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Observation of reduction in Casimir Force Without Change of Dielectric Permittivity (?) U. Mohideen University of California-Riverside

Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

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Page 1: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Observation of reduction in Casimir Force Without Change of Dielectric Permittivity (?)

U. MohideenUniversity of California-Riverside

Page 2: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Motivation to measure Casimir force with Indium Tin Oxide (ITO)

Use Transparent Electrodes to Reduce the Casimir Force

Manipulation of the Casimir Force using UV Light

Explore same puzzles in the Lifshitz Theory with dielectrics

Page 3: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Transparent Electrodes to Reduce Casimir Force

Rationale:Reduce Casimir Force by Reducing Boundary Reflectivity at characteristic frequency (~c/2z)

z

In devices z~ 1mmGold Electrodes have ~100% Reflectivity

Use electrodes which are transparent around1mm to reduce reflectivity and reduce Casimir force

De Mann et al, PRL, 103,040402 (2009)

Page 4: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

UV treatment to Reduce Casimir Force (?)

Rationale:UV treatment known to change mobility of Charge Carriers in ITO

C.N. Li et al, Appl Phys. , 80,301 (2005)

Page 5: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

ITO Sample Properties

1. Sputter coated ITO film made in a loadlocked and cryo-pumped system with a base pressure of 5X10-7 Torr or better.

2. The substrates (Quartz) are sputter etched cleaned and then sputter coated with ITO on one side.

3. The resistivity of ITO taking by four point probe measurement is 42 ohms/sq.4. The thickness of ITO measured by AFM is 74.6 ± 0.2nm

Page 6: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

EXPERIMENT

Experiment:i. Measure Casimir force between Au Sphere and Au plate ii.Replace Au plate with ITO plate Compareiii. UV Treat ITO plate and Measure Casimir Force Compare

Compare the Casimir force using Au & ITO Plates (with and without UV Treatment)

Results:1.Casimir force reduces by x 2 with ITO2.Casimir Force reduces additional ~35% with UV treatment

Page 7: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Force Measurements Using Cantilever Deflection

Plate :Au or ITO

Radius of Au coated Sphere= 101.23±0.25 µm

Smooth Au coating 0f 105±1 nm10 nm Cr followed by 20 nm of Al then Au coatingAu Coating done at 3.75 Ẩ/min

Page 8: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Experimental set-up scheme for contact mode

Oil Free vacuum at 10-7 TorrTemperature 2 o CVibration Isolation

Page 9: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

100 150 200 250 300-0.5

-0.4

-0.3

-0.2

-0.1

0.0

Ca

nti

lev

er

De

fle

cti

on

(V

)

Au sphere-ITO plate relative separations (nm)

-260 mV -235 mV -225 mV -210 mV -200 mV -190 mV -175 mV -160 mV -135 mV -110 mV

Method: Measured Total Force(Electrostatic+Casimir) between Au Sphere and ITO Plate

-270 -240 -210 -180 -150 -120 -90

-0.20

-0.15

-0.10

-0.05

sig

nal

(V

)

applied voltages (mV)

Electric Force

Cantilever deflection signal:2

0 )('

)(

'''VV

k

zX

k

F

k

F

k

FS CaselectricCas

def

10 Different Voltages VV o = Residual PotentialX(z)~ Capacitancek’ = cantilever spring constant

Parabolas Drawn at each Separation

-280 -260 -240 -220 -200 -180 -160 -140 -120 -100-0.12

-0.10

-0.08

-0.06

-0.04

-0.02

0.00

applied voltages (mV)

sig

na

l (V

)

Page 10: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Residual Electrostatic Potential between Au Sphere and ITO Plate

<V0>=-196.81.5 mV

100 150 200 250 300

-210

-200

-190

-180

Au sphere-ITO plate separations (nm)

Res

idu

al E

lect

ros

tati

c P

ote

nti

al (

mV

)

Residual Voltage independent of Au Sphere-ITO plate separationThis allows easy subtraction of the electrostatic force

Page 11: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Experimental Procedure

Cantilever deflection signal: 20 )(

'

)(

'''VV

k

zX

k

F

k

F

k

FS CaseCas

def

z=z0+ zpiezo-Sphotodiode signal * m

z0 = Surface separation on contactm= cantilever deflection per signal unit

0V

- Curvature

- residual potential differencebetween the sphere and the plate

'

)(

k

zX

Parameters defined from parabolas:

'k

0z

Use sphere- plate electrostatic formula

100 150 200 250 300-0.5

-0.4

-0.3

-0.2

-0.1

0.0

Ca

nti

lev

er

De

fle

cti

on

(V

)

Au sphere-ITO plate relative separations (nm)

-260 mV -235 mV -225 mV -210 mV -200 mV -190 mV -175 mV -160 mV -135 mV -110 mV

-270 -240 -210 -180 -150 -120 -90

-0.20

-0.15

-0.10

-0.05

sig

na

l (V

)

applied voltages (mV)

-270 -240 -210 -180 -150 -120 -90-0.30

-0.25

-0.20

-0.15

-0.10

sig

nal

(V

)

applied voltages (mV)

m from

Page 12: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

<z0>=29.50.4 nm

Determination of contact separation zo & cantilever spring constant k

<k>=0.01390.0001 N/m

0 200 400 600 800 1000

-3.0x10-5

-2.0x10-5

-1.0x10-5

0.0

Experiment Theory

Au sphere-ITO plate separations (nm)

Par

abo

la C

urv

atu

re

Both zo & k independent of separationCritical for precision measurement

200 400 600 800 100027

28

29

30

31

Ave

arag

e sp

her

e-p

late

sep

arat

ion

on

co

nta

ct (

nm

)

End point of the fit (nm)

100 200 300 400 500 600 700 800 900 10000.0134

0.0136

0.0138

0.0140

0.0142

0.0144

Can

tiliv

er S

pri

ng

Co

nst

ant

(N/m

)

End point of the fit (nm)

Page 13: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Will lead to Dependence of Vo on Separation Distance (Anamalous Behaviour Due to Skewed Parabola)

0

Correction for Sphere or Plate Movement during Measurement

Sphere- Plate separation (nm)

Force vs. Separation Curves for Same Applied Voltage Shifted due to Sphere/Plate Movement

1st time

2nd time

Canti

leve

r Defl

ectio

n

Page 14: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Correction due to Sphere-Plate Drift

01000200030004000

-4

-3

-2

-1

0

4114.34114.44114.54114.64114.74114.84114.9

-3.6

-3.4

-3.2

-3.0

-2.8

-2.6

Sd

ef(a

rbit

rary

un

its

)

yx

w

Piezo extension, d (nm)

C

y

x

w

2. Repeat Electrostatic Force Measurement for same applied V and look at change in contact point.

1600 1620 1640

-1.70

-1.65

-1.60

Ca

nti

lev

er

De

fle

cti

on

(V

)

0.08 nm/sec

1. Find Precise Sphere Plate Contact Point- Extrapolate

Contact points as a function of time

Page 15: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

200 400 600 800 1000

25.5

26.0

26.5

27.0

27.5

28.0

End point of the fit (nm)

Av

eara

ge

sph

ere-

pla

te s

ep

arat

ion

on

co

nta

ct (

nm

)

100 150 200 250 300

-210

-200

-190

-180

Sphere-plate separations (nm)

Sp

he

re-p

late

co

nta

ct

po

ten

tia

l (m

V)

100 150 200 250 300-210

-205

-200

-195

-190

-185

Sp

he

re-p

late

co

nta

ct

po

ten

tia

l (m

V)

Sphere-plate separations (nm)

<V0>=-196.81.5 mV

Errors due to Sphere-Plate Separation DriftCorrected Uncorrected

<z0>=29.50.4 nm

200 400 600 800 100028.0

28.5

29.0

29.5

30.0

30.5

31.0

Ave

arag

e sp

her

e-p

late

sep

arat

ion

on

co

nta

ct (

nm

)

End point of the fit (nm)

Page 16: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

50 100 150 200 250 300-350

-300

-250

-200

-150

-100

-50

0

Ca

sim

ir F

orc

e (p

N)

Au sphere-ITO plate separations (nm)

60 70 80 90 100-350

-300

-250

-200

-150

-100

-50

Measured Casimir Force from Au Sphere- ITO Plate

20 )()( VVzXFFFF TotalElectricTotalCasimir

Subtract Electric Force from Total Force

100 Voltages Applied to Plate

Page 17: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Measured Casimir Force Comparison of Au plate to ITO plate

100 150 200 250 300

-300

-250

-200

-150

-100

-50

0

Au sphere-ITO plate separations (nm)

ITO before UV Gold

C

as

imir

Fo

rce

(p

N)

Number of voltages V = 10Number of repetitions = 10

FCas (pN)z (nm)

100

85

120 -50.1

-123.42

-81.62

ITO/Au

0.57

0.61

0.59

40% Reduction in Casimir Force with ITO

Page 18: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

UV Treatment of ITO Plate

• Penray Hg Lamp 9.0 inch long and 0.375 inch diameter

• λ=254 nm 5.4 mWatt/cm2 at 1.9 cm• λ=365 nm 0.2 mWatt/cm2 at 1.9 cm• 12 hr• Cleaned as before (Acetone, Methanol,

Ethanol, water rinse and Nitrogen dry)

Page 19: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Insert UV Treated ITO Plate& Repeat Measurement

Page 20: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

100 150 200 250 300

-0.4

-0.3

-0.2

-0.1

0.0

Au sphere-ITO plate relative separations (nm)

Can

tile

ve

r D

efl

ect

ion

(V

)

-25 mV 0 mV 25 mV 50 mV 60 mV 70 mV 85 mV 100 mV 125 mV 150 mV

-40 0 40 80 120 160-0.20

-0.16

-0.12

-0.08

-0.04

sig

na

l (V

)

applied voltages (mV)

-40 0 40 80 120 160

-0.12

-0.08

-0.04

0.00

sig

na

l (V

)

applied voltages (mV)

Measured Total Force(Electrostatic+Casimir) between Au Sphere and ITO Plate

Electric Force

20 )(

'

)(

'''VV

k

zX

k

F

k

F

k

FS CaselectricCas

def

10 Different Voltages V on plateV o = Residual PotentialX(z)= Capacitancek’ = cantilever spring constant

Cantilever deflection signal:

0V

Parabola Curvature

- residual potential differencebetween the sphere and the plate

'

)(

k

zX

'k

0z

Use sphere- plate electrostatic formula

Page 21: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Check Stability of Measurements of Au Sphere and ITO Plate (after UV treatment)

<z0>=290.6 nm

<V0>=65 2 mV

<k>=0.01380.0001 N/m

100 150 200 250 30050

55

60

65

70

75

80

Res

idu

al E

lect

rost

atic

Po

ten

tial

(m

V)

Au sphere-ITO plate separations (nm)

1. Distance independence of residual potential Vo

2. Distance independence of contact separation zo 3. Distance independence of Spring constant

100 200 300 400 500 600 700 800 900 100028.2

28.4

28.6

28.8

29.0

29.2

29.4

Av

erag

e S

epar

ati

on

on

Sp

her

e-P

late

Co

nta

ct (

nm

)

Au sphere-ITO plate separations (nm)

200 400 600 800 10000.0134

0.0136

0.0138

0.0140

0.0142

Ca

nti

live

r S

pri

ng

Co

ns

tan

t (N

/m)

Au sphere-ITO plate separations (nm)

Fit Electrostatic Force Curve

Page 22: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Repeat Casimir Force between Au Sphere and ITO Plate (after UV treatment)

100 150 200 250 300

-250

-200

-150

-100

-50

0

Ca

sim

ir F

orc

e (

pN

)

Au sphere-ITO plate separations (nm)

60 70 80 90 100

-250

-200

-150

-100

-50

Grey Bars represent the complete range of data every 5 nm

20 )()( VVzXFFFF TotalElectricTotalCasimir

Subtract Electric Force from Total Force

100 Voltages Applied to Plate

Page 23: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Casimir Force between Au Sphere and ITO Plate (Before and After UV comparison)

After UV/Before UVz (nm)

100

120

85 0.72

0.68

0.66

100 150 200 250 300

-300

-250

-200

-150

-100

-50

0

Au sphere-ITO plate separations (nm)

ITO after UV ITO before UV

C

asim

ir F

orc

e (p

N)

21-35% Reduction with UV treatment21% at 60 nm and 35% at 130 nm

Page 24: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

440 460 480 500 520 5400.0

0.1

0.2

0.3

0.4

Casimir Force (pN)

140 1600.0

0.1

0.2

0.3

0.4

Casimir Force (pN)

60 80 1000.0

0.1

0.2

0.3

0.4

Casimir Force (pN)

240 260 280 300 320 3400.0

0.1

0.2

0.3

0.4

Casimir Force (pN)

100 1200.0

0.1

0.2

0.3

0.4

Casimir Force (pN)

40 600.0

0.1

0.2

0.3

0.4

Casimir Force (pN)

ITO Before UVITO After UV

60 nm

80 nm

100 nm

Histograms of the Experimental Data- No Overlap

Page 25: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

100 150 200 250 3000.0

0.5

1.0

1.5

2.0

2.5

3.0

Total error Systematic error Random error

Au sphere-ITO plate separations (nm)

Err

or

(pN

)

100 150 200 250 3000.0

0.5

1.0

1.5

2.0

2.5

3.0

Total error Systematic error Random error

Au sphere-ITO plate separations (nm)

Err

or

(pN

)

ITO Before UV ITO After UV

Experimental Errors at 95% Confidence Level

Error due to use of Proximity Force Approx <0.3%Radius of Sphere= 101.2±0.5 mm

Page 26: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Comparison with Lifshitz Theory

Page 27: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Lifshitz Formula

lk

l

lk

li

kk

llk

l

kll

kl

ik

qK

qKKr

Kq

KqKr

)(

)()(

)()(

)()()(

// ),(,),(

]})()(1ln[])()(1{ln[)1()( 2,

)2(

,

)1(

0 0

2,

)2(

//,

)1(

//021 zq

lll

zqlllBc

ll eKrKreKrKrdKKTRKzF

2/12)()(2/12 ])([,)( 2

2

2

2

KiKKqcl

kklcl

ll

R

z

R>>z

2

1

TlkB

l

2 At l=0, =0xMatsubara Freqs.

Reflection Coeffs:

Page 28: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Measure PermittivityEllipsometry Measurements

VUV-VASESpectral range 0.14 – 1.7 µm;Angle of incidence is computer controlled from 10° to 90° ;

IR-VASE

Spectral range 1.7–33 µm; Angle of incidence is computer controlled from 30° to 90°.

J.A. Woollam Co., Inc.

Page 29: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Comparison with Theory: Casimir Force between Au Sphere and ITO Plate

Dielectric Permittivity Measured by Ellipsometry from 0.04 eV to 8.47 eV. Fit to Lorentz oscillators and Drude type free electron behavior

14.5 15.0 15.5 16.0 16.5 17.00

2

4

6

8

10

12

ITO(i

)

Log10[(rad/s)]

0 2 4 6 8 10 120

1

2

3

4

5

Im IT

O

(eV)

220

220

20

)( WW

WAOsc

xgwx

xga

aA=111.52; w0=8.eV, g0= 4.eV.

Extrapolated to lower Frequency with Drude Model [wp =1.5 eV, g=0.128 eV]

Page 30: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

15.0 15.5 16.0 16.5 17.00

2

4

6

8

10

12

ITO(i)

Log10[(rad/s)]

14.5 15.0 15.5 16.0 16.5 17.00

2

4

6

8

10

12

ITO(i

)

Log10[(rad/s)]

No UV

After UV

Dielectric Permittivity in Imaginary Frequency

0 2 4 6 8 10 120

1

2

3

4

5

Im IT

O

(eV)

0 2 4 6 8 10 120

1

2

3

4

5

Im IT

O

(eV)

Very Little Difference between Before and After UV in imaginary frequency

Drude Model Parameters [wp =1.5 eV, g=0.128 eV (No UV), g=0.132 eV (UV)]

220

220

20

)( WW

WAOsc

xgwx

xga

aA=111.52; w0=8.eV, g0= 4.eV;aA=240.54, w0=9.eV, g0=8.5eV.

Page 31: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

RMS Roughness=2.04 nm

hi, nm vi

0.097 4.40E-040.483 1.50E-04

0.87 0.001021.257 0.00161.644 8.70E-04

2.03 0.002622.417 0.001892.804 0.002773.191 0.004083.577 0.004523.964 0.003354.351 0.00514.738 0.006415.124 0.0083

5.511 0.0086

5.898 0.01049

6.285 0.01311

6.671 0.01734

7.058 0.01734

7.445 0.02273

7.832 0.02389

8.218 0.03395

8.605 0.04006

8.992 0.05041

9.379 0.05522

9.765 0.06148

10.152 0.08421

10.539 0.08362

10.926 0.08858

11.312 0.09237

11.699 0.07605

12.086 0.05478

12.473 0.04691

12.859 0.02608

13.246 0.02171

13.633 0.00874

14.02 0.00758

14.406 0.00626

14.793 000262

15.18 0.00102

Fractions vi of the surface area covered by roughnesswith heights hi

ITO Plate Roughness

Roughness effect<0.5 % for >116 nm<1% for > 90 nm<2.2% at 60 nm

Page 32: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Carrier Density Measurement

dneIB

HV

Slope = B/dne is sameSame Carrier Density = 7 x 1020 /cc

wikipedia

-1000 -500 0 500 1000-5.38

-5.36

-5.34

-5.32

-5.30

-5.28

-5.26

-5.24

-5.22

magnetic flux density (Gauss)

VH

all (

mv)

No UVAfter UV

Page 33: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

100 150 200 250 300

-300

-250

-200

-150

-100

-50

0

Au sphere-ITO plate separations (nm)

Ca

sim

ir F

orc

e (

pN

)

60 70 80 90 100-300

-250

-200

-150

-100

-50

0

Comparison with Theory: Casimir Force between Au Sphere and ITO Plate Before UV

ITO Before UV DC Conductivty Included – Good Agreement

Page 34: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Comparison with Theory: Casimir Force between Au Sphere and ITO Plate After UV

No Agreement if we include Free Carriers

----Theory with DC Conductivity

Effect of inclusion of DC Conductivity

++ Data

60 80 100 120 140 160 180 200

-300

-250

-200

-150

-100

-50

0

Au sphere-ITO plate separations (nm)

Ca

sim

ir F

orc

e (

pN

)

ITO After UV

Page 35: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

100 150 200 250 300

-300

-250

-200

-150

-100

-50

0

Au sphere-ITO plate separations (nm)

Ca

sim

ir F

orc

e (

pN

)

60 70 80 90 100-300

-250

-200

-150

-100

-50

Comparison with Theory: Casimir Force between Au Sphere and ITO Plate After UV

Good Agreement only if we drop the DC conductivity of ITO Afer UV Assume it to be a perfect dielectric

ITO After UV

DC Conductivity Not Inclduded

Page 36: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Understanding the Patch Effectby

Electrostatic Simulation

Page 37: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Electrostatic simulation with COMSOL software package

Plate size = 32×32 m;Patch size = 0.6×0.6 m;Vplate=0.018 mV , Vsphere=0, Vpatches=random in [-90;90] mV, ~0.7 mV.

We solved the Poisson equation for conductive plate (variable potential Vplate) with dielectric patches on the surface (random potential distribution in [-90;90] mV) and conductive sphere on the distance z from the plate

Area filled by patches has been chosen according to condition: Surface area > Aeff=2Rd (for z=0.1 m plate size should be higher then 8 m)

Ftotal (Vplate) between

the sphere and plate = 0Vplate =V0

Aeff=2Rd

Patches

- 0r

V=0 r – relative permittivity

Page 38: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Electrostatic simulation with COMSOL software package

In the pictures:Sphere radius R = 100 m; Plate size = 32×32 m;Patch size = 0.3×0.3 m to 0.9×0.9 m;Vpatches=random in [-90;90] mV, ~0.7 mV.

We solved the Poisson equation for conductive plate (variable potential Vplate) with dielectric patches on the surface (random potential distribution in [-90;90] mV) and conductive sphere on the distance d from the plate

Plate

Patches

Aeff=2Rd

Sphere

Apply voltages to the plate and find voltage when electrostatic force goes to zeroThis compensating voltage (Vo) is found for different separations.

- 0r

V=0 r – relative permittivity

Page 39: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Simulation Results of Compensating Voltage

0.0 0.2 0.4 0.6 0.8 1.0

0.009

0.012

0.015

0.018

0.021

sphere-plate separations (m)

Co

mp

en

sa

tin

g V

olt

ag

e (

mV

)

300 nm 300 nm 600 nm 600 nm 900 nm 900 nm

size distance between

Distance IndependentAs in Observed in Experiment –WellCompensated

Page 40: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

Conclusions1. UV Modification of the Casimir Force was demonstrated.

2. No Anamalous distance dependence of the Compensating Voltage

3. 21-35% reduction of Casimir force by UV treatment even though there is not much change in e(ix)

4. The Casimir force measurements have the correct distance dependence.

5. Inclusion of DC conductivity in the Lifshitz formula for the ITO after UV leads to disagreement with the experimental results.

6. A Study of the Temperature Dependence of the Carrier Mobility might shed light on the discrepancy.

• Precision Measurement of Casimir Force with Au Using a

Dynamic AFM at 15:30 pm

Page 41: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

AcknowledgementsExperimentC.C. ChangA. Banishev

R. Castillo

Theoretical AnalysisV.M. Mostepanenko

G.L. Klimchitskaya

Research Funded by: DARPA, National Science Foundation & US Department of Energy

Page 42: Motivation to measure Casimir force with Indium Tin Oxide (ITO) Use Transparent Electrodes to Reduce the Casimir Force Manipulation of the Casimir Force

100 150 200 250 300

-300

-250

-200

-150

-100

-50

0

Au sphere-ITO plate separations (nm)

Cas

imir

Fo

rce

(pN

)

60 70 80 90 100-300

-250

-200

-150

-100

-50

0

100 150 200 250 300

-300

-250

-200

-150

-100

-50

0

Au sphere-ITO plate separations (nm)

Cas

imir

Fo

rce

(pN

)

60 70 80 90 100-300

-250

-200

-150

-100

-50

100 150 200

-300

-250

-200

-150

-100

-50

0

Au sphere-ITO plate separations (nm)

Cas

imir

Fo

rce

(pN

)

Comparison with Theory: Casimir Force between Au Sphere and ITO Plate

Good Agreement only if we dropthe DC conductivity of ITO

Afer UV

ITO Before UV ITO After UV

ComparisonDC Conductivty Included DC Conductivity Not Inclduded