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Telecom MEMS:
Overcoming Challenges to
Acceptance Through Reliability
Dr. James Wylde
29 May 2003
Table of Contents
PTV10G – an example of a MEMS Enabled Product
MEMS Reliability
Conclusions
Q&A Session
PTV/ATV10GAn example of a MEMS enabled product
ConceptThe PTV/ATV 10G combines a 10Gb/s receiver with a MEMS based VOA
in one packageEnables increased density and lower cost to system vendors (density x2,
CR ~300/ch)
MEMS Reliability
Introduction of emergent technology into
existing technology paradigm requires extra
diligence for customer acceptance
Telcordia offers standardized testing program
for telecom components
– Do not address the unique requirements of MEMS
devices
Bookham program expands on Telcordia to
provide real “time to failure” prediction for
customers
MEMS Reliability
d/do = 0.9 Device has failed
-30
-25
-20
-15
-10
-5
0
5
0.4 0.5 0.6 0.7 0.8 0.9 1 1.1
Normalized Deflection [d/do]
Att
en
ua
tio
n [
dB
]
10 % Drop in
Deflection
Each board 8 modules 6 chips per module
MEMS Reliability
Each board 8 modules 6 chips per module
14 pin
Butterfly
packages
Thermistor
MEMS
Chips
Course Temp
Control
-10 to 85 oC
Fine Temp
Control
MEMS Chips
Data Acquisition
10 port Switch
Temp
Power
Multimeter
Temp
Power
Video
DAQ +
Machine Vision
Stress BoardTest Station
Performance Measurement
Software
3 0
3 5
4 0
4 5
5 0
5 5
0 10 0 20 0 30 0 40 0
ti m e [hrs ]
Dis
pla
cem
ent
[um
]
(a)
30
35
40
45
50
55
0 1 00 20 0 30 0 40 0
ti m e [hrs ]
Dis
pla
cem
ent
[um
]
(b)
3 0
3 5
4 0
4 5
5 0
5 5
0 1 0 0 20 0 30 0 40 0
ti m e [hrs ]
Dis
pla
cem
ent
[um
]
(c)
30
35
40
45
50
55
0 1 00 20 0 30 0 400
ti m e [hrs ]
Dis
pla
cem
en
t [u
m]
(d)
Device Degradation (Deflection)
67 mW
125 mW95 mW
82 mW
Highly Overstressed Degradation
(Device Resistance)
2000
2050
2100
2150
2200
2250
2300
2350
2400
2450
2500
0 100 200 300 400 500
Time [hours]
Re
sis
tan
ce
[O
hm
]
Time to Failure
y = 6E+66x-30.648
R2 = 0.9602
0
100
200
300
400
500
600
700
800
900
1000
60 80 100 120 140
Power [mW]
Tim
e T
o F
ailu
re [ho
urs
]
Normal
operating
power
Failure Modes
Permanent Deformation (Permanent Bending)
– Abutment causes added stress
– Creep Damage – High Temp + High Stress
Resistance Change = Drop in Deflection
– 1 - Increase in dislocations due to deformation
– 2 - Boron diffusion into thermal oxide
100 % Overstress
400 hours
0
2
4
6
8
10
12
14
16
18
20
60 80 100 120 140
Power [mW]
Tim
e T
o F
ailu
re [Y
EA
RS
]
Ongoing Work
Influenced by a
abutment
-No Abutment
-Predicted with 95%
Confidence after 4000
hours of data
Low Temp Storage
- Only in Canada
Conclusions
MEMS and “small technology” has the potential to
revolutionize communications and many other field
A significant challenge to the widespread acceptance of “small
tech” is the lack of a sound reliability model
The results of this work have shown promise towards enabling
industry to accurately predict the life expectancy of silicon
based micro devices.