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8/19/2019 NANENG 311 - Exp 1 - Task 1&2 - Thursday G2
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NANENG311
R ESULT SHEET #1SPRING 2016
U NIVERSITY OF SCIENCE AND
TECHNOLOGY
NANOTECHNOLOGY PROGRAM
ZEWAIL CITY
1 Deposition & Characterization of Amorphous Silicon Nitride Thin Films
Result sheet for Lab Experiment No.1
Lab date Lab group
17/3/2016 Group 2
Full name ID Section Email address
Ahmed Abubakr Ahmed 201300656 4C [email protected]
Mostafa Amer Mahmoud 201300607 4C [email protected]
Mohamed Wael Mohamed 201303444 4C [email protected]
Mohamed Hassan Zidan 201303650 4C [email protected]
Ahmed Mamdouh ELbaroudy 201305036 4C [email protected]
8/19/2019 NANENG 311 - Exp 1 - Task 1&2 - Thursday G2
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NANENG311
R ESULT SHEET #1SPRING 2016
U NIVERSITY OF SCIENCE AND
TECHNOLOGY
NANOTECHNOLOGY PROGRAM
ZEWAIL CITY
2 Deposition & Characterization of Amorphous Silicon Nitride Thin Films
I. For A-Si :
1.
Photo of the sample.
2. Measured data.
8/19/2019 NANENG 311 - Exp 1 - Task 1&2 - Thursday G2
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NANENG311
R ESULT SHEET #1SPRING 2016
U NIVERSITY OF SCIENCE AND
TECHNOLOGY
NANOTECHNOLOGY PROGRAM
ZEWAIL CITY
3 Deposition & Characterization of Amorphous Silicon Nitride Thin Films
3. Fitted data.
4. Plot of the refractive index of a-Si.
8/19/2019 NANENG 311 - Exp 1 - Task 1&2 - Thursday G2
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NANENG311
R ESULT SHEET #1SPRING 2016
U NIVERSITY OF SCIENCE AND
TECHNOLOGY
NANOTECHNOLOGY PROGRAM
ZEWAIL CITY
4 Deposition & Characterization of Amorphous Silicon Nitride Thin Films
5. Thickness of
the layer[um].
0.065377
6. Deposition
time[min].
7
7. Deposition
rate[um/min].
9.3395*10-3
II. For SixNx
1. Photo of the sample.
8/19/2019 NANENG 311 - Exp 1 - Task 1&2 - Thursday G2
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NANENG311
R ESULT SHEET #1SPRING 2016
U NIVERSITY OF SCIENCE AND
TECHNOLOGY
NANOTECHNOLOGY PROGRAM
ZEWAIL CITY
5 Deposition & Characterization of Amorphous Silicon Nitride Thin Films
2. Measured data.
3. Fitted data.
4.
8/19/2019 NANENG 311 - Exp 1 - Task 1&2 - Thursday G2
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NANENG311
R ESULT SHEET #1SPRING 2016
U NIVERSITY OF SCIENCE AND
TECHNOLOGY
NANOTECHNOLOGY PROGRAM
ZEWAIL CITY
6 Deposition & Characterization of Amorphous Silicon Nitride Thin Films
5. Plot of the refractive index of SixNx.
6. Thickness of the
layer[um].
0.01095
7. Deposition
time[min].
0.58333
7. Deposition
rate[um/min].
0.018771
