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Distributed Power Conversion - An answer to Power Delivery Challenges in SoCs? Rinkle Jain, Jim Tschanz, Vivek De October 8 2014 Circuit Research Lab, Intel Corporation Hillsboro, OR Power Supply on Chip Workshop 2014

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Distributed Power Conversion - An answer toPower Delivery Challenges in SoCs?

Rinkle Jain, Jim Tschanz, Vivek De

October 8 2014

Circuit Research Lab, Intel Corporation

Hillsboro, OR

Power Supply on Chip Workshop 2014

Acknowledgements

Vaibhav Vaidya

Stephen Kim

Seth Sanders

Krishnan Ravichandran

Chai Sutantavibul

Trang Ngyuen

Chung-ching Peng

Tri Huynh

Ken Ikeda

Carlos Tokunaga

Muhammad Khellah

Rick Forand

This research was, in part, funded by the U.S. Government (DARPA). The views and conclusions

contained in this document are those of the authors and should not be interpreted as representing

the official policies, either expressed or implied, of the U.S. Government.

2/ 24

Outline

Motivation for fully integrated VRs

Capability of Switched Capacitor Voltage Regulator (SCVR)

DVFS enabler with minimum area-power overhead

Co-design with load

Summary and Conclusion

3/ 24

Motivation for fully integrated voltage regulators

The Platform Perspective

Courtesy: S. Soman, A. Uan-zo-li; IntelPSoC 2014 Rinkle Jain 4 / 24

Motivation for fully integrated voltage regulators

The Platform Perspective

SoCs inherently require several voltage rails

Input rail consolidation simplifies power delivery significantlyPSoC 2014 Rinkle Jain 4 / 24

Motivation for fully integrated voltage regulators

The Die Side of the Story

[Burton et.al APEC ’14] [Kurd et.al ISSCC ’14]

Faster state transitions by 25%, higher performance per watt

Overall idle power slashed by 20x, battery life improvement by > 50%

Proliferation of Integrated voltage regulators in latest technology node

PSoC 2014 Rinkle Jain 5 / 24

Motivation for fully integrated voltage regulators

Finer Grain Voltage Domains0

0.2

0.4

0.6

0.8

1

1.2

1.4

1.6

1.8

0 200 400 600 800 1000 1200

Po

wer

(n

orm

)

Frequency (MHz)

Dual-Vcc with droop

Dual-Vcc with droop and Adaptive Clock

Baseline with droop

0.8

1

1.2

1.4

1.6

1.8

2

2.2

0.3 0.4 0.5 0.6 0.7 0.8 0.9

Ene

rgy

Effi

cien

cy (

no

rm)

Vcc (V)

Dual-Vcc with droop

Dual-Vcc with droop and Adaptive Clock

Baseline with droop

Figure 6. (a) FMAX recovery for different Adaptive Clock Distribution lengths.

(b) Power vs. frequency for baseline design, baseline with adaptive clocking, and dual-VCC design with adaptive clocking.

(c) Energy efficiency vs. VCC.

(a)

(b)

(c)

0.0%

2.0%

4.0%

6.0%

8.0%

10.0%

12.0%

14.0%

1 2 3 4 5 6 7 8

FMax

De

grad

atio

n

ACD Delay in Clock Cycles

90% FMAX recovery

FMAX degradation without adaptive clocking

40%

0.67V

0.38V

27%

12.4%

0.8V

[Tokunaga et.al ISSCC ’14] Measured data

Vmin reduction through many voltage domains

Necessary level shifters incorporated here with 0 area penalty

PSoC 2014 Rinkle Jain 6 / 24

Switched Capacitor Voltage Regulator Capability

Switched Capacitor VR with MIM

MIM + 3.5KB RF

MIM + 3.5KB RF

MIM + 3.5KB RF

MIM + 3.5KB RF

SCVR Control

SCVR Power Stage

Probe pads

848 um

269 um

C1 C4

C3C2

power stage

High density MIM

TEM [C.-H. Jan et.al .; IEDM 2012]

Technology 22nm Tri-gate CMOS

Passive Type High Density MIM

MIM Area 99450 µm2

Power Stage Area 3240 µm2

Control Area 420 µm2

Total Active Area 3660 µm2

Total RF Area 101376 µm2

Test Interface Membrane probe

[R. Jain et.al .; JSSC 2014]PSoC 2014 Rinkle Jain 7 / 24

Switched Capacitor Voltage Regulator Capability

Conversion Efficiency Measurements

Vout (V)

99 Ω46 Ω 13.3mW

2.8mW 5.5mW 6.83mW

6.4mW 10.4mW 13mW25mW

2:1

3:25:4

1:1Ideal LDO

Output Power (mW)

84% peak and 63% minimum efficiency

Lower peaks in other modes due to larger switch size

Flat efficiency down to << 10% rated load with PFMS10

S11

S21

S31

Vin

Vout

C1 C2

Power Cell

S41

S51

S61

S71

S81S91

[R. Jain et.al .; JSSC 2014]

PSoC 2014 Rinkle Jain 8 / 24

Switched Capacitor Voltage Regulator Capability

Motivation for Conductance ModulationVin Vo

m:n

++

--

Rout = f (Rfsl ∝ rdsond , Rssl ∝ 1

Cfsw)

Rload

Ve

Ve = Vinn/m

Rout

Averaged Model Efficiency Contours

Limitations of simple frequency modulation

Lower-than-optimal conversion efficiency at lower voltages

Increased output ripple and associated power loss at light loads

Input noise coupling. EMI/RFI due to impulsive current draw

Other knobs: 1/rdson (conductance), C (fly capacitance), d(duty)PSoC 2014 Rinkle Jain 9 / 24

Switched Capacitor Voltage Regulator Capability

Motivation for Conductance ModulationVin Vo

m:n

++

--

Rout = f (Rfsl ∝ rdsond , Rssl ∝ 1

Cfsw)

Rload

Ve

Ve = Vinn/m

Rout

Averaged Model Efficiency Contours

Limitations of simple frequency modulation

Lower-than-optimal conversion efficiency at lower voltages

Increased output ripple and associated power loss at light loads

Input noise coupling. EMI/RFI due to impulsive current draw

Other knobs: 1/rdson (conductance), C (fly capacitance), d(duty)PSoC 2014 Rinkle Jain 9 / 24

Switched Capacitor Voltage Regulator Capability

Adaptive Widths Architecture

Buffers + Level Shifters

SegmentedPower Stage

Wid

th A

sse

rt

0.2

5x

1x

2x

2x

2x

2x

En1

En2Width

Selection

VO

UT

VR

EF

CLK

Counter

Power Module (PM)

Divider

LBHC

AW Control (AWC)

LEGN

on

-o

ve

rla

pC

lockCKi

Mo

de

Lo

gic

Total transistor size implemented as 3 weighted banks (ratio 2:1:0.25)

8 way interleaving, 2GHz input cloc; 2 bits for width selection

[R. Jain et.al .; CICC 2014]PSoC 2014 Rinkle Jain 10 / 24

Switched Capacitor Voltage Regulator Capability

AW Measurements at Constant Vref

fsw < FthW = bW ′

a implies higher efficiency at W’ (W’=W/n)

fsw is a good indicator of low voltage and light load conditions

PSoC 2014 Rinkle Jain 11 / 24

Switched Capacitor Voltage Regulator Capability

AW Measurements at different Vref

Rout uniquely defines the optimal width

PSoC 2014 Rinkle Jain 12 / 24

Switched Capacitor Voltage Regulator Capability

AW control law: Measurements

200 400 600 0 200 400 600 800-3

-2

-1

0

1

2

3

0 50 100 150 200-3

-2

-1

0

1

2

3

50 100 150-5

-4

-3

-2

-1

0

1

2

3

4

5

0 100 200 300-5

-4

-3

-2

-1

0

1

2

3

4

5

Target

0 200 400 600-5

-4

-3

-2

-1

0

1

2

3

4

5

3:25:42:1

Target

W3-W4

transition

5 dies

25°C-70°C

W2-W3

transition

3:25:4 2:1

5 dies

25°C-70°C

W1-W2

transition

2:13:25:4

Target

5 dies

25°C-70°C

Automatically switching to a smaller transistor size (or width, W1>W2>W3>W4) at lighter load, when

it becomes just as efficient as larger size (efficiency difference =0) :

Measured efficiency difference at automated transition frequency Fth, different dies/temperatures

Eff

icie

ncy

ch

an

ge

at

Wid

th T

ran

siti

on

(%

)

Worst case

Error >-1%

Estimated Fth,die (MHz) Estimated Fth,die (MHz)Estimated Fth,die (MHz)

Fth for each width computed from two open loop measurements

Results show that proposed transition is effective

PSoC 2014 Rinkle Jain 13 / 24

Switched Capacitor Voltage Regulator Capability

AW Conversion Efficiency Measurements

0 5 10 15 20 2570

75

80

85Vout=0.55V, 2:1

Effic

ienc

y(%

)

Load Current (mA)

W3

W4

W2

W1

All three major loss mechanisms scale with load (more than linearly)

Nearly 15% improvement in 2:1 modePSoC 2014 Rinkle Jain 14 / 24

Switched Capacitor Voltage Regulator Capability

AW Conversion Efficiency Measurements

64

66

68

70

72

74

76

78

80

0.4 0.6 0.8 1

W3

W3

W3W3W2

W1

Vout(V)

Eff

icie

ncy

(%

)2:1 3:2 5:4 1:1

With A-W

No A-W

W1

Constant resistance load

All modes show optimal efficiency peaks

PSoC 2014 Rinkle Jain 15 / 24

Switched Capacitor Voltage Regulator Capability

Capability SummaryReference 2 3 5 This workProcess 45nm SOI 45nm 32nm SOI 22nm trigatePassives type Deep trench Gate Oxide SOI Gate Oxide MIMMaximum frequency 100MHz 30MHz 225MHz 250MHzInput Voltage 2V 1.8V 2V 1.23VOutput 0.95V/2.7mA 0.8-1V/8mA 0.4-1.1V/0.28A 0.45-1V, 88mAPower Efficiency % 90 69 81 [email protected],[email protected] time Unregulated 120-200ns Unregulated 3-5nsDroop - 250mV - ≤25mVCurrent densityA/mm2 2.3 0.050 0.73 0.88Area Overhead 13% 6x 41% 3.6%

All-digital multi-mode SCVR in 22nm tri-gate CMOS

using high-density MIM

Wide voltage range, good conversion efficiency across load

Low area overhead of 3.6%, comparison assumes 30mA, 0.1mm2 load

Fast < 5ns response times

Max VR current density of 400(880) mA/mm2 in 1:1(2:1) modes

PSoC 2014 Rinkle Jain 16 / 24

DVFS Enabler

Application

Current capability

At 1V, 2:1 mode: 1.2-1.6A/mm2 (22nm)

Atom at 2.5A/mm2, Graphics at 1.25A/mm2

Worst case di/dt: atom at 2A/ns ,Graphics at 150mA/ns

Vin=Vccmax feasible, downconversion isnot a must

Reuse power gates, hybrid solution withLDO

Minimum active power and area overhead

0.4 0.6 0.8 1Output Voltage [V]

1:1

5:43:2

2:1

3:1

Effic

ienc

y [%

]

Bypassmode

Digital LDOSCVR

100 200 300 400 500 600 7000

0.2

0.4

0.6

0.8

1

Frequency [MHz]Nor

mal

ized

Pow

er C

onsu

mpt

ion

DFS ext rail

0

0.2

0.4

0.6

0.8

1

Nor

mal

ized

Pow

er C

onsu

mpt

ion

DVFS SCVR with bypassDVFS ext railDVFS with IVR, 85% eff

PSoC 2014 Rinkle Jain 17 / 24

Distributed Implementation

Physical Design Constraints

Practical issues: Co-design with load

Graphics: large area, lower power density

lots of signals traverse x and y and x<y

Highly automated design, push button SoC Methodology (unlike core)

Shared metal resources, IR drop on weak grids

Need for distribution

One contiguous VR block ⇒ large keep-out-regions in APR

A stand-alone minimum-size VR tile desired, custom-laid out ok

VR tile should be reuse-able across loads of any size, aspect ratio

PSoC 2014 Rinkle Jain 18 / 24

Distributed Implementation

Active Ripple Control Enabling Distribution

Proposed solution

Distributed standalone tiles

Minimal interleaving

Local current mode control

Central PFM to drive all tiles

Vref

Vout

Local current mode controlLoad block

Minimumsize VR tile

PSoC 2014 Rinkle Jain 19 / 24

Distributed Implementation

Active Ripple Control Enabling Distribution

VR Tile 1 Vout

VR Tile 2 Vout

Central feedback sense Vout

Vref

load step at Tile1

PSoC 2014 Rinkle Jain 20 / 24

Distributed Implementation

Active Ripple Control Enabling Distribution

Vref

Central feedback sense

Tile 2 Vout

PSoC 2014 Rinkle Jain 20 / 24

Distributed Implementation

Active Ripple Mitigation Scheme (ARMS)

Gate voltage of select transistors controlled using diff amplifier

Ideally switch currents match load currents on a cycle by cycle basis

Objective: A frugal design that works across all conversion modes

PSoC 2014 Rinkle Jain 21 / 24

Distributed Implementation

Active Ripple Mitigation Scheme (ARMS)

Powerstage Schematic

Adaptive Gate Driver (AD)

Low ‐Bound Hysteretic Control(LBHC )

ARMS in  2:1 Operation 

VPVN

VB

AMP_OUT

MP

MN

S1

C1 C2 C3 C4VOUT

LEG

S2

S3

S4

LEG LEG LEG

VOUT

G42

G41

G81

G82

VOUT

VREF An

alo g

Mu x

Analo g

Swi tc

hAn a

logSw

i tch

G12

G11

G51

G52

ARMS Control (ARMC)

LEG

AD

AD

VOUT

VREF

CLK

D Q D Q D Q D Q

CK1 CK2 CK3 CK4

PSoC 2014 Rinkle Jain 21 / 24

Distributed Implementation

ARMS Ripple Measurements

0.020.040.060.080.10

0.45 0.55 0.65V_MIN (V)

V_PK

-PK

(V)

: ARMS ON CL: ARMS OFF: ARMS ON OL

2:1 3:2 5:4

50mV/Div. 100ns/Div.

ARMS OFF

ARMS Optimum Setting (OL)

ARM

S Sh

uttin

g Do

wn

0.70

0.75

0.80

0.850.90

0.20 0.30 0.40 0.50

PUF

V_MIN (V)

: ARMS OFF: ARMS ON OL

2:1 3:25:4

VOUT

VREF

CLK

ARMS Control

OLCL

PS_PH4

PS_PH3

PS_PH2

PS_PH1

LBHC

During OL, VREF can be tuned for optimum Condition for ARMS

0.020.040.060.080.10

0.45 0.55 0.65V_MIN (V)

V_PK

-PK

(V)

: ARMS ON CL: ARMS OFF: ARMS ON OL

50mV/Div. 100ns/Div.

ARMS OFF

ARMS Optimum Setting (OL)

ARM

S Sh

uttin

g Do

wn

0.70

0.75

0.80

0.850.90

0.20 0.30 0.40 0.50

PUF

V_MIN (V)

: ARMS OFF: ARMS ON OL

5:4

VOUT

VREF

CLK

ARMS Control

OLCL

PS_PH4

PS_PH3

PS_PH2

PS_PH1

LBHC

During OL, VREF can be tuned for optimum Condition for ARMS

3:22:1

2:1 3:2 5:40.2V

100

80

60

40

20

Vpkpk

(mV)

Vout (V)90

ARMS ON ARMS OFF

0.45 0.652:1 3:2 5:4

Load, Vout independent ripple

Minimum size VR tile

PSoC 2014 Rinkle Jain 22 / 24

Summary and Conclusion

Summary

Point-of-load VR solution for fine grain domains enable power benefits

Fast switched capacitor VRs with low area overhead demonstrated

Capacitance density and ESR dictate SCVR capability, less area with everynode

Hybrid DLDO-SCVR meets medium current density loads, no power penalty

Control techniques ensure optimal efficiency and small VR tiles

Distributed VRs desired for APR-friendly SoC integration for wide adoption

High-current-density loads may have (i) few bumps or platform limitations.(ii) high di/dt, tighter impedance requirements ⇒ step down IVR

Higher current density VR solutions for small domains are needed!

PSoC 2014 Rinkle Jain 23 / 24

Summary and Conclusion

Summary

Point-of-load VR solution for fine grain domains enable power benefits

Fast switched capacitor VRs with low area overhead demonstrated

Capacitance density and ESR dictate SCVR capability, less area with everynode

Hybrid DLDO-SCVR meets medium current density loads, no power penalty

Control techniques ensure optimal efficiency and small VR tiles

Distributed VRs desired for APR-friendly SoC integration for wide adoption

High-current-density loads may have (i) few bumps or platform limitations.(ii) high di/dt, tighter impedance requirements ⇒ step down IVR

Higher current density VR solutions for small domains are needed!

PSoC 2014 Rinkle Jain 23 / 24

Summary and Conclusion

Summary

Point-of-load VR solution for fine grain domains enable power benefits

Fast switched capacitor VRs with low area overhead demonstrated

Capacitance density and ESR dictate SCVR capability, less area with everynode

Hybrid DLDO-SCVR meets medium current density loads, no power penalty

Control techniques ensure optimal efficiency and small VR tiles

Distributed VRs desired for APR-friendly SoC integration for wide adoption

High-current-density loads may have (i) few bumps or platform limitations.(ii) high di/dt, tighter impedance requirements ⇒ step down IVR

Higher current density VR solutions for small domains are needed!

PSoC 2014 Rinkle Jain 23 / 24

Summary and Conclusion

Summary

Point-of-load VR solution for fine grain domains enable power benefits

Fast switched capacitor VRs with low area overhead demonstrated

Capacitance density and ESR dictate SCVR capability, less area with everynode

Hybrid DLDO-SCVR meets medium current density loads, no power penalty

Control techniques ensure optimal efficiency and small VR tiles

Distributed VRs desired for APR-friendly SoC integration for wide adoption

High-current-density loads may have (i) few bumps or platform limitations.(ii) high di/dt, tighter impedance requirements ⇒ step down IVR

Higher current density VR solutions for small domains are needed!

PSoC 2014 Rinkle Jain 23 / 24

Summary and Conclusion

Summary

Point-of-load VR solution for fine grain domains enable power benefits

Fast switched capacitor VRs with low area overhead demonstrated

Capacitance density and ESR dictate SCVR capability, less area with everynode

Hybrid DLDO-SCVR meets medium current density loads, no power penalty

Control techniques ensure optimal efficiency and small VR tiles

Distributed VRs desired for APR-friendly SoC integration for wide adoption

High-current-density loads may have (i) few bumps or platform limitations.(ii) high di/dt, tighter impedance requirements ⇒ step down IVR

Higher current density VR solutions for small domains are needed!

PSoC 2014 Rinkle Jain 23 / 24

Summary and Conclusion

Summary

Point-of-load VR solution for fine grain domains enable power benefits

Fast switched capacitor VRs with low area overhead demonstrated

Capacitance density and ESR dictate SCVR capability, less area with everynode

Hybrid DLDO-SCVR meets medium current density loads, no power penalty

Control techniques ensure optimal efficiency and small VR tiles

Distributed VRs desired for APR-friendly SoC integration for wide adoption

High-current-density loads may have (i) few bumps or platform limitations.(ii) high di/dt, tighter impedance requirements ⇒ step down IVR

Higher current density VR solutions for small domains are needed!

PSoC 2014 Rinkle Jain 23 / 24

Summary and Conclusion

Summary

Point-of-load VR solution for fine grain domains enable power benefits

Fast switched capacitor VRs with low area overhead demonstrated

Capacitance density and ESR dictate SCVR capability, less area with everynode

Hybrid DLDO-SCVR meets medium current density loads, no power penalty

Control techniques ensure optimal efficiency and small VR tiles

Distributed VRs desired for APR-friendly SoC integration for wide adoption

High-current-density loads may have (i) few bumps or platform limitations.(ii) high di/dt, tighter impedance requirements ⇒ step down IVR

Higher current density VR solutions for small domains are needed!

PSoC 2014 Rinkle Jain 23 / 24

Summary and Conclusion

Summary

Point-of-load VR solution for fine grain domains enable power benefits

Fast switched capacitor VRs with low area overhead demonstrated

Capacitance density and ESR dictate SCVR capability, less area with everynode

Hybrid DLDO-SCVR meets medium current density loads, no power penalty

Control techniques ensure optimal efficiency and small VR tiles

Distributed VRs desired for APR-friendly SoC integration for wide adoption

High-current-density loads may have (i) few bumps or platform limitations.(ii) high di/dt, tighter impedance requirements ⇒ step down IVR

Higher current density VR solutions for small domains are needed!

PSoC 2014 Rinkle Jain 23 / 24

Thank you for your attention!

PSoC 2014 Rinkle Jain 24 / 24