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Method of collecting pure vibrational absorption spectra of amorphousthin ®lms
Tong Lia, Jerzy Kanickia,*, Carol Mohlerb
aCenter for Display Technology and Manufacturing, Department of Electrical Engineering and Computer Science, The University of Michigan, 2360 Bonisteel
Blvd., Ann Arbor, MI 48105, USAbDow Chemical Company, Midland, MI 48641, USA
Received 5 June 1998; received in revised form 14 February 1999; accepted 15 February 1999
Abstract
We have presented a practical method to collect vibrational absorption spectra of hydrogenated amorphous thin ®lms free of interference
fringes and free of absorption deviation induced by interfacial re¯ection. The experimental setup description and theoretical explanation
given in this paper have provided adequate information for spectrum collection. Based on the same setup, we have also demonstrated that a
vibrational absorption spectrum free of shape distortion can be obtained by using a regular light source. Through the comparison between
proposed and conventional methods, we have shown that a pure vibrational absorption spectrum is the most reliable spectrum for absolute
thin ®lm microstructure assessment, while a shape-undistorted spectrum is reliable for relative thin ®lm microstructure assessment. q 1999
Elsevier Science S.A. All rights reserved.
Keywords: Fourier transform infrared spectroscopy; Optical properties; Silicon; Silicon nitride
1. Introduction
Microstructure of thin solid ®lms is normally character-
ized by its vibrational absorption spectrum obtained by
Fourier transform infrared spectroscopy (FTIR) [1]. Various
structural parameters such as bond absorption strength coef-
®cients, or oscillation proportional constants, stoichiometry,
hydrogen content (H-content), etc., are derived from
conventional spectra, which are widely used in material
quality assessment [2,3]. However, the conventional vibra-
tional absorption spectra collected at normal beam inci-
dence contain interference fringes [4,5]. So, many
different measures have to be taken to eliminate the
fringe-caused deviation from the as-measured spectra.
Among a variety of measures, three methods appear to be
the most popular. The ®rst method involves subtracting a
mathematically generated fringe pattern from the measured
spectrum [6]. The second utilizes a wedged double-side
polished silicon (Si) wafer as the substrate [2]. The third
is to deposit a very thin layer ( , 1000 AÊ ) so that the fringe
spacing is large enough that the baseline looks like a straight
line [3]. Although these measures do reduce the interference
induced deviation to some extent, they have very limited
capability to completely eliminate the fringes from the spec-
trum. For example, since fringe patterns can never be
perfectly matched due to the difference between theoretical
and measured patterns [7,8], the subtraction of the interfer-
ence fringes from the absorption spectrum can hardly yield a
reliable result. Thus, a practical and reliable measurement
method is very much desired if a quantitative determination
of the ®lm microstructure is needed.
In fact, method to avoid the interference deviation has
been developed for quite a while in spectroscopy in general
[9]. However, similar method has not been adopted in this
speci®c area somehow. This paper describes the method of
collecting a vibrational absorption spectrum free of inter-
ference fringes. In particular, by utilizing Brewster's law
[10] we can eliminate the re¯ection from a certain interface
at certain light incident orientation. Comparison with a
conventionally recorded spectrum indicates that the
proposed method is the only existing method that allows
the collection of a pure vibrational absorption spectrum
without interference fringes induced absorption deviation.
2. Experimental
The hydrogenated amorphous silicon (a-Si:H) and hydro-
Thin Solid Films 349 (1999) 283±288
0040-6090/99/$ - see front matter q 1999 Elsevier Science S.A. All rights reserved.
PII: S0040-6090(99)00193-5
genated amorphous silicon nitride (a-SiNx:H) thin-®lms
were deposited on double-side polished crystalline Si wafers
in a plasma-enhanced chemical vapor deposition (PECVD)
system using standard RF excitation with the power of 25
and 100 W, respectively. During the process, the Si
substrate temperature was set at 2508C, process chamber
pressure was kept at 0.43 Torr, and gas ¯ow rates were 50
sccm (silane) for a-Si:H, 18 (silane) and 200 sccm (ammo-
nia) for a-SiNx:H. The ®lms' thickness was measured using
a Dektak surface pro®ler after step etching. It should be
pointed out that the a-Si:H thin ®lm used in this study was
intentionally prepared with a high concentration of SiH2
bonds to illustrate the difference between baseline corrected
and fringe-free spectra.
The refractive index ®lm was deduced from IR spectrum
by observing a straight baseline at Brewster angle using p-
polarized light (see subsequent sections). Likewise, the Si
wafer's refractive index was deduced by observing maxi-
mum gain using Bio-Rad FTS-40 Fourier transform infrared
spectrometer at Brewster angle with p-polarized light,
because a complete energy transmission can be realized at
this point. The absorption coef®cients of the absorption
peaks were measured at Brewster angle condition (see
subsequent section for details), and the extinction coef®-
cients were calculated from
k � a
4pv�1�
[8,11] where a is the absorption coef®cient and v is the
wavenumber. The measured refractive indices of Si
substrate and ®lms (a-SiNx:H and a-Si:H), and absorption
as well as extinction coef®cients of the ®lms are tabulated in
Tables 1 and 2 for a-SiNx:H and a-Si:H, respectively.
The IR spectra were recorded at room temperature using a
Bio-Rad FTS-40 Fourier transform infrared spectrometer
and analyzed using Bio-Rad Win-IR software. The spectra
having a spectral resolution of 8 cm21 were the average of
64 scans. The aperture of the probe beam was set at 2 cm21
and detector gain ampli®cation was set at unity. A Pike
ZnSe Wire Grid linear polarizer was used to produce a p-
polarized probe beam and a Harrick Brewster's angle
sample holder was used to adjust the beam's incident
angle. An unit assembly was made in our laboratory to
accommodate polarizer and sample holder, in which the
polarizer is positioned at the central spot of the probe
beam, and can be easily slid in or out according to the
experimental requirements.
3. Method of collecting a pure vibrational absorptionspectrum
3.1. Theoretical fundamentals
3.1.1. The Brewster angle
When a beam of light passes through a thin ®lm with the
thickness comparable to the light wavelength, a pattern of
interference fringes can normally be observed due to
constructive and destructive interference of the re¯ected
and transmitted light components from various interfaces
[10]. These fringes are the superposition between fringes
of p- (electrical ®eld vibrating within the plane parallel to
the incident plane) and s-polarized (electrical ®eld vibrating
perpendicular to incident plane) light beams, since an unpo-
larized light beam can be viewed as a sum of a p- and s-
polarized waves. The re¯ectances of p- (Rp) and s- (Rs)
polarized waves at the interfaces strongly depend on the
T. Li et al. / Thin Solid Films 349 (1999) 283±288284
Table 1
Measured refractive indices, extinction coef®cients, and optical absorption coef®cients for various modes of a-SiNx:H, and refractive indices of Si substrate at
corresponding wavenumber
v (cm21) 800 Si-N(as)a 1200 N-H(b) 1547 N-H2(b) 2160 Si-H(s) 3346 N-H(s)
ns 3.84 3.86 3.87 3.89 4.01
nf 1.91 1.90 1.89 1.88 1.82
kf 0.868 0.171 1:642 £ 1022 7:033 £ 1023 3:667 £ 1022
a (cm21) 8.724 £ 103 2:574 £ 103 3:193 £ 102 1:909 £ 102 1:542 £ 103
a The bracketed scripts of as, s, and b stand for asymmetric stretching, stretching, and bending modes, respectively. For Si-N(as) and N-H(b) modes, the
optical absorption coef®cient is calculated from the conventional measurement using Newton recursion method. The ®lm thickness is about 1000 AÊ .
Table 2
Measured refractive indices, extinction coef®cients, and optical absorption coef®cients for various modes of a-Si:H, and refractive indices of Si substrate at
corresponding wavenumber
v (cm21) 630 Si-H(r) etc. 845 (Si-H2)n(b)a 880 Si-H2(b) 2000 Si-H(s) 2090 Si-H2(s)
ns 3.83 3.84 3.84 3.89 3.89
nf 3.27 3.28 3.28 3.31 3.31
kf 0.15865 5:605 £ 1023 1:481 £ 1022 1:354 £ 1022 1:54 £ 1022
a (cm21) 1:256 £ 103 59.52 1:6378 £ 102 3:403 £ 102 4:0459 £ 102
a The bracketed scripts of s and b stand for stretching and bending modes, respectively. The ®lm thickness is about 9000 AÊ .
beam's incident angle and the refractive indices of the
media [10]. Of which, Rp initially decreases with the
increase of incident angle, and after it reaches minimum,
the re¯ectance starts to increase with the incident angle
rapidly [12]. The incident angle, which yields the minimum
(vanished) re¯ectance, is called Brewster angle. This angle
is determined by the indices forming the interface, and can
be expressed by [10,13]
tanuB � nr
ni
�2�
where nr and ni are the refractive indices of the refracted and
incident media, respectively.
At Brewster angle the p-polarized light is fully trans-
mitted into the second medium without any re¯ection.
Thus, the vibrational absorption spectrum collected by
using p-polarized light at Brewster angle should display
no interference fringes. Based on the refractive indices of
a-Si:H and a-SiNx:H, the calculated Brewster angles for a-
Si:H and a-SiNx:H ®lms used in this work are 738 and 628,respectively, while the variations of Rp and Rs as functions
of the light incident angle can be found elsewhere [12].
3.1.2. Dispersion and extinction coef®cient consideration
It is well known that the refractive index is wavelength or
frequency dependent. Correspondingly, Brewster angle is
only de®ned for single wavenumber or spectral range in
which the variation of the refractive index is insigni®cant.
As indicated in Tables 1 and 2, the refractive indices of
different modes for both ®lms are different. Therefore,
strictly speaking, the interference-free spectrum should be
obtained at different incident angles according to the corre-
sponding index within absorption peak region. However, for
the ®lms used in this study, the variation of the refractive
index is not signi®cant within the observed spectral range,
and it becomes negligible when the index variation is
converted to the incident angle variation. A single Brewster
incident angle can result in a straight baseline within the
illustrated spectral range in the presence of the absorption
peaks. Therefore, for illustration purpose, only a single inci-
dent angle is used in this paper. In practice, however, the
usage of single or multiple incident angles should be based
on the observation of the straight baseline of the spectrum in
the observed spectral range.
For absorbing materials, the refractive index of the ®lm is
complex, which makes the analysis of the re¯ection, espe-
cially at oblique incidence, very complicated. The extinc-
tion coef®cients at various absorption peaks will change the
interference pattern (intensity and period) at the peak more
or less according to the value of the extinction coef®cient
[11]. For most modes of both ®lms, these extinction coef®-
cients are small, and will not cause signi®cant fringe pattern
deviation from that of non-absorbing baseline. However, for
prominent peaks such as 880 cm21 of a-SiNx:H and 630
cm21 of a-Si:H, the extinction coef®cients are nontrivial
and will cause signi®cant fringe pattern deviation from
that of the baseline at incident angles other than Brewster.
Fortunately, when the incident angle approaches Brewster
angle, this deviation becomes insigni®cant, which is indi-
cated by the fact that at Brewster angle all absorption peaks
have minimum intensities (see subsequent sections). That is,
when the baseline of the absorption spectral range becomes
straight, the absorption peak has a minimum peak intensity
indicating that the interfacial re¯ection is minimized. The
details of the extinction coef®cient impact on the absorption
peak intensity, especially at normal incidence, are beyond
the scope of this paper and can be found elsewhere [8,14].
For the simplicity, the extinction coef®cients are ignored in
the calculation. Instead, the effective indices obtained from
the IR spectrum are used, and hereafter labeled as refractive
index.
As shown in Tables 1 and 2, the refractive index of Si
wafer also varies with the wavenumber, although the varia-
tion is not signi®cant in the observed spectral range. This
variation will cause the absorption intensities deviate differ-
ently at different absorption peaks at normal incident, since
the magnitude of the re¯ection at the ®lm-substrate interface
varies at different wavenumbers due to index non-unifor-
mity. However, at Brewster angle, this variation does not
affect the absorption spectrum, because the multiple re¯ec-
tion is eliminated at the ®rst interface. Hence, again, for the
simplicity, only a unique refractive index of the substrate is
used in the subsequent illustration.
3.2. Experimental setup and operation
The experimental setup used in this work is illustrated
schematically in Fig. 1. As shown, an unpolarized beam
from light source impinges on a linear polarizer with its
polarizing axis within the plane of the paper and orthogonal
to the light beam. Then the transmitted p-polarized beam
incidents on the sample with an oblique angle of uB as
illustrated in the ®gure. The ®lm absorption spectrum is
taken in two steps: ®rst, a background scan of a bare Si
wafer is recorded; and then, a sample scan of the thin ®lm
on Si wafer is taken. After normalization by the background
scan, the sample's absorption spectrum is presented. There-
fore, it is important that the background and sample scans
are made at the same incident angle (uB), since any incon-
sistency between background and sample scans will cause
improper normalization of the ®nal spectrum. Speci®cally,
T. Li et al. / Thin Solid Films 349 (1999) 283±288 285
Fig. 1. The p-polarized probe beam passing through the stack of the thin
®lm and substrate at Brewster angle incidence.
substrates set at different light incident angles have different
effective thicknesses, which will result in a spectrum
containing the information of both the ®lm and the substrate
instead of ®lm's only.
When the Brewster condition of the ®rst interface is satis-
®ed, for p-polarized wave, the interference fringes can be
avoided, since the transmitted light reaching the detector
contains no re¯ected light component. This situation is
well described schematically in Fig. 1 (left side). A p-polar-
ized light beam strikes the ®rst interface (air±®lm) and fully
transmits into the ®lm. Part of this transmitted light beam is,
then, re¯ected by the second interface (®lm±substrate). This
re¯ected light beam again is fully transmitted at the ®rst
interface (®lm±air) into the air, and no partial re¯ection
exists in this direction. Since the Brewster angle in the air
and the resulting refracted angle in the ®lm are complemen-
tary (uB 1 ur � 908) [10], the re¯ected angle within the ®lm
is also at Brewster condition1. It might be argued that if the
Brewster condition of the second interface (from ®lm to
substrate) is satis®ed, fringe-free spectrum can also be
realized. This is true mathematically, however, theoretical
analysis shows that the second Brewster condition can
hardly be met, because the external light incident angle
with respect to the second interface is normally not large
enough to reach the Brewster condition at the ®lm-substrate
interface. Furthermore, even if the ®lm refractive index is so
small (other than a-Si:H and a-SiNx:H) that the second
Brewster condition can be realized, most of the light energy
will be lost due to high re¯ection at the ®rst interface at a
very large external incident angle [12]. The spectrum
collected with this little probe energy will be very noisy,
and can hardly be reliable. Hence, the ®rst Brewster angle is
the only option in practice.
It should be noted that so far only the re¯ection within the
thin ®lm has been analyzed and no re¯ection within
substrate was considered. Since the thickness of the
substrate is usually very large in comparison with the ®lm
thickness, and is out of the spatial coherent range, it will not
cause any interference fringes in the vibrational absorption
spectrum. Therefore, the fringe's analysis was always made
with the assumption that thickness of the substrate is in®-
nite, and this assumption ®ts well with the experimental
results.
4. Results
4.1. Comparison between fringe-free and conventional
spectra
Figs. 2a and b compare the fringe-free and conventional
(with fringes) vibrational absorption spectra of a-Si:H and a-
SiNx:H thin ®lms, respectively. The distortion induced by
the interference fringes is clearly illustrated by the compar-
ison between the distorted and pure absorption spectra. In
the conventional spectrum, taking a-Si:H for example, for
the peak located at around 2000 cm21, the left shoulder of
the peak is ampli®ed while the right shoulder of the peak is
diminished. Likewise, the left and right side of the peak
located at around 630 cm21 are enhanced differently, and
the amplitude of the peak is intensi®ed signi®cantly while
the peak's position is slightly shifted towards lower wave-
number. In addition, the larger absorption peaks, in conven-
tional spectra, have a larger absolute peak intensity
enhancement. The illustrated conventional absorption spec-
trum of a-SiNx:H has a similar distortion effect. But, it
should be noted that in Fig. 2b the peak at 1040 cm21 emer-
ging from the shoulder of the asymmetric peak located at
880 cm21, and the amplitude enhancement of the peak
located at 1215 cm21 are longitudinal-like optical resonance
(LO) effect of Si-N bond. Meanwhile the signi®cantly
T. Li et al. / Thin Solid Films 349 (1999) 283±288286
1
{ tanuB � tan�908 2 ur� � 1
tanur
� nr
ni;
[ tanur � nr
ni
� tanu0B ) Brewster condition:
Fig. 2. Comparison between conventional and fringe-free vibrational
absorption spectra for (a) a-Si:H and (b) a-SiNx:H thin ®lms, respectively;
where dashed curves represent the conventional and solid curves represent
the fringe-free spectra. The fringe-free spectra were recorded with p-polar-
ized light incidence at 738 for a-Si:H and 628 for a-SiNx:H, respectively.
Inserts show the simulated baseline variation as function of ®lm's thickness,
which is indicated by various values. The baseline periods indicated in the
inserts represent spectral range of 500±3000 cm21 for a-Si:H and 500±4000
cm21 for a-SiNx:H.
reduced asymmetric peak located at 880 cm21 is a trans-
verse-like optical resonance mode (TO) of Si-N bond [15±
17]. These enhanced and reduced peak intensities are due to
the sensitivity of the longitudinal components of infrared-
active vibrations to long-range electric forces. Those
features can be easily distinguished from the interference
effect. In fact, the optical densities of longitudinal- and
transverse-like modes are always directly and inversely
proportional to the light incident angle, respectively
[15,16], while the peak shape changes induced by the inter-
ference fringes do not have a constant relation with the light
incident angle.
Apparently, the baseline of the conventional vibrational
absorption spectrum is just a pattern of the interference
fringe. As indicated in the inserts, the baseline pattern is
determined by the parameters such as ®lm thickness and
refractive index at normal light incidence. In particular,
®lm's thickness and refractive index determine the optical
path which is re¯ected by the fringe period (or spacing); and
®lm's refractive index determines the magnitude of inter-
face re¯ection, which in turn dictates the fringe amplitude.
The baseline in the case of a-Si:H (9000 AÊ ) spectrum (from
400 to 3000 cm21) is about one period of interference
fringes, while that of a-SiNx:H (1000 AÊ ) spectrum (from
400 to 4000 cm21) is less than a quarter of one period as
indicated in the inserts of Figs. 2a and b, respectively. For a
given material, the refractive index has a consistent value in
a certain spectral range and fringe has a nearly constant
amplitude, but the period varies with the ®lm thickness as
depicted graphically in the inserts. For the same kind of
®lms with different thickness, the absorption peaks could
sit at different locations of the fringe (i.e. peak or valley
of the interference fringe) according to the thickness of
the ®lm, which will result in quite different ®nal peak
shapes. Furthermore, for the most cases, the absorption
peaks of the conventional spectrum still have different
shapes (other than ideal) even after the baseline correction.
As expected, with a p-polarized light incidence at uB, a
spectrum with a straight and horizontal baseline (solid spec-
trum) can be obtained due to a minimized fringe amplitude
resulting from a vanished re¯ection at the air-®lm interface.
Moreover, for the fringe-free spectra, the absorption peak
shapes are all consistent for the same kind of ®lms with
different thicknesses, which indicates that peak shape is
thickness or fringe pattern independent. It is also noted
that all fringe-free absorption peaks have smaller intensities
than those in conventional spectrum, which is the result of
the elimination of the multiple re¯ection induced absorption
enhancement [14]. As matter of fact, at oblique incidence,
the optical path has been increased by a factor of 1=cosur,
and the absorption intensity should be increased correspond-
ingly. The fact that the absorption intensities at normal inci-
dence are larger than those at the Brewster angle incidence
is the indication that the absorption enhancement induced
by the increase of the optical path is insigni®cant comparing
to that induced by the interfacial multiple re¯ection.
4.2. Comparison between fringe-free and virtual fringe-free
spectra
A straight and horizontal baseline in the vibrational
absorption spectrum can also be realized by an unpolarized
light beam when the angle of the incident light is greater
than uB. As mentioned above, an unpolarized light beam can
be viewed as the sum of a p- and s-polarized waves. For a
given ®lm, when ui , uB, with the increase of incident
angle, the fringes caused by p- and s-polarized components
show a decreasing and an increasing amplitudes, respec-
tively, due to corresponding natures of interfacial re¯ec-
tances [12]. Meanwhile their fringe's period and curvature
direction remain the same. When ui . uB, with the increase
of the incident angle, the fringe amplitudes of both p- and s-
polarized components increase, again, due to the natures of
corresponding interfacial re¯ectances. However, the phase
or curvature direction of the p-polarized fringes is ¯ipped,
T. Li et al. / Thin Solid Films 349 (1999) 283±288 287
Fig. 3. Comparison between `virtue' fringe-free and pure vibrational
absorption spectra for (a) a-Si:H and (b) a-SiNx:H thin ®lms, respectively;
where dashed curves represent the `virtue' fringe-free spectra and solid
curves represent the pure spectra. The `virtue' fringe-free spectra were
collected with unpolarized light at 768 for a-Si:H and 688 for a-SiNx:H,
respectively. The inserts illustrate the ideal baseline summation between
p- and s-polarized components, where spectrum periods represent the spec-
tral range of 500±3000 cm21 for a-Si:H and 500±4000 cm21 for a-SiNx:H,
respectively.
while that of the s-polarized fringes remains the same. (It
should be noted that p- and s-polarized fringes always have
the same fringe period at any incident angle because of the
same optical path they experienced.) Consequently, the
summation of two fringe patterns with the same period
but opposite curvature directions will yield a pattern with
a reduced amplitude. This averaging effect could result in a
zero amplitude at a speci®c external incident angle (u v),
which is illustrated in the inserts of Figs. 3a and b for a
large and a small interference fringe period, respectively.
The spectrum collected at this speci®c angle can be labeled
as `virtual' fringe-free vibrational spectrum, since it still
contains multiple re¯ection caused deviation although it
looks as if it were a fringe-free spectrum due to the presence
of straight and horizontal baseline.
The virtual absorption spectra recorded with an unpolar-
ized light at 768 and 688 are shown in Figs. 3a and b for a-
Si:H and a-SiNx:H, respectively, in comparison with the
spectra recorded at uB with a p-polarized beam. For a-
Si:H thin ®lm, an incident angle of 768 is needed for the
p- and s-spectra to balance each other and to yield a straight
and horizontal baseline. Likewise, for a-SiNx:H thin ®lm,
the incident angle of 688 is needed for the observation of this
fringe-cancellation. Apparently, the `virtual' fringe-free
spectra are de®nitely closer to ideal spectra than the conven-
tional spectra are in terms of absorption peak shapes.
However, as illustrated in Fig. 3, the peak intensities in
the `virtual' spectra are enhanced with respect to those
observed in the ideal fringe-free spectra. In fact, the multiple
re¯ection still partially bounces the probe light within the
®lm although the fringe pattern is gone due to the cancella-
tion between p- and s-polarized patterns. The effective opti-
cal path in this case appears to be longer than its real value,
and hence, a larger absorption is observed.
It is well known that the ®lms with different stoichiome-
tries, H-contents, and doping levels will exhibit different
refractive indices, and hence, different interfacial re¯ec-
tances. Therefore, in `virtual' fringe-free spectra, the same
absorption peaks (spectral location) of different ®lms will
exhibit different peak densities. On the other hand, in real
fringe-free spectra, bond densities are well de®ned, since the
interfacial re¯ectance is removed from the spectra. Based on
an appropriate optical path normalization, an absolute
assessment of the ®lm's microstructure can be realized.
5. Conclusion
We have presented a practical method to collect the pure
vibrational absorption spectra free of the interference
fringes and the interfacial re¯ections for hydrogenated
amorphous solid thin ®lms. This method is based on the
principle that at Brewster incident angle the p-polarized
light beam experiences no re¯ection at the interface of air
and ®lm. We have also shown that an absorption spectrum
with undistorted features (shapes) can also be obtained by
using an unpolarized beam at angles greater than Brewster
angle. However, the peak intensities are enhanced in this
kind of spectrum due to existence of the interfacial multiple
re¯ection. Comparison between the conventional and the
fringe-free absorption spectra indicate that, based on the
proposed method, a very reliable absolute and relative mate-
rial's microstructure characterization can be realized.
Acknowledgements
This work was supported by AFOSR/ARPA through
Multi-disciplinary University Research Initiative (MURI)
under the contract number F49020-95-1-0524, and by the
Center for Display Technology and Manufacturing at the
University of Michigan.
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