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Surface Analysis The Study of the Outer-Most Layers of Materials (
MEF 3100 Spring 2008
X-ray Photoelectron Spectroscopy XPS, ESCA
Photon inn – electron out
Introduction to X-ray Photoelectron Spectroscopy (XPS)
• What is XPS?- General Theory• How can we identify elements
and compounds?• Instrumentation for XPS• Examples of materials analysis with
XPS
What is XPS?
XX--ray Photoelectron Spectroscopy ray Photoelectron Spectroscopy (XPS), also known as Electron Spectroscopy (XPS), also known as Electron Spectroscopy for Chemical Analysis (ESCA) is a widely for Chemical Analysis (ESCA) is a widely used technique to investigate the chemical used technique to investigate the chemical composition of surfaces.composition of surfaces.
What is XPS?
XX--ray Photoelectron spectroscopy, ray Photoelectron spectroscopy, based on the photoelectric effect,based on the photoelectric effect,1,21,2 was was developed in the middeveloped in the mid--19601960’’s by Kai s by Kai Siegbahn and his research group at the Siegbahn and his research group at the University of Uppsala, Sweden.University of Uppsala, Sweden.33
1. H. Hertz, Ann. Physik 31,983 (1887).2. A. Einstein, Ann. Physik 17,132 (1905). 1921 Nobel Prize in Physics.3. K. Siegbahn, Et. Al.,Nova Acta Regiae Soc.Sci., Ser. IV, Vol. 20 (1967). 1981 Nobel Prize in Physics.
MEF 3100 Spring 2008
IntroductionX-ray Photoelectron Spectroscopy (XPS)X-ray photoelectron spectroscopy works by irradiating a sample material with mono energetic soft x-rays causing electrons to be ejected.
Identification of the elements in the sample can be made directly from the kinetic energies of these ejected photoelectrons.
The relative concentrations of elements can be determined from the photoelectron intensities.
MEF 3100 Spring 2008
XPS - ESCA
• Surface sensitive analysis technique based on photoelectric effect. Depth of analysis ~4-40 nm.
• All elements except Hydrogen.• Wide range of materials: Polymers, Ceramics,
metals …. (vacuum compatible)• Applications: corrosion, catalysis, thin films,
surface coatings, segregation …• Gives information on chemical composition and
chemical state.
XPS spectral lines are XPS spectral lines are identified by the shell from identified by the shell from which the electron was which the electron was ejected (1s, 2s, 2p, etc.).ejected (1s, 2s, 2p, etc.).
The ejected photoelectron has The ejected photoelectron has kinetic energy:kinetic energy:
KE=KE=hvhv--BEBE--
Following this process, the Following this process, the atom will release energy by atom will release energy by the emission of an Auger the emission of an Auger Electron.Electron.
Conduction BandConduction Band
Valence BandValence Band
L2,L3L2,L3
L1L1
KK
FermiFermiLevelLevel
Free Free Electron Electron LevelLevel
Incident XIncident X--rayrayEjected PhotoelectronEjected Photoelectron
1s1s
2s2s
2p2p
The Photoelectric ProcessThe Photoelectric Process
L electron falls to fill core level L electron falls to fill core level vacancy (step 1).vacancy (step 1).
KLL Auger electron emitted to KLL Auger electron emitted to conserve energy released in conserve energy released in step 1.step 1.
The kinetic energy of the The kinetic energy of the emitted Auger electron is: emitted Auger electron is:
KE=E(K)KE=E(K)--E(L2)E(L2)--E(L3).E(L3).
Conduction BandConduction Band
Valence BandValence Band
L2,L3L2,L3
L1L1
KK
FermiFermiLevelLevel
Free Free Electron Electron LevelLevel
Emitted Auger ElectronEmitted Auger Electron
1s1s
2s2s
2p2p
Auger Relation of Core HoleAuger Relation of Core Hole
X-ray Photoelectron Spectroscopy
Small Area DetectionXX--ray Beamray Beam
XX--ray penetration ray penetration depth ~1depth ~1m.m.Electrons can be Electrons can be excited in this excited in this entire volume.entire volume.
XX--ray excitation area ~1x1 cmray excitation area ~1x1 cm22. Electrons . Electrons are emitted from this entire areaare emitted from this entire area
Electrons are extracted Electrons are extracted only from a narrow solid only from a narrow solid angle.angle.
1 mm1 mm22
10 nm10 nm
MEF 3100 Spring 2008
Surface Sensitivity
MEF 3100 Spring 2008
Surface sensitivity
MEF 3100 Spring 2008
XPS – ESCA
XPS Energy Scale- Binding energy
BEBE = = hvhv -- KEKE --
specspec
Where: Where: BEBE= Electron Binding Energy= Electron Binding EnergyKEKE= Electron Kinetic Energy= Electron Kinetic Energy
specspec = Spectrometer Work Function= Spectrometer Work Function
Photoelectron line energies: Photoelectron line energies: Not DependentNot Dependent on photon on photon energy.energy.
Auger electron line energies: Auger electron line energies: DependentDependent on photon energy.on photon energy.
The binding energy scale was derived to make uniform The binding energy scale was derived to make uniform comparisons of chemical states straight forward.comparisons of chemical states straight forward.
MEF 3100 Spring 2008
Photo emission process is often envisaged as three steps
•Absorption and ionisation - (initial state effect)
•Response from atom and creation of photoelectron -(final state effect)
•Transport of electron to surface and escape - (extrinsic loss)
MEF 3100 Spring 2008
Absorbing X-rays – emitting Photoelectrons
MEF 3100 Spring 2008
A closer look
MEF 3100 Spring 2008
XPS Peaks
MEF 3100 Spring 2008
XPS example: Gold
MEF 3100 Spring 2008
Energy resolution ~1 eV
MEF 3100 Spring 2008
Electronic structure and spectroscopy
MEF 3100 Spring 2008
Binding energies?
MEF 3100 Spring 2008
Chemical shiftFunctional
GroupBinding Energy
(eV)hydrocarbon C-H, C -C 285.0
amine C-N 286.0
alcohol, ether C-O-H, C -O-C 286.5
Cl bound to C C-Cl 286.5
F bound to C C-F 287.8
carbonyl C=O 288.0
MEF 3100 Spring 2008
Chemical shift – binding energies in C 1s peak
MEF 3100 Spring 2008
965 955 945 935 925
19.8
Binding Energy (eV)
Cu 2p
2p1/2
2p3/2
Peak Area 1 : 2
Orbital=p
ls=1/2,3/2
l=1s=+/-1/2
Spin-Orbit Coupling
MEF 3100 Spring 2008
MEF 3100 Spring 2008
MEF 3100 Spring 2008
Instrumentation
Surface analysis by XPS requires irradiating Surface analysis by XPS requires irradiating a solid in an Ultraa solid in an Ultra--high Vacuum (UHV) high Vacuum (UHV) chamber with chamber with monoenergeticmonoenergetic soft Xsoft X--rays rays and analysing the energies of the emitted and analysing the energies of the emitted electrons.electrons.
MEF 3100 Spring 2008
XPS instrument at UIO?
Kratos Axis Ultra – new in 2007
People at UiO/Sintef
Martin Spyros
MEF 3100 Spring 2008
Instrument
1. Chambers 2. Vacuum and Pumps 3. Sources 4. Monochromator5. Analysers
Specimen handlingPlanning experiments
MEF 3100 Spring 2008
Dual anode X-ray source
MEF 3100 Spring 2008
Alternative X-ray sources
Surface Analysis�The Study of the Outer-Most Layers of Materials (