vii

PREFACE

This volume contains the Proceedings of the Fifth International Conference on Ion Implanta- tion Equipment and Techniques, which was held at Smugglers’ Notch in Jeffersonville,

Vermont, USA, July 23-27, 1984. A school consisting of thirteen lectures on the Science and Technology of Ion Implantation

was held on July 23 and 24. The school was organized by J.F. Ziegler of IBM-Research and was attended by almost two hundred people. The main conference was held July 25, 26 and 27 and consisted of five invited papers and eighty contributed papers. All contributed papers were presented in poster sessions and twenty-two were chosen for oral presentation. Over three hundred participants attended the main conference.

The technical program of the conference was based upon new developments in equipment and process techniques with emphasis on semiconductor applications. The program was divided into four major themes: Systems and Applications, New Equipment Developments, Associated Equipment and Quality Control.

The Systems and Applications session was keynoted by P.H. Rose’s historical review of ion implantation and was brought up-to-date by M.I. Current. A.B. Wittkower presented applica- tions of ion implantation into metals and J.F. Ziegler reviewed applications of high energy implants to create unique structures in semiconductors. The session was concluded with highlights of the Gordon Research Conference on Particle-Solid Interactions (July 9-13, 1984) and the Ion Beam Modification of Materials Conference (July 16-20, 1984) presented by W.K. Chu and S.T. Picraux.

The New Equipment Developments were divided into systems and subsystems. The systems session was technical presentations of commercial equipment and was organized by A.B. Wittkower. The sub-systems session was organized by K.G. Stephens and consisted of presenta- tions of new developments of end stations, sources and accelerators.

The Quality Control session addressed problems introduced by ion implantation such as wafer heating, charging and particulates and was organized by S.A. Diehl.

The Associated Equipment session included presentations of wafer mapping and annealing and was organized by MI. Current. Also a panel discussion, moderated by C.M. McKenna, provided a forum to discuss the future of focused ion beams.

Exhibits of ion implant related equipment were displayed each day in parallel with the Poster Sessions and were coordinated by E.W. LeClair and E.H. Bayer, respectively.

The success of the conference was due in large part to the geography of Smugglers’ Notch. The Village at Smugglers’ Notch is a selfcontained resort area surrounded by the highest peaks in the Green Mountains. An atmosphere of closeness was provided by the Village which encouraged fraternization among the attendees and inspired open discussions. It was further enchanced by the luxurious condominium rooms used for housing, food that was excellent in quality and quantity, and the free beer that was available every evening in the Smugglers’ Lounge.

We would like to express our gratitude to the many individuals and organizations who contributed to the success of the conference. First to IBM Burlington whose sponsorship and financial support made the conference possible. To the members, staff and graduate students of the University of Vermont, especially Sharon Von Bruns who published the program book and who was the chief agitator of the proceedings referees. The actual operation of the Conference was a tribute to the Conference Service Department of Smugglers’ Notch.

vlu Preface

Special thanks to conference assistant Georgette Seagle whose dedication and commitment was responsible for the efficient handling of every detail and who also organized the free Guest Program.

Finally, we want to thank the sponsors for their contributions, the school lecturers and the invited speakers for their presentations and the session organizers for planning their sessions and then keeping them on schedule.

The sixth conference in this series will be held in Berkeley, California, USA from July 28 to August 1, 1986 with a school held July 25 and 26. The conference will be co-chaired by Dr. Michael I. Current of Xerox Corporation, Dr. Nathan W. Cheung of the University of California at Berkeley and Dr. Wesley H. Weisenberger of Ion Implant Services. This con- ference will continue the trend toward greater user participation and will emphasize device yield improvement and process controls.

Bob Brown Dick Anderson

Conference Chairmen