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©2012 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings are not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners.
1©2012 Micron Technology, Inc. |
A. Pirovano
Process R&D, Micron
Phase-change memories for energy-efficient data-centric IT
applications
2©2012 Micron Technology, Inc. |
Outline
▶ Memory trends and power usage
▶ Phase-change memory concept and value
propositions
▶ PCM products specifications
▶ Scaling trends
▶ Power efficency and future perspectives
3©2012 Micron Technology, Inc. |
Background
▶ Memory power consumption in systems has grown over time
▶ Social Network: > 1B users, 40% mobile access, > 3B photos/month, > 12M
videos/month
▶ CO2 emissions due to data centers are half of those due to airplanes
▶ In mid-size servers memory arrays account for 40% of power consumption;
the processor for less than 30%
▶ DRAM stand-by accounts for 35% of a Smart Phone battery life. SRAM
contributes to 15% of a cellular phone talk-time
▶ In HDD 70% of power goes to spinning and tracking. Current SSD’s consume
30% of HDD’s.
A. L. Lacaita, VLSI, 2010
4©2012 Micron Technology, Inc. |
Smartphone trend
▶ Smartphone market is in constant expansion: 350% in 7 years
5©2012 Micron Technology, Inc. |
Smartphone power usage
▶ High-end processors: memory
accounts for 20% of the total
power consumption
▶ Low power processors: memory
accounts for 70% of the total
power consumption
J. Howard, ISSCC, p. 108, 2010
6©2012 Micron Technology, Inc. |
Data center trend
▶ Data center for “cloud” systems is another explosive market: it is
predicted to expand 350% in 5 years
7©2012 Micron Technology, Inc. |
Cloud computing is changing the paradigm
▶ From compute-centric
� Bottleneck:
CPU/Memory
▶ Extrapolation to 2020:
� 5.6M of HDD
� 19’000 sq. ft.
� 25MW
R.F. Freitas, W.W. Wilcke, IBM J. Res. Dev. 52, 2008
▶ To data-centric
� Bottleneck: Storage
and I/O
▶ Extrapolation to 2020:
� 21M of HDD
� 70’000 sq. ft.
� 93MW
8©2012 Micron Technology, Inc. |
Data center power usage
▶ Cooling is becoming a big piece
of the cake with almost 50% of
the total energy spending
▶ Inside a server, HDD and
DRAM, hence memory, is
responsible for 40% of the total
9©2012 Micron Technology, Inc. |
Future in data center
▶ PCM is one of the
candidates to push
to the market the
so called Storage-
Class Memory
(SCM)R.F. Freitas, W.W. Wilcke, IBM J. Res. Dev. 52, 2008
G. W. Burr, IBM, 2010
10©2012 Micron Technology, Inc. |
NAND challenges as SCM
▶ NAND scaling is indeed increasing density
lowering costs but reliability is rapidly getting
worse
▶ Scaling is predicted to slow down with
respect to the past trend
▶ Write and read latency is predicted to
increase opening the serious question if SSDs
price/performance ratio will be competitive
with magnetic disks
L. M. Grupp et al., 2012
11©2012 Micron Technology, Inc. |
Phase Change Memory (PCM)
Page 11
▶ Storing mechanism
� Amorphous/poly-crystal phase of
chalcogenide alloy (Ge2Sb2Te5 – GST)
▶ Writing mechanism
� Current-induced Joule effect
▶ Sensing mechanism
� Resistance change of the GST
▶ Cell structure
� 1 transistor, 1 resistor (1T/1R)
Amorphous Crystalline
High resistivity Low resistivity
Amorphous Crystalline
High resistivity Low resistivity
I
V
I
V
Time
Temperature
Tx
Tm
Reset (amorphization)
Set (crystallization)
Time
Temperature
Tx
Tm
Reset (amorphization)
Set (crystallization)
12©2012 Micron Technology, Inc. |
Selectors and PCM Array Architectures
MOSFET BJT/Diode OTS
Process
Complexity
No mask overhead for
the selector
Dedicated steps for the
p-n-p junction
integration
Dedicated steps in the
BEOL
Cell Size Larger (~20F2) Smaller (~5F2) 3D cross-point (~4F2/n)
Memory Array
OrganizationConventional Innovative Ground-breaking
Application Embedded memoryHigh density/
High PerformanceVery high density
Schematic Cell
Structure
Cross-sectionn+n+
p-substrate
STI
WL
BL
GND
n+n+p-substrate
STI
WL
BL
GND
p-substraten-wellp+
BL
WL
n+
p-substraten-wellp+
BL
WL
n+
BL
WL
OUM
OTS
13©2012 Micron Technology, Inc. |
Phase Change Memory Key Attributes
Attributes PCM EEPROM NOR NAND DRAM
Non-Volatile Yes Yes Yes Yes No
Scaling sub-2x nm n.a. 3x nm 2x nm 3x nm
Granularity Small/Byte Small/Byte Large Large Small/Byte
Erase No No Yes Yes No
Software Easy Easy Moderate Hard Easy
Power ~Flash ~Flash ~Flash ~Flash High
Write Bandwidth 1- 15+
MB/s
13-30
KB/s
0.5-2
MB/s
10+
MB/s
100+
MB/s
Read Latency 50 - 100 ns 200-200 ns 70-100 ns 15 - 50 us 20 - 80 ns
Endurance 106+ 105 -106 105 104-5 Unlimited
PCM provides a new set of features combining properties of NVMs with DRAM
▶ Non Volatility
▶ Flexibility
� No Erase, Bit alterable,
Continuous Writing
▶ Lower power
consumption than RAM
▶ Fast Writes
▶ Read bandwidth and
writing throughput
▶ eXecution in Place
▶ Extended endurance
14©2012 Micron Technology, Inc. |
PCM Value Proposition
15©2012 Micron Technology, Inc. |
PCM – NOR Flash legacy
C.Villa et al., ISSCC 2010
▶ Replace NOR in embedded platforms
� PCM has an edge due to density,
scalability, and write speed
▶ 45nm PCM - 1Gb “Bonelli” specifications
� NOR Flash legacy spec + bit alterability
� Chip area: 37.5 mm2
� Power supply range: 1.7V, 2.0V
� Temperature range: -40°C, +85°C
▶ Measured performance
� Initial access speed: 85ns
� Max read throughput: 266MB/s
� Program throughput: 9MB/s
16©2012 Micron Technology, Inc. |
PCM – LPDDR2
▶ Replace (a part of) DRAM
� PCM has an edge on DRAM due to power and
scalability, but it is slower
▶ 20nm PRAM - 1Gb x 8 LPDDR2 specifications
� LPDDR2 interface
� Chip area: 59.4 mm2
� Power supply range: 1.8V, 1.2V
� Temperature range: -25°C, +85°C
▶ Measured performance
� Initial access speed: 120ns
� IO speed: 800Mb/s/pin
� Program throughput: 40MB/s (133MB/s with
external power and 256b parallel write)
Y. Choi et al., ISSCC, 2012
17©2012 Micron Technology, Inc. |
PCM Application Opportunities
PCM feature can be exploited by all the memory system, especially the ones resulting from the convergence of consumer, computer and communication electronics
▶ Wireless System to store of XiP, semi-static data and files� Bit alterability allows direct-write memory
▶ Solid State Storage Subsystem to store frequently accessed pages and elements easily managed when manipulated in place
� Caching with PCM will improve performance and reliability
▶ Computing Platforms taking advantage of non-volatility to reduce the power
� PCM offers endurance and write latency that are compelling for a number of novel solutions
S.Eilert et al., “PCM: a new memory enables new memory usage models”, IMW, 2009
18©2012 Micron Technology, Inc. |
PCMS Memory Cell Cross-Bar Architecture
Ovonic Threshold Switch, OTS, is a two-terminal switch
Metal 1Met
al 2
Row
Column
Poly
Si-Subst rate
Metal 1Met
al 2
Row
Column
Poly
Si-Subst rate
Chalcogenide materials can be used both for the memory and for the selector to
form stackable cross point PCM
• True high density cross-bar
• Possible multilayer vertical stacking
Intel-Numonyx, IEDM 2009
19©2012 Micron Technology, Inc. |
C. Lam, SRC NVM Forum 2004
Y. C. Chen et al., IEDM 2006
Ultimate Scalability of PCM principles
▶ Device functionality demonstrated on
60 nm2 active area
▶ Reset current <10uA
▶ Phase change mechanism appears
scalable to at least ~5nm
P.Wong, EPCOS 2010
20©2012 Micron Technology, Inc. |
Scaling and Program Disturb
S.H. Lee et al. VLSI, 2010
▶ Program disturb due to thermal crosstalk represents one of the main issues for PCM device scaling
� Anisotropic scaling worsen the problem
� A well-tempered engineering of the thermal conductivity of the surrounding dielectrics and in particular of interfaces keeps this problem under control
21©2012 Micron Technology, Inc. |
PCM Device Scalability
A. Redaelli et al., IRPS 2010
If an isotropic scaling
approach is adopted
▶ Programming current
decreases linearly
▶ Thermal disturb issues do not
rise
▶ Current density increases with
geometrical scaling
22©2012 Micron Technology, Inc. |
Current Density Effects in BJT Devices
▶ BJT devices fabricated at 45nm have been characterized aiming to assess the
BJT reliability after a DC stress at the current density required to program
scaled PCM at different nodes
0.0 0.5 1.0 1.5 2.0 2.5 3.0 3.50
5
10
15
20
25
3016 nm
22 nm
32 nm
45 nm
Cur
rent
Den
sity
[M
A/c
m2 ]
Applied Voltage, VEB
[V]
23©2012 Micron Technology, Inc. |
BJT Stress Results
No degradation occurs after stressing the BJT with 25 MA/cm2
DC current density for 100 s (equivalent to 109 program events)
0.0 0.5 1.0 1.5 2.0 2.5 3.0 3.50
5
10
15
20
25
30Stressing current
Before stress After stress
Applied Voltage, VEB
[V]
Cur
ren
t Den
sity
[MA
/cm
2 ]
0 1 2 3 4 510f
100f
1p
10p
After stress Before stress
Applied Voltage, VBE
[V]
Rev
erse
Cur
rent
[A]
24©2012 Micron Technology, Inc. |
PCM Cell Endurance
0 50 100 150 200105
106
107
108
109
1010
Accelerated stress
Scaling trend in operating conditions
45 nm90 nm180 nm
Cyc
le N
um
ber
[#]
Current Density [MA/cm2]
A. Redaelli et al., IRPS 2010
▶ Intrinsic endurance does not depend on the lithographic node if PCM is
programmed with its own programming current
▶ Premature failures in accelerated tests is related to the temperature reached
inside the device
25©2012 Micron Technology, Inc. |
0.01
0.1
1
10
100
1 10 100 1000 10000
Energy [pJ]
Contact area [nm2]
Reset
Set
PCM energy scaling
▶ Energy to program a bit follows the technology scaling: reducing the
cell size it is possible to reduce it from today 10pJ down to 0.1pJ
Area [nm2]
Reference
2.54 Jiale, VLSI 2011
28.26 Feng, Science 2011
127.5 I.S. Kim, VLSI 2010
400 Pirovano, ESSDERC 2007
487.5 D.H. Kim, IEDM 2008
500 W.S. Chen, IEDM 2007
707 Y. Sasago, VLSI 2006
1257 Breitwisch, VLSI 2007
1963 J.I. Lee, VLSI 2007
3000 Pellizzer, VLSI 2006
4000 Y.H. Ya, VLSI 2003
State of the art for PCM products
26©2012 Micron Technology, Inc. |
Energy-effiicient computation
200 kW 20 W
▶ Performance gap between human brain and machine computing has
been largely reduced, but...
▶ ... an impressive energy consuption gap still exists!
27©2012 Micron Technology, Inc. |
An outlook to the future – I
▶ Recently it has been shown by Tominaga group that by proper
engineering of the active material it is possible to reduce the
programming current of 20x (J. Tominaga et al. E\PCOS 2010, R.E.
Simpson et al., Nature Nanotechnology 2011)
T. Shintami et al., E\PCOS, 2011
28©2012 Micron Technology, Inc. |
An outlook to the future – II
▶ PCM can be use as energy efficient synapse in ultra-dense large scale
neuromorphic systems enabling biologically inspired low power, highly
parallel, and fault-tolerant systems
▶ 4M PCM cells
▶ 2M synapses
▶ 680s learning duration
▶ 112µW/learning
(70’000nm2 cell area)
M. Suri et al., IEDM Tech. Dig., 2011
29©2012 Micron Technology, Inc. |
Conclusions
▶ Memories are becoming growingly fundamental in
electronic systems thanks to the introduction of “memory-
centric” concept.
▶ Demand for high-density memory combined with high-
performance, energy efficient and highly reliable is
continuously increasing.
▶ PCM technology has the potential features that could
match the requests.