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SPIE Advanced Lithography 2007 SLIDESHOW. Monday Plenary Session – 1200 attendees. New SPIE Fellows. New SPIE Fellow Prof. Bruce Smith, RIT. Best Paper Awards. Dr. Burn Lin, Taiwan Semiconductor Mask Corp. George A. Gomba, IBM Distinguished Engineer - PowerPoint PPT Presentation
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SPIE Advanced Lithography 2007
SLIDESHOW
Monday Plenary Session – 1200 attendees
New SPIE Fellows
New SPIE Fellow Prof. Bruce Smith, RIT
Best Paper Awards
Dr. Burn Lin, Taiwan Semiconductor Mask Corp.
George A. Gomba, IBM Distinguished Engineer and Director of Lithography Technology Development, IBM Corp.
Symposium Chairs Prof. Roxann Engelstad and Dr. Chris Progler
Panel Discussions
The Exhibition
The Poster Receptions
See you in 2008!
24 – 29 February
http://spie.org/events/al
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