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40 um
Grin size: 4.5 um Line width: 5 um
(a) (b)
(c) (d)
Photolithography
(a) Incomplete pattern on the wafer with delamination of the photoresist films (S1813)
(b) A triangular dot pattern with a dot-to-dot size of 40 um
(c) A hexagonal grid pattern with a grin size of 4.5 um
(d) A square grid pattern with a line width of 5 um
Synthesis and Characterization of Silica Nanoparticles 49
4
504
514
524
534
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564
574
584
594
604
614
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634
644
654
664
674
6840
2468
1012141618
Particle Size (nm)
Num
ber
Fig 1. SEM image of silica nanoparticles from two sections
Fig 2. Particle size distribution histogram based on SEM data
105.709
141.772
190.137
255.002
341.994999999999
458.666
615.139
824.992
1106.435
1483.893
1990.119
2669.043
3579.581
4800.74605
1015202530
Particle Size (nm)
Inte
nsity
(Per
cent
)
105.709
141.772
190.137
255.002
341.994999999999
458.666
615.139
824.992
1106.435
1483.893
1990.119
2669.043
3579.581
4800.74605
1015202530
Particle Size (nm)
Num
ber (
Perc
ent)
(a)
(b)
Fig 3. Size distribution results by DLS: (a) by intensity; (b) by number
Nanoparticle Assembly and Characterization
(a) (b)
(c)
SEM images of assembled particles in (a) cross-section view; (b) Top view. Showing ordered close packed structure over long ranges with some cracks & defects.
The transmission spectra at normal incidence and angle resolved reflection spectra with incident angle from 5° to 40° at 5° increment are shown in (c), showing blue shift phenomenon of the maximum intensity point.