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NANOTECHNOLOGY AND CHIP FABRICATION Course Instructor: Mr. RETHWAN FAIZ American International University-Bangladesh

Nanotechnology and CHIP Fabrication

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Page 1: Nanotechnology and CHIP Fabrication

NANOTECHNOLOGY AND CHIP FABRICATION

Course Instructor: Mr. RETHWAN FAIZ

American International University-Bangladesh

Page 2: Nanotechnology and CHIP Fabrication

Group Members Khan, Bayzid [ 11-19915-3] Hasan, Md. Mahedi [12-21498-2] Mujaheden Chy, S.M. Emam-Ul [12-22708-

3]

Page 3: Nanotechnology and CHIP Fabrication

In this presentation Concept and History of Nanotechnology. Why Nanotechnology ? Nanotechnology Foretold Fabrication Process

Page 4: Nanotechnology and CHIP Fabrication

What is Nanotechnology Nanotechnology is the creation and use of

materials or devices at extremely small scales.

1 nm = 0.00000001 m

Page 5: Nanotechnology and CHIP Fabrication

Nanotechnology Foretold• Concept first introduced by

American physicist Richard P. Feynman (1918-1988).

• Predicted several aspects in today’s nanotechnology.– Advanced microscopes – Developments in fabrication

methods – Possibilities of atom-to-atom

assembly

Page 6: Nanotechnology and CHIP Fabrication

Moore’s Law Moore's law" is

the observation that, the number of transistors in a dense integrated chip has doubled approximately every two years.

Page 7: Nanotechnology and CHIP Fabrication

Fabrication Process 1.Thermal Oxidation 2. Patterning 3. Etching 4. Doping 5. Finishing

Page 8: Nanotechnology and CHIP Fabrication

Oxidation way to produce a thin layer

of oxide (usually silicon dioxide) on the surface of a wafer. The technique forces an oxidizing agent to diffuse into the wafer at high temperature and react with it.

Page 9: Nanotechnology and CHIP Fabrication

Patterning Using Chemical Vapor

Deposition (CVD) technology, an insulating material called dielectric is deposited on the wafer surface, being grown and deposited in later steps

Page 10: Nanotechnology and CHIP Fabrication

PhotolithographyPhoto lithography is process used to make multiple layers of circuit pattern on the chip. wafer surface is deposited a light-sensitive chemical. It is repeated many times as each layer of the chip is built.

Page 11: Nanotechnology and CHIP Fabrication

Etching Etching

removes selected material from the chip surface to create the device structures.

• Ion Implantationshoots section of silicon with charged atoms accelerates “dopant” materials to a high velocity and shoots section of silicon and change the conductivity of the film.

Doping

Page 12: Nanotechnology and CHIP Fabrication

Finishing Final Chip

After processing, the chip is covered with a plastic or ceramic material to seal it tightly from the atmosphere.

Page 13: Nanotechnology and CHIP Fabrication

Bibliography http://www.nanotech-now.com/

information.htm http://www.nano.gov/ http://nanotechweb.org/ http://www.nano.org.uk/