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ENTEGRIS PROPRIETARY AND CONFIDENTIAL
10/04/15
Chris Newman Global Product Manager – Lithography Products – ME Div
Entegris Pellicle Capable EUV Pod
CONFIDENTIAL | 2
EUV Pods (Top Side Of EIP Base Plate)
Standard “A” Type EIP Base Plate Pellicle Capable EIP Base Plate
Base plate top side differences: 1. Pellicle pocket depth 2. Height of RPAS/2DBC
windows
CONFIDENTIAL | 3
Pellicle Pocket (Top Side Of Inner Pod)
Pellicle pocket is the same depth
as reticle access pockets (3.3mm)
CONFIDENTIAL | 4
Pellicle Pocket (Bottom Side Of Inner Pod)
2D Bar Code pocket is larger and uses
the same glass as the RPAS window.
New glass retainer
clip is required due
to depth of pellicle
Clip is retained in an
undercut feature
CONFIDENTIAL | 5
Pellicle Capable Pod Test Summary
All tests passed the ASML specifications for pellicle capable pods
Test Test Result
Inspection Mechanical measurement Pass
Visual inspection Pass
Functional Sensor target reflectivity Pass
Full system cycle test Pass
Particle Adder Measurements
RH transfer path test Pass
In-system habitat test (venting) Pass
Outgassing EIP outgas test Pass
Shipping 8-leg shipping test Pass
CONFIDENTIAL | 6
Summary
The Entegris pellicle capable EUV pod is qualified for use with pelliclized reticles in the ASML NXE-3100 and 3300 scanners
Entegris®, the Entegris Rings Design® and Creating a Material AdvantageSM are trademarks of Entegris, Inc. ©2013 Entegris, Inc. All rights reserved.