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INF 5460Electronic noise – estimates and countermeasures
Lecture no 9 (Mot 6)
Noise in field effect transistors
Two types of field effect transistors: • MOSFET: Capacitive control of the channel • JFET: Variation of the width of a reversed biased depletion zone that determines the width of the channel. GaAs FETs have a similar behaviour.
INF5460 Noise in field effect transistors 2
MOS and JFET
FET (Field Effect Transistor) implies that a channel is created/throttled as a result of the voltage of a control terminal. There are essentially two ways to do this:
• MOS: The gate sets up a field that creates a channel on the other side of an insulator
• JFET (Junction FET): The voltage on the gate controls the width of the depletion zone which opens/closes the channel. JFETs are available in two variants
– Discrete components: the gate lie on both sides of the channel.
– ASIC: the gate is on one side while it is an insulator on the other side of the channel.
INF5460 Noise in field effect transistors 3
Noise Mechanisms
The figure shows a simple FET-model extended with noise models.
Elements of a typical model: Cgs, Cgd: Capacitance between gate and source and between gate and drain. gmVgs: Current between source and drain. RDS: Resistance in the channel between drain and source.
INF5460 Noise in field effect transistors 4
Noise models: Gate:
• Shot-Noise in leakage current through the gate (especially JFET and newer small linewidth CMOS) and
• thermal fluctuations from the drain node, which affects the gate node
Drain:
• Ind: Thermal excitations in the channel.
• If: Flicker noise in the channel
The gate and Ind thermal noises are both due to thermal noise in the channel and they are partially correlated at higher frequencies.
INF5460 Noise in field effect transistors 5
En-In representation of noise
The figure show the typical trends for En and In in a FET. En is flat at high frequencies but grows at lower frequencies due to flicker noise. In is flat at low frequencies but grows linearly with frequency above a corner frequency.
INF5460 Noise in field effect transistors 6
En: The constant, frequency independent contribution of En at high frequencies is due to thermal noise in the channel. This thermal noise in the channel can be modelled by a serial resistance at the input with size:
Its noise voltage is calculated in the usual way:
To minimize noise in region 2 gm should be large.
In: When it comes to the In-noise at low frequencies (region 3) this is due to shot-noise in the dc-reverse current in JFETs and shot-noise leakage currents in the MOSFET. This noise is "white" and has usually no 1/f-component.
The rise in region four is due to the real part of the input admittance.
m
ng
R3
2
nn kTRE 4
GSSn qII 2
INF5460 Noise in field effect transistors 7
Modified model for slightly higher frequenciesWe will now study the effect of the feedback caused by Cgd first ignoring the noise.
We now also includes Cds. External loads are represented by a resistance and a capacitance. Total resistive load RL is now in parallel with the value of the internal resistance rds and the external RD. Total capacitive load CL is the parallel value of the internal capacitance Cds
and the external CD. INF5460 Noise in field effect transistors 8
The effect of the feedback capacitor Cgd can be made visible by use of a Miller theorem.
With a voltage gain Av the feedback element Z can be divided into two impedances Z1 and Z2 given by the following expression:
and
vA
ZZ
1
1
vA
ZZ
112
INF5460 Noise in field effect transistors 9
With the elements of the MOSFET we get:
where ZL is determined by
The feedback element Z is given by
We want to analyse the input and insert in the expression of the Z1, so that we get:
The admittance is the inverse of Z1 and we get:
[We have multiplied by (1-jRLCL) in the numerator and denominator]
Lm
gs
Lgsm
gs
dsv Zg
v
Zvg
v
vA
LLL CjRZ 1||
gdCjZ 1
LmgdgdLL
LL
RgCjCCR
CRjZ
1
121
222
22222
11
11
LL
LLLmgdLLLmgdgdLL
CR
CRRgCjCRRgCCCRY
INF5460 Noise in field effect transistors 10
The real part of Y1 is:
The real part represent a resistance. (In our case Z1 will be between the gate and source.)
Normally ²RL²CL² ≪1 so that the expression can be simplified to
The imaginary part of Y1 is:
This means that we also have an equivalent capacitance between gate and source which is:
.
222
22
11
ReLL
LgdLm
CR
CCRgY
LgdLm
LLeq
CCRg
CR
YR
22
222
1
1
Re
1
LgdLm
eqCCRg
R22
1
222
222
11
1Im
LL
gdLLLmgd
CR
CCRRgCjY
222
222
1
1
LL
gdLLLmgdeq
CR
CCRRgCC
INF5460 Noise in field effect transistors 11
Also this expression can be simplified because ²RL²CL² ≪1 to:
Let us look a little more on the expression we found for the equivalent resistance:
We see that this resistance decreases with the square of the frequency. This resistance will have an effective noise current √(4kT/Req). This gives the rise in In at higher frequencies as it is illustrated in the figure presented earlier.
The noise elements En and In are correlated at higher frequencies since they both have a significant contribution from the same source: Thermal noise in the channel resistance. This means that the noise is somewhat greater and we must include an additional correlation element.
2221 gdLLLmgdeq CCRRgCC
LgdLm
eqCCRg
R22
1
INF5460 Noise in field effect transistors 12
Example: Calculation of input conductanceGoal: Find the input impedance Gi and noise current In for a FET where: gm = 500S , Cgd= 1pF, CL = 3pF and RL = 200k
We use the term for "Re Y" as we did previously and can plot the curve, as shown on the right:
The noise current In can be calculated as √(4kTGi) and is shown in the plot to the left:
INF5460 Noise in field effect transistors 13
Simple FET model
First, we ignore the noise and consider a standard MOSFET.
The transistor can be in cut-off, linear region or in saturation. In the linear region the current Ids has a strong dependence on Vds, while in saturation the dependence is weaker. The linear range is often named the resistive or ohmic region.
INF5460 Noise in field effect transistors 14
In saturation Ids can be expressed as follows:
Here modulates the dependence on the channel length, VT is the threshold voltage, W is the channel width, while L is the channel length. The transconductance value KP can be expressed as:
Here is 0 the mobility of the channel and Cox the capacitance over the gate oxide.
Some examples of sizes from the book:N-channel p-channel Denomination
KP 41.8 15.5 A/V²
VT 0.79 -0.93 V
0.01 0.01 1/V
DSTGSpD VVVL
WKI
1
2
20 ox
p
CK
INF5460 Noise in field effect transistors 15
Key parameters are transconductance ...
.. and output conductance ...
TGS
DDSTGSp
poQGS
Dm
VV
IVVV
L
WK
V
Ig
212
int
DDSTGSp
poQdsDS
Dds IVVV
L
WK
rV
Ig
11 2
int
INF5460 Noise in field effect transistors 16
The capacitances Cgd and Cgs. These capacitances will vary depending on the region:
Cox may be defined as:
... and stated i fF/um ²
Region
Cut-off Linear Saturation
Cgd COXWLD COXWLD + (1/2) WLCOX COXWLD
Cgs COXWLD COXWLD + (1/2) WLCOX COXWLD + (2/3) WLCOX
ox
SiO
oxt
C 20
INF5460 Noise in field effect transistors 17
Example: Find ID, gm and gds
N-MOSFET with W/L = 50, VGS = 1V and VDS = 5V. Use additional values from the table.
First, we check whether it is conducting and in saturation? VDS (= 5V) VGS-VT (= 1-0.79 = 0.21V)Yes, it is in saturation!
Then we calculate the current in accordance with the equation for the IDS.
Then we find gm and gds:
MSgr dsds 029.1972.011
SAVIg Dds 972.02.9701.0 1
SVAVVA
VVVLWKg DSTGSpm
92692605.121.050/8.412
01.012
2
AVVAID 2.9705.179.01508.41 222
INF5460 Noise in field effect transistors 18
Calculation of noise in a MOSFETAs previously mentioned we have three noise sources in our noise model: Ing, Ind and If. Ing:Ing is mainly shot noise and can be modulated with:
The increase in In at high frequencies is due to the Miller coupling through the Cgd of noise in the channel.
Ind:Ind is the thermal noise in the channel. In parallel with drain-source it is:
(This is the same noise that we would have had if we had a parallel resistance in the channel with a size of:)
If: The Flicker noise is also between the source and drain:
dcng qII 22
3
82 mnd
kTgI
m
DRAINg
R2
3
2
2
effox
ADQF
fLfC
IKI
F
INF5460 Noise in field effect transistors 19
The noise current at the output from the two dominating sources is:
To find the equivalent noise at the input we first have to find the gain of the transistor. In this case we have current at the output and voltage at the input:
We get the equivalent noise at the input by dividing the noise on the output by the gain:
We insert for Ind and If:
(AF1, L Leff, (1 -VDS 1)1)
(The first clause corresponds to the noise voltage from a transistor with size:)
222fndno III
m
signalgs
signald
tr gv
iK
)(
)(
2
2
2
222
m
f
m
ndnni
g
I
g
IEE
effoxp
F
m
nniWLfCK
K
g
kTEE
23
822
m
ng
R3
2
INF5460 Noise in field effect transistors 20
Ind in short length devicesWe learnt in the previous that the thermal noise in the channels could be expressed as:
However in newer technologies with smaller transistor lengths it is a little more complicated and more correct will be:
where is 2/3 for long L and increasing for short L. An example measurement shows =2.5 for L=0.25µm.
When Vds=0 the expression is
where for short L and for long L in saturation.
Ref: Razavi Design of Analog CMOS Integrated Circuits
mnd kTgI 82
mnd gkTI 42
dsnd gkTI 42
onds Rg 1 mds gg
INF5460 Noise in field effect transistors 21
Example: Find EniUse the same transistor that we considered previously. In addition:
• Leakage current IDC: 100fA,
• Cox = 0.7fF/m², f = 1Hz, fc = 1kHz,
• KF = 3.6x10-30 C²/Vs, AF=1 and
Solution: First we find the shot-noise at the input:
Then we find the thermal noise in the channel:
(Equivalent resistance for this noise is: )
mmmLLL deltadrawneff 235.3365.02.13
HzAqII dcng /102.31010602.122 23213192 2/1/18.0 HzfAIng
HzAkTg
I mnd /1088.93/10926106.12
3
8 2246202
2/1/14.3 HzpAInd
kg
Rm
DRAIN 62.1109262
3
2
36
INF5460 Noise in field effect transistors 22
Flicker noise calculated:
Total noise in the drain-source channel is:
Then we find the equivalent input noise that this represents:
2/1
223
215
6302
2
2
/9.6
/1077.4235.3107.01000
102.97106.3
HzpAI
HzAI
LfC
IKI
f
f
effox
ADQF
f
F
2/1
2232
223242
222
/59.7
/1076.5
/1077.41088.9
HzpAI
HzAI
HzAI
III
no
no
no
fndno
2/1
217
26
232
/19.8
/1071.610926
1076.5
HznVE
HzVE
ni
ni
INF5460 Noise in field effect transistors 23
Some comments:
• The flicker noise is dominant at 1kHz
• (The proportion of Eni² due to Ind is equivalent to placing a resistance on the gate (in series) with size:)
How to achieve low noise? Let us study the equation we found for the equivalent input noise:
We should have a large gm which means that we should have a large W/L ratio and a high idle current. Creating large transistor will also reduce the flicker noise and, thus, reduce the corner frequency (i.e. the frequency where the flicker noise is the same size as other noise sources.)
720109263
2
3
26
m
ng
R
22
23
8n
effoxp
F
m
ni EWLfCK
K
g
kTE
INF5460 Noise in field effect transistors 24
Example: Determine the corner frequencyAt the corner frequency the two contributions are equal:
Inserted we get:
Substituted values result in:
22ndf EE
28
3
effoxm
ADQF
cLCkTg
IKf
F
kHzfc 83.4
INF5460 Noise in field effect transistors 25
MOS noise sources• Flicker noise in channel
• Thermal noise in channel
• Shot-noise in leakage channel-gate
• Coupled thermal noise at gate
• Thermal noise in gate
• Thermal noise in bulk
• Thermal noise in source
• Thermal noise in drain
• Shot-noise drain-bulk
• Shot-noise source-bulk
• (Coupling noise to bulk)INF5460 Noise in bipolar transistors 26
CMOS switch charge injection• A conducting CMOS
transistor keeps some charge in the channel
• When turned off this charge is released through the source/drain and generates an (unpredictable) voltage change
• A proposal is to add a pair of half-sized “opposite” dummy transistors. However this solution requires impedance symmetry.
CMOS switch charge injection
• The injected charge is a function of transistor size and voltage level
• Small transistor gives slow response but small step.
• Large transistors gives fast response but large step.
• Parallel, different sized transistors with different pulse termination times may give both fast response and minimum step.
CMOS switch charge injection• Sharp input pulse at 0ns, all switches closed (conducting)
• S2 (large) opens at 1ns
• S1 (medium) opens at 1.5ns
• S0 (small) opens at 2ns
• OUT0 : S0
• OUT2 : S2
• OUT012: S0+S1+S2
Observations:
• Generated voltage step depends on signal level
• OUT0: Slow but minimum step
• OUT2: Fast but large step
• OUT012: Fast and minimum step
INF5460 Noise in bipolar transistors 29
Sampler with switch charge cancelation• A differential sampler with
same sized switches on both inputs may almost eliminate the influence by the charge injection.
• At sampling both transistors have the same potential and generates similar charge on both inputs.
Sampler with injection compensation
• OUTsimp: standard
• OUTmod: with charge injection compensation
• The inputs experience a very equal step resulting in a stable output
INF5460 Noise in bipolar transistors 31
Correlated double sampling• Photo diodes
(CMOS pixel cells) consist of a reversed biased diode operating as a capacitor.
• A switched reset potential is placed on the sensor node. Accumulated electrons generated from light photons reduces the sensor node potential.
INF5460 Noise in field effect transistors 32
Correlated double sampling
Due to charge injection and thermal noise the sensor node will be resat to unpredictable levels. With correlated double sampling
the value is measured both immediately after reset and before next reset. The difference is used.
INF5460 Noise in field effect transistors 33