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Dr Alexandre Pauchard Dr Alexandre Pauchard CTO CTO Synova SA, Switzerland Synova SA, Switzerland Precision cutting and grooving Precision cutting and grooving with the Laser with the Laser MicroJet MicroJet

Precision cutting and grooving with the Laser MicroJet

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Page 1: Precision cutting and grooving with the Laser MicroJet

Dr Alexandre Pauchard Dr Alexandre Pauchard

CTOCTO

Synova SA, SwitzerlandSynova SA, Switzerland

Precision cutting and groovingPrecision cutting and grooving

with the Laser with the Laser MicroJetMicroJet

Page 2: Precision cutting and grooving with the Laser MicroJet

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Outline

� Company – Products – Markets

� Laser MicroJet principle

� Selected applications

� metal cutting

- fuel injection nozzles

- micro-springs

� wafer dicing

� laser doping of solar cells

� Conclusion

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Founded: 1997Headcount: 60 employees

Company

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Products

Laser Dicing System (LDS) Laser Grinding System (LGS)

Hybrid Laser Saw (HLS) w/ Disco Corp.

Cutting / grooving of wafers

Laser Stencil System (LSS)

Cutting of masks

Laser Cutting System (LCS)

General purpose

Manual LCP Doping Inline Doping w/ Rena Gmbh

Selective doping of solar cells

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Markets

Consumer goods

Solar Hard tooling

Automotive

MedTechSemiconductor

WatchDisplays

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� Water jet generated using small nozzles (20 – 160µm) and low water pressure (100 – 300bar). The water jet is not cutting.

� High-power pulsed laser beam focused into nozzle in water chamber

� Laser beam guided by total internal reflection to work piece

� Long working distance (>100 mm)

Laser MicroJet Principle

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Laser MicroJet Principle

Water jet guides laser � long working distance

Avantages:

Water jet expels molten material �cleaner surfaces

Water jet cools material � less HAZ

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Fuel injection nozzles

Goal:

• direct and optimize fuel flow into combustion chamber

• high pressure to atomize fuel into spray

• dimensions: 180 – 260 µm, ±±±± 2 µm• thickness 120 – 220 µm• materials: stainless steel, AISI 440C (hard, resistant to wear and corrosion)

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Fuel injection nozzles

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Cutting speed: 4 times higher with LMJ

Drilled with EDM Drilled with LMJ

Fuel injection nozzles

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� Process: cut four 310 µµµµm holes with 18° angle

� Automation: 200 nozzles / hour

Fuel injection nozzles

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Fuel injection nozzles

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Annealed stainless steel - 150µm thickness

Cutting of micro-springs

No post cleaning treatment

2.5mm

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SYSTEM Machine type LCS300

Nozzle diameter 40 µm MICROJET® PARAMETER MicroJet® diameter 36 µm

Water pressure 400 bar Assist gas He

LASER PARAMETER Laser type L101IR Wavelength 1064 nm

Peckholes Pulse frequency 1 kHz

Laser Power % 100 % Pulse width 100 µs

Lines Pulse frequency 0.5 kHz Laser Power % 75 % Pulse width 60 µs

CUTTING PARAMETER Scanning speed 1 mm/s

Number of passes 1 Time / piece 260 s Fixture clamped

Cutting of micro-springs

1. Cutting of micro-springs made of annealed stainless steel (150µm thickness)2. Process parameters:

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Cutting of micro-springs

Initial cut strategies resulted in a twisted spring. Optimization in cutting strategy allowed to eliminate built-in stress !

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� Based on Disco dual parallel spindle DFD6361

Fully Automatic Dicing Saw

� Performs loading, alignment, cutting, cleaning, drying and unloading

fully automatically

� Wafer diameter up to Ø300 mm

� Cutting speed 0.1 - 600 mm/s

Hybrid Laser Saw (HLS)

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Hybrid Laser Saw (HLS)

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Hybrid Laser Saw (HLS)

Cutting 600µm thick silicon wafer using saw followed by LMJ,

cut in sequential passes

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Dicing of thin wafers

Cutting of thin Si wafers

50 microns

200 mm/s

50 microns thick Silicon wafer

Cutting of thin GaAs wafers

100 microns thick GaAs wafer

23 microns

40 mm/s

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P type

N+ type

High doping emitter layer necessary to obtain good ohmic contact to metallization

Standard solar cells:Uniform emitter doping introduced using diffusion furnaces

Consequence: N+ emitter over entire surface

Solar cells

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Solar cells

Consequence of having N+ emitter over entire surface:

High surface recombination in blue response (photons with high absorption coefficient)

Solution: use of selective emitters

Deposit high doping layer only below metallic fingers, not between fingers

Different techniques to introduce selective emitters exist, some based on lasers

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Laser Chemical Processing

Idea from ISE*, based on Synova IP:

Start from water jet-guided laser technology; replace water by chemical jet

� Laser Chemical Processing (LCP)

* Willeke, G.P. and D. Kray, A new route towards 50 µm thin crystalline silicon wafer solar cells Proceedings of the 17th European Photovoltaic Solar Energy Conference, 2001, Munich, Germany

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Step 1

� Guide laser beam into chemical jet(H3PO4 for selective emitter)

� Laser pulse heats up surface(532nm, 1W, 10ns, 30kHz)

Step 2

� Evaporated / melted material ejected� Separation of jet from surface

LCP-doping physical model

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Step 3

� Vapor flume collapses� Jet carries away debries� Contact jet to surface reestablished

Step 4

� Carrier liquid decomposes thermally� Liquid phase diffusion of dopant

LCP-doping physical model

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LCP-doping physical model

Step 5

� Si resolidifies

Conclusion

� Self-aligned process� Perfect epitaxy if pulse not too short� Damage-free local diffusion� No need for post-process anneal

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Solar cell experiments

Laser-doped Silicon Solar Cells by Laser Chemical Processing (LCP) exceeding 20% Efficiency, D. Kray et al, 33rd PVSEC, 2008.

HM SP = hot-melt screen-print

� Strong improvement of blue response using selective emitter by LCP-doping� IQE close to 100% from 300nm to 900nm � Dip around 1000nm due to non-optimized LFC process

Efficiency gain of0.5 – 0.7% absolute

(e.g. efficiency increases from17% to 17.5%)

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Manual LCP machine

For R&D purposes

Manual loading / unloading

About 15’ per wafer

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Automated LCP machine

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Areas of application:

• local diffusion without thermal defects• structuring combined with standard metallisation techniques• structuring combined with self aligning electrolytic NiAg plating, NiCuAg plating in preparation• single process for selective emitter or local BSF forming

Machine specification:

Process: local SiN ablation and n++ type diffusionDimensions: 9500 x 3500 – 4000 x 2000 mm (length x width x height)Throughput: 1200 – 4800 wafers / hWafer thicknes: > 160µm H3PO4 consumption: 0.4 – 0.8 l/hPower consumption: 30 – 50kW

Automated LCP machine

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Conclusion

Laser MicroJet technology is a versatile and cost-effective tool for precise cutting of

• Thin metals• Semiconductors• Hard materials• Ceramics• Diamonds

Extensions of the technology, like Laser Chemical Processing (LCP), opens up a whole range of new applications. Example: laser doping for introduction of selective emitters in solar cells

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Contact

W h e r e o t h e r s s e e i m p o s s i b i l i t i e s , w e s e e s o l u t i o n s

Dr Alexandre PauchardCTO

Synova [email protected]