Product Information Photonic Professional

7/29/2019 Product Information Photonic Professional

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OCTOBER 2012 PHOTONIC PROFESSIONAL 1 / 6

P H O T O N I C P R O F E S S I O N A L

TECHNOLOGY & KEY FEATURES

Compact and user-friendly laser lithography system

True 3D micro- and nanofabrication via two-photon polymerization

Ultra-precise piezo controlled structuring

Dip-in laser lithography (DiLL) for highest resolution and minimum

feature size throughout the complete writing volume

Easy structure alignment

Live view of the writing process

High degree of automation:

- Automatic substrate tilt correction

- Autofocus system

- PerfectShapeTM for highest structure accuracy

CAD import via DXF, STL file format

CE certified

Laser safety class 1 for the whole system

Photonic Professional system

COMPONENTS

Optical breadboard

Electronics

Optics cabinet

Piezo stage (xyz-stage)

Inverted microscope

OPTIONS

Motorized xy-scanning stage (100 x 100 mm2)

Various objectives (air, oil immersion, DiLL)

Various sample holders

Turn-key femtosecond fiber lasers

Microscope camera

Cleanroom configuration

OPTICS & RESOLUTION

3D lateral feature size: ≤ 200 nm; typically 150 nm

2D lateral feature size: ≤ 150 nm; typically 120 nm

2D lateral resolution: ≤ 500 nm; typically 300 nm

Vertical resolution: ≤ 1 µm; typically 800 nm

Piezo range: 300 x 300 x 300 µm3

Motorized xy-scanning stage range: 100 x 100 mm2

TRUE 3D LASER

L ITHOGRAPHY

Brandenburg Gate written with a Photonic

Professional system.

Grating of parallel lines, with a center-to-centerrod distance of 300 nm and line widths < 100 nm.

1 µm




MATERIALS

Specially designed proprietary UV-curable photoresists:

IP-L (780), IP-G (780) and IP-Dip SU-8 (25, 50, 100, …)

Ormocere

AZ MiR 701, AR-P 3210

AZ 5214, AZ 9260

Chalcogenide glass (As2S3)

PEG-DA, PETA

And many others …

APPLICATIONS

Micro-optics

Photonic crystals & metamaterials

Free form surfaces

Photonic waveguides / wire bonds

Scaffolds for cell biology

Biomimetics

Micro-/nanofluidics

Micro-robotics

Mechanical metamaterials, ultralight materials

Rapid prototyping And many others …

DIRECT LASER WRITING (DLW)

BY TWO-PHOTON POLYMERIZATION

The technique of 3D Direct Laser Writing (DLW) is based on two-

photon polymerization in photosensitive materials triggered by ultra-

short laser pulses. The absorbed energy causes a chemical and / or

physical change of the photoresist within a small volume pixel

(”voxel”), which may be scaled by the laser power.

The laser lithography system thus fabricates structures by exposing

the photosensitive material along trajectories and/or points defined by

the designed 3D structure. You may consider this procedure like using

a nanometer-sized pen drawing in three dimensions.

Courtesy of Prof. Christian Koos, KarlsruheInstitute of Technology (KIT/IPQ), Germany

References: N. Lindenmann, G. Balthasar,D. Hillerkuss, R. Schmogrow, M. Jordan, J.Leuthold, W. Freude, and C. Koos, “Photonic wire

bonding: a novel concept for chip-scaleinterconnects,” Opt. Express 20, 17667-17677

(2012)




HARDWARE

1. Optical TableThe Photonic Professional system is a stationary unit. The system is installed on an optical breadboard which ispassively vibration isolated by a self-leveling system optical table frame. Nanoscribe also supplies special cleanroom

compatible breadboards and optical table frames. For the passive vibration isolation a compressed air supply with5 - 7 bars air pressure is required.

2. Electronics

The electronic rack is typically placed below the optical table. It contains the Photonic Professional controller, thecomputer and the laser controller. The system is powered with a standard power cord (AC 110 – 240 V,50 – 60 Hz).

3. Optics Cabinet

The laser and the optics are housed by the optics cabinet fixed on the breadboard. The protective housing is equippedwith an electrical interlock switch for laser safety. The complete system is certified laser class 1, thus no special safetymeasures are required to run the Photonic Professional system.

width

length

height




4. a) Piezo Stage

During the writing process the position of the laser focus is controlledwith nanometer precision using a piezo stage. The volume addressed

by the piezo measures 300 x 300 x 300 µm³. The positioningrepeatability within the complete writing volume is better than 10 nm.Inertia related patterning artifacts are compensated via Nanoscribe’s

PerfectShapeTM technology.

4. b) Motorized Stage

The Photonic Professional system is typically equipped with a

motorized positioning stage (xy-stage) which allows for addressingdifferent substrates and/or different positions on a substrate with arepeatability of +/- 1 µm. The range of the motorized stage is100 x 100 mm². For patterning large surface structures the motorized

stage can be used in combination with the z-drive of the piezo.

5. Microscope and Autofocus

The lithography system is based on an inverted microscope. Carl Zeissoptics is used for diffraction limited focusing of the laser into thephotosensitive material. The microscope is equipped with an autofocussystem which allows for precise vertical positioning of the focal spotrelative to the substrate surface.

The writing process in Nanoscribe’s photoresists can be monitored inrealtime using an optional microscope camera. Structural features andexposure doses can thus be easily optimized on the fly.

6. Laser

All Photonic Professional systems are equipped with a pulsed erbiumdoped femtosecond fiber laser source at a center wavelength of 780 nm. The laser power ranges between 45 - 120 mW at a pulselength between 120 - 250 fs, depending on the choice of laser. Theturnkey lasers are completely integrated into the 3D laser lithographysystems by Nanoscribe.

7. Sample Holders

Nanoscribe provides a variety of sample holders for different substratetypes. The standard holder holds up to ten cover slips of 30 mmdiameter with a thickness of 170 µm. Further sample holders areavailable for 1”, 2” and 4” wafers, 5” masks, microscope object slides,microfluidic channels and for our patent-pending DiLL-technology.Nanoscribe also designs holders for your specific applications onrequest.




SOFTWARE

The software package comprises the control interface to the laserlithography system NanoWrite, the CAD-data-format STL converter

tool Nanoslicer , and the editor DeScribe for syntax-highlightedprogramming in GWL - the system’s native scripting language. Anintuitive user interface together with software compatibility to CADdata format (STL and DXF) guarantees easy handling.

Tilt correction, autofocus, substrate positioning, PerfectShapeTM andexposure dose are controlled by NanoWrite for a complete automationof the writing process.

Main application window of NanoWrite 1.6.

DIP-IN LASER LITHOGRAPHY (DiLL)

With its patent-pending Dip-in Laser Lithography (DiLL) technology,Nanoscribe pushes the frontiers of 3D nano-/micro-lithography:

Photoresists are commonly not perfectly index-matched to the oilimmersion system. This results in aberrations which lead to a loss of resolution and laser power with increasing writing depth. To overcomethis problem, Nanoscribe developed and introduced a new route in 3Dmicrofabrication: Dip-in laser lithography (DiLL). In the DiLL processthe objective lens is directly dipped into a liquid photoresist serving asimmersion and photosensitive medium at the same time. Even in case

of a non-index-matched photoresist the homogeneity of the writingprocess is preserved along the optical axis. Using a dedicated DiLLobjective, structure heights in the millimeter range have beenachieved. Combined with our index matched DiLL photoresist IP-Dip,highest resolution is assured.

DiLL-equipped Photonic Professional systems will allow you tofabricate structures with constant resolution over the full structurevolume. Thus high aspect ratios have become feasible that havepreviously been unheard of in optical lithography.

2 µm

Fractionated cube and fractionated pyramid produced with a Photonic Professional system, using the potential of the DiLL-technology.

Calculated laser intensity distribution of the laser

focus within an index-matched photoresist.

3D polymer micro-truss along the publication

“Ultralight Metallic Microlattices” of T.A. Schaedleret al. in Science 334, 962 (2011).

2 µm

http://www.nanoscribe.de/en/products/software-and-updates

http://www.nanoscribe.de/en/products/software-and-updates




TECHNICAL DETAILS PHOTONIC PROFESSIONAL

ELECTRICAL PROPERTIES

main voltage AC 110 – 240 V

main frequency 50 – 60 Hz

power consumption typically ~ 800 VA; at maximum 1,000 VA

main supply overvoltage category II

grounding equipment conductor required

electrical safety according to DIN EN 61010-1:2001

AMBIENT CONDITIONS

operating conditions indoors

operating temperature 22° C (± 4° C)

temperature stability ± 1° C

storage temperature 20° C (± 10° C)

maximum relative humidity 60 %

vibration isolation required (see optical table frame)

WEIGHTS AND MEASURES

total weight 270 kg

dimensions (Photonic Professional system without working desk) 110 x 110 x 140 cm³ (W x L x H)

weight (Photonic Professional system without electronic rack) 220 kg

dimensions (electronic rack) 56 x 60 x 64 cm³ (W x L x H)

weight (electronic rack) 50 kg

minimum wall distance 30 cm

SPECIFICATIONS

3D lateral feature size ≤ 200 nm; typically 150 nm

2D lateral resolution ≤ 500 nm; typically 300 nm

vertical resolution ≤ 1 µm; typically 800 nm

piezo range 300 x 300 x 300 μm³

accessible writing area up to 100 x 100 mm²

OBJECTIVES

oil immersion objective 100x; NA=1.4; WD=170 µm

Dip-in objective 100x; NA=1.3; WD=370 µm

air objective 63x; NA=0.75; WD=1.7 mm

other objectives on request

FEMTOSECOND FIBER LASER

pulse length (depending on the laser type) 120 - 250 fs

maximum laser power (depending on the laser type) 45 - 120 mW

laser center wavelength 780 ± 10 nm

laser repetition rate (depending on the laser type) 40 - 100 MHz

OPTICAL TABLE FRAME

dimensions 110 x 110 x 80 cm³ (W x L x H)

weight 70 kg

air pressure 5 - 7 bar

cleanroom special optical tables available

CONTACT

Nanoscribe GmbH Tel +49 721 60 82 88 40 E-Mail [email protected] 1 Fax +49 721 60 82 88 48 Web www.nanoscribe.de76344 Eggenstein-LeopoldshafenGermany

http://www.nanoscribe.de/

http://www.nanoscribe.de/

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Product Information Photonic Professional