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Functional interfaces with conjugated organic materials:energy level tuning and "soft" metallic contacts
Norbert Koch
Emmy Noether-Nachwuchsgruppe"Supramolecular Systems"
Institut für PhysikHumboldt-Universität zu Berlin
Outline:
1. Interfaces in "organic electronics": conjugated molecules (semiconductors) and electrodes (conductors)
2. Optimizing energy levels at organic/metal interfaces with strong electron acceptors/donors- work function increase with a molecular acceptor- work function reduction with a molecular donor
3. "Soft" metallic contacts to individual C60 molecules
Conclusion
Organic Light Emitting Diodes
(OLED)
Organic Field-Effect Transistors(OFET)
Organic Photovoltaic Cells(OPVC)Organic Memory Cells
+ (-)
- (+)
NC
COM
E
E
Source Drain
Gate
Gate insulator
Organic channel VDS
VG
1"Organic Electronics" Devices
CN
CN
F F
FF
NC
NC
S
S
S
S
S
S
���
����
��
TkATj
B
barrierinjectionchargeexp2
cathodeanode organic
material
EF
hn
EF
Evac
U- ��
�
VB (HOMO)
CB (LUMO)
SE
U - (1 - 2)
Why are interfaces important:example: Organic Light Emitting Devices
OLED - How do electrodes and organics interact?
- Physico-chemical properties?
- Energy level alignment at interfaces?
- Influence on charge injection?
- Morphological/structural aspects of interface-formation?
Molecular Electronics":Interface-Only Devices!
1
h�
Injection-limited current:
Estimating charge injection barriers: The Schottky-Mott Limit
1
IE
�h,1
EF
2
IE
�h,2EF
Evac Evac
�h,2 = �h,1 – (2 – 1)
if Schottky-Mott limit (vacuum level alignment) applies: charge injection barriers � can be predicted from materials parameters:
• metal work function • organic material ionization energy IE• organic material electron affinity EA
i substrate work functionIE ionization energy�h,i hole injection barrierEF Fermi levelEvac vacuum level
1
EAIE
e
h
������
EA
�e
Ionization Energy, Work Function & Charge Injection Barriersfrom photoelectron spectroscopy
ionization energy = h� – (Ekin,HOMO – Ekin,SECO)work function = h� – (Ekin,EF – Ekin,SECO)
hole injection barrier = Ekin,EF – Ekin,HOMO
core-levels: type of interaction
Secondary electron cutoff (SECO)
HOMO or EF
Ekin
Cou
nts
EE
kin,HOMO
kin,EF
Ekin,SECO
1
measurements:in ultrahigh vacuum(p < 10-9 mbar)
sample preparation:- molecular layers evaporated
(stepwise) in situ
- polymers spin coatedex situ
Substrate
Organic
sample
spectrometer
e-
h�
Example for physisorptive organic/metal interface:pentacene on Au(111)
3 2 1 0
(2)
(1)
MT(Å)
0
110
50
16
84
2
�e= 45°
inte
nsity
(arb
. uni
ts)
binding energy (eV)
Estimated from Au (5.40 eV) and IEPEN (5.1 eV):
�est = IEPEN- Au = - 0.3 eV
Measured: �exp = 0.6 eV
PEN �PEN= 0.60 eVID = 0.95 eV (change of )
Au=5.50
�vac,PEN=0.95
0.60
PEN=4.55
Evac
EF
(1)
Koch, Vollmer, Duhm, Sakamoto, Suzuki, Adv. Mater. 19 (2007) 112
1
Invalidity of Schottky-Mott model for organic/metal interfaces:Interface Dipoles
Schottky-Mott Limit
i substrate work function IE ionization energy � hole injection barrierEF Fermi levelEvac vacuum level Ishii, Sugiyama, Ito, Seki, Adv. Mater. 11 (1999) 605
Koch, ChemPhysChem 8 (2007) 1438
1
Interface Dipole (ID or �vac):• charge transfer• bond formation• metal electron "push-back"
IDEAIDIE
e
h
��������
2
2a � Organic/metal interface energy level tuning
2b � Bonding of an acceptor molecule on a metal
Systematic tuning of energy levels
metal surface potential changes as (linear) function of acceptor coverage due to metal�adsorbate charge transfer (CT). CT creates localized dipoles ��
Helmholtz-Equation:
���0
eN��
mechanism works in general:
predictable tuning of HIB for any subsequent organic layer
by up to 1.4 eVKoch, Duhm, Rabe, Vollmer, Johnson, Phys. Rev. Lett. 95 (2005) 237601
+ + +N �1
HIB reduction and increase small
+ + + + + +µN �2HIB reduction and increase large
+ + +µN ��1
HIB reduction and increase small
+ + + + + +N ��2
HIB reduction and increase large
holeinjection
barrierheight
HIBmax
ca. 1 ML
acceptor coverage
0 ML
HIBmin
O
O
F
F
F
F F
F
F
FCNNC
NC CN
CN
CN
F F
FF
NC
NC
F4TCNQtetrafluoro-tetracyano-quinodimethane
TCAQ FAQ
+ + + + + ++ + + + + +
organic semiconductor
2
for � ... effective diel. const.equiv. to Topping-model
Molecular energy levels after charge transfer:simple model of integer charge transfer and molecular ions
bind
ing
e ner
gy
E =0vac
N nP nBP
EF
(HOMO)
(LUMO)
N neutral molecule insulating/semiconductingnP "negative Polaron" (anion) metallicnBP "negative Bipolaron" (dianion) insulating/semiconducting
(LUMO+1)
2
Energy Levels and of F4TCNQ on Cu(111):Simple charge transfer?
-10 -8 -6 -4 -2 0
0 5 10 15
4.85.05.25.45.65.8UPS
DFT
EF
inte
nsity
(arb
. uni
ts)
binding energy (eV)����e
V�
���Å)
Comparison UPS and Density Functional Theory (DFT) *
LUMO of F4TCNQ becomes filled
located below EF: non-metallic
work function increases:
Cu(111): 5.0 eVF4TCNQ/Cu: 5.6 eV
Estimation of �: 2 electrons transferred from Cu to F4TCNQ2.5 Å F4TCNQ-Cu(111) bonding distance
� � should be + 5 eV ! (experiment: + 0.6 eV !)
2 CN
CN
F F
FF
NC
NC
* Zojer & Brédas groups, TU-Graz/GA-Tech
Detailed mechanism of metal -increase:F4TCNQ on Cu(111)
CN
CN
F F
FF
NC
NC
xz
y
x
3.6 (3.3)2.1 (2.7)0.0 (0.0)
X-ray standing waves (XSW) Density functional theory (DFT)*
Bonding distances from Cu:
Theory Experiment
F: 3.6 Å F: 3.3 ÅN: 2.1 Å N: 2.7 Å
F4TCNQ conformation is changed due to adsorption on Cu:
• quinoid (bulk) to aromatic (adsorbed) � CT• bulk F4TCNQ: planar
F4TCNQ on Cu(111): non-planar� non-planarity induces dipole that decreases !* Zojer & Brédas groups, TU-Graz/GA-Tech
2
Bonding mechanism and bi-directional charge transfer
H-9 L
Metal � Molecule charge transfer:
LUMO (�-level) filled with 1.8 e
Molecule � Metal charge transfer:
H-9 etc. (�-levels) depleted of e
net CT: 0.6 e transferred to F4TCNQ
Including all effects: � due to net charge transfer � due to bent molecular conformation
total work function increase from theory: 0.7 eV experiment: 0.6 eV
Romaner, Heimel, Brédas, Gerlach, Schreiber, Zegenhagen, Duhm, Koch, Zojer, Phys. Rev. Lett. 99 (2007) 256801
Orbital occupation analysis
2
Gold work function reduction by 2.2 eV with an air-stable molecular donor layer
8 9 10 11 12
e
d
c
b
a
�!
4.10 eV3.30 eV
4.20 eV
3.30 eV
5.50 eV
inte
nsity
(arb
. uni
ts)
kinetic energy (eV)
N
N
methyl viologen (MV0)1,1'-dimethyl-1H,1'H-[4,4']bipyridinylidene
pristine Au
1 ML MV0/Au
electron injection barriers lowered by:0.8 eV for Alq30.7 eV for C60
2
Bröker, Blum, Frisch, Vollmer, Hofmann, Rieger, Müllen, Rabe, Zojer, Koch, Appl. Phys. Lett. 93 (2008) 243303
3 Organic Electronics � Molecular Electronics
How to make "good metallic" contacts to individual molecules ?
challenges in molecular electronics:
� lateral separation of individual molecules(reduce lateral cross-talk)
� metallic contact changes molecular electronic properties(molecule changes/loses its function)
Example: C60 on Ag(111)
scanning tunneling microscopy (STM)
UPS (density of valence states)
close packed C60 monolayer
lattice constant � molecular diameter � 1 nm
� electronic cross-talk between neighboringmolecules
"bulk" C60: large energy gap(no DOVS close to EF)
monolayer C60: gap-state near EF� not a "semiconductor"
3
Designed molecular acceptor to pre-pattern Ag(111)
N
N
N
N
N
NCN
CN
CNNC
NC
NC
hexa-azatriphenylene-hexanitrile (HATCN)
STM:
monolayer HACTN/Ag(111)
honeycomb structure w/ hole
lattice constant � 2 nm
UPS (density of valence states)
HATCN / Ag(111) is metallic
partially filled LUMO cuts EFand extends into vacuum side
3
calculated electron density distribution @ EF
"Soft metallic" contacts: C60 on HATCN/Ag(111)
STM:
lattice constant � 2 nm
C60 in hexagonal lattice
individual C60 molecules(reduced cross-talk)
UPS (density of valence states)
Using "soft molecular metal" as structural template, i.e., HATCN/Ag(111):
� metallic contact to individual C60 molecules
� function ("semiconductor") preserved
� at room temperatureC60 on HATCN / Ag(111) has bulk electronic structure
Glowatzki, Bröker, Blum, Hofmann, Rabe, Müllen, Zojer, Koch, Nano Lett. 8 (2008) 3825
3
Conclusions
� organic/metal electrodes:
rather complex multiple mechanisms; simple models do not apply.• metal electron "push-back"• charge transfer• bond formation
- model with reliable predictive character still missing (for adsorption on "clean" metals)
+ injection barrier tuning with acceptors/donors: concept transfer from UHV to even air feasible
Using "soft molecular metal" as structural template:
� metallic contact to individual C60 molecule
� function ("semiconductor") preserved
� at room temperature
Acknowledgements
HU-BerlinGeorg HeimelJürgen P. Rabe
Financial Support:- Sfb 448 (DFG) - Emmy Noether Program (DFG)- SPP 1355 (DFG)- H. C. Starck GmbH- EC (STREP "ICONTROL")
BESSYAntje Vollmer
Supramolecular SystemsRalf-Peter BlumBenjamin BrökerSteffen Duhm (now Chiba U)Johannes FrischFatemeh GhaniHendrik GlowatzkiSven KäbischIngo SalzmannRaphael SchlesingerRasmus TalvisteJörn-Oliver VogelShuwen YuJian Zhang
TU-Graz
Lorenz RomanerEgbert Zojer
Georgia-TechJean-Luc Brédas
HasylabRobert L. Johnson
H. C. StarckAndreas Elschner
U TübingenAlexander GerlachFrank Schreiber
ESRFJörg Zegenhagen
MPI-Polymer Res.Ralph RiegerKlaus Müllen