NONCHROMATED OXIDE COATING

FOR ALUMINUM

US. Patent 6,432,225. Aug. 13,2002 M.Z? Schriever, assignor to The Boeing Co., Seattle, Wash. An improved process that is com- mercially practical for forming an oxide film cobalt conversion coat- ing exhibiting corrosion resist- ance and paint adhesion proper- ties on a substrate, where the substrate is aluminum or alu- minum alloy.

ELECTROPLATING A DUAL-SIDE

SUBSTRATE

US. Patent 6,432,291. Aug. 13,2002 I? Vivares, et al., assignors to Advanced Micro Devices, Inc., Sunnyvale, Calif A method of electroplating a dual- sided workpiece, which comprises providing an electrically insula- tive substrate including first and

second of opposed major surfaces, with respective first and second pluralities of electrically conduc- tive features formed on the major surfaces; providing an electrical contractor in simultaneous touch- ing electrical contract with each feature of one the pluralities of electrically conductive features; and contacting with at least one electroplating bath while apply- ing an electrical potential and simultaneously electroplating at least one layer on the pluralities of electrically conductive features.

ELECTRODEPOSITING METAL ON

PARTICLES

US. Patent 6,432,229 Aug. 13,2002 M. Pinto, et al., assignors to Metallic Power, Znc,, Carlsbad, Calif: A method of electrodepositing metal on electrically conductive particles comprising allowing a

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force to cause a bed of electrically conductive particles to flow across a particles contacting surface of a cathode support spaced from an anode, where the force has a direction and the particle contact- ing surface is at an angle between 15 and 85” relative to the direc- tion of the force; avoiding sus- tained contact between the parti- cles and the anode without use separator; and providing an elec- trical current between the bed of particles and the anode, thereby electrodepositing metal on the electrically conductive particles as they flow across the particle contacting surface of the cathode.

PROCESS FOR COPPER

PLATING A WAFER

US. Patent 6,432,293. Aug. 13,2002 S. Ogata and K. Ueno, assignors to Permelec Electrode Ltd., Kanagawa,

76 Metal Finishing