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ZEISS SmartEDX The ZEISS EDS Solution Dedicated to Your Routine SEM Microanalysis Applications Streamlining SEM Imaging and Microanalysis zeiss.com/microscopy

Streamlining SEM Imaging and Microanalysis

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Page 1: Streamlining SEM Imaging and Microanalysis

ZEISS SmartEDXThe ZEISS EDS Solution Dedicated to Your RoutineSEM Microanalysis Applications

Streamlining SEM Imaging and Microanalysis

zeiss.com/microscopy

Page 2: Streamlining SEM Imaging and Microanalysis

2

If SEM imaging alone isn’t enough to gain a complete under- standing of parts or samples, investigators will turn to Energy Dispersive Spectroscopy (EDS) to acquire spatially resolved ele-mental information from these surfaces.

ZEISS SmartEDX is the dedicated microanalysis solution designed specifically

for analytical routine applications performed on the ZEISS EVO Family and

Sigma 300.

SmartEDX is one of the ZEISS’ workflow-guided solutions, which are developed

to improve both ease of use and workflow repeatability in multi-user environ-

ments.

ZEISS SmartEDX is ideal for customers with a vested interest in streamlining their

number of analytical equipment suppliers. And because SmartEDX is supported

entirely by ZEISS, you can trust your EVO or Sigma 300 equipped with SmartEDX

to your ZEISS service engineer, who will take care of the entire system, both

imaging and microanalysis alike.

The ZEISS EDS Solution Dedicated to Your Routine SEM Microanalysis Applications

ZEISS SmartEDX (fixed version): Peltier-cooled, ultra-compact design

Familiarity through consistency: Intuitive, workflow-guided graphical user interface

› In Brief

› The Advantages

› The Applications

› Technology and Details

Page 3: Streamlining SEM Imaging and Microanalysis

3

Simpler. More Intelligent. More Integrated.

Workflow-guided Graphical User

Interface

Like other ZEISS workflow-guided software

solutions, such as SmartSEM Touch, ZEN core,

or Shuttle & Find for EVO and Sigma 300, the

SmartEDX software is easy to learn, intuitive

to use, and helps ensure repeatable execution

of analytical tasks on the SEM, particularly in

environments where more than one operator

will be using the system.

Total system support

SmartEDX is supported like any other ZEISS

component. All installation, preventive mainte-

nance, warranty, diagnostics and repair, spare

part logistics, and inclusion in total system service

contracts are fully handled by ZEISS, making

support of your analytical SEM solution easy.

Resolution and throughput that are

optimized for routine microanalysis

applications

Not every SEM is alike, and the same is true for

EDS solutions; thus, SEM and EDS have to be

paired with careful consideration. SmartEDX

provides highest (output count rate) throughput

at 129 eV energy resolution and 1-5 nA probe

current, which is the typical analytical operating

condition for both ZEISS EVO and Sigma 300

Scanning Electron Microscopes. This makes

SmartEDX a smart match to both our conventional

and field emission analytical SEM workhorses.

ZEISS SmartEDX user interface ZEISS EVO Scanning Electron Microscope with high vacuum and 30 kV beam acceleration capabilities

SmartEDX is supported entirely by ZEISS.

› In Brief

› The Advantages

› The Applications

› Technology and Details

Page 4: Streamlining SEM Imaging and Microanalysis

N7

He2

Ne10

F9

O8

C6

B5

Ar18

Cl17

S16

P15

Si14

Al13

Kr36

Br35

Se34

As33

Ge32

Ga31

Zn30

Cu29

Ni28

Co27

Fe26

Mn25

Cr24

V23

Ti22

Sc21

Ca20

K19

Mg12

Na11

Be4

Li3

H1

Xe54

I53

Te52

Sb51

Sn50

In49

Cd48

Ag47

Pd46

Rh45

Ru44

Tc43

Mo42

Nb41

Zr40

Y39

Sr38

Rb37

Rn86

At85

Po84

Bi83

Pb82

Dy66

Tb65

Gd64

Eu63

Sm62

Pm61

Nd60

Pr59

Ce58

La57

Ba56

Cs55

Rg111

Ds110

Mt109

Hs108

Bh107

Sg106

Db105

Rf104

Ra88

Fr87

Lu71

Yb70

Tm69

Er68

Ho67

Tl81

Hg80

Au79

Pt78

Ir77

Os76

Re75

W74

Ta73

Hf72

Bk97

Lr103

No102

Md101

Fm100

Es99

Cf98

Cm96

Am95

Pu94

Np93

U92

Pa91

Th90

Ac89

Co27

Fe26

6.40 7.06

0.70 0.72

Mn25

Rh45

Ru44

Tc43

180 K160 K140 K120 K100 K

80 K60 K40 K20 K

0 K0.0 1.7 3.4 5.1 6.8 8.5 10.2

4

SEM operating conditions

The SEM must have the ability to create a high

vacuum environment in the specimen chamber

to avoid scattering of the primary electron beam.

Beam scatter compromises the spatial resolution

of the elemental chemistry data. Furthermore,

the SEM must be able to adjust the primary beam

acceleration energy to sufficiently high values –

up to 30 kV – for optimal signal to noise ratio of

the peaks in the X-ray spectrum. ZEISS EVO and

Sigma 300 solutions meet these requirements for

delivery of the reproducible and accurate EDS data

you require in your daily decision making.

EDS operating conditions

SmartEDX has the versatility to provide 129 eV

intensity peak (energy) resolution, as well as opti-

mized detection of low energy X-rays from light

elements thanks to superior transmissivity of the

silicon nitride window on its X-ray detector.

SmartEDX at Work: Quantitative Microanalysis

To acquire reproducible and accurate spatially resolved elemental chemistry requires careful consideration

of both SEM and EDS operation conditions. Together, SmartEDX on either EVO or Sigma 300 is ideally suited

for routine microanalysis applications, particularly for customers with high standards for data reproducibility.

Assess your choice of kV up to 30 kV from a periodic table with K and L-line energy values

Bulk spectrum from a mild steel component with a two-layer cosmetic coating, used for a quick assessment of the elements present in the sample

Smart quant results

Element Weight % Atomic % Net Int. Error % Kratio Z A F

C K 10.97 29.41 443.27 9.22 0.0257 1.2026 0.1946 1.0000

O K 7.89 15.87 895.76 8.46 0.0240 1.1611 0.2621 1.0000

SiK 8.00 9.17 2282.76 6.70 0.0366 1.0737 0.4245 1.0028

CaK 2.39 1.92 782.66 2.52 0.0228 1.0250 0.9014 1.0351

FeK 61.18 35.26 13093.09 1.13 0.5725 0.9243 0.9998 1.0125

NiK 2.56 1.41 410.54 3.31 0.0217 0.9374 0.8921 1.0125

CuK 3.69 1.87 510.97 2.99 0.0305 0.8921 0.9125 1.0142

› In Brief

› The Advantages

› The Applications

› Technology and Details

Page 5: Streamlining SEM Imaging and Microanalysis

20 µm 20 µm

20 µm 20 µm

5

SmartEDX at Work: Fast, Drift corrected, Elemental Mapping

Dissimilar joint between low alloy steel and nickel alloy. Sample courtesy of TWI Ltd

All the capability you need to acquire

elemental maps quickly and accurately

Elemental maps, line scans, and spectra can

be displayed, interpreted, and quantified,

based either on the widely used CPS map, or

on advanced quantification algorithms, which

of course include state of the art real-time ZAF

corrections. The optimal balance between speed

and energy resolution is just a mouse click away.

Drift correction is a standard SmartEDX feature,

available for every collection mode. Fully auto-

matic setting of all relevant parameters makes

the usage of drift correction as intuitive as an

eyeblink.

All this is complemented by Multipoint Analysis,

which beside the possibility of a survey for quick

and easy point sampling, allows saving and

recalling of multipoint scan lists, for automated,

reproducible, and consistent data collection.

› In Brief

› The Advantages

› The Applications

› Technology and Details

Page 6: Streamlining SEM Imaging and Microanalysis

6

The Technology that Drives Your Insights

Output count rate versus probe current for three pulse processor settings

Detector size tailored to routine

microanalysis requirements

As practical throughput is controlled primarily by

pulse processing, we’ve implemented a detector

size that delivers optimum throughput at the

probe current range required for the SEM system

to perform at its best.

In conjunction with a solid-state backscattered

electron detector, such as EVO or Sigma 300 HD-

BSD, the practical probe current range is typically

1-5 nA. It is in this range where the 30 mm2

detector of the SmartEDX system achieves the

best compromise between highest input count

rate and lowest possible dead time to deliver

the highest throughput (output count rate) at

129 eV energy resolution. Throughput can be

further enhanced, up to 300,000 output counts

per second, by selecting one of two faster pulse

processing settings, albeit at compromised energy

resolution.

Input counts,

no resolution

Speed >150 eV

Middle

135 – 140 eV

Resolution

<129 eV

Probe current (nA)

Cou

nts

per

Seco

nd (C

PS)

› In Brief

› The Advantages

› The Applications

› Technology and Details

Page 7: Streamlining SEM Imaging and Microanalysis

7

The Technology that Drives Your Insights

Silicon nitride window for light element detection

The detector of the SmartEDX solution is fitted with an ultra-thin silicon nitride window, which allows

superior detection of low energy X-ray pulses from light elements such as carbon, nitrogen or oxygen.

Detector energy resolution, specified at 129 eV for manganese K-alpha, extrapolates to approximately 60 eV

for carbon, which ensures excellent separation of light element peaks in the spectrum.

EDS Spectrum from a carbon-coated Boron-Nitride sample, showing excellent separation and peak to noise background for the light elements Boron, Carbon and Nitrogen

Elemental and phase quantification

SmartEDX utilizes the industry-standard ZAF

corrective algorithm for the interference effects

of atomic number (Z), absorption (A) and

fluorescence (F), in combination with predeter-

mined X-ray intensity values for the different X-ray

energies from elemental standards (referred to

as standardless analysis).

In addition, SmartEDX enables the acquisition

and storage of reference spectra. Spectra from

unknown materials then can be matched against

reference spectra from the library – a method

referred to as spectrum matching – to aid in

identification. This method is particularly useful

for microanalysis applications where a relatively

limited number of materials are utilized, as is

often the case in manufacturing and assembly

environments.

0.040 0.105 0.170 0.235 0.300 0.365 0.430 0.495 0.560 0.625

› In Brief

› The Advantages

› The Applications

› Technology and Details

Page 8: Streamlining SEM Imaging and Microanalysis

8

The Technology that Drives Your Insights

Fixed version for powerful analytical

capability in a compact package:

Ease of use and fast results with optimum price

performance ratio.

SmartEDX features a 30 mm2 chip, adequate for

all levels of analysis and high throughput for

industrial applications. The detector excellent

energy resolution is matched to an advanced low-

noise electronics, for best in class performance

and throughput.

The robust silicon nitride (Si3N4) window provided

as standard on SmartEDX, allows larger transmis-

sivity for low energy X-rays, a must for light

element analysis, while at the same time ensures

resistance to shock and corrosion, and full com-

patibility with plasma cleaning.

Retractable version to optimize detector

position for your application:

Increase the input count rate by moving the

detector closer to the sample.

Based on the same hardware as the fixed version

of SmartEDX, this version can be retracted from

its analysis position to a safe position where the

detector is hard to hit by e.g. a large sample.

Movability helps if your samples are sensitive to

the electron beam and cannot withstand long

dwell times but a decent EDX is required, or if you

like to perform higher resolution imaging. In both

cases it is necessary to keep the spot size / probe

current small and to maximize the input count

rate.

Optimized position 1 nA

Fixed position 2 nA

Fixed position 1 nA

Optimized position 2 nA

Energy Resolution

20000

40000

60000

80000

100000

120000

140000

160000

180000

Out

put

Cou

nts

per

Seco

nd (O

CPS

)

200000

Speed >150 eV Middle 135 – 140 eV Resolution <129 eV

The retractable version enables to keep low beam

current and small spot size, without sacrificing the

X-rays count rate. The input count rates collected

in the optimized position are more than twice

the counts of the fixed version of SmartEDX.

› In Brief

› The Advantages

› The Applications

› Technology and Details

Page 9: Streamlining SEM Imaging and Microanalysis

9

The Technology that Drives Your Insights

Detector

Type Silicon Drift

Cooling Peltier (LN-free)

Active Area 30 mm2

Window Silicon Nitride (Si3N4)

Mount Fixed or Slide (optional, recommended for particle analysis)

Detection Range Be (4) to Am (95)

Pulse Processor

Amplification Time Three settings: Resolution, Middle and Speed

Best Energy Resolution 129 eV for Mn Ka

Input Count Rate (ICPS) Up to 1.000.000 CPS

Output Count Rate (OCPS) Up to 300.000 CPS (Speed amp time)

Up to 40.000 CPS (Resolution amp time)

Key Features

Peak Deconvolution Included

Quantitative Analysis Standardless, ZAF corrected. Spectrum Matching

Multipoint Analysis Included

Elemental Linescan Intensities (CPS) or Quant

Elemental Mapping Intensities (CPS) or Quant

Drift Correction Standard

Spectrum Matching Optional

› In Brief

› The Advantages

› The Applications

› Technology and Details

Page 10: Streamlining SEM Imaging and Microanalysis

Carl Zeiss Microscopy GmbH 07745 Jena, Germany [email protected] www.zeiss.com/microscopy

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