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TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
TOXICAPTURETM
A Safe Solution toDopant Gas Desorptionfrom Metal Surfaces
Junction Technology Group
September 22, 2010
Maki EgamiTAKACHIHO CHEMICAL INDUSTRIAL CO,.LTD
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
What is Takachiho’sTOXICAPTURE TM?
_ TOXICAPTURETM is a micro-abatement system for
very small amount of toxic gas.
_ TOXICAPTURETM is a simple and easy solution toreduce:
-risk towards human health
-risk of polluting clean room environment
_ TOXICAPTURETM is used to further minimize trace
toxic dopant gas inside cylinder valve outlets
Junction Technology Group
September 22, 2010
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
_ Use of high pressure gases
_ Use of gases inside clean room
(VS.outside in gas cabinets)
_ Use of gases with extremely strong toxicity ACGIH Threshold Limit Values:
Risk Concerns in Ion Implantation
Junction Technology Group
September 22, 2010
AsH3 PH3 BF3
0.05ppm 0.3ppm 1ppm
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
_Very slow leak from valve
_Valve loosening due to vibration during transportation
_Wrong operation on valve handle
Toxicapture is effective for the following two!Toxicapture is effective for the following two!
_Gas desorption from metal surfaces
_Volatile chemical reaction occurring on metal surfaces
Common Causes of OperatorExposure to Toxic Fumes
Junction Technology Group
September 22, 2010
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
TOXIC GAS DETECTION
RIKEN KEIKI SC-90 type
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
Takachiho’s Solution-TOXICAPTURE TM
Junction Technology Group
September 22, 2010
22: Cap Body
23: Gasket
24: Reagent
25: Barrier of Sintering Metal
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
TOXICAPTURE TM& Valve Diagram
_ Gas Connecting part_ Volume 1~1.5ml_ SUS Body Material_ Diaphragm_ Spring_ Stem
Junction Technology Group
September 22, 2010
Problematice Outgassing Area
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
2010 in Semicon West
Prevention of dopant gas emission bysimple chemical reaction--
_ Non-poisonous reaction
_ Irreversible reaction
_ No Poisonous Metal
_ No air or water reaction
TOXICAPTURE TM is Very Safe
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
Proving TOXICAPTURETM’s Effectivity-Experiment at ATMI
From ATMI’s Paper titled “Evaluation of ToxicaptureTM Filter forBF3 and PH3 Removal” written byPaul J. Marganski, ResearchEngineer of ATMI MLS R&D.
Static test setup to evaluate the reaction kinetics involved
Junction Technology Group
September 22, 2010
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
TOXICAPTURE TM
Experiment Results-PH3
Reaction Capacity:970µL (at 1atm,0℃) =43 µmol
Reaction Rate:51 µ L/hr =2.3μ mol/hr =1.4x10-5cc/sec
_ Enough capability to hold outgas from valve_ NOT enough to remove large amount of gas e.g.-a full cylinder of gas
From ATMI’s Paper titled “ Evaluation ofToxicaptureTM Filter for BF3 and PH3Removal” written by Paul J. Marganski,Research Engineer of ATMI MLS R&D.
Junction Technology Group
September 22, 2010
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
TOXICAPTURETM Effective Gases & Types of Fittings
_ Ion Implantation Gases: AsH3, PH3, BF3
_ Other Toxic Gases: CO, NO, SO2, HCl, Cl2, HF, H2S, NH3, etc.
_ Types of Fittings:
JIS type CGA 330 CGA 350
Junction Technology Group
September 22, 2010
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
VCR 1/2
Cup
Junction Technology Group
September 22, 2010
VCR 1/4Plug
VCR _ Plug
TOXICAPTURETM Effective Gases & Types of Fittings
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
TOXICAPTURETMInside Implant Equipment Gas Box
Junction Technology Group
September 22, 2010
ToxicaptureMFC
Pressuregauge
Valves Cylinder
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
PATENTSSTOXICAPTURETM
PATENTS
US Patent
Junction Technology Group
September 22, 2010
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
PATENTS
Junction Technology Group
September 22, 2010
SingaporePatent
TOXICAPTURETMPATENTS
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
PATENTS
Junction Technology Group
September 22, 2010
ChinaPatent
TOXICAPTURETMPATENTS
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
Conclusion
_Although minimized, use of toxic gas in ion implantation still contains risk of toxic fume exposure
_TOXICAPTURETM can further minimize this risk thru a miniaturizedgas abatement system placed in the outlet cap of a cylinder.
_TOXICAPTURETM’s effectiveness was quantified—it has enoughcapability to hold outgas from valves
_TOXICAPTURETM will help to maintain safe cylinder changes in ionimplantation
_TOXICAPTURETM in various forms may help to reduce: corrosion ofgas supply system, hazard in work environment, vacuum operationtime
Junction Technology Group
September 22, 2010
TOXICAPTURETM
Takachiho Chemical Industrial Co., Ltd.
Thank you forYour attention!
Junction Technology Group
September 22, 2010