Facilities Include:Facilities Include:• 2 MV Tandem accelerator

• Rapid elemental depth profile techniques include RBS, EBS, ERD, PIXE and NRD

• Sub-micro size microbeam with full scanning capability

• Advanced sample goniometer for channelling spectroscopy

• Automatic data analysis system

• External (in air) microbeam for vacuum sensitive samples

Future Developments:Future Developments:

• Just installed state-of-the-art accelerator

• Developing routine, accurate, cheap characterisation

• Plan to extend capabilities by installing:

• Nano ion beam for nano analysis and proton beam lithography

• Vertical ion beam for liquid and biological applications

• Continue and expand interaction with both University and Industrial groups

• Light from silicon – LEDs at room temperature (patent)

• Spin-out company formed: Si-Light Technologies

• Ion beam synthesis of superconducting MgB2 (patent)

• Elevated temperature implants, for increased thermal stability and larger process window, for the production of high resistivity layers in GaAs

• Control of transient enhanced diffusion of boron in silicon (2 patents)

• Room temperature formation of ultra-thin (2nm) conducting silicides

• DataFurnace for ion beam analysis (sold under license)

• Centre supported £48M of grants over 4 years

• Queens Anniversary Prize for Further and Higher Education

• Si, SiGe, SOI for CMOS, modelling, TCAD (Philips, Applied Materials, Silvaco, ISE)

• Modeling & Simulation - energetic molecule & cluster surface interactions

• Ultra-thin silicides for displays and CMOS (Philips/LG)

• Virtual substrates: ion beam synthesis, layer transfer

• Photonics for silicon laser (and LED), integrated optics, III-V compounds (LEDs and lasers)

• Development of ion beam analysis techniques and applications for Cultural Heritage and the Environment

• Proton beam lithography for high aspect ratio and buried structures

• Application of Ion Beams to biomedical applications

SuccessesSuccesses New ProjectsNew Projects

Industrial Users of the IBC include:Industrial Users of the IBC include:• QinetiQ• Applied Materials • Filtronic• e2v Technologies• PRP Optoelectronics• Bookham Technology• Philips Research Labs• Canberra• FOM-AMOLF NL• CRP - Belgium• MATS UK• Coherent - Germany• Cascade Scientific• Mesaphotonics• LG/Philips• ABB – Switzerland• Zetec• EIF • Gresham Scientific• Aonex Technologies - USA

Academic Users of the IBC include:Academic Users of the IBC include:• KCL• Leeds• Glasgow• ICSTM• Cambridge• Warwick• Sheffield• Southampton• Oxford• UEA• Nottingham• QUB• Bristol• South Bank• Durham• Salford• UMIST• Swansea

• Manchester• Newcastle• Royal Holloway• Hull• Liverpool• Heriot Watt• UCL• Aston• De Monfort• QMWC• Northumbria• Bath• Exeter• Edinburgh• Birmingham• Surrey - Physics,

Elec. Eng. Bio Sciences Materials Science

ImplantationImplantation AnalysisAnalysisFacilities Include:Facilities Include:

• 2MV High Energy Implanter• 200kV High Current implanter• Implantation 2 keV 6 MeV• Sample sizes up to 40cm x 40cm• Hot (1000 oC) or cold (~LN)

implants• In situ measurements can be made• Sample Chambers in clean room

(class 100)• Up to 10mA beam currents

available

Future Developments:Future Developments:• Precision implantation of novel

devices and modification of a wide range of materials

• Have state-of-the-art facilities (keV-MeV) - (long lifetime)

• Developing ultra-low energy capability - for nanotechnology, ion beam deposition, ion beam synthesis

• Developing ultra-low-dose capability

• Continue close interaction with both University and Industrial groups

Surrey Ion Beam CentreSurrey Ion Beam Centre