Microwave discharge produced plasma for EUV light source ―Load to Commercial EUV Source－ Keita Sugimoto 1 , Saya Tashima 1 , Masami Ohnishi 1 , Waheed Hugrass 2 ,Hodaka Osawa 1 , 1 Kansai University, Osaka, Japan, 2 University of Tasmania, Launceston, Tasmania, Australia Abstract Conceptual drawing of multi-EUV sources A new EUV light source has been developed for the lithographic application. The source consists of the microwave oscillator, the wave guide, the tuner, the resonant cavity and the capillary tube. The compact size and the high efficiency realize the distinguished EUV source with a law cost. The EUV power of 250W or more, however, is required for the lithography. The high demand can be resolved by using the multi-sources, e.g. combining multiple sources. When one module emits 25W EUV power, the integrated source of ten modules produces 250W EUV power, keeping the etendue less than the restricted values. MDPP facility Auto Tuner Stab Tuner Wave guide Cavity Magnetic field coil Zr filter Xe gas supply Reflection meter Vacuum pump Optical system Cross-section view Composed Etendue: Single Etendue× / IF EUV light Mirror MDPP Vacuum vessel upper MDPP Vacuum pump Vacuum vessel 0.30 0.25 0.20 0.15 0.10 0.05 0.00 C.E. [%] 8 6 4 2 0 Gas Pressure [Pa] 1.0 0.8 0.6 0.4 0.2 0.0 EUV [W/2str] 8 6 4 2 0 Gas Pressure [Pa] 1mm Present Experimental Result The EUV output is 0.7W@2πsr for 250W input power. The CE achieved 0.3%. Experimental facility ・CW/pulse operation giving a high duty. ・High overall efficiency. EUV power / Electric power >0.1% ・Compact size affordable for multi- source structure. ・Cheaper cost because of simple composition. (Oscillator + resonance cavity) Estimated EUV power ・The increase of the microwave power affords to operate at the higher gas pressure. ・The CE may be improved over 0.5% at IF. ・The 5kW microwave produces 25W EUV. ・Ten multiple sources achieves 250W EUV power. 2014 Oct EUV power CE 0.7W@250W(2πsr ) 0.3% 2015 Jan 6W@2kW(2πsr ) 0.3% 2015 July 25W@5kW(2πsr) 0.5% 250W@50kW(IF),ten modules 0.5% 2016 Jan Conclusions ・Microwave Discharge Plasma Production has the features of no debris production, high efficiency operation(CW), and ・Multiple source structure will 250W EUV light source in 2016. Contact to [email protected] -0.2 -0.1 0.0 0.1 0.2 0.5 0.4 0.3 0.2 0.1 0.0 X [m] Y [m] Stab Tuner Microwave Permanent magnet Plasma in quartz Tube Turbo molecular pump The cylindrical cavity mode is TM010 and TE111. cheaper construction cost. Time schedule for development Advantages of MDPP

Microwave discharge produced plasma for EUV light sourceeuvlsymposium.lbl.gov/pdf/2014/c7ad90a8b1bc4d2e... · 2015. 11. 24. · Microwave discharge produced plasma for EUV light source

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Microwave discharge produced plasma for EUV light source ―Load to Commercial EUV Source－

Keita Sugimoto1, Saya Tashima1, Masami Ohnishi1, Waheed Hugrass2,Hodaka Osawa1, 1Kansai University, Osaka, Japan, 2University of Tasmania, Launceston, Tasmania, Australia

Abstract

Conceptual drawing of multi-EUV sources

A new EUV light source has been developed for the lithographic application. The source consists of the microwave oscillator, the wave guide, the tuner, the resonant cavity and the capillary tube. The compact size and the high efficiency realize the distinguished EUV source with a law cost. The EUV power of 250W or more, however, is required for the lithography. The high demand can be resolved by using the multi-sources, e.g. combining multiple sources. When one module emits 25W EUV power, the integrated source of ten modules produces 250W EUV power, keeping the etendue less than the restricted values.

MDPP facility

Auto Tuner

Stab Tuner Wave guide

Cavity

Magnetic field coil Zr filter

Xe gas supply

Reflection meter

Vacuum pump

Optical system

Cross-section view

Composed Etendue:

Single Etendue× 𝟒/𝒄𝒐𝒔𝜽

𝜃

IF

EUV light Mirror

MDPP

Vacuum vessel

upper

MDPP

Vacuum pump

Vacuum vessel

0.30

0.25

0.20

0.15

0.10

0.05

0.00

C.E

. [%

]

86420

Gas Pressure [Pa]

1.0

0.8

0.6

0.4

0.2

0.0

EU

V [

W/2

str]

86420

Gas Pressure [Pa]

1mm

Present Experimental Result

The EUV output is 0.7W@2πsr for 250W input power. The CE achieved 0.3%.

Experimental facility

・CW/pulse operation giving a high duty. ・High overall efficiency. EUV power / Electric power >0.1% ・Compact size affordable for multi-source structure. ・Cheaper cost because of simple composition. (Oscillator + resonance cavity)

Estimated EUV power

・The increase of the microwave power affords to operate at the higher gas pressure. ・The CE may be improved over 0.5% at IF. ・The 5kW microwave produces 25W EUV. ・Ten multiple sources achieves 250W EUV power.

2014 Oct

EUV power

CE

0.7W@250W(2πsr ) 0.3%

2015 Jan

6W@2kW(2πsr ) 0.3%

2015 July

25W@5kW(2πsr) 0.5%

250W@50kW(IF),ten modules 0.5%

2016 Jan

Conclusions ・Microwave Discharge Plasma Production has the features of no debris production, high efficiency operation(CW), and ・Multiple source structure will 250W EUV light source in 2016.

Contact to [email protected]

-0.2

-0.1

0.0

0.1

0.2

0.50.40.30.20.10.0

X [m]

Y [

m]

Stab Tuner

Microwave Permanent magnet

Plasma in

quartz Tube Turbo molecular pump

The cylindrical cavity mode is TM010 and TE111.

cheaper construction cost.

Time schedule for development

Advantages of MDPP