<D;

mm1= 29 M;mm2= 29 M;mm3= 29 M;mm4= 29 M;mm5= 29 M;mm6= 29 M;mm7= 29 M;mm8= 29 M;mm9= 16 M;

wavenumber2= 1147.5;tensol2= Eigensystem@88c2ê mm1, c1ê mm1, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, −c1ê mm1, 0, 0<,8c1ê mm1, c3ê mm1, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, −c3ê mm1, 0, 0<,80, 0, c2ê mm2, c1ê mm2, 0, 0, 0, 0, 0, 0, 0, 0, −c1ê mm2, 0, 0<,80, 0, c1ê mm2, c3ê mm2, 0, 0, 0, 0, 0, 0, 0, 0, −c3ê mm2, 0, 0<,80, 0, 0, 0, c2ê mm3, c1ê mm3, 0, 0, 0, 0, 0, 0, −c1ê mm3, 0, 0<,80, 0, 0, 0, c1ê mm3, c3ê mm3, 0, 0, 0, 0, 0, 0, −c3ê mm3, 0, 0<,80, 0, 0, 0, 0, 0, c2ê mm4, c1ê mm4, 0, 0, 0, 0, 0, −c1ê mm4, 0<,80, 0, 0, 0, 0, 0, c1ê mm4, c3ê mm4, 0, 0, 0, 0, 0, −c3ê mm4, 0<,80, 0, 0, 0, 0, 0, 0, 0, c2ê mm5, c1ê mm5, 0, 0, 0, −c1ê mm5, 0<,80, 0, 0, 0, 0, 0, 0, 0, c1ê mm5, c3ê mm5, 0, 0, 0, −c3ê mm5, 0<,80, 0, 0, 0, 0, 0, 0, 0, 0, 0, c2ê mm6, c1ê mm6, 0, −c1ê mm6, 0<,80, 0, 0, 0, 0, 0, 0, 0, 0, 0, c1ê mm6, c1ê mm6, 0, −c3ê mm6, 0<,8−c1ê mm7, −c3ê mm7, −c1ê mm7, −c3ê mm7, −c1ê mm7, −c3ê mm7,

0, 0, 0, 0, 0, 0, 3c3ê mm7+ kê mm7, 0, −kê mm7<,80, 0, 0, 0, 0, 0, −c1ê mm8, −c3ê mm8, −c1ê mm8, −c3ê mm8,−c1ê mm8, −c3ê mm8, 0, 3c3ê mm8+ kê mm8, kê mm8<,80, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, 0, −kê mm9, kê mm9, 2kê mm9<<D;

SS1= Sub1;SS2= Sub2;

If@Abs@Hwavenumber1− Sqrt@tensol1@@1, 1DDD∗ 5.3129∗10^−12LD < SS1 &&Abs@Hwavenumber2− Sqrt@tensol2@@1, 1DDD∗ 5.3129∗10^−12LD < SS2,

Ans1= Sqrt@tensol1@@1, 1DDD∗5.3129∗10^−12D;

If@Abs@Hwavenumber1− Sqrt@tensol1@@1, 1DDD∗ 5.3129∗10^−12LD < SS1 &&Abs@Hwavenumber2− Sqrt@tensol2@@1, 1DDD∗ 5.3129∗10^−12LD < SS2,

Ans2= Sqrt@tensol2@@1, 1DDD∗5.3129∗10^−12D;

If@Abs@Hwavenumber1− Sqrt@tensol1@@1, 1DDD∗ 5.3129∗10^−12LD < SS1 &&Abs@Hwavenumber2− Sqrt@tensol2@@1, 1DDD∗ 5.3129∗10^−12LD < SS2,

Sub1= Abs@Hwavenumber1− Sqrt@tensol1@@1, 1DDD∗ 5.3129∗10^−12LDD;

165

If@Abs@Hwavenumber1− Sqrt@tensol1@@1, 1DDD∗ 5.3129∗10^−12LD < SS1 &&Abs@Hwavenumber2− Sqrt@tensol2@@1, 1DDD∗ 5.3129∗10^−12LD < SS2,

Sub2= Abs@Hwavenumber2− Sqrt@tensol2@@1, 1DDD∗ 5.3129∗10^−12LDD;

If@Abs@Hwavenumber1− Sqrt@tensol1@@1, 1DDD∗ 5.3129∗10^−12LD < SS1 &&Abs@Hwavenumber2− Sqrt@tensol2@@1, 1DDD∗ 5.3129∗10^−12LD < SS2,

Print@i && Ans1− 15 && Ans2− 15 && K && kDD;

IfASqrtAHwavenumber1− Sqrt@tensol1@@1, 1DDD∗ 5.3129∗10^−12L2E < SS1 &&SqrtAHwavenumber2− Sqrt@tensol2@@1, 1DDD∗ 5.3129∗10^−12L2E < SS2,

OldK= KE ;IfASqrtAHwavenumber1− Sqrt@tensol1@@1, 1DDD∗ 5.3129∗10^−12L2E < SS1 &&

SqrtAHwavenumber2− Sqrt@tensol2@@1, 1DDD∗ 5.3129∗10^−12L2E < SS2,Oldkk= kE;E

Print@K && kD

166

Acknowledgements

Without the guidance, encouragement and generous support of Professor

Kohei M. Itoh, none of the present work would have been possible. I am grateful

to have the continuous benefit of his expertise in the physics and materials science of

semiconductors.

Many professors have substantially aided my research. I am grateful to

Professor Jun-ichiro Muto for his expert advices on electric materials in general.

Novel germanium crystals we investigated were provided by Professor Eugen E.

Haller. He also taught me the importance of studying defects in semiconductors.

I extend my thanks to Dr. Hiroshi Yamada-Kaneta, without his expertise in oxygen

in silicon, the study of the local vibrational modes of oxygen in silicon crystal

described in this thesis would not habe been completed. Professor Hyunjung Kim

taught me how to push the limit of Fourier transform spectroscopy of

semiconductors. I would like to thank Professor Eiji Ohta and Professor Shuichi

Nose for their critical reading of this thesis. Toshimichi Yamada and Eisuke Abe

have also contributed to improve my English writing.