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SEMI Draft Document 4343B Revision of SEMI E52-0703 PRACTICE FOR REFERENCING GASES AND GAS MIXTURES USED IN DIGITAL MASS FLOW CONTROLLERS Background Statement Note: This background statement is not part of the balloted item. It is provided solely to assist the recipient in reaching an informed decision based on the rationale of the activity that preceded the creation of this document. Note: Recipients of this document are invited to submit, with their comments, notification of any relevant patented technology or copyrighted items of which they are aware and to provide supporting documentation. In this context, “patented technology” is defined as technology for which a patent has issued or has been applied for. In the latter case, only publicly available information on the contents of the patent application is to be provided. Additional gases and mixed gases are introduced. The purpose of this ballot is to add code 352 to 364 for new gases and code 909 to 964 for mixed gases. The new list will facilitate the production and use of digital mass flow device. This letter ballot will be reviewed by the MFC Task Force and adjudicated by the Gases Committee during their meetings in San Diego, CA, during the week of 28 October, 2007.

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SEMI Draft Document 4343BRevision of SEMI E52-0703PRACTICE FOR REFERENCING GASES AND GAS MIXTURES USED IN DIGITAL MASS FLOW CONTROLLERS

Background Statement

Note: This background statement is not part of the balloted item. It is provided solely to assist the recipient in reaching an informed decision based on the rationale of the activity that preceded the creation of this document.

Note: Recipients of this document are invited to submit, with their comments, notification of any relevant patented technology or copyrighted items of which they are aware and to provide supporting documentation. In this context, “patented technology” is defined as technology for which a patent has issued or has been applied for. In the latter case, only publicly available information on the contents of the patent application is to be provided.

Additional gases and mixed gases are introduced. The purpose of this ballot is to add code 352 to 364 for new gases and code 909 to 964 for mixed gases. The new list will facilitate the production and use of digital mass flow device.

This letter ballot will be reviewed by the MFC Task Force and adjudicated by the Gases Committee during their meetings in San Diego, CA, during the week of 28 October, 2007.

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SEMI Draft Document 4343BRevision of SEMI E52-0703, PRACTICE FOR REFERENCING GASES, GAS MIXTURES AND VAPORIZABLE MATERIALS USED IN DIGITAL MASS FLOW CONTROLLERS

NOTICE: This document was completely rewritten in 2003.

1 Purpose1.1 To provide a numerical index of gases and gas mixtures used in the semiconductor industry that will give an ordered reference for the gases and gas mixtures when used in mass flow devices. This index or list will facilitate the production and use of digital mass flow devices.

2 Scope2.1 The list includes gases, gas mixtures, and vaporizable materials that can be used in mass flow devices. The list will supplement, not replace, existing DOT/OSHA or other identification systems. For ease of use, the list is presented sorted by gas code, gas name, and symbol for gases and vaporizable materials and by code and mixture percentage for gas mixtures.

NOTICE: This standard does not purport to address safety issues, if any, associated with its use. It is the responsibility of the users of this standard to establish appropriate safety health practices and determine the applicability of regulatory or other limitations prior to use.

3 Limitations3.1 This list does not provide information related to the safe use and intended application of listed materials.

4 Referenced Standards4.1 NIST Standard1

NIST AD732-043 — JANAF Thermochemical Tables, 2nd Edition

4.2 Miscellaneous Publications

Dangerous Properties of Industrial Materials, 5th Edition, N. Irving Sax, © 19792

Encyclopedia of Gas, Air Liquide, © 19763

Matheson Gas Data Book, 6th Edition, © 19804

The Merck Manual Index, 6th Edition5

4.3 Data Sheets

Air Products & Chemicals Data Sheet, © 19916

American Cyanamid Data Sheet7

1 National Institute of Standards and Technology, 100 Bureau Drive, Stop 3460, Gaithersburg, MD 20899-3460, USA. Telephone: 301.975.6478, Website: www.nist.gov2 CRC Press LLC, (Headquarters) 2000 Corporate Blvd., NW, Boca Raton, FL 33431, 561.994.05553 Litton Publishing4 Matheson Gas Products, Inc., 959 Route 46 East, P.O. Box 624, Parsippany, NJ 07054, 973.257.11005 This publication is available from Franklin Electronic Publishers, 1 Franklin Plaza, Burlington, NJ 08060, 1.800.266.56266 Air Products & Chemicals Inc.-PA, Rural Route 1, Tamaqua, PA 18252, 717.467.29817 American Cyanamid Company, CALI Corporation Center, 50 Tice Blvd., Woodcliff Lake, NJ 07675, 201.930.0455

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 1 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Callery Chemical Borazine Data Sheet, © 19848

DuPont Data Sheet9

Schumacher Material Safety Data Sheet, No. R&D 49.3 JN, Revision Date 1/9510

Schumacher Product Data Sheet, No. 23, Revision 310

Air Liquide/Aloha Product Data Sheet March 200514

4.4 Handbooks

Chemical Engineers’ Handbook, 5th Edition11

CRC Handbook of Chemistry and Physics, 75th Edition, © 199412

4.5 Other Standard

Nomenclature of Organic Chemistry, authored by International Union of Pure and Applied Chemistry (IUPAC), edited by J. Rigaudy, © 197913

NOTICE: Unless otherwise indicated, all documents cited shall be the latest published versions.

5 Terminology5.1 Definitions

5.1.1 formula — the structural representation of a gas, indicating the molecular groupings. Formulas are unique and unambiguous except in the case of isomers.

5.1.2 gas code — an integer that is uniquely associated with a particular gas.

5.1.3 gas name — the accepted name for a gas as specified in Nomenclature of Organic Chemistry.

5.1.4 symbol — commonly accepted, unambiguous, and unique identification using ASCII characters with no subscripts, superscripts, or parentheses.

6 Gas Table Sorted by Code

Table 1 Gases Sorted by Code

Code Gas Name Symbol Formula Synonym Ref

1 Helium He He 12 Neon Ne Ne 13 Radon Rn Rn 24 Argon Ar Ar 15 Krypton Kr Kr 16 Xenon Xe Xe 17 Hydrogen H2 H2 1

8 Callery Chemical Company, P.O. Box 429, Pittsburgh, PA 15230, 412.967.41009 E.I. du Pont de Nemours and Company, 1007 Market St., Wilmington, DE 19898, 302.774.100010 Schumacher, 1969 Palomar Oaks Way, Carlsbad, CA 92009-1307, 619.931.9555

11 McGraw-Hill Inc., Princeton Rd., Hightstown, NJ 08520, 609.426.593412 CRC Press LLC Headquarters,2000 NW Corporate Blvd, Boca Raton,FL 33431, USA, Phone: 1(800)272-7737 or (561)994-0555 Fax: 1(800)374-3401 or (561)989-973213 This publication is available from Franklin Book Company, 7804 Montgomery Ave., Elkon’s Park, PA 19027, 215.635.525214 AIR LIQUIDE S.A., Tour AREVA 1 place de la Coupole 92084 Paris

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 2 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

8 Air Air 19 Carbon Monoxide CO CO 110 Hydrogen Bromide HBr HBr 111 Hydrogen Chloride HCl HCl 112 Hydrogen Fluoride HF HF 113 Nitrogen N2 N2 114 Deuterium D2 H2

2 D2 215 Oxygen O2 O2 116 Nitric Oxide NO NO 217 Hydrogen Iodide HI HI 118 Fluorine F2 F2 119 Chlorine Cl2 Cl2 120 Water Vapor H2O H2O 221 Bromine Br2 Br2 222 Hydrogen Sulfide H2S H2S 123 Hydrogen Selenide H2Se H2Se 124 Hydrogen Cyanide HCN HCN 125 Carbon Dioxide CO2 CO2 126 Nitrogen Dioxide NO2 NO2 127 Nitrous Oxide N2O N2O 128 Methane CH4 CH4 129 Ammonia NH3 NH3 130 Ozone O3 O3 131 Phosphine PH3 PH3 132 Sulfur Dioxide SO2 SO2 133 Methyl Fluoride CH3F CH3F Fluoromethane or Methane,

Fluoro1

34 Carbonyl Sulfide COS COS 135 Arsine AsH3 AsH3 136 Methyl Chloride CH3Cl CH3Cl Chloromethane or Methane,

Chloro1

37 Cyanogen Chloride ClCN ClCN 138 Ethylene C2H4 CH2=CH2 Ethene 139 Silane SiH4 SiH4 140 Carbon Disulfide CS2 CS2 241 Oxygen Difluoride OF2 OF2 142 Acetylene C2H2 HC=CH Ethyne 143 Germane GeH4 GeH4 144 Methyl Bromide CH3Br CH3Br Bromomethane or Methane,

Bromo1

45 Ethylene Oxide C2H4O C2H4O Oxirane, 1,2-epoxyethane 146 Carbonyl Fluoride CF2O CF2O 147 Methyl Mercaptan CH4S CH3SH 148 Boron Trifluoride BF3 BF3 149 Fluoroform CHF3 CHF3 Trifluoromethane or Methane, 1

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 3 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

Trifluoro, F-23, R-2350 Hydrazine N2H4 H2NNH2 251 Vinyl Fluoride C2H3F H2C=CHF 152 Methylamine CH5N CH3NH2 Amino Methane,

Monomethylamine2

53 Nitrogen Trifluoride NF3 NF3 154 Ethane C2H6 CH3CH3 155 Vinyl Chloride C2H3Cl CH2=CHCl Chloroethylene 156 Vinyl Bromide C2H3Br CH2=CHBr 157 Chlorodifluoromethane CHClF2 CClHF2 F-22, R-22 158 Diborane B2H6 B2H6 159 Cyanogen C2N2 NCCN Oxalodinitrile 160 Phosgene CCl2O CCl2O Carbonyl Chloride 161 Cyclopropane C3H6 C3H6 162 Phosphorus Trifluoride PF3 PF3 163 Carbon Tetrafluoride CF4 CF4 Tetrafluoromethane or Methane,

Tetrafluoro1

64 Difluoroethylene C2H2F2 CH2=CF2 G-1132A,Vinylidenefluoride 165 Dichlorofluoromethane CHCl2F CHCl2F F-21, R-21 166 Allene C3H4 CH2=C=CH2 Propadiene 167 Dichlorosilane SiH2Cl2 SiH2Cl2 168 Methyl Acetylene C3H4 CH3C=CH Propyne 169 Propylene C3H6 CH3CH=CH2 Propene 170 Boron Trichloride BCl3 BCl3 171 Chloroform CHCl3 CHCl3 Trichloromethane or Methane,

Trichloro2

72 Perchloryl Fluoride ClO3F ClO3F 173 Dimethyl Ether C2H6O CH3OCH3 Methyl ether 174 Chlorotrifluoromethane CClF3 ClCF3 F-13, R-13 175 Ethyl Chloride C2H5Cl C2H5Cl Chloroethane or Ethane, Chloro

or Ethyl Chloride1

76 Bromine Trifluoride BrF3 BrF3 177 Chlorine Trifluoride ClF3 ClF3 178 Nitrogen Trioxide N2O3 N2O3 179 Boron Tribromide BBr3 BBr3 180 Bromotrifluoromethane CBrF3 BrCF3 F-13B1, R-13B1 181 Methyl vinyl ether C3H6O H3C-O-CH=CH2 182 Difluoroethane C2H4F2 CH3CHF2 Ethylidene Fluoride, R-152A 183 Tribromomethane CHBr3 CHBr3 Bromoform 284 Dichlorodifluoromethane CCl2F2 CCl2F2 F-12, R-12 185 Dimethylamine C2H7N (CH3)2NH 186 Sulfur Tetrafluoride SF4 SF4 187 Sulfuryl Fluoride SO2F2 SO2F2 188 Silicon Tetrafluoride SiF4 SiF4 189 Propane C3H8 CH3CH2CH3 1

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 4 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

90 Intentionally Left Blank91 Trichlorofluoromethane CCl3F CCl3F F-11, R-11 192 Intentionally Left Blank93 Ethyl Acetylene C4H6 CH3CH2C=CH 194 Tetrafluorethylene C2F4 F2C=CF2 195 Nitrogen Tetroxide N2O4 N2O4 Dinitrogenoxide 296 Arsenic Pentafluoride AsF5 AsF5 297 Disilane Si2H6 Si2H6 298 Transbutene C4H8 CH3CH=CHCH3 299 Germanium Tetrafluoride GeF4 GeF4 Tetrafluorogermane 2

100 Butadiene C4H6 CH2=CH-CH=CH2 1,3-butadiene 1101 Carbon Tetrachloride CCl4 CCl4 Tetrachloromethane or Methane,

Tetrachloro2

102 Phosphorous Oxychloride POCl3 POCl3 2103 Difluorochloroethane C2H3ClF2 CF2ClCH3 F-142B, R-142B 1104 Butene C4H8 CH3CH2CH=CH2 1-Butene 1105 Bromotrifluoroethylene C2BrF3 CF2CFBr 1106 Isobutene C4H8 (CH3)2C=CH2 Isobutylene,Methylpropene 2107 Cisbutene C4H8 CH3CH=CHCH3 Cis-2-Butene 2108 Silicon Tetrachloride SiCl4 SiCl4 Tetrachlorosilane 2109 Trimethylamine C3H9N (CH3)3N 1110 Sulfur Hexafluoride SF6 SF6 1111 Isobutane C4H10 (CH3)2CHCH3 2-Methylpropane or Propane, 2-

Methyl1

112 Trichloroethane C2H3Cl3 CH3CCl3 TCA, Methylchloroform 2113 Germanium Tetrachloride GeCl4 GeCl4 Tetrachlorogermane 2114 Titanium Tetrachloride TiCl4 TiCl4 2115 Iodine Pentafluoride IF5 IF5 1116 Bromine Pentafluoride BrF5 BrF5 1117 Butane C4H10 CH3(CH2)2CH3 1118 Hexafluoroethane C2F6 F3CCF3 F-116, Perfluoroethane 1119 Chloropentafluoroethane C2ClF5 ClCF2CF3 F-115, R-115 1120 Methylbutene C5H10 CH3CH2CCH3=CH2 2-Methyl-1-Butene 1121 Tungsten Hexafluoride WF6 WF6 2122 Dimethylpropane C5H12 (CH3)4C Neopentane 2123 Uranium Hexafluoride UF6 UF6 2124 Molybdenum Hexafluoride MoF6 MoF6 2125 Dichlorotetrafluoroethane C2Cl2F4 F3CCCl2F F-114, R-114 1126 Trichlorotrifluoroethane C2Cl3F3 CF2ClCCl2F F-113, R-113 1127 Hexane C6H14 CH3(CH2)4CH3 2128 Perfluoropropane C3F8 CF2(CF3)2 1129 Octafluorocyclobutane C4F8 (CF2)4 Perfluorocyclobutane or

Cyclobutane, Perfluoro1

130 Dibromotetrafluorethane C2Br2F4 BrF2CCF2Br F-114B2, R-114B2 1131 Trimethoxyborine C3H9BO3 B(OCH3)3 TMB, Trimethyl borate 2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 5 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

132 Trimethylphosphorous C3H9P (CH3)3P Trimethylphosphine, TMP 2133 Trimethyl phosphite C3H9PO3 (CH3O)3P TMPi, Trimethoxyphosphine 2134 Difluorosilane SiH2F2 SiH2F2 10135 Dimethylzinc C2H6Zn (CH3)2Zn 3136 Ethanol C2H6O CH3CH2OH 2137 Halothane C2HBrClF3 BrClHCCF3 6138 Hexafluoropropylene C3F6 CF3CF=CF2 Perfluoropropylene or Propylene,

Perfluoro1

139 Hexamethyldisilane C6H18Si2 (CH3)3Si2(CH3)3 HMDSi, HMDS 3140 Nickel Carbonyl C4O4Ni Ni(CO)4 1141 Nitrosyl Chloride NOCl NOCl 1142 Pentaborane B5H9 B5H9 2143 Phosphorus Pentafluoride PF5 PF5 1144 Tetraethoxysilane C8H20O4Si (C2H5O)4Si TEOS 2145 Tin Tetrachloride SnCl4 SnCl4 Tetrachlorostannane 2146 Tributylaluminum C12H27Al (CH3CH2CH2CH2)3Al TBAl 3147 Trichlorosilane SiHCl3 SiHCl3 5148 Triethylgallium C6H15Ga (C2H5)3Ga TEGa 4149 Trimethylaluminum C3H9Al Al(CH3)3 TMA, TMAl 4150 Trimethylantimony C3H9Sb (CH3)3Sb Trimethylstibene 2151 Trimethylarsenic C3H9As (CH3)3As Trimethylarsine, TMAs 2152 Trimethylgallium C3H9Ga Ga(CH3)3 TMGa 4153 Trimethylindium C3H9In (CH3)3In TMIn 3154 Diethylsilane C4H12Si (C2H5)2SiH2 2155 Pentafluoroethane C2HF5 CF3CHF2 F-125, R-125 9156 Tetrafluoroethane C2H2F4 CH2FCF3 R-134A, F-134A 2157 Tetrafluorohydrazine N2F4 F2NNF2 Dinitrogen Tetrafluoride 1158 Tetramethylcyclotetra-siloxane C4H16Si4O4 (CH3)4H4(SiO)4 TOMCATS 7159 Tritium T2 H3

2 T2 2160 Difluoromethane CH2F2 CH2F2 Methylene Fluoride 2161 Tertiarybutylarsine C4H11As C(CH3)3AsH2 TBA 8162 Tertiarybutylphosphine C4H11P C(CH3)3PH2 TBP 8163 Triethyl borate C6H15O3B B(OC2H5)3 TEB, Triethoxyborane 2164 Dimethylaluminum hydride C2H7Al (CH3)2AlH DMAH 13165 Trimethylaminealane C3H12AlN (CH3)3NAlH3 TMAA 11166 Dimethylethylaminealane C4H14NAl (CH3)2C2H5NAlH3 DMEAA 14167 Nitric Acid HNO3 HNO3 2168 Tetrachloroethylene C2Cl4 Cl2C=CCl2 Perchloroethylene orEthylene,

Perchloro2

169 Ethyleneglycol C2H6O2 HOCH2CH2OH Ehtanediol, Glycol 2170 Hexanediol-1,6 C6H14O2 HO(CH2)6OH Hexyleneglycol,

Hexamethyleneglycol2

171 Sulfuric Acid H2SO4 H2SO4 2172 Chlorobenzene C6H5Cl C6H5Cl Chlorobenzol, Phenylchloride 2173 Acetonitrile C2H3N CH3CN 2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 6 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

174 Ethylbenzene C8H10 C6H5C2H5 2175 Intentionally Left Blank176 Methanol CH4O CH3OH Methyl Alcohol 2177 Methylcyclohexane C7H14 CH3C6H11 Hexahydrotoluene 2178 4-Methyl, 1-Pentene C6H12 (CH3)2CHCH2CH=CH2 2179 o-Xylene C8H10 1,2-(CH3)2C6H4 1,2-Dimethylbenzene 2180 Phenol C6H6O C6H5OH 2181 Toluene C7H8 C6H5CH3 Methylbenzene 2182 Tetrahydrofuran C4H8O C4H8O 2183 Methyltrichlorosilane CH3Cl3Si CH3SiCl3 MTS 2184 Acetone C3H6O CH3COCH3 2185 Methylsilane CH6Si CH3SiH3 Monomethylsilane 2186 2,2 Dichloro 1,1,1 Trifluoroethane C2HCl2F3 CHCl2-CF3 Freon 123, Suva 123 2187 Isopropyl Alcohol C3H8O (CH3)2CHOH 2-Propanol 2188 Diethoxydimethylsilane C6H16O2Si (C2H5O)2Si(CH3)2 2189 Sulfur Monochloride S2Cl2 S2Cl2 2190 Trimethylsilane C3H10Si (CH3)3SiH 2191 Dichloroethylene -trans C2H2Cl2 CHCl=CHCl 2192 Hexafluorobenzene C6F6 C6F6 2193 Phosphorus Trichloride PCL3 PCl3 2194 Titanium Tetraisopropoxide C12H28OTi Ti(OC3H7)4 1195 Arsenic Trifluoride AsF3 AsF3 2196 Arsenic Triiodine AsI3 AsI3 2197 Benzene C6H6 C6H6 2198 Borazine B3N3H6 H3B3N3H3 14199 Bromochlorodifluoromethane CBrClF2 BrClCF2 2200 Carbon Tetrabromide CBr4 CBr4 2201 Chlorine Dioxide ClO2 ClO2 2202 Chlorine Pentafluoride ClF5 ClF5 2203 Chlorodifluoroethane C2H3ClF2 CH3-CF2Cl R-142b 4204 Chlorodifluoroethylene C2HClF2 CF2=CHCl R-1122, FREON-1122 4205 Chlorosilane SiH3Cl SiH3Cl 2206 Chlorotrifluoroethylene C2ClF3 FCCl=CF2 R-1113, FREON-1113 2207 Cyclobutane C4H8 C4H8 Tetramethylene 2208 Diazomethane CH2N2 CH2N2 Acomethylene 2209 Dibromodifluoromethane CBr2F2 Br2CF2 R-12B2, FREON-12B2 2210 Dichloroethylene C2H2Cl2 CH2=CCl2 Vinylidene Chloride 2211 Dichloroethylene -cis C2H2Cl2 CHCl=CHCl 2212 Dichlorodimethylsilane C2H6SiCl2 (CH3)2SiCl2 2213 Diethylamine C4H11N (C2H5)2NH 2214 Diethylzinc C4H10Zn Zn(C2H5)2 2216 Arsenic Trichloride AsCl3 AsCl3 2217 Digermane Ge2H6 Ge2H6 2218 Dimethylcadmium C2H6Cd (CH3)2Cd 2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 7 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

219 Dimethylsilane C2H8Si (CH3)2SiH2 2220 Dimethyltellurium C2H6Te (CH3)2Te 2221 Ethyl Fluoride C2H5F CH3CH2F Fluoroethane, R-161, FREON-

1612

222 Ethylene Dichloride C2H4Cl2 ClCH2CH2Cl 1,2 Dichloroethane 2223 Fluoroacetylene C2HF FC=CH 2224 Fluorotriethoxysilane C6H15OSiF (C2H5O)3SiF 2225 Hexafluoroacetone C3F6O (CF3)2CO 2226 Aluminum Trifluoride AlF3 AlF3 2227 Hexamethyldisilazane C6H19Si2N (CH3)6Si2NH 2228 Hexamethyldisiloxane C6H18Si2O (CH3)6Si2O 2229 Hydrogen telluride H2Te H2Te 2230 Iron Carbonyl C5O5Fe Fe(CO)5 2231 Isopentane C5H12 CH3CH2CH(CH3)2 2-Methylbutane 2232 Difluoroamidogen NF2 NF2 2233 Monoethylamine C2H7N C2H5NH2 2234 Monomethyl hydrazine CH6N2 CH3N2H3 2235 Nitromethane CH3NO2 CH3NO2 2236 Octafluorobutane C4F8 C4F8 3237 Octane C8H18 CH3(CH2)6CH3 2238 Oxygen Dichloride OCl2 OCl2 2239 Pentaborane(11) B5H11 B5H11 2240 Pentane C5H12 CH3(CH2)3CH3 2241 Perfluorobutane C4F10 C4F10 3242 Arsenic Tribromide AsBr3 AsBr3 2243 Rhenium Hexafluoride ReF6 ReF6 2244 Deuteriumsilane SiD4 SiH2

4 2245 Stibine SbH3 SbH3 2246 Sulfur Trioxide SO3 SO3 2247 Tellurium Hexafluoride TeF6 TeF6 2248 Tetrachlorodiborane B2Cl4 B2Cl4 2249 Tetrafluorodiborane B2F4 B2F4 2250 Tetramethylgermanium C4H12Ge (CH3)4Ge 2251 Tetramethylsilane C4H12Si (CH3)4Si 2252 Tetramethyltin C4H12Sn (CH3)4Sn 2253 Tetrasilane Si4H10 Si4H10 2254 Titanium Tetraiodide TiI4 TiI4 2255 Tribromostibine SbBr3 SbBr3 2256 Trichlorostibine SbCl3 SbCl3 2257 Triethylaluminum C6H15Al (C2H5)3Al 2258 Triethylantimony C6H15Sb (C2H5)3Sb 2259 Trifluoroacetic Acid CF3CO2H CF3CO2H 2260 Trifluoroacetonitrile C2F3N F3CCN 2261 Trifluorosilane SiHF3 SiHF3 2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 8 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

262 Triisobutylaluminum C12H27Al (C4H9)3Al 2263 Xylene m- C8H10 1,3-(CH3)2C6H4 1,3 Dimethyl Benzene 3264 Xylene p- C8H10 1,4-(CH3)2C6H4 1,4 Dimethyl Benzene 3265 Dichloromethane CH2Cl2 CH2Cl2

266 Octafluorocyclopentene C5F8 CF2=C(CF3)-CF=CF2 3267 Hexafluoropropane C3H2F6 CH2FCF2CF3 1,1,1,2,2,3-Hexafluoropropane 2268 Methylene Bromide CH2Br2 CH2Br2 UN 2664; Methyl dibromide,

Dibromomethane1

269 Hydrazoic Acid HN3 HN3 1270 Hexafluoro-2-Butyne C4F6 CF3C=CCF3 Bis(trifluoromethyl)acetylene;

Perfluoro-2-butyne3

271 Butanol-1 C4H10O CH3CH2CH2CH2OH 1-butanol 3272 Hexafluoroacetylacetone C5H2F6O2 C5H2F6O2 1273 Tungsten Hexacarbonyl C6O6W W(CO)6 1274 Triethyl arsenate C6H15O4As (C2H5O)3AsO TEAsat 1275 Hafnium Tetranitrate HfN4O12 Hf(NO3)4 Hafnium nitrate 1276 Acrylonitrile C3H3N CH2=CHCN Acrylon; Propenenitrile 3277 Trimethylborane C3H9B (CH3)3B 2278 Silicon tetrabromide Br4Si Br4Si SiBr4; Tetrabromosilane; Silicon

(IV) bromide2

279 Tantalum (V) ethoxide C10H25O5Ta Ta(OC2H5)5 Ta(OEt)5 2

280 Diphenylmethylenediamine C13H14N2 C13H14N2 2281 Diphenylmethan-4,4'-diisocyanat C15H10N2O C15H10N2O UN 2489; Benzene,1,1'-

methylenebis(isocyanatophenyl)2

282 Tetrakis(diethylamido)titanium C16H40N4Ti Ti(N(CH3)2)4 TDEAT 2283 Acetic acid C2H4O2 CH3COOH Ethanoic acid; UN 2789; 2284 Dimethyl selenide C2H6Se C2H6Se (CH3)2Se; Selenium dimethyl;

Dimethylselenium2

285 Ethoxysilane C2H8OSi C2H8OSi 2286 Hexafluoropropylene oxide C3F6O C3F6O Hexafluoroepoxypropane 2287 Trimethoxysilane C3H10O3Si C3H10O3Si 2288 Pentafluoropropanol C3H3F5O C2F5CH2OH Perfluorodihydropropanol,

1,1,1,2,2-Pentafluoropropane2

289 Acrylic acid C3H4O2 C3H4O2 2-Propenoic acid; CH2=CHCOOH

2

290 Trifluoropropane C3H5F3 C3H5F3 1,1,1-Trifluoropropane; CH3CH2CF3

2

291 Ethyl Formate C3H6O2 HCO2C2H5 Ethyl ester formic acid; HC00C2H5

3

292 Methyl acetate C3H6O2 CH3CO2CH3 Methyl ester acetic acid; UN 1231

3

293 Propenamine C3H7N C3H7N Allylamine; Monoallylamine; UN 2334

2

294 Trimethyl ester phosphoric acid C3H9O4P C3H9O4P Trimethyl phosphate; Trimethoxyphosphine oxide

2

295 Heptafluoropropane C3HF7 C3HF7 1,1,1,2,3,3,3-Heptafluoropropane, Freon 227

2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 9 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

296 Hexafluorocyclobutene C4F6 C4F6 Perfluorocyclobutene; 1,2,3,3,4,4-Hexafluorocyclobutene

3

297 Hexafluoro butadiene-1,3 C4F6 CF2=CF-CF=CF2 Perfluorobutadiene-1,3; 3298 Diethyl sulfide C4H10S C4H10S UN 2375; Ethyl sulfide; 2299 Tetramethoxygermanium C4H12GeO4 (CH3O)4Ge Ge(OMe)4 2300 Dimethoxydimethylsilane C4H12O2Si (CH3O)2Si(CH3)2 KBM 22 2301 Tetramethoxysilane C4H12O4Si (CH3O)4Si Silicic Acid (H4SiO4);

Tetramethyl ester; Tetramethyl silicate

2

302 Tetramethyllead C4H12Pb (CH3)4Pb (CH3)4Pb; Plumbane, tetramethyl;

2

303 Trimethylvinylsilane C5H12Si (CH3)3SiCH=CH2 Vinyltrimethylsilane; CH2=CHSi(CH3)3

2

304 Pyridine C5H5N C5H5N Azabenzene; Azine 2305 Methyl methacrylate polymer C5H8O2 CH2=C(CH3)COOCH3 Poly(methyl methacrylate);2-

Methyl1-2-propenoic acid2

306 Triethyarsine C6H15As (C2H5)3As Triethylarsenic 2307 Triethoxyarsine C6H15AsO3 (C2H5O)3As Triethyl ester arsenous acid;

Triethyl arsenite2

308 Triethoxyborane C6H15BO3 (C2H5O)3B Boron triethoxide; triethyl borate 2309 Triethylindium C6H15In (C2H5)3In Indium, triethyl 2310 Triethylamine C6H15N (C2H5)3N UN 1296; 2311 Triethoxyphosphine C6H15O3P (C2H5O)3P Triethyl phosphite; UN 2323;

Phosphorous acid, triethyl ester2

312 Triethoxysilane C6H16O3Si (C2H5O)3SiH 2313 Triethylsilane C6H16Si (C2H5)3SiH (C2H5)3SiH, TES 2314 Trimethylisoxazole C6H9NO CH3CH=CHCH=CHCON

H2

3,4,5-Trimethylisoxazole, Sorbamide

3

315 Tetraethylgermane C8H20Ge (C2H5)4Ge (C2H5)4Ge; Germanium tetraethyl

2

316 Tetraethyl lead C8H20Pb (C2H5)4Pb Plumbane, tetraethyl; UN 1649 2317 Tetraethylsilane C8H20Si C8H20Si Tetraethylsilane;

Tetraethylsilicon; (C2H5)4Si2

318 Tetrakis(dimethylamido)titanium C8H24N4Ti [(CH3)2N]4Ti TDMAT 2

319 Styrene C8H8 C6H5CH=CH2 Ethenylbenzene; UN 2055 2320 Triallylamine C9H15N (CH2=CHCH2)3N Tri-2-propenylamine 2321 Trifluoromethylhypofluorite CF4O CF3OF CF3OF; Hypofluorous acid;

trifuoromethyl ester2

322 Formaldehyde CH2O HCHO H2C0; UN 1198; BFV 2323 Iodomethane CH3I CH3I Methyl iodide; Un 2644 2324 Xenon difluoride XeF2 XeF2 F2Xe; Xenon fluoride 2325 Selenium hexafluoride SeF6 SeF6 UN 2194; Selenium fluoride 2326 Disilane hexafluoride SiF6 SiF6 F6Si2; Hexafluorodisilane 2327 Fluorosilane SiH3F SiH3F H3FSi 2328 Trisilane Si3H8 Si3H8 Silicopropane; Trisilicane; H8Si3 2329 Mercury Hg Hg UN 2809 2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 10 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

330 Zinc Zn Zn UN 1383 2331 Acetaldehyde methoxy C3H6O2 CH3OCH2CHO 3332 Acetone,hydroxy C3H6O2 CH3COCH2OH Acetol 3333 Glycol methylene ether C3H6O2 CH2-O-CH2-CH2-O 1,3 – Dioxolane, Formal glycol 3334 Propanoic acid C3H6O2 CH3CH2CO2H Propionic acid 3335 Glycidol C3H6O2 CH2CHCH2OH 1-Propanol, 2,3 epoxy 3336 Butanol-2 C4H10O CH3CH2CH(OH)CH3 3337 Tertiary Butyl Alcohol C4H10O (CH3)3COH TBA, t-Butanol, t-Butyl alcohol 3338 Diethyl ether C4H10O C2H5OC2H5 3339 Methyl propyl ether C4H10O CH3OC3H7 3340 Methyl isopropyl ether C4H10O (CH3)2CHOCH3 3341 Isobutyl Alcohol C4H10O (CH3)2CHCH2OH 3342 3-one-2,5-dimethyl hexadiene C8H10 CH2=C(CH3)C=CC(CH3)

CH2

3

343 1,7-Octadiyne C8H10 HC=C(CH2)4C=CH 3344 2,6-Octadiyne C8H10 CH3C=CCH2CH2C=CCH3 3345 1,3,5,7-Octatetraene C8H10 CH2=CHCH=CHCH=CH

CH=CH2

3

346 Niobium Pentachloride NbCl5 NbCl5 3347 Disilabutane Si2C2H10 Si2C2H10 3348 Ethane,1,1,1-Trifluoro C2H3F3 C2H3F3 HFC-143a 3349 Diselenium Dichloride Se2Cl2 Se2Cl2 3350 Deuterium Ammonia ND3 ND3 3351 Perfluoro (Oxacyclopentane) C4F8O C4F8O 3352 Aluminum Trichloride AlCl3 AlCl3 Trichloroalumane 12353 Intentionally Left Blank354 2,2,3-trifluoro-3-(1,1,2,3,3-

pentafluoroprop-2-enyl)oxiraneC5F8O C5F80 Epoxyperfluorocyclopentene 12

355 Intentionally Left Blank356 Intentionally Left Blank357 Natural Gas NG NG 2358 Sulfur Trioxide SO3 SO3 Sulfan 12359 Tetrakis(ethylmethylamido)

HafniumC12H32HfN4 [(CH3CH2)(CH3)N]4Hf TEMAH 12

360 Trifluoroiodomethane CF3I CF3I 12361 Methyl-(methylethyl)-

cyclohenxadieneC10H16 ATRP, Alpha-Terpinene

362 MethylDiethoxySilane C5H14O2Si CH3SiH(OC2H5)2 mDEOE, DEMS363 Bicycloheptadiene C7H8 C7H8 BCHD, Norbornadiene364 OctaMethylCyclo TetraSiloxane C8H24O4Si4 (CH3CH3SiO)4 OMCTS

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 11 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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7 Gas Table Sorted by Name

Table 2 Gases Sorted by Name

Code Gas Name Symbol Formula Synonym Ref

345 1,3,5,7-Octatetraene C8H10 CH2=CHCH=CHCH=CHCH=CH2

3

343 1,7-Octadiyne C8H10 HC=C(CH2)4C=CH 3186 2,2 Dichloro 1,1,1 Trifluoroethane C2HCl2F3 CHCl2-CF3 Freon 123, Suva 123 2354 2,2,3-trifluoro-3-(1,1,2,3,3-

pentafluoroprop-2-enyl)oxiraneC5F8O C5F80 Epoxyperfluorocyclopentene 12

344 2,6-Octadiyne C8H10 CH3C=CCH2CH2C=CCH3 3342 3-one-2,5-dimethyl hexadiene C8H10 CH2=C(CH3)C=CC(CH3)

CH2

3

178 4-Methyl, 1-Pentene C6H12 (CH3)2CHCH2CH=CH2 2331 Acetaldehyde methoxy C3H6O2 CH3OCH2CHO 3283 Acetic acid C2H4O2 CH3COOH Ethanoic acid; UN 2789; 2184 Acetone C3H6O CH3COCH3 2332 Acetone,hydroxy C3H6O2 CH3COCH2OH Acetol 3173 Acetonitrile C2H3N CH3CN 242 Acetylene C2H2 HC=CH Ethyne 1289 Acrylic acid C3H4O2 C3H4O2 2-Propenoic acid;

CH2=CHCOOH2

276 Acrylonitrile C3H3N CH2=CHCN Acrylon; Propenenitrile 38 Air Air 1

66 Allene C3H4 CH2=C=CH2 Propadiene 1352 Aluminum Trichloride AlCl3 AlCl3 Trichloroalumane 12226 Aluminum Trifluoride AlF3 AlF3 229 Ammonia NH3 NH3 14 Argon Ar Ar 1

96 Arsenic Pentafluoride AsF5 AsF5 2242 Arsenic Tribromide AsBr3 AsBr3 2216 Arsenic Trichloride AsCl3 AsCl3 2195 Arsenic Trifluoride AsF3 AsF3 2196 Arsenic Triiodine AsI3 AsI3 235 Arsine AsH3 AsH3 1197 Benzene C6H6 C6H6 2363 Bicycloheptadiene C7H8 C7H8 BCHD, Norbornadiene198 Borazine B3N3H6 H3B3N3H3 1479 Boron Tribromide BBr3 BBr3 170 Boron Trichloride BCl3 BCl3 148 Boron Trifluoride BF3 BF3 121 Bromine Br2 Br2 2116 Bromine Pentafluoride BrF5 BrF5 176 Bromine Trifluoride BrF3 BrF3 1199 Bromochlorodifluoromethane CBrClF2 BrClCF2 2105 Bromotrifluoroethylene C2BrF3 CF2CFBr 1

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 12 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

80 Bromotrifluoromethane CBrF3 BrCF3 F-13B1, R-13B1 1100 Butadiene C4H6 CH2=CH-CH=CH2 1,3-butadiene 1

117 Butane C4H10 CH3(CH2)2CH3 1271 Butanol-1 C4H10O CH3CH2CH2CH2OH 1-butanol 3336 Butanol-2 C4H10O CH3CH2CH(OH)CH3 3104 Butene C4H8 CH3CH2CH=CH2 1-Butene 125 Carbon Dioxide CO2 CO2 140 Carbon Disulfide CS2 CS2 29 Carbon Monoxide CO CO 1

200 Carbon Tetrabromide CBr4 CBr4 2101 Carbon Tetrachloride CCl4 CCl4 Tetrachloromethane or Methane,

Tetrachloro2

63 Carbon Tetrafluoride CF4 CF4 Tetrafluoromethane or Methane, Tetrafluoro

1

46 Carbonyl Fluoride CF2O CF2O 134 Carbonyl Sulfide COS COS 119 Chlorine Cl2 Cl2 1201 Chlorine Dioxide ClO2 ClO2 2202 Chlorine Pentafluoride ClF5 ClF5 277 Chlorine Trifluoride ClF3 ClF3 1172 Chlorobenzene C6H5Cl C6H5Cl Chlorobenzol, Phenylchloride 2203 Chlorodifluoroethane C2H3ClF2 CH3-CF2Cl R-142b 4204 Chlorodifluoroethylene C2HClF2 CF2=CHCl R-1122, FREON-1122 457 Chlorodifluoromethane CHClF2 CClHF2 F-22, R-22 171 Chloroform CHCl3 CHCl3 Trichloromethane or Methane,

Trichloro2

119 Chloropentafluoroethane C2ClF5 ClCF2CF3 F-115, R-115 1205 Chlorosilane SiH3Cl SiH3Cl 2206 Chlorotrifluoroethylene C2ClF3 FCCl=CF2 R-1113, FREON-1113 274 Chlorotrifluoromethane CClF3 ClCF3 F-13, R-13 1107 Cisbutene C4H8 CH3CH=CHCH3 Cis-2-Butene 259 Cyanogen C2N2 NCCN Oxalodinitrile 137 Cyanogen Chloride ClCN ClCN 1207 Cyclobutane C4H8 C4H8 Tetramethylene 261 Cyclopropane C3H6 C3H6 114 Deuterium D2 H2

2 D2 2350 Deuterium Ammonia ND3 ND3 3244 Deuteriumsilane SiD4 SiH2

4 2208 Diazomethane CH2N2 CH2N2 Acomethylene 258 Diborane B2H6 B2H6 1209 Dibromodifluoromethane CBr2F2 Br2CF2 R-12B2, FREON-12B2 2130 Dibromotetrafluorethane C2Br2F4 BrF2CCF2Br F-114B2, R-114B2 184 Dichlorodifluoromethane CCl2F2 CCl2F2 F-12, R-12 1212 Dichlorodimethylsilane C2H6SiCl2 (CH3)2SiCl2 2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 13 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

210 Dichloroethylene C2H2Cl2 CH2=CCl2 Vinylidene Chloride 2211 Dichloroethylene -cis C2H2Cl2 CHCl=CHCl 2191 Dichloroethylene -trans C2H2Cl2 CHCl=CHCl 265 Dichlorofluoromethane CHCl2F CHCl2F F-21, R-21 1265 Dichloromethane CH2Cl2 CH2Cl2

67 Dichlorosilane SiH2Cl2 SiH2Cl2 1125 Dichlorotetrafluoroethane C2Cl2F4 F3CCCl2F F-114, R-114 1188 Diethoxydimethylsilane C6H16O2Si (C2H5O)2Si(CH3)2 2338 Diethyl ether C4H10O C2H5OC2H5 3298 Diethyl sulfide C4H10S C4H10S UN 2375; Ethyl sulfide; 2213 Diethylamine C4H11N (C2H5)2NH 2154 Diethylsilane C4H12Si (C2H5)2SiH2 2214 Diethylzinc C4H10Zn Zn(C2H5)2 2232 Difluoroamidogen NF2 NF2 2103 Difluorochloroethane C2H3ClF2 CF2ClCH3 F-142B, R-142B 182 Difluoroethane C2H4F2 CH3CHF2 Ethylidene Fluoride, R-152A 164 Difluoroethylene C2H2F2 CH2=CF2 G-1132A,Vinylidenefluoride 1160 Difluoromethane CH2F2 CH2F2 Methylene Fluoride 2134 Difluorosilane SiH2F2 SiH2F2 10217 Digermane Ge2H6 Ge2H6 2300 Dimethoxydimethylsilane C4H12O2Si (CH3O)2Si(CH3)2 KBM 22 273 Dimethyl Ether C2H6O CH3OCH3 Methyl ether 1284 Dimethyl selenide C2H6Se C2H6Se (CH3)2Se; Selenium dimethyl;

Dimethylselenium2

164 Dimethylaluminum hydride C2H7Al (CH3)2AlH DMAH 1385 Dimethylamine C2H7N (CH3)2NH 1218 Dimethylcadmium C2H6Cd (CH3)2Cd 2166 Dimethylethylaminealane C4H14NAl (CH3)2C2H5NAlH3 DMEAA 14122 Dimethylpropane C5H12 (CH3)4C Neopentane 2219 Dimethylsilane C2H8Si (CH3)2SiH2 2220 Dimethyltellurium C2H6Te (CH3)2Te 2135 Dimethylzinc C2H6Zn (CH3)2Zn 3281 Diphenylmethan-4,4'-diisocyanat C15H10N2O C15H10N2O UN 2489; Benzene,1,1'-

methylenebis(isocyanatophenyl)2

280 Diphenylmethylenediamine C13H14N2 C13H14N2 2349 Diselenium Dichloride Se2Cl2 Se2Cl2 3347 Disilabutane Si2C2H10 Si2C2H10 397 Disilane Si2H6 Si2H6 2326 Disilane hexafluoride SiF6 SiF6 F6Si2; Hexafluorodisilane 254 Ethane C2H6 CH3CH3 1348 Ethane,1,1,1-Trifluoro C2H3F3 C2H3F3 HFC-143a 3136 Ethanol C2H6O CH3CH2OH 2285 Ethoxysilane C2H8OSi C2H8OSi 293 Ethyl Acetylene C4H6 CH3CH2C=CH 1

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 14 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

75 Ethyl Chloride C2H5Cl C2H5Cl Chloroethane or Ethane, Chloro or Ethyl Chloride

1

221 Ethyl Fluoride C2H5F CH3CH2F Fluoroethane, R-161, FREON-161

2

291 Ethyl Formate C3H6O2 HCO2C2H5 Ethyl ester formic acid; HC00C2H5

3

174 Ethylbenzene C8H10 C6H5C2H5 238 Ethylene C2H4 CH2=CH2 Ethene 1222 Ethylene Dichloride C2H4Cl2 ClCH2CH2Cl 1,2 Dichloroethane 245 Ethylene Oxide C2H4O C2H4O Oxirane, 1,2-epoxyethane 1169 Ethyleneglycol C2H6O2 HOCH2CH2OH Ehtanediol, Glycol 218 Fluorine F2 F2 1223 Fluoroacetylene C2HF FC=CH 249 Fluoroform CHF3 CHF3 Trifluoromethane or Methane,

Trifluoro, F-23, R-231

327 Fluorosilane SiH3F SiH3F H3FSi 2224 Fluorotriethoxysilane C6H15OSiF (C2H5O)3SiF 2322 Formaldehyde CH2O HCHO H2C0; UN 1198; BFV 243 Germane GeH4 GeH4 1113 Germanium Tetrachloride GeCl4 GeCl4 Tetrachlorogermane 299 Germanium Tetrafluoride GeF4 GeF4 Tetrafluorogermane 2335 Glycidol C3H6O2 CH2CHCH2OH 1-Propanol, 2,3 epoxy 3333 Glycol methylene ether C3H6O2 CH2-O-CH2-CH2-O 1,3 – Dioxolane, Formal glycol 3275 Hafnium Tetranitrate HfN4O12 Hf(NO3)4 Hafnium nitrate 1137 Halothane C2HBrClF3 BrClHCCF3 61 Helium He He 1

295 Heptafluoropropane C3HF7 C3HF7 1,1,1,2,3,3,3-Heptafluoropropane, Freon 227

2

297 Hexafluoro butadiene-1,3 C4F6 CF2=CF-CF=CF2 Perfluorobutadiene-1,3; 3270 Hexafluoro-2-Butyne C4F6 CF3C=CCF3 Bis(trifluoromethyl)acetylene;

Perfluoro-2-butyne3

225 Hexafluoroacetone C3F6O (CF3)2CO 2272 Hexafluoroacetylacetone C5H2F6O2 C5H2F6O2 1192 Hexafluorobenzene C6F6 C6F6 2296 Hexafluorocyclobutene C4F6 C4F6 Perfluorocyclobutene;

1,2,3,3,4,4-Hexafluorocyclobutene

3

118 Hexafluoroethane C2F6 F3CCF3 F-116, Perfluoroethane 1267 Hexafluoropropane C3H2F6 CH2FCF2CF3 1,1,1,2,2,3-Hexafluoropropane 2138 Hexafluoropropylene C3F6 CF3CF=CF2 Perfluoropropylene or Propylene,

Perfluoro1

286 Hexafluoropropylene oxide C3F6O C3F6O Hexafluoroepoxypropane 2139 Hexamethyldisilane C6H18Si2 (CH3)3Si2(CH3)3 HMDSi, HMDS 3227 Hexamethyldisilazane C6H19Si2N (CH3)6Si2NH 2228 Hexamethyldisiloxane C6H18Si2O (CH3)6Si2O 2127 Hexane C6H14 CH3(CH2)4CH3 2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 15 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

170 Hexanediol-1,6 C6H14O2 HO(CH2)6OH Hexyleneglycol, Hexamethyleneglycol

2

50 Hydrazine N2H4 H2NNH2 2269 Hydrazoic Acid HN3 HN3 17 Hydrogen H2 H2 1

10 Hydrogen Bromide HBr HBr 111 Hydrogen Chloride HCl HCl 124 Hydrogen Cyanide HCN HCN 112 Hydrogen Fluoride HF HF 117 Hydrogen Iodide HI HI 123 Hydrogen Selenide H2Se H2Se 122 Hydrogen Sulfide H2S H2S 1229 Hydrogen telluride H2Te H2Te 2175 Intentionally Left Blank353 Intentionally Left Blank355 Intentionally Left Blank356 Intentionally Left Blank90 Intentionally Left Blank92 Intentionally Left Blank115 Iodine Pentafluoride IF5 IF5 1323 Iodomethane CH3I CH3I Methyl iodide; Un 2644 2230 Iron Carbonyl C5O5Fe Fe(CO)5 2111 Isobutane C4H10 (CH3)2CHCH3 2-Methylpropane or Propane, 2-

Methyl1

106 Isobutene C4H8 (CH3)2C=CH2 Isobutylene,Methylpropene 2341 Isobutyl Alcohol C4H10O (CH3)2CHCH2OH 3231 Isopentane C5H12 CH3CH2CH(CH3)2 2-Methylbutane 2187 Isopropyl Alcohol C3H8O (CH3)2CHOH 2-Propanol 25 Krypton Kr Kr 1

329 Mercury Hg Hg UN 2809 228 Methane CH4 CH4 1176 Methanol CH4O CH3OH Methyl Alcohol 2292 Methyl acetate C3H6O2 CH3CO2CH3 Methyl ester acetic acid; UN

12313

68 Methyl Acetylene C3H4 CH3C=CH Propyne 144 Methyl Bromide CH3Br CH3Br Bromomethane or Methane,

Bromo1

36 Methyl Chloride CH3Cl CH3Cl Chloromethane or Methane, Chloro

1

33 Methyl Fluoride CH3F CH3F Fluoromethane or Methane, Fluoro

1

340 Methyl isopropyl ether C4H10O (CH3)2CHOCH3 347 Methyl Mercaptan CH4S CH3SH 1305 Methyl methacrylate polymer C5H8O2 CH2=C(CH3)COOCH3 Poly(methyl methacrylate);2-

Methyl1-2-propenoic acid2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 16 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

339 Methyl propyl ether C4H10O CH3OC3H7 381 Methyl vinyl ether C3H6O H3C-O-CH=CH2 1361 Methyl-(methylethyl)-

cyclohenxadieneC10H16 ATRP, Alpha-Terpinene

52 Methylamine CH5N CH3NH2 Amino Methane, Monomethylamine

2

120 Methylbutene C5H10 CH3CH2CCH3=CH2 2-Methyl-1-Butene 1177 Methylcyclohexane C7H14 CH3C6H11 Hexahydrotoluene 2362 MethylDiethoxySilane C5H14O2Si CH3SiH(OC2H5)2 mDEOE, DEMS268 Methylene Bromide CH2Br2 CH2Br2 UN 2664; Methyl dibromide,

Dibromomethane1

185 Methylsilane CH6Si CH3SiH3 Monomethylsilane 2183 Methyltrichlorosilane CH3Cl3Si CH3SiCl3 MTS 2124 Molybdenum Hexafluoride MoF6 MoF6 2233 Monoethylamine C2H7N C2H5NH2 2234 Monomethyl hydrazine CH6N2 CH3N2H3 2357 Natural Gas NG NG 22 Neon Ne Ne 1

140 Nickel Carbonyl C4O4Ni Ni(CO)4 1346 Niobium Pentachloride NbCl5 NbCl5 3167 Nitric Acid HNO3 HNO3 216 Nitric Oxide NO NO 213 Nitrogen N2 N2 126 Nitrogen Dioxide NO2 NO2 195 Nitrogen Tetroxide N2O4 N2O4 Dinitrogenoxide 253 Nitrogen Trifluoride NF3 NF3 178 Nitrogen Trioxide N2O3 N2O3 1235 Nitromethane CH3NO2 CH3NO2 2141 Nitrosyl Chloride NOCl NOCl 127 Nitrous Oxide N2O N2O 1236 Octafluorobutane C4F8 C4F8 3129 Octafluorocyclobutane C4F8 (CF2)4 Perfluorocyclobutane or

Cyclobutane, Perfluoro1

266 Octafluorocyclopentene C5F8 CF2=C(CF3)-CF=CF2 3364 OctaMethylCyclo TetraSiloxane C8H24O4Si4 (CH3CH3SiO)4 OMCTS237 Octane C8H18 CH3(CH2)6CH3 215 Oxygen O2 O2 1238 Oxygen Dichloride OCl2 OCl2 241 Oxygen Difluoride OF2 OF2 1179 o-Xylene C8H10 1,2-(CH3)2C6H4 1,2-Dimethylbenzene 230 Ozone O3 O3 1142 Pentaborane B5H9 B5H9 2239 Pentaborane(11) B5H11 B5H11 2155 Pentafluoroethane C2HF5 CF3CHF2 F-125, R-125 9288 Pentafluoropropanol C3H3F5O C2F5CH2OH Perfluorodihydropropanol, 2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 17 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

1,1,1,2,2-Pentafluoropropane240 Pentane C5H12 CH3(CH2)3CH3 272 Perchloryl Fluoride ClO3F ClO3F 1351 Perfluoro (Oxacyclopentane) C4F8O C4F8O 3241 Perfluorobutane C4F10 C4F10 3128 Perfluoropropane C3F8 CF2(CF3)2 1180 Phenol C6H6O C6H5OH 260 Phosgene CCl2O CCl2O Carbonyl Chloride 131 Phosphine PH3 PH3 1102 Phosphorous Oxychloride POCl3 POCl3 2143 Phosphorus Pentafluoride PF5 PF5 1193 Phosphorus Trichloride PCL3 PCl3 262 Phosphorus Trifluoride PF3 PF3 189 Propane C3H8 CH3CH2CH3 1334 Propanoic acid C3H6O2 CH3CH2CO2H Propionic acid 3293 Propenamine C3H7N C3H7N Allylamine; Monoallylamine; UN

23342

69 Propylene C3H6 CH3CH=CH2 Propene 1304 Pyridine C5H5N C5H5N Azabenzene; Azine 23 Radon Rn Rn 2

243 Rhenium Hexafluoride ReF6 ReF6 2325 Selenium hexafluoride SeF6 SeF6 UN 2194; Selenium fluoride 239 Silane SiH4 SiH4 1278 Silicon tetrabromide Br4Si Br4Si SiBr4; Tetrabromosilane; Silicon

(IV) bromide2

108 Silicon Tetrachloride SiCl4 SiCl4 Tetrachlorosilane 288 Silicon Tetrafluoride SiF4 SiF4 1245 Stibine SbH3 SbH3 2319 Styrene C8H8 C6H5CH=CH2 Ethenylbenzene; UN 2055 232 Sulfur Dioxide SO2 SO2 1110 Sulfur Hexafluoride SF6 SF6 1189 Sulfur Monochloride S2Cl2 S2Cl2 286 Sulfur Tetrafluoride SF4 SF4 1246 Sulfur Trioxide SO3 SO3 2358 Sulfur Trioxide SO3 SO3 Sulfan 12171 Sulfuric Acid H2SO4 H2SO4 287 Sulfuryl Fluoride SO2F2 SO2F2 1279 Tantalum (V) ethoxide C10H25O5Ta Ta(OC2H5)5 Ta(OEt)5 2

247 Tellurium Hexafluoride TeF6 TeF6 2337 Tertiary Butyl Alcohol C4H10O (CH3)3COH TBA, t-Butanol, t-Butyl alcohol 3161 Tertiarybutylarsine C4H11As C(CH3)3AsH2 TBA 8162 Tertiarybutylphosphine C4H11P C(CH3)3PH2 TBP 8248 Tetrachlorodiborane B2Cl4 B2Cl4 2168 Tetrachloroethylene C2Cl4 Cl2C=CCl2 Perchloroethylene orEthylene, 2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 18 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

Perchloro144 Tetraethoxysilane C8H20O4Si (C2H5O)4Si TEOS 2316 Tetraethyl lead C8H20Pb (C2H5)4Pb Plumbane, tetraethyl; UN 1649 2315 Tetraethylgermane C8H20Ge (C2H5)4Ge (C2H5)4Ge; Germanium

tetraethyl2

317 Tetraethylsilane C8H20Si C8H20Si Tetraethylsilane; Tetraethylsilicon; (C2H5)4Si

2

94 Tetrafluorethylene C2F4 F2C=CF2 1249 Tetrafluorodiborane B2F4 B2F4 2156 Tetrafluoroethane C2H2F4 CH2FCF3 R-134A, F-134A 2157 Tetrafluorohydrazine N2F4 F2NNF2 Dinitrogen Tetrafluoride 1182 Tetrahydrofuran C4H8O C4H8O 2282 Tetrakis(diethylamido)titanium C16H40N4Ti Ti(N(CH3)2)4 TDEAT 2318 Tetrakis(dimethylamido)titanium C8H24N4Ti [(CH3)2N]4Ti TDMAT 2

359 Tetrakis(ethylmethylamido) Hafnium

C12H32HfN4 [(CH3CH2)(CH3)N]4Hf TEMAH 12

299 Tetramethoxygermanium C4H12GeO4 (CH3O)4Ge Ge(OMe)4 2301 Tetramethoxysilane C4H12O4Si (CH3O)4Si Silicic Acid (H4SiO4);

Tetramethyl ester; Tetramethyl silicate

2

158 Tetramethylcyclotetra-siloxane C4H16Si4O4 (CH3)4H4(SiO)4 TOMCATS 7250 Tetramethylgermanium C4H12Ge (CH3)4Ge 2302 Tetramethyllead C4H12Pb (CH3)4Pb (CH3)4Pb; Plumbane,

tetramethyl;2

251 Tetramethylsilane C4H12Si (CH3)4Si 2252 Tetramethyltin C4H12Sn (CH3)4Sn 2253 Tetrasilane Si4H10 Si4H10 2145 Tin Tetrachloride SnCl4 SnCl4 Tetrachlorostannane 2114 Titanium Tetrachloride TiCl4 TiCl4 2254 Titanium Tetraiodide TiI4 TiI4 2194 Titanium Tetraisopropoxide C12H28OTi Ti(OC3H7)4 1181 Toluene C7H8 C6H5CH3 Methylbenzene 298 Transbutene C4H8 CH3CH=CHCH3 2320 Triallylamine C9H15N (CH2=CHCH2)3N Tri-2-propenylamine 283 Tribromomethane CHBr3 CHBr3 Bromoform 2255 Tribromostibine SbBr3 SbBr3 2146 Tributylaluminum C12H27Al (CH3CH2CH2CH2)3Al TBAl 3112 Trichloroethane C2H3Cl3 CH3CCl3 TCA, Methylchloroform 291 Trichlorofluoromethane CCl3F CCl3F F-11, R-11 1147 Trichlorosilane SiHCl3 SiHCl3 5256 Trichlorostibine SbCl3 SbCl3 2126 Trichlorotrifluoroethane C2Cl3F3 CF2ClCCl2F F-113, R-113 1307 Triethoxyarsine C6H15AsO3 (C2H5O)3As Triethyl ester arsenous acid;

Triethyl arsenite2

308 Triethoxyborane C6H15BO3 (C2H5O)3B Boron triethoxide; triethyl borate 2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 19 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

311 Triethoxyphosphine C6H15O3P (C2H5O)3P Triethyl phosphite; UN 2323; Phosphorous acid, triethyl ester

2

312 Triethoxysilane C6H16O3Si (C2H5O)3SiH 2306 Triethyarsine C6H15As (C2H5)3As Triethylarsenic 2274 Triethyl arsenate C6H15O4As (C2H5O)3AsO TEAsat 1163 Triethyl borate C6H15O3B B(OC2H5)3 TEB, Triethoxyborane 2257 Triethylaluminum C6H15Al (C2H5)3Al 2310 Triethylamine C6H15N (C2H5)3N UN 1296; 2258 Triethylantimony C6H15Sb (C2H5)3Sb 2148 Triethylgallium C6H15Ga (C2H5)3Ga TEGa 4309 Triethylindium C6H15In (C2H5)3In Indium, triethyl 2313 Triethylsilane C6H16Si (C2H5)3SiH (C2H5)3SiH, TES 2259 Trifluoroacetic Acid CF3CO2H CF3CO2H 2260 Trifluoroacetonitrile C2F3N F3CCN 2360 Trifluoroiodomethane CF3I CF3I 12321 Trifluoromethylhypofluorite CF4O CF3OF CF3OF; Hypofluorous acid;

trifuoromethyl ester2

290 Trifluoropropane C3H5F3 C3H5F3 1,1,1-Trifluoropropane; CH3CH2CF3

2

261 Trifluorosilane SiHF3 SiHF3 2262 Triisobutylaluminum C12H27Al (C4H9)3Al 2131 Trimethoxyborine C3H9BO3 B(OCH3)3 TMB, Trimethyl borate 2287 Trimethoxysilane C3H10O3Si C3H10O3Si 2294 Trimethyl ester phosphoric acid C3H9O4P C3H9O4P Trimethyl phosphate;

Trimethoxyphosphine oxide2

133 Trimethyl phosphite C3H9PO3 (CH3O)3P TMPi, Trimethoxyphosphine 2149 Trimethylaluminum C3H9Al Al(CH3)3 TMA, TMAl 4109 Trimethylamine C3H9N (CH3)3N 1165 Trimethylaminealane C3H12AlN (CH3)3NAlH3 TMAA 11150 Trimethylantimony C3H9Sb (CH3)3Sb Trimethylstibene 2151 Trimethylarsenic C3H9As (CH3)3As Trimethylarsine, TMAs 2277 Trimethylborane C3H9B (CH3)3B 2152 Trimethylgallium C3H9Ga Ga(CH3)3 TMGa 4153 Trimethylindium C3H9In (CH3)3In TMIn 3314 Trimethylisoxazole C6H9NO CH3CH=CHCH=CHCON

H2

3,4,5-Trimethylisoxazole, Sorbamide

3

132 Trimethylphosphorous C3H9P (CH3)3P Trimethylphosphine, TMP 2190 Trimethylsilane C3H10Si (CH3)3SiH 2303 Trimethylvinylsilane C5H12Si (CH3)3SiCH=CH2 Vinyltrimethylsilane;

CH2=CHSi(CH3)32

328 Trisilane Si3H8 Si3H8 Silicopropane; Trisilicane; H8Si3 2159 Tritium T2 H3

2 T2 2273 Tungsten Hexacarbonyl C6O6W W(CO)6 1121 Tungsten Hexafluoride WF6 WF6 2123 Uranium Hexafluoride UF6 UF6 2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 20 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

56 Vinyl Bromide C2H3Br CH2=CHBr 155 Vinyl Chloride C2H3Cl CH2=CHCl Chloroethylene 151 Vinyl Fluoride C2H3F H2C=CHF 120 Water Vapor H2O H2O 26 Xenon Xe Xe 1

324 Xenon difluoride XeF2 XeF2 F2Xe; Xenon fluoride 2263 Xylene m- C8H10 1,3-(CH3)2C6H4 1,3 Dimethyl Benzene 3264 Xylene p- C8H10 1,4-(CH3)2C6H4 1,4 Dimethyl Benzene 3330 Zinc Zn Zn UN 1383 2

8 Gas Table Sorted by Symbol

Table 3 Gases Sorted by Symbol

Code Gas Name Symbol Formula Synonym Ref

175 Intentionally Left Blank353 Intentionally Left Blank355 Intentionally Left Blank356 Intentionally Left Blank90 Intentionally Left Blank92 Intentionally Left Blank8 Air Air 1

352 Aluminum Trichloride AlCl3 AlCl3 Trichloroalumane 12226 Aluminum Trifluoride AlF3 AlF3 24 Argon Ar Ar 1

242 Arsenic Tribromide AsBr3 AsBr3 2216 Arsenic Trichloride AsCl3 AsCl3 2195 Arsenic Trifluoride AsF3 AsF3 296 Arsenic Pentafluoride AsF5 AsF5 235 Arsine AsH3 AsH3 1

196 Arsenic Triiodine AsI3 AsI3 2248 Tetrachlorodiborane B2Cl4 B2Cl4 2249 Tetrafluorodiborane B2F4 B2F4 258 Diborane B2H6 B2H6 1

198 Borazine B3N3H6 H3B3N3H3 14239 Pentaborane(11) B5H11 B5H11 2142 Pentaborane B5H9 B5H9 279 Boron Tribromide BBr3 BBr3 170 Boron Trichloride BCl3 BCl3 148 Boron Trifluoride BF3 BF3 121 Bromine Br2 Br2 2

278 Silicon tetrabromide Br4Si Br4Si SiBr4; Tetrabromosilane; Silicon (IV) bromide

2

76 Bromine Trifluoride BrF3 BrF3 1

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 21 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

116 Bromine Pentafluoride BrF5 BrF5 1361 Methyl-(methylethyl)-

cyclohenxadieneC10H16 ATRP, Alpha-Terpinene

279 Tantalum (V) ethoxide C10H25O5Ta Ta(OC2H5)5 Ta(OEt)5 2

146 Tributylaluminum C12H27Al (CH3CH2CH2CH2)3Al TBAl 3262 Triisobutylaluminum C12H27Al (C4H9)3Al 2194 Titanium Tetraisopropoxide C12H28OTi Ti(OC3H7)4 1359 Tetrakis(ethylmethylamido)

HafniumC12H32HfN4 [(CH3CH2)(CH3)N]4Hf TEMAH 12

280 Diphenylmethylenediamine C13H14N2 C13H14N2 2281 Diphenylmethan-4,4'-

diisocyanatC15H10N2O C15H10N2O UN 2489; Benzene,1,1'-

methylenebis(isocyanatophenyl)2

282 Tetrakis(diethylamido)titanium C16H40N4Ti Ti(N(CH3)2)4 TDEAT 2130 Dibromotetrafluorethane C2Br2F4 BrF2CCF2Br F-114B2, R-114B2 1105 Bromotrifluoroethylene C2BrF3 CF2CFBr 1125 Dichlorotetrafluoroethane C2Cl2F4 F3CCCl2F F-114, R-114 1126 Trichlorotrifluoroethane C2Cl3F3 CF2ClCCl2F F-113, R-113 1168 Tetrachloroethylene C2Cl4 Cl2C=CCl2 Perchloroethylene orEthylene,

Perchloro2

206 Chlorotrifluoroethylene C2ClF3 FCCl=CF2 R-1113, FREON-1113 2119 Chloropentafluoroethane C2ClF5 ClCF2CF3 F-115, R-115 1260 Trifluoroacetonitrile C2F3N F3CCN 294 Tetrafluorethylene C2F4 F2C=CF2 1

118 Hexafluoroethane C2F6 F3CCF3 F-116, Perfluoroethane 142 Acetylene C2H2 HC=CH Ethyne 1

210 Dichloroethylene C2H2Cl2 CH2=CCl2 Vinylidene Chloride 2211 Dichloroethylene -cis C2H2Cl2 CHCl=CHCl 2191 Dichloroethylene -trans C2H2Cl2 CHCl=CHCl 264 Difluoroethylene C2H2F2 CH2=CF2 G-1132A,Vinylidenefluoride 1

156 Tetrafluoroethane C2H2F4 CH2FCF3 R-134A, F-134A 256 Vinyl Bromide C2H3Br CH2=CHBr 155 Vinyl Chloride C2H3Cl CH2=CHCl Chloroethylene 1

112 Trichloroethane C2H3Cl3 CH3CCl3 TCA, Methylchloroform 2203 Chlorodifluoroethane C2H3ClF2 CH3-CF2Cl R-142b 4103 Difluorochloroethane C2H3ClF2 CF2ClCH3 F-142B, R-142B 151 Vinyl Fluoride C2H3F H2C=CHF 1

348 Ethane,1,1,1-Trifluoro C2H3F3 C2H3F3 HFC-143a 3173 Acetonitrile C2H3N CH3CN 238 Ethylene C2H4 CH2=CH2 Ethene 1

222 Ethylene Dichloride C2H4Cl2 ClCH2CH2Cl 1,2 Dichloroethane 282 Difluoroethane C2H4F2 CH3CHF2 Ethylidene Fluoride, R-152A 145 Ethylene Oxide C2H4O C2H4O Oxirane, 1,2-epoxyethane 1

283 Acetic acid C2H4O2 CH3COOH Ethanoic acid; UN 2789; 275 Ethyl Chloride C2H5Cl C2H5Cl Chloroethane or Ethane, Chloro

or Ethyl Chloride1

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 22 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

221 Ethyl Fluoride C2H5F CH3CH2F Fluoroethane, R-161, FREON-161

2

54 Ethane C2H6 CH3CH3 1218 Dimethylcadmium C2H6Cd (CH3)2Cd 273 Dimethyl Ether C2H6O CH3OCH3 Methyl ether 1

136 Ethanol C2H6O CH3CH2OH 2169 Ethyleneglycol C2H6O2 HOCH2CH2OH Ehtanediol, Glycol 2284 Dimethyl selenide C2H6Se C2H6Se (CH3)2Se; Selenium dimethyl;

Dimethylselenium2

212 Dichlorodimethylsilane C2H6SiCl2 (CH3)2SiCl2 2220 Dimethyltellurium C2H6Te (CH3)2Te 2135 Dimethylzinc C2H6Zn (CH3)2Zn 3164 Dimethylaluminum hydride C2H7Al (CH3)2AlH DMAH 1385 Dimethylamine C2H7N (CH3)2NH 1

233 Monoethylamine C2H7N C2H5NH2 2285 Ethoxysilane C2H8OSi C2H8OSi 2219 Dimethylsilane C2H8Si (CH3)2SiH2 2137 Halothane C2HBrClF3 BrClHCCF3 6186 2,2 Dichloro 1,1,1

TrifluoroethaneC2HCl2F3 CHCl2-CF3 Freon 123, Suva 123 2

204 Chlorodifluoroethylene C2HClF2 CF2=CHCl R-1122, FREON-1122 4223 Fluoroacetylene C2HF FC=CH 2155 Pentafluoroethane C2HF5 CF3CHF2 F-125, R-125 959 Cyanogen C2N2 NCCN Oxalodinitrile 1

138 Hexafluoropropylene C3F6 CF3CF=CF2 Perfluoropropylene or Propylene, Perfluoro

1

225 Hexafluoroacetone C3F6O (CF3)2CO 2286 Hexafluoropropylene oxide C3F6O C3F6O Hexafluoroepoxypropane 2128 Perfluoropropane C3F8 CF2(CF3)2 1287 Trimethoxysilane C3H10O3Si C3H10O3Si 2190 Trimethylsilane C3H10Si (CH3)3SiH 2165 Trimethylaminealane C3H12AlN (CH3)3NAlH3 TMAA 11267 Hexafluoropropane C3H2F6 CH2FCF2CF3 1,1,1,2,2,3-Hexafluoropropane 2288 Pentafluoropropanol C3H3F5O C2F5CH2OH Perfluorodihydropropanol,

1,1,1,2,2-Pentafluoropropane2

276 Acrylonitrile C3H3N CH2=CHCN Acrylon; Propenenitrile 366 Allene C3H4 CH2=C=CH2 Propadiene 168 Methyl Acetylene C3H4 CH3C=CH Propyne 1

289 Acrylic acid C3H4O2 C3H4O2 2-Propenoic acid; CH2=CHCOOH

2

290 Trifluoropropane C3H5F3 C3H5F3 1,1,1-Trifluoropropane; CH3CH2CF3

2

61 Cyclopropane C3H6 C3H6 169 Propylene C3H6 CH3CH=CH2 Propene 1

184 Acetone C3H6O CH3COCH3 2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 23 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

81 Methyl vinyl ether C3H6O H3C-O-CH=CH2 1331 Acetaldehyde methoxy C3H6O2 CH3OCH2CHO 3332 Acetone,hydroxy C3H6O2 CH3COCH2OH Acetol 3291 Ethyl Formate C3H6O2 HCO2C2H5 Ethyl ester formic acid;

HC00C2H53

335 Glycidol C3H6O2 CH2CHCH2OH 1-Propanol, 2,3 epoxy 3333 Glycol methylene ether C3H6O2 CH2-O-CH2-CH2-O 1,3 – Dioxolane, Formal glycol 3292 Methyl acetate C3H6O2 CH3CO2CH3 Methyl ester acetic acid; UN

12313

334 Propanoic acid C3H6O2 CH3CH2CO2H Propionic acid 3293 Propenamine C3H7N C3H7N Allylamine; Monoallylamine; UN

23342

89 Propane C3H8 CH3CH2CH3 1187 Isopropyl Alcohol C3H8O (CH3)2CHOH 2-Propanol 2149 Trimethylaluminum C3H9Al Al(CH3)3 TMA, TMAl 4151 Trimethylarsenic C3H9As (CH3)3As Trimethylarsine, TMAs 2277 Trimethylborane C3H9B (CH3)3B 2131 Trimethoxyborine C3H9BO3 B(OCH3)3 TMB, Trimethyl borate 2152 Trimethylgallium C3H9Ga Ga(CH3)3 TMGa 4153 Trimethylindium C3H9In (CH3)3In TMIn 3109 Trimethylamine C3H9N (CH3)3N 1294 Trimethyl ester phosphoric acid C3H9O4P C3H9O4P Trimethyl phosphate;

Trimethoxyphosphine oxide2

132 Trimethylphosphorous C3H9P (CH3)3P Trimethylphosphine, TMP 2133 Trimethyl phosphite C3H9PO3 (CH3O)3P TMPi, Trimethoxyphosphine 2150 Trimethylantimony C3H9Sb (CH3)3Sb Trimethylstibene 2295 Heptafluoropropane C3HF7 C3HF7 1,1,1,2,3,3,3-Heptafluoropropane,

Freon 2272

241 Perfluorobutane C4F10 C4F10 3297 Hexafluoro butadiene-1,3 C4F6 CF2=CF-CF=CF2 Perfluorobutadiene-1,3; 3270 Hexafluoro-2-Butyne C4F6 CF3C=CCF3 Bis(trifluoromethyl)acetylene;

Perfluoro-2-butyne3

296 Hexafluorocyclobutene C4F6 C4F6 Perfluorocyclobutene; 1,2,3,3,4,4-Hexafluorocyclobutene

3

236 Octafluorobutane C4F8 C4F8 3129 Octafluorocyclobutane C4F8 (CF2)4 Perfluorocyclobutane or

Cyclobutane, Perfluoro1

351 Perfluoro (Oxacyclopentane) C4F8O C4F8O 3117 Butane C4H10 CH3(CH2)2CH3 1111 Isobutane C4H10 (CH3)2CHCH3 2-Methylpropane or Propane, 2-

Methyl1

271 Butanol-1 C4H10O CH3CH2CH2CH2OH 1-butanol 3336 Butanol-2 C4H10O CH3CH2CH(OH)CH3 3338 Diethyl ether C4H10O C2H5OC2H5 3341 Isobutyl Alcohol C4H10O (CH3)2CHCH2OH 3

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 24 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

340 Methyl isopropyl ether C4H10O (CH3)2CHOCH3 3339 Methyl propyl ether C4H10O CH3OC3H7 3337 Tertiary Butyl Alcohol C4H10O (CH3)3COH TBA, t-Butanol, t-Butyl alcohol 3298 Diethyl sulfide C4H10S C4H10S UN 2375; Ethyl sulfide; 2214 Diethylzinc C4H10Zn Zn(C2H5)2 2161 Tertiarybutylarsine C4H11As C(CH3)3AsH2 TBA 8213 Diethylamine C4H11N (C2H5)2NH 2162 Tertiarybutylphosphine C4H11P C(CH3)3PH2 TBP 8250 Tetramethylgermanium C4H12Ge (CH3)4Ge 2299 Tetramethoxygermanium C4H12GeO4 (CH3O)4Ge Ge(OMe)4 2300 Dimethoxydimethylsilane C4H12O2Si (CH3O)2Si(CH3)2 KBM 22 2301 Tetramethoxysilane C4H12O4Si (CH3O)4Si Silicic Acid (H4SiO4);

Tetramethyl ester; Tetramethyl silicate

2

302 Tetramethyllead C4H12Pb (CH3)4Pb (CH3)4Pb; Plumbane, tetramethyl;

2

154 Diethylsilane C4H12Si (C2H5)2SiH2 2251 Tetramethylsilane C4H12Si (CH3)4Si 2252 Tetramethyltin C4H12Sn (CH3)4Sn 2166 Dimethylethylaminealane C4H14NAl (CH3)2C2H5NAlH3 DMEAA 14158 Tetramethylcyclotetra-siloxane C4H16Si4O4 (CH3)4H4(SiO)4 TOMCATS 7100 Butadiene C4H6 CH2=CH-CH=CH2 1,3-butadiene 1

93 Ethyl Acetylene C4H6 CH3CH2C=CH 1104 Butene C4H8 CH3CH2CH=CH2 1-Butene 1107 Cisbutene C4H8 CH3CH=CHCH3 Cis-2-Butene 2207 Cyclobutane C4H8 C4H8 Tetramethylene 2106 Isobutene C4H8 (CH3)2C=CH2 Isobutylene,Methylpropene 298 Transbutene C4H8 CH3CH=CHCH3 2

182 Tetrahydrofuran C4H8O C4H8O 2140 Nickel Carbonyl C4O4Ni Ni(CO)4 1266 Octafluorocyclopentene C5F8 CF2=C(CF3)-CF=CF2 3354 2,2,3-trifluoro-3-(1,1,2,3,3-

pentafluoroprop-2-enyl)oxiraneC5F8O C5F80 Epoxyperfluorocyclopentene 12

120 Methylbutene C5H10 CH3CH2CCH3=CH2 2-Methyl-1-Butene 1122 Dimethylpropane C5H12 (CH3)4C Neopentane 2231 Isopentane C5H12 CH3CH2CH(CH3)2 2-Methylbutane 2240 Pentane C5H12 CH3(CH2)3CH3 2303 Trimethylvinylsilane C5H12Si (CH3)3SiCH=CH2 Vinyltrimethylsilane;

CH2=CHSi(CH3)32

362 MethylDiethoxySilane C5H14O2Si CH3SiH(OC2H5)2 mDEOE, DEMS272 Hexafluoroacetylacetone C5H2F6O2 C5H2F6O2 1304 Pyridine C5H5N C5H5N Azabenzene; Azine 2305 Methyl methacrylate polymer C5H8O2 CH2=C(CH3)COOCH3 Poly(methyl methacrylate);2-

Methyl1-2-propenoic acid2

230 Iron Carbonyl C5O5Fe Fe(CO)5 2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 25 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

192 Hexafluorobenzene C6F6 C6F6 2178 4-Methyl, 1-Pentene C6H12 (CH3)2CHCH2CH=CH2 2127 Hexane C6H14 CH3(CH2)4CH3 2170 Hexanediol-1,6 C6H14O2 HO(CH2)6OH Hexyleneglycol,

Hexamethyleneglycol2

257 Triethylaluminum C6H15Al (C2H5)3Al 2306 Triethyarsine C6H15As (C2H5)3As Triethylarsenic 2307 Triethoxyarsine C6H15AsO3 (C2H5O)3As Triethyl ester arsenous acid;

Triethyl arsenite2

308 Triethoxyborane C6H15BO3 (C2H5O)3B Boron triethoxide; triethyl borate 2148 Triethylgallium C6H15Ga (C2H5)3Ga TEGa 4309 Triethylindium C6H15In (C2H5)3In Indium, triethyl 2310 Triethylamine C6H15N (C2H5)3N UN 1296; 2163 Triethyl borate C6H15O3B B(OC2H5)3 TEB, Triethoxyborane 2311 Triethoxyphosphine C6H15O3P (C2H5O)3P Triethyl phosphite; UN 2323;

Phosphorous acid, triethyl ester2

274 Triethyl arsenate C6H15O4As (C2H5O)3AsO TEAsat 1224 Fluorotriethoxysilane C6H15OSiF (C2H5O)3SiF 2258 Triethylantimony C6H15Sb (C2H5)3Sb 2188 Diethoxydimethylsilane C6H16O2Si (C2H5O)2Si(CH3)2 2312 Triethoxysilane C6H16O3Si (C2H5O)3SiH 2313 Triethylsilane C6H16Si (C2H5)3SiH (C2H5)3SiH, TES 2139 Hexamethyldisilane C6H18Si2 (CH3)3Si2(CH3)3 HMDSi, HMDS 3228 Hexamethyldisiloxane C6H18Si2O (CH3)6Si2O 2227 Hexamethyldisilazane C6H19Si2N (CH3)6Si2NH 2172 Chlorobenzene C6H5Cl C6H5Cl Chlorobenzol, Phenylchloride 2197 Benzene C6H6 C6H6 2180 Phenol C6H6O C6H5OH 2314 Trimethylisoxazole C6H9NO CH3CH=CHCH=CHCONH

2

3,4,5-Trimethylisoxazole, Sorbamide

3

273 Tungsten Hexacarbonyl C6O6W W(CO)6 1177 Methylcyclohexane C7H14 CH3C6H11 Hexahydrotoluene 2363 Bicycloheptadiene C7H8 C7H8 BCHD, Norbornadiene181 Toluene C7H8 C6H5CH3 Methylbenzene 2345 1,3,5,7-Octatetraene C8H10 CH2=CHCH=CHCH=CHC

H=CH2

3

343 1,7-Octadiyne C8H10 HC=C(CH2)4C=CH 3344 2,6-Octadiyne C8H10 CH3C=CCH2CH2C=CCH3 3342 3-one-2,5-dimethyl hexadiene C8H10 CH2=C(CH3)C=CC(CH3)C

H2

3

174 Ethylbenzene C8H10 C6H5C2H5 2179 o-Xylene C8H10 1,2-(CH3)2C6H4 1,2-Dimethylbenzene 2263 Xylene m- C8H10 1,3-(CH3)2C6H4 1,3 Dimethyl Benzene 3264 Xylene p- C8H10 1,4-(CH3)2C6H4 1,4 Dimethyl Benzene 3237 Octane C8H18 CH3(CH2)6CH3 2

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 26 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

315 Tetraethylgermane C8H20Ge (C2H5)4Ge (C2H5)4Ge; Germanium tetraethyl

2

144 Tetraethoxysilane C8H20O4Si (C2H5O)4Si TEOS 2316 Tetraethyl lead C8H20Pb (C2H5)4Pb Plumbane, tetraethyl; UN 1649 2317 Tetraethylsilane C8H20Si C8H20Si Tetraethylsilane;

Tetraethylsilicon; (C2H5)4Si2

318 Tetrakis(dimethylamido)titanium

C8H24N4Ti [(CH3)2N]4Ti TDMAT 2

364 OctaMethylCyclo TetraSiloxane C8H24O4Si4 (CH3CH3SiO)4 OMCTS319 Styrene C8H8 C6H5CH=CH2 Ethenylbenzene; UN 2055 2320 Triallylamine C9H15N (CH2=CHCH2)3N Tri-2-propenylamine 2209 Dibromodifluoromethane CBr2F2 Br2CF2 R-12B2, FREON-12B2 2200 Carbon Tetrabromide CBr4 CBr4 2199 Bromochlorodifluoromethane CBrClF2 BrClCF2 280 Bromotrifluoromethane CBrF3 BrCF3 F-13B1, R-13B1 184 Dichlorodifluoromethane CCl2F2 CCl2F2 F-12, R-12 160 Phosgene CCl2O CCl2O Carbonyl Chloride 191 Trichlorofluoromethane CCl3F CCl3F F-11, R-11 1

101 Carbon Tetrachloride CCl4 CCl4 Tetrachloromethane or Methane, Tetrachloro

2

74 Chlorotrifluoromethane CClF3 ClCF3 F-13, R-13 146 Carbonyl Fluoride CF2O CF2O 1

259 Trifluoroacetic Acid CF3CO2H CF3CO2H 2360 Trifluoroiodomethane CF3I CF3I 1263 Carbon Tetrafluoride CF4 CF4 Tetrafluoromethane or Methane,

Tetrafluoro1

321 Trifluoromethylhypofluorite CF4O CF3OF CF3OF; Hypofluorous acid; trifuoromethyl ester

2

268 Methylene Bromide CH2Br2 CH2Br2 UN 2664; Methyl dibromide, Dibromomethane

1

265 Dichloromethane CH2Cl2 CH2Cl2

160 Difluoromethane CH2F2 CH2F2 Methylene Fluoride 2208 Diazomethane CH2N2 CH2N2 Acomethylene 2322 Formaldehyde CH2O HCHO H2C0; UN 1198; BFV 244 Methyl Bromide CH3Br CH3Br Bromomethane or Methane,

Bromo1

36 Methyl Chloride CH3Cl CH3Cl Chloromethane or Methane, Chloro

1

183 Methyltrichlorosilane CH3Cl3Si CH3SiCl3 MTS 233 Methyl Fluoride CH3F CH3F Fluoromethane or Methane,

Fluoro1

323 Iodomethane CH3I CH3I Methyl iodide; Un 2644 2235 Nitromethane CH3NO2 CH3NO2 228 Methane CH4 CH4 1

176 Methanol CH4O CH3OH Methyl Alcohol 247 Methyl Mercaptan CH4S CH3SH 1

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 27 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

52 Methylamine CH5N CH3NH2 Amino Methane, Monomethylamine

2

234 Monomethyl hydrazine CH6N2 CH3N2H3 2185 Methylsilane CH6Si CH3SiH3 Monomethylsilane 283 Tribromomethane CHBr3 CHBr3 Bromoform 265 Dichlorofluoromethane CHCl2F CHCl2F F-21, R-21 171 Chloroform CHCl3 CHCl3 Trichloromethane or Methane,

Trichloro2

57 Chlorodifluoromethane CHClF2 CClHF2 F-22, R-22 149 Fluoroform CHF3 CHF3 Trifluoromethane or Methane,

Trifluoro, F-23, R-231

19 Chlorine Cl2 Cl2 137 Cyanogen Chloride ClCN ClCN 177 Chlorine Trifluoride ClF3 ClF3 1

202 Chlorine Pentafluoride ClF5 ClF5 2201 Chlorine Dioxide ClO2 ClO2 272 Perchloryl Fluoride ClO3F ClO3F 19 Carbon Monoxide CO CO 125 Carbon Dioxide CO2 CO2 134 Carbonyl Sulfide COS COS 140 Carbon Disulfide CS2 CS2 214 Deuterium D2 H2

2 D2 218 Fluorine F2 F2 1

217 Digermane Ge2H6 Ge2H6 2113 Germanium Tetrachloride GeCl4 GeCl4 Tetrachlorogermane 299 Germanium Tetrafluoride GeF4 GeF4 Tetrafluorogermane 243 Germane GeH4 GeH4 17 Hydrogen H2 H2 120 Water Vapor H2O H2O 222 Hydrogen Sulfide H2S H2S 123 Hydrogen Selenide H2Se H2Se 1

171 Sulfuric Acid H2SO4 H2SO4 2229 Hydrogen telluride H2Te H2Te 210 Hydrogen Bromide HBr HBr 111 Hydrogen Chloride HCl HCl 124 Hydrogen Cyanide HCN HCN 11 Helium He He 112 Hydrogen Fluoride HF HF 1

275 Hafnium Tetranitrate HfN4O12 Hf(NO3)4 Hafnium nitrate 1329 Mercury Hg Hg UN 2809 217 Hydrogen Iodide HI HI 1

269 Hydrazoic Acid HN3 HN3 1167 Nitric Acid HNO3 HNO3 2115 Iodine Pentafluoride IF5 IF5 1

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 28 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

5 Krypton Kr Kr 1124 Molybdenum Hexafluoride MoF6 MoF6 213 Nitrogen N2 N2 1

157 Tetrafluorohydrazine N2F4 F2NNF2 Dinitrogen Tetrafluoride 150 Hydrazine N2H4 H2NNH2 227 Nitrous Oxide N2O N2O 178 Nitrogen Trioxide N2O3 N2O3 195 Nitrogen Tetroxide N2O4 N2O4 Dinitrogenoxide 2

346 Niobium Pentachloride NbCl5 NbCl5 3350 Deuterium Ammonia ND3 ND3 32 Neon Ne Ne 1

232 Difluoroamidogen NF2 NF2 253 Nitrogen Trifluoride NF3 NF3 1

357 Natural Gas NG NG 229 Ammonia NH3 NH3 116 Nitric Oxide NO NO 226 Nitrogen Dioxide NO2 NO2 1

141 Nitrosyl Chloride NOCl NOCl 115 Oxygen O2 O2 130 Ozone O3 O3 1

238 Oxygen Dichloride OCl2 OCl2 241 Oxygen Difluoride OF2 OF2 1

193 Phosphorus Trichloride PCL3 PCl3 262 Phosphorus Trifluoride PF3 PF3 1

143 Phosphorus Pentafluoride PF5 PF5 131 Phosphine PH3 PH3 1

102 Phosphorous Oxychloride POCl3 POCl3 2243 Rhenium Hexafluoride ReF6 ReF6 23 Radon Rn Rn 2

189 Sulfur Monochloride S2Cl2 S2Cl2 2255 Tribromostibine SbBr3 SbBr3 2256 Trichlorostibine SbCl3 SbCl3 2245 Stibine SbH3 SbH3 2349 Diselenium Dichloride Se2Cl2 Se2Cl2 3325 Selenium hexafluoride SeF6 SeF6 UN 2194; Selenium fluoride 286 Sulfur Tetrafluoride SF4 SF4 1

110 Sulfur Hexafluoride SF6 SF6 1347 Disilabutane Si2C2H10 Si2C2H10 397 Disilane Si2H6 Si2H6 2

328 Trisilane Si3H8 Si3H8 Silicopropane; Trisilicane; H8Si3 2253 Tetrasilane Si4H10 Si4H10 2108 Silicon Tetrachloride SiCl4 SiCl4 Tetrachlorosilane 2244 Deuteriumsilane SiD4 SiH2

4 288 Silicon Tetrafluoride SiF4 SiF4 1

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 29 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Code Gas Name Symbol Formula Synonym Ref

326 Disilane hexafluoride SiF6 SiF6 F6Si2; Hexafluorodisilane 267 Dichlorosilane SiH2Cl2 SiH2Cl2 1

134 Difluorosilane SiH2F2 SiH2F2 10205 Chlorosilane SiH3Cl SiH3Cl 2327 Fluorosilane SiH3F SiH3F H3FSi 239 Silane SiH4 SiH4 1

147 Trichlorosilane SiHCl3 SiHCl3 5261 Trifluorosilane SiHF3 SiHF3 2145 Tin Tetrachloride SnCl4 SnCl4 Tetrachlorostannane 232 Sulfur Dioxide SO2 SO2 187 Sulfuryl Fluoride SO2F2 SO2F2 1

246 Sulfur Trioxide SO3 SO3 2358 Sulfur Trioxide SO3 SO3 Sulfan 12159 Tritium T2 H3

2 T2 2247 Tellurium Hexafluoride TeF6 TeF6 2114 Titanium Tetrachloride TiCl4 TiCl4 2254 Titanium Tetraiodide TiI4 TiI4 2123 Uranium Hexafluoride UF6 UF6 2121 Tungsten Hexafluoride WF6 WF6 26 Xenon Xe Xe 1

324 Xenon difluoride XeF2 XeF2 F2Xe; Xenon fluoride 2330 Zinc Zn Zn UN 1383 2

9 Mixed Gas Table Sorted by Code9.1 Mixed gases are percent by volume.

Table 4 Mixed Gases Sorted by Code

MIXED GAS NAME SYMBOL CODE

15%PHOSPHINE/NITROGEN 15%PH3/N2 05005%PHOSPHINE/NITROGEN 5%PH3/N2 050120%SILANE/NITROGEN 20%SiH4/N2 050240%ARGON/TUNGSTEN HEXAFLUORIDE 40%Ar/WF6 050310%ARSINE/HYDROGEN 10%AsH3/H2 050440%OXYGEN/HEXAFLUOROETHANE(FREON-116) 40%O2/C2F6 05052%TRICHLOROETHANE/NITROGEN 2%C2H3Cl3/N2 050620%CARBON DIOXIDE/HYDROGEN 20%CO2/H2 050730%CARBON DIOXIDE/AIR 30%CO2/Air 050810%GERMANE/HYDROGEN 10%GeH4/H2 05095%HYDROGEN SELENIDE/HYDROGEN 5%H2Se/H2 051010%HYDROGEN SELENIDE/HYDROGEN 10%H2Se/H2 051113%HYDROGEN CHLORIDE/1.32%XENON/NEON 13%HCI/1.32%Xe/Ne 051220%OXYGEN/CARBON TETRAFLUORIDE(FREON-14) 20%O2/CF4 05131%PHOSPHINE/NITROGEN 1%PH3/N2 0514

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 30 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

1.6%PHOSPHINE/21%SILANE/ARGON 1.6%PH3/21%SiH4/Ar 051510%PHOSPHINE/HYDROGEN 10%PH3/H2 051625%PHOSPHINE/SILANE 25%PH3/SiH4 051750%PHOSPHINE/NITROGEN 50%PH3/N2 051815%SILANE/NITROGEN 15%SiH4/N2 051921%SILANE/4%PHOSPHINE/ARGON 21%SiH4/4%PH3/Ar 052050%SILANE/HELIUM 50%SiH4/He 052120%TRICHLOROSILANE/HYDROGEN 20%SiHCI3/H2 05225%TETRAETHYLORTHOSILICATE(TEOS)/NITROGEN 5%Si(C2H5O)4/N2 05235%TRIETHYLANTIMONY(TESb)/HYDROGEN 5%(C2H5)3Sb/H2 052420%TRIMETHYLALUMINUM(TMAI)/HYDROGEN 20%(CH3)3AI/H2 05251%TRIMETHYL BORATE(TMB)/HYDROGEN 1%(CH3O)3B/H2 052610%PHOSPHINE/NITROGEN 10%PH3/N2 05274.5%PHOSPHINE/NITROGEN 4.5%PH3/N2 052820%SILANE/HELIUM 20%SiH4/He 052920%PHOSPHINE/SILANE 20%PH3/SiH4 05301%PHOSPHINE/SILANE 1%PH3/SiH4 053110%HYDROGEN/NITROGEN 10%H2/N2 05321.5%PHOSPHINE/SILANE 1.5%PH3/SiH4 05333%PHOSPHINE/ARGON 3%PH3/Ar 05344%PHOSPHINE/NITROGEN 4%PH3/N2 053520%OXYGEN/HELIUM 20%O2/He 05361%PHOSPHINE/ARGON 1%PH3/Ar 053710%PHOSPHINE/ARGON 10%PH3/Ar 05382%PHOSPHINE/ARGON 2%PH3/Ar 053920%ARGON/SILANE 20%Ar/SiH4 054020%SILANE/ARGON 20%SiH4/Ar 05415%HYDROGEN/NITROGEN 5%H2/N2 054216%CARBON DIOXIDE/NITROGEN 16%CO2/N2 05432%SILANE/HYDROGEN 2%SiH4/H2 054415%HYDROGEN/NITROGEN 15%H2/N2 05451%PHOSPHINE/HELIUM 1%PH3/He 05460.01%DIBORANE/HYDROGEN 0.01%B2H6/H2 05470.01%SILANE/HYDROGEN 0.01%SiH4/H2 05480.5%DIBORANE/ARGON 0.5%B2H6/Ar 05490.5%PHOSPHINE/NITROGEN 0.5%PH3/N2 05500.5%SILANE/HYDROGEN 0.5%SiH4/H2 05510.8%PHOSPHINE/NITROGEN 0.8%PH3/N2 05520.8%PHOSPHINE/SILANE 0.8%PH3/SiH4 05530.9%ARSINE/HYDROGEN 0.9%AsH3/H2 05541%ARSINE/NITROGEN 1%AsH3/N2 05551%ARSINE/SILANE 1%AsH3/SiH4 05561%DIBORANE/HYDROGEN 1%B2H6/H2 05571%DIBORANE/NITROGEN 1%B2H6/N2 0558

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 31 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

1%BORON TRICHLORIDE/HYDROGEN 1%BCI3/H2 05591%BORON TRICHLORIDE/NITROGEN 1%BCI3/N2 05601%HYDROGEN/NITROGEN 1%H2/N2 05611%OXYGEN/NITROGEN 1%O2/N2 05621%PHOSPHINE/HYDROGEN 1%PH3/H2 05631.5%ARSINE/HYDROGEN 1.5%AsH3/H2 056410%SILANE/ARGON 10%SiH4/Ar 056510%FLUORINE/HELIUM 10%F2/He 05665%WATER VAPOR/AIR 5%H2O/Air 056710%WATER VAPOR/NITROGEN 10%H2O/N2 05682%OZONE/OXYGEN 2%O3/O2 056910%NITROGEN TRIFLUORIDE/OXYGEN 10%NF3/O2 057010%OZONE/OXYGEN 10%O3/O2 057110%PHOSPHINE/SILANE 10%PH3/SiH4 057210%SILANE/HELIUM 10%SiH4/He 05738%CARBON TETRAFLUORIDE(FREON-14)/OXYGEN 8%CF4/O2 057410%SILANE/HYDROGEN 10%SiH4/H2 057510%NITROGEN/ARGON 10%N2/Ar 057620%SILANE/HYDROGEN 20%SiH4/H2 057715%ARGON/PHOSPHINE 15%Ar/PH3 057815%ARSINE/HYDROGEN 15%AsH3/H2 057915%DIBORANE/NITROGEN 15%B2H6/N2 058015%PHOSPHINE/15%SILANE/NITROGEN 15%PH3/15%SiH4/N2 058115%PHOSPHINE/ARGON 15%PH3/Ar 058215%PHOSPHINE/HYDROGEN 15%PH3/H2 058315%PHOSPHINE/SILANE 15%PH3/SiH4 058417%OXYGEN/CARBON TETRAFLUORIDE(FREON-14) 17%O2/CF4 05852%ARSINE/NITROGEN 2%AsH3/N2 05862%DIBORANE/ARGON 2%B2H6/Ar 05872%HYDROGEN/NITROGEN 2%H2/N2 05882%SILANE/HELIUM 2%SiH4/He 058920%ARSINE/HYDROGEN 20%AsH3/H2 059020%DIBORANE/SILANE 20%B2H6/SiH4 059120%HYDROGEN/CARBON MONOXIDE 20%H2/CO 059220%PHOSPHINE/HYDROGEN 20%PH3/H2 059321%OXYGEN/NITROGEN 21%O2/N2 05943%DIBORANE/NITROGEN 3%B2H6/N2 05953%HYDROGEN/HELIUM 3%H2/He 05963%HYDROGEN/NITROGEN 3%H2/N2 05973%OXYGEN/HELIUM 3%O2/He 05983%OZONE/AIR 3%O3/Air 05993%PHOSPHINE/NITROGEN 3%PH3/N2 06003%PHOSPHINE/SILANE 3%PH3/SiH4 06013%SILANE/HELIUM 3%SiH4/He 0602

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 32 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

30%HELIUM/OXYGEN 30%He/O2 060330%OXYGEN/HELIUM 30%O2/He 06044%DIBORANE/NITROGEN 4%B2H6/N2 06054%HYDROGEN/HELIUM 4%H2/He 06064%HYDROGEN/NITROGEN 4%H2/N2 06074%NITROGEN/HYDROGEN 4%N2/H2 06084%OXYGEN/CARBON TETRAFLUORIDE(FREON-14) 4%O2/CF4 06094%PHOSPHINE/HELIUM 4%PH3/He 06104%PHOSPHINE/SILANE 4%PH3/SiH4 061140%HELIUM/SILANE 40%He/SiH4 06128%OXYGEN/CARBON TETRAFLUORIDE(FREON-14) 8%O2/CF4 06135%ARSINE/HYDROGEN 5%AsH3/H2 06145%DIBORANE/ARGON 5%B2H6/Ar 06155%BORON TRICHLORIDE/HYDROGEN 5%BCI3/H2 06165%PROPANE/HYDROGEN 5%C3H8/H2 06175%CARBON DIOXIDE/NITROGEN 5%CO2/N2 06185%HYDROGEN/ARGON 5%H2/Ar 06198%PHOSPHINE/NITROGEN 8%PH3/N2 06205%NITROGEN/HYDROGEN 5%N2/H2 06215%NITROGEN/PHOSPHINE 5%N2/PH3 06225%OXYGEN/ARGON 5%O2/Ar 06235%OZONE/OXYGEN 5%O3/O2 06245%PHOSPHINE/5%SILANE/NITROGEN 5%PH3/5%SiH4/N2 06255%PHOSPHINE/ARGON 5%PH3/Ar 06265%PHOSPHINE/SILANE 5%PH3/SiH4 06275%DICHLOROSILANE/ARGON 5%SiH2CI2/Ar 06285%SILANE/ARGON 5%SiH4/Ar 062950%HELIUM/OXYGEN 50%He/O2 063050%NITROGEN/OXYGEN 50%N2/O2 063150%PHOSPHINE/SILANE 50%PH3/SiH4 063250%SILANE/HYDROGEN 50%SiH4/H2 06336.5%DIBORANE/15%SILANE/NITROGEN 6.5%B2H6/15%SiH4/N2 06346.5%DIBORANE/HYDROGEN 6.5%B2H6/H2 06358%PHOSPHINE/SILANE 8%PH3/SiH4 063630%OXYGEN/HYDROGEN 30%O2/H2 063725%AMMONIA/HYDROGEN 25%NH3/H2 06388%OZONE/OXYGEN 8%O3/O2 06392%PHOSPHINE/NITROGEN 2%PH3/N2 064015%OZONE/OXYGEN 15%O3/O2 064140%OXYGEN/SULFUR HEXAFLUORIDE 40%O2/SF6 064213%HYDROGEN/NITROGEN 13%H2/N2 06431%HYDROGEN SULFIDE/HYDROGEN 1%H2S/H2 06441%HYDROGEN SELENIDE/HYDROGEN 1%H2Se/H2 064510%SILANE/NITROGEN 10%SiH4/N2 0646

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 33 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

10%DISILANE/HELIUM 10%Si2H6/He 064720%DISILANE/HELIUM 20%Si2H6/He 064810%OXYGEN/HELIUM 10%O2/He 064950%HYDROGEN BROMIDE/HYDROGEN CHLORIDE 50%HBr/HCI 065012%OZONE/OXYGEN 12%O3/O2 065115%NITRIC OXIDE/NITROGEN 15%NO/N2 06522%SILANE/NITROGEN 2%SiH4/N2 06535%DIBORANE/NITROGEN 5%B2H6/N2 06540.5%BORON TRICHLORIDE/HYDROGEN 0.5%BCI3/H2 06550.5%PHOSPHINE/HYDROGEN 0.5%PH3/H2 06563%DIBORANE/HYDROGEN 3%B2H6/H2 06571%GERMANE/NITROGEN 1%GeH4/N2 06583%DIBORANE/5%SILANE/NITROGEN 3%B2H6/5%SiH4/N2 06590.3%PHOSPHINE/SILANE 0.3%PH3/SiH4 066030%NITROGEN TRIFLUORIDE/NITROGEN 30%NF3/N2 06610.8%DIBORANE/NITROGEN 0.8%B2H6/N2 06622%ARSINE/SILANE 2%AsH3/SiH4 06638%GERMANE/HYDROGEN 8%GeH4/H2 06643%ARSINE/HYDROGEN 3%AsH3/H2 066510%DIBORANE/NITROGEN 10%B2H6/N2 06668%PHOSPHINE/HELIUM 8%PH3/He 066710%AMMONIA/NITROGEN 10%NH3/N2 06685%FLUORINE/NITROGEN TRIFLUORIDE 5%F2/NF3 066910%DISILANE/ARGON 10%Si2H6/Ar 06703%PHOSPHINE/5%SILANE/NITROGEN 3%PH3/5%SiH4/N2 06713%NITROGEN/HYDROGEN 3%N2/H2 06720.7%ARSINE/HYDROGEN 0.7%AsH3/H2 067310%PHOSPHINE/HELIUM 10%PH3/He 06740.8%PHOSPHINE/HELIUM 0.8%PH3/He 06757.5%PHOSPHINE/SILANE 7.5%PH3/SiH4 067620%FLUORINE/HELIUM 20%F2/He 067722%PHOSPHINE/SILANE 22%PH3/SiH4 06785%TRICHLOROSILANE/HYDROGEN 5%SiHCI3/H2 067925%TRICHLOROSILANE/HYDROGEN 25%SiHCI3/H2 06800.8%PHOSPHINE/DISILANE 0.8%PH3/Si2H6 068113%TRICHLOROSILANE/HYDROGEN 13%SiHCI3/H2 06825%DIBORANE/SILANE 5%B2H6/SiH4 06831%SILANE/DIBORANE 1%SiH4/B2H6 06847%METHYLENE CHLORIDE/3%OZONE/AIR 7%CH2CI2/3%O3/Air 068550%FLUOROFORM/ARGON 50%CHF3/Ar 068620%HELIUM/OXYGEN 20%He/O2 06873%ARSINE/ARGON 3%AsH3/Ar 068810%METHYLSILANE/HYDROGEN 10%CH6Si/H2 06890.05%DIBORANE/HYDROGEN 0.05%B2H6/H2 0690

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 34 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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4%PHOSPHINE/ARGON 4%PH3/Ar 06918%HYDROGEN/ARGON 8%H2/Ar 06925%PHOSPHINE/HELIUM 5%PH3/He 069315%HYDROGEN/ARGON 15%H2/Ar 06942%DIBORANE/NITROGEN 2%B2H6/N2 06952%PHOSPHINE/SILANE 2%PH3/SiH4 069615%DIBORANE/ARGON 15%B2H6/Ar 069710%GERMANE/ARGON 10%GeH4/Ar 06985%METHANE/HELIUM 5%CH4/He 06994%HYDROGEN/ARGON 4%H2/Ar 070010%DIBORANE/HYDROGEN 10%B2H6/H2 070140%SILANE/HELIUM 40%SiH4/He 07022%ARSINE/HYDROGEN 2%AsH3/H2 070310%GERMANE/HELIUM 10%GeH4/He 07049.4%ARGON/NITROGEN TRIFLUORIDE 9.4%Ar/NF3 07058.6%ARGON/NITROGEN TRIFLUORIDE 8.6%Ar/NF3 07060.8%PHOSPHINE/HYDROGEN 0.8%PH3/H2 07070.06%ARSINE/HYDROGEN 0.06%AsH3/H2 07085%PHOSPHINE/HYDROGEN 5%PH3/H2 070910%METHANE/ARGON 10%CH4/Ar 07105%ACETONE/NITROGEN 5%C3H6O-m)/N2 07115%BENZENE/NITROGEN 5%C6H6/N2 071220%DISILANE/HYDROGEN 20%Si2H6/H2 07138%PROPANE/10%AMMONIA/AIR 8%C3H8/10%NH3/Air 07148.2%PROPANE/9.8%AMMONIA/AIR 8.2%C3H8/9.8%NH3/Air 071510%CYCLOPROPANE/HELIUM 10%C3H6-a)/He 07162%METHYSILANE/HYDROGEN 2%CH6Si/H2 071710%ETHYLENE/HELIUM 10%C2H4/He 07185%CHLORINE/HELIUM 5%CI2/He 07195%FLUORINE/HELIUM 5%F2/He 07200.7%ARSINE/HELIUM 0.7%AsH3/He 07215%DIBORANE/HYDROGEN 5%B2H6/H2 072220%OZONE/NITROGEN 20%O3/N2 07231%ARSINE/HYDROGEN 1%AsH3/H2 072440%HYDROGEN/HELIUM 40%H2/He 07255%HYDROGEN CHLORIDE/NITROGEN 5%HCI/N2 07268%HYDROGEN/NITROGEN 8%H2/N2 072720%CARBON TETRAFLUORIDE/NITROGEN 20%CF4/N2 072810%CARBON MONOXIDE/CARBON DIOXIDE 10%CO/CO2 072910%CARBON MONOXIDE/AIR 10%CO/Air 073010%DISILANE/HYDROGEN 10%Si2H6/H2 07315%FLUORINE/NITROGEN 5%F2/N2 07321%FLUORINE/NEON 1%F2/Ne 07335%CARBON DIOXIDE/15%OXYGEN/NITROGEN 5%CO2/15%O2/N2 0734

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 35 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

10%CARBON DIOXIDE/10%OXYGEN/NITROGEN 10%CO2/10%O2/N2 073520%OXYGEN/NITROGEN 20%O2/N2 073625%HELIUM/ARGON 25%He/Ar 07374%HELIUM/NITROGEN 4%He/N2 073810%TRIMETHYSILANE/HYDROGEN 10%(CH3)3SiH/H2 07392%GERMANE/ARGON 2%GeH4/Ar 07400.8%ARSINE/HYDROGEN 0.8%AsH3/H2 07410.8%GERMANIUM TETRAFLUORIDE/HYDROGEN 0.8%GeF4/H2 07420.8%DIBORANE/HYDROGEN 0.8%B2H6/H2 074310%METHANE/HELIUM 10%CH4/He 07441%SILANE/HELIUM 1%SiH4/He 074525%FLUORINE/NITROGEN 25%F2/N2 074650%GERMANE/ARGON 50%GeH4/Ar 07477%CARBON DIOXIDE/10%HYDROGEN/20%CARBON MONOXIDE/NITROGEN 7%CO2/10%H2/20%CO/N2 074810%HELIUM/HYDROGEN 10%He/H2 07491%BUTADIENE/BUTENE 1%C4H6-e)/C4H8-i) 075040%GERMANE/ARGON 40%GeH4/Ar 07515%HELIUM/NITROGEN 5%He/N2 07525%OXYGEN/CARBON TETRAFLUORIDE 5%O2/CF4 075310%FLUORINE/ARGON 10%F2/Ar 075425%FLUORINE/ARGON 25%F2/Ar 075550%FLUORINE/ARGON 50%F2/Ar 075650%FLUORINE/HELIUM 50%F2/He 075725%FLUORINE/HELIUM 25%F2/He 075810%FLUORINE/NITROGEN 10%F2/N2 075950%FLUORINE/NITROGEN 50%F2/N2 07605%FLUORINE/ARGON 5%F2/Ar 07615%HYDROGEN/HELIUM 5%H2/He 07625%SULFUR DIOXIDE/HELIUM 5%SO2/He 07632%DISILANE/HELIUM 2%Si2H6/He 07645%GERMANE/HELIUM 5%GeH4/He 07655%DIBORANE/HELIUM 5%B2H6/He 076620%PHOSPHINE/NITROGEN 20%PH3/N2 07673.5%HYDROGEN/NITROGEN 3.5%H2/N2 076850%HEXAFLUOROETHANE/OXYGEN 50%C2F6/O2 076925%HEXAFLUOROETHANE/OXYGEN 25%C2F6/O2 07700.7%GERMANIUM/HYDROGEN 0.7%GeH4/H2 07711%ACETYLENE/ETHYLENE 1%C2H2/C2H4 07725%SILANE/NITROGEN 5%SiH4/N2 07730.8%CO/0.8%O2/20%CO2/32%N2/H2 SELOX GAS MIX 07741.5%GERMANE/HYDROGEN 1.5%GeH4/H2 07755%BORON TRIFLUORIDE/HELIUM 5%BF3/He 07765%PHOSPHORUS PENTAFLUORIDE/HELIUM 5%PF5/He 0777

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 36 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Informational (Blue) Ballot1000AInformational (Blue) Ballotjn l

MIXED GAS NAME SYMBOL CODE

15%CARBON DIOXIDE/NITROGEN 15%CO2/N2 07785%OXYGEN/HELIUM 5%O2/He 07795%SILANE/HELIUM 5%SiH4/He 07801%NITROGEN DIOXIDE/NITROGEN 1%NO2/N2 07811%SULFUR DIOXIDE/NITROGEN 1%SO2/N2 078210%CARBON DIOXIDE/NITROGEN 10%CO2/N2 07830.02%CARBON MONOXIDE/NITROGEN 0.02%CO/N2 07845%HEXAFLUOROETHANE/OXYGEN 5%C2F6/O2 07850.1%CARBON MONOXIDE/NITROGEN 0.1%CO/N2 078615%GERMANIUM TETRACHLORIDE/OXYGEN 15%GeCl4/O2 07872%NITROGEN/3%CARBON MONOXIDE/17%CARBON DIOXIDE/HYDROGEN 2%N2/3%CO/17%CO2/H2 07880.1%PHOSPHINE/NITROGEN 0.1%PH3/N2 07890.1%HYDROGEN CHLORIDE/NITROGEN 0.1%HCl/N2 07900.1%NITROGEN DIOXIDE/AIR 0.1%NO2/Air 07910.1%NITROGEN DIOXIDE/NITROGEN 0.1%NO2/N2 07920.1%PHOSPHINE/HYDROGEN 0.1%PH3/H2 07930.2%SULFUR DIOXIDE/AIR 0.2%SO2/Air 07940.25%CARBON MONOXIDE0/.1%HYDROGEN/1%OXYGEN/NITROGEN 0.25%CO/0.1%H2/1%O2/N2 07950.25%DIBORANE/HYDROGEN 0.25%B2H6/H2 07960.25%OXYGEN/0.5%HYDROGEN/1.5%CARBON MONOXIDE/NITROGEN 0.25%O20.5%H2/1.5%CO/N2 07970.4%HYDROGEN CHLORIDE/AIR .4%HCl/Air 07980.5%ARSINE/SILANE 0.5%AsH3/SiH4 07991%CARBON DIOXIDE/NITROGEN 1%CO2/N2 08001%CARBON MONOXIDE/19% NITROGEN/30%OXYGEN/CARBON DIOXIDE 1%CO/19%N2/30%O2/CO2 08011%CARBON MONOXIDE/AIR 1%CO/Air 08021%CARBON MONOXIDE/CARBON DIOXIDE 1%CO/CO2 08031%CHLORINE/NITROGEN 1%Cl2/N2 08041%DIBORANE/ARGON 1%B2H6/Ar 08051%HYDROGEN SULFIDE/NITROGEN 1%H2S/N2 08061%METHANE/49.5%CARBON DIOXIDE/ARGON 1%CH4/49.5%CO2/Ar 08071%NITROGEN DIOXIDE/AIR 1%NO2/Air 08081%SULFUR DIOXIDE/ARGON 1%SO2/Ar 08091.5%SILANE/ARGON 1.5%SiH4/Ar 08101.8%SILANE/NITROGEN 1.8%SiH4/N2 08111.9%SILANE/NITROGEN 1.9%SiH4/N2 081210%CARBON DIOXIDE/ARGON 10%CO2/Ar 081310%FLUORINE/OXYGEN 10%F2/O2 081410%METHANE/HYDROGEN 10%CH4/H2 081510%OXYGEN/30%CARBON DIOXIDE/ARGON 10%O2/30%CO2/Ar 081610%OZONE/NITROGEN 10%O3/N2 081710%SULFUR DIOXIDE/NITROGEN 10%SO2/N2 081812%HYDROGEN/NITROGEN 12%H2/N2 0819

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 37 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Informational (Blue) Ballot1000AInformational (Blue) Ballotjn l

MIXED GAS NAME SYMBOL CODE

15%DIBORANE/HYDROGEN 15%B2H6/H2 082015%SILANE/ARGON 15%SiH4/Ar 08212%NITRIC OXIDE/NITROGEN 2%NO/N2 08222%SILANE/ARGON 2%SiH4/Ar 08232%SULFUR DIOXIDE/NITROGEN 2%SO2/N2 08242.5%DIBORANE/HYDROGEN 2.5%B2H6/H2 08252.5%METHANE/AIR 2.5%CH4/Air 082620%FLUOROFORM/OXYGEN 20%CHF3/O2 082722%OXYGEN/HELIUM 22%O2/He 082825%CARBON MONOXIDE/HYDROGEN 25%CO/H2 082925%PROPANE/PROPYLENE 25%C3H8/C3H6 08303%AMMONIA/NITROGEN 3%NH3/N2 08313%BORON TRICHLORIDE/HYDROGEN 3%BCl3/H2 08323%HYDROGEN/ARGON 3%H2/Ar 08333%PHOSPHINE/HELIUM 3%PH3/He 08343.5%CARBON DIOXIDE/HELIUM 3.5%CO2/He 083530% ISOBUTANE/HELIUM 30%CH(CH3)3/He 083630%GERMANE/ARGON 30%GeH4/Ar 083730%SILANE/ARGON 30%SiH4/Ar 083830%SILANE/NITROGEN 30%SiH4/N2 083933.3%HYDROGEN/CARBON MONOXIDE 33.3%H2/CO 084035%PHOSPHINE/SILANE 35%PH3/SiH4 08414%SILANE/NITROGEN 4%SiH4/N2 08425%AMMONIA/NITROGEN 5%NH3/N2 08435%CARBON MONOXIDE/ARGON 5%CO/Ar 08445%ETHENE/NITROGEN 5%C2H4/N2 08455%HELIUM/ARGON 5%He/Ar 08465%SILANE/HYDROGEN 5%SiH4/H2 084750%CARBON DIOXIDE/NITROGEN 50%CO2/N2 084850%HELIUM/ARGON 50%He/Ar 084950%HYDROGEN/NITROGEN 50%H2/N2 085050%NITROGEN DIOXIDE/AMMONIA 50%NO2/NH3 085150%NITROGEN/HELIUM 50%N2/He 085250%SULFUR DIOXIDE/NITRIC OXIDE 50%SO2/NO 08536%CARBON DIOXIDE/NITROGEN 6%CO2/N2 08546%HYDROGEN CHLORIDE/OXYGEN 6%HCl/O2 08556%HYDROGEN/NITROGEN 6%H2/N2 08566%OZONE/OXYGEN 6%O3/O2 08576.5%DIBORANE/NITROGEN 6.5%B2H6/N2 08587%HYDROGEN/ARGON 7%H2/Ar 08598%DIBORANE/ARGON 8%B2H6/Ar 08608%DIBORANE/NITROGEN 8%B2H6/N2 08615%CARBON MONOXIDE/NITROGEN 5%CO/N2 08622%OXYGEN/ARGON 2%O2/Ar 0863

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 38 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

15%SILANE/HELIUM 15%SiH4/He 08645%CARBON DIOXIDE/5%OXYGEN/NITROGEN 5%CO2/5%O2/N2 08652.5%OXYGEN/5%CARBON DIOXIDE/NITROGEN 2.5%O2/5%CO2/N2 08665%CARBON DIOXIDE/10%OXYGEN/NITROGEN 5%CO2/10%O2/N2 086711%OZONE/OXYGEN 11%O3/O2 086820%OZONE/OXYGEN 20%O3/O2 08693%SILANE/HYDROGEN 3%SiH4/H2 08701%NITROGEN/HYDROGEN 1%N2/H2 08713%PROPANE/HYDROGEN 3%C3H8/H2 08721.65%ACETYLENE/70%ETHYLENE/NITROGEN 1.65%C2H2/70%C2H4/N2 087330%TRIMETHYLSILANE/HYDROGEN 30%(CH3)3SiH/H2 087420%OXYGEN/ARGON 20%O2/Ar 08755%DIBORANE/5%SILANE/NITROGEN 5%B2H6/5%SiH4/N2 087630%TRICHLOROSILANE/HYDROGEN 30%SiHCl3/H2 08773%ETHYLENE/HELIUM 3%C2H4/He 08780.1%HYDROGEN/0.25%CARBON MONOXIDE/1%OXYGEN/NITROGEN 0.1%H2/0.25%CO/1%O2/N2 087920%NITROGEN/HYDROGEN 20%N2/H2 088010%DIBORANE/ARGON 10%B2H6/Ar 088121.6%CARBON DIOXIDE/32.4%NITROGEN/HYDROGEN 21.6%CO2/32.4%N2/H2 08827%HYDROGEN/HELIUM 7%H2/He 08834%TETRAFLUOROETHANE (FREON-134A)/44%PENTAFLUOROETHANE (FREON-125)/ ETHANE,1,1,1-TRIFLUORO-(HFC-143a) 4%C2H2F4/44%C2HF5/C2H3F3 088430%PROPANE/BUTANE 30%C3H8/C4H10 08850.01%PHOSPHINE/ARGON 0.01%PH3/Ar 08860.1%PHOSPHINE/ARGON 0.1%PH3/Ar 08870.1%DIBORANE/ARGON 0.1%B2H6/Ar 08880.5%PHOSPHINE/HELIUM 0.5%PH3/He 08895.5%ARSENIC TRICHLORIDE/HYDROGEN 5.5%AsCl3/H2 089017.4%GERMANIUM TETRACHLORIDE/HYDROGEN 17.4%GeCl4/H2 089132%SILICON TETRACHLORIDE/HYDROGEN 32%SiCl4/O2 089218.4%PHOSPHORUS OXYCHLORIDE/OXYGEN 18.4%POCl3/O2 089313%DISELENIUM DICHLORIDE/HYDROGEN 13%Se2Cl2/H2 089440%GERMANE/NITROGEN 40%GeH4/N2 089530%PHOSPHINE/SILANE 30%PH3/SiH4 08962.7%ETHYLENE/HELIUM 2.7%C2H4/He 08971%GERMANE/HYDROGEN 1%GeH4/H2 08981%METHYLSILANE (MONO)/HYDROGEN 1%CH6Si/H2 08990.48%NITROGEN TRIFLUORIDE/NITROGEN 0.48%NF3/N2 09007%OZONE/OXYGEN 7%O3/O2 09010.2%HYDROGEN SULFIDE/NITROGEN 0.2%H2S/N2 09022%HYDROGEN SULFIDE/NITROGEN 2%H2S/N2 09032%NITROGEN DIOXIDE/NITROGEN 2%NO2/N2 09040.4%CHLORINE/NITROGEN 0.4%Cl2/N2 0905

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 39 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

4.6%SULFUR DIOXIDE/NITROGEN 4.6%SO2/N2 090610%ARSINE/NITROGEN 10%AsH3/N2 090720%DIBORANE/HELIUM 20%B2H6/He 09085%HELIUM/HYDROGEN 5%He/H2 09090.5%GERMANE/HYDROGEN 0.5%GeH4/H2 0910

4%GERMANE/HYDROGEN 4%GeH4/H2 091150%BUTANE/ACETYLENE 50%C4H10/C2H2 09124.5%HYDROGEN/NITROGEN 4.5%H2/N2 09133%HELIUM/NITROGEN 3%He/N2 09141%TRIMETHYL BORATE/HELIUM 1%(CH3O)3B/He 09152%PHOSPHINE/HYDROGEN 2%PH3/H2 091650%PROPYLENE/NITROGEN 50%C3H6/N2 091710%METHYLTRICHLOROSILANE /HYDROGEN 10%CH3Cl3Si/H2 091820%HYDROGEN/20%CARBON MONOXIDE/NITROGEN 20%H2/20%CO/N2 091920%HYDROGEN/20%CARBON MONOXIDE/ARGON 20%H2/20%CO/Ar 09204%OXYGEN/NITROGEN 4%O2/N2 09212.5%ETHYLENE/HELIUM 2.5%C2H4/He 09221%SULFUR MONOXIDE/NITROGEN 1%SO/N2 092310%NITRIC OXIDE/NITROGEN 10%NO/N2 092410%PROPYLENE/NITROGEN 10%C3H6/N2 09253%HYDROGEN SULFIDE/HYDROGEN 3%H2S/H2 09266%DIBORANE/NITROGEN 6%B2H6/N2 09275%METHYLSILANE /HYDROGEN 5%CH6Si/H2 092810%METHANE/NITROGEN 10%CH4/N2 09293.9%HYDROGEN/NITROGEN 3.9%H2/N2 093012%TRISILANE/HYDROGEN 12%Si3H8/H2 09315%GERMANE/HYDROGEN 5%GeH4/H2 09322%DISILANE/HYDROGEN 2%Si2H6/H2 09332%OXYGEN/HELIUM 2%O2/He 09340.1%PHOSPHINE/HELIUM 0.1%PH3/He 093510%HELIUM/NITROGEN 10%He/N2 093612%CARBON DIOXIDE/AIR 12%CO2/Air 09372%GERMANE/HYDROGEN 2%GeH4/H2 093810%DIBORANE/HELIUM 10%B2H6/He 09399% TETRAKIS(ETHYLMETHYLAMIDO)HAFNIUM /N2 9%Hf(N((C2H5)(CH3))4/N2 09401%OXYGEN/ARGON 1%O2/Ar 094110%HYDROGEN SULFIDE/HYDROGEN 10%H2S/H2 094240%HYDROGEN/NITROGEN 40%H2/N2 094340%NITROGEN/CARBON DIOXIDE 40%N2/CO2 09441%NITRIC OXIDE/NITROGEN 1%NO/N2 094530%ETHYLENE/HELIUM 30%C2H4/He 094610%HYDROGEN CHLORIDE/ARGON 10%HCl/Ar 094720%PHOSPHINE/ARGON 20%PH3/Ar 09482%FLUORINE/NEON 2%F2/Ne 0949

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 40 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

10%HYDROGEN/HELIUM 10%H2/He 09507%ARSINE/HYDROGEN 7%AsH3/H2 09510.75%HYDROGEN SULFIDE/METHANE 0.75%H2S/CH4 095215%HYDROGEN/DIBORANE 15%H2/B2H6 095314%SIH2CL2/20%SIH4/33%HCL/N2 14%SiH2Cl2/20%SiH4/33%HCl/N2 095410%HYDROGEN/ARGON 10%H2/Ar 09552.7%ETHYLENE/HYDROGEN 2.7%C2H4/H2 09564.5%HYDROGEN/HELIUM 4.5%H2/He 095717%METHANE/CARBON DIOXIDE 17%CH4 / 83%CO2 09582.5%OXYGEN/NITROGEN 2.5%O2/N2 09595%OXYGEN/NITROGEN 5%O2/N2 096010%OXYGEN/NITROGEN 10%O2/N2 096120% MONO METHYL SILANE/H2 20%SiH3(CH3)/H2 096220%FLUORINE/N2 20%F2 /N2 09630.5% SILANE/ARGON 0.5% SiH4/Ar 0964

10 Mixed Gas Table Sorted by Percentage

Table 5 Mixed Gases Sorted by Percentage

MIXED GAS NAME SYMBOL CODE

0.01%DIBORANE/HYDROGEN 0.01%B2H6/H2 05470.01%PHOSPHINE/ARGON 0.01%PH3/Ar 08860.01%SILANE/HYDROGEN 0.01%SiH4/H2 05480.02%CARBON MONOXIDE/NITROGEN 0.02%CO/N2 07840.05%DIBORANE/HYDROGEN 0.05%B2H6/H2 06900.06%ARSINE/HYDROGEN 0.06%AsH3/H2 07080.1%CARBON MONOXIDE/NITROGEN 0.1%CO/N2 07860.1%DIBORANE/ARGON 0.1%B2H6/Ar 08880.1%HYDROGEN CHLORIDE/NITROGEN 0.1%HCl/N2 07900.1%HYDROGEN/0.25%CARBON MONOXIDE/1%OXYGEN/NITROGEN 0.1%H2/0.25%CO/1%O2/N2 08790.1%NITROGEN DIOXIDE/AIR 0.1%NO2/Air 07910.1%NITROGEN DIOXIDE/NITROGEN 0.1%NO2/N2 07920.1%PHOSPHINE/ARGON 0.1%PH3/Ar 08870.1%PHOSPHINE/HELIUM 0.1%PH3/He 09350.1%PHOSPHINE/HYDROGEN 0.1%PH3/H2 07930.1%PHOSPHINE/NITROGEN 0.1%PH3/N2 07890.2%HYDROGEN SULFIDE/NITROGEN 0.2%H2S/N2 09020.2%SULFUR DIOXIDE/AIR 0.2%SO2/Air 07940.25%CARBON MONOXIDE0/.1%HYDROGEN/1%OXYGEN/NITROGEN 0.25%CO/0.1%H2/1%O2/N2 07950.25%DIBORANE/HYDROGEN 0.25%B2H6/H2 07960.25%OXYGEN/0.5%HYDROGEN/1.5%CARBON MONOXIDE/NITROGEN 0.25%O20.5%H2/1.5%CO/N2 0797

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 41 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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Informational (Blue) Ballot1000AInformational (Blue) Ballotjn l

MIXED GAS NAME SYMBOL CODE

0.3%PHOSPHINE/SILANE 0.3%PH3/SiH4 06600.4%CHLORINE/NITROGEN 0.4%Cl2/N2 09050.4%HYDROGEN CHLORIDE/AIR .4%HCl/Air 07980.48%NITROGEN TRIFLUORIDE/NITROGEN 0.48%NF3/N2 09000.5% SILANE/ARGON 0.5% SiH4/Ar 09640.5%ARSINE/SILANE 0.5%AsH3/SiH4 07990.5%BORON TRICHLORIDE/HYDROGEN 0.5%BCI3/H2 06550.5%DIBORANE/ARGON 0.5%B2H6/Ar 05490.5%GERMANE/HYDROGEN 0.5%GeH4/H2 09100.5%PHOSPHINE/HELIUM 0.5%PH3/He 08890.5%PHOSPHINE/HYDROGEN 0.5%PH3/H2 06560.5%PHOSPHINE/NITROGEN 0.5%PH3/N2 05500.5%SILANE/HYDROGEN 0.5%SiH4/H2 05510.7%ARSINE/HELIUM 0.7%AsH3/He 07210.7%ARSINE/HYDROGEN 0.7%AsH3/H2 06730.7%GERMANIUM/HYDROGEN 0.7%GeH4/H2 07710.75%HYDROGEN SULFIDE/METHANE 0.75%H2S/CH4 09520.8%ARSINE/HYDROGEN 0.8%AsH3/H2 07410.8%CO/0.8%O2/20%CO2/32%N2/H2 SELOX GAS MIX 07740.8%DIBORANE/HYDROGEN 0.8%B2H6/H2 07430.8%DIBORANE/NITROGEN 0.8%B2H6/N2 06620.8%GERMANIUM TETRAFLUORIDE/HYDROGEN 0.8%GeF4/H2 07420.8%PHOSPHINE/DISILANE 0.8%PH3/Si2H6 06810.8%PHOSPHINE/HELIUM 0.8%PH3/He 06750.8%PHOSPHINE/HYDROGEN 0.8%PH3/H2 07070.8%PHOSPHINE/NITROGEN 0.8%PH3/N2 05520.8%PHOSPHINE/SILANE 0.8%PH3/SiH4 05530.9%ARSINE/HYDROGEN 0.9%AsH3/H2 05541%ACETYLENE/ETHYLENE 1%C2H2/C2H4 07721%ARSINE/HYDROGEN 1%AsH3/H2 07241%ARSINE/NITROGEN 1%AsH3/N2 05551%ARSINE/SILANE 1%AsH3/SiH4 05561%BORON TRICHLORIDE/HYDROGEN 1%BCI3/H2 05591%BORON TRICHLORIDE/NITROGEN 1%BCI3/N2 05601%BUTADIENE/BUTENE 1%C4H6-e)/C4H8-i) 07501%CARBON DIOXIDE/NITROGEN 1%CO2/N2 08001%CARBON MONOXIDE/19% NITROGEN/30%OXYGEN/CARBON DIOXIDE 1%CO/19%N2/30%O2/CO2 08011%CARBON MONOXIDE/AIR 1%CO/Air 08021%CARBON MONOXIDE/CARBON DIOXIDE 1%CO/CO2 08031%CHLORINE/NITROGEN 1%Cl2/N2 08041%DIBORANE/ARGON 1%B2H6/Ar 08051%DIBORANE/HYDROGEN 1%B2H6/H2 05571%DIBORANE/NITROGEN 1%B2H6/N2 0558

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 42 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

1%FLUORINE/NEON 1%F2/Ne 07331%GERMANE/HYDROGEN 1%GeH4/H2 08981%GERMANE/NITROGEN 1%GeH4/N2 06581%HYDROGEN SELENIDE/HYDROGEN 1%H2Se/H2 06451%HYDROGEN SULFIDE/HYDROGEN 1%H2S/H2 06441%HYDROGEN SULFIDE/NITROGEN 1%H2S/N2 08061%HYDROGEN/NITROGEN 1%H2/N2 05611%METHANE/49.5%CARBON DIOXIDE/ARGON 1%CH4/49.5%CO2/Ar 08071%METHYLSILANE (MONO)/HYDROGEN 1%CH6Si/H2 08991%NITRIC OXIDE/NITROGEN 1%NO/N2 09451%NITROGEN DIOXIDE/AIR 1%NO2/Air 08081%NITROGEN DIOXIDE/NITROGEN 1%NO2/N2 07811%NITROGEN/HYDROGEN 1%N2/H2 08711%OXYGEN/ARGON 1%O2/Ar 09411%OXYGEN/NITROGEN 1%O2/N2 05621%PHOSPHINE/ARGON 1%PH3/Ar 05371%PHOSPHINE/HELIUM 1%PH3/He 05461%PHOSPHINE/HYDROGEN 1%PH3/H2 05631%PHOSPHINE/NITROGEN 1%PH3/N2 05141%PHOSPHINE/SILANE 1%PH3/SiH4 05311%SILANE/DIBORANE 1%SiH4/B2H6 06841%SILANE/HELIUM 1%SiH4/He 07451%SULFUR DIOXIDE/ARGON 1%SO2/Ar 08091%SULFUR DIOXIDE/NITROGEN 1%SO2/N2 07821%SULFUR MONOXIDE/NITROGEN 1%SO/N2 09231%TRIMETHYL BORATE(TMB)/HYDROGEN 1%(CH3O)3B/H2 05261%TRIMETHYL BORATE/HELIUM 1%(CH3O)3B/He 09151.5%ARSINE/HYDROGEN 1.5%AsH3/H2 05641.5%GERMANE/HYDROGEN 1.5%GeH4/H2 07751.5%PHOSPHINE/SILANE 1.5%PH3/SiH4 05331.5%SILANE/ARGON 1.5%SiH4/Ar 08101.6%PHOSPHINE/21%SILANE/ARGON 1.6%PH3/21%SiH4/Ar 05151.65%ACETYLENE/70%ETHYLENE/NITROGEN 1.65%C2H2/70%C2H4/N2 08731.8%SILANE/NITROGEN 1.8%SiH4/N2 08111.9%SILANE/NITROGEN 1.9%SiH4/N2 081210%AMMONIA/NITROGEN 10%NH3/N2 066810%ARSINE/HYDROGEN 10%AsH3/H2 050410%ARSINE/NITROGEN 10%AsH3/N2 090710%CARBON DIOXIDE/10%OXYGEN/NITROGEN 10%CO2/10%O2/N2 073510%CARBON DIOXIDE/ARGON 10%CO2/Ar 081310%CARBON DIOXIDE/NITROGEN 10%CO2/N2 078310%CARBON MONOXIDE/AIR 10%CO/Air 073010%CARBON MONOXIDE/CARBON DIOXIDE 10%CO/CO2 072910%CYCLOPROPANE/HELIUM 10%C3H6-a)/He 0716

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 43 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

10%DIBORANE/ARGON 10%B2H6/Ar 088110%DIBORANE/HELIUM 10%B2H6/He 093910%DIBORANE/HYDROGEN 10%B2H6/H2 070110%DIBORANE/NITROGEN 10%B2H6/N2 066610%DISILANE/ARGON 10%Si2H6/Ar 067010%DISILANE/HELIUM 10%Si2H6/He 064710%DISILANE/HYDROGEN 10%Si2H6/H2 073110%ETHYLENE/HELIUM 10%C2H4/He 071810%FLUORINE/ARGON 10%F2/Ar 075410%FLUORINE/HELIUM 10%F2/He 056610%FLUORINE/NITROGEN 10%F2/N2 075910%FLUORINE/OXYGEN 10%F2/O2 081410%GERMANE/ARGON 10%GeH4/Ar 069810%GERMANE/HELIUM 10%GeH4/He 070410%GERMANE/HYDROGEN 10%GeH4/H2 050910%HELIUM/HYDROGEN 10%He/H2 074910%HELIUM/NITROGEN 10%He/N2 093610%HYDROGEN CHLORIDE/ARGON 10%HCl/Ar 094710%HYDROGEN SELENIDE/HYDROGEN 10%H2Se/H2 051110%HYDROGEN SULFIDE/HYDROGEN 10%H2S/H2 094210%HYDROGEN/ARGON 10%H2/Ar 095510%HYDROGEN/HELIUM 10%H2/He 095010%HYDROGEN/NITROGEN 10%H2/N2 053210%METHANE/ARGON 10%CH4/Ar 071010%METHANE/HELIUM 10%CH4/He 074410%METHANE/HYDROGEN 10%CH4/H2 081510%METHANE/NITROGEN 10%CH4/N2 092910%METHYLSILANE/HYDROGEN 10%CH6Si/H2 068910%METHYLTRICHLOROSILANE /HYDROGEN 10%CH3Cl3Si/H2 091810%NITRIC OXIDE/NITROGEN 10%NO/N2 092410%NITROGEN TRIFLUORIDE/OXYGEN 10%NF3/O2 057010%NITROGEN/ARGON 10%N2/Ar 057610%OXYGEN/30%CARBON DIOXIDE/ARGON 10%O2/30%CO2/Ar 081610%OXYGEN/HELIUM 10%O2/He 0649

10%OXYGEN/NITROGEN 10%O2/N2 096110%OZONE/NITROGEN 10%O3/N2 081710%OZONE/OXYGEN 10%O3/O2 057110%PHOSPHINE/ARGON 10%PH3/Ar 053810%PHOSPHINE/HELIUM 10%PH3/He 067410%PHOSPHINE/HYDROGEN 10%PH3/H2 051610%PHOSPHINE/NITROGEN 10%PH3/N2 052710%PHOSPHINE/SILANE 10%PH3/SiH4 057210%PROPYLENE/NITROGEN 10%C3H6/N2 092510%SILANE/ARGON 10%SiH4/Ar 0565

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 44 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

10%SILANE/HELIUM 10%SiH4/He 057310%SILANE/HYDROGEN 10%SiH4/H2 057510%SILANE/NITROGEN 10%SiH4/N2 064610%SULFUR DIOXIDE/NITROGEN 10%SO2/N2 081810%TRIMETHYSILANE/HYDROGEN 10%(CH3)3SiH/H2 073910%WATER VAPOR/NITROGEN 10%H2O/N2 056811%OZONE/OXYGEN 11%O3/O2 086812%CARBON DIOXIDE/AIR 12%CO2/Air 093712%HYDROGEN/NITROGEN 12%H2/N2 081912%OZONE/OXYGEN 12%O3/O2 065112%TRISILANE/HYDROGEN 12%Si3H8/H2 093113%DISELENIUM DICHLORIDE/HYDROGEN 13%Se2Cl2/H2 089413%HYDROGEN CHLORIDE/1.32%XENON/NEON 13%HCI/1.32%Xe/Ne 051213%HYDROGEN/NITROGEN 13%H2/N2 064313%TRICHLOROSILANE/HYDROGEN 13%SiHCI3/H2 068214%SIH2CL2/20%SIH4/33%HCL/N2 14%SiH2Cl2/20%SiH4/33%HCl/N2 095415%ARGON/PHOSPHINE 15%Ar/PH3 057815%ARSINE/HYDROGEN 15%AsH3/H2 057915%CARBON DIOXIDE/NITROGEN 15%CO2/N2 077815%DIBORANE/ARGON 15%B2H6/Ar 069715%DIBORANE/HYDROGEN 15%B2H6/H2 082015%DIBORANE/NITROGEN 15%B2H6/N2 058015%GERMANIUM TETRACHLORIDE/OXYGEN 15%GeCl4/O2 078715%HYDROGEN/ARGON 15%H2/Ar 069415%HYDROGEN/DIBORANE 15%H2/B2H6 095315%HYDROGEN/NITROGEN 15%H2/N2 054515%NITRIC OXIDE/NITROGEN 15%NO/N2 065215%OZONE/OXYGEN 15%O3/O2 064115%PHOSPHINE/15%SILANE/NITROGEN 15%PH3/15%SiH4/N2 058115%PHOSPHINE/ARGON 15%PH3/Ar 058215%PHOSPHINE/HYDROGEN 15%PH3/H2 058315%PHOSPHINE/NITROGEN 15%PH3/N2 050015%PHOSPHINE/SILANE 15%PH3/SiH4 058415%SILANE/ARGON 15%SiH4/Ar 082115%SILANE/HELIUM 15%SiH4/He 086415%SILANE/NITROGEN 15%SiH4/N2 051916%CARBON DIOXIDE/NITROGEN 16%CO2/N2 054317%METHANE/CARBON DIOXIDE 17%CH4 / 83%CO2 095817%OXYGEN/CARBON TETRAFLUORIDE(FREON-14) 17%O2/CF4 058517.4%GERMANIUM TETRACHLORIDE/HYDROGEN 17.4%GeCl4/H2 089118.4%PHOSPHORUS OXYCHLORIDE/OXYGEN 18.4%POCl3/O2 08932%ARSINE/HYDROGEN 2%AsH3/H2 07032%ARSINE/NITROGEN 2%AsH3/N2 05862%ARSINE/SILANE 2%AsH3/SiH4 0663

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 45 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

2%DIBORANE/ARGON 2%B2H6/Ar 05872%DIBORANE/NITROGEN 2%B2H6/N2 06952%DISILANE/HELIUM 2%Si2H6/He 07642%DISILANE/HYDROGEN 2%Si2H6/H2 09332%FLUORINE/NEON 2%F2/Ne 09492%GERMANE/ARGON 2%GeH4/Ar 07402%GERMANE/HYDROGEN 2%GeH4/H2 09382%HYDROGEN SULFIDE/NITROGEN 2%H2S/N2 09032%HYDROGEN/NITROGEN 2%H2/N2 05882%METHYSILANE/HYDROGEN 2%CH6Si/H2 07172%NITRIC OXIDE/NITROGEN 2%NO/N2 08222%NITROGEN DIOXIDE/NITROGEN 2%NO2/N2 09042%NITROGEN/3%CARBON MONOXIDE/17%CARBON DIOXIDE/HYDROGEN 2%N2/3%CO/17%CO2/H2 07882%OXYGEN/ARGON 2%O2/Ar 08632%OXYGEN/HELIUM 2%O2/He 09342%OZONE/OXYGEN 2%O3/O2 05692%PHOSPHINE/ARGON 2%PH3/Ar 05392%PHOSPHINE/HYDROGEN 2%PH3/H2 09162%PHOSPHINE/NITROGEN 2%PH3/N2 06402%PHOSPHINE/SILANE 2%PH3/SiH4 06962%SILANE/ARGON 2%SiH4/Ar 08232%SILANE/HELIUM 2%SiH4/He 05892%SILANE/HYDROGEN 2%SiH4/H2 05442%SILANE/NITROGEN 2%SiH4/N2 06532%SULFUR DIOXIDE/NITROGEN 2%SO2/N2 08242%TRICHLOROETHANE/NITROGEN 2%C2H3Cl3/N2 05062.5%DIBORANE/HYDROGEN 2.5%B2H6/H2 08252.5%ETHYLENE/HELIUM 2.5%C2H4/He 09222.5%METHANE/AIR 2.5%CH4/Air 08262.5%OXYGEN/5%CARBON DIOXIDE/NITROGEN 2.5%O2/5%CO2/N2 08662.5%OXYGEN/NITROGEN 2.5%O2/N2 09592.7%ETHYLENE/HELIUM 2.7%C2H4/He 08972.7%ETHYLENE/HYDROGEN 2.7%C2H4/H2 095620% MONO METHYL SILANE/H2 20%SiH3(CH3)/H2 096220%ARGON/SILANE 20%Ar/SiH4 054020%ARSINE/HYDROGEN 20%AsH3/H2 059020%CARBON DIOXIDE/HYDROGEN 20%CO2/H2 050720%CARBON TETRAFLUORIDE/NITROGEN 20%CF4/N2 072820%DIBORANE/HELIUM 20%B2H6/He 090820%DIBORANE/SILANE 20%B2H6/SiH4 059120%DISILANE/HELIUM 20%Si2H6/He 064820%DISILANE/HYDROGEN 20%Si2H6/H2 071320%FLUORINE/HELIUM 20%F2/He 0677

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 46 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

20%FLUORINE/N2 20%F2 /N2 096320%FLUOROFORM/OXYGEN 20%CHF3/O2 082720%HELIUM/OXYGEN 20%He/O2 068720%HYDROGEN/20%CARBON MONOXIDE/ARGON 20%H2/20%CO/Ar 092020%HYDROGEN/20%CARBON MONOXIDE/NITROGEN 20%H2/20%CO/N2 091920%HYDROGEN/CARBON MONOXIDE 20%H2/CO 059220%NITROGEN/HYDROGEN 20%N2/H2 088020%OXYGEN/ARGON 20%O2/Ar 087520%OXYGEN/CARBON TETRAFLUORIDE(FREON-14) 20%O2/CF4 051320%OXYGEN/HELIUM 20%O2/He 053620%OXYGEN/NITROGEN 20%O2/N2 073620%OZONE/NITROGEN 20%O3/N2 072320%OZONE/OXYGEN 20%O3/O2 086920%PHOSPHINE/ARGON 20%PH3/Ar 094820%PHOSPHINE/HYDROGEN 20%PH3/H2 059320%PHOSPHINE/NITROGEN 20%PH3/N2 076720%PHOSPHINE/SILANE 20%PH3/SiH4 053020%SILANE/ARGON 20%SiH4/Ar 054120%SILANE/HELIUM 20%SiH4/He 052920%SILANE/HYDROGEN 20%SiH4/H2 057720%SILANE/NITROGEN 20%SiH4/N2 050220%TRICHLOROSILANE/HYDROGEN 20%SiHCI3/H2 052220%TRIMETHYLALUMINUM(TMAI)/HYDROGEN 20%(CH3)3AI/H2 052521%OXYGEN/NITROGEN 21%O2/N2 059421%SILANE/4%PHOSPHINE/ARGON 21%SiH4/4%PH3/Ar 052021.6%CARBON DIOXIDE/32.4%NITROGEN/HYDROGEN 21.6%CO2/32.4%N2/H2 088222%OXYGEN/HELIUM 22%O2/He 082822%PHOSPHINE/SILANE 22%PH3/SiH4 067825%AMMONIA/HYDROGEN 25%NH3/H2 063825%CARBON MONOXIDE/HYDROGEN 25%CO/H2 082925%FLUORINE/ARGON 25%F2/Ar 075525%FLUORINE/HELIUM 25%F2/He 075825%FLUORINE/NITROGEN 25%F2/N2 074625%HELIUM/ARGON 25%He/Ar 073725%HEXAFLUOROETHANE/OXYGEN 25%C2F6/O2 077025%PHOSPHINE/SILANE 25%PH3/SiH4 051725%PROPANE/PROPYLENE 25%C3H8/C3H6 083025%TRICHLOROSILANE/HYDROGEN 25%SiHCI3/H2 06803%AMMONIA/NITROGEN 3%NH3/N2 08313%ARSINE/ARGON 3%AsH3/Ar 06883%ARSINE/HYDROGEN 3%AsH3/H2 06653%BORON TRICHLORIDE/HYDROGEN 3%BCl3/H2 08323%DIBORANE/5%SILANE/NITROGEN 3%B2H6/5%SiH4/N2 06593%DIBORANE/HYDROGEN 3%B2H6/H2 0657

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 47 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

3%DIBORANE/NITROGEN 3%B2H6/N2 05953%ETHYLENE/HELIUM 3%C2H4/He 08783%HELIUM/NITROGEN 3%He/N2 09143%HYDROGEN SULFIDE/HYDROGEN 3%H2S/H2 09263%HYDROGEN/ARGON 3%H2/Ar 08333%HYDROGEN/HELIUM 3%H2/He 05963%HYDROGEN/NITROGEN 3%H2/N2 05973%NITROGEN/HYDROGEN 3%N2/H2 06723%OXYGEN/HELIUM 3%O2/He 05983%OZONE/AIR 3%O3/Air 05993%PHOSPHINE/5%SILANE/NITROGEN 3%PH3/5%SiH4/N2 06713%PHOSPHINE/ARGON 3%PH3/Ar 05343%PHOSPHINE/HELIUM 3%PH3/He 08343%PHOSPHINE/NITROGEN 3%PH3/N2 06003%PHOSPHINE/SILANE 3%PH3/SiH4 06013%PROPANE/HYDROGEN 3%C3H8/H2 08723%SILANE/HELIUM 3%SiH4/He 06023%SILANE/HYDROGEN 3%SiH4/H2 08703.5%CARBON DIOXIDE/HELIUM 3.5%CO2/He 08353.5%HYDROGEN/NITROGEN 3.5%H2/N2 07683.9%HYDROGEN/NITROGEN 3.9%H2/N2 093030% ISOBUTANE/HELIUM 30%CH(CH3)3/He 083630%CARBON DIOXIDE/AIR 30%CO2/Air 050830%ETHYLENE/HELIUM 30%C2H4/He 094630%GERMANE/ARGON 30%GeH4/Ar 083730%HELIUM/OXYGEN 30%He/O2 060330%NITROGEN TRIFLUORIDE/NITROGEN 30%NF3/N2 066130%OXYGEN/HELIUM 30%O2/He 060430%OXYGEN/HYDROGEN 30%O2/H2 063730%PHOSPHINE/SILANE 30%PH3/SiH4 089630%PROPANE/BUTANE 30%C3H8/C4H10 088530%SILANE/ARGON 30%SiH4/Ar 083830%SILANE/NITROGEN 30%SiH4/N2 083930%TRICHLOROSILANE/HYDROGEN 30%SiHCl3/H2 087730%TRIMETHYLSILANE/HYDROGEN 30%(CH3)3SiH/H2 087432%SILICON TETRACHLORIDE/HYDROGEN 32%SiCl4/O2 089233.3%HYDROGEN/CARBON MONOXIDE 33.3%H2/CO 084035%PHOSPHINE/SILANE 35%PH3/SiH4 08414%DIBORANE/NITROGEN 4%B2H6/N2 06054%GERMANE/HYDROGEN 4%GeH4/H2 09114%HELIUM/NITROGEN 4%He/N2 07384%HYDROGEN/ARGON 4%H2/Ar 07004%HYDROGEN/HELIUM 4%H2/He 06064%HYDROGEN/NITROGEN 4%H2/N2 0607

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 48 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

4%NITROGEN/HYDROGEN 4%N2/H2 06084%OXYGEN/CARBON TETRAFLUORIDE(FREON-14) 4%O2/CF4 06094%OXYGEN/NITROGEN 4%O2/N2 09214%PHOSPHINE/ARGON 4%PH3/Ar 06914%PHOSPHINE/HELIUM 4%PH3/He 06104%PHOSPHINE/NITROGEN 4%PH3/N2 05354%PHOSPHINE/SILANE 4%PH3/SiH4 06114%SILANE/NITROGEN 4%SiH4/N2 08424%TETRAFLUOROETHANE (FREON-134A)/44%PENTAFLUOROETHANE (FREON-125)/ ETHANE,1,1,1-TRIFLUORO-(HFC-143a) 4%C2H2F4/44%C2HF5/C2H3F3 08844.5%HYDROGEN/HELIUM 4.5%H2/He 09574.5%HYDROGEN/NITROGEN 4.5%H2/N2 09134.5%PHOSPHINE/NITROGEN 4.5%PH3/N2 05284.6%SULFUR DIOXIDE/NITROGEN 4.6%SO2/N2 090640%ARGON/TUNGSTEN HEXAFLUORIDE 40%Ar/WF6 050340%GERMANE/ARGON 40%GeH4/Ar 075140%GERMANE/NITROGEN 40%GeH4/N2 089540%HELIUM/SILANE 40%He/SiH4 061240%HYDROGEN/HELIUM 40%H2/He 072540%HYDROGEN/NITROGEN 40%H2/N2 094340%NITROGEN/CARBON DIOXIDE 40%N2/CO2 094440%OXYGEN/HEXAFLUOROETHANE(FREON-116) 40%O2/C2F6 050540%OXYGEN/SULFUR HEXAFLUORIDE 40%O2/SF6 064240%SILANE/HELIUM 40%SiH4/He 07025%ACETONE/NITROGEN 5%C3H6O-m)/N2 07115%AMMONIA/NITROGEN 5%NH3/N2 08435%ARSINE/HYDROGEN 5%AsH3/H2 06145%BENZENE/NITROGEN 5%C6H6/N2 07125%BORON TRICHLORIDE/HYDROGEN 5%BCI3/H2 06165%BORON TRIFLUORIDE/HELIUM 5%BF3/He 07765%CARBON DIOXIDE/10%OXYGEN/NITROGEN 5%CO2/10%O2/N2 08675%CARBON DIOXIDE/15%OXYGEN/NITROGEN 5%CO2/15%O2/N2 07345%CARBON DIOXIDE/5%OXYGEN/NITROGEN 5%CO2/5%O2/N2 08655%CARBON DIOXIDE/NITROGEN 5%CO2/N2 06185%CARBON MONOXIDE/ARGON 5%CO/Ar 08445%CARBON MONOXIDE/NITROGEN 5%CO/N2 08625%CHLORINE/HELIUM 5%CI2/He 07195%DIBORANE/5%SILANE/NITROGEN 5%B2H6/5%SiH4/N2 08765%DIBORANE/ARGON 5%B2H6/Ar 06155%DIBORANE/HELIUM 5%B2H6/He 07665%DIBORANE/HYDROGEN 5%B2H6/H2 07225%DIBORANE/NITROGEN 5%B2H6/N2 06545%DIBORANE/SILANE 5%B2H6/SiH4 0683

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 49 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

5%DICHLOROSILANE/ARGON 5%SiH2CI2/Ar 06285%ETHENE/NITROGEN 5%C2H4/N2 08455%FLUORINE/ARGON 5%F2/Ar 07615%FLUORINE/HELIUM 5%F2/He 07205%FLUORINE/NITROGEN 5%F2/N2 07325%FLUORINE/NITROGEN TRIFLUORIDE 5%F2/NF3 06695%GERMANE/HELIUM 5%GeH4/He 07655%GERMANE/HYDROGEN 5%GeH4/H2 09325%HELIUM/ARGON 5%He/Ar 08465%HELIUM/HYDROGEN 5%He/H2 09095%HELIUM/NITROGEN 5%He/N2 07525%HEXAFLUOROETHANE/OXYGEN 5%C2F6/O2 07855%HYDROGEN CHLORIDE/NITROGEN 5%HCI/N2 07265%HYDROGEN SELENIDE/HYDROGEN 5%H2Se/H2 05105%HYDROGEN/ARGON 5%H2/Ar 06195%HYDROGEN/HELIUM 5%H2/He 07625%HYDROGEN/NITROGEN 5%H2/N2 05425%METHANE/HELIUM 5%CH4/He 06995%METHYLSILANE /HYDROGEN 5%CH6Si/H2 09285%NITROGEN/HYDROGEN 5%N2/H2 06215%NITROGEN/PHOSPHINE 5%N2/PH3 06225%OXYGEN/ARGON 5%O2/Ar 06235%OXYGEN/CARBON TETRAFLUORIDE 5%O2/CF4 07535%OXYGEN/HELIUM 5%O2/He 07795%OXYGEN/NITROGEN 5%O2/N2 09605%OZONE/OXYGEN 5%O3/O2 06245%PHOSPHINE/5%SILANE/NITROGEN 5%PH3/5%SiH4/N2 06255%PHOSPHINE/ARGON 5%PH3/Ar 06265%PHOSPHINE/HELIUM 5%PH3/He 06935%PHOSPHINE/HYDROGEN 5%PH3/H2 07095%PHOSPHINE/NITROGEN 5%PH3/N2 05015%PHOSPHINE/SILANE 5%PH3/SiH4 06275%PHOSPHORUS PENTAFLUORIDE/HELIUM 5%PF5/He 07775%PROPANE/HYDROGEN 5%C3H8/H2 06175%SILANE/ARGON 5%SiH4/Ar 06295%SILANE/HELIUM 5%SiH4/He 07805%SILANE/HYDROGEN 5%SiH4/H2 08475%SILANE/NITROGEN 5%SiH4/N2 07735%SULFUR DIOXIDE/HELIUM 5%SO2/He 07635%TETRAETHYLORTHOSILICATE(TEOS)/NITROGEN 5%Si(C2H5O)4/N2 05235%TRICHLOROSILANE/HYDROGEN 5%SiHCI3/H2 06795%TRIETHYLANTIMONY(TESb)/HYDROGEN 5%(C2H5)3Sb/H2 05245%WATER VAPOR/AIR 5%H2O/Air 05675.5%ARSENIC TRICHLORIDE/HYDROGEN 5.5%AsCl3/H2 0890

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 50 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

50%BUTANE/ACETYLENE 50%C4H10/C2H2 091250%CARBON DIOXIDE/NITROGEN 50%CO2/N2 084850%FLUORINE/ARGON 50%F2/Ar 075650%FLUORINE/HELIUM 50%F2/He 075750%FLUORINE/NITROGEN 50%F2/N2 076050%FLUOROFORM/ARGON 50%CHF3/Ar 068650%GERMANE/ARGON 50%GeH4/Ar 074750%HELIUM/ARGON 50%He/Ar 084950%HELIUM/OXYGEN 50%He/O2 063050%HEXAFLUOROETHANE/OXYGEN 50%C2F6/O2 076950%HYDROGEN BROMIDE/HYDROGEN CHLORIDE 50%HBr/HCI 065050%HYDROGEN/NITROGEN 50%H2/N2 085050%NITROGEN DIOXIDE/AMMONIA 50%NO2/NH3 085150%NITROGEN/HELIUM 50%N2/He 085250%NITROGEN/OXYGEN 50%N2/O2 063150%PHOSPHINE/NITROGEN 50%PH3/N2 051850%PHOSPHINE/SILANE 50%PH3/SiH4 063250%PROPYLENE/NITROGEN 50%C3H6/N2 091750%SILANE/HELIUM 50%SiH4/He 052150%SILANE/HYDROGEN 50%SiH4/H2 063350%SULFUR DIOXIDE/NITRIC OXIDE 50%SO2/NO 08536%CARBON DIOXIDE/NITROGEN 6%CO2/N2 08546%DIBORANE/NITROGEN 6%B2H6/N2 09276%HYDROGEN CHLORIDE/OXYGEN 6%HCl/O2 08556%HYDROGEN/NITROGEN 6%H2/N2 08566%OZONE/OXYGEN 6%O3/O2 08576.5%DIBORANE/15%SILANE/NITROGEN 6.5%B2H6/15%SiH4/N2 06346.5%DIBORANE/HYDROGEN 6.5%B2H6/H2 06356.5%DIBORANE/NITROGEN 6.5%B2H6/N2 08587%ARSINE/HYDROGEN 7%AsH3/H2 09517%CARBON DIOXIDE/10%HYDROGEN/20%CARBON MONOXIDE/NITROGEN 7%CO2/10%H2/20%CO/N2 07487%HYDROGEN/ARGON 7%H2/Ar 08597%HYDROGEN/HELIUM 7%H2/He 08837%METHYLENE CHLORIDE/3%OZONE/AIR 7%CH2CI2/3%O3/Air 06857%OZONE/OXYGEN 7%O3/O2 09017.5%PHOSPHINE/SILANE 7.5%PH3/SiH4 06768%CARBON TETRAFLUORIDE(FREON-14)/OXYGEN 8%CF4/O2 05748%DIBORANE/ARGON 8%B2H6/Ar 08608%DIBORANE/NITROGEN 8%B2H6/N2 08618%GERMANE/HYDROGEN 8%GeH4/H2 06648%HYDROGEN/ARGON 8%H2/Ar 06928%HYDROGEN/NITROGEN 8%H2/N2 07278%OXYGEN/CARBON TETRAFLUORIDE(FREON-14) 8%O2/CF4 0613

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 51 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023

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MIXED GAS NAME SYMBOL CODE

8%OZONE/OXYGEN 8%O3/O2 06398%PHOSPHINE/HELIUM 8%PH3/He 06678%PHOSPHINE/NITROGEN 8%PH3/N2 06208%PHOSPHINE/SILANE 8%PH3/SiH4 06368%PROPANE/10%AMMONIA/AIR 8%C3H8/10%NH3/Air 07148.2%PROPANE/9.8%AMMONIA/AIR 8.2%C3H8/9.8%NH3/Air 07158.6%ARGON/NITROGEN TRIFLUORIDE 8.6%Ar/NF3 07069% TETRAKIS(ETHYLMETHYLAMIDO)HAFNIUM /N2 9%Hf(N((C2H5)(CH3))4/N2 09409.4%ARGON/NITROGEN TRIFLUORIDE 9.4%Ar/NF3 0705

11 Related Document11.1 Data Sheet

Schumacher Material Safety Data Sheet, No. 48.1 JN, Revision Date 8/9414

NOTICE: SEMI makes no warranties or representations as to the suitability of the standard set forth herein for any particular application. The determination of the suitability of the standard is solely the responsibility of the user. Users are cautioned to refer to manufacturer’s instructions, product labels, product data sheets, and other relevant literature respecting any materials mentioned herein. These standards are subject to change without notice.

The user’s attention is called to the possibility that compliance with this standard may require use of copyrighted material or of an invention covered by patent rights. By publication of this standard, SEMI takes no position respecting the validity of any patent rights or copyrights asserted in connection with any item mentioned in this standard. Users of this standard are expressly advised that determination of any such patent rights or copyrights, and the risk of infringement of such rights, are entirely their own responsibility

14 Schumacher, 1969 Palomar Oaks Way, Carlsbad, CA 92009-1307, 619.931.9555

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Page 52 Doc. B SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: B

Date: 5/9/2023