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Lecture on Integrated Circuits (ICs)
History• 19th Century - Solid-State Rectifiers
• 1907 - Application of Crystal Detector in Radio Sets
• 1947 - BJT Constructed by Bardeen and Brattain
• 1959 – Integrated Circuit Constructed by Kilby
• Complexity grows by Moore’s Law
In 1965, Gordon Moore predicted that the number of transistors that can be integrated on a die would double every 18 to 14 months .
Moore’s Law in Microprocessors
40048008
80808085 8086
286386
486Pentium® proc
P6
0.001
0.01
0.1
1
10
100
1000
1970 1980 1990 2000 2010
Tra
nsi
stor
s (M
T)
2X growth in 1.96 years!
64
256
1,000
4,000
16,000
64,000
256,000
1,000,000
4,000,000
16,000,000
64,000,000
10
100
1000
10000
100000
1000000
10000000
100000000
1980 1983 1986 1989 1992 1995 1998 2001 2004 2007 2010
Year
Kbit
capa
city
/chi
p
DRAM Chip Capacity
1.6-2.4 m
1.0-1.2 m
0.7-0.8 m
0.5-0.6 m
0.35-0.4 m
0.18-0.25 m
0.13 m
0.1 m
0.07 m
human memory
encyclopedia
book
page
4X growth every 3 years!
Resolution of Features of ICs
2.0
1.0
0.5
0.1
0.25
Chip technology described by the dimensions of line width and typical transistor size. Today, the chip resolution is around 50 nano meters, or 0.05 micron.
IC Design and Manufacturing Process
• Process Auto Process Auto • Lithography Lithography • Etch/Doping Etch/Doping • Diffusion Diffusion • Deposition Deposition
Back-End ManufacturingBack-End Manufacturing Front-End Manufacturing Front-End Manufacturing
Circuit Design Circuit Design by Toolsby Tools
Mask DesignMask Design
• Bonding Bonding • Packaging Packaging • Test equipment Test equipment
Intellectual Intellectual PropertiesProperties
WafersWafersPackagesPackages
IC Design Tasks
Physical ImplementationPhysical Implementation
Design PlanningDesign Planning
ExtractionExtraction
Physical VerificationPhysical Verification
Mask Synthesis / OPCMask Synthesis / OPC
Lan
guag
esL
angu
ages
Ass
erti
ons
and
Tes
tben
ches
Ass
erti
ons
and
Tes
tben
ches
VerificationVerification
Architecture DesignArchitecture Design
Mixed Signal / AnalogMixed Signal / AnalogV
erif
icat
ion
IP
Ver
ific
atio
n I
P
Des
ign
Dat
abas
eD
esig
n D
atab
ase
Tim
ing
and
Sig
nal
In
tegr
ity
Tim
ing
and
Sig
nal
In
tegr
ity T
est
Tes
t
Pow
erP
ower
Ph
ysic
alP
hys
ical SynthesisSynthesis
IPIP
Silicon Crystal – Better than Gold
• Quartz, or Silica, consists of Silicon Dioxide• Sand contains many tiny grains of quartz• Silicon can be artificially produced by combining
silica and carbon in electric furnace• Practical integrated circuits can only be fabricated
from single-crystal material
Crystal Growth
• Solid seed crystal is rotated and slowly extracted from a pool of molten Si
• Requires careful control to give crystals desired purity and dimensions
Ingot
Getting Wafers from Ingot• Sliced by diamond-tipped saw into thin wafers
• Etch wafers in chemical to remove any unwanted
• Smooth surface
Photolithography
Photolithography is a technique that is used to define the shape of micro-machined structures on a wafer.
Lithography Machine
• Make “mask” defining electrical circuitry.• Coat wafer with “photoresist” (sensitive to UV light) where the mask is not present.
UV light
reduction lens
Wafer
Start
Stop
• Thick ( 1µm) oxides are used as insulation
Oxidation of Silicon (SiO2)
• Etching: Process where unwanted areas of films are removed by either dissolving them in a wet chemical solution. Wanted areas are protected by resist.
• Doping: Process where certain material is implanted into substrate.
Clean Room• First used for surgery room to avoid bacteria
contamination
• Adopted in semiconductor industry in 1950• Smaller device needs higher grade clean room• Less particle, more expensive to build
– Class 10: less than 10 particles with diameter larger than 0.5 m per cubic foot
– Class 1: less than 1 such particles per cubic foot.– 0.18 m device require higher than Class 1 grade clean room.
Effect of Particles
Particle on Mask
Film
Substrate
Cleanroom Structure
Process Area
Equipment Area
Class 1000Equipment Area
Class 1000
Raised Floor with Grid Panels
Return Air
HEPA Filter
Fans
Pump, RF and etc.
Process Tool
Process Tool
Makeup Air Makeup Air
Class 1
Wafer with Circuit Fabricated
Bonding Pad Configurations
Peripheral Bonding Pads
Area Array Bonding Pads
Pads Range from 125 m x 125 m down to 25 m x 25 m
Package Types
Single In Line Package (SIP)
Small Outline Transistor (SOY)
Quad Flat Pack a(DIP)
Zig Zag In Line Package (ZIP)
Dual In Line Package (DIP)
Pin Grid Array (PGA)
Ball Grid Array (BGA)
Ball Grid Array Solder
Gold Wire Bonding
Assembled IC
Ball Grid Array (BGA) Package
Using ICs on Circuit Board
Surface mount
Tombstone
Dead-bug
Via hole mount
Wave Soldering
IC PCB
What’s Next?
Who Work in IC Industry?• Mechanical engineers• Chemical engineers• Electrical engineers• Systems engineers• Civil engineers• Physicists• Chemists• Material Scientists• Mathematicians• Well, lawyers, finance majors, etc. too.
Good Luck and God Bless!!