CORRECTIONS

Spatially Localized Photoluminescence at 1.5 Micrometers Wavelength in Direct Laser Written Optical Nanostructures**

By Sean Wong,* Oliver Kiowski, Manfred Kappes, Jorg K. N. Lindner, Nirajan Mandal, Frank C. Peiris, Geoffrey A. Ozin,

Michael Thiel, Markus Braun, Martin Wegener, and Georg von Freymann*

Advanced Materials 2008, 20, 4097–4102.

DOI: 10.1002/adma.200801508

The following errors appear in the above article:

The inset of Figure 3 was missing. The correct representation of Figure 3 is shown here:

Figure 3. SEM image of the step-ladder structure with one of the supporting walls removed via FIB milling.

The position of the Er-doped layer is highlighted with a red line as a guide to the eye. The bars are systematically

shifted vertically in 200nm steps relative to the doping layer, starting from the substrate (top left side of the SEM image).

High-magnification SEM imaging of the Er/As2S3 layer (inset) shows that it has a thickness of 139nm

(this value takes into account a sample stage tilt of 548).

Several characters in Figure 4 were incorrectly displayed. The correct representation of Figure 4 is shown below:

Figure 4. a) A schematic of the step-ladder structure (center), and the results of the spatially resolved confocal PL

imaging technique in the 1D line-scan mode (bottom) and 2D imaging mode (inset). b) A representative cross-section

SEM image of the bars (left) that were examined to construct a model (centre) used to show the progression of the Er

doping layer in the bars situated between at the positions between 5 and 65 mm of the step-ladder structure (right).

c) SEM images of bars positioned above the erbium doping layer (highlighted in red). Part of the highlighting is removed

to show actual Er/As2S3 layer (indicated with a red-arrow).