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Strictly private and confidential
UBmaterials Inc.
June, 2014
2Strictly private and confidential
I. Company 1. Greeting from CEO
Customer satisfaction with Creative Technology Innovation.
Hello, everyone who visit our homepage, First of all, I wish your ever lasting healthy and pleasant time.
Small but Strong company. UBmaterials is a small company with very short history but we are pursuing strong company in our business field.
We are very proud of being a frontier with innovative technologyin CMP slurry business field though it is not comfortable way.
We have strong partnership with Hanyang Univ. in order to overcome small company’s limitation of R&D capability through AcademicIndustrial cooperative R&D project.
And, customer satisfaction is our priority. We will do our best in order to make you satisfy with state-of-the-art technology we have.
Thank you for your business and considerations.
Joseph(Seung-Won) JungPresident & CEO
3Strictly private and confidential
I. Company
Company UB materials Inc.
President & CEO Joseph (Seung-Won) Jung
Establishment December 20, 2012
Capital 2,871 Million Korean Won
Location10, Hakchon-ro, Yangji-myeon, Cheoin-gu, Yongin-si, Gyeonggi-do, Korea
Main Item Tungsten and Nano colloidal Ceria slurry for CMP process
Homepage www.ubmaterials.com
82-10-5882-5874
2. Company outline
4Strictly private and confidential
Establishment
Open R&D Center
2013.JDP agreement with SK Hynix for GST CMP Slurry
Set up mass production facility for W Slurry
Take 4,000 million Korean Won Investment from Shinetsu Chemical Inc. Japan.
Take 1,500 million Korean Won Investment From Korea Development Bank
Certificate ISO 9001
Certificate High –Tech product from Korean Gov
Certificate Venture company
Certificate New Excellent Technology from Korean Gov.
Take 2,200 million Korean Won R&D Fund from Korean Government(MOTIE)
I. Company
2012. 12.
2013. 1.
2013. 2.
2013. 3.
2013. 3.
2013. 4.
2013. 4.
2013. 6.
2013. 7.
2013. 12.
2013. 12.
3. Chronology
5Strictly private and confidential
Name Title Major Career
Joseph Jung President & CEO• Team Leader of Planning dept., LG Siltron• Director, Epi-wafer Div., LG Siltron• President of LG Siltron America Inc.
Jae-Gun Park CTO
• Director, Materials technology dept. Samsung Electronics• Dean of Combined Technology Institute, Hanyang Univ.• Member, The National Academy of Engineering of Korea• Member, Committee of National Intellectual Property• Professor of Hanyang University
H G Sohn CFO • President, Techsellnetcom., Ltd. A KOSDAQ company
M H Noh Outside director • President, Shinetsu Chemical Korea
T H Shim Auditor • Research Professor , Hanyang Univ.
Jin-Hyung Park Chief of R&D Center • Research Professor , Hanyang Univ.
I. Company 4. The management
6Strictly private and confidential
Slurry Technology development @ Hanyang University
Mass production, Quality control, & sales @ UB Materials
Technology transfer
Synthesis room
CMP test roomCoupon 8 inch 12 inch
PSI XE-150 (AFM) AES XPS (ESCA 2000) TEM
Ellipsometer(MM-16) 4 Point Probe ELS-Z2+ Matec ESA9800
Analysis tool
I. Company 5. Academic-Industrial Cooperative Model
Semiconductor Fab and Equipments at Hanyang University
7Strictly private and confidential
II. Product
Slurry Current status Strong point of UBM Slurry
TungstenCMP Slurry
-. Necessary 2-step process for Line and Hole CMP process
-. Possible dishing problem at Line, Hole and Tungsten Buried gate process under 20nm DRAM
-. Possible 1 step process for Line and Hole process
-. Dishing Free Slurry
-. Can use for both Buried Gate and Plug
Nano-colloidalCeria Slurry(Wet Ceria)
forOxide
-. Currently use Dry Ceria Slurry caused many scratches and hard to use for poly-Si stop CMP process of NAND Flash Memory under 20 um grade.
-. Wet Ceria Slurry cause Less scratch
-. We have our own Nano-colloidal Ceria Abrasive synthesis Technologywhich is World’s second development.
8Strictly private and confidential
Land 53,375 ft2
Buildings
- 11,743ft2 for R&D Center & Warehouse
- 9,963ft2 Clean Room for Production
Warehouse Smock room Tour Line Office R&D Center
Outline Overall view
III. Facility 1. Outline
9Strictly private and confidential
Production Line
Sonication
Analysis room(Class 1,000) DI System
Homogenizer Scrubber
2. Major EquipmentsIII. Facility
10Strictly private and confidential
For Tungsten(W) CMP Slurry
3. Mass Production LineIII. Facility
11Strictly private and confidential
Certification of New Excellent Technology
III. Major Certificates 1
Certification of Foreign Invested company
Certification of Hi-Tech Product
12Strictly private and confidential
Certification of Venture CompanyCertification of ISO 9001
III. Major Certificates 2
Certification of ISO 9001
Thank you for your Business!!!
감 사 합 니 다.