10
HAL Id: jpa-00225877 https://hal.archives-ouvertes.fr/jpa-00225877 Submitted on 1 Jan 1986 HAL is a multi-disciplinary open access archive for the deposit and dissemination of sci- entific research documents, whether they are pub- lished or not. The documents may come from teaching and research institutions in France or abroad, or from public or private research centers. L’archive ouverte pluridisciplinaire HAL, est destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des établissements d’enseignement et de recherche français ou étrangers, des laboratoires publics ou privés. X-UV INTERFERENTIAL MIRRORS AND NEW POSSIBILITIES FOR PLASMA RADIATION STUDIES P. Dhez To cite this version: P. Dhez. X-UV INTERFERENTIAL MIRRORS AND NEW POSSIBILITIES FOR PLASMA RADIATION STUDIES. Journal de Physique Colloques, 1986, 47 (C6), pp.C6-267-C6-275. <10.1051/jphyscol:1986634>. <jpa-00225877>

X-UV INTERFERENTIAL MIRRORS AND NEW POSSIBILITIES FOR

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HAL Id: jpa-00225877https://hal.archives-ouvertes.fr/jpa-00225877

Submitted on 1 Jan 1986

HAL is a multi-disciplinary open accessarchive for the deposit and dissemination of sci-entific research documents, whether they are pub-lished or not. The documents may come fromteaching and research institutions in France orabroad, or from public or private research centers.

L’archive ouverte pluridisciplinaire HAL, estdestinée au dépôt et à la diffusion de documentsscientifiques de niveau recherche, publiés ou non,émanant des établissements d’enseignement et derecherche français ou étrangers, des laboratoirespublics ou privés.

X-UV INTERFERENTIAL MIRRORS AND NEWPOSSIBILITIES FOR PLASMA RADIATION

STUDIESP. Dhez

To cite this version:P. Dhez. X-UV INTERFERENTIAL MIRRORS AND NEW POSSIBILITIES FOR PLASMARADIATION STUDIES. Journal de Physique Colloques, 1986, 47 (C6), pp.C6-267-C6-275.<10.1051/jphyscol:1986634>. <jpa-00225877>

JOURNAL DE PHYSIQUE, Colloque C6, supplement au no 10, Tome 47, octobre 1986

X-UV INTERFERENTIAL MIRRORS AND NEW POSSIBILITIES FOR PLASMA RADIATION STUDIES

P. DHEZ

Laboratoire de Spectroscopie Atomique et Ionique and LURE, Universite Paris XI, F-91405 Orsay Cedex, France

RESUME

La rea l i sa t ion de rniroirs in ter fbrent ie ls adapt& au domaine X-UV e s t une poss ib i l i t l apparue seulement depuis une dizaine d'annees. Dans une premiPre pa r t i e nous rappelons l e s ca rac t l r i s t i ques principales d e t e l s miroirs. Par comparaison avec l e s opt iques s o u s incidence r a san te s e u l e s disponibles &squJ& maintenanti nous indiquons ensu i t e l e s nouvelles >voies ouve r t e s par leur u t i l i sa t ion . Enfin nous dannons quelques exemples de diagnoctic de plasma t i r a n t par t ie de c e s nouvelles possibil i t8s.

ABSTRACT

For about t e n yea r s new multilayered X-UV mirrors have been in progress and a r e now overcoming some of t he main d i f icul t ies well Rnown with t h e grazing incidence opt ics used up t o now. The main character is t ics of such mirrors a r e f i r s t recalled. Next some of t he new poss ib i l i t ies in X-UV spectroscopy and imaging a r e given. Finally we briefly describe some examples of new s e t ups using such X-UV inter ference mirrors fo r plasma diagnostic.

INTRODUCTION.

Several papers a t t h i s f i r s t colloquium about "X-Ray Laser" demonstrate clearly t h e importance of plasma diagnost ics t o progress in t he understanding of t h e mecanisms leading t o t he population inversion and how t h e use of t he X-UV range i s well su i ted t o s tudy plasma temperature, dens i ty and character is t ic l i ne s of highly ionized atoms. Indeed, t he progress in such diagnostics using spectroscopy o r imaging opt ics a r e very dependant t o t he poss ib i l i t ies t o build t he correspoding X-UV optical s y s t e m s t o achieve them.

Until now, most of t h e s e t ups have been res t r ic ted t o grazing incidence and c r i s t a l opt ics (L). This is due t o t he X-U\/ optical cons tant values. Over a l l t he X-UV range; t hese one forbid a t t he same time t h e c lass ica l normal incidence mirrars witb s ingle in ter face , which need very absorbing material? and a l s o the ref rac t ive lenses , because ref rac t ive index i s t o o close t o t he vaccuum one. The qui te recent development of multilayered mirrors (2) and Fresnel zone p la te (3) had considerably enhanced t h e poss ib i l i t ies t o conceive X-UV optics b e t t e r adapted t o X-UV diagnostics. Based on diffraction properties, such in ter ferent ia l opt ics a r e no t similar t o t h e c lass ica l s ingle in ter face mirrors and ref rac t ive l e n s e s well Known in t h e visible range. To ge t such X-UV diffracting optics, specia l microfabrication technologies have been recently developed. The p re sen t s t a t e of a r t in t h i s new field permi ts t o overcome seve ra l l imi ta t ions which up t o now had slowed down the use of t he X-UV range.

In t h i s paper I will t ry f i r s t t o recall t h e basic proper t ies of t he X-UV in t e r f e ren t i a l mirrors. Next I will indicate new poss ib i l i t ies offered by such mirrors t o design new X-UV optics. Finally I will give some examples of new plasma diagnostics using these interference mirrars.

Article published online by EDP Sciences and available at http://dx.doi.org/10.1051/jphyscol:1986634

C6-268 JOURNAL DE PHYSIQUE

BASIC PROPERTIES OF THE INTERFERENTIAL X-UV MIRRORS

Before to come t o interference mirrors, l e t us f i r s t remember how the classical single interface mirror acts.

The f i r s t figure shows how the

.Pi absorpt ion coeff icient of gcld i s

u l o - Au linked to normal incidence reflectivit:, U a, (4). d 5- W ---Rl..,"",vcd*' Because, in the X-UV range, a l l a, materials have almost the same order

2- of magnitude f o r t h e opt ical constants, they al l exhibit the same behaviour. Fresnel formula giving the refectivity coefficient versus the angle af incidence permits t o calculate t h e efficiency of X-UV

L; mirrors by using X-UV optical indices (5). Figure 2 is an example of such calculations for a hafnium dioptre a t t h r e e w a v e l e n g t h s (6) . I t d e m o n s t r a t e s how r e f l e c t i v i t y

oh&& & "$a 2b0 & ' I ~ O decrease with absorption coefficient hv !eT7) when wavelength becomes shorter and

how a noticeable reflectivity regime is restricted to grazing angle range. Some physics text books explain that

- Figure 1 - only an infinitely absorbing material i s a perfect mirrur.

In such case, a lmost a l l photons a r e absorbed by the f i r s t atomic layer and immediately reemittedt s o they look like reflected.

In actual materials, phatons penetrate the medium. The penetration length usually considered in such problem is the thicUness L - absorbing i / e of the incident intensity, about O,3. Along the penetration path most of photons -

a r e absorbed, converted in h e a t or 10-0

photoelectronst and those reemitted suffer o 45 90

also absorption on the back way before they Incidence Angle 0 (degree)

leave the mirror. As a rul?, good normal incidence mirrors are obtained only from - Figure 2 - mater ia l s having a pene t ra t ion length smaller than , o r comparable t o , t h e wavelength of the light t o reflect. As indicated by curves on figure 3, no material sat isfy this condition in the X-UV range. Sot according t o Fresnel formula only grazing incidence worKs in th i s range for dioptre mirrurs.

Dielectric mirrors for visible are stacUs of very transparent materials, containing alternating equal thichkness of high and low index transparent materials. I t is a f i r s t example of interferential mirrors using a penetrating wave. Such a principle looks very convenient t o the X-UV range where we cannot avoid the wave penetration. In the case of transparent materialst each interface is only slightly reflecting, due t o the weaK difference between the index of both materials.

,--. -. A t the end, one get a constructive

in te r fe rence f o r the wavelenght corresponding t o the difference o f optical path between the succesive par t ia l waves. By th is way 100% ref lect iv i ty can be obtained w i th non absorbing media.

A n o t h e r mode l o f e f f i c i e n t in ter ferent ia l mirror i s the ideal Bragg crystal containing very th in l a y e r s o f a p e r f e c t l y absorb ing material set a t a regular distance i n a perfectly transparent medium. Real crystals are no t l ike that, b u t atomic planes bring a periodic electronic density modulation which also works convenient ly. More than that , c r y s t a l l i n e mate r ia l s are n o t an absolute necessity. I n fact , as remarks very earlier, th in amorphous evaporated layers can i n principle leads t o a more convenient electronic

Wavelength (X) density modulation, i f qual i t ies o f the

- Figure 3 - interfaces can be controlled.

I n summary the common point t o these both kind o f interference mirrors working wi th a penetrating wave i s the need o f a periodic medium wi th a d period matching the classical Bragg's law: 2d.sin43 =A.

L e t s tu rn now our attent ion t o the efficiency o f such interference mirrors. Calculations show that, even w i th s l ight absorbing materials, the efficiency o f such systems decrease very f a s t and by consequence are both uneff ic ient in the X-UV range. E. Spiller have been the f i r s t t o clearly po int ou t tha t w i t h absorbing materials one can s t i l l get noticeable ref lect iv i ty w i th interference mirror (7). I n t h i s case, one must bu i ld evaporated periodic layers containing a f i r s t matefial w i th the maximum absorption a t the desired wavelength as an ef f ic ient scatter and a second one the more transparent as possible used as a spacer. In addit ion one must t o adjust the re la t ive thicKness o f the more absorbing material i n such a way tha t re f lec t i v i t y per period is larger than i t s absorption . How t o adjust t h i s re la t ive thickness, called p , and how much ref lect iv i ty can be obtained have been next summarized on a simple graph by A. Vinogradov (g), i n the case o f purely absorbing materials. Such an approximation i s quite valuable f o r the X-UV range. For more precise calculations one must take i n t o account the refract ive par t o f the index, which leads t o an increase o f the ref lect iv i ty.

I n the case o f the W/C couple o f material, f igure 4 shows the maximum o f the normal

'" incidence re f lec t i v i t y which can be obtained, even by optimizing the p parameter fo r each 2 wavelength (9). Due t o the q u i t e h igh .d

absorption, just before the Ck edge around 5 44A, the carbone appears clearly as a bad $ transparent material i n t h i s range. Actually, a, 0.4

such edges are a lso p resen t i n the tu

re f lec t i v i t y curves o f any natural or organic 2 0.2

crystals, t o get the f o r example most e f f ic ient on Ok around in ter ferent ia l 16A. So, o,o

" " I

W/C Plultilaver

I,% 6 8 10 ZO (0 60 6 0 1 ~ 0 2m

mirrors along a l l the X-UV range one needs t o choose the most appropriate materials f o r Wavelength (8) each range. Such a search have been done by A. Rosenbluth (9) during h i s thesis and the - Figure 4 - computerized resul ts are given in f igure 5.

JOURNAL DE PHYSIQUE

- Figure 5 -

" 6 8 1 0 20 40 60 100 200

WAVELENGTH (a]. The ver t ica l l i ne s indicate where new couple of mater ia ls must be used t o keep the maximum normal incidence peak reflectivity. The optimum parameter p and t h e necessary number of per iods N t o g e t such ref lec t iv i ty a r e given.

Conslderlng a glven wavelength and changlng sl ightly t h r p parameter o f f e r two ln teres t lng p o s s ~ b l l l t i e s .

The f l r s t o n e 1s t o optiml:e t h e m u l t l l a y e r s f o r maxlmum peak o r in tegra ted reflectivity, o r f o r t he bes t resolution fiO). The second one

C/W Multalayer 1s t o mlnlmize the overlapping order. The f i g u r e 6 1s a n example of

Perlod d=35& ' calculation f o r t h e c a s e of W/C multllayer a t %A ( i f) . With a smal l decrease of reflectivity ~t IS possible t o minimlse a t t he same time the second and thlrd order. Around p=0.5 we g o t t h e equivalent o f a centrosymetrlc cell well known In dlffractlng sys tem a s able t o cancel a l l t h e even orders . An experimental

o 2 .4 6 8 check of t h e s e poss lb l l l t ies have been 8=dw/d done (11) and t h e damping of any

- Figure 6 - choosen order h a s been observed.

I t i s not here t he r ight place t o give de t a i l s about calculations, evaporation and t e s t i ng methods developed t o obtained good X-UV multi layers mirrors. Let u s just s a y t h a t presently, r e s u l t s obtained in d i f f e r en t countries a r e very encouraging, a recent meeting specially devoted t o X-Ray Multilayered Optics i i 2 ) can be considered a s a good summary of the p re sen t s t a t e .

Two examples of reflectivity curve a r e just given here t o i l l u s t r a t e t he r e su l t s .

Figure 7 i l l u s t r a t e s some pecular i t ies of such mirrors working in f ac t with f ew per iods compared t o a crystal . The reflectivity curve ve r sus t he incidence angle h a s been go t with the 1.54A Cuk line and a 12 per iods W/C multi layers 2d=120A (13). One can s e e the t o t a l ref lec t iv i ty range f o r t h e most grazing incidence range and next t he Bragg peaks corresponding t o t he N = 112 and 3th order of t h e classical Bragg formula 2d.sin0 = N A . Secondary maxima between two succesive Bragg peaks a r e similar t o t hose observed in t he multisl i t experiments in visible with a small number of diffracting objects. So, adding 2 t o t he number of observed secondary maxima gives t he number of working periods of t he mirror. When a fixed angle of incidence is used and the band p a s s of t he multilayer i s regis t ra ted ve r sus wavelength, such secondary maxima can a l s o been observed on each s ide of t he ref lec t iv i ty peak.

INCIDENCE ANGLE BP 8 B R A G G ANGLE (Deg.)

- Figure 7 - - Figure 3 - The f igure 8 shows the ref lec t iv i ty observed on t h e copper emission l i nes iLa,pf a t i3.2A with an organic crys ta l , lead s t e a r a t e in t h i s case, and a 21 periods W/C multilayer prepared with a lmost t h e same 2d. Such a d i rec t comparison demonst ra tes t h a t optimized multi layers can be much more ef f ic ient t han organic c rys t a l s (14) f o r in tegra ted and peak reflectivity. Especially optimized multilayer fo r a given wavelength can be more ef f ic ient t han t h i s one. The resolut ion of t he multi layers is lower due t o t he small number of layers.

NEW POSSIBILITIES GIVEN BY X-UV MULTILAYERS

Several new ways t o design multilayered opt ics have been t e s t ed . In addit ion of t he poss ib i l i t ies t a aptirnize such mirrors f o r any wavelength a t any choosen incidence, including the normal one, we can obtained more ef f ic ient and more s t ab l e l aye r s under high flux than with organic crystals. Stabil i ty of multi layers under high pulsed X-ray bu r s t begin t o receive a t t en t ion f o r plasma diagnost ics (15).

As sugges ted by s eve ra l people, it is possible t o prepare multi layers with a gradient of t he period along one direction. Keeping fixed the incident angle and moving such multilayer along t h e graded direction in f ron t of an X-UV beam will change t h e reflected wavelentgh. So without any change in t he incidence angle, t h e equivalent of a double monochromator can be obtained hy using a s ingle t rans la t ion and two para l le l multi layers (16). More recently i t h a s been proposed t o u s e such graded multi layer on point t o point focussing opt ics toroidal mirrors. Changing the period d locally a s des i ra ted l eads t o enhance the reflectivity o r t o r e s t r i c t t h e band p a s s of t he focused beam 117).

Figure 9 shows a proposal t o obta in quas i normal X-UV e f f i c i e n t g r a t i n g (101. R e f l e c t i v i t y would be o b t a i n e d by t h e multilayer and dispers ion by the grating. Obviously f o r a choosen wavelength it IS necessary t o match the blaze angle and t h e groove d is tance of t h e gra t ing with t h e multilayer period. In f a d n o t only t h e echele t te gra t ing but any Rlnd of groove shape can be used, a s demonstrated by r e c e n t electromagnetic t h e o r e t i c a l calculations on such layered g r a t ~ n g s (18).

Another way opened by multi layers is t h e possibil i ty t o build X-UV polar izers and polarimeters. LiRe in o t h e r s electromagnetic - Figure 9 - range, t h e u se of the Breswter angle permit

JOURNAL DE PHYSIQUE

t o re f lect only one o f the component o f l i g t h and so t o polarize a beam by reflection. That happens f o r the incidence angle such tha t the refracted and the ref lected direct ion o f the wave are a t 90' . Because refract ive index i s almost the unity over a l l the X-UV range, the 45' incidence provide always a very good polarization rate as appears on the f igure 2. Unfortunatly, such a possibi l i ty i s forbidden w i th classical single interface mirrors because fo r such large angles the ref lect iv i ty efficiency i s too low. On the contrary, a multi layer optimized f o r such incidence can have good ref lect iv i ty and so t o be an effect ive polarizers. Possibi l i t ies o f X-UV polarizers and polarimeters have been demonstrated recently (6, 19).

Multi layered opt ics being able t o work a t the normal incidence, i s i n principle possible t o re turn t o the wel l known opt ical system using normal incidence mirror fo r telescope or microscope. Such poss ib i l i ty have been f i r s t tested a t 44.4A w i th a spherically bended si l icon wafer previously coated w i th a mult i layers (20). Schwarzchild microscope w i th two spherical confocal mirrors have been next designed fo r synchrotron source (21). Another example o f imaging multi layered optics i s the telescope bu i l t a t the I n s t i t u t d'optique d'Orsay fo r the french astrophysicists (22). I t i s a Ritchey-Chretien type system where aspherization o f the f i r s t mirror have been achieved by a graded single layer evaporated on the spherical blank before the mult i layer coating (23).

X-ray Fabry-Perot, first demonstrated by T. Barbee, i s an other major advance which must be underligned (24,25).

EXAMPLES OF THE USE OF MULTILAYERS FOR PLASMA DIAGNOSTICS

Figure 10 shows the principle o f the system designed by the L~vermore group t o receive simultaneously on the same streak camera photocathod several small band pass o f the spectrum emitted by a laser plasma (26). It i s certainly the f i r s t system t a k n g advantage of the mult i layer possibil it ies, i n t h i s case t o choose freely the 2d spacing. By t h i s way they can work a t the Bragg condition fo r d i f ferent choosen wavelengths, but w i th the same Q Bragg angle.

L- irradiated Drgt

L- irradiated Drgt

- Figure 10 -

Imaging o f plasma w i th grazing incidence KirKpatrick's mirrors o r pinhole camera optics have always been l imi ted by the d i f f icu l ty t o select a small band pass o f the spectrum passing through these optics. Metal l ic f i l t e r s are very uneff ic ient in the X-UV and mult i layers appear as a good solut ion f o r such f i l ter ing. Such a band pass selection f o r X-UV pinhole camera had been used a t the PM1 Laboratory fo r laser plasma imaging. A metall ic f i l t e r is j l s t added t o protect the mult i layers from the plasma burst but also t o block the visible and U V which would be ref lected by the multilayers. With such a system, images o f aluminum ions emitted a t i54A have permitted t o compare the la te ra l expansion o f the plasma fo r the W and 2w frequency o f the laser (27).

Combining a f l a t and a focussing multi layers with matched periods, t he same group of t he PM1 laboratory a l s o achieved t h e f i r s t demonstration of t h e possibil i ty t o experimentally evaluate in X-UV the ref rac t ive index of l a s e r produced plasma (28). The scheme of t h e s e t up is given on figure 11.

Laser AI F i l ter Beam 1

Knife

Spherical

--I--- Multi layere

Mirror

- Figure 11 - Beam 2

One pa r t of t he l a se r beam produces t he X-IJV probed plasma. The 45" f l a t multllayered mirror was optlmlzed t o r e f l ec t only the 154A fo r whlch they wlsh t o t e s t t he ref rac t ive index. No s t rong line of t h l s wavelength 1s emlt ted by t h e probed plasma. A para l le l beam of t he des i ra ted wavelentgh, a s t rong 154A l ine emitted b y a Cu t a rge t , 1s se lec ted and ref lec ted In a para l le l beam ny using another spherical multilayered mirror. Only t h i s para l le l beam a f t e r refraction through t h e plasma pruduces a s p o t on t h e photographic plate, and the measured deflection h a s been used t o evaluate t he refractive ~ n d e x .

Direct imaging of plasma by large angle collecting opt ics is an o the r possibil i ty open by normal incidence spherical opt ics , with t he addit ional advantage of magification. A Schwarzschild microscope have been recently buil t a t t he I n s t i t u t d'Optique dtOrsay f o r t he PM1 Lab t o obta in X-UV image a t t h e r e a r surface of a fo i l in view t o s tudy t h e heat t r a n s f e r t inside t h e t a r g e t during t h ~ . plasma formation. Resu l t s obtained a t 304A with a 6p spa t i a l resolution during the f i r s t t r i a l s look very promising ( 2 9 ) .

X ray l a s e r research, which began in the s even t i e s (30) is a n other f ield where multi layers can be hepful, even if a complete resonator is not y e t working. A s proposed in 1982 by our group (31) and demonstrated l a s t year a t Princeton 132), a s ingle normal incidence multilayer mirror set i n normal incidence can r e f l ec t enough in tens i ty through t h e plasma column t o praduce a noticeable in tens i ty change on the t e s t e d line.

0 1 l ' ! " ' l ! 1 105 1 1 0

W A V E L E N G T H C A )

- Figure 12 -

- 10

Z 3

m C 4

> t 5 V) Z Y

l-

?

The figure 12 shgws the predicted e f f e c t w i th a n ach ievab le mi r ro r reflectivity and observed gain plasma amplification in our experiment 130). Because no change in t he spectrum can appear outs ide the ref lec ted band p a s s of t he mirror, a comparison b e t w e e n s h o t s , wi th and w i t h o u t mi r ro r , is s t r a i g t h f o r w a r d . I n addition, t h e re la t ive l ine i n t ens i t i e s oven the unchanged range give good information about t h e l a s e r shoot and h e l p s f o r s t a t i c t i c a l e r r o r s evaluations.

- "with mirror

R = 0 . 1 5 ,

- -

-

+without mirror

A1 Plasma Length 2Gm. ,

C6-274 JOURNAL DE PHYSIQUE

Obviously the realisation of the second multilayer worUng in the semi transparent mode a s an exit window of an X-UV laser is a very exciting problem. Another talks in th i s meeting will review the questions and the s t a t e of a r t on th i s field (32,33).

CONCLUSIONS

Limitations brought by the obligation t o build only X-UV grazing incidence optics are now removed a f te r a long sixty years hlstory. The quite recent X-UV mult~layer mirrors bring completely new possibilities for X-UV optical systems. Some examples of uses, summarized here are just a f i r s t blooming of applications. As when a new tool arrives, we are just presently solving the f i r s t class of problems which are the most stringent in our work and which look the easiest. No doubt that th i s new allowance t o conceive X-UV optics, with large collecting apertu* and worKing a t the same time a s an efficient band pass f l l ter over all the ranget will lead t o a large diversity of systems helping the plasma diagnostics. We have not yet a l l the equivalent optical systems of the visible range, but th i s s tep ahead with interference mirrors have reduced the gap which separates the X-UV optics of the numerous possibilities available in other ranges.

REFERENCES

l- Low Energy X-Ray Diagnostics, AIP Conf. Proc. Ne.75, Edit. by D.T. Atwood and B.L. Henke. USA (1981).

2- T.W. BARBEE. Multilayers for X-Rays Optics, pp.2-28 in ref.12. 3- X Ray Microscopy, Springer Series in Optical Sciences Vo1.43, Edit. G. Schmahl and D.

Rudolph. 11984). 4- H.J. HAGEMAMN e t al. Optical Constants from the Far 1.R t o the X-Ray Region: Mgt

AL,Cu; Ag, Au, Bi; C and Al,03. Internal Report DESY SR 7417 May 1971. 5- B.L. HENKE e t al. Low ~nergy-X- ay Interaction Coefficients. Atomic Data and Nuclear

Data Table 27, N'1 11982) 6- A. KHANDAR e t al. Study of Multilayered X-UV Polarizers in SPIE Proceedings:

Multilayers Structures and Laboratory X-Ray Laser Research. Vo1.688 (1986) 7- E. SPILLER, Multilayer Interference Coating for the Vacuum Ultraviolet. Space Optics

ICO I X , pp.581 (1974) and Appl. Phys. Lett. 20,365 (1972). 8- A.V. WNOGRADOV and B. Ya. ZELDOWCHt X-Ray and Far UV Multilayer Mirrors:

principles and possibilities. Appl. Opt. 16, 83 (1977). 9- A. ROSENBLUTH. Thesis "Reflecting Properties of X-Ray Multilayer Devices".

Rochester University, Rochester N.Y, USA (1982). 10- E. SPILLER, Evaporated Multilayer Dispersion Elements for Soft X-Rays, pp.124-130 in

ref.1 11- R. MARMORET Thesis 1982, Universite PARIS V1 (France). 12- Applications of Thin-Film Multilayered Structures t o Figured Optics, Proceedings SPIE

Vol. 563 11985). 13- P. DHEZ, Metallic ~ u l t i l a y e r s : New possibilties in X-UV optics. Adv. Space. Res. V01.2,

Ne4, pp.!99-206 (1983). 14- M. ARBAOUI e t al. SPIE Proceeding ,Thin Film Technologies, Vo1.652 11986). 15- R.H. DAY and T.W. BARBEE, Applications of Layered Synthetic Microstructures t o

High-Temperature Plasma Diagnostics. Rev. Sci. Instrum. 56,5, pp.791-795 (1985). 16- T.W. BARBEE. Multilayers for X-Ray Optical Applications, pp.144-162 in ref .3. 17- G.F. MARSHALL, A Unified Geometrical Insight for the Design of Toroidal Reflectors

with Multilayered Optical Coating. pp.114-134 in Ref.i2. 18- B. VIDAL e t al. Thin Film and Grating Theories Used t o Optimize the High Reflectivity

of Mirrors and Gratings for X-Ray Optics. pp.142-149 in Ref.12.- 19- A. KHANDAR and P. DHEZ, Multilayers X-Ray Polarizers. pp.158-163 in Ref.2 20- J.H. UNDERWOOD and T.W. BARBEE, Soft X-Ray Imaging with a Normal Incidence Mirror.

Nature 294,5840, pp. 429-431 1198 l). 21- E. SPILLER, A Scanning Soft X-Ray Microscope Using Normal Incidence Mirrors, pp.

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23- J.P. CHAUVINEAU e t al. Aspherization and Multilayer Coating of a Ritchey Chretien Telescope for 30.4 nm. pp.275-279 in ref.12.

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