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The top documents tagged [rf sputtering]
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WSe2 Thin-film Realization by Synthesis and by Tarnishing
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Technology Thin films ZnO:Al were prepared by RF diode sputtering from ZnO + 2wt % Al 2 O 3 target. It is a plasma assisted deposition method which involves
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Supporting Information For Effects of Bismuth Oxide Buffer Layer on BiFeO 3 Thin Film 1 Ching-Chich Leu a,*, Tsung-Ju Lin b, Shu-Yu Chen b, and Chen-Ti
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CCMX Annual Activity Report 2007
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