Upload
others
View
1
Download
0
Embed Size (px)
Citation preview
Nanotechnology in NEC
Fundamental and EnvironmentalResearch Laboratories
NEC Corporation
Jun’ichi Sone
T.Baba : Nanoelectronics, CNT electronicsK.Ohashi : Nanophotonics, SpintronicsH.Kawaura : Nanoelectronics, Nanobio technology
NEC Members
NanoelectronicsNanoelectronics
World’s Smallest MOS TransistorsNanofabricationNanoBridgeCarbon Nanotube ApplicationsQuantum Bit Devices
World’s Smallest Si MOS TransistorWorld’s Smallest Si MOS Transistor H.Kawaura, T.Sakamoto,
et.al.
Electron Micrograph of 8nm Gate Current -Voltage Characteristic
p-sub
Upper Gate
Gate Oxide Film
Intergate Oxide Film
n +
Ultra -shallow Junction
Lower Gate
0 0.5 1
0
2
4
6
Dra
in C
urre
nt(µ
A)
Drain Voltage (V)
300 K
Gate Voltage =0.9 V
0
Electron Micrograph of 8nm Gate Current -Voltage Characteristic
p-sub
Upper Gate
Gate Oxide Film
Intergate Oxide Film
n +
Ultra- shallow Junction
Lower Gate
0 0.5 1
0
2
4
6
Dra
in C
urre
nt(µ
A)
Drain Voltage (V)
300 K
Gate Voltage =0.9 V
0
444
8nm8nm
NanofabricationNanofabrication
“10nm-EB lithography with Calix Arene resist”
SEM image of Calix Arene resist pattern
Molecular Structure forCalix Arene
Commercially available from Tokuyama Corp.
Nanofab. Group (Ochiai et.al.)
CMOS devices show proper transistor operation by careful design and fabrication even when the gate length is reduced to 5nm. However, we encounter many problems. In particular,
Difficulties to suppress the fluctuation of device parametersgate length, impurity profile (number of impurities) and others
Difficulties of high-through-put production for small structureswith nm-scale or even atomic-scale accuracyDifficultiers of the transistor design due to appearance of quantum effect
To utilize self-assembled nanostructures,CNTs, metallic nano-pipe structures (NanoBridge),molecular devices and so on.
To utilize quantum effects as an operation principle,Quantum computing devices (Q-bits)
Cu Cu+ + e- (oxidation)Cu+ + e- Cu (deoxidation)
Cu2S
Cu
Ti
Cu+
OFFON
−V +V−V
Atom (ion) transfer through solid electrolyteElectrochemical reaction on both electrodes
Principle of NanoBridge
ON
OFF
電流
(mA
)
-0.2 0 0.2
-10
1
-2
ON
OFF
電流
(mA
)
-0.2 0 0.2
-10
1
-2
Stretching ofmetal nanobridge
Compact (4F2)Low ON resistance (<50Ω)Scalable (<30nm) ~50ohmrepeatable (103~105 times)
Low switching voltage(0.05~0.2V)
Nonvolatile (>1 month)ON/OFF ratio (>105)
Voltage (V)
Cur
rent
(mA
)
T.Sakamoto et al. (APL, 2003)with NIMS Dr.Aono’s Group
Programmable CBICConventional FPGA switch
(SRAM & pass Tr.)Huge (120F2)Resistive (2kΩ)In logic plane
NanoBridgeTiny (4F2)Low resistive (50Ω)On logic plane
Improvement ofsignal delay by
20~40%
FPGA ProgrammableCBIC
Replacementwith NanoBridge
~1/2 ~1/2
Logic cell
Xbar switches
Small scalecircuit cell
Circuit areareduction to
½~¼
T.Sakamoto et al. (ISSCC2004)with NIMS Dr.Aono’s Group
4x4 Xbar switches
(X0, X1, X2, X3) = (0, 0, 1, 0)(Y0, Y1, Y2, Y3) = (–, 0, –, –)(C0, C1, C2, C3) = (0, 1, 0, 0)
X0 X1 X2 X3
Y1
Y2
Y0
OFF OFF OFFON
Xbar circuit on CMOS substrate
Xm
Yn
NanoBridge
Xm
Yn
NanoBridge
Extra Tr. is used for cell selection because of broad distribution of
switching voltage
Xm
Yn
CnNanoBridge
Xm
Yn
CnNanoBridge
ON/OFF stateat each Xpointis selectable. 2020µµmm2020µµmm
NanoBridge
SiO2Cu
Cu2SInsulatorAu/Pt/Ti
Programming operationof 4X4 Xbar switches
X0 X1 X2 X3
Y1Y2Y3
Y0
Y1Y2
Y3
Y0
Output #1 Output #2
Pattern #1 Pattern #2X0 X1 X2 X3
Y1Y2Y3
Y0
Input (1.8V)
X0
X1
X2X3
10μsec
Application of programmable CBIC学校
家庭
病院
自然
オフィス乗り物
工場
人工衛星
NEC
NEC
Any timeAny whereAnything Ubiquitous Society
Realization of electronic products with low cost and high performance to fulfill the market needsAdd-on new function later
Realization of many functions on a single chipby connection
reconfiguration
GPSmp3
Digital TV
movie
PatternRecognition
Applications of Carbon Nanotubes
FED
トランジスタ
ナノテクノロジ(ナノ加工・部品)
バイオセンサー
量子デバイス トランジスタ
マイクロ波増幅管
Random
Large
Small
Catalysts
Composites
Biosensors
Quantum devices
Hydrogen Storage
Aligned
Nanotech.
LSI memory, logic, wiring
FED
Orientation
Qua
ntity
010708b
Fuel Cells
Transistor
Single-walled Carbon Nanotubes
1.3 nm
Single-walled Carbon Nanotubes
1.3 nm
Single-walled Carbon Nanohorn AggregateSingle-walled Carbon Nanohorn Aggregate
Iijima, S. et al. Chem. Phys. Lett.309, 165 (1999).
Iijima, S. Nature (1993)
Carbon Nanotube Transistor Structure Model, Scanning Probe Micrograph Image, Transistor Characteristics
–2 0 20
200
400
600
ゲート電圧(V )ドレイン電流
(nA)
ドレイン電圧:100 m V
gm=320 nSSource
Gate
DrainCarbon nanotube
S G G D
Gate
CNT TransistorsCNT Transistors
“Excelling present Sitransistors in performance”
F.Nihey et al.
Fabrication of Single Wall Carbon Nanohorn
Laser Ablation (Iijima Group, JST)
ナノホーン:純度 90%以上
(700 Torr)
CO 2
3~5 kW, φ3mm500ms, 10 Hz
R.T.Nanohorn
Ar Gas(700 Torr)
CO 2 Laser
3~5 kW, φ3mm500ms, 10 Hz
Carbon
Iijima, Yudasaka,et.al.
Principle Diagram of Portable Fuel Cell
Carbon Nanohorns
Platinum Catalyst
Fuel AirO2
Elec
trol
yte
Film
e
H2O
H+
Cat
alys
t Ele
ctro
deCO2
CH3OHe
e 10 1000100 1000010
1000
100
10000
Volume Energy Density (Wh/L)
Wei
ght E
nerg
y D
ensi
ty(W
h/kg
)
Fuel
NiHLead
Lithium
NiCd
Cat
alys
t Ele
ctro
de
Cell
Principle Diagram of Portable Fuel Cell
Carbon Nanohorns
Platinum Catalyst
Fuel AirO2
Elec
trol
yte
Film
e
H2O
H+
Cat
alys
t Ele
ctro
deCO2
CH3OHe
e 10 1000100 1000010
1000
100
10000
Volume Energy Density (Wh/L)
Wei
ght E
nerg
y D
ensi
ty(W
h/kg
)
Fuel
NiHLead
Lithium
NiCd
Cat
alys
t Ele
ctro
de
Cell
Carbon Nanotube Fuel CellsCarbon Nanotube Fuel Cells CNT Technologies Group(Y.Kubo et.al.)
TEM images of Nanohorn with Pt catalyst
Carbon nanohornConventional carbon material
(acetylene black)
※ Black particles : Pt catalyst
・ Finer Pt catalyst is dispersed homogeneously on the surface of carbon nanohorns・ Finer particles have better catalyst capability
Average Power 14WMaximum Power 24W
Note PC with DM-Fuel Cell insideNote PC with DM-Fuel Cell inside
Demonstration of the operation in 2003 World-PC in September, 2003.
CNT Technologies Gr.(Y.Kubo et.al.)
Superconducting quantum bit
Ground Electrode Cooper-Pair Box
++++
- - - -
Tunnel Junction
Cooper-Pairs
Gate Electrode
1 extra cooper1 extra cooper--pair in a boxpair in a box
No extra cooperNo extra cooper--pair in a boxpair in a box
Mixed state of no extra and single extra cooperMixed state of no extra and single extra cooper--pair in a boxpair in a box
Quantum-Bit Device for Quantum ComputerQuantum-Bit Device for Quantum Computer
Quantum coherence control
A B A’ B’00
0 0 1
11
1
1
011
00
10+
A
B
A’
B’
Control bit
Target bit
Input Output
Logic operation truth tablefor C-NOT gate
Input Output
Tsai, Nakamura, Yamamoto, Pashkin*, Astafiev* (* RIKEN)
Possible highPossible high--speed computing speed computing Factoring, Date search, Quantum-simulation, NP problems
Nature, 30 Oct., 2003
1 µm
Target bit
Inverting of target bit only when control bit is “0”SEM of C-NOT Gate
Scematics of the device
Connecting capacitor
When control bit is “0”,
Taget bit is not inverted
Taget bit is inverted
“0”
Cooper pair tunnelingCooper pair tunneling
“1”
When control bit is “1”,
Probe 2 Probe 1
Operation Principle of C-NOT Quantum BitsOperation Principle of C-NOT Quantum Bits
GroundElectrode 2
Target bit
GroundElectrode 1
Gate Electrode 2 Gate Electrode 1
Contrl bitDC Electrode 2
DC Electrode 1
Contrl bit
DC electrode 2
GateElectrode 2
DCElectrode 1
Gate electrode 1
GroundElectrode 1
Probe 2
Probe 1
Target bit
Gate electrode 2
Connectingcapacitor Control bit
Gate electrode 2
Target bit
Connectingcapacitor Control bit
GroundElectrode 2
0 00 0
InputInput 0000 1100
0011 1100 0000 1111⟩⟩++⟩⟩ 1100||0011|| ββαα ⟩⟩++⟩⟩ 1111||0000|| ββαα
Experimental results of C-NOT gate operationExperimental results of C-NOT gate operation
When input target bit is “0” When input target bit is “1”
Control bit
Target bit
0011 111100 11α 0〉+ β 1〉
1 11 1
00
OutputOutput
Control bit Target bit
Contrpl bit Target bit
00
11
0000
111111
Entangled state Entangled state
Out
put c
urre
nt(pA
)
00 11α 0〉+ β 1〉
0 0
Number of measurement events
1
0
1
0Number of
measurement events
Nanobio Technology& Nanophotonics
Nanobio Technology& Nanophotonics
DNA and Protein Separation by Nano-Pillar GelSurface Plasmon Technology
High-resolution separation of DNAs and proteins by using artificial gel fabricated by nanotechnology health care chip
Nanobio TechnologyNanobio Technology
FeaturesHigh through-put, high resolution, and high reproducibilityControl of dynamic range and separation band by the design
natural gel (random) artificial gel (uniform)with 200nm diameter
DNA (100- or more several ten nm), and protein (several ten nm)
Kawaura et.al.
DNA and Protein separation by using nano-pillar gel
GlassLiquid Pool
Micro Fluid Channel
Silicon
Artificial Nanostructure
Fluorescence Microscope
1µm
DNA Flow Direction
DNA Size-Separation Chip with Artificial Nanostructure
GlassLiquid Pool
Micro Fluid Channel
Silicon
Artificial Nanostructure
Fluorescence Microscope
1µm
DNA Flow Direction
DNA Size-Separation Chip with Artificial Nanostructure
Nanobio ChipNanobio Chip
Time(sec)
Sign
al
Fluorescently dyed DNA
Nature, vol. 391, p. 641, 12 Feb. 1998
Surface Plasmon Technology
Ebbesen et.al.(presently, Leus Pastuer University)
λ = 700 nm λ = 637 nm
d = 200 nm
P = 600 nm
t = 300 nm
Incident lightIncident light
FDTD simulation
Ohashi. et. al.Enhancement of photon tunneling
Enhancement of photon tunneling
DVD Red
<10 Gbits/inch2
Blue
<100 Gbits/inch2
Nano-light
1 Tbits/inch2
Laser Light
Bit Size
Small aperture
Concept of Nano-light RecordingConcept of Nano-light Recording
Diffraction limit
Plasmon enhancement
Near-Field Recording by Plasmon HeadNear-Field Recording by Plasmon Head
φ ~ 100 nm
Pits are recorded on a DVD medium (GeSbTe) by near-field light.HDD-Type Plasmon Head
Strong near-field light from a nano hole