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Rochester Institute of Technology Rochester Institute of Technology RIT Scholar Works RIT Scholar Works Theses 5-2015 Design of VCOs in Deep Sub-micron Technologies Design of VCOs in Deep Sub-micron Technologies Evan Kjell Jorgensen Follow this and additional works at: https://scholarworks.rit.edu/theses Recommended Citation Recommended Citation Jorgensen, Evan Kjell, "Design of VCOs in Deep Sub-micron Technologies" (2015). Thesis. Rochester Institute of Technology. Accessed from This Thesis is brought to you for free and open access by RIT Scholar Works. It has been accepted for inclusion in Theses by an authorized administrator of RIT Scholar Works. For more information, please contact [email protected].

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Page 1: Design of VCOs in Deep Sub-micron Technologies

Rochester Institute of Technology Rochester Institute of Technology

RIT Scholar Works RIT Scholar Works

Theses

5-2015

Design of VCOs in Deep Sub-micron Technologies Design of VCOs in Deep Sub-micron Technologies

Evan Kjell Jorgensen

Follow this and additional works at: https://scholarworks.rit.edu/theses

Recommended Citation Recommended Citation Jorgensen, Evan Kjell, "Design of VCOs in Deep Sub-micron Technologies" (2015). Thesis. Rochester Institute of Technology. Accessed from

This Thesis is brought to you for free and open access by RIT Scholar Works. It has been accepted for inclusion in Theses by an authorized administrator of RIT Scholar Works. For more information, please contact [email protected].

Page 2: Design of VCOs in Deep Sub-micron Technologies

Design of VCOs in Deep Sub-micronTechnologies

by

Evan Kjell Jorgensen

A Thesis Submitted in Partial Fulfillment of the Requirements for theDegree of Master of Science

in Electrical and Microelectronic Engineering

Supervised by

Professor Dr. P. R. MukundDepartment of Electrical and Microelectronic Engineering

Kate Gleason College of EngineeringRochester Institute of Technology

Rochester, New YorkMay 2015

Approved by:

Dr. P. R. Mukund, ProfessorThesis Advisor, Department of Electrical and Microelectronic Engineering

Dr. James Moon, ProfessorCommittee Member, Department of Electrical and Microelectronic Engineering

Dr. Robert Pearson, ProfessorCommittee Member, Department of Electrical and Microelectronic Engineering

Page 3: Design of VCOs in Deep Sub-micron Technologies

Thesis Release Permission Form

Rochester Institute of TechnologyKate Gleason College of Engineering

Title:

Design of VCOs in Deep Sub-micron Technologies

I, Evan Kjell Jorgensen, hereby grant permission to the Wallace Memo-

rial Library to reproduce my thesis in whole or part.

Evan Kjell Jorgensen

Date

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iii

Dedication

I would like to dedicate this thesis to my father Frank Nils Jelmert

Jorgensen for his encouragement and support throughout my life. Without

his persistence in conveying to me the importance of higher education I

may not be where I am today.

In addition, the love, joy, strength and courage of my twin brother Ethan

Stian Jorgensen has always helped ward off discouragement and motivated

me to keep trying when things get tough.

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Acknowledgments

Throughout my graduate education Dr. Mukund has been an excellent

advisor and professor. He understands what hard work and dedication can

bring to ones life. The feedback and advise provided by him, for academics

and career path, has been invaluable. I am grateful for the support and

motivation provided by Dr. Mukund.

In addition I would like to thank Dr. Moon for his incredible quality of

teaching in the advanced device physics courses, and well as advising

during my thesis project. His dedication to education and meticulous

attention to detail inspired me to strive for such a level of dedication in all

that I do.

Thanks to all the Microelectronics Engineering professors I had during my

undergraduate career for their dedication to the students and program.

Thanks to Anand Gopalan, Fred Heaton, and John Eble at Rambus for their

support, and GlobalFoundries for fabrication of our test chip.

Thanks to my colleagues and friends at RIT for giving me a welcome

distraction from work when stress levels were high.

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v

AbstractDesign of VCOs in Deep Sub-micron Technologies

Evan Kjell Jorgensen

Supervising Professor: Dr. P. R. Mukund

This work will present a more accurate frequency prediction model for

single-ended ring oscillators (ROs), a case-study comparing different ROs,

and a design method for LC voltage-controlled oscillators (LCVCOs) that

uses a MATLAB script based on analytical equations to output a graphical

design space showing performance characteristics as a function of design

parameters. Using this method, design trade-offs become clear, and the

designer can choose which performance characteristics to optimize. These

methods were used to design various topologies of ring oscillators and LCV-

COs in the GlobalFoundries 28 nm HPP CMOS technology, comparing

the performance between different topologies based on simulation results.

The results from the MATLAB design script were compared to simulation

results as well to show the effectiveness of the design methods.

Three varieties of 5 GHz voltage controlled ring oscillators were de-

signed in the GlobalFoundries 28 nm HPP CMOS technology. The first

is a low current low dropout regulator (LDO) tuned ring oscillator designed

with thin oxide devices and a 0.85 V supply. The second is a high cur-

rent LDO-tuned ring oscillator designed with medium oxide devices and

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vi

a 1.5 V supply. The third is varactor-tuned ring oscillator with no LDO,

and 0.85 V supply. Performance comparison of these ring oscillator sys-

tems are presented, outlining trade-offs between tuning range, phase noise,

power dissipation, and area. The varactor-tuned ring oscillator exhibits 8.89

dBc/Hz (with power supply noise) and 16.27 dBc/Hz (without power supply

noise) improvement in phase noise over the best-performing LDO-tuned

ring oscillator. There are advantages in average power dissipation and area

for a minimal tradeoff in tuning range with the varactor-tuned ring oscillator.

Four multi-GHz LCVCOs were designed in the GlobalFoundries 28 nm

HPP CMOS technology: 15 GHz varactor-tuned NMOS-only, 9 GHz varactor-

tuned self-biased CMOS, 14.2 GHz digitally-tuned NMOS-only, and 8.2

GHz digitally-tuned self-biased CMOS. As a design method, analytical ex-

pressions describing tuning range, tank amplitude constraint, and startup

condition were used in MATLAB to output a graphical view of the design

space for both NMOS-only and CMOS LCVCOs, with maximum varactor

capacitance on the y-axis and NMOS transistor width on the x-axis. Phase

noise was predicted as well. In addition to the standard varactor control

voltage tuning method, digitally-tuned implementations of both NMOS and

CMOS LCVCOs are presented. The performance aspects of all designed

LCVCOs are compared. Both varactor-tuned and digitally-tuned NMOS

LCVCOs have lower phase noise, lower power consumption, and higher

tuning range than both CMOS topologies. The varactor-tuned NMOS LCVCO

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vii

has the lowest phase noise of -97 dBc/Hz at 1 MHz offset from 15 GHz cen-

ter frequency, FOM of -172.20 dBc/Hz, and FOMT of -167.76 dBc/Hz. The

digitally-tuned CMOS LCVCO has the greatest tuning range at 10%. Phase

noise is improved by 3 dBc/Hz with the digitally-tuned CMOS topology

over varactor-tuned CMOS.

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viii

Contents

Dedication . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . iii

Acknowledgments . . . . . . . . . . . . . . . . . . . . . . . . . iv

Abstract . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . v

1 Introduction . . . . . . . . . . . . . . . . . . . . . . . . . . . 11.1 Motivation . . . . . . . . . . . . . . . . . . . . . . . . . . . 11.2 Contributions . . . . . . . . . . . . . . . . . . . . . . . . . 31.3 Thesis Organization . . . . . . . . . . . . . . . . . . . . . . 4

2 VCOs . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 52.1 Introduction . . . . . . . . . . . . . . . . . . . . . . . . . . 52.2 Applications . . . . . . . . . . . . . . . . . . . . . . . . . . 72.3 Ring Oscillator . . . . . . . . . . . . . . . . . . . . . . . . 92.4 LC Voltage-Controlled Oscillator . . . . . . . . . . . . . . . 122.5 VCO Characteristics . . . . . . . . . . . . . . . . . . . . . 17

2.5.1 Center Frequency and Tuning Range . . . . . . . . . 172.5.2 Phase Noise and Jitter . . . . . . . . . . . . . . . . 192.5.3 Power Consumption and Area . . . . . . . . . . . . 212.5.4 Manufacturability . . . . . . . . . . . . . . . . . . . 22

3 Overview of VCOs Designed in This Work . . . . . . . . . . 233.1 Ring Oscillators . . . . . . . . . . . . . . . . . . . . . . . . 23

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3.1.1 LDO-tuned Ring Oscillator . . . . . . . . . . . . . . 233.1.2 Varactor-tuned Ring Oscillator . . . . . . . . . . . . 26

3.2 NMOS-only LCVCO . . . . . . . . . . . . . . . . . . . . . 273.2.1 Varactor-tuned . . . . . . . . . . . . . . . . . . . . 273.2.2 Digitally-tuned . . . . . . . . . . . . . . . . . . . . 28

3.3 Self-biased CMOS LCVCO . . . . . . . . . . . . . . . . . 303.3.1 Varactor-tuned . . . . . . . . . . . . . . . . . . . . 303.3.2 Digitally-tuned . . . . . . . . . . . . . . . . . . . . 31

4 Design Methodology . . . . . . . . . . . . . . . . . . . . . . 324.1 Ring Oscillator . . . . . . . . . . . . . . . . . . . . . . . . 32

4.1.1 Frequency and Propagation Delay . . . . . . . . . . 324.1.2 Phase Noise . . . . . . . . . . . . . . . . . . . . . . 354.1.3 Gate Resistance . . . . . . . . . . . . . . . . . . . . 39

4.2 NMOS-only and Self-biased CMOS LCVCOs . . . . . . . . 444.2.1 Frequency and Tuning Range . . . . . . . . . . . . 454.2.2 Tank Amplitude Constraints . . . . . . . . . . . . . 464.2.3 Startup Condition . . . . . . . . . . . . . . . . . . . 474.2.4 Phase Noise . . . . . . . . . . . . . . . . . . . . . . 48

5 Results and Discussion . . . . . . . . . . . . . . . . . . . . . 505.1 Ring Oscillators . . . . . . . . . . . . . . . . . . . . . . . . 505.2 LCVCOs . . . . . . . . . . . . . . . . . . . . . . . . . . . 575.3 Physical Design and Test Plan . . . . . . . . . . . . . . . . 63

6 Conclusions . . . . . . . . . . . . . . . . . . . . . . . . . . . 67

Bibliography . . . . . . . . . . . . . . . . . . . . . . . . . . . . 70

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A Tuning Range and Phase Noise of all LCVCOs over ProcessCorners . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 74

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List of Tables

4.1 Typical mobility and field values for surface electrons andholes . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 38

5.1 Summary of results for ring oscillators . . . . . . . . . . . . 575.2 Summary of results . . . . . . . . . . . . . . . . . . . . . . 63

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xii

List of Figures

2.1 Basic VCO symbol. . . . . . . . . . . . . . . . . . . . . . . 52.2 Simple 2-port feedback circuit with amplifier and feedback

network . . . . . . . . . . . . . . . . . . . . . . . . . . . . 62.3 Block diagram of PLL . . . . . . . . . . . . . . . . . . . . 72.4 Block diagram of CDR . . . . . . . . . . . . . . . . . . . . 82.5 Block diagram of frequency synthesizer . . . . . . . . . . . 92.6 Single-ended ring oscillator . . . . . . . . . . . . . . . . . . 102.7 Differential ring oscillator . . . . . . . . . . . . . . . . . . 122.8 Ideal parallel LC circuit . . . . . . . . . . . . . . . . . . . . 132.9 Parallel LC circuit with losses and active negative resistance 152.10 LC oscillator with cross-coupled differential pair . . . . . . 152.11 LC VCO using varactors . . . . . . . . . . . . . . . . . . . 162.12 Illustration of phase noise of a real oscillator . . . . . . . . . 20

3.1 Replica compensated LDO topology from [19] . . . . . . . 243.2 Single-ended ring oscillator with inter-nodal varactors . . . . 263.3 Varactor-tuned NMOS-only LCVCO . . . . . . . . . . . . . 273.4 Digitally-tuned NMOS-only LCVCO . . . . . . . . . . . . 293.5 Varactor-tuned CMOS LCVCO . . . . . . . . . . . . . . . . 303.6 Digitally-tuned CMOS LCVCO . . . . . . . . . . . . . . . 31

4.1 Inter-stage input and parasitic capacitances . . . . . . . . . . 334.2 Gate and channel resistance [28] . . . . . . . . . . . . . . . 40

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xiii

4.3 KCL on ring oscillator stage including input and parasiticcapacitances . . . . . . . . . . . . . . . . . . . . . . . . . . 42

5.1 Frequency versus number of stages . . . . . . . . . . . . . . 505.2 Predicted and simulated phase noise for 7, 9, 11, 13, and 15

stage ring oscillators . . . . . . . . . . . . . . . . . . . . . 515.3 Tuning range of VCOs . . . . . . . . . . . . . . . . . . . . 535.4 Power supply sensitivity of LDO in VCO1 and LDO in VCO2 545.5 Output noise versus frequency for all VCOs without PSN . . 555.6 Phase noise versus offset frequency for all VCOs with and

without PSN . . . . . . . . . . . . . . . . . . . . . . . . . . 565.7 NMOS LCVCO design space . . . . . . . . . . . . . . . . . 575.8 CMOS LCVCO design space . . . . . . . . . . . . . . . . . 585.9 Tuning range of varactor-tuned NMOS and CMOS LCVCOs 595.10 Tuning range of digitally-tuned NMOS and CMOS LCVCOs 605.11 Predicted phase noise of all LCVCOs . . . . . . . . . . . . 615.12 Simulated phase noise of all LCVCOs . . . . . . . . . . . . 625.13 Layout of all VCOs . . . . . . . . . . . . . . . . . . . . . . 645.14 Top level test chip layout . . . . . . . . . . . . . . . . . . . 65

A.1 Tuning Range of VT NMOS LCVCO . . . . . . . . . . . . 74A.2 Phase Noise of VT NMOS LCVCO . . . . . . . . . . . . . 75A.3 Tuning Range of DT NMOS LCVCO . . . . . . . . . . . . 75A.4 Phase Noise of DT NMOS LCVCO . . . . . . . . . . . . . 76A.5 Tuning Range of VT CMOS LCVCO . . . . . . . . . . . . 76A.6 Phase Noise of VT CMOS LCVCO . . . . . . . . . . . . . 77A.7 Tuning Range of DT CMOS LCVCO . . . . . . . . . . . . 77A.8 Phase Noise of DT CMOS LCVCO . . . . . . . . . . . . . 78

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1

Chapter 1

Introduction

1.1 Motivation

The rapid growth in global communications networks has driven the demand

for high-performance communications systems that are faster and consume

less power. In fiber optic channels, the interface circuits at the emitting

and receiving ends need to be fast enough to take full advantage of the

speed of the fiber optic system. Within-high performance mobile devices,

microprocessors require a phase-locked loop (PLL) for frequency synthesis

to generate a stable clock, clock and data recovery (CDR) for high speed

IO’s, and wireless transceiver front-end circuitry that must be capable of

modulating high-speed analog signals incoming from the antenna. Voltage-

controlled oscillators (VCOs) are used within PLLs for these applications,

and in modern devices, must achieve center frequencies in the GHz range

[1–8].

In such applications, the VCO must have low phase noise first and fore-

most, low power consumption, and must be implemented within a reason-

able area. CMOS VCOs are typically designed using a ring oscillator (RO)

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2

or an LC resonant voltage-controlled oscillator (LCVCO). LC oscillators

generally have better phase noise performance due to the high quality fac-

tor (Q) achievable with an LC resonant network; however, high-Q designs

require high quality on-chip inductors, increasing the cost and complexity

of the CMOS process. In addition, LC oscillators can achieve a higher

maximum frequency compared to a ring oscillator in the same process. The

ring oscillator is advantageous in tuning range, area, and manufacturability.

Even though the concept of the VCO is fairly straightforward, there are still

difficulties in the design, especially in advanced scaled deep sub-micron

CMOS technologies. The continued scaling of CMOS technologies wors-

ens short-channel effects, increases process variation and device mismatch,

increases the influence from parasitic components, and increases flicker and

thermal noise [9].

The design of VCOs includes trade-offs in speed, power, area, and ap-

plication. Accurate models and analytical expressions are needed in or-

der to shorten and simplify the design process. Without accurate models,

the designer will not be able to make informed decisions on which design

variables affect important performance parameters and may have to rely

on iterative and time-consuming simulations. This is not a recommended

design approach. Furthermore, assembling analytical expressions together

into a numerical computing environment such as MATLAB and generating a

graphical view of the design space can give the designer a powerful insight,

making the initial design as time-efficient as possible.

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3

This thesis will present design methodologies using analytical expres-

sions within MATLAB generating a graphical output of the design space

including important performance parameters as a function of design vari-

ables for both ring oscillators and LCVCOs. The design method for the

ring oscillators uses existing expressions for frequency based on stage delay,

and with the addition of parasitics and gate resistance terms. The LCVCO

design method includes expressions for frequency, tuning range, startup

condition, and tank amplitude constraint, derived for two separate LCVCO

circuit topologies. Using these design methods, ring oscillators and LCV-

COs of various topologies are designed and compared, with results shown

in this thesis.

1.2 Contributions

The key contributions of this work are:

1. A model using analytical expressions in MATLAB to predict the center

oscillation frequency of ring oscillators as a function of the number

of stages. The model accounts for parasitic capacitances and gate

resistance in addition to the standard stage delay components. Phase

noise is predicted as well.

2. A design methodology for NMOS-only and self-biased CMOS LCV-

COs using MATLAB to produce graphical outputs of the design space.

This is a multi-faceted design approach that shows parameters such

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4

as tuning range, tank amplitude constraints, and startup condition as a

function of maximum varactor capacitance and transistor gate width in

graphical form on a single plot, giving the designer a complete view

of the design space. This method is derived for both current-biased

NMOS-only and self-biased CMOS LCVCO topologies.

3. A case study showing the disadvantages of using an LDO for tuning

and regulation on ring oscillators in a deep sub-micron technology.

4. A new LCVCO tuning method incorporating a digitally-tuned capaci-

tor bank (on both NMOS-only and self-biased CMOS LCVCOs).

5. A detailed performance comparison of ring oscillators and LCVCOs

in a deep sub-micron technology.

6. A test chip in the GlobalFoundries 28 nm HPP CMOS process to

experimentally validate designs and simulation results. Testing will

take place upon completion of fabrication in early June 2015.

1.3 Thesis Organization

This work is organized as follows: Chapter 2 presents the theory behind

both ring oscillators and LCVCOs; Chapter 3 presents the VCOs designed

in this work; Chapter 4 presents the design methodologies used for both ring

oscillators and LCVCOs; Chapter 5 shows results from design methods and

simulation; Chapter 6 presents conclusions.

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5

Chapter 2

VCOs

2.1 Introduction

The voltage-controlled oscillator (VCO) is a circuit where the output is a

single-ended or differential periodic oscillating output voltage the frequency

of which is dependent on an input control voltage. A basic VCO symbol is

shown in Figure 2.1.

Figure 2.1: Basic VCO symbol.

The underlying equation for the operation a VCO is given by (2.1).

fV CO = f0 +KV COVctrl (2.1)

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where f0 is the center frequency of the VCO, KV CO is the gain of the VCO,

Vctrl is the input control voltage to tune or change the output frequency

fV CO. The gain of the VCO determines how much Vctrl will affect the

frequency of the VCO, shown in (2.2).

KV CO =δfcδVctrl

(2.2)

As described in [10], for stable oscillation to occur the VCO must satisfy

the Barkhausen stability criteria for a 2-port feedback system shown in

Figure 2.2.

A

β(jω)

Vin Vout

Figure 2.2: Simple 2-port feedback circuit with amplifier and feedback network

The loop gain of the feedback system must satisfy the relationship in

(2.3)

|βA(jω)| = 1 (2.3)

and phase must satisfy (2.4)

∠βA(jω) = 2πk k = 1, 2, ..., n (2.4)

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7

The VCO is a critical circuit block used in phase-locked loops (PLLs).

Common applications of PLLs are in frequency synthesis and clock and

data recovery circuits (CDR) where they are used as a local VCO. The

two main categories of VCOs include the ring oscillator and the LC os-

cillator (LCVCO). The LCVCO is generally capable of higher maximum

oscillation frequencies as well as better phase noise performance compared

to ring oscillators. Ring oscillators are advantageous in tuning range and

manufacturability.

2.2 Applications

The VCO is commonly used as a key component of the PLL, as shown in

Figure 2.3.

PhaseDetectorKd

Low-passFilterF (s)

VCOKv

XiVe Vc Xo

Figure 2.3: Block diagram of PLL

The PLL is a circuit that synchronizes the frequency and phase of its

output signal to the frequency and phase of a reference input signal [11].

The phase detector produces a DC output Ve that is proportional to the phase

difference of the input signal Xi and the VCO output signal Xo. The low-

pass filter attenuates any high frequency variation in Ve, giving a clean DC

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8

signal, Vc, to the VCO. This signal controls the frequency of oscillation of

the VCO, decreasing or increasing until the frequency of Xo matches that

of Xi. When the difference in angular frequency of the input and output

(ωi−ωo) is much lower than the loop gain (K = KdKv), the PLL is in lock.

One common application for PLL is the clock and data recovery circuit

(CDR) shown in Figure 2.4 [7].

PhaseDetectorKd

ChargePump

Low-passFilterF (s)

VCOKv

DecisionCircuit

Din

CLK

Dout

Figure 2.4: Block diagram of CDR

As in the PLL, the phase detector compares the phase of the incoming

data (Din) to the phase of the clock (CLK) generated by the VCO. The

difference is converted into a voltage signal and applied to the charge pump.

The charge pump sends a signal through the low-pass filter, delivering a

clean DC signal to the VCO control input to either increase or decrease the

frequency of the VCO output CLK. The CLK signal drives a decision circuit

that re-synchronizes the output data (Dout) to reduce jitter.

Another application of the PLL is in the frequency synthesizer circuit

shown in Figure 2.5.

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9

PhaseDetectorKd

Low-passFilterF (s)

VCOKv

÷ N

frefVe Vc fout

Figure 2.5: Block diagram of frequency synthesizer

The frequency synthesizer is widely used in radio communications and

wireless devices as a source of stable oscillation for the frequency modula-

tion and demodulation of signals. The frequency synthesizer is a PLL with

a frequency divider in the feedback path, giving the capability of generating

an accurate local oscillator whose frequency can be changed in small in-

crements. The phase detector inputs must be at the same frequency for the

PLL to lock. For this to occur, fref must be equivalent to fout/N ; therefore,

fout = N · fref . The divider multiple, N, can be incremented to enable

operation on different channels.

2.3 Ring Oscillator

A ring oscillator is a series of N delay stages where the output of the last

stage is connected to the input of the first stage in a feedback loop. For

stable oscillation, the ring must follow the Barkhausen criteria where the

ring must provide a multiple of 2π phase shift and unity voltage gain at the

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10

desired oscillation frequency. Each delay stage provides π/N phase shift,

and the remaining π phase shift is provided by the DC inversion [12]. Ring

oscillators can be made of single-ended or differential delay stages. Single-

ended ring oscillators (Figure 2.6) must have an odd number of stages to

provide DC inversion for oscillation.

...N...

...N...

Figure 2.6: Single-ended ring oscillator

The frequency of oscillation is determined by the number of stages, N,

and the stage delay, td as shown in (2.5).

f0 =1

2N · td(2.5)

where stage propagation delay is

td = ηRDSeffCL (2.6)

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Since propagation delay is the time between mid-level input and mid-

level output level, η = ln(0.5) = 0.69.

RDSeff =

1βn(VDD−V tn) + 1

βp(VDD−V tp)

2(2.7)

where βn = µnCoxnWL n

and βp = µpCoxpWL p

is the effective channel resistance

through which the load capacitance CL = Cin + Cpara of each stage is

charged or discharged depending on when the inverter is high or low.

To incorporate frequency control in the ring oscillator, either N or td

must be varied. Since it is impractical to implement a circuit that can vary

the number of stages for frequency tuning, td must be varied. One way

is to control the amount of current that is available to charge CL by using

current-starved inverters as the delay stage. This requires four transistors

stacked between VDD and GND and can prove difficult and impractical in

deep sub-micron CMOS technologies with sub-1V power supplies.

A single-ended VCO as in Figure 2.6 can be tuned by regulating VDD

with a voltage regulator such as a low dropout regulator (LDO), or by fixing

VDD and controlling varactors between each delay stage. The LDO tuning

method has good power supply noise rejection from the LDO, but has a dis-

advantage in that it requires more voltage headroom and uses significantly

more area and power. The varactor tuning method uses less area and power,

but leaves the power supply more vulnerable to noise.

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Differential ring oscillators (Figure 2.7) are advantageous since their dif-

ferential delay stage topology provide good common-mode noise rejection.

+−

+−

+−

+−

+−

+−

+−

+

Figure 2.7: Differential ring oscillator

This topology must have an even number of stages if the output of the last

stage is cross-coupled before being fed back to the input of the first stage,

and an odd number of stages if the last stage output is not cross-coupled.

A common stage topology for the differential ring oscillator consists of a

source-coupled pair with a resistive load driven by a current source. An

operational amplifier is often required in a negative feedback error ampli-

fier configuration with an external reference voltage for biasing an active

resistive load. This stage topology can be difficult to realize across process

corners and supply variation in sub-1V technologies.

2.4 LC Voltage-Controlled Oscillator

The ideal LC oscillator consists of an inductor (L), capacitor (C) driven by

an AC voltage source, shown in Figure 2.8.

Page 27: Design of VCOs in Deep Sub-micron Technologies

13

V (t) L C

Figure 2.8: Ideal parallel LC circuit

The reactances are given by (2.8)

XL = ωL and XC =1

ωC(2.8)

For oscillation to occur, the reactances must be equal. Setting the two

equal and solving for ω gives

ω0 =1√LC

or f0 =1

2π√LC

(2.9)

Ideal inductors and capacitors are not physically attainable because there

are losses in the form of a positive parasitic series resistance Rs. Quality

factor for the LC tank can be described as the ratio of energy stored to energy

dissipated per cycle [10, 13].

QE =ωEstored

Pdiss(2.10)

where

Page 28: Design of VCOs in Deep Sub-micron Technologies

14

Estored =LsI

2max

2(2.11)

and

Pdiss =RsI

2max

2(2.12)

giving tank quality factor

Qtank =ωLsRs

(2.13)

where Rs is the parasitic series resistance associated with the inductor. This

series resistance Rs can be converted into a parallel resistance Rp described

as

Rp =LsCRs

= Q2tankRs (2.14)

Although Rs is a more accurate representation of the actual physical

losses of an integrated inductor, the equivalent parallel representation Rp is

often easier to work with when considering other elements of the LCVCO.

The parasitic resistance Rp must be canceled out by a negative resistance

that is equal in magnitude [10]. Figure 2.9 shows an LC tank with parallel

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15

parasitic resistance Rp and negative resistance −Rp.

L C Rp −Rp

Figure 2.9: Parallel LC circuit with losses and active negative resistance

A common method of realizing this compensating negative resistance in

a monolithic LC oscillator is with a cross-coupled differential pair as shown

in Figure 2.10.

L C Rp Rp C L

−2/gm

Figure 2.10: LC oscillator with cross-coupled differential pair

The 2-port resistance seen between the two drain nodes of the active

devices is −2/gm [10]. This negative resistance must be equivalent to the

positive resistance 2Rp from the LC tank losses for steady oscillation. From

(2.8) the oscillation frequency is dependent on L and C. Since monolithic

inductors are not tunable, frequency control must come from C. This can be

achieved using varactors as in Figure 2.11.

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16

L

Cv

Vctrl

Cv

L

−2/gm

Figure 2.11: LC VCO using varactors

The topology shown in Figure 2.11 is known as NMOS-only biased with

a current source to ground. An NMOS FET is often used as the current

mirror. This topology can also be biased with a current source to the supply,

where a PMOS FET would be used as the current mirror. Other topologies

include PMOS-only differential pair with either current source to ground or

the supply.

The NMOS-only topology provides higher maximum center frequencies

over those using PMOS differential pairs due to higher electron mobility. It

also gives a higher output voltage swing, of up to twice the supply level, due

to the inductors being tied to the supply. This can be beneficial in reducing

phase noise through signal maximization, but if not carefully designed can

cause degradation due to hot electron effects or gate oxide breakdown, lead-

ing to poor reliability [10]. Topologies with the current source to ground

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17

have the smallest sensitivity to noise on the ground line but high sensitivity

to noise on the supply, and the opposite can be said about those with the

current source to the supply.

2.5 VCO Characteristics

There are several important performance characteristics of VCOs that the

designer must be aware of to choose which topology is most beneficial

depending on the intended application. These include center frequency

and tuning range, phase noise and jitter, power consumption and area, and

manufacturability. Manufacturability includes ease of integration with stan-

dard CMOS technologies and digital circuitry, and the effect of process

variations.

2.5.1 Center Frequency and Tuning Range

Frequency characteristics of a VCO include center frequency and tuning

range. The center frequency is the frequency at which the VCO can operate

in the middle of the range of its control voltage, given by (2.1). Higher cen-

ter frequencies are desired as the demand for higher speed communications

systems and serial data transfer rates increases.

The tuning range is the range in which oscillation can be varied around

the center frequency, usually measured in percentage of the center frequency.

A VCO with a center frequency of 5 GHz and a tuning range from 4.5 GHz

to 5.5 GHz would have a tuning range of 20%. A tuning range is necessary

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18

for chips or systems that need to operate over a range of frequencies. Tuning

range is also important since the frequency of a VCO can vary due to process

variations. If the frequency of the fabricated VCO is slightly different than

the intended frequency, as long as the tuning range encompasses the desired

frequency of operation, the VCO is still useful.

Higher center frequency is more easily achieved with an LCVCO due to

the inverse relationship to the LC product (2.9) and the fact that those values

can be made extremely low. Oscillation frequencies of up to 50 GHz have

been reported in [14]. The frequency of LCVCOs is limited by the need of

active devices to compensate for LC tank losses and maintain oscillation.

The maximum center frequency of ring oscillators is much lower. Using the

design method presented in Section 4.1, the oscillation frequency of an 11

stage single-ended ring oscillator in 28 nm technology is calculated to be

around 5.5 GHz.

Although ring oscillators are not capable of as high frequencies as LCV-

COs, their tuning range is often much greater. From (2.5)-(2.7) it is apparent

that there are parameters such as VDD and CL (through use of varactors) that

can be physically varied to change frequency. Tuning ranges of 10-50%

are often achievable. In the case of LCVCOs, the capacitance of the tank

varactors is often the only frequency-related parameter that can physically

be varied, limiting the tuning range. Given this, and the higher oscillation

frequency, the tuning range of LCVCOs will typically be less than that of

ring oscillators.

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19

2.5.2 Phase Noise and Jitter

The output of an ideal sinusoidal oscillator can be described as

Vout(t) = V0cos[2πfct+ φ] (2.15)

where V0 is a constant amplitude, fc is the center frequency, and φ a fixed

phase. In real oscillators there are internal noise sources such as thermal

(white noise), flicker (1/f ) noise, shot noise, as well as noise from external

sources on the power supply and ground. Both of these will cause fluc-

tuations in the amplitude and phase terms of (2.15). These terms become

functions of time, and now the output of a real oscillator can be represented

as

Vout(t) = V0(t)cos[2πfct+ φ(t)] (2.16)

The fluctuations in time introduced by V0(t) and φ(t) result in sidebands

in a symmetrical distribution around fc as shown in Figure 2.12 [13].

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20

Figure 2.12: Illustration of phase noise of a real oscillator

In the time domain, these frequency fluctuations are described as jitter,

usually in units of time (seconds or period cycles). Jitter is described as the

variance (σ2τ ) of the Gaussian distribution of the output signal period with a

mean value of τ = 1/ωc. Jitter characterized by the single sideband noise

spectral density and normalized to the carrier signal power in the frequency

domain is known as phase noise. Phase noise has units of dBc/Hz. In Figure

2.12, the solid center line represents the power density of the frequency

spectrum of an ideal oscillator, while the symmetrical envelopes around the

center line represent the sideband noise power spectral density originating

from jitter in the output waveform of a real oscillator. It is important to

minimize phase noise in VCOs in order to maintain a high signal-to-noise

ratio in whatever signal the VCO is modulating or demodulating.

Phase noise in a general form can be described by (2.17)

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21

L(fc,∆f) = 10 · log[Psideband(fc + ∆f, 1Hz)

Pcarrier

](2.17)

which is the ratio of the power in a 1 Hz bandwidth at an offset ∆f from the

carrier, fc, divided by the power of the carrier. More detailed expressions

describing phase noise as a function of noise sources and parameters for

specific oscillator topologies have been derived in [15,16] and are presented

in later sections.

Phase noise can also be related to quality factor, Q, as shown in (2.18).

L(fc,∆f) = 10 · log[

2kT

Pcarrier·(

fc2Q∆f

)](2.18)

An LCVCO has a higher Q than a ring oscillator due to the high energy

storage per cycle in the LC tank, with the only energy dissipation occurring

due to the series resistance losses. In a ring oscillator, the energy is stored

in the equivalent capacitance of the next stage. In each cycle, the energy is

fully charged and then discharged, significantly reducing Q. Typical Q val-

ues of ring oscillators are 1.3-1.4 [17], while those of LCVCOs are usually

an order of magnitude higher [18].

2.5.3 Power Consumption and Area

Power consumption is an important criterion in VCO designs. Phase noise

can be minimized by increasing the current and amplitude of an output

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22

signal, resulting in higher power consumption. However, low power con-

sumption may be desired as part of an overall system level power budget,

presenting a trade-off. In terms of VCO topology, LCVCOs have far greater

power consumption due to the need for higher currents to drive the LC tank,

especially at higher frequencies. Ring oscillators typically have lower power

consumption. Area is an important factor because it translates directly

into cost. Due to the size of integrated inductors relative to other devices,

LCVCOs usually require more area than ring oscillators.

2.5.4 Manufacturability

Manufacturability of the VCO describes ease and ability to design and fab-

ricate the VCO in a way that is integrated with other analog and digital

circuitry on the same chip in standard CMOS processes. If area is a top

priority, ring oscillators will be preferred. Other factors such as supply noise

rejection and resistance to process variation are important as well. If a VCO

must be integrated on a chip with circuitry that may present a high amount

of noise to the power supply, a differential topology or supply regulator may

be needed for supply noise rejection. Ring oscillators are more susceptible

to process variation than LCVCOs; however, with their larger tuning range,

they can still be usable.

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23

Chapter 3

Overview of VCOs Designed in This Work

As part of this work, several varieties of VCOs – both ring and LC – were

designed in the GlobalFoundries 28 nm HPP CMOS technology.

3.1 Ring Oscillators

3.1.1 LDO-tuned Ring Oscillator

A common method of tuning a ring oscillator is by varying VDD with a low

dropout regulator (LDO). This serves the dual purpose of tuning and supply

noise rejection. Two separate LDO voltage regulators have been designed in

this 28 nm CMOS technology using the topology shown in Figure 3.1. One

uses thin oxide devices and a 0.85 V supply, and the other uses medium

oxide devices and a 1.5 V supply. Both use the replica compensated LDO

topology from [19], shown in Figure 3.1.

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24

Figure 3.1: Replica compensated LDO topology from [19]

Conventional voltage regulators suffer from bandwidth and supply re-

jection limitations. This topology uses the replica compensation technique

proposed by Elad Alon et al. [19] to improve the phase noise of the VCO

through improved bandwidth and supply noise rejection. This topology has

been shown to improve supply noise rejection of the LDO by more than 30

dB over a 1 GHz bandwidth, and phase noise of the VCO by 8-10 dBc [20].

To improve the supply noise rejection of the regulator, the output pole

must be the dominant pole [20]. The output pole is the parallel combination

of the decoupling capacitor on the output and the output resistance. Once

the bandwidth of the amplifier has been increased by the negative feedback

the output pole becomes dominant [19]. The error amplifier consists of a

cross-coupled NMOS differential pair sharing the same PMOS active mirror

load. The amount of bias current in the differential pair and the width of the

NMOS transistors determine the loop gain of the regulator system [19]. It is

Page 39: Design of VCOs in Deep Sub-micron Technologies

25

important to have a high gain and high bandwidth amplifier for good supply

noise rejection [19]. The product of the minimum supply rejection (Rmin)

and the regulator bandwidth (wbw) is independent of the feedback gain k and

is given by

Rmin · wbw = waAaAoRvdd (3.1)

where Aa and Ao represent the amplifier gain and output stage gain, respec-

tively, andRvdd is the inverse of open-loop supply sensitivity of the regulator

(Rvdd = 1/Svdd).

A parallel combination of diode-connected PMOS and NMOS transistors

forms the replica load that replicates the I-V characteristics of the actual

VCO. The VCO current can be expressed as

Ivco = 2(Ionp||Ionn) (3.2)

where Ionn and Ionp are the saturated drain currents of the NMOS and PMOS

in a CMOS inverter based ring oscillator. If the oscillators are sized in

such a way that both rise current and fall current are exactly the same

then the system will give minimum phase noise, which is explained by

Hajimiri et al. [15]. This replica load is preferred since it does not generate

any switching noise and offers lower parasitics, increasing bandwidth for

the RC output filter [19]. Since it is not loaded by the output decoupling

Page 40: Design of VCOs in Deep Sub-micron Technologies

26

capacitor, it provides a faster feedback path to the input, improving supply

noise rejection [20].

3.1.2 Varactor-tuned Ring Oscillator

An alternative method of tuning a ring oscillator is by varying the internodal

capacitance using varactors placed at the output node of each delay stage,

shown in Figure 3.2.

Cv Cv

...N...

Figure 3.2: Single-ended ring oscillator with inter-nodal varactors

One advantage of this topology is higher output swing, from GND to

VDD, from not using a voltage regulator. Higher output swing enables better

phase noise performance. A disadvantage is that without use of a regulator,

the ring oscillator is more susceptible to power supply noise. This can be

mitigated through use of a separate, clean power supply for the oscillator, as

well as placing decoupling capacitors on the supply.

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27

3.2 NMOS-only LCVCO

3.2.1 Varactor-tuned

A varactor-tuned NMOS-only LCVCO (VT NMOS) topology was used

as shown in Figure 3.3. A single symmetric spiral inductor with Ltank

inductance and center-tap to VDD was used in all LCVCOs.

Cv

Vctrl

CvIref

Ltank

−2/gm

Figure 3.3: Varactor-tuned NMOS-only LCVCO

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28

3.2.2 Digitally-tuned

A digitally-tuned NMOS-only LCVCO (DT NMOS), shown in Figure 3.4,

was designed using four banks of varactors where Cv2 = 2Cv1, Cv3 = 4Cv1,

and Cv4 = 8Cv1 that are controlled through 4-bit external bias voltages Vb1,

Vb2, Vb3, and Vb4, where Vb1 is the LSB and Vb4 the MSB. Each bias voltage is

either 0 V or 0.85 V, making the corresponding capacitance either minimum

or maximum. Doing so gives the LCVCO a wider tuning range and better

selectivity.

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29

Cv1Vb1 Cv1

Cv2Vb2 Cv2

Cv3Vb3 Cv3

Cv4Vb4 Cv4

Iref

Ltank

−2/gm

Figure 3.4: Digitally-tuned NMOS-only LCVCO

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30

3.3 Self-biased CMOS LCVCO

3.3.1 Varactor-tuned

A self-biased CMOS LCVCO (VT CMOS), shown in Figure 3.5, was de-

signed utilizing both PMOS and NMOS cross-coupled differential pairs

with no current source bias. A quadrature LCVCO using this topology

was introduced in [21] and later in [22]. Removing the current source

maximizes signal swing and eliminates the phase noise source associated

with the current source [13, 23], and reduces flicker noise terms as all core

transistors are now in GHz switching bias condition [24].

CvVctrl Cv

−2/gmp

Ltank

−2/gmn

Figure 3.5: Varactor-tuned CMOS LCVCO

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31

3.3.2 Digitally-tuned

A digitally-tuned variation of the CMOS LCVCO (DT CMOS) was de-

signed as well, as shown in Figure 3.6. This circuit uses the same digital

tuning scheme as the digitally-tuned NMOS-only LCVCO from Section

3.2.2.

Cv1Vb1 Cv1

Cv2Vb2 Cv2

Cv3Vb3 Cv3

Cv4Vb4 Cv4

−2/gmp

Ltank

−2/gmn

Figure 3.6: Digitally-tuned CMOS LCVCO

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32

Chapter 4

Design Methodology

4.1 Ring Oscillator

The following expressions were used in MATLAB to predict the center os-

cillation frequency of ring oscillators as a function of the number of stages,

and to predict phase noise. The model accounts for parasitic capacitances

and gate resistance in addition to the standard stage delay components.

Design variables such asWp,Wn, L, VDD, andN are inputs, and technology

dependent parameters such as Cox, µn, and µp are constants.

4.1.1 Frequency and Propagation Delay

The basic expression for the center frequency of a ring oscillator is given by

f0 =1

2Ntd(4.1)

where N is the number of stages and

td = ηRDSeffCL (4.2)

is the propagation delay of a single inverter stage. Since propagation delay

Page 47: Design of VCOs in Deep Sub-micron Technologies

33

is the time between mid-level input and mid-level output, η = ln(0.5) = 0.69.

The inter-stage load capacitance, CL = Cin +Cpara, is the capacitance seen

at each node between stages. For the varactor-tuned ring oscillator, the term

Cpara will include the mid varactor capacitance Cv.

The following RC components for propagation delay are considered at

the points on the inverter voltage transfer characteristic when either the

NFET is in triode and PFET in cutoff (Vout low and Vin high), or the PFET

in triode and NFET in cutoff (Vout high and Vin low).

RDSeff =

1βn(VDD−V tn) + 1

βp(VDD−V tp)

2(4.3)

is the effective (average) channel resistance through which the load capac-

itance is charged or discharged depending on whether Vin is low or high.

The terms βn = µnCoxnWL n

and βp = µpCoxpWL p

.

Figure 4.1 shows the inter-stage input and parasitic capacitances con-

tributing to the CL in propagation delay.

CvCdbn

Cdbp

Cgsn

Cgsp

Cgdp

Cgdn

Figure 4.1: Inter-stage input and parasitic capacitances

Page 48: Design of VCOs in Deep Sub-micron Technologies

34

The input capacitance terms

Cin = Cgsn + Cgsp (4.4)

where

Cgsn =1

2WnLCoxn +WnCovn (4.5)

and

Cgsp =1

2WpLCoxp +WpCovp (4.6)

The terms Covn and Covp are the NMOS and PMOS gate overlap capaci-

tances per area.

The parasitic capacitance term is

Cpara = Cdbn + Cdbp + Cgdn + Cgdp + Cv (4.7)

which includes drain-body capacitance terms

Cdbn = CjnLWn + Cjswn(2L+ 2Wn) (4.8)

Page 49: Design of VCOs in Deep Sub-micron Technologies

35

and

Cdbp = CjpLWp + Cjswp(2L+ 2Wp) (4.9)

where Cj is the zero-bias junction capacitance per unit area and Cjsw is the

zero-bias sidewall junction capacitance per perimeter length,

as well as gate-drain capacitance terms

Cgdn = WnLCoxn +WnCovn (4.10)

and

Cgdp = WpLCoxp +WpCovp (4.11)

The usual factor of 1/2 in the gate-drain capacitance terms is multiplied

by 2 due to the Miller-effect as CM = C(1 + |Av|) where Av is -1.

4.1.2 Phase Noise

In [15], the expression for the phase noise of a single-ended CMOS ring

oscillator is derived from the impulse sensitivity function (ISF). The ISF

represents the sensitivity of the output waveform to a perturbation at any

point in time. The perturbation is a current impulse in the form of injected

charge that causes an instantaneous change in voltage, ∆V = ∆qCL

due to

Page 50: Design of VCOs in Deep Sub-micron Technologies

36

∆q on the load capacitance CL. This change in voltage results in a shift in

transition time that can be described as a change in phase.

The single-sideband phase noise spectrum due to a single noise current

source [16] is

L {∆f} =Γ2rms

8π2∆f 2

i2n/∆f

q2max

(4.12)

Γrms is the rms impulse sensitivity function,

i2n∆f

= 4kTγgd0 = 4kTγµCoxW

L∆V (4.13)

is the single-sideband power spectral density of the noise current source.

The term γ is the noise factor. It is typically 0.66 for long-channel devices

in saturation, and twice that for short-channel devices [25, 26]. For this

design, γ = 1.33 was assumed.

From Hajimiri et al. [15], assuming the thermal noise sources from delay

stage devices are uncorrelated and the waveform of each node is the same

except for the overall phase shift, the total phase noise fromN noise sources

becomes

L {fc,∆f} =8

kT

P

VDDVchar

f 2c

∆f 2(4.14)

where P is power dissipation including crowbar current drawn from the

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37

supply during transitions [15], shown in (4.15).

P = 2ηNVDDqmaxf0 (4.15)

During a single period, each node is charged to qmax and discharged back

to zero. The crowbar current is the extra current drawn from the supply to

ground that does not contribute to the charging of qmax.

Vchar is the characteristic voltage of the MOSFET, given by

Vchar =EcL

γ(4.16)

and Ec is the critical electric field at which carrier velocity is saturated,

also known as Esat, from the short-channel MOSFET model. Note that

phase noise is inversely proportional to power dissipation and increases

quadratically with oscillation frequency. In addition, there is only a small

dependence on the number of stages. If additional delay stages (seen as

noise sources) are added, the peak current at transition (and thus power)

must be increased in order to maintain the same oscillation frequency and

phase noise should not change significantly.

The critical field Esat can be expressed as

Esat =Esatn + Esatp

2(4.17)

where

Page 52: Design of VCOs in Deep Sub-micron Technologies

38

Esatn =2vsatnµeffn

(4.18)

and

Esatp =2vsatpµeffp

(4.19)

Typically vsatn = 9x106 cm/s and vsatp = 8x106 cm/s.

Effective mobilities are described as

µeffn =µn0

1 +(Eeffn

E0n

)vn (4.20)

and

µeffp =µn0

1 +(Eeffp

E0n

)vp (4.21)

Table 4.1 shows values for the terms in (4.20) and (4.21), reported by

[27, 28].

Table 4.1: Typical mobility and field values for surface electrons and holes

Parameter Electron Holeµ0 (cm2/Vsec) 670 160E0 (MV/cm) 0.67 0.7

v 1.6 1.0

The effective fields, Eeffn and Eeffp are expressed as

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39

Eeffn =Vgs − Vtn

6toxn+Vtn + Vz

3toxn(4.22)

and

Eeffp =|Vgs| −

∣∣Vtp∣∣6toxp

+

∣∣Vtp∣∣+ Vz

3toxp(4.23)

where Vz = 0.2 V.

4.1.3 Gate Resistance

There is an additional polysilicon gate resistance Rg present at high fre-

quencies that affects the center frequency outside of the normal propagation

delay, td (4.2). This due to non-quasi-static (NQS) effects where there is

a finite response time of the charge in the channel with respect to the gate

bias [29]. This response time is due to the distributed channel and gate

resistances. A basic model of this is shown in Figure 4.2.

Reltd is the effective sheet resistance of the gate electrode and Rch is the

channel resistance. For this purpose Reltd will be referred to as Rsh and can

be expressed as

Rsh =Rsh1Rsh2

Rsh1 +Rsh2(4.24)

where Rsh1 is the sheet resistance of the gate polysilicon and Rsh2 is the

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40

Figure 4.2: Gate and channel resistance [28]

sheet resistance of the gate salicide.

The gate resistance Rg can be expressed as

Rg = Rsh

((dCGL

)+

(Weff

mL

))(4.25)

where dCG is the gate-to-contact distance, L is gate length, Weff is the

effective gate width of the inverter, and m is a multiplier of 3 [30].

The following treatment, applied to a differential ring oscillator, has been

presented in a MS thesis by S. Docking [31]. Here the same steps will be

applied to the single-ended ring oscillator.

The gate resistance affects the circuit at the input of the next stage through

the voltage drop across Rg onto Cin. This shifts the time that the output

voltage swing crosses the midpoint of VDD/2. The output voltage waveform

can be described as

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41

Vout(t) =VDD

2

(1 + sin

(2πft− π

(1 +

1

N

)))(4.26)

and

t0 =N + 1

2Nf(4.27)

is the time at which Vout is at mid-swing and is equivalent to VDD/2.

The voltage on Cin at mid-swing due to the drop across Rg is now

Vout(t0)− ICin(t0)Rg =

VDD2

(4.28)

The current ICin(t) is found by applying KCL at the output node accord-

ing to Figure 4.3.

ICin(t) = IRDSp

(t) + ICpara(t)− IRDSn

(t) (4.29)

where

ICpara(t) = Cpara ·

d(VDD − Vout(t))dt

(4.30)

is the current necessary to discharge Cpara.

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42

CinICinCparaICpara

IRDSp

IRDSn

Vout(t)

+−VDD

Figure 4.3: KCL on ring oscillator stage including input and parasitic capacitances

Now the terms

IRDSp(t)− IRDSn

(t) = IRDSeff(4.31)

where IRDSeffis the total current through RDSeff charging CL during a

transition and is constant. Thus it does not affect the frequency and will

be discarded. Now ICin(t) = ICpara

(t).

The derivative

d(VDD − V out(t))dt

= 2πfVDD

2cos

(2πft− π

(1 +

1

N

))(4.32)

Substituting (4.32) into (4.30) results in

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43

ICpara(t) = −Cpara2πft

VDD2cos

(2πft− π

(1 +

1

N

))(4.33)

Substituting both (4.26) and (4.33) into (4.28) gives

sin

2ft0N −N − 1

1

)+ 2πfRgCparacos

2ft0N −N − 1

1

)= 0

(4.34)

Solving (4.34) for t0 results in

t0 =πN + π − arctan(2πf ·RgCpara)N

2πfN(4.35)

and if 2πfRgCpara) << 1, arctan(2πfRgCpara) becomes 2πfRgCpara,

resulting in

t0 =πN + π − 2πf ·RgCparaN

2πfN(4.36)

which further simplifies to

t0 =N + 1

2Nf−RgCpara (4.37)

If Rg is 0, (4.37) is identical to (4.27). This is also the same result for the

differential ring oscillator in [31]. At this point in [31], (4.33) is integrated

Page 58: Design of VCOs in Deep Sub-micron Technologies

44

with (4.37) as a lower integration limit. The result is eventually

(1− ISSRgCpara

Vsw(Cin + Cpara)

(2−N

(1

2− 1

π

))+

2√

2N

π

)(4.38)

This is the gate resistance multiplier for a differential ring oscillator

which is multiplied onto the existing frequency expression (4.1). In (4.38),

notice the term ISS/Vsw where ISS tail current and Vsw is the voltage swing.

For this to be applied to the single-ended ring oscillator, ISS can be replaced

by IDS and Vsw by VDS resulting in 1/RDSeff . Now (4.38) becomes

(1− RgCpara

RDSeff(Cin + Cpara)

(2−N

(1

2− 1

π

))+

2√

2N

π

)(4.39)

where (4.39) is the gate resistance frequency multiplier for a single-ended

ring oscillator.

4.2 NMOS-only and Self-biased CMOS LCVCOs

The following analytical expressions were used in MATLAB to create a

design script for an NMOS-only LCVCO. Design variables such asCV ,Wn,

L, and VDD are inputs, and technology dependent parameters such as Cox,

µn, and µp are constants. Parameters such as center frequency and tuning

range, output voltage amplitude constraints, and stable startup condition are

used to construct a two-dimensional graphical view of the design space

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45

with CVmaxon the y-axis and Wn on the x-axis. This method is based on

concepts presented by D. Ham and A. Hajimiri in [32]. The following

sections include terms from both NMOS and PMOS devices. For the case

of designing the NMOS-only LCVCO, the PMOS terms are omitted.

4.2.1 Frequency and Tuning Range

The center frequency of the LCVCO is given by

ω =1√

LtankCtankor f =

1

2π√LtankCtank

(4.40)

The equivalent tank capacitance

Ctank = 0.5 (CNMOS + CPMOS + CL + Cv + Cload) (4.41)

where capacitances from active devices are

CNMOS = 4Cgdn + Cgsn + Cdbn (4.42)

and

CPMOS = 4Cgdp + Cgsp + Cdbp (4.43)

Upper and lower frequency limit specifications can be set such that

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46

ωmin ≥1√

LtankCtank,max(4.44)

for the lower limit, and

ωmax ≤1√

LtankCtank,min(4.45)

for the upper limit

4.2.2 Tank Amplitude Constraints

The LCVCO has two modes of operation: current-limited and voltage-

limited. In the current-limited regime the tank amplitude Vtank grows lin-

early with the bias current Ibias until it reaches the voltage-limited regime

[33]. In the voltage-limited regime the tank amplitude is limited by the

supply voltage or the point at which active devices leave saturation. The

tank amplitude constraint is determined based on the boundaries of LCVCO

operation between the current-limited and voltage-limited regime.

The minimum tank amplitude constraint is

Vtank,min =Ibias

gtank,max(4.46)

where

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47

gtank = 0.5 (gon + gop + gv + gL) (4.47)

For the case of the self-biased CMOS LCVCO, the bias current Ibias is

not an independently chosen design variable as it varies based on device

size. Instead, Ibias is calculated using the short-channel MOS model satura-

tion current equation for each width within the range of widths chosen for

the design space.

The inductor conductance is

gL =1

Rp+

Rs

ω2L2ind

(4.48)

and varactor conductance is

gv = ω2C2vRv (4.49)

So maximum tank conductance gtank,max occurs at Cv,max.

4.2.3 Startup Condition

For oscillation startup, the effective negative conductance from the active

devices gactive must be at least as large as the product of small-signal loop

gain α and effective tank conductance gtank. To ensure this is met un-

der worst-case process and temperature variations, a minimum small-signal

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48

loop gain of αmin = 3 is required. The startup condition is now

gactive ≥ αmingtank,max (4.50)

where

gactive = 0.5 (gmn + gmp) (4.51)

The expressions for tuning range (4.44) and (4.45), tank amplitude con-

straint (4.46), and startup condition (4.50) are solved for Cv,max in terms of

Wn and then plotted over a range of Wn.

4.2.4 Phase Noise

Phase noise for a cross-coupled LCVCO topology is given by [16]

L{∆f} =1

8π2f 2off

· 1

q2max

·∑n

(i2n

∆f· Γ2

rms,n

)(4.52)

where foff is the frequency offset from the center frequency and qmax is the

total charge swing of the tank.

qmax = V0Ctank (4.53)

and (4.52) becomes

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49

L{∆f} =1

8π2f 2off

· 1

V 20 C

2tank

·∑n

(i2n

∆f· Γ2

rms,n

)(4.54)

The summation of i2n∆f thermal noise terms represent the noise power

spectral density due to cross-coupled pair drain current thermal noise [30],

inductor thermal noise, and varactor thermal noise and are given as

i2M,d

∆f= 4kTγ(gd0,n + gd0,p) (4.55)

i2ind∆f

= 4kTgL (4.56)

i2var∆f

= 4kTgv,max (4.57)

The term Γrms = 1/√

2 for a sinusoid waveform. Using (4.54), (4.55),

(4.56), and (4.57), phase noise can be approximated.

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50

Chapter 5

Results and Discussion

5.1 Ring Oscillators

Figure 5.1 shows modeled frequency versus number of stages, with and

without gate resistance Rg, and simulated frequency.

Figure 5.1: Frequency versus number of stages

The model without Rg overestimates frequency by about 15%. With Rg,

the model predicts simulated frequency to within 1-2%.

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51

Figure 5.2 shows predicted phase noise from (4.14) as well as simulated

phase noise for 7, 9, 11, 13, and 15 stage varactor-tuned ring oscillators.

Figure 5.2: Predicted and simulated phase noise for 7, 9, 11, 13, and 15 stage ringoscillators

Simulated phase noise follows predicted phase noise fairly close beyond

the 1 MHz offset frequency. Within the 1 MHz offset, simulated phase

noise is worse than predicted due to flicker noise contributions not being

accounted for in (4.14).

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52

For the LDO versus no-LDO experiment, three 5 GHz ring VCO sys-

tems were designed and simulated. All simulation results were done using

models that include estimates of parasitics based on the SKILL code within

device p-cells. The first (VCO1) consists of a 7 stage LDO regulated ring

oscillator where the LDO was designed with thin oxide devices and corre-

sponding 0.85 V supply. Maximum transition current and thus power was

lower for this system due to a 0.15 V maximum headroom loss from the

output stage of the LDO, reducing maximum voltage on delay stages to 0.7

V instead of 0.85 V.

The second (VCO2) is a 15 stage LDO regulated ring oscillator that was

designed in an attempt to increase current by using medium oxide devices

capable of supporting 1.5 V VDD in the LDO. Current was substantially

higher in this system since up to 0.85 V can now be achieved on delay stages

due to the 1.5 V supply enabled on the LDO devices. Both LDO regulated

VCOs from systems 1 and 2 use the same topology from Figure 3.1. The

third (VCO3) is an 11 stage varactor-tuned ring oscillator receiving full 0.85

V supply on the delay stages.

Figure 5.3 shows the tuning range of all VCOs.

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53

Figure 5.3: Tuning range of VCOs

The tuning range of varactor-tuned VCO3 is lower than that of the LDO-

tuned VCOs, but has greater selectivity since it is over a wider voltage range.

Figure 5.4 shows power supply noise sensitivity of the LDOs used in

VCO1 and VCO2.

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54

Figure 5.4: Power supply sensitivity of LDO in VCO1 and LDO in VCO2

Power supply sensitivity of VCO2 is lower than that of VCO1. The

common-mode gain and bandwidth of the output RC filter are significant

factors in determining the supply sensitivity of the regulator. The common-

mode gain of the LDO with VCO2 is less than the LDO with VCO1 by at

least 15 dB. Also the low-pass RC filter formed by the output resistance

and decoupling capacitor of the LDO shows higher bandwidth for LDO

with VCO1 than the LDO with VCO2. Lower bandwidth of the low-pass

filter helps in the attenuation of high-frequency noise, improving the supply

sensitivity of the regulator.

Figure 5.5 shows output noise for all VCOs.

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55

Figure 5.5: Output noise versus frequency for all VCOs without PSN

Notice VCO2 and VCO3 have significantly less output noise around

the noise corner, and VCO3 has slightly less than VCO2. Flicker noise

from FET devices is inversely proportional to input capacitance, so the

higher noise of VCO1 is likely due to lower capacitance as devices are sized

smaller since they are driving less current.

Figure 5.6 shows phase noise for all VCOs with and without power

supply noise (PSN). Power supply noise is modeled as device noise reflected

back into the system at VDD. VCO1 and VCO2 have PSR due to their LDOs

regulating VDD on the delay stages; VCO3 has no LDO thus no PSR.

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56

Figure 5.6: Phase noise versus offset frequency for all VCOs with and without PSN

Phase noise for VCO1 and VCO2 is nearly the same with and without

PSN, showing the PSR qualities of the LDOs functioning as expected. Phase

noise for VCO3 with PSN is worse than without PSN, as expected. Despite

this, the phase noise of VCO3 is significantly better than VCO1 and VCO2

even with PSN.

Table 5.1 shows a summary of results for tuning range, phase noise,

average power dissipation, and active area.

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57

Table 5.1: Summary of results for ring oscillators

VCO1 VCO2 VCO3Tuning Range (%) 90% 80% 40%

Phase Noise (1 MHz) with PSN (dBc/Hz) -53.79 -57.35 -66.24Phase Noise (1 MHz) without PSN (dBc/Hz) -53.96 -57.59 -73.86

Pavg (µW) 77 1940 750Active area (µm2) 311.2 11730 28.6

5.2 LCVCOs

Figure 5.7 shows the design space for the NMOS LCVCO.

Figure 5.7: NMOS LCVCO design space

Figure 5.8 shows the design space for the CMOS LCVCO.

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58

Figure 5.8: CMOS LCVCO design space

The valid design space in Figures 5.7 and 5.8 is below the upper tuning

range limit, above the lower tuning range limit, below the tank amplitude

constraint, and below the startup condition. The designer may start by

choosing a set of values for Wn and Cv,max to fall within this area on the

graph. Stable oscillation is almost guaranteed at this point, but the design

still may not be optimized. Optimization can be achieved through sensitiv-

ity analysis with respect to the desired output specification, or by running

parametric analysis in simulation.

The following simulation results were obtained using models that include

estimates of parasitics based on the SKILL code within device p-cells. For

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59

clarity, only typical process corners are shown here; however the following

simulations done over process corners can be seen in Appendix A. Figure

5.9 shows the tuning range of both the varactor-tuned NMOS-only and self-

biased CMOS LCVCOs.

Figure 5.9: Tuning range of varactor-tuned NMOS and CMOS LCVCOs

The center frequency of the VT NMOS LCVCO is 15 GHz, while that

of the VT CMOS LCVCO is 9 GHz. The NMOS-only topology shows a

tuning range of 6%, while the CMOS topology shows a tuning range of 5%.

Figure 5.10 shows the tuning range of the both the DT NMOS and DT

CMOS LCVCOs. The bias scheme to demonstrate tuning range is done

using a 4-bit square wave voltage input where Vhigh = 0.9 V and Vlow = 0 V.

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60

The bias voltage source frequencies are such that fb3 = 2 · fb4, fb2 = 4 · fb4,

fb1 = 8 · fb4, showing all 24 = 16 combinations in a given time interval.

Figure 5.10: Tuning range of digitally-tuned NMOS and CMOS LCVCOs

The center frequency of the DT NMOS is 14.2 GHz with a 9% tuning

range. This is a 50% increase over the VT NMOS LCVCO. The center

frequency of the DT CMOS is 8.2 GHz with a 10% tuning range. This is a

100% increase over the VT CMOS LCVCO.

Figure 5.11 shows predicted phase noise for all LCVCOs.

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61

Figure 5.11: Predicted phase noise of all LCVCOs

Phase noise of both varactor-tuned CMOS and NMOS topologies is pre-

dicted to be roughly the same, around -90 dBc/Hz at 1 MHz offset. Both

digitally-tuned CMOS and NMOS topologies are predicted to have worse

phase noise due to the decrease in output voltage swing outweighing the

increase in added capacitance. The digitally-tuned topologies are predicted

to offer a significant improvement in tuning range.

Figure 5.12 shows the simulated phase noise of all LCVCOs.

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62

Figure 5.12: Simulated phase noise of all LCVCOs

The VT NMOS-only LCVCO has the lowest phase noise, with -97 dBc at

1 MHz offset from 15 GHz. The DT NMOS topology has -94 dBc at 1 MHz

offset from 14.5 GHz. The decrease in phase noise is due to a decrease in

output swing from 1.7 V to 1.5 V due to added capacitance. The VT CMOS

has -80 dBc at 1 MHz offset from 9 GHz, and DT CMOS is slightly better

at -83 dBc at 1MHz offset from 8.2 GHz. The simulated phase noise for

the self-biased CMOS topologies is slightly worse than predicted; however

simulated phase noise was improved by 3 dBc with the DT CMOS topology

over the VT CMOS topology. The decrease in voltage swing from the added

capacitance is not as significant so phase noise improves.

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63

Table 5.2 shows a summary of results for tuning range (TR), phase noise

at 1 MHz offset (PN), static DC power dissipation (PDC), figure of merit

(FOM), and tuning-range-normalized figure of merit (FOMT). FOM and

FOMT are given by

FOM = L(foff)− 20 · log(f0

foff

)+ 10 · log

(PDC

1mW

)(5.1)

FOMT = FOM − 20 · log(TR

10

)(5.2)

Table 5.2: Summary of results

NMOS NMOS DT CMOS CMOS DTfc (GHz) 15 14.2 9 8.2TR (%) 6 9 5 10

PN 1 MHz (dBc/Hz) -97 -94 -80 -83PDC (mW) 6.8 6.8 17 17

FOM (dBc/Hz) -172.20 -168.72 -146.78 -148.97FOMT (dBc/Hz) -167.76 -167.81 -140.76 -148.97

5.3 Physical Design and Test Plan

Figure 5.13 shows the physical layout of all VCOs, including all LCVCOs,

5, 7, 9, 11, 13, and 15 stage ring oscillators, and the two LDO-ring oscillator

combinations. The octagonal structures are the symmetric spiral inductors,

one for each of the four LCVCOs.

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64

Figure 5.13: Layout of all VCOs

The top level test chip layout is shown in Figure 5.14. There are addi-

tional circuits that were designed by colleagues, including current sources,

opamps, and a bandgap voltage reference circuit.

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65

Figure 5.14: Top level test chip layout

The positive and negative outputs from each LCVCO are sent through

CML buffers and a transmission-gate muxing configuration to GSSG RF

probe pads. The outputs from the LDOs and ring VCOs are sent through

tapered inverter buffers and a transmission-gate muxing configuration to

bond pads.

The LCVCOs will be tested for tuning range and phase noise using a

network analyzer probing the GSSG RF pads. The 6 varactor-tuned ring

VCOs will be tested for center frequency versus number of stages using an

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66

oscilloscope connected to the bond pads. The 3 VCOs from the LDO versus

no LDO case study will be tested for tuning range and phase noise to verify

conclusions made from simulation results.

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67

Chapter 6

Conclusions

Analytical expressions were used in MATLAB to create a frequency predic-

tion model for single-ended varactor-tuned ring oscillators based on inter-

stage capacitance and gate resistance contributions. Phase noise was pre-

dicted as well. It was found that frequency is overestimated by roughly 15%

without accounting for gate resistance. With the effects of gate resistance,

frequency can be estimated to within 1-2%. The phase noise prediction was

fairly accurate beyond the 1 MHz offset frequency. Within 1 MHz offset

frequency simulated phase noise is worse than predicted due to flicker noise

contributions not being accounted for in prediction expressions.

For the case study of LDO-tuning versus no LDO-tuning, three 5 GHz

ring VCO systems were designed and simulated in the GlobalFoundries 28

nm HPP CMOS technology: VCO1 - low current thin oxide 0.85 V LDO

regulated, VCO2 - high current medium oxide 1.5 V LDO regulated, and

VCO3 - varactor tuned with no LDO. Results are summarized in Table 5.1.

VCO2 achieves better phase noise and tuning range than VCO1 as a

result of using medium oxide devices within the LDO, enabling up to 0.85

V across the delay stages and overall higher current and power dissipation

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68

during delay stage transition. However, there is a 25X increase in power and

37X increase in area.

VCO3 outperforms VCO2 and VCO1 in phase noise and area while still

maintaining 750 µW power dissipation (lower than VCO2) and 20% tuning

range. The lower phase noise of VCO3 is due to higher current and power

dissipation during delay stage transition, as well as fewer noise sources from

not relying on an LDO for tuning and using varactors instead. In this 28 nm

technology with 0.85 V supply, and likely other advanced-scaled deep sub-

micron CMOS technologies at a similar frequency, a varactor-tuned ring

oscillator may be preferred over LDO-tuned ring oscillator. Although re-

sults were presented using only typical process conditions, corners analysis

has been done. Phase noise is not significantly affected by corners. Tuning

range is shifted but still includes the 5 GHz center frequency within the

range of Vctrl.

Four varieties of multi-GHz LCVCOs were designed and simulated in

this 28 nm CMOS technology: 15 GHz varactor-tuned NMOS-only, 9 GHz

varactor-tuned self-biased CMOS, 14.2 GHz digitally-tuned NMOS-only,

and 8.2 GHz digitally-tuned self-biased CMOS. Analytical expressions de-

scribing tuning range, tank amplitude constraint, and startup condition were

compiled in MATLAB and used to output a graphical view of the valid

design space for NMOS-only and self-biased CMOS LCVCOs. Phase noise

was predicted as well. A digital tuning method that improves tuning range,

selectivity, and in one case phase noise, was presented for both LCVCO

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69

topologies.

Simulation of all four LCVCOs was done with results summarized in

Table 5.2. The VT NMOS-only LCVCO shows best phase noise of -97

dBc/Hz at 1 MHz offset from 15 GHz, FOM of -172.20 dBc/Hz, FOMT

of -167.76 dBc/Hz, and 6% tuning range. The DT NMOS shows slightly

worse phase noise and FOM, but nearly equivalent FOMT to that the VT

NMOS due an improved tuning range of 9%. The CMOS topologies both

show lower phase noise than both NMOS varieties, but phase, tuning range,

FOM, and FOMT were improved with the DT CMOS topology over the VT

CMOS.

A test chip containing all of these circuits was designed and taped-out

for fabrication in this 28 nm technology. Testing and characterization will

take place upon delivery in June 2015.

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Appendix A

Tuning Range and Phase Noise of all LCV-COs over Process Corners

Figure A.1: Tuning Range of VT NMOS LCVCO

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Figure A.2: Phase Noise of VT NMOS LCVCO

Figure A.3: Tuning Range of DT NMOS LCVCO

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Figure A.4: Phase Noise of DT NMOS LCVCO

Figure A.5: Tuning Range of VT CMOS LCVCO

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Figure A.6: Phase Noise of VT CMOS LCVCO

Figure A.7: Tuning Range of DT CMOS LCVCO

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Figure A.8: Phase Noise of DT CMOS LCVCO