Upload
paula-simmons
View
221
Download
1
Tags:
Embed Size (px)
Citation preview
Facilities and Programfor Coating 8” Plates
Jeffrey Elam, Anil Mane, Qing Peng, Joseph LiberaArgonne National Laboratory
LAPD Collaboration MeetingJune 10, 2010
Argonne Flow-Tube ALD Coating Systems
2
2”
36”
33 mmdisc
siliconwitness
siliconwitness
• ~1% thickness increased at the “Si block” location• Thickness increased as high as 30% after MCP locations
Thickness across the reactor Chemistry #1
3
4
Thickness across the reactor Chemistry #2
• No thickness deviations near MCP• Uniformity and ease of scaling in ALD are process-dependent
Large Substrate Reactor Integrates with existing ALD reactors Accommodates up to 12”x18” parts
5
12”
18”
ALD Indium-Tin Oxide in Large Substrate Reactor
0
0.5
1
1.5
2
0 5 10 15 20
-50+5
Rel
ativ
e T
hick
ness
Axial Distance (Inches)
Distance fromCenter (in)
0
0.5
1
1.5
2
-6 -4 -2 0 2 4 6R
elat
ive
Thi
ckn
ess
Distance From Center (Inches)
Very poor uniformity over large areas (± 45%) In2O3-catalyzed decomposition of O3
6
Cyclopentadienyl Indium /Ozone (O3) → In2O3
Improved ALD ITO Process
Standard Deviation=3.1%
No ozone Excellent uniformity over large areas Process matters a lot
7
Large substrate testing: ALD Chemistry #2
8
Not optimized (same conditions as in flow tube)
Beneq TFS500
9
Arrived: 5/18/10 Commissioning : 6/28/10
500 m
m
Large Area Reaction Chamber for Beneq
10
10 trays
Tray top Tray Bottom
11.25”
17.5”
Two 8”x8” Tiles in Beneq Tray
11
2 Tiles/Tray x 10 Trays = 20 Tiles per batch
Tray top Tray Bottom
8”x8” tile
8”x8” tile
Challenge: ALD in High Aspect Ratios
Aspect ratio of capillary arrays does not limit the exposure times
12
For LAPD tiles, aspect ratio L/D = 60
Diethyl zinc (DEZ)/H2O → ZnO
Challenge: ALD on High Surface Areas
13
Surface Area (SA) ~ 4αγAB (Jason McPhate, 12/09)• α = open area ratio = 0.65• γ = aspect ratio L/d = 60• AB = area of plate top sans pores ,
• 33 mm disc = 8.4 cm2
• 8”x8” tile = 412 cm2
Surface Areas of Capillary Glass:
Empty large area reactor: 0.3 m2
1x 8”x8” tile: 6.4 m2
Empty Beneq: 5.8 m2
20x 8”x8” tile: 129 m2
Surface Areas: Empty ALD tube reactor: 600 cm2 1x 33 mm disc: 1310 cm2
Coating High Surface Areas: Silica Gel Powder 100 micron particles, 30 nm pores Surface area = 100 m2/g, L/D ~ 2000 Powder bed fixture for ~1 g support
Self-limiting growth on planar and porous surfaces
Exposures increased by x100
0
0.5
1
1.5
0 0.05 0.1 0.15 0.2
Al 2
O3 G
row
th R
ate
(Å/C
ycle
)
TMA Exposure (Torr s)
Silica GelPlanar Surface
0
1
2
3
0 5 10 15 20 25
Wei
ght
Gai
n (
%)
TMA Exposure (Torr s)
Coating High Surface Areas: Silica Gel Powder trimethyl aluminum (TMA)/H2O → Al2O3
Layer-by-Layer Al2O3 ALD
16
0
10
20
30
40
50
60
70
0 5 10 15 20A
l 2O3
Load
ing
(Wt %
)
Al2O3 ALD Cycles
0
1000
2000
3000
4000
0 1000 2000 3000
Thi
ckn
ess
(Å
)
Al2O3 ALD Cycles
Layer-by-layer growth on planar and porous surfaces
Silica GelPlanar Surface
Outline of Research Plan
Single 8”x8” glass squares in large area reactor– Thickness uniformity with ellipsometry– Resistance uniformity with four-point probe– Composition with X-ray fluorescence (XRF) - destructive
Single 8”x8” capillary plate in large area reactor– Apply patterned electrodes (United Lens?)
• Measure resistance uniformity– composition (XRF), thickness (SEM) – destructive– MCP testing?
Multiple 8”x8” glass squares in Beneq– Thickness uniformity with ellipsometry– Resistance uniformity with four-point probe– Composition with X-ray fluorescence (XRF) - destructive
Multiple 8”x8” capillary plates in Beneq– Apply patterned electrodes
• Measure resistance uniformity– composition (XRF), thickness (SEM) – destructive– MCP testing?
17