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www.elsevier.com/locate/tsf
Thin Solid Films 492
Molecular dynamics study on size-dependent elastic properties of
silicon nanocantilevers
S.H. Park a,*, J.S. Kim a, J.H. Park a, J.S. Lee b, Y.K. Choi c, O.M. Kwon d
aDepartment of Mechanical and System Design Engineering, Hongik University, Seoul, 121-791 KoreabSchool of Mechanical and Aerospace Engineering, Seoul National University, Seoul, 151-742 Korea
cSchool of Mechanical Engineering, Chung-Ang University, Seoul, 156-756 KoreadSchool of Mechanical Engineering, Korea University, Seoul, 136-701 Korea
Received 27 May 2004; received in revised form 13 May 2005; accepted 22 June 2005
Available online 28 July 2005
Abstract
The motion of nanoscale structures made of pure crystalline silicon with different lattice conditions is simulated in vacuum by applying
the molecular dynamics technique with the use of the Tersoff potential. Elastic moduli for various sized specimens are obtained by simulating
flexural and longitudinal vibrations as well as simple tension tests. Compared with the bulk silicon, the elastic modulus decreases
monotonically by as much as 40% as the thickness of the specimen decreases, and the presence of voids in the specimen further decreases the
modulus by a significant amount. Estimation of thermal fluctuations and feasibility study of nanoscale cantilevers as molecular mass sensors
demonstrate that the continuum-theory-based analysis can still be used on nanoscale structures provided the dependence of the elastic
constants on dimensional scaling is accounted for.
D 2005 Elsevier B.V. All rights reserved.
PACS: 68.60.B; 62.20.F; 71.15.D
Keywords: Elastic properties; Nanostructures; Sensors; Silicon
1. Introduction
Nanoscale materials and structures have recently
gained considerable interest as sensors and devices. In
particular, the widespread availability of micro- and
nanoscale structures such as atomic force microscopes
has resulted in renewed interest in cantilever systems as
chemical, physical and biological sensors [1–3]. Apart
from small size, a number of unique properties arise from
relatively high surface area in nanoscale structures. For
accurate sensing, it is crucial to be able to evaluate the
elastic properties at different dimensional scales. The
present study investigates the feasibility of simulations
based on molecular modeling for evaluating the elastic
properties of pure crystalline silicon structures with
nanoscale dimensions.
0040-6090/$ - see front matter D 2005 Elsevier B.V. All rights reserved.
doi:10.1016/j.tsf.2005.06.056
* Corresponding author. Tel.: +82 2 320 1632; fax: +82 2 322 7003.
E-mail address: [email protected] (S.H. Park).
A number of efforts to evaluate the elastic properties
using molecular dynamics (MD) approach have been
reported. One approach employs a simple tension test to
statically determine the elastic properties of single-crystal
metals and semiconductors [4,5]. Another approach is to use
structural resonant responses. Experimental as well as
theoretical investigations of the dynamic behavior of ultra-
thin micro- and nano-structures have been carried out.
Studies have reported on the use of resonance variation in
detecting the presence of external force or mass [6,7], and a
significant size effect on the elastic modulus has been
reported [8,9]. Of particular interest in nanoscale structures
has been predicting the effect of thermal noise on the
cantilever flexural response [10–12].
In the present work, both the static extension and
resonant frequency responses are employed to determine
the elastic modulus of nanoscale structures by constructing
molecular simulation models. The sensitivity of the elastic
modulus on the number of voids is also investigated. Where
(2005) 285 – 289
Table 1
The Tersoff parameters for silicon
Parameters Tersoff (Si)
Aij 1830.8 eV
Bij 471.18 eV
k ij 0.24799 nm�1
�1
S.H. Park et al. / Thin Solid Films 492 (2005) 285–289286
possible, the simulation results are verified by comparing
with theoretical calculations based on the continuum model.
The elastic constants obtained are then applied to the
analysis of thermal fluctuations, and the applicability of
nanoscale structures as molecular mass sensors is also
demonstrated.
l ij 0.17322 nmv ij 1.0
b ij 0.0000010999
n 0.78734
ci 100390
di 16.217
hi �0.59826
Rij 0.27 nm
Sij 0.30 nm
2. Molecular dynamics simulation
A classical MD simulation model for cantilever struc-
tures made of crystalline silicon is shown in Fig. 1. The
diamond structure of silicon can be constructed with the
help of the Tersoff three-body potential [13,14] that
incorporates the cut-off function into Morse potential for
two-body system and modifies the attractive term to account
for three-body interactions. The parameter values in the
Tersoff potential function for silicon are given in Table 1,
where subscript ij denotes neighboring silicon atoms i and j.
Atomic motion can be obtained from the Newton’s
equations of motion through a numerical solution that uses
the Gear Predictor–Corrector algorithm [15] with a time
step of 2 fs. The average temperature of the structure is
maintained at 300 K by the momentum scaling method. To
ensure consistency, the following procedure is applied for
all simulation runs: (i) placement of atoms in the cantilever,
based on the diamond lattice structure, (ii) equilibration of
the crystalline silicon at 300 K for a sufficient period (105
time steps), (iii) estimation of the properties at the same
temperature by processing data for time steps ranging from
2�105 to 5�105.
The elastic properties can be obtained by static simu-
lation runs in which an external tensile force is imposed on
the atoms at the end regions of cantilevers in the axial, i.e.,
z-direction and relative elongation in the same direction is
estimated. During tensile simulations the periodic boundary
conditions are applied in the x- (i.e., the width) direction and
the calculation domains in the y- and z- (i.e., the thickness
and length) directions are maintained at three times the sizes
of the cantilever in the respective directions. Each of the
Fig. 1. Molecular models for (a) static and (b) dynamic estimations of the
elastic modulus of crystalline silicon nanocantilevers.
lattice directions is aligned with the z-axis. The elastic
modulus can be obtained by applying a generalized Hooke’s
law of the form r =EVe where r, EVand e denote the stress,
elastic modulus for the periodic boundary condition in the x-
direction, and strain, respectively. The elastic modulus EVobtained in this manner can be expected to be greater than
the Young’s modulus EV, which denotes the elastic modulus
for the free boundary conditions (under the normal stress of
1 atm to be exact) in both the x- and y- (i.e., the width and
height) directions. For cubic structures such as silicon, there
exist three independent stiffness coefficients and EV(or EVforthat matter) can be calculated from those three stiffness
coefficients [16]. The following expressions can be derived
for EV in <100>, <110> and <111> crystallographic
directions, respectively:
E V<100>
¼ C11 1� C12
C11
�� 2#"
ð1Þ
E V<110>
¼ 1
2C11 þ C12 þ 2C44 � 2
C212
C11
��ð2Þ
E V<111>
¼ 1
3C11 þ 2C12 þ 4C44ð Þ
� 2
9
C11 þ 2C12 � 2C44ð Þ2
C11 þ C12 þ 2C44
ð3Þ
From the published data on the bulk stiffness coefficients
using the Tersoff potential [13], EVfor the bulk silicon have
been calculated to be 107.3, 142.3, 179.3 GPa in <100>,
<110> and <111> crystallographic directions, respectively.
Using equations similar to (1)–(3), the corresponding E
have been calculated to be 94.3, 142.3, 171.3 GPa,
respectively.
3. Results and discussion
As shown in Fig. 1(a), the elastic modulus can be
calculated from a simple tension via a generalized Hook’s
0 1 2 3 4 5 6 710-8
10-7
10-6
10-5
10-4
5th
4th3rd
2nd
x1011
0 1 2 3 4 5 6 7x1011
1st mode
MA
GN
ITU
DE
FREQUENCY [Hz]
(a)
10-9
10-8
10-7
10-6
10-5
10-4
2nd1st mode
MA
GN
ITU
DE
FREQUENCY [Hz]
(b)
Fig. 2. Resonant frequencies of (a) longitudinal and (b) flexural vibrations
of nanocantilevers.
1 2 3 4
1 2 3 4
50
100
150
200FOR BULK
STRUCTURE
<111>
<110>
<100>
EL
AS
TIC
MO
DU
LU
S [
GP
a]
THICKNESS [nm]
(a)
DIRECTION <100> <110> <111> TENSILE FLEXURALLONGITUDINAL
50
100
150
200
<111>
<100>
<110>
FOR BULKSTRUCTUREDIRECTION
<100> <110> <111>
YO
UN
G'S
MO
DU
LU
S [
GP
a]
THICKNESS [nm]
(b)
Fig. 3. Elastic modulus with respect to thickness for three crystallographic
directions: (a) with PBC in x-direction and (b) without PBC (Young’s
modulus).
S.H. Park et al. / Thin Solid Films 492 (2005) 285–289 287
Law. An alternative way of obtaining the modulus is to
induce flexural or longitudinal vibration (Fig. 1(b)) and
measure the natural frequencies of the vibration. For flexural
vibration analysis, the Euler–Bernoulli beam model [17]
can still be applied using EVinstead of E with the governing
equation given by
B2w z; tð ÞBt2
þ c2B4w z; tð ÞBz4
¼ 0; c ¼
ffiffiffiffiffiffiffiffiE VI
qA
sð4Þ
subject to clamped-free boundary conditions. Solving the
equation, the natural frequencies can be calculated from
fn ¼k2n2kl2
ffiffiffiffiffiffiffiEVI
qA
sð5Þ
where fn, EV, I, q, and A denote the natural frequency in
hertz, elastic modulus for the periodic boundary condition
case, moment of inertia, mass density, and cross-sectional
area, respectively, and kngbnl satisfies the characteristic
equation,
cosbnlIcoshbnl ¼ � 1 ð6Þ
For the longitudinal vibration, the governing equation
[17] is given by
EV
qB2w z; tð ÞBt2
þ B2w z; tð ÞBt2
¼ 0 ð7Þ
subject to clamped-free boundary conditions. The natural
frequencies can be computed from
fn ¼2n� 1
4l
ffiffiffiffiffiEV
q
sn ¼ 1ð Þ ð8Þ
By measuring the natural frequencies from the frequency
domain display of simulated motion of the specimen such as
given in Fig. 2 and knowing the specimen parameters I, q,and A, the corresponding EVcan be calculated.
Fig. 3 depicts the change in the elastic modulus for
various cantilever thickness. For each crystallographic
direction, EVand E are plotted as a function of the thickness
in Fig. 3(a) and (b), respectively. Notice that for the given
thickness of the cantilever, EVis always greater than E. For
all three crystallographic directions, both EVand E increase
monotonically as the thickness is increased. Also, the
modulus values obtained by applying the three different
simulation testing methods are in close agreement. Here, the
base width and length of the cantilever are 2.172 and 9.774
nm, respectively.
The results in Fig. 3 show that the elastic modulus for
perfect-crystalline silicon nanostructures has decreased from
the corresponding bulk modulus by as much as 40%. In the
0.0 0.5 1.0 1.565
70
75
80
85
EL
AS
TIC
MO
DU
LU
S [
GP
a]
VACANCY [%]
TENSILE FLEXURAL LONGITUDINAL
Fig. 4. Elastic modulus with respect to vacancy for <100> crystallographic
direction, obtained by MD simulation of extensional and vibration
responses.
S.H. Park et al. / Thin Solid Films 492 (2005) 285–289288
presence of defects, these values can be expected to
diminish even further. To examine this issue, the depend-
ence of EV(i.e., with one PBC) on point defects (vacancies) issimulated. As shown in Fig. 4, the presence of defects can
significantly affect the elastic property. We have created
models with various defect distributions, and have found
that EVdepends primarily on the total number of vacancies
present in the structure, and the effect of their spatial
distribution is at best secondary. And again, the three
different testing methods are in close agreement. Here, the
base width, length, and thickness of the cantilever are 2.172,
9.774, and 1.089 nm, respectively.
Thermal fluctuations constitute one fundamental source
of vibration in nanoscale sensors such as scanning probe
microscopes, and represent an important design consid-
eration. The integral of the thermal fluctuation over all
frequencies corresponds to an energy per degree of
freedom, 1 /2kT, which would be expected from the
equipartition theorem [10,18]. The equipartition theorem
states that if a system is in thermal equilibrium every
independent quadratic term in its total energy has a mean
value equal to 1 /2kT, where k is the Boltzmann constant
and T is the absolute temperature. For small flexural
motion, the potential energy of the cantilever is 1 /2Ky2,
1.0 1.5 2.0 2.5 3.0
0.1
0.2
0.3
TH
ER
MA
L N
OIS
E [
nm
]
THICKNESS [nm]
DIRECTIONMDTHEORY <100> <110> <111>
Fig. 5. Comparisons between theory and MD simulation of thermally
induced vibration amplitudes with respect to thickness for three crystallo-
graphic directions.
where K denotes the spring constant and y the vertical
deflection at the free end. Equating the two expressions,
we can write
1
2kT ¼ 1
2Ky2: ð9Þ
Here, the spring constant for the cantilever is given as
[18]
K ¼ 3E Vl
l3: ð10Þ
Rearranging Eq. (9) into the following form yields a
theoretical estimate of the amplitude of the thermal
fluctuations in the vertical direction at the free end.
ffiffiffiffiffiy2
p¼
ffiffiffiffiffiffiffikT
K
rð11Þ
For different thickness, thermal fluctuations are calcu-
lated using Eq. (11), in which the EVvalues of Fig. 3 have
been applied. The results are compared in Fig. 5 and good
agreement between the theory and MD simulations is
observed. To further examine the accuracy of the simulation
method, the dependence of thermal fluctuations on temper-
ature for <100> direction is shown in Fig. 6 for the same
specimen used in Fig. 5, with the thickness fixed at 2.172
nm. Also plotted is the corresponding EVat each temperature
needed to compute thermal fluctuations. For each temper-
ature, EV has been obtained by a tensile test simulation.
Again, close agreements between the theoretical and MD
simulation results are attained.
For sensing the presence of additional mass on the
cantilever, changes in the flexural vibration characteristics is
the most sensitive of the three methods employed in the
present study. Additional mass placed at the free end causes
the resonant frequencies of the flexural modes to decrease.
The effect of the concentrated mass on the natural frequency
200 300 400 500
0.06
0.08
0.10
0.12THEORY MD
TEMPERATURE [K]
TH
ER
MA
L N
OIS
E [
nm
]
80
85
90
95
100 EL
AS
TIC
MO
DU
LU
S [G
Pa]
Fig. 6. Comparisons between theory and MD simulation of thermally
induced vibration amplitudes with respect to temperature for <100>
direction with thickness of 2.172 nm together with the corresponding E V.
(a)
(b)
0 20 40 60 809
10
1121
22
23
1st
MO
DE
FR
EQ
UE
NC
Y [
GH
z]
NUMBER OF ADDED ATOMS
THEORY MD
THICKNESS: 1.086 nm
THICKNESS: 2.172 nm
Clamped Part Free Part
FlexuralVibration
Added Atoms
L
Fig. 7. (a) Molecular model for mass-loading detection and (b) shifts in the
first flexural resonant frequency due to added silicon atoms: comparison
between theory and MD simulation.
S.H. Park et al. / Thin Solid Films 492 (2005) 285–289 289
of the first flexural mode of the Euler–Bernoulli cantilever
beam can be calculated by [17]
f1 ¼1
2k
ffiffiffiffiffiffiffiffiffiK
meff
r; ð12Þ
meff ¼ mc þ 0:2427md ð13Þ
where K is given by Eq. (10), md is the cantilever mass, and
mc the concentrated mass (i.e., the additional mass). To
investigate the feasibility of the nanoscale cantilevers as
molecular mass sensors, silicon molecules are placed on top
of the cantilevers at the free end and the change in the first
flexural resonant frequency is simulated. Fig. 7 shows the
frequency as a function of the number of silicon atoms
placed on the cantilever. Here, the base width and the length
of the cantilever are 2.172 and 9.774 nm, respectively. The
simulation results and theoretical estimates based on Eqs.
(12) and (13) are in close agreement, with the thinner
structure showing superior sensitivity to the molecular mass
present.
4. Conclusions
The MD simulation based on the Tersoff potential model
has been conducted to investigate the size-dependence of
the elastic properties of the nano-scale crystalline silicon
cantilevers.
Three different estimation methods yield results that are
in close agreement and demonstrate strong dependence of
the elastic properties on dimensional scaling. The elastic
modulus decreases monotonically as the thickness of the
specimen decreases, and the presence of voids in the
specimen further decreases the modulus by a significant
amount.
Estimations of thermal noise and frequency shift due to
mass-loading demonstrate that the analysis method based on
the continuum mechanics modeling can still be used on
nanoscale structures provided the dependence of elastic
constants on dimensional scaling is accounted for.
Acknowledgments
The authors gratefully acknowledge the financial support
from the Micro Thermal System Research Center sponsored
by the Korean Science and Engineering Foundation.
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