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ESH ITWG
April 7, 2006 Vaals, Netherlands
Summary of Environmental, Health and Safety Chapter
ITRS 2006
04/10/23 20:39 File name and path go here. 2
Agenda
• 2005 (Seoul) Summary
• Technical Work– Cross-thrust Analysis– 2006 Overall ESH needs– Objectives and work assignments for July meeting
• Have Fun at the ITRS
• IRC Issues?
04/10/23 20:39 File name and path go here. 3
2006 ITRS Update ESH Focus Issues-1• Chemicals – MATERIAL CHOICE
• Material in devices vs precursor/starting materials• ALD/MOCVD/PVD • Process By-Products (e.g. – RuO4, Al(CH3)3 )• Pb-Free Roadmap
• Materials for Manufacturing Only• Non-aqueous immersion fluids• PFOS moving to PFAS/PFOA
• ERM• Proposed ERM Table would map ERD’s material classes• ESH assess for future potential risks (of each class)• Nano Infrastructure Dialog (e.g. – metrology)
• Energy• EUV (Lithography)• Energy Goals (Interconnect)• Who Owns Setting/Driving Energy Reduction Needs• Sleep State Technology (Factory Integration)• Green Fab Definition (Factory Integration)
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2006 ITRS Update ESH Focus Issues-2
• Recycle Systems
• Chemical• Definition of Recycle, Reuse, Reclaim • Conflict with technology performance• Energy penalty due to dilute chemicals
• Water • Conflict with technology performance
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ESH Chapter ITWG AttendeesESIA – Shane Harte (ESIA)
- Francesca Illuzzi (ST Microelectronics)
- Harry Thewissen (Philips)
JSIA –- Shigehito Ibuka (TEL)
- Takayuki Oogoshi (NEC Electronics)
- Tetsu Tomine (Seiko-Epson)
SIA – Jim Jewett (Intel)
- Walter Worth (Sematech)