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3authors,including:

Someoftheauthorsofthispublicationarealsoworkingontheserelatedprojects:

spontaneousmetalwhiskergrowthViewproject

MAXphasesViewproject

PeigenZhang

LouisianaStateUniversity

42PUBLICATIONS240CITATIONS

SEEPROFILE

Z.M.Sun

NationalInstituteofAdvancedIndustrialSci…

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lable at ScienceDirect

Journal of Materials Science & Technology 31 (2015) 675e698

Contents lists avai

Journal of Materials Science & Technology

journal homepage: www.jmst.org

Spontaneous Growth of Metal Whiskers on Surfaces of Solids: AReview

Peigen Zhang 1, Yamei Zhang 2, Zhengming Sun 1, 2, 3, *

1 Jiangsu Key Laboratory of Advanced Metallic Materials, School of Materials Science and Engineering, Southeast University, Nanjing 211189, China2 Jiangsu Key Laboratory of Construction Materials, School of Materials Science and Engineering, Southeast University, Nanjing 211189, China3 National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8569, Japan

a r t i c l e i n f o

Article history:Received 19 December 2014Received in revised form22 January 2015Accepted 27 January 2015Available online 24 April 2015

Key words:Metal whiskersMicroelectronics failureGrowth mechanismHealth hazardMAX phase

* Corresponding author. Prof., Ph.D.; Tel.: þ86 25 5Fax: þ86 25 52090668.

E-mail addresses: [email protected], z.m.sun@a

http://dx.doi.org/10.1016/j.jmst.2015.04.0011005-0302/Copyright © 2015, The editorial office of J

Spontaneous metal whisker growth phenomenon has been studied for ~70 years, but still resists in-terpretations, which has haunted the electronics-rich systems from the birth of the industry sincewhiskers may lead to short circuits and hence other disasters. In addition to reliability problems, threat ofPb whiskers to human health is also significant due to the toxicity of the element and its geometry aswell as its nanometer size. This issue becomes more attention drawing and urgent due to the restrictionson Pb use in EU, Japan etc., which phases out the Pb-addition practice to mitigate Sn whiskers. This paperreviews the origin of the whiskering phenomenon and whisker-induced problems, ranging from early inthe World War II to the present; details the development of this issue in the electronics-rich systemsincluding the phenomenon, problems and remedies; pictures the long history of the developments of thegrowth mechanisms and models which are full of hardship and contradictions. New aspects on thespontaneous whisker growth in some different substrates, such as in brasses and MAX phase materialsare reviewed in more details. The latter was found to be a promising system to understand the whiskergrowth phenomenon, with new growth models proposed that may shed new light to the intricate battlefield of the metal whisker research in general.Copyright © 2015, The editorial office of Journal of Materials Science & Technology. Published by Elsevier

Limited. All rights reserved.

1. Introduction

The whisker growth phenomenon generally refers to the fila-mentary growths of single crystal, on the surfaces of solids[1e12].Whiskers can spontaneously grow from pure metals, alloys, andother solids in a normal environment (room temperature/humidi-ty), and they usually are tens to hundreds of microns long andseveral to tens of microns thick, with random cross section con-tours. They are usually found on relatively thin (0.5e50 mm) metalfilms that have been deposited onto some kind of substrate mate-rial. Fig. 1 shows the typical tin whiskers on some components[13].More generally, other types of eruptions of metals from metallicdeposits have also been evidenced, such as flowers, hillocks, ex-trusions, volcanoes, etc., even though variants have not been of asmuch general interest as the much longer whiskers[7,14]. In additionto the pure metal whiskers, the PbeSn composite whiskers are also

2091086;

ist.go.jp (Z. Sun).

ournal of Materials Science & Tech

confirmed, albeit the reports on the composite whiskers arelimited[15,16].

This phenomenon was found centuries ago, and it is presentlystill under intensive research in both academic circle and industrialsectors. As far back the 16th century, Ercker watched hair sil-ver[8,17,18], but the phenomenon had not brought troubles until theadvent of the electronics industry early in the 20th century. In theearly inception of the electronics industry (tube era), tin whiskerswere noticed and documented in equipment which used pure, oralmost pure, tin solder in their production. The whiskering phe-nomenon had immediately been frequently reported and receivedhigh volume of attentions as the whisker-induced failures accu-mulated. Unfortunately, the whiskering phenomenon has beenresisting interpretation till now, and it has become a very peskyproblem giving rise to failures and troubles in many fields.

Tin whisker is probably the most frequently reported andstudied one, although the earliest report on whiskers whichbrought troubles and loss was documented as Cd whiskers[19]. Inreality, a great many metals are found to share the same whiskergrowth phenomenon, such as Cd, Sn, Bi, Zn[1,19e26], and, to a lesserextent, Ag, Au, Al, Sb, Mg, Ta, Mo, W, Fe, Ni, Pd, Pt, Pb, Au and so

nology. Published by Elsevier Limited. All rights reserved.

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Fig. 1. (A) Sn whiskers on a capacitor; (B) Sn whiskers growing on a matte tin-platedcopper leadframe[13].

P. Zhang et al. / Journal of Materials Science & Technology 31 (2015) 675e698676

on[17,27e29], and the list seems going longer. Fig. 2 shows dense zincwhiskers and super long bismuth wires, for examples. Cu whiskersare surprisingly found to belong to the list[30,31]. According to theauthors' experience, the cornucopia of the list may not stoplargening, and it is particularly true when the substrates extendbeyond metals and alloys. In other words, some new metal whis-kers appear on the substrates other than metals/alloys. For

Fig. 2. (A) Zinc whiskers on hot dip galvanized steel pipe[32], and (B) very high aspect ratio bof Bi and chrome-nitride[33].

instance, whiskers have been found onMAX phase materials, whichare a family of structurally related ternary nitrides and carbidesnewly developed in these decades. In 1999, Barsoum et al. pub-lished in science, reporting the room-temperature self-extrusion ofGa whiskers from Cr2GaN MAX phase[11].

Involved in engineering, the whiskering phenomenon inevi-tably gives rise to troubles. Since World War II, spontaneouswhisker growth has been plaguing many systems, such as on-orbitcommercial satellites, military equipment, medical equipment, in-dustrial/power systems[19,26,34e37]. A number of observations ofwhiskers, whisker-induced failures, and some whisker anecdoteswere well documented by the NASA Goddard Space Flight Cen-ter[13,38,39], and this is probably the most comprehensive docu-mentation on the metal whiskers and the related problems andchallenges. Among the metal whiskers, Pb whisker may poseproblems to human health in addition to engineering, because Pb iswell known as occupational toxin. The Pb whiskers were notidentified as a highly possible way of the Pb invasion of humanbody until 2005 when we reported the room temperature spon-taneous growth of Pb whiskers and hillocks on the surface of acommercial leaded brass which was lightly abraded[27].

To understand the mechanism(s) of the whiskering phenome-non, across more than half century of the long march, dozens ofmodels and theories have been proposed, for instance, thedislocation-based theories[3,40,41] and recrystallization theory[4,42],developed in 1950s, compressive stresses (whichmay be originatedby a number of factors, e.g. oxidation, formation of intermetalliccompounds[6,43]), surface energy effects and many others[44].However, until now, the growth mechanism(s) behind this well-established phenomenon still remains elusive. Along with the ef-forts to understand the mechanism by which whiskers grow,various remedies to mitigate the whisker-induced problems havebeen developed, and by the introduction of Pb, a “magic” element,triumphs over the whiskering phenomenonwere achieved in 1959by SnePb alloy[26,34,36,45e47]. The addition of Pb has been one of thebest andmost reliable practice to mitigate/eliminate Snwhiskers inthe electronics industry ever since. Consequently, the interest insearching the growth mechanisms and the mitigation remedieswaned. However, the lead-free movement and the legislation,especially active in Japan and the European Union, have changedthe status quo of the leaded solutions, and made the troublesomeand long time interpretation-resisting problem reappear.

For a topic, to which it has been paid attention for centuries, thesummarizing work is impossible to cover all the bases in rich

ismuth wire grown on the surfaces of freshly fabricated composite thin films consisting

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P. Zhang et al. / Journal of Materials Science & Technology 31 (2015) 675e698 677

details, and the authors from the beginning did not aim at an all-embracing review article. The authors are trying the best to mini-mize bias in this review article. Based on the authors' researchexperiences, in addition to summarizing the development of themechanism/mitigation-seeking researches, some specific aspectson the whiskering problem will be mostly elaborated, such as Pbwhiskers and their potential harms to human health, whiskeringproblems with MAX phase materials. The well-established whis-kering phenomenon with metal/alloy substrates will not be theleitmotiv of this article even though it will be included to give acomplete picture of this topic. On the other hand, it does not lackfor excellent review articles for the general metal whiskers withmetal/alloy substrates in the long march people have beenworkingon[7,23,48,49]. Basically, the road map of this review paper is as fol-lows. After a brief introduction to the whole picture of the spon-taneous growth of metal whiskers (this part), the origin of thewhiskering phenomenon and the problems associated with thewhiskers are dated back; the whiskering phenomenon, thewhisker-induced problems in microelectronics, and the mitigationstrategies are focused since this is the most concerned in the cur-rent research in this filed; themechanisms proposed by researchersare sorted out along discussions to give a picture of theinterpretation-seeking efforts; the Pb whiskers are particularlydiscussed in a separate section because of the specific potentialthreat to human health; considering the promising potential ap-plications of the newly developed MAX phase materials, the factthat it is relatively less addressed in other literature, and the sim-ilarity of the whiskering problem the MAX phase materials bearwith metals, this review gives more weight to the whisker phe-nomenon with MAX phase materials.

2. Origin of the Whiskering Phenomenon and Whisker-induced Problems

2.1. “Hair silver” found in the 16th century

The metal whiskering phenomenon had not become wellestablished until late 1940s, when the electronics industry startedand developed ahead vigorously, but its past is quite deep. As earlyas in the 16th century, Ercker recorded that it was very amusing andpretty to watch hair silver growing out of the silver objects or coinsjust as it grows in the mineral after slightly cutting or scratchingwith a knife and holding them over a gentle charcoal fire until theygot hot[17,18]. Probably, because the silver, one of seven metals uponwhich civilization was based, was deeply associated with man-kind's life in ancient time, and in the 19th century Robert Boyle alsoobserved that protuberances of silver on certain materialsincreased in length from one day to another[8]. With the develop-ment of human civilization, more metals were discovered, and theyserve people in more aspects far beyond medium of exchange asthe original role of silver and gold. Especially, after the birth ofelectronics industry, as more metals were selected to function insome systems, the tip of an iceberg of metal whisker phenomenonsurfaced.

2.2. Whisker-induced failures in World War II, the start of theproblem

During World War II, investigations on random failures ofelectrical systems led to a discovery that the random failures werefrequently attributed to shorting circuit by Cd whiskers. Back tothose days, the electroplated material for electrical componentswas cadmium (Cd), and it was found that cadmium whiskersspontaneously grew on the surfaces of electrical components. TheCd whiskers and the related failures in radio equipment during

World War II were summarized by Cobb in an article “CadmiumWhiskers”[19] in 1946, whichmany people considered to be the firstpublic publication addressing how metal whisker spontaneousgrowth affected the proper functioning of electronic systems. Soonlater, the similar random failures happened to Bell Telephone onchannel filters used for multi-channel transmission lines. To copewith Cd whisker-induced failures, Bell Labs immediately switchedto pure tin electroplating, but quickly found that the second choiceof material was not the solution, because pure tin had whiskeringphenomenon quite close to those experienced with Cd platings. In1951, Compton et al.[1] reported the findings on tin platings. At thesame time, Bell Lab realized the seriousness of the whiskeringphenomenon, and a long-term tin whisker study project wasimmediately launched, as did other research groups and organi-zations worldwide, such as ITRI (the International Tin ResearchInstitute), ESA (the European Space Agency), the L.M. EricssonTelephone Company (Sweden), among others. With more organi-zations deployed the researches on the metal whiskering phe-nomenon, the two decades of 1940 and 1950 saw the generality ofthe whiskering phenomenon with different metals, especially thelow-melting point ones. At the same time, the research activities onthis phenomenon shifted from the amusement like that in Ercker'srecord to the mechanism-seeking and engineering solution-developing activities.

2.3. Instances of whisker-induced problems

The problems raised by metal whiskers have infested almostevery field where metals which are prone to growing whiskers areused, and have run the gamut of devices and manufacturers.Electrical shorts caused by growth of these tiny whiskers haveknocked out guided missiles and communication satellites, shutdown nuclear power plants, and caused heart pacemakers to fail.This means most industries are not able to be immune to the tiny-whisker problems[13,50]. Experts fear that many technological fail-ures for which causes have not been found are due to undetectedtin whiskers. And even if engineers trace a failure to whiskers, thatfinding is rarely publicized. For both competitive and liability rea-sons, observers note, companies are not eager to reveal that a flawis lurking in their products. Instead, companies try to remedy theflaw with a minimum of fanfare and then quietly get on withbusiness[50]. NASA has suffered a lot from this whisker-relatedissue, especially in electronic-rich systems. Tin (and other metal)whisker-induced failures were documented by NASA indetail[39,51,52], which is a useful resource pool to investigate thewhisker-induced failures, although it is not all encompassing. Partof the failures listed in the web pages by NASA is cited in Tables 1and 2.

The commercial (non-NASA) satellites listed in Table 1 havereportedly suffered on-orbit failures of their satellite control pro-cessors (SCP) due to tin whisker-induced short circuits where thewhiskers grew on pure tin-plated electromagnetic relays. Eachsatellite was designed with a primary and one redundant SCP.Failure of both primary and redundant SCPs results in a completeloss of the satellite's primary mission[39]. In Table 2, a summary ofmetal whisker-related “events” affecting the power industry ispresented. Among these events happened to power plants, on April17, 2005, Millstone plant drew more attentions since it is the onlypower generation site in Connecticut and the only multiunit nu-clear plant in New England[53]. Millstone plant shut down withoutincident when a circuit board monitoring a steam pressure lineshort-circuited, which caused the board to malfunction and indi-cate an unsafe drop in pressure in the reactor's steam system, whenin reality there was no drop in steam pressure. The cause wasattributed to “tin whiskers”. In response to this event, Millstone

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Table 1On-orbit commercial satellite failures[39,51]

Satellite name Launch date First SCP failure Redundant SCP failure

Complete losses e both primary and redundant SCPs failedGALAXY VII [PanAmSat] 27-Oct-1992 13-Jun-1998 22-Nov-2000GALAXY IV [PanAmSat] 24-Jun-1993 (not caused by 'tin whiskers') 19-May-1998SOLIDARIDAD 1 [SatMex] 19-Nov-1993 28-Apr-1999 27-Aug-2000GALAXY IIIR [PanAmSat] 15-Dec-1995 21-Apr-2001 15-Jan-2006Partial losseseonly 1 of 2 redundant SCPs failedOPTUS B1 13-Aug-1992 21-May-2005 Still operationalDBS-1 [DirecTV] 17-Dec-1993 4-Jul-1998 Still operationalPAS-4 [PanAmSat] 3-Aug-1995 3rd quarter 1998 Still operationalDirecTV 3 (DirecTV) 9-Jun-1995 4-May-2002 Still operational

P. Zhang et al. / Journal of Materials Science & Technology 31 (2015) 675e698678

implemented a procedure to inspect for these whiskers at everyrefueling outage, or 18 months[53].

3. Whiskers in Electronic-rich Systems: the Phenomena, theProblems and Remedies

NASA has been concerning this issue for a long time and keepsvery rich data base for it. The organization runs a web site thatcovers metal-whisker researches[13]. The metal whiskers have beenfound with most EEE (electrical and electronic equipment) parts,such as capacitors, circuit breakers, connectors, resistors, trans-formers, and mechanical hardware and structures, such as bus barsand rails, conduit, terminal lugs, etc[13]. By affecting these compo-nents, metal whiskers bring troubles to commercial satellites,military equipment, medical facilities, data center, etc., and the listcan by no means be complete. Because the metal whiskers arehighly electrically conductive, it is not surprising that the night-mares created by metal whiskers were most frequently met in theelectronics industry, and the electronics industry is the severelyaffected area by the metal whisker perils since it was invented.

3.1. Whisker-related failure models

The most frequently reported failure mode associated withmetal whiskers (mostly tin whiskers) is electrical short circuits, butmetal vapor arc in vacuum and plasma at low-pressure environ-ment, and debris/contamination interfering with sensitive opticsare also reported[52,54e56]. Fig. 3(AeC) show practical instances forthe three failure modes, respectively.

3.1.1. Conductive bridges to create a short circuitAll metal whiskers are highly conductive filaments, which can

create shorts by bridging two adjacent conductors at different po-tential, although their full-load current is not big because of thewhiskers' small diameters[57e59]. Whisker bridging short circuits

Table 2Summary of metal whisker-related “events” affecting the power industry[39]

Location Date Event

Dresden Nuclear 1987 Trip of “B” Channel of RPSDuane Arnold 1990 Reactor ScramDuane Arnold 1995 Reactor Scram/Controlled ShutdownDresden Nuclear 1997 Reactor ScramSouth Texas Project 1999 Reactor Pre-Trip AlarmDominion Millstone 2005 Reactor Trip - Tin Whiskers on Diode TerminaNot Specified 1995 Tin Whiskers in RelaysForeign Plant 1999 Tin Whiskers in Relays Producing Three FalseForeign Plant 2001 Tin Whiskers on IC Leads Producing a ReactorNot Specified 2002 Whiskers on Potentiometers Producing PoweNot Specified 2006 Zinc Whiskers in RelaysNot Specified 2006 Tin Whiskers in Relays

can occur either when a long enough whisker synchronously touchadjacent conductors at the birthplace of the whisker, or when anentire whisker or a segment of it breaks off and drifts from itsoriginal growth site to conductors, Fig. 3(A). Because of the smallsize and light weight, whiskers can be airborne and possibly fallonto any locations where they can cause short circuits when touchtwo sites with different potentials. Depending on the current car-rying capacity of the whiskers and the applied current, the shortsproduced by whiskers can either be permanent or intermittent. Fortypical whiskers, permanent short circuits happen when currentapplied is less than 10's of mA, and intermittent ones happenwhenapplied current is greater than 10's of mA[29,54,57].

3.1.2. Plasma of metal ionsWhen metal whiskers are fused openwith a big current of more

than a few amps and a supply voltage over 12 V in a vacuum or low-pressure environment, catastrophic failure might happen[34,60], andan instance is shown in Fig. 3(B). Under some electrical/atmo-spheric conditions, whiskers might be vaporized into conductiveplasma of metal ions. The vaporized tin, under this kind of condi-tion, might initiate a plasma discharge that can carry currents ofhundreds of amps and may continue until all the available exposedtin is consumed or the supply current is interrupted[35,51,61]. Fail-ures by this mode might bring huge cost, including jeopardizingpeople's life.

3.1.3. Random debris of whiskersThe third failure mode is shown in Fig. 3(C), where debris of a

broken whisker blurs an optical surface[52]. Broken whiskers havegood mobility in a system, thus they are a source of concern. Theymight interfere with the operation of micro-electro-mechanicalstructures (MEMS), clog fine channels, or contaminate optical sur-faces[51]. In addition to the three modes, there might exist otherways for whiskers to intervene in some systems, since some “no-

Source

U.S. Nuclear Regulatory Commission, Sept. 2007U.S. Nuclear Regulatory Commission, Sept. 2007U.S. Nuclear Regulatory Commission, Sept. 2007U.S. Nuclear Regulatory Commission, Sept. 2007U.S. Nuclear Regulatory Commission, Sept. 2007

ls The Day (New London, CT July 4, 05)Private Communication

Alarms/Plant Shutdowns Foxboro-tech paperTrip Anonymous Anecdote

r Supply Failures Westinghouse Nuclear BulletinPrivate CommunicationPrivate Communication

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Fig. 3. Typical failure modes induced by whiskers: (A) electrical short circuits, (B) metal vapor arc, and (C) debris/contamination[52].

P. Zhang et al. / Journal of Materials Science & Technology 31 (2015) 675e698 679

fault-found and intermittent” failures in electronic-rich systemshave been frequently reported all the time[62e65].

3.2. Typical failure experiences in electronic fields

By the failure modes stated in the previous section, mostfrequently by short circuit, numerous failures associatedwithmetalwhiskers (primarily tin whiskers) have happened in electronicfield. The “whisker failure” draws attentions from not only thecircle of academia and engineering, but also press circles thanks tothe big caliber of the failures and their ubiquity[66e70]. The failuresbrought complete loss of costly electronic systems, or intermittentmalfunction to systems[52]. By disabling electronic components, thewhiskers broadly spread their destructive power, and they haveruined missiles, silenced communications satellites[66,71], forcednuclear power plants to shut down[67], and other catastrophiclosses[72]. Unfortunately, so far the growth of the whisker is by nomeans divinable, because the true mechanism(s) behind thiswhiskering phenomenon is still elusive. When the tiny “devils”sprout without warning from solder and finishes deep insideelectronics, an unpredicted event which might imperil electronicsystem is approaching, and finally pacemakers, consumer gadgets,even some military equipment and critical part of a space shuttlewould fall victim to the whiskers[29,37,73]. Fig. 4 displays severalwhisker cases on electrical components, for examples.

In 1940s,Western Electric and Bell Labs impressed on people thetroubles from tin whiskers. Since then the troubles and resultantdamages have lasted for almost 70 years[52]. NASA filed the 60-years history of documented metal whisker failures (from 1946 to2006)[32,52]. The documented failures by NASA involves a widespectrum of industrial sectors, such as astronautic, military, avi-onics, nuclear power plant, telecommunication, medical, and con-sumer electronics applications[13,29,39]. Impressively, there are anumber of big failures as a result of metal whiskers. In 1990s, at

least four satellites had been completely damaged, and four satel-lites had been partially disabled by the whisker-induced failures.There are also multiple records of astronautic and military failuresresulted from tin whiskers, such as the failures from military air-planes, patriot missile, radar for F-15[39]. Whiskers with lengths of8.0 mm were found growing from Sn-plated card guides in an in-strument box on the space shuttle, Fig. 5, which was long enoughand ready to cause short circuit in the system[71]. Zinc whiskerswere found to be the culprits for the failures happed to the medicalequipment, such as the heart peacemaker[74]. From 1987 to 2005, abunch ofmetal whisker-related events affecting the power industry(GE, Westinghouse, Dominion, etc.) was documented, at least six ofwhich were attributed to tin whiskers or zinc whiskers[39,75e77]. Apresentation by the U.S. Department of Energy Office of Environ-ment, Safety and Health Evaluations says metal whiskers caused anuclear power reactor to shut down in April 2005[77,78].

With a much greater impact, in 2010, Toyota recalled 1.33million vehicles due to reliability issues in the engine control unitthat could cause a vehicle to fail to start or stall while driving.Although whiskers were not the only culprit that held re-sponsibility for the acceleration problem, they are undoubtedlyundermining the reliability and safety of electric-rich systems[56,71].A 2011 NASA report on the unintended acceleration problem inToyota cars found numerous whiskers on pedal assemblies withlengths up to 1.9 mm, one of which had formed a “resistive partialshort circuit between the pedal signal outputs”, seen in Fig. 6[71,79].Tin whiskers were actually found on several models of Toyota cars,such as in the engine control unit (ECU) of a 2008 Toyota Tundratruck[56].

In addition to the big events, the mysterious “devils” mightattack your devices and have already directly cost you. Consumerslove their electronics, and almost every hour billions of people usevarious electronics, from flat-screen TVs, video games, pads, smartphones to coffee makers and some sport electronics. But over time,

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Fig. 4. (A) Tin whiskers on relays, (B) zinc whiskers on computer room flooring, (C) tin whiskers on D-sub connector, (D) tin whiskers on transformer can, (E) cadmiumwhiskers onconnector, and (F) tin whiskers on lugs[32].

P. Zhang et al. / Journal of Materials Science & Technology 31 (2015) 675e698680

even the best of these devices inexplicably stop working. Usually itis not worth the time and money to have them repaired, butreplacing the dead ones would cost your money and leave you along-lingering question of why stopping working. The culprits ofthe inexplicable malfunction happened to your electronics are verylikely the tiny whiskers. The tiny killers to the electronics leave noevident traces the human eye could easily detect, and unfortu-nately, if the effective whisker-quenching method cannot be foundin the near future, the unforeseen malfunctions might happenmore frequently to your electronics as more devices would occupyyour life and they have been designedmore andmore compact. In aword, metal whiskers are not an imaginative, fanciful term far fromyour everyday life. They are real and complexly existing, and mightbe posing a serious problem to electronics of all types near you,even though they are hard to be seen by naked eyes.

The prevailing whisker failures have brought huge loss to hu-man society[71]. By the whisker-induced short circuits, with a roughestimate, they have leveled over $10 billion in damage since theywere first noticed in the 1940s[68]. Now some electronics makersworry the destruction will be more widespread, as the EuropeanUnion and governments around the world enact laws to eliminatethe best-known defense e lead e from electronic devices.

Fig. 5. Digital image of whiskers growing from card cage on space shuttle[71].

3.3. Strategies and the dilemma to address the whisker problems

The whisker problems happened almost the same time with thebirth of the electronics industry in the 20th century, and as thewhisker-induced problems plaguedwider sectors, resulting in hugeloss, the long march towards the mechanism interpretation andmitigation strategy search started immediately in both academiaand industrial circle[71].

3.3.1. Dilemma of Pb-solutionThe precise growth mechanism(s) since 1940s has been

remaining unknown, although the effort to quench the whiskers inengineering never stopped. With the belief of an alloy element fortin to alleviate the tin whiskering phenomenon, Bell Labs workedthrough the periodic table in 1950s. Fortunately, a magic element,lead (Pb), was found to work. Other elements they tried, however,seem to enhance whiskering[32]. So far, in engineering, the mostfamous and successful mitigation strategy is adding 0.5%e1% (byweight) of lead (Pb) to tin[80], which once made the concern aboutand interest inwhiskers fade away. However, as the sales growth inconsumer electronics such as computers, smart phones, pads, goes

Fig. 6. A whisker growing across accelerator pedal position sensor from ToyotaCamry[71].

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exponential, the disposal of the devices when replaced with thenewest generation has been a severe challenge to the environ-mental security. To prevent the scenario of disaster that countlessPb-rich circuit boards/parts fromwaste electronics are dumped intolandfills, and the Pb element migrates into municipal water sup-plies, from happening, responsible administrations and organiza-tions, especially in Europe and Japan[81], went into action decadesago, and directives concerning the protection of the environmentfrom hazardous substances were carried out, for examples, Direc-tive 2002/95/EC of the European Parliament and of the Council (27January 2003) on the restriction of the use of certain hazardoussubstances in electrical and electronic equipment (RoHS), Directive2002/96/EC of the European Parliament and of the Council (27January 2003) on waste electrical and electronic equipment(WEEE), and Directive 2003/108/EC of the European Parliament andof the Council (8 December 2003) amending Directive 2002/96/EConwaste electrical and electronic equipment (WEEE)[81,82]. In 2006,Europeans barred the toxic metal from most electronics to preventits being incinerated or accumulating in dumps after computersand other gadgets are tossed out. Similar measures are beingconsidered or are already in place in other countries, includingJapan, China, South Korea, Argentina, Australia and the UnitedStates[68].

RoHS requires green manufacturing of electronic componentsand has again troubled the industry by rousing the half centurydormant problem. The current situation for the whisker-quenchingstrategy seeking is regulated by the RoHS. It means that the methodmust be lead-free. Removing lead from solder may seem a smartidea environmentally, but the erratic microscopic growths of metalwhiskers could be just as problematic as before the advent of Pb-addition because a lead-free mitigation for the whiskering phe-nomenon as effective as Pb-addition is still the expectation inelectronics industry. After restricting Pb addition, the whiskerfailure mode that has been responsible for the loss of billions ofdollars is re-emerging. As a result, the Pb-free regulation incurredcomplaints, and put itself into a dilemma. In 2007, Robertson fromAssociated Press covered the dilemma, and comments of severalimportant investigators in this issue were quoted[68]. “The EU'sdecision was irresponsible and not based on sound science,” saidJoe Smetana, a principal engineer and tin whisker expert withFrench telecommunications equipment maker Alcatel-Lucent SA.“We're solving a problem that isn't and creating a bunch of newones. Without tinelead, we can no longer be confident that wewon't get whiskers and whisker-related problems during the life-time of the equipment,” he says. The risk of a whisker-relatedfailure is pretty low in the first five years of a product's life. Butafter that, Smetana concedes, “it's all in the ‘we don't know’ range.”While the scientists and engineers warn that the whiskers have thepotential to destroy missions, some companies say the EU rulesthreaten the reliability of their products, exposing them to un-known risks and possibly threatening people's safety. To get rid ofthe dilemma, a lead-free method as effective as Pb-addition is amust. Although the industry is working fast to come upwith a lead-free solution, elements that are as effective as lead in preventing tinwhiskers, are still not found[68].

3.3.2. Lead-free solution explorationRestricted by the RoHS, industry and organizations, such as

iNEMI, NASA and JEITA[83] have beenworking to assess and addressthe risks aroused by whiskering problem without lead[84]. Severalwhisker risk assessment and mitigation methods were developedand discussed[85e88]. Essentially, the effectiveness of the mitigationstrategies was usually evaluated in terms of change of whiskerdensity and the maximum whisker length, incubation time, withand without applying the strategies[87,89]. The practical mitigation

methods (lead-free) are the following[29,87,90e93]: (1) avoid pure tinplating, (2) dip tin finished surface in solder, (3) select matte or low-stress tin as the finishmaterial, (4) select finishwith an under-layer,(5) select a finish with high tin plating thickness, (6) minimizecompressive loads on plated surfaces, (7) apply heat treatments, (8)apply conformal coating.

3.3.2.1. Avoid pure tin plating. The surest thing to prevent tinwhisker-induced failures is to avoid using pure tin and high tincontent Pb-free material for plating any electronic component.Alternatives to lead alloying element, such as silver or bismuth canreduce the propensity of whisker growth, according to thereports[94e97], although they are not as effective as lead. Due to thecost and reliability of the non-Pb alloying elements, this is not apractical method to get rid of the whisker problems.

3.3.2.2. Dip tin finished surface in solder. Solder dipping is analternative mitigation strategy. However, solder dipping may causedamages to the components, such as package cracking or loss of airtightness, due to thermal shock, popcorning of plastic packages,solder bridging between leads on fine pitch packages, and elec-trostatic discharge. Solder dipping may have limited successdepending on the specific process to coat the entire exposed tin-plated lead surface. In order to reduce the potential risk fromthermal shock to the package, a stand-off distance to the packagebody is required in solder dipping. This stand-off area can be theAchilles heel to the component[87].

3.3.2.3. Select matte or low-stress tin as the finish material.Albeit all types of pure tin finishes have been found to have thepotential for whiskering, bright electroplated tin finishes have beenfound to grow whiskers with the highest density and longer lengthcompared to matte tin finishes and this is the reason that matte tinis recommended to be used instead of bright tin[29,95]. This obser-vation may stem from the larger grain size and lower-stress ofmatte tin plating deposits. Matte and bright tin are characterized bydifferent grain size and carbon content. Excessive amounts of co-deposited carbon generally cause a loss of solderability of tin andtin alloy plating, excessive intermetallic formation, excessiveoxidation and surface contaminants[98,99].

3.3.2.4. Select finish with an under-layer. The beneficial influence ofa nickel under-layer is widely recognized[95,100e104]. A thin under-layer, such as nickel layer appears to decrease the compressivestress caused by intermetallic formation between the plating layerand the base metal. Since the growth rate of nickeletin in-termetallics (essentially Ni3Sn4 and NiSn3) is lower than that ofcopperetin intermetallics, stresses caused by intermetallic forma-tion within the plating deposit can be reduced[29]. Xu even showedthat a nickel under-layer generates a tensile stress on the tinplating[5]. However, under-layer cannot eliminate whiskering duemainly to the fact that under-layer cannot reduce the mismatch ofCTE (coefficient of thermal expansion) between the substrate or theunder-layer and the tin finish[5].

3.3.2.5. Select a finish with high tin plating thickness. Industry dataindicate that thickness of plating also affects tin whiskergrowth[95,99,105,106]. Glazunova et al.[107] reported that whiskers donot grow on very thin (~0.5 mm) tin plating while much higherwhisker density and growth rate were found on thick (2e5 mm)plating. Interestingly, much thicker tin finishes show a lower pro-pensity for tin whiskers and/or a greater incubation time before tinwhiskers occur[106]. Though very thin tin plating also retardswhisker growth, in reality very thin tin plating is not appliedbecause it has poor corrosion resistance and solderability. Thick tin

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plating is required for real product. iNEMI recommended tinthickness for components without a nickel or silver under-layer beat least 10 mm nominal or thicker in their interimrecommendation[106].

3.3.2.6. Minimize compressive loads on plated surfaces.Compressive stress (mechanically or chemically induced) has beenshown to be an accelerating factor for whisker growth by manyinvestigators[5,29]. Avoiding mechanical loading, such as mechani-cal bending, turning a nut or screw, is an effective way to reduce tinwhiskering, but this is not always reliable[87]. In iNEMI recom-mendations on lead-free finishes for components used in high-reliability products, it states that tin deposits that have tensilestress as plated and remain tensile with aging are preferred, and tindeposits that are compressive during service life are notpreferred[106].

3.3.2.7. Apply heat treatments. Heat treatments, including reflow-ing, fusing and annealing, appear to reduce whisker growth byrelieving internal stresses and increasing grain size. Duringreflowing, the parts are heated above 232 �C (the melting point oftin), which releases stresses in the tin deposit. However, the impactof the reflow process on both grain size and residual stress was notwell evaluated, and some research results showed that whiskerformation risk may not necessarily be mitigated by the heattreatment strategy[29].

3.3.2.8. Apply conformal coating. Conformal coatings can confinewhisker growth to within the coat, and prevent whiskers fromshorting exposed conductors. NASA's experiments indicate thatUralane-5757 conformal coating can delay the growth of whis-kers[29,108], but it cannot eliminate the growth. Tin whiskers havebeen reported to grow and penetrate through the conformalcoating[109]. If the conformal coatings fail to contain whiskergrowth within the coat layer, its effectiveness in providing pro-tection against electrical leakage and corrosion will be compro-mised. Another concern is the potential for whiskers to produceminor delamination of the conformal coating from the circuitboard, and in such case, the resulting capillary space could providea void for condensation of the water vapor molecules that slowlydiffuse through the coating material, which may result in galvaniccorrosion[29,90,108,110]. The risk is substantially reduced compared to

Fig. 7. A copy of the datasheet packed with an iPhone 6 in China market, indicating Pb

the scenarios without applying a conformal coat, but the conformalcoating is far away a satisfied solution to this problem[93].

3.3.3. A reliable lead-free solution still lackingA practical method as general, effective and reliable as Pb-

addition practice is still absent in the option list, although thereare several lead-free options existing to mitigate the whiskergrowth and contain the whisker-induced problems, as stated in theprevious paragraphs. So the research on this topic and seeking thesubstitute of Pb-solution are far from over.

Many companies and manufacturers are not getting rid of thePb-addition practice to guarantee the reliability of their products. Atypical manufacturer supplying solder sticks to photovoltaic (PV)cell manufacturer located in outskirt of Jintan (Yangzi Delta in-dustrial area, Jiangsu Province, China) was still shipping PbeSnsticks (manufactured according to the GB/T3131-2001) out in largescale in the spring 2014. And it seems that the plant had a goodgrowing trend since it had been financially and in policy supportedby the local government. Besides the small manufacturers, largecompanies, such as Apple Inc. do not get rid of Pb, either. Mostcomponents inside iPhone 6, the most updated generation ofiPhone yet, released on September 9, 2014, contain Pb, Fig. 7, wherea toxic substance datasheet packed with iPhone 6 is shown. Itclearly acknowledges that circuit board, display screen, battery,power adapter and other accessories contain Pb, and the concen-tration is beyond the level regulated in the GB/T 26572-2011. Applesold more than 6.5 million of iPhone 6/6 plus in China just inNovember 2014, and its sales volume in the whole year 2014 wouldbe more than 40 million, reported iSuppli, the leading marketresearch firm focused on the electronics value chain. The hugevolume of Pb-containing consumer electronics, including iPhones,which is the tip of the iceberg, would bring tremendous pressure onthe environment. So, the lead-free solution is extremely significantand urgent for environmental security.

4. Mechanisms of Spontaneous Growth of Metal Whiskers

4.1. Intricate phenomena still hiding the mechanisms

Beginning in early 1940s, catastrophic failures and big losseswhich were ascribed to the metallic whiskers happened. To findeffective mitigation of whiskers, an understanding of how and why

exceeds the upper limit in a China National Standard (right, English Translation).

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Table 3Typical attributes of metal whiskers

Geometry Length Typically hundreds of microns; some to a few millimetersThickness A few microns to tens of micronsShape Straight/helical/tangled/kinked filaments/nodulesTexture Striations along the growth directionCross section Arbitrary contour

Physical properties Strength Better than the substrate where whiskers growMicrostructure Crystal structureConductive Electrically conductive

Growth behavior Incubation time Arbitrary, from minutes to yearsGrowth end Whiskers' base underneath the substratesGrowth sites UncertainGrowth rate 0.1e100 nm/s, depends on the metals, processing method, and environment parametersGrowth mechanism Unconfirmed

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the whiskers form would be helpful. So, the research on this topichas been active ever since, aiming at understanding the phenom-enon and seeking the fundamental mechanisms governing whis-kers' growth. There have been a tremendous amount of study andinnumerous publications related to this subject[44,71,111e120]. In spiteof this, until now, there is still no consensus on the specific growthmechanism for this kind of metallic whiskers. This is also why thesolution-seeking work to quench the whisker problem is ineffi-cient, as stated in the previous section 3.3. The difficulty is partiallythat multiple materials processes interact to create the whiskers(e.g. inter-diffusion, phase transformation, stress generation andrelaxation), so it is not easy for investigators to ascribe the growthto a specific factor, and identify the underlying mechanisms. Evenworse, many processing variables (such as film thickness, grain size,plating conditions, microstructure and composition)[113,121e123],have been confirmed to play a role in the whiskering phenomenon,which makes it difficult to compare the results of different studiesdone under different conditions[124e127].

Galyon published an excellent brief history of tinwhisker theorybased on a selected set of papers published from 1946 to 2004[48].Most researches have been conducted on tin whiskers, but mostresearchers agree that similar mechanism operating behind thewhiskering phenomena for the different metals which growwhiskers because of the similarities between the metal whiskers.Especially after the scanning electron microscopy (SEM) techniquewas employed to characterize the microstructures of the whiskers,the existence of high degree of similarity across the whiskers fromdifferent substrates (zinc, tin, cadmium etc.) had been confirmedand accepted. For example, the similarity between zinc and tinwhiskers was compared in 1975 by Lindborg[128]. Typical attributesthe metal whiskers share are summarized in Table 3[23,44].

An integrated theory of the whisker growth is desirable, but theexistence ofmultiplemechanisms behind the general phenomena ofmetal whisker growth is well accepted[49]. Considering the rich di-versity of the substrates, growth behavior, andwhiskermorphology,it is reasonable for plural mechanisms to exist[14,71,126,127,129]. In re-ality, some investigator pointed that the growthmode for a whiskercan even change with time[23,42,49,71,129,130], which makes themechanism-identifying work much more difficult. And the possibleinter-operating situation between different mechanisms makes thesolution-seeking effort to mitigate/eliminate the whisker-resultantproblems intricate.

4.2. Growth mechanism-seeking researches

The theories developed hitherto essentially fall into these cat-egories: dislocation theory mechanisms[2,3,40,41,131e133], recrystalli-zation mechanism[4,42,107,134e136], the compressive stress relatedmechanisms[49,137e140]. Among the mechanisms, stress-based ones

draw most interests and disputes, and a bunch of variants havebeen developed by varying the origins of the stresses. The variantsinclude, but not limited to, residual stress, mechanical force[141e143],coefficients of thermal expansion mismatch, intermetallic com-pounds (IMC) formation[144], “weak oxide” layer crack[22,141,145],oxidation of soft metals[6,17,27], corrosion[146e148], “fresh metalatoms” release[44,149e153], and so on.

4.2.1. Dislocation theory mechanismsIn 1950s, dislocation theory mechanisms were proposed and

developed into two sets according to the different claims of thegrowing ends. Peach stated that Sn whiskers grew from Sn atomsmigrating through a screw dislocation at the center of thewhisker[2]. These migrating Sn atoms subsequently depositedthemselves at the whisker tip, which means whiskers grew byadding Sn atoms on their tops. Linborg developed this mechanismin 1976 by proposing a two-stage dislocation model for whiskergrowth[131]. The dislocation mechanism provided the physical im-age for the whisker growth, but these mechanisms were firmlydisproved. Actually, in as early as 1953, Koonce and Arnold un-doubtedly showed whiskers grow from their base, not their tips[25].And many subsequent reports have confirmed the fact that thewhiskers grow from their bases[128,154]. In the same year the evi-dences against the first set of dislocation mechanism (grow at thetip of whiskers) appeared, the alternative dislocation mechanismfor “growth at the whisker base” was suggested by Frank[3]. Frank'smechanism proposed a rotating edge dislocation pinned to a screwdislocation at right angles to the surface. Theoretically, the rotatingedge dislocation was assumed to stay in the same plane after eachrevolution. Each revolution would add an additional layer of Snatoms to the whisker base. Almost at the same time, Eshelbyindependently proposed a mechanism for “growth at the whiskerbase” based on Frank-Read dislocation[40]. The Frank-Read dislo-cation at the base of the whisker emitting loops that expanded byclimb to a boundary. The dislocation loops glide to the surface anddeposit a half plane of atoms at the surface. In 1956 and 1958,Franks published twice to develop a dislocation glide mechanismfor whisker growth[132,133]. In Franks' model, the dislocations thatresult in whiskers are pinned due to lattice faults, and thus act asdislocation sources under the influence of a stress field. Thesepinned dislocations were proposed to move by glide to growwhiskers. However, the dislocation mechanisms were proposedtheoretically and the experimental evidences supporting disloca-tion mechanisms were not found. Furthermore, there have beenplural publications discussing dislocation mechanisms apparentlyconflict. For example, in1957 Baker concluded, based on a study ofdistribution of angular bends in whiskers, that the experimentalobservation in his study were incompatible with dislocationmechanisms of whisker growth[155]. In 1958, Smith et al.[156] and

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Ellis et al.[4] also observed evidence against the dislocation mech-anisms, respectively. All subsequent dislocation proposals areessentially variants of the above dislocation theories. Albeit thedislocation mechanism gave detailed model for whisker growth,there have been not experimental evidences for it. It is sure that themajority opinion of current theorists is that dislocation mecha-nisms are not involved in whisker growth.

4.2.2. Recrystallization mechanismEllis et al. did more than just casting doubt on the relevance of

dislocation mechanisms for whisker growth. In 1958, Ellis et al. asmentioned above[42], for the first time, proposed that recrystalli-zation played a key role in the formation and growth of whiskers.But Ellis et al. suggested the recrystallization mechanism based onindirect evidence and they encouraged experimentalists toconsider the proposal and attempt to prove/disprove its validity[42].Actually, as early as in 1954, Fisher et al. showed that applied forceswould accelerate tin whisker growth[157]. When they appliedclamping forces to tin films electrodeposited onto steel substrates,they observed that the applied compressive forces significantlyaccelerated whisker growth rates, which gave clear informationthat whisker growth is driven by compressive stresses within thebase material. This acceleration effect by compressive stresses wascorroborated later by Glazunova in 1962[158] and Pitt et al., in1964[159], respectively. Considering that a number of recrystalliza-tion events happen due to the high stored energy level while theclamping pressure extrudes whisker material from the substrates,the experimentation adopted by Fisher et al. provided indirectevidences for the recrystallization mechanism later proposed in1958 by Ellis et al. Glazunova and Kudryavtsev in 1963 publishedsome important experimental data, showing the presence of zinc incopper substrates greatly accelerated the tin whisker growth[107].At the same time, they reported for the first time that annealingwould mitigate the whisker growth. All the evidences made themgive the commentary: “it may be assumed that the incipiency andsubsequent growth of tin whiskers is a distinct form of recrystal-lization”. But, a specific model explaining the whisker growth forrecrystallization mechanism has not been provided, and therecrystallization mechanism was built up by surmising based onindirect evidences. In addition, theoretically, according to therecrystallization mechanism, higher temperature would acceleratethe process of recrystallization, thus the whisker growth. However,experimental evidences against recrystallization mechanism werefound. For example, Tu[141] reported that when temperature wasraised above 100 �C, Sn whisker growth was depressed. Sabbaghet al. claims that 52 �C is the optimal temperature for whiskergrowth[160]. Furthermore, McDowell[61] found that Sn whiskergrowth slows considerably above 121 �C and halts completelyabove 150 �C. In a word, the recrystallization mechanism canneither provide the physical image for the whisker growth, nor besupported by experimental evidence.

4.2.3. Stress-related theoriesIt is a long history for the compressive stress (gradient) related

growth theories[48,161]. Generally, whisker formation is recognizedto be a stress relief mechanism by these stress-based the-ories[22,162,163]. There are abundant positive experimental obser-vations for this mechanism, and one of the experimentalcornerstones of the stress theory is the longitudinal striations onthe surfaces of whiskers, which are generally translated into theextrusion marks when the whiskers are born by compressivestresses[6,33,44,164]. The models built on the stress theories greatlyvary, depending on the interpretation of the origins for the stresses,which might be originated thermally, chemically, mechanically, orelectrically[142,165e167]. That is also the reason that the stress related

theories are the most discussed ones and still remain active. Themodels recently developed mostly involve stress, although the or-igins of the stresses are different. The stress-based theories succeedto win popularity and receive experimental support, but the chal-lenges and debates on stress never halt. We, trying to be with thesmallest bias, discuss some typical ones.

4.2.3.1. Mechanical deformation and the residual stress. In one of theearly studies[157], it has been found experimentally that the growthrate of tin whiskers may be accelerated up to 10,000 times thepreviously observed spontaneous rate by the application of pres-sure up to 52 MPa (7500 psi). The whisker growth was induced byusing a clamp to apply pressure on the tin-plated samples. Whiskergrowth rate was observed to be mostly a function of clamp pres-sure. Besides the external stress induced by pressure[157,168,169], theresidual stress introduced by electrolytic deposition process is alsoidentified as the driving force for whisker growth[22,130].

However, the apparent weak points of this theory are haunting,such as the low melting point of tin. The low melting point of tinand the arbitrary (usually incredibly long) incubation time of tinwhisker growth are not consistent. Due to the low melting point oftin (231.89 �C, room temperature reaches the 60% of it), the residualstress should be easily relaxed, which means the whiskers wouldgrow soon if not completely restrained[44]. Another sharp contraryagainst the stress-based theory is the experimental findings pub-lished in 2005 by Chen et al.[170], where they found a spectacularlyrapid and profuse growth of tin whiskers on electrodepositedtinemanganese alloy coatings and during the whole period ofwhisker growth, the tinemanganese electrodeposits were found tobe in a tensile residual stress state. This, if not explicitly rules outthe commonly accepted explanation of a compressive stress as thedriving force for tinwhisker growth, at least casts grave doubt on it.Actually, this finding by Chen et al. shakes the common base of allvariants of stress-related theory. Experimental observations[44,171]

that fall out of the scope of rational explanation by the stress-based theories are too many to list completely.

4.2.3.2. Thermal stress. Mismatch in the coefficients of thermalexpansion (CTE) was identified as the origin of the driving force forwhisker growth[145,172e178]. For example, Shin et al. proposed thatstrain induced by heating due to the thermal expansion mismatchbetween the coatings (tin, 1 mm thickness) and the substrate (Si,(001)) is responsible for the tin whisker growth[174]. But this modelhas critical defect when it comes to whiskers from pure tin withconsiderable thickness and other homogeneous alloyswhich do nothave a substrate[90]. Actually, this model also contradicts with thefindings by Chen et al.[170] and our experimental results[179].

4.2.3.3. IMC growth. Lee and Lee[22] firstly showed directly in 1998that the IMC (intermetallic compound) formation in the tin grainboundaries leads to stress in the layer. In the study of the sponta-neous growth of Sn whiskers from tin electrodeposits on phosphorbronze sheet, they tactfully used wafer curvature to measure Snlayers over Cu and attributed the stress evolution to the growingIMC (Cu6Sn5) compressing the Sn grains by growing into the ver-tical grain boundaries. To release the compressive stress in the tinfilm, tin whiskers grow from the grain whose surface oxide issheared. The whisker growth is controlled by the expansion of theprismatic dislocation loop on the slip plane by climb, that is, bymeans of the operation of the Bardeen-Herring dislocation source.The dislocation loop expansion is restricted by the grain boundary.The loop now glides along its Burgers vector direction. As a result,tin whisker grows by one atomic step. The continuous operation ofthe BardeeneHerring dislocation source gives rise to whiskergrowth until the stress is relieved.

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However, very soon this plausible theory was found not to holdwater. IMC effects become more complicated at elevated temper-atures where a neighboring intermetallic layer of Cu3Sn may alsoform, Cu3Sn intermetallic layers have lower molar volumes thanCu6Sn5, and are not expected to create as much extra stress withinthe substrate[6,44,113,180]. Moreover, there is by no means for inter-metallic to form in pure substrates where it is still not whisker-immune. In a word, it is not safe to accept IMC as a critical factorfor the whiskering phenomenon.

4.2.3.4. Cracked oxide theory. As more experimental and theoret-ical calculationwork has been done for stress creationwithin metalsubstrates[6,71,128,181], Tu theoretically proposed that a “weak spot”layer enabled the localized relief of internal stresses by permittingwhisker growth through a crack in the oxide layer[141], which ismore often referred to as the “cracked oxide theory”. Tu et al.[182]

further developed the theory and proposed three indispensableconditions for tin whisker growth from tin coating: (i) room tem-perature diffusion in the tin; (ii) a room temperature reaction be-tween tin and Cu to form Cu6Sn5 and induce compressive stress inthe tin; and (iii) a stable surface oxide on the tin film. This surfaceoxide layer on the tin coating is needed in order to produce a stressgradient for creep. When the top oxide layer is broken, the exposedsurface is stress free, so a compressive stress gradient is developedfor creep or the growth of a whisker to relax the stress. However,this “cracked oxide theory” could not be directly tested by experi-ments. Furthermore, Osenbach et al.[23,183,184] designed an experi-ment where intentional crack points were created, but the pointsfailed to grow whiskers as expected according to Tu's “crackedoxide theory”. Other experimental contradiction with the “crackedoxide theory” was reported by Xian et al. and Liu et al. from Sn-REsystems[44,149,167,185].

4.2.3.5. Oxidation theory. Barsoum et al. proposed an oxidation-based process for the growth of soft metal whiskers in2004[6,27,186]. Based on the experimental data collected from A-element-rich MAX phase substrates (indium-rich Zr2InC, gallium-rich Cr2GaN, etc.), the oxidation-based whisker growth processwas developed. Essentially, they showed that the driving force is areaction between oxygen and the sprouting metal (Ga/In). Theresulting volume expansion creates a compressive stress thatpushes the whiskers up. As most theories and models in this topic,this oxidation-based model also well accounts for the authors'experimental observation, but its limitations are easy to list underthat general background of the whiskering phenomenon. The mostevident observation against the theory was obtained in our recentexperiments where the oxygen casts no effect to the whiskergrowth from gallium-rich Cr2GaC system[179,187]. In addition, thetheory cannot easily account for the diversity of the whiskers'diameter distribution. In essence, “extrusion” under compressivestress is, like many other variants under this category, the base ofthis theory, which had been challenged by many experimentalobservations.

4.2.3.6. Fresh Sn-atoms theory. After a series of studies on theSneRE system, three groups (Xian et al., Chawla et al. and Liu et al.)proposed the theory[151,167,185,188e190]. They found that tin whiskersgrow from RESn3 compounds (RE ¼ La, Ce, Nd, etc.). Essentially, bythe theory, tin whiskers originate from tin clusters/atoms releasedfrom the selective oxidation of RESn3 compounds at room ambi-ence. On the whisker surface there exists a thin layer of tin oxidethat protects the whisker and limit its lateral growth. Anotheroxidation product of RESn3 is RE(OH)3. The volume expansionduring the oxidation of NdSn3, LaSn3 and CeSn3 is calculated to be43%, 38% and 43%, respectively[167]. The restriction of the volume

expansion by the compact surface RE(OH)3 layer generatescompressive stress, which is considered to be the driving force forwhisker growth[167,185]. An alternative interpretation of the drivingforce was suggested as the chemical potential gradient between thereleased Sn atoms and the whiskers[151]. As the authors stated, theproposed fresh Sn atom theory can explain the growth behaviorand microstructural characteristics of tin whiskers from Sn-rareearth (SneRE) system very well, but it has evident drawbacks. Forexample, Xian et al. observed that the compressive stress is not arequirement for the tin whisker growth in the SneRE systems bydesigning some stress-free powder samples of Sn3Nd[44,191].Moreover, when it comes to the general whiskering phenomenon,for instance the tin whiskers from pure tin substrate where there isno rare earth element, the theory loses the basis.

4.2.4. Loose ends and remarksAlthough the battle against whiskering phenomenon has lasted

for multiple decades long, unfortunately there is currently nogeneral consensus on the underlying mechanism(s) of whiskerincubation and growth. The science of whiskering is still beingworked out, while it is baffling investigators both in scientific andindustrial community. The authors want to discuss some points onthe mechanism-seeking march.

One of the most aggravating complications when studyingmetal whiskers is their incubation time. Whiskers have beenobserved within minutes in some cases, but may take up to yearsand even decades before growing dense and long enough to arousefailures in some electronics-rich systems. This tremendous uncer-tainty of the incubation period contributes the mystery of whis-kering phenomenon, and is particularly frustrating because therandomly long incubation time might make experimental practicesincomplete. The incubation period is a significant consideration inthe study. Sn-plated electronic systems that may seem sound and isin good working order for many years carry latent threat of whiskergrowth. In 1976, Dunn, working for the European Space Agency,released a set of publications where surfaces susceptible to whiskergrowth (such as tin) were strongly recommended to be excludedfrom spacecraft design[8,113,192]. But not all satellite manufacturersfollowed this recommendation, and over a decade later, in 1990,several commercial spacecraft failed due to tin whiskers. Thesedelayed failures by long incubation time are plural[73,113]. Thatmeans that the absence of whiskering evidence in the short run isnot the evidence of absence of whiskering in the long run. To copewith this unpredictable incubation time problem, harnessing thefactors, e.g. temperature, humidity, stresses, which would shortenwhiskering incubation time and accelerate growth rate, is ofimportance[157,193e197].

Huge diversity of the substrates where whiskers grow, togetherwith the various treatments of the substrates, is also an aggravatingcomplication every investigator in this field cannot bypass.Although the generality of the whiskering phenomenon (such astin, zinc, bismuth), has been confirmed, and the inferring that themechanisms operating behind the various substrates should be thesame is currently consensual among researchers, differences andcomparison research among different substrates have beensparsely conducted. Especially, some relatively new substrates werefound to have much stronger influence on the whiskering phe-nomenon which should be a sally port for uncovering thismystery[33,116,179,198,199].

Dispute in the stress-based models is also a thorny issue. Thediscussion and argument on the role of stress in the whiskergrowth have been patterned. As stated in the previous section4.2.3, although the confirmation of the significant effect of thestress on the whisker growth has been repeatedly made, thedoubts and even contrary evidences never stop. From a perusal of

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the related literature, it seems the current consensus that whiskergrowth is primarily a stress-induced process is reached amongresearchers. However, the authors would propose that a thoroughre-evaluation of the effect of stress (gradient) on the whiskergrowth should be seriously taken, in particularly under theexperimental findings in our recently published work[179]. But, onepoint we have to make clear is that we do not neglect the effect ofthe stress on the whisker growth, and what we cast doubt on iswhether the stress is a leading factor (sufficiency) or just anaccelerating factor.

Surprisingly, there are never any significant discussions as towhy mitigation practices by addition of Pb worked[113]. There wereoccasional mentions that addition of Pb prevented the stress formbuilding up during IMC (intermetallic metal compound) growth inPbeSn alloy layers, thus suppressing whisker formation[126].Thorough investigation on the mechanism of Pb-mitigation shouldbe paid attention, and this would probably bring new route to seekthe true mechanism behind the whisker growth phenomenon.

5. Pb Whiskers

Pb as an effective mitigation agent for Sn whisker also forms Pbwhiskers. But, compared with other metal whiskers, Pb whiskerscame to scientists' sights later and Pb whiskers draw much lesserattention than othermetalwhiskers, such as tinwhiskers[144,200e202].As stated in the previouspart of this reviewpaper, themechanism forPb to mitigate Sn whiskers has never been systematically investi-gated and it has been accepted as an empirical practice in the elec-tronics industry. Appropriate amount of Pb addition into Sn caneffectively quench the Snwhiskers[32,46], but in the reflowed eutecticSnePb solder, Pb or SnePb whiskers were observed, Fig. 8[16].Different from other frequently reported tin/zinc whiskers, in addi-tion to bringing malfunction to electronic-rich systems, Pb mightimperil human health chronically, which has been widely studiedand well established, such as its neurotoxicity, immunodeficiency,renal toxicity and promotion of hypertension[203e210].

5.1. Observation of Pb whiskers on brass surfaces

The potential harmful impact on human body from lead was notfully considered by the element in fibrous form until to 2005, whenwe firstly reported that lightly abrading the surface of a commercialleaded brass (Cue38Zne2Pb, ASTM-C37700) results in the room

Fig. 8. PbeSn whiskers and the small whisker (point

temperature spontaneous growth of Pb whiskers and hillocks[27].Because of the shape effect[211], Pb whiskers might bring moreharm to human body than the other morphologies they take. Un-fortunately, Pb whiskers might be more prevailing than people areaware of them. In addition to the addition of Pb as whisker miti-gation agent, Pb, usually with 1e2 wt%, is added to some brasses toimprove their machinability and/or corrosion resistance[212,213].The typical morphologies of Pb whiskers observed in our experi-ments are shown in Fig. 9[27]. The Pb whiskers wear almost all thetypical characteristics of general metals whiskers such as the di-ameters, the striations (parallel/vertical to the wire growth direc-tion), which suggest Pb whiskers also belong to the whiskeringphenomenon which is popular with the low melting point metals.Whiskers of the size and aspect ratios observed in this study havebeen identified as carcinogens that can trigger lung and othercancers[211]. Moreover, the aspect ratios and submicron diametersof the Pb whiskers render them easily dispersible in the atmo-sphere, jeopardizing people's health especially for people that dealwith leaded brass on a daily basis.

5.2. Effect of environment on growth of Pb whiskers from brasses

Due to the easily realized hazards Pb whiskers can bring tohuman health and the fact that leaded brass is a widely used ma-terial in our daily life[17,27], we did a detailed statistics-based studyof the effect of various environments (air, argon, vacuum, oil andwater etc.) on the room temperature spontaneous nucleation andgrowth of lead whiskers from hacksaw-cut surfaces of leadedcommercial brasses[17].

In the detailed statistics-based study, three commercial leadedbrasses, C3604, C3771 and C3712, were either cut or polished andsubsequently exposed to various environments for storage, and thewhiskering phenomenon on surfaces were then examined. Itrevealed that Pb whiskers with diameters of a few tens to a fewhundreds of nanometers were grown spontaneously at roomtemperature from hacksaw-cut or polished surfaces of all the threeleaded commercial brasses, seen in Fig. 10. By a statistical method,the environment was found to significantly affect the Pb whiskergrowth, and such an effect can only occur if, and only if, the at-mosphere is implicated in the nucleation and growth of the whis-kers. When the samples were kept under a mechanical vacuum(~1 Pa), a whisker density exceeding 30000 whiskers cm�2 wasobserved after ~400 h. When exposed to other environments, like

ed by the arrow in the left) on the base whisker.

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Fig. 9. Typical morphologies of Pb whiskers observed on the surface of a commercial leaded brass about 2 h after being lightly abraded with sandpaper. Striations in both thelongitudinal and transverse directions are observed as shown in inset. The diameters of the whiskers ranged from a few tens to a few hundreds of nanometers. In the top rightmicrograph, a Pb hillock at the root of a curved thin Pb whisker was also observed[27].

P. Zhang et al. / Journal of Materials Science & Technology 31 (2015) 675e698 687

air, Ar, oil or water, fewer whiskers were observed. A saturationtime of ~400 h for whisker nucleation and growth was statisticallyidentified, and in all cases, the final average whisker length fell inthe narrow range of ~12 ± 2 mm. Average whisker growth rateswere found to be in the order of 0.01 nm/s for all the samples exceptthe one stored in water. Some individual whiskers showed growthrates that were about an order of magnitude higher. When thesamples were exposed to air after the initial storage of 166 h indifferent environments, accelerated nucleation and growth wasconfirmed. The sample stored in water did not show any whiskergrowth, but rapid growth of a relatively fewwhiskers was observedwhen the sample was subsequently exposed to air. This is attrib-uted to the surface hydrocerussite crystal and possible amorphousfilm formation in water, and the subsequent cracking of such sur-face products upon drying. All the growth behaviors and thegeometrical parameters of the Pbwhiskers grown on brass surfaces

Fig. 10. Pb nanowhiskers observed on the hacks

found in this study are beneficial for the health protection forpeople who have to vocationally touch with brasses.

5.3. Driving force for Pb whisker growth

Based on the experimental results in the study, it seems that thegrowth mechanism for the whiskers are consistent with a scenariowhere oxygen and/or moisture diffusion along the Pb/brass in-terfaces forms oxides or hydro-oxides and the accompanying vol-ume expansion provides the driving force for whisker growth. Theresults, however, indicate that the situation is more complicatedand involves more than the simple inward diffusion of oxygen and/or moisture, because there is no direct correlation between theoxygen and/or moisture concentration in the surroundings andeither the number or the growth or nucleation rates of the whis-kers. It is only by appreciating that whisker formation is a

aw-cut surfaces of the three leaded brasses.

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competition between their growth and the sealing off of the surfaceby a patina that prevents further oxygen and/or moistures that theresults of this work can be better understood. The idea that an oxidelayer on the surface can impede whisker growth is not new and is awell-established phenomenon[6,22,214]. To better address the healththread brought by lead, much work would have to be done, espe-cially on the Pb whiskers. A sound understanding on the growthbehavior of Pb whiskers would largely avoid the potential hazardfor people's life.

6. Whiskers on MAX Phases

As stated in the introduction section, the substrates wherewhisker growth is observed are not limited to alloys and metals.Whiskers have been observed onMAX phase materials, which are afamily of structurally related ternary nitrides and carbides newlydeveloped in these decades[215e219].

6.1. MAX phases and the whisker problems with MAX phasematerials

The MAX phases are a fascinating class of layered solids that arerelatively young. The term of MAX is an abbreviation of Mnþ1AXn,where n ¼ 1, 2, or 3, “M” is an early transition-metal, “A” is an A-group element, and “X” is C and/or N. The labeling of A-group el-ements in the periodic table came from the old CSA notation. Thetransitionmetal,M, elements that formMAX phases are: Sc, Ti, V, Cr,Zr, Nb, Mo, Hf, Ta, and recently Mn; the A-group elements are Al, Si,P, S, Ga, Ge, As, In, Sn, Tl and Pb. In an isolated case, Cd is also re-ported to form MAX phase by taking the position of A. Dependingon the value of n, the M2AX, M3AX2 and M4AX3 phases are usuallyreferred to 211, 312 and 413 phases, respectively. Experimental orcalculated evidence has also been advanced for the existence ofhigher order MAX phases, such as 514, 615, and 716[215]. The MAX

Fig. 11. Layered crystal structure of MAX ph

phases are all layered hexagonal structures with space group D46h-P63/mmc (No. 194). In every instance, near-close-packed Mlayers are interleaved with layers of pure A-group element with theX atoms filling the octahedral sites between the former, Fig. 11.Thermally, elastically, and electrically, the MAX phases share manyof the advantageous attributes of their respective binary metalcarbides or nitrides (MaXb); mechanically, however, they behavelikemetals. This class of materials was firstly discovered in the early1960s, and extensively developed in the last 15 years or so. Datingback to 1960s, Nowotny and his group in Vienna published the firstwork on MAX phases, which sometimes were labeled as M2BC, andsometimes as H-phases[220]. From later 1990s, Barsoum and hisgroup rejuvenated the investigation inMAX phases. A bunch of bulkMAX phases with high purity was realized, and their excellentproperties were characterized[221].

Since MAX phase materials are shown to have an excellentcombination of merits, i.e. they unusually combine the goodproperties of both metals and ceramics, their promising applica-tions are expected, and the spectrum of their application is greatlybroad[222-227]. In an early review paper[227], Barsoum listed thepotential applications, and they cover plural aspects in industrialsectors, such as structural material for high temperature applica-tions, substitute for machinable ceramics, kiln furniture, heat ex-changers, rotating parts, and so on. After rapid development inrecent 10þ years, the applications for MAX phases have beenbecoming more promising, and they extend to electrodes, exhaustgas filters, free-cutting elements, microelectronics, biomaterials,damping materials, corrosion resistant materials, surface coatings,defence equipment, nuclear applications, low dimensional mate-rials, and substrates for CVD diamond, etc.[215]. However, the phe-nomenon of spontaneous whisker growth raises doubt about theirstability and reliability. As the stability is the first requirement forthe materials which are employed, the issue is debarring theprogress of the practical application of the MAX phase materials.

ases: (a) 211, (b) 312, and (c) 413[221].

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6.2. A-element whiskers on MAX phases

6.2.1. Introduction to whiskering phenomena in MAX phasesAlthough MAX phase materials could be dated back to more

than half century ago, it had not come out of abeyance until thefirst report by Barsoum et al., in 1997[228]. The whiskering phe-nomena with MAX phase materials are a concomitant topic withthe researches on MAX phase. Thereby, the research on thewhiskering phenomena with MAX phase materials just surfacedafter the return of the MAX phase happened in Barsoum's group atDrexel University. Primarily, this topic has been conducted by thetwo groups: Barsoum's and Sun's in United States and Japan,respectively, which are also the major groups which have beenfocusing to the researches of MAX phases. We carefully combedthe literature, and to our best knowledge, there is no report onthis topic from a third group. There is an interesting report pub-lished in 2007 on the tin whiskers from a composite system of Ti,Si and C by Li et al.[229], but it essentially has nothing about theMAX phase itself, so we consider this publication to the catalog ofgeneral metal whisker.

This means the writing of this section would intensivelyinclude the major work in this field by the two groups led byBarsoum and Sun, respectively. In brief, according to the models/mechanisms they proposed to understand the whisker growth inMAX phase substrates, the two groups have covered three phasesalong the way they address the whiskering phenomena with MAXphase: (1) de-intercalation of A atoms from basal planes of MAXphase grains account for the A-metal whisker growth, (2) residualfree A atoms existing in between MAX phase grains andoxidation-based model produce the whiskers, and (3) wetting-dewetting behavior of the Ga film existing intergranular makesthe A whisker growth. In the immediate following part, thetypical work from the two groups will be chronologicallyintroduced.

Fig. 12. A series of SEM images of the surface of a Cr2GaN sample exposed to the atmospherhigher magnification; (C) same as (A), but at a different location, (D) sample after six mon

6.2.2. Primary researches conducted in this areaIn 1999, Barsoum and Farber reported in science that bulk

samples of the layered ternary nitride Cr2GaN were observed tospontaneously grow filaments of pure Ga at room temperature[11].The bulk MAX phase samples, after fabrication, were lightly pol-ished and exposed to the ambient environment for 24e48 h, atwhich time filaments, visible to the naked eye, appeared on thesurface, Fig. 12. The formation and growth of the Ga filaments werefound only to occur near the surface, and the roots of the filamentswere shallow (2e20 mm). The authors stated that these Ga fila-ments grew in the sameway hair grows, from the base. The authorssuggested multifold evidences that indicate the filaments wereforced to flow through a channel: (i) no two filaments have thesame cross section or shape; (ii) channel marks, mostly striations,are visible on all of the filament surfaces, along their growth di-rection; and (iii) the presence of helical shapes that can most easilybe obtained by extrusion is seen. For example, the simplest expla-nation for the various shapes taken by the coiled filament (apparentin the near center of Fig. 12(A) and shown at a higher magnificationin Fig. 12(B)), which originally emerged from the substrate at thelower left corner as a tight spiral and continued growing from itsbase, changing shape as it did, is that the shape of the orificethrough which it was extruded was itself continually changingshape.

The Ga source for the filaments growth was ascribed to the de-intercalation of Ga from the basal plane of porous Cr2GaN samples.The authors firstly proposed a possible source for the Ga element toform Ga whiskers, and it is the reactions involving Cr2GaN:

Cr2GaN ¼ Cr2Ga1�yNþ yGaðsÞ (1)

Or more likely:

Cr2GaNþ yxXx ¼ Cr2

�XyGa1�y

�Nþ yGaðsÞ (2)

e for 50 h: (A) filaments observed are pure single crystalline Ga; (B) same as (A), but atths, showing marked increase in density and length of whiskers[11].

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where Xx is a gas in the atmosphere, possibly O2 or N2. At the sametime, the driving force for the whiskers growth was ascribed to theconcomitant positive volume change with the reactions (1), (2),stated above[11].

Furthermore, the authors in the same paper reported someother phenomena for the filament growth, which, according to ourexperiences, are significant to understanding the filament growth,although at that time the authors did not realize it. For example, theauthors found that for the filament growth, either a catalyst,microcracks, or some peculiar geometric arrangement of the poresis required, and the concentration of the filaments was a function ofsample density, with higher density samples showing less activity.

Immediately later, an alternative interpretation for the Ga fila-ment growth was proposed by the same group in a successivesecond article in science[230]. In the second paper, two sets ofsamples were prepared with these materials, porous samples ofTi2GaN, TiGa3, and FeGa3. One set was quenched in water from theprocessing temperature of 800 �C, the other was furnace cooled. ByX-ray diffraction of the samples the authors identified small(ca. 5 vol.%) amounts of unreacted Ga, presenting at the grainboundaries[6], and implied that it is unlikely that the crystallinelattice is the Ga source because the lattice parameters of all samplestested remained unchanged before and after the growth of the Gafilaments. Totally different scenarios were found on the two sets ofsamples: the surfaces of the furnace-cooled samples weresporadically covered by nonwetting Ga droplets, which appear tobe connected to the substrates by what can best be described asliquid Ga stringers or ligaments, increased in size with time, andconversely, the quenched samples grewwhiskers identical to thosepreviously observed[11]. Based on the mutual exclusivity of thewhiskers and droplets, the authors inferred that their source isidentical, and further, the authors concluded that the driving force

Fig. 13. Ga whiskers or micropillars spontaneously g

for the growth of the whiskers is the overall reduction in surfaceenergy and not a reaction with the atmosphere or a phase transi-tion, which had been proposed in their earlier publication[11]. Basedon the observations in this study, the authors concluded that thenecessary requirements needed to grow whiskers are the rightcombination of surface diffusivity, anisotropic growth, and non-wetting, and if these conditions can be achieved for highermelting-point metals, such as Bi and Sn, they could be grown as whiskers aswell. However, the growth habit of these filaments and the specificmechanism for the three requirements, which are essential to givebetter understanding of the phenomenon, were mostly left un-touched in the paper.

A few years after the reports on the spontaneous growth ofmetal whiskers with MAX phase materials in science, the similarphenomena in other MAX phases (Zr2InC, Cr2GaC) were furtherinvestigated by Barsoum, Sun et al.[6,231,232], Fig.13. And the authorscontinued to seek the mechanism and driving force for whiskergrowth. Essentially, the Barsoum's group developed a model basedon the reaction between oxygen and the sprouting metal[6,232].

In 2004, whisker growth behavior on In(indium)-rich Zr2InCsample and 50 wt% AleSn alloy sample were investigated by Bar-soum et al., and the authors proposed a model to explain the ob-servations on In and Sn whiskers and many past observations withrespect to the metal whiskers[6]. Essentially, the authors show thatthe driving force is a reaction between oxygen and the sproutingmetal, which existed in elemental state as intergranular films,Fig. 14. The resultant volume expansion creates a compressivestress that pushes the whiskers up, and the scenario is shownschematically in Fig. 15. Although, in the paper, it was not claimedthat reactionwith the atmosphere is the only reason for the growthof SM whiskers, it seems that, by the proposed model, continuedwhisker growth can be prevented by the provision of an oxygen

rown on the surface of MAX phase Cr2GaC[231].

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Fig. 14. SEM micrograph fractured Zr2InC surface showing In at grain boundaries (thissurface is covered with a thin In film)[6].

P. Zhang et al. / Journal of Materials Science & Technology 31 (2015) 675e698 691

diffusion barrier layer, which was confirmed by the nail polishexperiment in the paper. Within the observation in this research,the oxidation-based process sounds plausible, and the implied so-lution to the pesky problem form the model is simple: oxygenshould be prevented from accessing any potential active surface.However, as the authors stated, there are still some questionsremaining unresolved, such as why whiskers much smaller than1 mm in diameter are not typically observed.

We reported in 2005 the room-temperature spontaneousgrowth of Ga freestanding nanoribbons from Cr2GaC surfaces,Fig. 16, and the freestanding nanoribbons and the ones laying onthe surfaces of the samplewere observed and investigated in detail.Based on the observations, an oxidation-based model was pro-posed to explain the growth of the nanostructures[232]. Basically,we suggested that when, upon fracture, a pre-existing Ga layerdorone that spreads onto the basal planes as a result of fracturedisexposed to oxygen, this layer rapidly oxidizes to form an ultrathinouter oxide skin, which schematically is shown in Fig. 17. Thismodel went well with the observations in the paper, such as thedriving force of the growth, the orientation of the nanoribbons.

However, in the continued work along this topic, in the nextyear 2006, we observed some new morphologies and new clues onthese nanoribbons, Fig. 18, which resulted in an alternative mech-anism for the spontaneous formation of freestanding Ga nano-ribbons on Cr2GaC surfaces[233]. The alternative one seems to besimpler and more natural than the previous one depicted in Fig. 17.Basically, according to the supplemental observations, we believethe presence of freestanding Ga nanoribbons on Cr2GaC surfaces

Fig. 15. Oxidation reaction based whisker growth model: (a) periodic hexagonal arrangemen(white); (b) plane strain finite element mesh for the analysis of the effect of oxide expansi

were the leftover skins of Ga whiskers or spheres that were reab-sorbed into the Cr2GaC grain boundaries, most likely as a result oftheir melting. This proposition is entirely supported by the real-time SEM images shown in Fig. 18, which are analogous to theskins of molting snakes. The analogy of a skin-shedding snakeactually answers half of the question, and we still hold the view forthe room-temperature growth of metal whiskers which wereestablished based on an oxidation reaction model in previouswork[6,27]. However, the reasonswere not entirely clear and therebymore work was needed to understand the intriguing phenomenon.

As the experiences accumulate, we were conscious of theimportance of the existence of the intergranular A-metal films inMAX phase for the A-metal whisker growth. So, we reported ourresearch work on equilibrium Ga intergranular films in Cr2GaC in2013[234]. In this work, the compelling evidences for the presence ofequilibrium intergranular films were observed, under the aid ofdifferential scanning calorimetry, in the �60 �C to 70 �C tempera-ture range, on both sintered bulk Cr2GaC and Cr2GaC powders,Fig. 19. Intriguingly, we observed that a thick Ga pillar had sproutedfrom the Cr2GaC surface, and 2 h later, it was slowly absorbed backinto the sintered bulk, Fig. 20. The sharp endothermic trough,roughly 50 �C below the melting point of bulk pure Ga, in thepowdered samples was taken to be strong evidence for the pres-ence of IGFs in the latter; however, the troughs for the sinteredbody were much more diffuse, suggesting that in this case, a dis-tribution of grain boundary thicknesses exists, Fig. 19(a). Based onthese results it is obvious that: (a) on heating, a clear, sharp,endothermic trough, centered at about�18.4 �C, can be clearly seenfor the powder. For the sintered body, this trough is much smaller;(b) in both cases, a trough centered at about 28.5 �C is observed. Thecenter of the trough for pure Ga is about 35.8 �C and (c) on secondheating of the powder, the area of the �18.4 �C trough increases atthe expense of the one at 28.5 �C. Further cycling resulted in a slowbut steady increase of the area of the �18.4 �C trough at theexpense of the one at 28.5 �C, Fig. 20(c). In Fig. 19(b), it comparesthe DSC results for the powders to those of the sintered sample andpure Ga upon cooling. These results show that: (a) for the sinteredcompound, an exothermic peak initiates at 16.3 �C and extends to atleast �44 �C; (b) for the powder, the exothermic peaks initiatearound 16.3 �C, but the majority of the heat is releasedaround �28 �C. On second cooling, outside a few new sharp peaksat �7.5 �C, �44 �C and �52 �C, the overall shape of the DSC curveremains the same.

The resorption of the thick Ga pillar with time (Figs. 20(a) and(b)) implies that the driving force responsible for its growth isreversible. It follows that the mechanism proposed for the extru-sion of low melting metals, viz. the diffusion of oxygen along theGBs[6] cannot be the operative mechanism here since the latter is

t of Al grains (gray) surrounded by a thin oxide layer (not shown in the Figure) and Snon; (c) contours of out-of-plane stress in Sn in MPa (SM: soft metal, details in ref.[6]).

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Fig. 16. Typical SEM micrographs taken on polished surfaces of Cr2GaC: (AeC) freestanding nanoribbons normal to the surface; (D, E) edge-on observations of the nanoribbonsshowing thickness of less than 10 nm; (F, H, I) long nanoribbons laying on the surface of the sample; (G) selected raster from (F) showing the transparency of the nanoribbon. Darkregions show where grains were pulled out and replaced by diamond suspension used for polishing. Note transparency of nanoribbons[232].

P. Zhang et al. / Journal of Materials Science & Technology 31 (2015) 675e698692

irreversible. The relatively high linear rate and its rapidity furtherpreclude diffusion as the operative mechanism. The only plausiblemechanism remaining, therefore, is a wetting/de-wetting transi-tion. To understand this mechanism for Ga pillar to grow out of thesubstrate and retreat again, one needs to invoke the existence of atemperature-dependent GB segregation, shown in Fig. 20(d). Dur-ing growth, liquid rejected from the GBs must flow from the inte-rior to the root of the growing pillar. Once at the root, it solidifiesand pushes the pillar outward. When the temperature is increased,

Fig. 17. Schematic illustration outlining the spontaneous growth of nanoribbons: (a)upon fracture, the basal planes are covered by a thin Ga film that, in turn, is rapidlycovered by a thin oxide layer; (b) oxidation of the underside of the Ga film results innanoribbons that either grow parallel to the surface (left-hand side) or become free-standing (right-hand side).

the atoms at the root of the pillar premelt and flow back into theGBs, shrinking the pillar.

So far, by the results obtained in our work[234], it is clear that themetal whisker growth with MAX phase substrates is highly likely asurface-related activity, and a process of crystal growth, and thefindings help usmostly exclude the possibility that the stress-basedmechanisms (regardless of the origins of the stresses) for the metalwhisker growth. At the same time, although most researches of thewhiskering phenomenon have been conducted on dense bulkmaterials or films, and the researches performed on such loosepowder-prepared composite samples are few[33,229], it seems that itis more fruitful to work with powders to study this phenomenon.Hence, we have focused on the MAX phase system and kept onemploying powder-based samples to investigate the whiskeringphenomenon.

Recently, more interesting results have been obtained in theCr2GaCeGa system[179]. Essentially, we found that there are threerequisites for Ga whiskers to grow out of Cr2GaCeGa system: (1)the existence of free Ga (not the Ga atoms at basal planes ofCr2GaC), (2) the existence of cleavage planes of Cr2GaC grains,and (3) lower temperature (e.g. e5 �C accelerating the growth). Agrowth model was established based on our findings in theCr2GaCeGa system. In this model, Ga wires would grow wherefree Ga is exposed to the Ga planes of MAX phase crystals, by adriving force related to the temperature-dependent surface ac-tivity. The cleavage plane, shown in Fig. 21, would act as thenucleating sites for Ga whisker initiating. On the cleavage planes,Ga atoms are exposed in an atomistic arrangement which mayserve as the natural seed crystal for the Ga wire growth. Andschematically shown in Fig. 22, there are several scenarios (A, B,C, and D) for Ga wire's nucleating. According to the authors'experiences, the findings and tentative model proposed from ourrecent work[179,234] might be the right track to seek the final goalfor the metal whisker growth, at least for the whiskering

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Fig. 18. (a) Ga whisker at the root of a nanoribbon; (b) disappeared shortly after it was photographed. The two micrographs (a) and (b) were taken 14 min apart; the Ga whisker waslast seen 6 min before its disappearance was noticed. Micrographs (c) and (d) are magnified views of the roots shown in (a) and (b), respectively[233].

P. Zhang et al. / Journal of Materials Science & Technology 31 (2015) 675e698 693

phenomenon happening with MAX phase based composite, if itdoes not apply generally for all the metal whiskeringphenomena.

6.2.3. Significance of the research on the A-element whiskering inMAX phase materials

Predicted by the model developed in our previous work[179] andthe previously reported Ga/In whiskers[6,11,232,234], it is likely ageneral phenomenon for the whiskering phenomenon in A-element-richMAX phases. Considering the different melting points

Fig. 19. Summary of DSC of powders, sintered compacts and pure Ga upon: (a) heating andNote: all runs and their designations are color coordinated[234].

of A-elements in different instances of MAX phases, the whiskeringphenomenon might happen at different (elevated) temperatureranges. The confirmation of the generality of A-element whiskeringphenomenon with MAX phase materials is an ongoing projectwithin our group, and some preliminary results show Ti2SnCeSncomposite behaves in a similar way as Cr2GaCeGa composites. Andwe put Cr2AlCeAl and even Ti3SiC2eSi in our agenda for thewhiskering behavior investigation. This possibly general whisker-ing behavior is critical for some MAX instances whose industrialapplication is about to be mature, such as Ti2SnC[235,236] and

(b) cooling. The first and second heating and cooling runs for the powders are shown.

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Fig. 20. Time lapse SEM micrographs of a Ga micro-pillar as it is resorbed into the sintered matrix: (a) initially and (b) after about 2 h; (c) plots the areas of the endothermic troughsat �18.4 �C and 28 �C as a function of heating/cooling cycles; inset in (b) is schematic of how a thin quasi-liquid layer can be stabilized at a GB; (d) sketches the proposed absorptionversus temperature relationship needed to explain the extrusion/resorption of the micro-pillars[234].

P. Zhang et al. / Journal of Materials Science & Technology 31 (2015) 675e698694

Ti3SiC2[215]. The potential risks for Ti2SnC and Ti3SiC2 are especiallyprofound, because most potential applications of MAX phase ma-terials emphasize and harness the electrical conductivity of thematerials, and the A-element whiskers/wires are highly conductive.

Fig. 21. Crystal structure of Cr2GaC (left), and the schematic layers of Cr, Ga and C atoms (rignucleate[179].

Criteria on the A-element whiskering phenomenon with MAXphase materials are urgent, and the corresponding mitigation/elimination strategies are significant for the commercialization ofthis family of new materials.

ht); the dash lines represent the cleavage planes where it is possible for the Ga wire to

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Fig. 22. Schematic diagram of different Ga wire nucleating scenarios: Phase I: thecleavage planes of Cr2GaC grain; Phase II: Ga nuclei/nucleus on the planes; Phase III: Gawire growing. (A) A single Ga nuclei completely occupies a cleavage plane; (B) a singlenuclei partially occupies a cleavage plane; (C) plural nucleus (disconnected) scatter ona cleavage plane and (D) plural cleavage planes in close contact with each othersimultaneously occupied by Ga nucleus[179].

P. Zhang et al. / Journal of Materials Science & Technology 31 (2015) 675e698 695

On the other hand, as elaborated in our previous publication andothers'[6,11,179,232,234], the exploring growth mechanism of whiskerswith MAX phase system might lead to a new standpoint to thegeneral metal whiskers, and this would redirect researchers out ofthe patterned battle with whiskers for almost 70 years.

6.3. Linkage of the whisker growth phenomenon across differentsubstrates

Albeit the substrate of MAX phases (a ternary carbides/nitrides)are different from the substrates (metals/alloys) where generalmetal whiskers grow, the whiskering phenomenon across thespectrum of all the substrates share most features, by which theauthors tend to accept the assumption that the same mechanismoperates behind these whiskering phenomenon across the spec-trum of all the substrates, including theMAX phases. As the authors'discussion in one piece of our previous work[179], the role ofheterogenous interface on the whisker incubation should be seri-ously considered. Particularly, there has been a flurry of publica-tions (majorly by Xian, Liu et al.) on the tin whisker growth fromrare earth intermetallic compounds (RESn3: RE ¼ Nd, La,Ce)[44,116,148,151,153,167,185,189,199,237e239], where the whiskers werereported to grown on the interface of RESn3 phase and Sn. Based onthe morphological linkage and some similar process behaviors(incubation period, temperature-affected growth rate, etc.) be-tween the wires grown on MAX-A composite system, RESn3, andmetal/alloy substrates, the authors propose an incipient theory thatthe heterogenous interface plays a critical role in the nucleating ofwhiskers, which thus determines the subsequent growth of whis-kers. This tentative remark has to be further tested and developedin the future, but its significancewouldmatter a lot, considering thecurrent patterned situation of the interpretation-seeking researchin this filed. By grasping more common points between whiskergrowth phenomena from different substrates, new light possiblycasts on the mechanism-seeking researches.

7. Perspectives

Whisker growth from solids has been documented as an engi-neering problem in the public domain for almost 70 years, and itsundermining the reliability of the electronics-rich systems has beenbringing grave loss to a wide spectrum of sectors, and the life ofindividuals. Unfortunately, a basic understanding upon the truephysics of the whiskering phenomenon remains elusive, whichmakes it impossible for engineers to provide a means for predictingwhisker growth and risk, and ultimately prevention strategies. Thehuge demand of coating metals in the electronics industry, and thetrend of Pb-free movement for the sake of sound environment urgeresearchers to resolve the long time interpretation-resistantwhisker problem with metals. As the applications of MAX phasematerials progress, the impetus to study the properties/problems ofMAX phase materials also increases.

Thanks to the RoHS, Pb-addition solution to the engineeringproblem induced by Sn whiskers is phasing out, which makes thewhisker-induced risks appear again. Considering the current situa-tion of the lead-free strategies stated in section 3.3.2, foreseeably,before a lead-free solutionaseffective asPb-addition is found, thePb-additionwould have to be put in a dilemma constructed by the hardchoices between sound environment and reliability of electronics.

The current growth mechanisms/theories in public domainshould be re-evaluated, especially the role of stress in whiskernucleation and growth. More attentions and researches should bedirected to the whisker growth in composite systems, such as theMAX phase systems, Sn-RE systems, where the researches arerelatively new and insufficient. In our opinion, it would be mean-ingful for researchers to study the whisker growth phenomenon todivide the whiskering phenomenon into two phases: nucleatingand growing. In reality, the whiskering phenomenon is an aniso-tropic growth of crystals. To realize the anisotropic growth of acrystal, a seed with preferred growth direction is required. For thisviewpoint, we preliminarily proposed a catalyst-based modelbased on the experimental data from the Cr2GaCeGa system[179],which is probably a promising direction to address the mechanisminterpretation.

Researches on Ga/In whiskers/wires with MAX phase substrateswould be potentially fruitful for the mechanism-seeking purpose.Considering the high level of similarity between the whiskers fromMAX phase system and general metal whiskers, the similar nucle-ation and growth mechanism(s) would be rationally expected.According to our previous work[179,187,232e234], the Ga wires grownfrom Cr2GaCeGa system have a controllable incubation period byenvironmental parameters, and the very fast growth rate(~200 nm/s) is easily realized. In addition, the wires were found togrow from very loose substrate (where it is stress-free)[179,231]. Allthe new characteristics of Ga wires from Cr2GaCeGa system,together with the low melting point of Ga, are facilitating the ob-servations of the whiskering behaviors. The near temperaturemelting point of Ga is of a big convenience to evaluate the role ofcrystallization in the whisker formation. The controllable and shortincubation period and the rapid growth of Ga wires would enablereal-time investigations into the nucleation and growth processeswhich were not practical in the past with other metals such as tin,zinc.

Acknowledgments

The research is supported by the National Natural ScienceFoundation of China (No. 51272043), Jiangsu Planned Projects forPostdoctoral Research Funds (1302008A), China Postdoctoral Sci-ence Foundation (2014M551484), and the Fundamental ResearchFunds for the Central Universities (3212004603).

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References

[1] K.G. Compton, A. Mendizza, S.M. Arnold, Corrosion 7 (1951) 327e334.[2] M.O. Peach, J. Appl. Phys. 23 (1952) 1401e1403.[3] F.C. Frank, Philos. Mag. 44 (1953) 854e860.[4] W. Ellis, D. Gibbons, R. Treuting, in: R.H. Doremus, B.W. Roberts, D. Turnbull

(Eds.), Growth and Perfection of Crystals, John Wiley, New York, 1958, pp.102e120.

[5] C. Xu, Y. Zhang, C. Fan, J. Abys, L. Hopkins, F. Stevie, Circuitree Magazine 15(2002). S06e2-1.

[6] M. Barsoum, E. Hoffman, R. Doherty, S. Gupta, A. Zavaliangos, Phys. Rev. Lett.93 (2004) 206104.

[7] G.T. Galyon, IEEE Trans. Electron. Packag. Manuf. 28 (2005) 94e122.[8] B.D. Dunn, Circuit World 2 (1976) 32e40.[9] G.W. Stupian, Tin Whiskers in Electronic Circuits, 1992. TR-92(2925)-7.

[10] J.R. Downs, R.M. Francis, Metal Finishing 92 (1994) 23e25.[11] M.W. Barsoum, L. Farber, Science 284 (1999) 937e939.[12] Q. Li, Y.C. Chan, Z. Chen, J. Mater. Sci.-Mater. Electron. 25 (2014) 1222e1227.[13] NASA, http://nepp.nasa.gov/whisker/.[14] J.W. Osenbach, JOM 63 (2011) 57e60.[15] C.C. Wei, P.C. Liu, C. Chen, K.N. Tu, J. Mater. Res. 23 (2008) 2017e2022.[16] J. Brusse, Presentation Slides, 2003, p. 8.[17] Z.M. Sun, H. Hashimoto, M.W. Barsoum, Acta Mater. 55 (2007) 3387e3396.[18] L. Ercker, Treaties on Ores and Assaying (1574, 2nd ed. 1580), translated by

A.G. Sisco, C.S. Smith, University of Chicago, 1951.[19] H.L. Cobb, Monthly Rev. Am. Electroplaters Soc. 33 (1946) 28e30.[20] G. Sienes, J. Phys. Soc. Jpn. 15 (1960) 1199e1210.[21] T. Shibutani, Q. Yu, M. Shiratori, M.G. Pecht, Microelectron. Reliab. 48 (2008)

1033e1039.[22] B.Z. Lee, D.N. Lee, Acta Mater. 46 (1998) 3701e3714.[23] J.W. Osenbach, J.M. deLucca, B.D. Potteiger, A. Amin, F.A. Baiocchi, J. Mater.

Sci.-Mater. Electron. 18 (2007) 283e305.[24] S.E. Koonce, S.M. Arnold, J. Appl. Phys. 25 (1954) 134.[25] S.E. Koonce, S.M. Arnold, J. Appl. Phys. 24 (1953) 365.[26] S.M. Arnold, in: Proceedings of the IEEE Electronic Components Technology

Conference, 1959, pp. 75e82.[27] Z.M. Sun, M.W. Barsoum, J. Mater. Res. 20 (2005) 1087e1089.[28] I.A. Blech, P.M. Petroff, K.L. Tai, V. Kumar, J. Cryst. Growth 32 (1975)

161e169.[29] Y. Fukuda, T. Fang, S. Ganesan, M. Osterman, M. Pecht, Tin Whiskers in

Electronics, Lead-free Electronics, JohnWiley & Sons, Inc, 2006, pp. 551e625.[30] M. Saka, F. Yamaya, H. Tohmyoh, Scripta Mater. 56 (2007) 1031e1034.[31] K.H. Dietz, Circuitree Magazine 19, 2006, p. 56.[32] J. Brusse, H. Leidecker, L. Panashchenko, Metal Whiskers: Failure Modes and

Mitigation Strategies, 2007. Available from: http://nepp.nasa.gov/whisker.[33] Y.T. Cheng, A.M. Weiner, C.A. Wong, M.P. Balogh, M.J. Lukitsch, Appl. Phys.

Lett. 81 (2002) 3248e3259.[34] J.A. Brusse, G.J. Ewell, J.P. Siplon, in: CARTS 2002: 22nd Capacitor and Resistor

Technology Symposium, 2002.[35] H. Livingston, BAE SYSTEM Information and Electronic Warfare Systems,

2003.[36] S. Mathew, M. Osterman, T. Shibutani, Q. Yu, M. Pecht, in: HDP’07, 2007.[37] J. Brusse, M. Sampson, IEEE IT Prof. 6 (2004) 43e47.[38] NASA, http://nepp.nasa.gov/whisker/anecdote/.[39] NASA, http://nepp.nasa.gov/whisker/failures/.[40] J.D. Eshelby, Phys. Rev. 91 (1953) 755e756.[41] S. Amelinckx, W. Bontinck, W. Dekeyser, F. Seitz, Philos. Mag. 2 (1957)

355e378.[42] W.C. Ellis, D.F. Gibbons, R.G. Treuting, in: International Conference on Crystal

Growth, Cooperstown, New York, August 27e29, 1958.[43] M.A. Dudek, N. Chawla, Acta Mater. 57 (2009) 4588e4599.[44] Z.S. Zhao, A.P. Xian, Chin. J. Nonferr. Met. 22 (2012) 2267e2276.[45] T.A. Woodrow, in: IPC/JEDEC 8th International Conference on Lead-Free

Electronic Components and Assemblies, San Jose, CA, April 18e20, 2005.[46] S.M. Arnold, Plating 53 (1966) 96e99.[47] W.J. Boettinger, C.E. Johnson, L.A. Bendersky, K.W. Moon, M.E. Williams,

G.R. Stafford, Acta Mater. 53 (2005) 5033e5050.[48] G.T. Galyon, IBM eSG Group, Poughkeepsie, New York, 2004.[49] J. Smetana, IEEE Trans. Electron. Packag. Manuf. 30 (2007) 11e22.[50] S.L. Rovner, Can. J. Chem. 85 (2007) 30e33.[51] NASA, Parts Advisory: Tin Whiskers, 2004.[52] H. Leidecker, J. Brusse, Slides, 2006.[53] Wikepidia, Available from: http://en.wikipedia.org/wiki/Millstone_Nuclear_

Power_Plant#Events.[54] J. Brusse, in: Slides-Proceedings of AESF SUR/FIN, June 24e27, 2002.[55] B. Levine, Electron. News 48 (2) (2002).[56] E. George, M. Pecht, Microelectron. Reliab. 54 (2014) 214e219.[57] K.J. Courey, S.S. Asfour, J.A. Bayliss, L.L. Ludwig, M.C. Zapata, IEEE Trans.

Electron. Packag. Manuf. 31 (2008) 32e40.[58] K.J. Courey, S.S. Asfour, A. Onar, J.A. Bayliss, L.L. Ludwig, M.C. Wright, IEEE

Trans. Electron. Packag. Manuf. 32 (2009) 41e48.[59] G.W. Stupian, Aerospace Report No. TR-92(2925)-7, 1992, pp. 1e21.

[60] J. Brusse, in: Slides-proceedings of AESF SUR/FIN 2002, June 24e27, 2003.[61] M.E. McDowell, in: Proceedings of Aerospace Applications Conference, 1993.[62] H. Qi, S. Ganesan, M. Pecht, Microelectron. Reliab. 48 (2008) 663e674.[63] M. Pecht, R. Jaai, Microelectron. Reliab. 50 (2010) 317e323.[64] P. S€oderholm, Reliab. Eng. Syst. Safe 92 (2007) 1e14.[65] D.A. Thomas, K. Ayers, M. Pecht, Microelectron. Reliab. 42 (2002) 641e651.[66] K. Jacobsen, The Guardian, 2008.[67] P. Daddona, Reactor Shutdown: Dominion Learns Big Lesson from a Tiny ‘Tin

Whisker', the Day, 2005.[68] Jordan Robertson, USA TODAY, Associated Press, 10/7/2007.[69] Jordan Robertson, Ocala Star-Banner, 10/6/2007.[70] Sharon Silke Carty, Huffington Post, 01/23/2012.[71] E. Chason, N. Jadhav, F. Pei, E. Buchovecky, A. Bower, Prog. Surf. Sci. 88 (2013)

103e131.[72] J.S. Kadesch, J. Brusse, NASA EEE Links Newsletter 6 (2001) 1e7.[73] B. Nordwall, Aviation Week Space Technol. (1986) 65e70.[74] Food and Drug Administration, March, 1986.[75] Westinghouse Electric Company, Nuclear Technical Bulletin, Number

TB-02-5, 07/12/2002.[76] Westinghouse Electric Company, Nuclear Technical Bulletin, Number

TB-05-4, 06/08/2005.[77] P. Daddona, The Day, Waterford, CT, 2005.[78] Wikipedia, http://en.wikipedia.org/wiki/Whisker_(metallurgyhttp://en.

wikipedia.org/wiki/Whisker_(metallurgy)#Millstone_Nuclear_Power_Plant.[79] National Highway Traffic Safety Administration Toyota Unintended Accel-

eration Investigation, 2011. http://www.nhtsa.gov/UA.[80] S.M. Arnold, in: Proc. of the IEEE Elec. Comp. Conf, 1959.[81] Elimination of Lead from Electrical and Electronic Equipment - the Dilemma

of Tin-whisker Growth, 2004. Available from: http://www.esa.int/esapub/eurocomp/eurocomp7.pdf.

[82] R.E.U.D. 2002/95/EC, Off. J. Eur. Union, L 37 (2003) 19e23.[83] H. Liang, Printed Circuit Inf. 11 (2007) 55e58.[84] W.S. Hong, C.M. Oh, D.S. Kim, J. Electron. Mater. 42 (2012) 332e347.[85] N. Vo, M. Kwoka, P. Bush, IEEE Trans. Electron. Packag. Manuf. 28 (2005) 3e9.[86] V. Schroeder, P. Bush, M. Williams, N. Vo, H.L. Reynolds, IEEE Trans. Electron.

Packag. Manuf. 29 (2006) 231e238.[87] T. Fang, Tin Whisker Risk Assessment Studies, Ph.D. Dissertation, University

of Maryland, 2005.[88] R.D. Hilty, in: NEMI Lead Fres Summit Meeting, 2004.[89] T. Fang, M. Osterman, M. Pecht, Microelectron. Reliab. 46 (2006) 846e849.[90] J. Brusse, H. Leidecker, L. Panashchenko, in: Slides-2nd International Sym-

posium on Tin Whiskers, 2008.[91] V. Eveloy, S. Ganesan, Y. Fukuda, W. Ji, M.G. Pecht, IEEE Trans. Comp. Packag.

Technol. 28 (2005) 884e894.[92] JEDEC/IPC, Current Tin Whiskers Theory and Mitigation Practices Guideline,

2006, pp. 1e30. Available from: www.jedec.org.[93] S. Mathew, M. Osterman, T. Shibutani, Y. Qiang, M. Pecht, in: International

Symposium on High Density Packaging and Microsystem Integration, HDP'07, 26e28 June, 2007.

[94] S.M. Arnold, Growth and Properties of Metal Whiskers, Bell TelephoneLaboratories, 1956.

[95] S. Britton, Trans. Inst. Metal Finishing 52 (1974) 95e102.[96] R.P. Diehl, Metal Finishing 91 (1993) 37e42.[97] J.L. Jo, S. Nagao, K. Hamasaki, M. Tsujimoto, T. Sugahara, K. Suganuma,

J. Electron. Mater. 43 (2014) 1e8.[98] iNEMI Tin Whisker Projects, Available from: http://www.inemiold.org/cms/

projects/ese/tin_whisker.html.[99] TycoElectronics, Keeping Tin Solderable, 2004. Available from: http://www.

amp.com/products/technology/articles/dd47a.stm.[100] R. Schetty, W. Sepp, IEEE Minimization of Tin Whisker Growth for Ultra-low

Tin Whisker Applications, 2009, pp. 225e234.[101] Y. Hada, O. Morikawa, H. Togami, in: 26th Annual National Relay Conference,

1978.[102] R. Schetty, Circuit World 27 (2001) 17e20.[103] Y. Zhang, C. Xu, J. Abys, C. Fan, A. Cysotskaya, in: Proc. IPC SMEMA Council

Apex, 2002.[104] K. Whitlaw, J. Crosby, in: Proceedings of SESF SUR/FIN, 2002.[105] M. Rozen, Plating 55 (1968) 1155e1168.[106] iNEMI Recommendations on Lead-Free Finishes for Components Used in

High-Reliability Products, Version 4 (12-1-06). Available from: http://thor.inemi.org/webdownload/projects/ese/tin_whiskers/Pb-Free_Finishes_v4.pdf.

[107] V. Glazunova, N. Kudryavtsev, Translated from Zhurnal Prikladnoi Khimii 36(1963) 543e550.

[108] H. Leidecker, J.S. Kadesch, in: Proceedings of IMAPS Nordic, the 37th IMAPSNordic Annual Conference, 2000.

[109] J. Brusse, in: AESF SUR/FIN Proceedings, Orlando, FL, June 24e27, 2002.[110] S. Han, M. Osterman, S. Meschter, M. Pecht, J. Electron. Mater. 41 (2012)

2508e2518.[111] B. Horv�ath, Microelectron. Reliab. 53 (2013) 1009e1020.[112] W. Diyatmika, J. Chu, Y. Yen, in: Microsystems, Packaging, Assembly and

Circuits Technology Conference (IMPACT), 2013 8th International, 2013.

Page 24: Spontaneous Growth of Metal Whiskers on Surfaces of Solids ... · Spontaneous Growth of Metal Whiskers on Surfaces of Solids: A Review Peigen Zhang 1, Yamei Zhang 2, Zhengming Sun

P. Zhang et al. / Journal of Materials Science & Technology 31 (2015) 675e698 697

[113] E.R. Crandall, Factors Governing Tin Whisker Growth, 2013.[114] D. Bunyan, M.A. Ashworth, G.D. Wilcox, R.L. Higginson, R.J. Heath, C. Liu,

Trans. Inst. Metal Finishing 91 (2013) 249e259.[115] F. Pei, C. Briant, H. Kesari, A. Bower, E. Chason, Scripta Mater. 93 (2014)

16e19.[116] H. Ye, S. Xue, W. Long, Q. Zhang, J. Ma, Trans. China Weld. Inst. 34 (2013)

59e61.[117] H. Ye, S. Xue, C. Chen, Y. Li, Solder. Surf. Mt. Technol. 25 (2013) 139e144.[118] Y. Wang, J.E. Blendell, C.A. Handwerker, J. Mater. Sci. 49 (2013) 1099e1113.[119] D. Susan, J. Michael, R.P. Grant, B. McKenzie, W.G. Yelton, Metall. Mater.

Trans. A 44 (2013) 1485e1496.[120] A. Skwarek, K. Witek, M. Pluska, A. Czerwinski, Acta Phys. Polonica A 123

(2013) 430e431.[121] J. Cheng, F. Yang, P. Vianco, B. Zhang, J.M. Li, J. Electron. Mater. 40 (2011)

2069e2075.[122] N. Jadhav, J. Wasserman, F. Pei, E. Chason, J. Electron. Mater. 41 (2012)

588e595.[123] S.J. Shin, J.J. Kim, Y.K. Son, J. Mechan. Sci. Technol. 23 (2010) 2885e2890.[124] L.A. Pinol, J. Melngailis, H.K. Charles, D.M. Lee, R. Deacon, G. Coles,

G. Clatterbaugh, IEEE Trans. Comp. Packag. Manuf. Technol. 1 (2011)2028e2032.

[125] N. Jadhav, E.J. Buchovecky, L. Reinbold, S. Kumar, A.F. Bower, E. Chason, IEEETrans. Electron. Packag. Manuf. 33 (2010) 183e192.

[126] E. Chason, N. Jadhav, W.L. Chan, L. Reinbold, K.S. Kumar, Appl. Phys. Lett. 92(2008) 171901.

[127] E. Chason, N. Jadhav, F. Pei, JOM 63 (2011) 62e68.[128] U. Lindborg, Metall. Trans. A 6 (1975) 1581e1586.[129] A. Baated, K.S. Kim, K. Suganuma, J. Mater. Sci.-Mater. Electron. 22 (2011)

1685e1693.[130] W. Boettinger, C. Johnson, L. Bendersky, K.W. Moon, M. Williams, G. Stafford,

Acta Mater. 53 (2005) 5033e5050.[131] U. Lindborg, Acta Metall. 24 (1976) 181e186.[132] J. Franks, Nature 177 (1956) 984.[133] J. Franks, Acta Metall. 6 (1958) 103e109.[134] I. Boguslavsky, P. Bush, in: APEX Conference, March, 2003.[135] T. Kakeshita, K.I. Shimizu, R. Kawanaka, T. Hasegawa, J. Mater. Sci. 17 (1982)

2560e2566.[136] J. LeBret, M. Norton, J. Mater. Res. 18 (2003) 585e593.[137] J.W. Osenbach, J. Appl. Phys. 106 (2009) 094903.[138] E. Buchovecky, N. Jadhav, A. Bower, E. Chason, J. Electron. Mater. 38 (2009)

2676e2684.[139] E.J. Buchovecky, N. Du, A.F. Bower, Appl. Phys. Lett. 94 (2009) 191904.[140] J. Cheng, Tin Whiskers in Electronic Packaging: Mechanism and Modeling,

University of Rochester, 2011.[141] K. Tu, Phys. Rev. B 49 (1994) 2030e2034.[142] K.N. Tu, J.C.M. Li, Mater. Sci. Eng. A 409 (2005) 131e139.[143] J. Liang, Z.H. Xu, X. Li, J. Mater. Sci.-Mater. Electron. 18 (2007) 599e604.[144] K. Zeng, K.N. Tu, Mater. Sci. Eng. R 38 (2002) 55e105.[145] K. Suganuma, A. Baated, K.S. Kim, K. Hamasaki, N. Nemoto, T. Nakagawa,

T. Yamada, Acta Mater. 59 (2011) 7255e7267.[146] H.L. Reynolds, J.W. Osenbach, G. Henshall, R.D. Parker, S. Peng, IEEE Trans.

Electron. Packag. Manuf. 33 (2010) 1e15.[147] J.W. Osenbach, H.L. Reynolds, G. Henshall, R.D. Parker, S. Peng, IEEE Trans.

Electron. Packag. Manuf. 33 (2010) 16e24.[148] L. Hua, C. Yang, Microelectron. Reliab. 51 (2011) 2274e2283.[149] B. Jiang, A.P. Xian, Phil. Mag. Lett. 87 (2007) 657e662.[150] B. Jiang, A.P. Xian, J. Mater. Sci.-Mater. Electron. 18 (2007) 513e518.[151] A.P. Xian, M. Liu, J. Mater. Res. 24 (2009) 2775e2783.[152] M. Liu, A.P. Xian, J. Electron. Mater. 38 (2009) 2353e2361.[153] M. Liu, A.P. Xian, J. Alloy. Compd. 486 (2009) 590e596.[154] F.R.N. Nabaro, P.J. Jackson, in: International Conference on Crystal Growth,

Cooperstown, New York, August 27e29, 1958.[155] G. Baker, Acta Metall. 5 (1957) 353e357.[156] H. Smith, R. Rundle, J. Appl. Phys. 29 (1958) 679e683.[157] R.M. Fisher, L.S. Darken, K.G. Carroll, Acta Metall. 2 (1954) 368e373.[158] V. Glazunova, Kristallografiya 7 (1962) 761e768.[159] C.H. Pitt, R.G. Henning, J. Appl. Phys. 35 (1964) 459e460.[160] N. Sabbagh, Metal Finishing 73 (1975) 27e31.[161] H.P. Howard, J. Cheng, P.T. Vianco, J.C.M. Li, Acta Mater. 59 (2011)

1957e1963.[162] G.T. Galyon, L. Palmer, IEEE Trans. Electron. Packag. Manuf. 28 (2005)

17e30.[163] G.T.T. Sheng, C.F. Hu, W.J. Choi, K.N. Tu, Y.Y. Bong, L. Nguyen, J. Appl. Phys. 92

(2002) 64.[164] E.N. Hoffman, M.W. Barsoum, W. Wang, R.D. Doherty, in: The 51st IEEE Holm

Conference, 26e28 Sep., 2005.[165] T. Shibutani, J. Wu, Q. Yu, M. Pecht, Microelectron. Reliab. 48 (2008)

1613e1627.[166] W.J. Choi, G.T. Galyon, K.N. Tu, T.Y. Lee, in: The Structure and Kinetics of Tin-

whisker Formation and Growth on Hihg Tin Content Finishes, 2005 (Chapter21).

[167] C.F. Li, Z.Q. Liu, Acta Mater. 61 (2013) 589e601.

[168] H. Moriuchi, Y. Tadokoro, M. Sato, T. Furusawa, N. Suzuki, J. Electron. Mater.36 (2007) 220e225.

[169] T. Shibutani, Q. Yu, T. Yamashita, M. Shiratori, IEEE Trans. Electron. Packag.Manuf. 29 (2006) 259e264.

[170] K. Chen, G. Wilcox, Phys. Rev. Lett. 94 (2005) 66104.[171] B. Jiang, A.P. Xian, Microelectron. Reliab. 48 (2008) 105e110.[172] K. Kim, C. Yu, J. Yang, Microelectron. Reliab. 46 (2006) 1080e1086.[173] K.S. Kim, C.H. Yu, J.M. Yang, Thin Solid Films 504 (2006) 350e354.[174] J.W. Shin, E. Chason, J. Mater. Res. 24 (2009) 1522e1528.[175] K.S. Kim, C.H. Yu, J.M. Yang, Microelectron. Reliab. 46 (2006) 1080e1086.[176] Y. Nakadaira, S. Jeong, J. Shim, J. Seo, S. Min, T. Cho, S. Kang, S. Oh, Micro-

electron. Reliab. 48 (2008) 83e104.[177] N. Jadhav, M. Williams, F. Pei, G. Stafford, E. Chason, J. Electron. Mater. 42

(2013) 312e318.[178] Y. Zhang, C. Fan, C. Xu, O. Khaselev, J. Abys, Circuitree Magazine 17 (2004)

70e73.[179] P. Zhang, L.W. Shen, J. Ouyang, Y. Zhang, S. Wu, Z.M. Sun, J. Alloy. Compd. 619

(2015) 488e497.[180] N. Saunders, A.P. Miodownik, Bull. Alloy Phase Diagrams 11 (1990) 278e287.[181] G.T. Galyon, C. Xu, S. Lal, B. Notohardjono, L. Palmer, in: 2005 Electronic

Components and Technology Conference, 2005.[182] K. Tu, C. Chen, A.T. Wu, J. Mater. Sci.-Mater. Electron. 18 (2007) 269e281.[183] J.W. Osenbach, J.M. DeLucca, B.D. Potteiger, A. Amin, R.L. Shook, F.A. Baiocchi,

IEEE Trans. Electron. Packag. Manuf. 30 (2007) 23e35.[184] J.W. Osenbach, R.L. Shook, B.T. Vaccaro, B.D. Potteiger, A.N. Amin,

K.N. Hooghan, P. Suratkar, P. Ruengsinsub, IEEE Trans. Electron. Packag.Manuf. 28 (2005) 36e62.

[185] C.F. Li, Z.Q. Liu, J.K. Shang, J. Alloy. Compd. 550 (2013) 231e238.[186] Z.M. Sun, S. Gupta, H.H. Ye, M.W. Barsoum, J. Mater. Res. 20 (2005)

2618e2621.[187] P. Zhang, Y. Liu, J. Ouyang, Y. Zhang, Z. Sun, To be published.[188] M. Liu, A.P. Xian, J. Mater. Sci. Eng. 27 (2009) 314e323.[189] M. Liu, A.P. Xian, Microelectron. Reliab. 49 (2009) 667e672.[190] M. Dudek, N. Chawla, Acta Mater. 57 (2009) 4588e4599.[191] H.C. Shi, A.P. Xian, J. Electron. Mater. 40 (2011) 1962e1966.[192] B. Dunn, Met. Mater. 34 (1975) 32e40.[193] P. Su, Growth Mechanisms and Mitigation Strategies of Tin Whisker Growth,

Lead-Free Solder Process Development, John Wiley & Sons, Inc, 2011, pp.125e150.

[194] P. Matkowski, M. Sakowicz, A. Wymyslowski, J. Felba, A. Ambroziak, in: XXIXInternational Conference of IMAPS Poland Chapter, Koszalin-darlowko,September, 2005.

[195] C.J. Lee, H. Reynolds, in: 2006 Int. Conf. Electron. Mater. Packaging 1e3, 2006,pp. 697e717.

[196] K.S. Kim, C.H. Yu, S.W. Han, K.C. Yang, J.H. Kim, Microelectron. Reliab. 48(2008) 111e118.

[197] K.N. Tu, C. Chen, A.T. Wu, J. Mater. Sci-Mater. Electron 18 (2007) 269e281.[198] T.H. Chuang, Scripta Mater. 55 (2006) 983e986.[199] P. Xue, S. Xue, Y. Shen, Z. Xiao, H. Zhu, W. Long, X. Yu, Solder. Surf. Mt.

Technol. 24 (2012) 280e286.[200] M. Murakami, Thin Solid Films 55 (1978) 101e111.[201] J.P. Monchoux, E. Rabkin, Acta Mater. 50 (2002) 3161e3176.[202] M. Murakami, P. Chaudhari, Thin Solid Films 46 (1977) 109e115.[203] D.A. Gidlow, Occup. Med. 54 (2004) 76e81.[204] J. Chan, M. Sim, R. Golec, A. Forbes, Occup. Med-oxford. 50 (2000)

398e405.[205] L. Gerhardsson, D. Brune, G.F. Nordberg, P.O. Wester, Sci. Total. Environ. 50

(1986) 65e85.[206] L.M. Heath, K.L. Soole, M.L. McLaughlin, G.T.A. McEwan, J.W. Edwards, Rev.

Environ. Health (2003) 231.[207] L. Gerhardsson, V. Englyst, N.G. Lundstr€om, G. Nordberg, S. Sandberg,

F. Steinvall, J. Trace. Elem. Med. Bio. 9 (1995) 136e143.[208] W.I. Manton, C.R. Angle, K.L. Stanek, Y.R. Reese, T.J. Kuehnemann, Environ.

Res. 82 (2000) 60e80.[209] J. Grigg, Arch. Dis. Child. 89 (2004) 244e250.[210] P. Grandjean, Environ. Res. 17 (1978) 303e321.[211] R.A. Baan, Y. Grosse, Mutat. Res.-Fundam. Mol. Mech. Mutagen. 553 (2004)

43e58.[212] R.M. El-Sherif, K.M. Ismail, W.A. Badawy, Electrochim. Acta 49 (2004)

5139e5150.[213] S. Kuyucak, M. Sahoo, Can. Metall. Quart. 35 (1996) 1e15.[214] S. Britton, K. Bright, Metallurgia 56 (1957) 163e168.[215] Z.M. Sun, Int. Mater. Rev. 56 (2011) 143e166.[216] M. Radovic, M.W. Barsoum, Am. Ceram. Soc. Bull. 92 (2013) 20e27.[217] M.W. Barsoum, MAX Phases Properties of Machinable Ternary Carbides and

Nitrides, John Wiley & Sons, 2013.[218] E.N. Hoffman, D.W. Vinson, R.L. Sindelar, D.J. Tallman, G. Kohse,

M.W. Barsoum, Nucl. Eng. Des. 244 (2012) 17e24.[219] M.W. Barsoum, T. El-Raghy, Am. Sci. 89 (2001) 334e343.[220] V.H. Nowotny, Prog. Solid State Chem. 5 (1971) 27e70.[221] M. Barsoum, MAX Phases Properties of Machninable Ternary Carbides and

Nitrides, Wiley-VCH, Singapore, 2013.

Page 25: Spontaneous Growth of Metal Whiskers on Surfaces of Solids ... · Spontaneous Growth of Metal Whiskers on Surfaces of Solids: A Review Peigen Zhang 1, Yamei Zhang 2, Zhengming Sun

P. Zhang et al. / Journal of Materials Science & Technology 31 (2015) 675e698698

[222] M.W. Barsoum, T. El-Raghy, C.J. Rawn, W.D. Porter, H. Wang, E.A. Payzant,C.R. Hubbard, J. Phys. Chem. Solids 60 (1999) 429e439.

[223] M.W. Barsoum, G. Yaroschuk, S. Tyagi, Scripta Mater. 37 (1997) 1583e1591.[224] M. Barsoum, T. El-Raghy, J. Mater. Synth. Process. 5 (1997) 197e216.[225] M.W. Barsoum, T. El-Raghy, J. Am. Ceram. Soc. 79 (1996) 1953e1956.[226] M.W. Barsoum, D. Brodkin, T. El-Raghy, Scripta Mater. 36 (1997) 535e541.[227] M.W. Barsoum, Prog. Solid St. Chem. 28 (2000) 201e281.[228] M.W. Barsoum, T. El-Raghy, J. Mater. Synth. Process. 5 (1997) 197e216.[229] S.B. Li, G.P. Bei, H.X. Zhai, Z.L. Zhang, Y. Zhou, C.W. Li, J. Mater. Res. 22 (2007)

3226e3232.[230] T. El-Raghy, M.W. Barsoum, Science 285 (1999) 1355.[231] Z. Sun, H. Hashimoto, W. Tian, Y. Zou, Int. J. Appl. Ceram. Technol. 7 (2010)

704e718.[232] Z.M. Sun, S. Gupta, H. Ye, M.W. Barsoum, J. Mater. Res. 20 (2005) 2618e2621.[233] Z.M. Sun, M.W. Barsoum, J. Mater. Res. 21 (2006) 1629e1631.[234] Z.M. Sun, M.W. Barsoum, Y.M. Zhang, H. Hashimoto, Mater. Res. Lett. 1

(2013) 109e113.[235] J. Zhang, B. Liu, J.Y. Wang, Y.C. Zhou, J. Mater. Res. 24 (2012) 39e49.[236] J. Wu, Y. Zhou, C. Yan, Z. Metallkd. 96 (2005) 847e852.[237] H. Ye, S. Xue, M. Pecht, Mater. Lett. 98 (2013) 78e81.[238] H.C. Shi, A.P. Xian, J. Chin, Nonferr. Met. 21 (2011) 1021e1030.[239] C.M.L. Wu, Y.W. Wong, J. Mater. Sci.-Mater. Eleltron. 18 (2007) 77e91.

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Z.M. Sun received his B.S. at the Department of MaterialsScience and Engineering, Nanjing Institute of Technology(currently School of Materials Science and Engineering,Southeast University) in 1985, his M.S. degree at Instituteof Metal Research (IMR), CAS in 1988. He received his Ph.D.degree in 1992, under a joint-degree program between theIMR, CAS, and the University of Vienna. Then, he served asa research associate at IMR. In March 1993, he joined theInstitute of Physical Chemistry, the University of Vienna,as a guest researcher. In August 1994, he was invited tojoin the Toyohashi University of Technology, Japan, underthe support of Daiko Foundation. At the same national uni-versity he obtained a fellowship from the Japan Society forthe Promotion of Science (JSPS) in August 1995. In April

1997, he joined the Tohoku National Industrial Research Institute, as a research officer,a permanent position. This institute was later reorganized to the National Institute ofAdvanced Industrial Science and Technology (AIST), where he was promoted to a se-nior research scientist and served as an associate to the director of the InternationalAffairs Division, for one year. He also worked at Drexel University, USA, in February2004 for one year, on his sabbatical leave from AIST. In 2013, he was selected by TheRecruitment Program of Global Experts, generally called Thousand Talents Program,and joined the School of Materials Science and Engineering, Southeast University.His research interests covered the research and development of metallic materials,intermetallic compounds, ceramics and composites, including their synthesis, charac-terization and applications. In the past decade, he devoted most of his energy to theMAX phase materials, a family of ternary compounds, which combines the best attri-butes of metals and ceramics. He has authored over 100 SCI indexed papers andapplied over 20 patents.